A winding coating system

Abstract

The utility model provides a kind of winding coating system, including the arrangement of roll-off chamber, at least one function room and winding chamber and substrate winding device in proper order, for the target substrate released from roll-off chamber is sequentially conveyed to winding chamber and is stored, still include valve puller device, for the vacuum valve of function room is extracted or withdrawn, to replace sputtering target material or evaporation filler installed in the inboard of vacuum valve.The winding coating system provided by the utility model sets valve puller device and extracts the vacuum valve of function room such as evaporation chamber or sputtering chamber to open or close corresponding function room, so that operating personnel quickly replace sputtering target material or evaporation filler installed in the inboard of vacuum valve, simplifies winding coating material replacement step and device cost is controllable, so that winding coating material replacement operation saves time and effort, to improve the winding coating efficiency of winding coating system, while each chamber does not need to break vacuum frequently, further improve the coating efficiency of winding coating system and reduce coating cost.

Description

Technical Field

[0001] This utility model relates to the field of vacuum coating technology, and in particular to a roll-to-roll coating system. Background Technology

[0002] Currently, the demand for coating on flexible substrates is increasing in markets such as consumer electronics, lithium batteries, and optics, leading to the widespread application of vacuum roll-to-roll coating equipment. Many existing vacuum roll-to-roll coating systems integrate processes such as evaporation, sputtering, gas reaction, and surface treatment to meet the needs of developing different film systems and materials.

[0003] However, in existing vacuum roll-to-roll coating equipment, when the sputtering target or vapor deposition filler is exhausted, the top cover of the corresponding vapor deposition or sputtering chamber needs to be manually opened to replace the target or filler, which is time-consuming and labor-intensive. Furthermore, existing vacuum roll-to-roll coating equipment requires frequent vacuum breaking of each chamber during loading and unloading, which can easily allow air to enter the chamber and contaminate subsequent targets or fillers, resulting in reduced efficiency and increased costs for the vacuum roll-to-roll coating equipment. Utility Model Content

[0004] This invention proposes a roll-to-roll coating system to solve the technical problem that existing vacuum roll-to-roll coating equipment requires manual opening of the corresponding chamber cover plate for material replacement when the sputtering target or vapor-deposited filler is exhausted, which is time-consuming and labor-intensive.

[0005] To solve the above problems, the technical solution adopted by this utility model is as follows:

[0006] This utility model provides a roll-to-roll coating system, including an unwinding chamber, at least one functional chamber, and a winding chamber arranged in sequence, as well as a substrate winding device for sequentially conveying the target substrate released from the unwinding chamber through each functional chamber to the winding chamber for storage, and further including:

[0007] The valve pull-out device is used to pull out or retract the vacuum valve of the functional chamber to replace the sputtering target or vapor-deposited filler installed inside the vacuum valve.

[0008] Preferably, the functional chamber is a vapor deposition chamber or a sputtering chamber.

[0009] Preferably, the functional chamber includes a vapor deposition chamber and a sputtering chamber arranged sequentially between the unwinding chamber and the rewinding chamber. The substrate winding device is used to transport the target substrate released from the unwinding chamber sequentially through the vapor deposition chamber and the sputtering chamber to the rewinding chamber for storage. The valve pull-out device includes:

[0010] The first pull-out mechanism is used to pull out or retract the vacuum valve of the vapor deposition chamber to replace the vapor deposition filler installed inside the vacuum valve.

[0011] The second pull-out mechanism is used to pull out or retract the vacuum valve of the sputtering chamber to replace the sputtering target installed inside the vacuum valve.

[0012] Furthermore, the roll-to-roll coating system also includes:

[0013] The post-processing chamber is located between the sputtering chamber and the winding chamber. The substrate winding device transports the target substrate sequentially through the evaporation chamber, the sputtering chamber, and the post-processing chamber to the winding chamber.

[0014] Preferably, the unwinding chamber, the vapor deposition chamber, the sputtering chamber, the post-treatment chamber, and the rewinding chamber are arranged adjacent to each other in sequence. The unwinding chamber and the vapor deposition chamber are connected through a first substrate channel, the vapor deposition chamber and the sputtering chamber are connected through a second substrate channel, the sputtering chamber and the post-treatment chamber are connected through a third substrate channel, and the post-treatment chamber and the rewinding chamber are connected through a fourth substrate channel. Transition guide rollers are provided at the first substrate channel and / or the second substrate channel and / or the third substrate channel and / or the fourth substrate channel to alleviate the pressure difference between the front and rear chambers.

[0015] Preferably, the unwinding chamber is provided with a substrate unwinding device, the vapor deposition chamber is provided with an evaporation coating drum and an evaporation device located below the coating drum, the evaporation device includes vapor deposition filler and an evaporation source, the sputtering chamber is provided with a sputtering coating drum and a sputtering device surrounding the sputtering coating drum, the sputtering device includes a sputtering target and a sputtering source, the post-processing chamber is provided with a post-processing device, the post-processing device includes a gas delivery mechanism and a second ion source, and the rewinding chamber is provided with a substrate rewinding device;

[0016] The substrate winding device is used to transport the target substrate released from the substrate unwinding device to the substrate winding device after passing through the first substrate channel, the evaporation coating drum, the second substrate channel, the sputtering coating drum and the third substrate channel in sequence to the substrate winding device for storage.

[0017] The evaporation source is used to provide evaporation energy so that the vapor deposition filler generates vapor deposition gas to perform vapor deposition on the target substrate above the evaporation coating drum;

[0018] The sputtering source is used to provide sputtering energy to generate an ion beam on the sputtering target to perform sputtering coating on the target substrate that is above the sputtering coating drum;

[0019] A gas delivery mechanism is used to introduce reactive gases into the post-processing chamber, and a second ion source is used to provide ion energy so that the reactive gases can perform plasma post-processing on the target substrate.

[0020] Preferably, the substrate winding apparatus includes:

[0021] The first winding mechanism is located in the unwinding chamber and between the substrate unwinding device and the first substrate channel, and is used to connect the target substrate released from the substrate unwinding device.

[0022] The second winding mechanism is located in the evaporation chamber and between the first substrate channel and the evaporation coating drum. It is used to guide the target substrate from the first winding mechanism to the evaporation coating drum through the first substrate channel.

[0023] The third winding mechanism is located in the evaporation chamber and between the evaporation coating drum and the second substrate channel, and is used to connect the target substrate wound by the evaporation coating drum.

[0024] The fourth winding mechanism is located in the sputtering chamber and between the second substrate channel and the sputtering coating drum. It is used to guide the target substrate from the third winding mechanism through the second substrate channel to the sputtering coating drum.

[0025] The fifth winding mechanism is located in the sputtering chamber and between the sputtering coating drum and the third substrate channel, and is used to connect the target substrate wound by the sputtering coating drum;

[0026] The sixth winding mechanism is located in the post-processing chamber and between the third substrate channel and the fourth substrate channel. It is used to guide the target substrate from the fifth winding mechanism through the third substrate channel into the post-processing chamber.

[0027] The seventh winding mechanism is located in the winding chamber and between the fourth substrate channel and the substrate winding device. It is used to guide the target substrate that has undergone surface post-treatment with reactive gas from the sixth winding mechanism to the substrate winding device via the fourth substrate channel.

[0028] Furthermore, the sputtering chamber includes:

[0029] Several sputtering cavities are spaced around the periphery of the sputtering coating drum and are respectively connected to the vacuum valves of the sputtering chamber. The sputtering target is installed on the inner side of the vacuum valve facing the sputtering cavities.

[0030] Furthermore, the evaporation device also includes:

[0031] A vapor deposition baffle is placed between the evaporation source and the evaporation coating drum to shield the parts of the target substrate that do not require evaporation coating.

[0032] Furthermore, the evaporation device also includes:

[0033] The first ion source, located in the evaporation chamber and between the second winding mechanism and the evaporation coating drum, is used to provide ion energy to perform plasma pretreatment on the target substrate.

[0034] Compared with the prior art, the present invention has the following beneficial effects:

[0035] The roll-to-roll coating system provided by this utility model is equipped with a valve pull-out device to pull out the vacuum valves of functional chambers such as the evaporation chamber or sputtering chamber to open or close the corresponding functional chambers. This allows operators to quickly replace the sputtering target or evaporation filler installed inside the vacuum valve, simplifying the roll-to-roll coating material changeover process and keeping the device cost under control. This makes the roll-to-roll coating material changeover operation time-saving and labor-saving, thereby improving the roll-to-roll coating efficiency of the roll-to-roll coating system. At the same time, each chamber does not need to be frequently broken through vacuum, further improving the coating efficiency of the roll-to-roll coating system and reducing the coating cost. Attached Figure Description

[0036] To more clearly illustrate the technical solution proposed by this utility model, the present utility model will be described in detail below with reference to the embodiments and accompanying drawings. It should be understood that the embodiments and accompanying drawings described in the following detailed description are merely some embodiments of this utility model, and those skilled in the art can make changes to these drawings under the concept of this utility model.

[0037] Figure 1 A three-dimensional structural schematic diagram of an embodiment of the roll-to-roll coating system provided by this utility model;

[0038] Figure 2 A top view of an embodiment of the roll-to-roll coating system provided by this utility model;

[0039] Figure 3 This is a cross-sectional structural schematic diagram of an embodiment of the roll-to-roll coating system provided by this utility model.

[0040] The main markings in the attached figures are as follows:

[0041] 1. Unwinding chamber; 11. Substrate unwinding device; 111. Unwinding roller; 2. Evaporation chamber; 21. Evaporation cavity; 22. First substrate channel; 221. First transition guide roller; 23. Evaporation coating drum; 231. Evaporation coating roller; 24. Evaporation device; 241. Evaporation container; 242. Evaporation source; 243. Evaporation baffle; 244. First ion source; 3. Sputtering chamber; 31. Sputtering cavity; 311. Sputtering partition; 32. Second substrate channel; 321. Second transition guide roller 33. Sputtering drum; 331. Sputtering roller; 34. Sputtering device; 341. Sputtering target; 4. Post-processing chamber; 41. Third substrate channel; 411. Third transition guide roller; 5. Rewinding chamber; 51. Fourth substrate channel; 511. Fourth transition guide roller; 52. Substrate rewinding device; 521. Rewinding roller; 6. Substrate winding device; 61. First winding mechanism; 611. First flattening roller; 612. First movable swing arm; 6121. First strip arm; 613. 614. First movable roller; 62. First guide roller; 63. Second winding mechanism; 64. First correction roller; 65. Second guide roller; 66. Third winding mechanism; 67. Third guide roller; 68. Second correction roller; 69. Fourth winding mechanism; 60. Third guide roller; 61. Second correction roller; 61. Third guide roller; 62. Fourth guide roller; 63. Fifth winding mechanism; 64. Fifth guide roller; 65. Fifth guide roller; 66. Fifth correction roller; 67. Sixth winding mechanism; 68. Sixth guide roller; 69. Seventh winding mechanism ; 671, Seventh guide roller; 672, Second flattening roller; 673, Second movable swing arm; 6731, Second strip arm; 674, Second movable roller; 7, Valve pull-out device; 71, First pull-out mechanism; 711, First pull-out guide rail; 72, Second pull-out mechanism; 721, Second pull-out guide rail; 8, Vacuum valve; 81, Mounting tube seat; 82, Mounting base; 9, Target substrate; 10, Vacuum device; 101, Foreboard pump; 102, Molecular pump; 20, Electrical device. Detailed Implementation

[0042] Please refer to the following: Figure 1-3 The roll coating system provided in this utility model application includes an unwinding chamber 1, at least one functional chamber and a winding chamber 5 arranged in sequence, and a substrate winding device 6. The substrate winding device 6 is used to transport the target substrate 9 released from the unwinding chamber 1 to the winding chamber 5 for storage through each functional chamber. The functional chamber is used to perform vacuum coating operations corresponding to the target substrate 9 that is wound around the functional cavity inside the functional chamber.

[0043] The roll-to-roll coating system also includes:

[0044] The valve pull-out device 7 is used to pull out the vacuum valve 8 of the functional chamber to open the corresponding functional chamber or retract it to close the corresponding functional chamber, so that the operator can quickly replace the sputtering target 341 or vapor deposition filler (not shown in the figure) installed inside the vacuum valve 8. This simplifies the material change-out steps of the roll-to-roll coating system and keeps the device cost under control. It makes the material change-out operation of the roll-to-roll coating system time-saving and labor-saving, thereby improving the roll-to-roll coating efficiency of the roll-to-roll coating system.

[0045] Please refer to the following: Figure 1-3 In this embodiment, the functional chamber includes an unwinding chamber 1, a vapor deposition chamber 2, a sputtering chamber 3, and a rewinding chamber 5 arranged in sequence (i.e., the vapor deposition chamber 2 and the sputtering chamber 3 are arranged in sequence between the unwinding chamber 1 and the rewinding chamber 5). The substrate winding device 6 is used to transport the target substrate 9 released from the unwinding chamber 1 to the rewinding chamber 5 for storage via the vapor deposition chamber 2 and the sputtering chamber 3.

[0046] Valve pull-out device 7 includes:

[0047] The first pull-out mechanism 71 is used to pull out the vacuum valve 8 of the vapor deposition chamber 2 to open the vapor deposition chamber 2 or to retract it to close the vapor deposition chamber 2, so that the operator can quickly replace the vapor deposition filler (not shown in the figure) installed inside the vacuum valve 8 and pulled out with it.

[0048] The second pull-out mechanism 72 is used to pull out the vacuum valve 8 of the sputtering chamber 3 to open the sputtering chamber 3 or to retract it to close the sputtering chamber 3, so that the operator can quickly replace the sputtering target 341 installed inside the vacuum valve 8 and pulled out with it.

[0049] Please refer to the following: Figure 1-3 In a preferred embodiment of this invention, the sputtering target 341 is tubular, and a plurality of mounting bases 81 are provided at intervals on the inner side of the vacuum valve 8 of the sputtering chamber 3 facing the sputtering cavity 31 inside the sputtering chamber 3. The sputtering target 341 is detachably connected to the corresponding mounting base 81.

[0050] Please refer to the following: Figure 1-3 In a preferred embodiment, the vacuum valve 8 of the vapor deposition chamber 2 is provided with a mounting base 82 facing the inner side of the vapor deposition chamber 21 inside the vapor deposition chamber 2. The evaporation container 241 is mounted on the mounting base 82, and the vapor deposition filler is filled inside the evaporation container 241.

[0051] Please refer to the following: Figure 1-3 In a preferred embodiment of this invention, the first pull-out mechanism 71 includes:

[0052] The vacuum valve 8 of the vapor deposition chamber 2 is movably mounted on the first pull-out guide rail 711;

[0053] The first drive unit (not shown in the figure) is used to drive the first transmission module (not shown in the figure) to drive the vacuum valve 8 of the vapor deposition chamber 2 to reciprocate along the first pull-out guide rail 711.

[0054] The second pull-out mechanism 72 includes:

[0055] The vacuum valve 8 of the sputtering chamber 3 is movably mounted on the second pull-out guide rail 721;

[0056] The second drive unit (not shown in the figure) is used to drive the second transmission module (not shown in the figure) to drive the vacuum valve 8 of the sputtering chamber 3 to reciprocate along the second pull-out guide rail 721.

[0057] As a preferred embodiment of this invention, both the first drive unit and the second drive unit adopt a drive motor or a drive cylinder / electric cylinder / hydraulic cylinder unit, and both the first transmission module and the second transmission module adopt a linear transmission module such as a synchronous pulley, lead screw nut, gear rack, cylinder telescopic rod, etc.

[0058] In another embodiment (not shown in the figure), only one functional chamber may be provided. This functional chamber may be a vapor deposition chamber 2 or a sputtering chamber 3. The valve pulling device 7 is used to pull out or retract the vacuum valve 8 of the vapor deposition chamber 2 or the sputtering chamber 3 to replace the sputtering target 341 or vapor deposition filler installed inside the vacuum valve 8 of the vapor deposition chamber 2 or the sputtering chamber 3.

[0059] Please refer to the following: Figure 1-3 In this embodiment, the roll-to-roll coating system further includes:

[0060] The post-processing chamber 4 is located between the sputtering chamber 3 and the winding chamber 5. The substrate winding device 6 transports the target substrate 9 sequentially through the evaporation chamber 2, the sputtering chamber 3 and the post-processing chamber 4 to the winding chamber 5.

[0061] Please refer to the following: Figure 1-3 In this embodiment, the unwinding chamber 1, the vapor deposition chamber 2, the sputtering chamber 3, the post-processing chamber 4, and the rewinding chamber 5 are arranged adjacent to each other in sequence. The unwinding chamber 1 and the vapor deposition chamber 2 are connected by a first substrate channel 22, the vapor deposition chamber 2 and the sputtering chamber 3 are connected by a second substrate channel 32, the sputtering chamber 3 and the post-processing chamber 4 are connected by a third substrate channel 41, and the post-processing chamber 4 and the rewinding chamber 5 are connected by a fourth substrate channel 51. The first substrate channel 22, the second substrate channel 32, the third substrate channel 41, and the fourth substrate channel 51 are all slit-type channels to separate the different functions of the front and rear chambers or to maintain different vacuum atmospheres.

[0062] Please refer to the following: Figure 1-3In this embodiment, transition guide rollers are provided at the first substrate channel 22 and / or the second substrate channel 32 and / or the third substrate channel 41 and / or the fourth substrate channel 51 to alleviate the pressure difference between the front and rear chambers and prevent air knife from being generated at the corresponding channel slit due to excessive pressure difference between the front and rear chambers (usually the pressure in the post-processing chamber inside the post-processing chamber 4 is greater than that in the front), thereby causing damage to the film surface of the target substrate 9.

[0063] Please refer to the following: Figure 1-3 In this embodiment, one vapor deposition chamber 2, one sputtering chamber 3, and one post-processing chamber 4 are each provided.

[0064] In other embodiments, the post-processing chamber 4 may be omitted, and at least one of the vapor deposition chamber 2 and the sputtering chamber 3 may be provided.

[0065] Please refer to the following: Figure 1-3 In this embodiment, the unwinding chamber 1 is equipped with a substrate unwinding device 11, the evaporation chamber 2 is equipped with an evaporation coating drum 23 and an evaporation device 24 located below the coating drum. The evaporation device 24 includes the aforementioned evaporation container 241, evaporation filler filled in the evaporation container 241, and an evaporation source 242 installed on the mounting base 82. The sputtering chamber 3 is equipped with a sputtering coating drum 33 and a sputtering device 34 surrounding the sputtering coating drum 33. The sputtering device 34 includes a sputtering target 341 and a sputtering source (not shown in the figure) installed on the aforementioned mounting tube 81, and a control magnet (not shown in the figure) located at the target center for generating a fixed or adjustable control magnetic field. The post-processing chamber 4 is equipped with a post-processing device (not shown in the figure), which includes a gas delivery mechanism (not shown in the figure) and a second ion source (not shown in the figure). The winding chamber 5 is equipped with a substrate winding device 52.

[0066] The substrate winding device 6 is used to transport the target substrate 9 released from the substrate unwinding device 11 sequentially through the first substrate channel 22, the evaporation coating drum 23, the second substrate channel 32, the sputtering coating drum 33, and the third substrate channel 41 to the substrate winding device 52 for storage. The evaporation source 242 provides evaporation energy to generate evaporation gas from the evaporation filler to perform evaporation coating on the target substrate 9 that has passed over the evaporation coating drum 23. The sputtering source provides sputtering energy to generate an ion beam from the sputtering target 341, which, guided by a control magnetic field, performs sputtering coating on the target substrate 9 that has passed over the sputtering coating drum 33. The gas delivery mechanism introduces reactive gas into the post-processing chamber 4, and the second ion source provides ion energy to perform plasma post-processing on the surface of the target substrate 9.

[0067] Please refer to the following: Figure 1-3 In this embodiment, the substrate winding device 6 includes:

[0068] The first winding mechanism 61 is located in the unwinding chamber 1 and between the substrate unwinding device 11 and the first substrate channel 22, for connecting the target substrate 9 released from the substrate unwinding device 11; the second winding mechanism 62 is located in the evaporation chamber 2 and between the first substrate channel 22 and the evaporation coating drum 23, for guiding the target substrate 9 from the first winding mechanism 61 through the first substrate channel 22 to the evaporation coating drum 23; the third winding mechanism 63 is located in the evaporation chamber 2 and between the evaporation coating drum 23 and the second substrate channel 32, for connecting the target substrate 9 wound by the evaporation coating drum 23; the fourth winding mechanism 64 is located in the sputtering chamber 3 and between the second substrate channel 32 and the sputtering coating drum 33, for guiding the target substrate 9 from the third winding mechanism 64. Mechanism 63 winds the target substrate 9 through the second substrate channel 32 into the sputtering drum 33; the fifth winding mechanism 65 is located in the sputtering chamber 3 and between the sputtering drum 33 and the third substrate channel 41, and is used to connect the target substrate 9 wound through the sputtering drum 33; the sixth winding mechanism 66 is located in the post-processing chamber 4 and between the third substrate channel 41 and the fourth substrate channel 51, and is used to guide the target substrate 9 from the fifth winding mechanism 65 through the third substrate channel 41 into the post-processing chamber 4; the seventh winding mechanism 67 is located in the take-up chamber 5 and between the fourth substrate channel 51 and the substrate take-up device 52, and is used to guide the target substrate 9 after the reactive gas surface post-treatment to be wound from the sixth winding mechanism 66 through the fourth substrate channel 51 into the substrate take-up device 52.

[0069] In this embodiment, the target substrate 9 includes, but is not limited to, aluminum foil, copper foil, stainless steel substrate, PE / PP / PET / PI / PC, and multilayer composite material substrate.

[0070] Please refer to the following: Figure 1-3 In this embodiment, the evaporation chamber 2 is provided with a rotatable evaporation coating roller 231, and the evaporation coating drum 23 is mounted on the evaporation coating roller 231; the sputtering chamber 3 is provided with a rotatable sputtering coating roller 331, and the sputtering coating drum 33 is mounted on the sputtering coating roller 331.

[0071] The substrate unwinding device 11 includes:

[0072] The unwinding roller 111 is rotatably mounted in the unwinding chamber 1 and is used to release the target substrate 9.

[0073] The first winding mechanism 61 includes:

[0074] A first flattening roller 611 is rotatably mounted in the unwinding chamber 1 and located between the unwinding roller 111 and the first substrate channel 22; a first movable swing arm 612 includes a pair of first strip arms 6121 connected at their ends, with the included angle between the pair of first strip arms 6121 being greater than 90 degrees and less than 180 degrees, and the first flattening roller 611 passes through the junction of the pair of first strip arms 6121; a pair of first movable rollers 613 are rotatably mounted at the ends of the pair of first strip arms 6121 away from the other first strip arm 6121; a plurality of first guide rollers 614 are rotatably mounted in the unwinding chamber 1 and are spaced apart between the first movable roller 613 and the first substrate channel 22 along the winding path conveyed between the first movable roller 613 and the first substrate channel 22 at the end of the target substrate 9.

[0075] During the winding operation, the first flattening roller 611 is positioned at a point and rotates. According to the required roll diameter of the target substrate 9 released by the unwinding roller 111, a pair of first movable rollers 613 are driven to swing up and down around the first flattening roller 611 with the first movable swing arm 612, thereby changing the relative position of the pair of first movable rollers 613 in the unwinding chamber 1, so as to flatten and tighten the target substrate 9 that has been wound around the pair of first movable rollers 613 and the first flattening roller 611, and guide it through the first substrate channel 22 to enter the vapor deposition chamber 2.

[0076] Please refer to the following: Figure 1-3 In this embodiment, the second winding mechanism 62 includes:

[0077] The first alignment roller 621 is rotatably mounted in the evaporation chamber 2 and located between the first substrate channel 22 and the evaporation coating drum 23; a plurality of second guide rollers 622 are rotatably mounted in the evaporation chamber 2 and are spaced apart between the first alignment roller 621 and the evaporation coating drum 23 along the winding path of the target substrate 9 conveyed between the first alignment roller 621 and the evaporation coating drum 23.

[0078] The third winding mechanism 63 includes:

[0079] Several third guide rollers 631 are rotatably mounted in the evaporation chamber 2 and are spaced apart between the evaporation drum 23 and the second substrate channel 32 along the winding path of the target substrate 9 being conveyed between the evaporation drum 23 and the second substrate channel 32.

[0080] The second correction roller 632 is rotatably mounted in the vapor deposition chamber 2 and is located between the third guide roller 631 at the end and the second substrate channel 32.

[0081] After entering the evaporation chamber 2 through the first substrate channel 22, the target substrate 9 first passes through the first correction roller 621 to correct the winding direction, then passes through each of the second guide rollers 622 in sequence, then passes through the evaporation coating drum 23 to perform the evaporation coating operation, then passes through each of the third guide rollers 631 in sequence, and finally passes through the second correction roller 632 to correct the winding direction, so that the target substrate 9 passes through the second substrate channel 32 to enter the sputtering chamber 3.

[0082] Please refer to the following: Figure 1-3 In this embodiment, the fourth winding mechanism 64 includes:

[0083] The third correction roller 641 is rotatably mounted in the sputtering chamber 3 and located between the second substrate channel 32 and the sputtering coating drum 33; a plurality of fourth guide rollers 642 are rotatably mounted in the sputtering chamber 3 and are spaced apart between the third correction roller 641 and the sputtering coating drum 33 along the winding path of the target substrate 9 conveyed between the third correction roller 641 and the sputtering coating drum 33.

[0084] The fifth winding mechanism 65 includes:

[0085] Several fifth guide rollers 651 are rotatably mounted in the sputtering chamber 3 and are spaced apart between the sputtering drum 33 and the third substrate channel 41 along the winding path of the target substrate 9 conveyed between the sputtering drum 33 and the third substrate channel 41.

[0086] The fourth correction roller 652 is rotatably mounted inside the sputtering chamber 3 and is located between the fifth guide roller 651 at the end and the third substrate channel 41.

[0087] After entering the sputtering chamber 3 through the second substrate channel 32, the target substrate 9 first passes through the third correction roller 641 to correct its winding direction, then passes through each of the fourth guide rollers 642 in sequence, and then passes through the sputtering coating drum 33 to perform sputtering coating operation. Next, it passes through each of the fifth guide rollers 651 in sequence, and finally passes through the fourth correction roller 652 to correct its winding direction, so that the target substrate 9 passes through the third substrate channel 41 to enter the post-processing chamber 4.

[0088] Please refer to the following: Figure 1-3 In this embodiment, the sixth winding mechanism 66 includes:

[0089] A plurality of sixth guide rollers 661 are rotatably mounted in the post-processing unit and are spaced apart between the third substrate channel 41 and the fourth substrate channel 51 along the winding path of the target substrate 9 conveyed between the third substrate channel 41 and the fourth substrate channel 51.

[0090] After entering the post-processing chamber 4 through the third substrate channel 41, the target substrate 9 sequentially passes through each of the sixth guide rollers 661 to perform surface post-processing operations, and finally passes through the fourth substrate channel 51 to enter the winding chamber 5.

[0091] Please refer to the following: Figure 1-3 In this embodiment, the seventh winding mechanism 67 includes:

[0092] Several seventh guide rollers 671 are rotatably mounted in the winding chamber 5 and are spaced apart between the fourth substrate channel 51 and the substrate winding device 52 along the winding path of the target substrate 9 conveyed between the fourth substrate channel 51 and the substrate winding device 52.

[0093] The second flattening roller 672 is rotatably mounted in the winding chamber 5 and located between the seventh guide roller 671 at the end and the substrate winding device 52; the second movable swing arm 673 includes a pair of second strip arms 6731 connected at their ends, and the included angle of the pair of second strip arms 6731 is greater than 90 degrees and less than 180 degrees, and the second flattening roller 672 passes through the junction of the pair of second strip arms 6731; a pair of second movable rollers 674 are rotatably mounted at the ends of the pair of second strip arms 6731 away from the other second strip arm 6731.

[0094] The substrate winding device 52 includes:

[0095] The take-up roller 521 is rotatably mounted in the take-up chamber 5 and is used to hold the target substrate 9.

[0096] During the winding operation, the second flattening roller 672 is positioned at a point and rotates. According to the required roll diameter of the target substrate 9, it drives a pair of second movable rollers 674 to swing up and down around the second flattening roller 672 with the second movable swing arm 673, thereby changing the relative position of the pair of second movable rollers 674 in the winding chamber 5, so as to flatten and tighten the target substrate 9 that has been wound around the pair of second movable rollers 674 and the second flattening roller 672, and finally store it in the winding roller 521.

[0097] In a preferred embodiment of this invention, the second winding mechanism 62, the third winding mechanism 63 and / or the fourth winding mechanism 64 and the fifth winding mechanism 65 further include an electromagnetic heating roller (not shown in the figure) and a cold roller (not shown in the figure), respectively, which are respectively disposed on both sides of the evaporation coating drum 23 and / or the sputtering coating drum 33 facing the coating surface of the target substrate 9. The electromagnetic heating roller is used to eliminate the stress of the target substrate 9, and the cold roller is used to shape the target substrate 9 after coating.

[0098] In a preferred embodiment of this example, the substrate unwinding device 11, the first winding mechanism 61, the third winding mechanism 63, the fourth winding mechanism 64, the fifth winding mechanism 65, the sixth winding mechanism 66, the seventh winding mechanism 67, the substrate winding device 52, the evaporation coating drum 23, and the corresponding rollers of the sputtering coating drum 33 are all driven by motors to rotate, so that the substrate winding device 6 can perform unwinding, transmission / handling, and winding of the target substrate 9.

[0099] Please refer to the following: Figure 1-3 In this embodiment, the first substrate channel 22, the second substrate channel 32, the third substrate channel 41 and the fourth substrate channel 51 are respectively provided with a first transition guide roller 221, a second transition guide roller 321, a third transition guide roller 411 and a fourth transition guide roller 511.

[0100] In this embodiment, a substrate heating device (not shown in the figure) is also provided in the unwinding chamber 1. The substrate heating device can be a resistance type or an infrared type (such as an infrared heating lamp) or other heating devices, which are used to assist in heating the target substrate 9 to improve the subsequent coating efficiency.

[0101] In this embodiment, the evaporation source 242 can use a crucible (materials including but not limited to graphite, alumina, boron nitride, etc.) or an evaporation boat as the evaporation container 241 for thermal resistance evaporation, or it can use electron beam evaporation. The vapor deposition filler includes, but is not limited to, gold, silver, copper, zinc, nickel, chromium, aluminum, titanium, nickel-chromium alloy, copper-tungsten alloy, diamond-based carbon, C60, lithium fluoride, magnesium fluoride, etc.

[0102] As a preferred embodiment of this invention, the evaporation source 242 has a built-in temperature control device (not shown in the figure), which can be configured with a film thickness detection unit and a sheet resistance detection unit to detect the film performance and parameters in real time.

[0103] Please refer to the following: Figure 1-3 In this embodiment, the evaporation device 24 further includes:

[0104] A vapor deposition baffle 243 (i.e., a mask plate) is disposed between the evaporation source 242 and the evaporation coating drum 23 to block the parts of the target substrate 9 that do not require evaporation coating.

[0105] Please refer to the following: Figure 1-3 In this embodiment, the evaporation device 24 further includes:

[0106] The first ion source 244 is located in the evaporation chamber 2 and between the second winding mechanism 62 and the evaporation coating drum 23. It is used to provide ion energy to perform plasma pretreatment on the surface of the target substrate 9 to improve the adhesion between film layers.

[0107] Please refer to the following: Figure 1-3 In this embodiment, the sputtering chamber 31 inside the sputtering chamber 3 includes a plurality of sputtering cavities 311, which are spaced around the periphery of the sputtering coating drum 33 and are respectively connected to the vacuum valves 8 of the sputtering chamber 3. The sputtering target 341 is installed on the inner side of the vacuum valves 8 facing the sputtering cavities 311.

[0108] Please refer to the following: Figure 1-3 In a preferred embodiment, at least three sputtering cavities 311 are spaced apart. The sputtering targets 341 include at least three pairs of rotating or planar targets mounted on the inner side of the vacuum valve 8 facing the sputtering cavities 311, corresponding to each sputtering cavity 311. Each pair of targets is separated from the others by an independent sputtering cavity 311 to prevent interference and contamination between sputtering targets 341 made of different materials. The sputtering targets 341 include, but are not limited to, ceramics, silicon dioxide, graphite, niobium oxide, etc. The sputtering source preferably uses a DC, intermediate frequency, pulsed radio frequency, or other sputtering power supply to provide sputtering energy.

[0109] In this embodiment (not shown in the figure), the gas delivery mechanism of the post-processing device is used to introduce reactive gases (including but not limited to CO2, N2, O2, H2, CF4, SiH4, NH3, He, Ar, etc.) into the post-processing chamber 4. The post-processing device also includes a liquid delivery mechanism (not shown in the figure) for introducing liquids (such as H2O) into the post-processing chamber 4, and at least one second ion source to perform post-processing operations such as cooling annealing, heat treatment, and gas reaction on the target substrate 9 after the coating operation is completed.

[0110] In this embodiment, the roll-to-roll coating system also includes electrical devices and auxiliary devices (not shown in the figure). The electrical devices are controlled by PLC programming to realize fully automated production of the entire roll-to-roll coating system. The auxiliary devices include various detection or control units for providing parameter detection or temperature control, such as temperature detection units, gas analysis units, crystal oscillator units, ellipsometer units, sheet resistance detection units, eddy current units, etc., which can be installed in the evaporation chamber 2, sputtering chamber 3, and post-processing chamber 4. The crystal oscillator unit, ellipsometer unit, and eddy current unit are all used to detect film thickness, and any one of them can be selected.

[0111] In a preferred embodiment of this invention, the electrical equipment preferably includes at least one power supply cabinet.

[0112] In this embodiment, the roll-to-roll coating system further includes:

[0113] The vacuum device 10 includes a back pump 101, a plurality of molecular pumps 102, and a vacuum / negative pressure pipeline connecting the unwinding chamber 1 and / or at least one functional chamber and / or the winding chamber 5 with the back pump 101 and the molecular pumps 102. The back pump 101 and the molecular pumps 102 are used to evacuate the roll-to-roll coating system to achieve the vacuum level required for coating the target substrate 9.

[0114] In this embodiment, channel sealing devices (i.e. slit sealing devices, not shown in the figure) are provided at the connection points of the unwinding chamber 1, the winding chamber 5, the vapor deposition chamber 2, the sputtering chamber 3, and the post-processing chamber 4 (i.e., near the first substrate channel 22, the second substrate channel 32, the third substrate channel 41, and the fourth substrate channel 51). The target substrate 9 moves and is transported between the chambers through the corresponding slit channels.

[0115] The working steps and principle of the roll-to-roll coating system provided by this utility model are as follows:

[0116] S1: When the roll-to-roll coating system performs the roll-to-roll coating operation, according to the required roll diameter of the target substrate 9 released by the unwinding roller 111, a pair of first movable rollers 613 are driven to swing up and down around the first flattening roller 611 with the first movable swing arm 612, so as to flatten and tighten the target substrate 9 that has been wrapped around the pair of first movable rollers 613 and the first flattening roller 611. After the substrate heating device provides auxiliary heating, the substrate 9 is guided by each first guide roller 614 and enters the vapor deposition chamber 2 through the first substrate channel 22.

[0117] S2: After entering the evaporation chamber 2, the target substrate 9 first passes through the first correction roller 621 to correct its winding direction. Then, it passes through each of the second guide rollers 622 and the first ion source 244 to perform plasma pretreatment on its surface. After passing through the evaporation coating drum 23, the evaporation baffle 243 blocks the parts of the target substrate 9 that do not need to be evaporated. The evaporation source 242 evaporates the evaporation filler onto the target substrate 9 to perform evaporation coating on the target substrate 9. Then, the target substrate 9 passes through each of the third guide rollers 631 and the second correction roller 632 to correct its winding direction, so that the target substrate 9 passes through the second substrate channel 32 and enters the sputtering chamber 3.

[0118] S3: After entering the sputtering chamber 3, the target substrate 9 first passes through the third correction roller 641 to correct its winding direction, then passes through each of the fourth guide rollers 642 in sequence, and then passes through the sputtering coating drum 33. The sputtering source provides sputtering energy to generate an ion beam in the sputtering target 341 in the corresponding sputtering cavity 311. Under the guidance of the control magnetic field, the target substrate 9 passing through the sputtering coating drum 33 above is sputtered and coated. Next, the target substrate 9 passes through each of the fifth guide rollers 651 and the fourth correction roller 652 in sequence to correct its winding direction, so that the target substrate 9 passes through the third substrate channel 41 and enters the post-processing chamber 4.

[0119] S4: After entering the post-processing chamber 4, the target substrate 9 passes through each of the sixth guide rollers 661 in sequence. The gas conveying mechanism and the liquid conveying mechanism respectively introduce the reaction gas and liquid into the post-processing cavity inside the post-processing chamber 4, and the second ion source provides ion energy so that the reaction gas and liquid perform ion post-processing operations such as cooling annealing, heat treatment, gas reaction and so on on the surface of the target substrate 9.

[0120] S5: After the post-processing is completed, the target substrate 9 enters the winding chamber 5 through the fourth substrate channel 51. According to the required roll diameter of the target substrate 9, a pair of second movable rollers 674 are driven to swing up and down around the second flattening roller 672 with the second movable swing arm 673, so as to flatten and tighten the target substrate 9 that has passed through the pair of second movable rollers 674 and the second flattening roller 672, and finally store it in the winding roller 521 to complete the vapor deposition operation.

[0121] S6: After the vapor deposition operation is completed, the channel sealing device on one side of the unwinding chamber 1 or the winding chamber 5 is activated to seal the remaining chambers, only providing vacuum buffering for the unwinding chamber 1 or the winding chamber 5. This prevents air from entering the evaporation chamber, sputtering chamber 3, and post-treatment chamber 4 during the loading and unloading of the target substrate 9, thus avoiding contamination of the target substrate 9 during subsequent coating processes. When it is necessary to replace the sputtering target 341 or the vapor deposition filler, the channel sealing device on both sides of the corresponding evaporation chamber or sputtering chamber 3 is activated first to seal the connection between the corresponding evaporation chamber or sputtering chamber 3 and the adjacent chamber. The substrate channel is then opened, and the corresponding evaporation chamber or sputtering chamber 3 is evaporated. The corresponding pulling mechanism is then activated to extract the sputtering target 341 or vapor-deposited filler from the corresponding chamber. The sputtering target 341 or vapor-deposited filler can be replaced quickly and conveniently without opening the chamber cover. This ensures that the evaporation chamber and sputtering chamber 3 operate under high vacuum for a longer period of time (vacuum is only broken when replacing the sputtering target 341 or vapor-deposited filler) and that the post-processing chamber 4 always operates under high vacuum. Each chamber does not need to be evacuated frequently, thereby improving the coating efficiency of the vacuum roll coating equipment and reducing the coating cost of the vacuum roll coating equipment.

[0122] The above are merely preferred embodiments of the present utility model and are not intended to limit the present utility model. Those skilled in the art should understand that any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A roll-to-roll coating system, comprising an unwinding chamber (1), at least one functional chamber, and a winding chamber (5) arranged sequentially, and a substrate winding device (6) for sequentially conveying a target substrate (9) released from the unwinding chamber (1) through each of the functional chambers to the winding chamber (5) for storage, characterized in that, Also includes: A valve pull-out device (7) is used to pull out or retract the vacuum valve (8) of the functional chamber to replace the sputtering target (341) or vapor-deposited filler installed inside the vacuum valve (8).

2. The roll-to-roll coating system as described in claim 1, characterized in that, The functional chamber is either a vapor deposition chamber (2) or a sputtering chamber (3).

3. The roll-to-roll coating system as described in claim 1, characterized in that, The functional chamber includes a vapor deposition chamber (2) and a sputtering chamber (3) arranged sequentially between the unwinding chamber (1) and the rewinding chamber (5). The substrate winding device (6) is used to transport the target substrate (9) released from the unwinding chamber (1) sequentially through the vapor deposition chamber (2) and the sputtering chamber (3) to the rewinding chamber (5) for storage. The valve pull-out device (7) includes: The first pull-out mechanism (71) is used to pull out or retract the vacuum valve (8) of the vapor deposition chamber (2) to replace the vapor deposition filler installed inside the vacuum valve (8); The second pull mechanism (72) is used to pull out or retract the vacuum valve (8) of the sputtering chamber (3) to replace the sputtering target (341) installed inside the vacuum valve (8).

4. The roll-to-roll coating system as described in claim 2 or 3, characterized in that, Also includes: The post-processing chamber (4) is located between the sputtering chamber (3) and the winding chamber (5). The substrate winding device (6) transports the target substrate (9) sequentially through the vapor deposition chamber (2), the sputtering chamber (3) and the post-processing chamber (4) to the winding chamber (5).

5. The roll-to-roll coating system as described in claim 4, characterized in that, The unwinding chamber (1), the vapor deposition chamber (2), the sputtering chamber (3), the post-processing chamber (4), and the winding chamber (5) are arranged adjacent to each other in sequence. The unwinding chamber (1) and the vapor deposition chamber (2) are connected through a first substrate channel (22), the vapor deposition chamber (2) and the sputtering chamber (3) are connected through a second substrate channel (32), the sputtering chamber (3) and the post-processing chamber (4) are connected through a third substrate channel (41), and the post-processing chamber (4) and the winding chamber (5) are connected through a fourth substrate channel (51). Transition guide rollers are provided at the first substrate channel (22) and / or the second substrate channel (32) and / or the third substrate channel (41) and / or the fourth substrate channel (51) to alleviate the pressure difference between the front and rear chambers.

6. The roll-to-roll coating system as described in claim 5, characterized in that, The unwinding chamber (1) is equipped with a substrate unwinding device (11). The vapor deposition chamber (2) is equipped with an evaporation coating drum (23) and an evaporation device (24) located below the coating drum. The evaporation device (24) includes the vapor deposition filler and an evaporation source (242). The sputtering chamber (3) is equipped with a sputtering coating drum (33) and a sputtering device (34) surrounding the sputtering coating drum (33). The sputtering device (34) includes the sputtering target (341) and a sputtering source. The post-processing chamber (4) is equipped with a post-processing device, which includes a gas delivery mechanism and a second ion source. The winding chamber (5) is equipped with a substrate winding device (52). The substrate winding device (6) is used to transport the target substrate (9) released from the substrate unwinding device (11) sequentially through the first substrate channel (22), the evaporation coating drum (23), the second substrate channel (32), the sputtering coating drum (33) and the third substrate channel (41) to the substrate winding device (52) for storage; The evaporation source (242) is used to provide evaporation energy so that the vapor deposition filler generates vapor deposition gas to perform vapor deposition on the target substrate (9) above the vapor deposition drum (23); The sputtering source is used to provide sputtering energy so that the sputtering target (341) generates an ion beam to perform sputtering coating on the target substrate (9) above the sputtering coating drum (33); The gas delivery mechanism is used to introduce reactive gas into the post-processing chamber (4), and the second ion source is used to provide ion energy so that the reactive gas performs plasma post-processing on the target substrate (9).

7. The roll-to-roll coating system as described in claim 6, characterized in that, The substrate winding device (6) includes: The first winding mechanism (61) is located in the unwinding chamber (1) and between the substrate unwinding device (11) and the first substrate channel (22), and is used to connect the target substrate (9) released from the substrate unwinding device (11); The second winding mechanism (62) is located in the vapor deposition chamber (2) and between the first substrate channel (22) and the vapor deposition drum (23), and is used to guide the target substrate (9) to be wound from the first winding mechanism (61) through the first substrate channel (22) to the vapor deposition drum (23); The third winding mechanism (63) is located in the vapor deposition chamber (2) and between the evaporation coating drum (23) and the second substrate channel (32), and is used to connect the target substrate (9) wound by the evaporation coating drum (23); The fourth winding mechanism (64) is located in the sputtering chamber (3) and between the second substrate channel (32) and the sputtering coating drum (33), and is used to guide the target substrate (9) to be wound from the third winding mechanism (63) through the second substrate channel (32) to the sputtering coating drum (33); The fifth winding mechanism (65) is located in the sputtering chamber (3) and between the sputtering coating drum (33) and the third substrate channel (41), and is used to connect the target substrate (9) wound by the sputtering coating drum (33); The sixth winding mechanism (66) is located in the post-processing chamber (4) and between the third substrate channel (41) and the fourth substrate channel (51), and is used to guide the target substrate (9) to be wound from the fifth winding mechanism (65) through the third substrate channel (41) into the post-processing chamber (4); The seventh winding mechanism (67) is located in the winding chamber (5) and between the fourth substrate channel (51) and the substrate winding device (52), and is used to guide the target substrate (9) after the surface treatment of the reactive gas from the sixth winding mechanism (66) through the fourth substrate channel (51) to the substrate winding device (52).

8. The roll-to-roll coating system as described in claim 6, characterized in that, The sputtering chamber (3) includes: A plurality of sputtering cavities (311) are spaced around the periphery of the sputtering coating drum (33) and are respectively connected to the vacuum valve (8) of the sputtering chamber (3). The sputtering target (341) is installed on the inner side of the vacuum valve (8) facing the sputtering cavity (311).

9. The roll-to-roll coating system as described in claim 6, characterized in that, The evaporation device (24) also includes: A vapor deposition baffle (243) is disposed between the evaporation source (242) and the vapor deposition drum (23) to shield the portion of the target substrate (9) that does not require vapor deposition.

10. The roll-to-roll coating system as described in claim 7, characterized in that, The evaporation device (24) also includes: A first ion source (244) is located in the vapor deposition chamber (2) and between the second winding mechanism (62) and the vapor deposition drum (23) to provide ion energy to perform plasma pretreatment on the target substrate (9).

Images