Low-temperature plasma dielectric barrier discharge reactor device and application thereof to selective oxidation of methane
By using an improved low-temperature plasma dielectric barrier discharge reactor device with a coaxial glass sleeve structure and a circulating water cooling system, the problem of simultaneously achieving high methane conversion rate and oxygen-containing compound selectivity in selective methane oxidation has been solved, thus realizing efficient methane conversion and oxygen-containing compound generation.
CN116726830BActive Publication Date: 2026-05-29SHENYANG NORMAL UNIV
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SHENYANG NORMAL UNIV
- Filing Date
- 2023-06-13
- Publication Date
- 2026-05-29
Smart Images
Figure HDA0004283440870000011
Abstract
The application discloses a low-temperature plasma dielectric barrier discharge reactor device and application of the device in methane selective oxidation reaction. The device comprises a high-voltage electrode, saturated NaCl solution, a discharge glass reaction tube, a glass sleeve, a ground glass tube, a polytetrafluoroethylene sleeve I, a polytetrafluoroethylene sleeve II and an inner glass tube. The high-voltage electrode is composed of the saturated NaCl solution covering the inner glass tube. The device can realize efficient activation and conversion of methane and oxygen at normal temperature and pressure, and significantly improves the yield of oxygen-containing compounds.
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