Cleaning chamber

Abstract

The application discloses a cleaning chamber, which comprises a chamber body, an exhaust box, an adjusting mechanism and a liquid discharge device. The exhaust box is located outside the chamber body and is in communication with the chamber body. The exhaust box is provided with a through hole in communication with an external space. The adjusting mechanism comprises an adjusting plate which is movably arranged in the exhaust box and is used for adjusting the exhaust capacity of the exhaust box. The adjusting plate is arranged between the communication port of the chamber body and the exhaust box and the communication port of the exhaust box and the factory exhaust end. The side of the adjusting plate, which faces the communication port of the chamber body and the exhaust box, is arranged in a downward inclination. The liquid discharge device is in communication with the external space through the through hole. The liquid discharge device is used for collecting the condensed liquid in the exhaust box and discharging the collected liquid to the external space through the through hole. The above scheme can solve the problem of poor cleaning effect of the cleaning chamber.

Description

[0001] This application is a divisional application of the Chinese patent application No. 202111401304.5, filed on November 19, 2021, with the title of "Cleaning chamber". TECHNICAL FIELD

[0002] The present application relates to the technical field of semiconductor cleaning, in particular to a cleaning chamber. BACKGROUND

[0003] When a silicon wafer is subjected to diffusion, oxidation and other processing technologies, a tubular member such as a quartz tube or a quartz boat is often used as a carrier. The tubular member will attach some diffusion particles in the long-term diffusion process, thereby causing the tubular member to be fouled. The diffusion process has very strict requirements for the cleanliness of the tubular member, and other metal impurities or ions are not allowed to exist on the wall of the tubular member. The cleanliness of the tubular member directly affects the yield of the silicon wafer, and therefore, the cleaning of the tubular member is extremely important.

[0004] In the related art, the cleaning chamber includes a chamber body and an exhaust box body. The chamber body and the exhaust box body are in communication, and the exhaust box body is in communication with a plant exhaust gas collection end. The tubular member is cleaned in the chamber body, and acid mist is generated during the cleaning process. The chamber body and the exhaust box body are in communication, so that the chamber body is in a negative pressure state, thereby extracting the acid mist to prevent the acid mist from overflowing from the chamber body.

[0005] However, the acid mist is prone to condensation in the exhaust box body, and the condensed liquid returns to the chamber body, which easily causes secondary pollution of the chamber body, and thus the cleaning effect of the cleaning chamber is poor. SUMMARY

[0006] The present application discloses a cleaning chamber to solve the problem of poor cleaning effect of the cleaning chamber.

[0007] To solve the above problems, the present application adopts the following technical solutions:

[0008] A cleaning chamber comprises:

[0009] a chamber body;

[0010] an exhaust box body, which is located outside the chamber body and in communication with the chamber body, and the exhaust box body is provided with a through hole in communication with an external space;

[0011] The adjusting mechanism comprises an adjusting plate movably located in the exhaust box, and the adjusting plate is used for adjusting the exhaust amount of the exhaust box; wherein the adjusting plate is arranged between the communication port of the chamber body and the exhaust box and the communication port of the exhaust box and the plant exhaust end, and the side of the adjusting plate facing the communication port of the chamber body and the exhaust box is arranged downwardly and obliquely;

[0012] The liquid discharge device is communicated with the external space through the through hole, and is used for collecting the condensed liquid in the exhaust box and discharging the collected liquid to the external space through the through hole.

[0013] The technical scheme adopted by the present application can achieve the following beneficial effects:

[0014] In the cleaning chamber disclosed by the present application, the liquid discharge device is communicated with the external space through the through hole, and is used for collecting the condensed liquid in the exhaust box and discharging the collected liquid to the external space through the through hole. In this scheme, the liquid in the exhaust box is discharged to the external space through the liquid discharge device, instead of being returned to the chamber body, so that the secondary pollution of the chamber body is avoided, and the cleaning effect of the cleaning chamber is improved. BRIEF DESCRIPTION OF DRAWINGS

[0015] The accompanying drawings, which are included to provide a further understanding of the present application and constitute a part of this application, illustrate embodiments of the present application and explain the present application, and do not limit the present application. In the drawings:

[0016] Figure 1 The structure schematic view of the cleaning chamber disclosed by the embodiment of the present application;

[0017] Figure 2 The partial structure schematic view of the cleaning chamber disclosed by the embodiment of the present application;

[0018] Figure 3 The partial sectional view of the cleaning chamber disclosed by the embodiment of the present application;

[0019] Figures 4 to 11 The structure schematic view of the partial component of the cleaning chamber disclosed by the embodiment of the present application;

[0020] Figure 12 The partial structure schematic view of another cleaning chamber disclosed by the embodiment of the present application;

[0021] Figure 13 The schematic view of the adjusting mechanism of another cleaning chamber disclosed by the embodiment of the present application.

[0022] Explanation of reference signs:

[0023] 100 - chamber body, 110 - first opening, 120 - shielding piece,

[0024] 200 - exhaust box, 202 - second opening, 203 - guide groove, 210 - inclined side plate, 220 - top plate, 221 - exhaust port, 230 - bottom plate, 231 - through hole, 240 - liquid collecting plate, 241 - liquid collecting hole, 250 - liquid discharge pipe, 260 - backflow prevention pipe, 261 - straight pipe section, 262 - arc-shaped pipe section,

[0025] 300 - adjusting mechanism, 310 - adjusting plate, 320 - guide rail assembly, 330 - rotating shaft. DETAILED DESCRIPTION

[0026] To make the objectives, technical solutions, and advantages of the present application clearer, the technical solutions of the present application will be described below in conjunction with specific embodiments of the present application and corresponding drawings. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0027] The technical solutions disclosed in the various embodiments of the present application will be described in detail below in conjunction with the drawings.

[0028] As shown in Figures 1 to 13 the embodiments of the present application disclose a cleaning chamber for cleaning a quartz tube, a quartz boat, or the like. The disclosed cleaning chamber includes a chamber body 100, an exhaust box 200, an adjusting mechanism 300, and a liquid discharge device.

[0029] The chamber body 100 provides a cleaning space, and components such as quartz tubes and quartz boats are cleaned in the chamber body 100. The exhaust box 200 is located outside the chamber body 100 and is in communication with the chamber body 100. The exhaust box 200 is provided with a through hole 231 in communication with the outside space. Specifically, the exhaust box 200 is also in communication with a factory exhaust end. The factory exhaust end can provide negative pressure for the chamber body 100 and the exhaust box 200, so that the acid mist in the chamber body 100 can be sucked into the exhaust box 200 and then be drawn to the factory exhaust end for collection and treatment.

[0030] In a specific scheme, the chamber body 100 is provided with a first opening 110. The exhaust box 200 covers the first opening 110, and the exhaust box 200 and part of the outer side wall of the chamber body 100 enclose an inner cavity of the exhaust box 200. The chamber body 100 is in communication with the exhaust box 200 through the first opening 110.

[0031] Alternatively, in another solution, the chamber body 100 and the exhaust box 200 each have an independent inner cavity, the chamber body 100 is provided with an opening, the exhaust box 200 is also provided with an opening, and the opening of the chamber body 100 and the opening of the exhaust box 200 are communicated to make the inner cavities of the chamber body 100 and the exhaust box 200 communicated.

[0032] The adjusting mechanism 300 includes an adjusting plate 310 movably located in the exhaust box 200, and the adjusting plate 310 is used to adjust the exhaust amount of the exhaust box 200. Specifically, the adjusting plate 310 can be arranged between the communication port of the chamber body 100 and the exhaust box 200 and the communication port of the exhaust box 200 and the factory exhaust end, and the cross-sectional area of the exhaust box 200 is covered by adjusting the adjusting plate 310, so as to adjust the exhaust amount of the exhaust box 200. Alternatively, the adjusting plate 310 can also be arranged at the communication port of the chamber body 100 and the exhaust box 200, and the area of the communication port of the chamber body 100 and the exhaust box 200 is covered by adjusting the adjusting plate 310. The communication port of the chamber body 100 and the exhaust box 200 is the first opening 110 mentioned above.

[0033] Alternatively, the adjusting plate 310 can be arranged at the communication port of the exhaust box 200 and the factory exhaust end, and the area of the communication port of the exhaust box 200 and the factory exhaust end is covered by adjusting the adjusting plate 310.

[0034] The liquid discharge device is communicated with the outside space through the through hole 231, and the liquid discharge device is used to collect the condensed liquid in the exhaust box 200, and discharge the collected liquid to the outside space through the through hole 231. The outside space here can be arranged as a waste liquid collection device outside the chamber body 100 and the exhaust box 200.

[0035] In the embodiments disclosed in the present application, the liquid in the exhaust box 200 is discharged through the liquid discharge device, instead of returning to the chamber body 100, so that secondary pollution of the chamber body 100 is not easy to occur, and thus the cleaning effect of the cleaning chamber is improved.

[0036] In addition, by adjusting the position of the adjusting plate 310 in the chamber body 100, the exhaust amount of the exhaust box 200 can be adjusted, and the acid mist discharge rate can be controlled to improve the cleaning efficiency of the cleaning chamber.

[0037] The embodiment of the present application discloses a specific structure of the liquid discharge device, and of course other structures can also be adopted, which is not limited herein. Specifically, the liquid discharge device can include a liquid collecting plate 240 and a liquid discharge pipe 250, both of which can be located in the exhaust box 200. The liquid collecting plate 240 can be used to collect the condensed liquid in the exhaust box 200, and the liquid discharge pipe 250 is connected with the liquid collecting plate 240 and used to discharge the liquid collected by the liquid collecting plate 240 to the outside space through the through hole 231.

[0038] In this scheme, the liquid collecting plate 240 can collect the condensed liquid, thereby reducing the liquid adhered to the inner wall of the exhaust box 200, and further avoiding the condensed liquid from flowing down from the side wall of the exhaust box 200 and entering the chamber body 100 through the communication port between the chamber body 100 and the exhaust box 200, so as to further prevent the secondary pollution of the chamber body 100.

[0039] In addition, the collected condensed liquid is discharged through the liquid discharge pipe 250, and the liquid flows in the liquid discharge pipe 250, so that the splashing of the liquid is not easy to occur, thereby avoiding the splashing of the liquid into the chamber body 100, so as to further prevent the secondary pollution of the chamber body 100 and improve the cleaning effect of the cleaning chamber.

[0040] In the above scheme, the liquid collecting plate 240 can be provided with a liquid collecting hole 241, one end of the liquid discharge pipe 250 can be in communication with the liquid discharge hole, and the other end of the liquid discharge pipe 250 can be in communication with the through hole 231.

[0041] Further, the liquid collecting plate 240 can be located below the adjusting plate 310, at this time, the liquid adhered to the adjusting plate 310 falls onto the liquid collecting plate 240, so as to collect the condensed liquid on the adjusting plate 310. In addition, the liquid collecting plate 240 can be located below the adjusting plate 310, and the liquid collecting plate 240 does not occupy the space above the adjusting plate 310, so as to not easily affect the exhaust volume of the adjusting plate 310 and not easily interfere with the adjusting plate 310.

[0042] Optionally, the liquid collecting plate 240 can be located below the communication port between the chamber body 100 and the exhaust box 200, or at a position flush with the lower side edge of the communication port between the chamber body 100 and the exhaust box 200.

[0043] In the above embodiment, the through hole 231 can be arranged on the side wall of the exhaust box 200, at this time, the through hole 231 is located above the bottom plate 230 of the exhaust box 200, so that the liquid on the bottom plate 230 of the exhaust box 200 is difficult to discharge.

[0044] Based on this, in another alternative embodiment, the liquid discharge pipe 250 can be arranged between the liquid collecting plate 240 and the bottom plate 230 of the exhaust box 200, and the through hole 231 can be arranged on the bottom plate 230. In this scheme, the through hole 231 is arranged on the bottom plate 230, which facilitates the discharge of the liquid on the bottom plate 230, thereby avoiding the accumulation of the liquid and the subsequent backflow of the vaporized liquid into the chamber body 100.

[0045] In the above embodiment, the liquid below the liquid collecting plate 240 is easily vaporized again, thereby flowing back to the upper side of the liquid collecting plate 240 through the liquid discharge pipe 250, so that the acid mist enters the chamber body 100 again, causing secondary pollution of the chamber body 100.

[0046] In another alternative embodiment, the liquid discharge device further comprises an anti-backflow pipe 260, which is in communication with the liquid discharge pipe 250. The anti-backflow pipe 260 can be used to prevent the gas below the liquid collecting plate 240 from flowing back to the upper side of the liquid collecting plate 240 through the liquid discharge pipe 250. In this scheme, the anti-backflow pipe 260 is in communication with the liquid discharge pipe 250, and when the backflowing gas enters the liquid discharge pipe 250, it is divided into two streams, one of which flows along the liquid discharge pipe 250, and the other of which enters the anti-backflow pipe 260 and flows along the anti-backflow pipe 260. The part of the gas flowing along the anti-backflow pipe 260 returns to the liquid discharge pipe 250 from the other end of the anti-backflow pipe 260, and at this time, the two streams of gas meet, and the gas flowing along the anti-backflow pipe 260 hinders the gas flowing along the liquid discharge pipe 250 from continuing to flow upward, thus preventing the backflow of the acid mist and avoiding the acid mist from entering the chamber body 100 again, causing secondary pollution of the chamber body 100.

[0047] In another alternative embodiment, the anti-backflow pipe 260 can include a straight pipe section 261 and an arc-shaped pipe section 262. The straight pipe section 261 can intersect and be in communication with the liquid discharge pipe 250. One end of the arc-shaped pipe section 262 is in communication with the liquid discharge pipe 250, and the other end can be in communication with the straight pipe section 261. The end of the straight pipe section 261 away from the arc-shaped pipe section 262 can be in communication with the through hole 231. In this scheme, the gas in the anti-backflow pipe 260 enters the arc-shaped pipe section 262 and returns to the liquid discharge pipe 250, thereby making the gas flow more smoothly in the arc-shaped pipe section 262, and thus the anti-backflow effect is better.

[0048] Specifically, the first end of the liquid discharge pipe 250 is in communication with the liquid collecting hole 241, and the second end of the liquid discharge pipe 250 is connected to the side wall of the straight pipe section 261 and is in communication with the straight pipe section 261. One end of the straight pipe section 261 is in communication with the through hole 231, and the other end is in communication with one end of the arc-shaped pipe section 262. The other end of the arc-shaped pipe section 262 is connected to the side wall of the liquid discharge pipe 250, and the arc-shaped pipe section 262 is in communication with the liquid discharge pipe 250. At this time, the connection between the arc-shaped pipe section 262 and the liquid discharge pipe 250 is located between the first end and the second end of the liquid discharge pipe 250.

[0049] In another alternative embodiment, the liquid collecting plate 240 can be provided with a plurality of liquid collecting holes 241, the plurality of liquid collecting holes 241 can be arranged at intervals, the number of the liquid discharge pipes 250 and the backflow prevention pipes 260 can be a plurality, the liquid collecting holes 241 and the liquid discharge pipes 250 can be arranged one by one, and the backflow prevention pipes 260 and the liquid discharge pipes 250 can be arranged one by one.

[0050] This scheme can improve the liquid discharge efficiency in the exhaust box 200, and can further avoid the accumulation of liquid in the exhaust box 200.

[0051] In order to improve the liquid collecting effect of the bottom plate 230, in another alternative embodiment, the liquid collecting plate 240 can be an arc-shaped plate, and the arc-shaped plate has a better liquid collecting effect than the flat plate and is more convenient for liquid discharge.

[0052] In another alternative embodiment, the bottom plate 230 can also be an arc-shaped plate, and this scheme can improve the liquid discharge effect of the bottom plate 230.

[0053] In the above embodiment, the adjusting plate 310 can rotate in the exhaust box 200. Specifically, as shown in Figure 12 and Figure 13 , the adjusting mechanism 300 can include a rotating shaft 330, the rotating shaft 330 can be connected with the exhaust box 200 and can rotate relative to the exhaust box 200. One side of the adjusting plate 310 is arranged on the rotating shaft 330, and the rotating shaft 330 rotates to drive the adjusting plate 310 to rotate.

[0054] Alternatively, in another alternative embodiment, the adjusting plate 310 can move relative to the exhaust box 200, and the edge of the adjusting plate 310 can be sealingly connected with the inner side wall of the exhaust box 200.

[0055] Compared with the rotating mode of the adjusting plate 310, in the moving mode of the adjusting plate 310, in order to prevent the adjusting plate 310 from interfering with the side wall of the chamber body 100 or the exhaust box 200 during rotation, a certain assembly gap is reserved between the adjusting plate 310 and the side wall of the chamber body 100 or the exhaust box 200 when the adjusting plate 310 is closed. Therefore, the assembly gap is prone to air leakage when the adjusting plate 310 is closed, and the adjusting plate 310 is difficult to completely cut off the communication between the air exhaust end and the chamber body 100.

[0056] And as Figure 6 , Figure 7In the shown manner of moving the adjusting plate 310, when the adjusting plate 310 is closed, the adjusting plate 310 can be moved to a position where the side wall of the chamber body 100 or the side wall of the exhaust box 200 is in contact, at this time, the adjusting plate 310 is in contact with the chamber body 100, the gap between the adjusting plate 310 and the side wall of the chamber body 100 or the side wall of the exhaust box 200 is small, and it is not easy to leak air, so as to completely cut off the communication between the factory exhaust end and the chamber body 100.

[0057] In addition, the edge of the adjusting plate 310 can be sealingly connected with the inner side wall of the exhaust box 200, and this scheme makes the edge of the adjusting plate 310 and the inner side wall of the exhaust box 200 have better sealing performance, so as not to easily leak air.

[0058] In another optional embodiment, the inner side wall of the exhaust box 200 can be provided with a guide groove 203, and the adjusting plate 310 can be slidingly matched with the guide groove 203. In this scheme, the guide groove 203 can further assist in guiding the adjusting plate 310, thereby improving the moving accuracy of the adjusting plate 310.

[0059] In the above embodiment, the adjusting plate 310 can move in the exhaust box 200, at this time, a larger space needs to be reserved in the exhaust box 200 for the movement of the adjusting plate 310, at this time, the volume of the exhaust box 200 is larger.

[0060] Based on this, in a specific scheme, a second opening 202 can be formed on the exhaust box 200, and at least part of the adjusting plate 310 can extend into or out of the exhaust box 200 along the second opening 202. In a specific operation process, when the adjusting plate 310 extends out of the exhaust box 200, the area of the adjusting plate 310 shielding the exhaust box 200 decreases, thereby increasing the exhaust capacity of the exhaust box 200; when the adjusting plate 310 extends into the exhaust box 200, the area of the adjusting plate 310 shielding the exhaust box 200 increases, thereby reducing the exhaust capacity of the exhaust box 200.

[0061] In this scheme, the adjusting plate 310 can enter and exit the exhaust box 200, so that a larger space does not need to be reserved in the exhaust box 200, and therefore the volume of the exhaust box 200 can be set smaller.

[0062] Further, the second opening 202 can be provided with a sealing member, and the second opening 202 is sealingly connected with the adjusting plate 310 through the sealing member. In this scheme, the sealing member can improve the sealing performance of the second opening 202 and the adjusting plate 310, thereby preventing air leakage between the second opening 202 and the adjusting plate 310. In addition, the sealing member can also scrape off the liquid attached to the adjusting plate 310, thereby preventing the liquid from leaking to the outside of the exhaust box 200.

[0063] In another alternative embodiment, the adjusting plate 310 is inclined downwardly towards the side of the communicating opening of the chamber body 100 and the exhaust box 200. In this scheme, the adjusting plate 310 is inclined downwardly, and in the closed state, the gravity of the adjusting plate 310 causes the adjusting plate 310 to press against the side wall of the chamber body 100 or the side wall of the exhaust box 200, so that the sealing between the chamber body 100 or the exhaust box 200 and the adjusting plate 310 is better, thereby further improving the reliability of the partition between the chamber body 100 and the exhaust end.

[0064] In addition, the inclined downward arrangement of the adjusting plate 310 also facilitates the sliding of the condensed liquid on the adjusting plate 310, so that the condensed liquid is not easily attached to the adjusting plate 310.

[0065] In order to improve the moving accuracy of the adjusting plate 310, in another alternative embodiment, the adjusting mechanism 300 can further include a guide rail assembly 320, which can be arranged on the side wall of the exhaust box 200, and the adjusting plate 310 can be slidingly connected with the guide rail assembly 320. In this scheme, the guide rail assembly 320 can guide the moving direction of the adjusting plate 310, thereby improving the moving accuracy of the adjusting plate 310.

[0066] Optionally, the guide rail assembly 320 can include a first guide rail, a second guide rail, a first sliding block and a second sliding block, and the first guide rail and the second guide rail can be mounted on the outer side wall of the exhaust box. The first guide rail and the second guide rail are slidingly connected with the first sliding block and the second sliding block, respectively, and the two sides of the adjusting plate 310 are fixedly connected with the first sliding block and the second sliding block, respectively, and the first sliding block and the second sliding block drive the adjusting plate 310 to move.

[0067] In another alternative embodiment, the exhaust box 200 can include a connected inclined side plate 210 and a top plate 220, and the top plate 220 can be provided with an exhaust port 221 for exhausting the gas in the exhaust box 200. The exhaust port 221 here is the communicating opening of the exhaust box 200 and the exhaust end mentioned above. The inclined side plate 210 can be arranged opposite to the chamber body 100, and the inclined side plate 210 can be inclined downwardly towards one side of the chamber body 100, so that the condensed liquid can slide off the inclined side plate 210.

[0068] In this scheme, the inclined side plate 210 is inclined towards one side of the chamber body 100, and at this time, the condensed gas in the exhaust box 200 can slide down to the bottom of the exhaust box 100 along the inclined side, so that the condensed liquid in the exhaust box 200 is conveniently discharged.

[0069] Further, the adjusting plate 310 can be in sliding connection with the inclined side plate 210, and the plane where the inclined side plate 210 is located is parallel to the plane where the adjusting plate 310 is located. In this scheme, the plane where the adjusting plate 310 moves is parallel to the plane where the inclined side plate 210 is located, so that the adjusting plate 310 is relatively stacked with the inclined side plate 210 and can slide relative to the inclined side plate 210, so that the structure in the exhaust box 200 is more compact, and the adjusting plate 310 occupies smaller installation space.

[0070] In addition, since the adjusting plate 310 is arranged to be inclined, the gravity of the adjusting plate 310 causes the adjusting plate 310 to press the side wall of the chamber body 100 or the exhaust box 200, thereby further improving the reliability of the partition between the chamber body 100 and the exhaust end.

[0071] In another alternative embodiment, the cleaning chamber disclosed in the present application further comprises a driving member, which can be connected with the adjusting plate 310, and the driving member can drive the adjusting plate 310 to move. In this scheme, the adjusting plate 310 is driven to move by the driving member, so that manual adjustment by the operator is not required, the operation difficulty of the operator is reduced, the moving accuracy of the adjusting plate 310 is improved, and the working pressure difference in the exhaust box 200 is more accurate, and the exhaust performance is better.

[0072] Specific operation process, when the operator checks the pressure difference in the exhaust box 200 through the pressure gauge of the cleaning chamber, when the pressure difference does not meet the working requirement, the operator outputs an instruction to the driving member through the upper computer, and the driving member drives the adjusting plate 310 to move, so as to meet the working pressure difference of the exhaust box 200.

[0073] Optionally, the driving member can be a servo motor, a hydraulic cylinder, a pneumatic cylinder or other power structure, of course, the driving member can also be other power structures, which are not limited herein.

[0074] In another alternative embodiment, the chamber body 100 can be provided with a shielding member 120, which covers the communication port between the chamber body 100 and the exhaust box 200, and the shielding member 120 has an assembly gap with the inner side wall of the chamber body 100, which is used for communication between the chamber body 100 and the communication port. At this time, the shielding member 120 can make it difficult for the gas in the exhaust box 200 to enter the chamber body 100, thereby further improving the cleanliness of the chamber body 100.

[0075] In the above embodiments of the present application, the differences between the various embodiments are mainly described, and the optimization features different between the various embodiments can be combined to form a more optimal embodiment as long as they are not contradictory. Considering the brevity of the writing, it will not be repeated here.

[0076] The above merely illustrates the embodiments of the present application but should not be taken as limitations. Various changes and modifications can be made by those skilled in the art. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application should be included in the scope of claims of the present application.

Claims

1. A cleaning chamber, characterized in that, include: Chamber body(100); An exhaust box (200) is located outside the chamber body (100) and is connected to the chamber body (100). The exhaust box (200) has a through hole (231) that connects to the outside space. An adjustment mechanism (300) includes an adjustment plate (310), which is movably located inside the exhaust box (200). The adjustment plate (310) is used to adjust the exhaust volume of the exhaust box (200). The adjustment plate (310) is disposed between the connection port between the chamber body (100) and the exhaust box (200) and the connection port between the exhaust box (200) and the factory exhaust end. The adjustment plate (310) is inclined downward toward the side of the connection port between the chamber body (100) and the exhaust box (200). A drain device is located inside the exhaust box (200) and below the regulating plate (310). The drain device is connected to the external space through the through hole (231). The drain device is used to collect the condensed liquid inside the exhaust box (200) and drain the collected liquid to the external space through the through hole (231).

2. The cleaning chamber according to claim 1, characterized in that, The draining device includes a liquid collecting plate (240) and a drain pipe (250). Both the liquid collecting plate (240) and the drain pipe (250) are located inside the exhaust box (200). The liquid collecting plate (240) is used to collect the condensed liquid inside the exhaust box (200). The drain pipe (250) is connected to the liquid collecting plate (240) and is used to drain the liquid collected by the liquid collecting plate (240) to the external space through the through hole (231).

3. The cleaning chamber according to claim 2, characterized in that, The drainage device also includes a backflow prevention pipe (260), which is connected to the drainage pipe (250). The backflow prevention pipe (260) is used to prevent gas below the collection plate (240) from flowing back to the top of the collection plate through the drainage pipe (250).

4. The cleaning chamber according to claim 3, characterized in that, The anti-backflow pipe (260) includes a straight pipe section (261) and an arc-shaped pipe section (262). The straight pipe section (261) intersects with and is connected to the drain pipe (250). One end of the arc-shaped pipe section (262) is connected to the drain pipe (250), and the other end is connected to the straight pipe section (261). The end of the straight pipe section (261) facing away from the arc-shaped pipe section (262) is connected to the through hole (231).

5. The cleaning chamber according to claim 3, characterized in that, The liquid collection plate (240) is located below the regulating plate (310); the drain pipe (250) is disposed between the liquid collection plate (240) and the bottom plate (230) of the exhaust box (200), and the through hole (231) is opened on the bottom plate (230).

6. The cleaning chamber according to claim 3, characterized in that, The liquid collection plate (240) has multiple liquid collection holes (241) spaced apart. The number of drain pipes (250) and anti-backflow pipes (260) are both multiple. The liquid collection holes (241) and drain pipes (250) are arranged in a one-to-one correspondence. The anti-backflow pipes (260) and drain pipes (250) are arranged in a one-to-one correspondence.

7. The cleaning chamber according to claim 1, characterized in that, The adjusting plate (310) is movable relative to the exhaust box (200), and the edge of the adjusting plate (310) is sealed to the inner wall of the exhaust box (200).

8. The cleaning chamber according to claim 7, characterized in that, The adjustment mechanism (300) further includes a guide rail assembly (320), which is disposed on the side wall of the exhaust box (200), and the adjustment plate (310) is slidably connected to the guide rail assembly (320).

9. The cleaning chamber according to claim 1, characterized in that, The exhaust box (200) includes a connected inclined side plate (210) and a top plate (220). The top plate (220) has an exhaust port (221) for discharging gas from the exhaust box (200). The inclined side plate (210) is disposed opposite to the chamber body (100). The inclined side plate (210) is inclined downward toward the side of the chamber body (100) so that the condensed liquid can slide off the inclined side plate (210).

10. The cleaning chamber according to claim 9, characterized in that, The adjusting plate (310) is slidably connected to the inclined side plate (210), and the plane of the inclined side plate (210) is parallel to the plane of the adjusting plate (310).

Images