An exhaust gas treatment device for epitaxial equipment

Abstract

The present invention discloses a tail gas treatment device for epitaxial equipment, comprising: an air intake interface, an exhaust pipe, a cooling component, a gas-solid separation component, a purge component, and an exhaust interface, wherein the two ends of the exhaust pipe are respectively sealed to connect the air intake interface and the exhaust interface to realize exhaust gas transportation, the cooling component surrounds the outside of the exhaust pipe and is used to realize exhaust cooling in the exhaust pipe, the gas-solid separation component is nested inside the exhaust pipe, and the gas-solid separation component includes a plurality of thin-walled cylinders nested in sequence, the purge component is sealed through the cooling component and communicates with the vent on the inside of the exhaust pipe, and purge gas is provided by the purge component to realize gas-solid separation of the exhaust flowing through the exhaust pipe. The present invention has the advantages of compact structure, simple operation, significant separation effect, and low cost of use, solves the problems of shortened life of vacuum components and high maintenance cost of exhaust caused by process exhaust, and improves the productivity and operational stability of epitaxial equipment.

Description

Technical Field

[0001] The invention belongs to the technical field of epitaxial equipment, and particularly relates to an exhaust gas treatment device for epitaxial equipment. Background Art

[0002] The exhaust gas from the SiC epitaxial furnace process is hot and contains a large amount of solid by-products, which often contaminate or even damage vacuum components such as dry pumps and butterfly valves in the vacuum system. At the same time, the by-products will deposit on the inner surface of the pipes. Over time, the deposits become thicker and thicker, resulting in a significant maintenance cost. Currently, most SiC epitaxial furnaces increase the frequency of vacuum system maintenance and add filters to prevent damage to vacuum components caused by process exhaust gas and the difficulty of maintenance caused by long-term dust accumulation. However, the following disadvantages still exist:

[0003] 1. The entire vacuum pipeline and vacuum components such as vacuum pumps need to be cleaned frequently, which delays production capacity;

[0004] 2. High-temperature process gas containing by-products can cause serious damage to vacuum components, especially butterfly valve seals and dry pump seals, which require frequent replacement.

[0005] 3. The flow resistance of the filter barrel is too large, which consumes a lot of pumping speed of the process dry pump, requiring a dry pump with a higher pumping speed, increasing equipment costs;

[0006] 4. The filter barrel protects the components of the vacuum system to a certain extent, but due to limited space, the filter barrel is often not directly connected to the reaction chamber, and the inner wall of the vacuum pipe between the filter barrel and the reaction chamber will still be deposited with thick by-products, which also causes maintenance difficulties. In addition, the maintenance of the filter barrel requires the replacement of the filter element, which incurs costs. Summary of the Invention

[0007] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide an exhaust gas treatment device for epitaxial equipment which has a compact structure, simple operation, significant separation effect and low use cost.

[0008] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0009] An exhaust gas treatment device for epitaxial equipment includes: an air inlet interface, an exhaust gas pipeline, a cooling component, a gas-solid separation component, a purge component and an exhaust interface. The two ends of the exhaust gas pipeline are respectively sealed and connected to the air inlet interface and the exhaust interface to realize exhaust gas transportation. The cooling component surrounds the outside of the exhaust gas pipeline and is used to realize exhaust gas cooling in the exhaust gas pipeline. The gas-solid separation component is nested on the inside of the exhaust gas pipeline. The gas-solid separation component includes a plurality of thin-walled cylinders nested in sequence. After the purge component is sealed and passes through the cooling component, it is connected to the air vent on the inside of the exhaust gas pipeline. The purge gas is provided by the purge component to realize gas-solid separation of the exhaust gas flowing through the exhaust gas pipeline.

[0010] As a further improvement of the present invention, the gas-solid separation component includes a first thin-walled cylinder, a second thin-walled cylinder and a third thin-walled cylinder which are nested in sequence, the first thin-walled cylinder is in contact with the inner wall of the exhaust pipe, and the side walls of the first thin-walled cylinder and the second thin-walled cylinder are evenly provided with multiple ventilation holes.

[0011] As a further improvement of the present invention, the vent holes of the first thin-walled cylinder correspond one-to-one with the vent holes of the exhaust pipe; the vent holes of the first thin-walled cylinder and the vent holes of the second thin-walled cylinder are arranged alternately.

[0012] As a further improvement of the present invention, the intervals between the first thin-walled cylinder, the second thin-walled cylinder and the third thin-walled cylinder are 20 mm±2 mm.

[0013] As a further improvement of the present invention, adjacent vent holes on the first thin-walled cylinder and adjacent vent holes on the second thin-walled cylinder are spaced 36°±2° apart in the radial direction and 15mm±2mm apart in the axial direction.

[0014] As a further improvement of the present invention, it also includes a support seat, which is fixed in the exhaust pipe and close to the exhaust interface. The support seat is used to realize the detachable installation of the first thin-walled cylinder, the second thin-walled cylinder and the third thin-walled cylinder in the exhaust pipe.

[0015] As a further improvement of the present invention, the support seat includes a first support ring, a second support ring and a third support ring with increasing radii in sequence, the first support ring is used to install the third thin-walled cylinder, the second support ring is used to install the second thin-walled cylinder, and the third support ring is used to install the first thin-walled cylinder.

[0016] As a further improvement of the present invention, the cooling assembly includes a cooling medium inlet pipe, a cooling medium outlet pipe, a cooling medium flow channel, a separator and a cooling outer tube. The cooling outer tube surrounds the outside of the exhaust gas pipe, and is provided with a cooling medium inlet pipe and a cooling medium outlet pipe. The interior of the cooling outer tube is divided into multiple cooling medium flow channels by a separator; after the purge assembly seal passes through the cooling outer tube and the cooling medium flow channel, it is connected to the vent hole on the inner side of the exhaust gas pipe.

[0017] As a further improvement of the present invention, the purge assembly includes purge ports evenly distributed on the cooling outer cylinder.

[0018] As a further improvement of the present invention, the air inlet interface and the exhaust interface both adopt KF flange interfaces.

[0019] As a further improvement of the present invention, the cooling assembly and the tail gas pipeline, as well as the purge assembly, the cooling assembly and the tail gas pipeline are all fixed by welding.

[0020] Compared with the prior art, the advantages of the present invention are:

[0021] 1. The tail gas treatment device for epitaxial equipment of the present invention realizes the connection of the tail gas pipeline with the reaction chamber and the subsequent tail gas pipeline through the air inlet interface and the exhaust interface. By arranging a cooling component around the outside of the tail gas pipeline and nesting the gas-solid separation component inside the tail gas pipeline, and connecting the gas-solid separation component with the purge component, the process tail gas is cooled double; at the same time, the gas is purged into the gas-solid separation component through the purge component, and the solid by-products in the tail gas adhere to the thin-walled cylindrical wall of the gas-solid separation component, so that the dust content and temperature of the tail gas flowing to the subsequent pipeline are within the acceptable range of the vacuum components. The tail gas treatment device of the present invention reduces the temperature of the process tail gas and, to a certain extent, limits the solid by-products from entering the subsequent vacuum components, thereby increasing the service life of the vacuum components. At the same time, maintenance is simple and fast, and only the thin-walled cylinder needs to be cleaned regularly. The cylinder is reusable and does not generate consumables, further reducing the operating cost of the equipment.

[0022] 2. The exhaust gas treatment device for epitaxial equipment of the present invention forms a gas-solid separation device by sequentially nesting a first thin-walled cylinder, a second thin-walled cylinder and a third thin-walled cylinder, which is easy to assemble and disassemble and has extremely small flow resistance. The side walls of the first thin-walled cylinder and the second thin-walled cylinder are evenly provided with a plurality of air vents, and no air vents are provided on the third thin-walled cylinder. The air vents of the first thin-walled cylinder correspond one-to-one with the air vents of the exhaust gas pipe. The purge gas provided by the purge assembly enters the gas-solid separation device through the exhaust gas pipe, and the separation of dust and gas is achieved with the cooperation of wall purge. The air vents of the first thin-walled cylinder and the air vents of the second thin-walled cylinder are staggered, which increases the contact area between the purge gas and the exhaust gas, thereby improving the cooling effect and purification effect of the exhaust gas. At the same time, the dust accumulates on each layer of thin-walled cylinder. During maintenance, only the thin-walled cylinder needs to be replaced. The operation is simple and the use cost is low. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 This is a schematic diagram of the main structural principle of the tail gas treatment device for epitaxial equipment of the present invention.

[0024] Figure 2 Schematic diagram of the working principle of the gas-solid separation device in the present invention.

[0025] Figure 3 This is a schematic diagram of the explosion structure principle of the tail gas treatment device for epitaxial equipment of the present invention.

[0026] Figure 4 This is a schematic diagram of the structural principle of the tail gas treatment device for epitaxial equipment of the present invention, wherein Figure (a) is a cross-sectional view and Figure (b) is a stereoscopic view.

[0027] Figure 5This is a schematic diagram of the cross-sectional structure principle of the tail gas treatment device for epitaxial equipment of the present invention.

[0028] Figure 6 It is a schematic diagram of the cross-sectional structure principle of the support seat in the present invention.

[0029] Legend: 1. Air inlet interface; 2. Exhaust gas pipe; 201. Fixed block; 3. Cooling assembly; 301. Cooling medium inlet pipe; 302. Cooling medium outlet pipe; 303. Cooling medium flow channel; 304. Separator; 305. Cooling outer cylinder; 4. First thin-walled cylinder; 5. Second thin-walled cylinder; 6. Third thin-walled cylinder; 7. Purge assembly; 701~70n, Purge port; 8. Support seat; 801. First support ring; 802. Second support ring; 803. Third support ring; 9. Exhaust interface. DETAILED DESCRIPTION

[0030] The present invention will be further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the scope of protection of the present invention is not limited thereby.

[0031] Example

[0032] like Figures 1 to 6 As shown, the exhaust gas treatment device for epitaxial equipment of the present invention includes: an air inlet interface 1, an exhaust gas pipeline 2, a cooling component 3, a gas-solid separation component, a purge component 7 and an exhaust interface 9. The input end of the exhaust gas pipeline 2 is sealed and connected to the reaction chamber of the epitaxial equipment through the air inlet interface 1, and the output end of the exhaust gas pipeline 2 is sealed and connected to the exhaust gas pipeline discharged to the outside through the exhaust interface 9 to realize exhaust gas transportation. The cooling component 3 surrounds the outside of the exhaust gas pipeline 2 and is used to realize exhaust gas cooling in the exhaust gas pipeline 2. The gas-solid separation component is nested axially inside the exhaust gas pipeline 2. The gas-solid separation component includes a plurality of thin-walled cylinders nested in sequence. After the purge component 7 passes through the cooling component 3 in a sealed manner, it is connected to the vent on the inside of the exhaust gas pipeline 2. The purge gas is provided by the purge component 7 to realize gas-solid separation of the exhaust gas flowing through the exhaust pipeline 2.

[0033] In this embodiment, the exhaust pipe 2 is connected to the reaction chamber and the subsequent exhaust pipeline through the air inlet interface 1 and the exhaust interface 9. By arranging the cooling component 3 around the outside of the exhaust pipe 2, nesting the gas-solid separation component inside the exhaust pipe, and connecting the gas-solid separation component to the purge component 7, the process exhaust is cooled double. At the same time, the gas is purged into the gas-solid separation component through the purge component 7, and the solid by-products in the exhaust gas adhere to the thin-walled cylindrical wall of the gas-solid separation component, so that the dust content and temperature of the exhaust gas flowing to the subsequent pipeline are within the acceptable range of the vacuum components. The exhaust treatment device of this embodiment reduces the temperature of the process exhaust and, to a certain extent, limits the solid by-products from entering the subsequent vacuum components, thereby increasing the service life of the vacuum components. At the same time, maintenance is simple and fast, and only the thin-walled cylinder needs to be cleaned regularly. The cylinder is reusable and does not generate consumables, further reducing the operating cost of the equipment.

[0034] like Figure 4 and Figure 5 As shown, in this embodiment, the gas-solid separation component includes a first thin-walled cylinder 4, a second thin-walled cylinder 5, and a third thin-walled cylinder 6 that are nested in sequence. The first thin-walled cylinder 4 is in contact with the inner wall of the exhaust pipe 2. The side walls of the first thin-walled cylinder 4 and the second thin-walled cylinder 5 are evenly distributed with multiple vents, while the third thin-walled cylinder 6 is not provided with through holes. The solid impurities are pressed against the outer walls of the first thin-walled cylinder 4, the second thin-walled cylinder 5, and the third thin-walled cylinder 6 by the purge gas. The vents of the first thin-walled cylinder 4 correspond one-to-one with the vents of the exhaust pipe 2, and the vents of the first thin-walled cylinder 4 and the vents of the second thin-walled cylinder 5 are staggered, which increases the contact area between the purge gas and the exhaust gas, and achieves better cooling and separation effects. At the same time, dust accumulates on each layer of thin-walled cylinders. During maintenance, only the thin-walled cylinders need to be replaced, thus realizing the recycling of thin-walled cylinders.

[0035] Furthermore, the spacing between the first thin-walled cylinder 4, the second thin-walled cylinder 5, and the third thin-walled cylinder 6 is 20 mm. Adjacent vent holes on the first thin-walled cylinder 4 and adjacent vent holes on the second thin-walled cylinder 5 are spaced 36° apart in the radial direction and 15 mm apart in the axial direction. A gas flow path with a certain space is formed between adjacent cylinders to ensure smooth flow of exhaust gas. It will be understood that the number of thin-walled cylinders in the exhaust pipe 2 is determined by the inner diameter of the exhaust pipe 2. For example, the number of thin-walled cylinders in an exhaust pipe 2 with an inner diameter of less than 100 mm is less than 4.

[0036] like Figure 5As shown, in this embodiment, the first thin-walled cylinder 4 with the largest inner diameter is fitted with the inner wall surface of the exhaust pipe 2, and the first thin-walled cylinder 4 has the same small hole as the exhaust pipe 2, so that the gas can enter the interior of the exhaust pipe 2 from the hole; the second thin-walled cylinder 5 has an inner diameter smaller than the first thin-walled cylinder 4, and is also provided with a plurality of purge holes, so that the purge gas can pass through and enter the interior of the second thin-walled cylinder 5, and is used to press the dust in the internal process gas onto the wall surface of the innermost third thin-walled cylinder 6, and the third thin-walled cylinder 6 located in the center does not have a purge port.

[0037] In this embodiment, a support seat 8 is also included. The support seat 8 is fixed in the exhaust pipe 2 and is close to the exhaust interface 9. The support seat 8 can be detachably installed on the fixed block 201, and finally the first thin-walled cylinder 4, the second thin-walled cylinder 5 and the third thin-walled cylinder 6 can be detachably installed in the exhaust pipe 2.

[0038] like Figure 6 As shown, in this embodiment, the support base 8 includes a first support ring 801, a second support ring 802, and a third support ring 803, each having a radius increasing in sequence. The first support ring 801 is used to mount the third thin-walled cylinder 6, the second support ring 802 is used to mount the second thin-walled cylinder 5, and the third support ring 803 is used to mount the first thin-walled cylinder 4.

[0039] like Figure 3 and Figure 4 As shown, in this embodiment, the cooling assembly 3 includes a cooling medium inlet pipe 301, a cooling medium outlet pipe 302, a cooling medium flow channel 303, a separator 304, and a cooling outer cylinder 305. The cooling outer cylinder 305 surrounds the outside of the exhaust pipe 2 and is provided with the cooling medium inlet pipe 301 and the cooling medium outlet pipe 302. The interior of the cooling outer cylinder 305 is divided into multiple cooling medium flow channels 303 by separators 304. The purge assembly 7 passes through the cooling outer cylinder 305 and the cooling medium flow channels 303 in a sealed manner and then communicates with the vent hole on the inside of the exhaust pipe 2.

[0040] Specifically, the cooling outer cylinder 305 is welded and wrapped around the outside of the exhaust pipe 2. Its length is shorter than that of the exhaust pipe 2. A plurality of separators 304 are provided inside the cooling outer cylinder 305 to form a cooling medium flow channel 303. There are two cooling medium connection ports on the outside of the cooling outer cylinder 305, which form a circulation loop with the cooling medium flow channel 303. The temperature and type of the cooling medium introduced can be adjusted according to actual needs. In this embodiment, the cooling medium is deionized water at 20°C to 22°C to prevent the process exhaust temperature from being too high and damaging the vacuum components on the subsequent pipelines.

[0041] like Figure 4As shown, in this embodiment, the purge assembly 7 includes purge ports 701-70n evenly distributed throughout the cooling outer cylinder 305. These multiple purge ports, combined with the multi-layer thin-walled cylinder, compact the dust in the process gas against the cylinder wall, preventing solid impurities from depositing on the inner wall of the pipe itself, thereby improving the purity of the gas entering the subsequent exhaust pipeline. One end of the purge port of the purge assembly 7 is connected to the interior of the exhaust pipeline 2, and the other end is connected to the gas source control terminal. The middle portion of the purge port extends through the cooling assembly 3.

[0042] In this embodiment, to avoid excessive occupancy of the cooling medium flow channel 303, the purge port 701 has a 1 / 8-inch air pipe and is welded to the cooling outer cylinder 305 and the exhaust pipe 2. Furthermore, the purge ports are evenly distributed radially and axially along the exhaust pipe 2. After passing through the cooling outer cylinder 305, the purge gas is further cooled and then sprayed into the exhaust pipe 2 through uniformly distributed small holes, pressing dust in the process gas against the walls of the thin-walled cylinders.

[0043] In this embodiment, the air inlet interface 1 and the exhaust interface 9 both adopt KF flange interfaces to achieve a sealed connection between the exhaust pipe 2 and the reaction chamber and the subsequent exhaust pipe.

[0044] During maintenance of the exhaust gas treatment device, the air inlet interface 1 and the exhaust interface 9 are removed, and the first thin-walled cylinder 4, the second thin-walled cylinder 5, the third thin-walled cylinder 6, and the support base 8 are removed from the exhaust port of the exhaust pipe 2 in sequence. The clean first thin-walled cylinder 4, the second thin-walled cylinder 5, and the third thin-walled cylinder 6 are then removed and the support base 8 is placed inside the exhaust pipe 2. The exhaust pipe 2 can then be reinstalled into the vacuum system, restoring the device to its operating state. Afterwards, the replaced first thin-walled cylinder 4, the second thin-walled cylinder 5, the third thin-walled cylinder 6, and the support base 8 are cleaned and prepared for replacement during the next maintenance.

[0045] The exhaust gas treatment device for epitaxial equipment in this embodiment minimizes exhaust gas temperature, preventing subsequent component damage due to high temperatures. Furthermore, by combining wall purge with multi-layer thin-walled cylinders, dust in the exhaust gas accumulates on the surface of the thin-walled cylinders rather than on the inner wall of the pipe. Maintenance only requires replacing the thin-walled cylinders and completing the pipe maintenance. The replaced thin-walled cylinders can be put back into use after cleaning. The gas-solid separation device composed of multi-layer thin-walled cylinders does not increase pipe flow resistance, facilitates maintenance, and significantly improves equipment production capacity.

[0046] Although the present invention is disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can, without departing from the spirit and technical solutions of the present invention, use the methods and technical contents disclosed above to make many possible changes and modifications to the technical solutions of the present invention, or modify them into equivalent embodiments with equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments based on the technical spirit of the present invention without departing from the content of the technical solutions of the present invention, shall still fall within the scope of protection of the technical solutions of the present invention.

Claims

1. An exhaust gas treatment device for epitaxial equipment, characterized in that: include: An air inlet interface (1), an exhaust pipe (2), a cooling component (3), a gas-solid separation component, a purge component (7) and an exhaust interface (9), wherein both ends of the exhaust pipe (2) are sealedly connected to the air inlet interface (1) and the exhaust interface (9) to realize exhaust gas transportation, the cooling component (3) surrounds the outside of the exhaust pipe (2) and is used to realize exhaust gas cooling in the exhaust pipe (2), the gas-solid separation component is nested inside the exhaust pipe (2), and the gas-solid separation component includes a plurality of thin-walled cylinders nested in sequence, the purge component (7) is sealed through the cooling component (3), and is communicated with the vent hole on the inside of the exhaust pipe (2), and the purge gas is provided by the purge component (7) to realize gas-solid separation of the exhaust gas flowing through the exhaust pipe (2); The gas-solid separation component comprises a first thin-walled cylinder (4), a second thin-walled cylinder (5), and a third thin-walled cylinder (6) which are nested in sequence, the first thin-walled cylinder (4) being in contact with the inner wall of the exhaust pipe (2), and a plurality of vent holes being distributed on the side walls of the first thin-walled cylinder (4) and the second thin-walled cylinder (5); The vent holes of the first thin-walled cylinder (4) correspond one-to-one with the vent holes of the exhaust pipe (2); the vent holes of the first thin-walled cylinder (4) and the vent holes of the second thin-walled cylinder (5) are arranged alternately; and the side wall of the third thin-walled cylinder (6) is not provided with vent holes.

2. The tail gas treatment device for epitaxial equipment according to claim 1, characterized in that: The intervals between the first thin-walled cylinder (4), the second thin-walled cylinder (5) and the third thin-walled cylinder (6) are 20 mm ± 2 mm.

3. The tail gas treatment device for epitaxial equipment according to claim 1, characterized in that: Adjacent vent holes on the first thin-walled cylinder (4) and adjacent vent holes on the second thin-walled cylinder (5) are spaced 36°±2° apart in the radial direction and 15mm±2mm apart in the axial direction.

4. The tail gas treatment device for epitaxial equipment according to claim 1, characterized in that: It also includes a support seat (8), which is fixed in the exhaust pipe (2) and close to the exhaust interface (9). The support seat (8) is used to realize the detachable installation of the first thin-walled cylinder (4), the second thin-walled cylinder (5) and the third thin-walled cylinder (6) in the exhaust pipe (2).

5. The tail gas treatment device for epitaxial equipment according to claim 4, characterized in that: The support seat (8) comprises a first support ring (801), a second support ring (802), and a third support ring (803) with successively increasing radii, wherein the first support ring (801) is used to mount the third thin-walled cylinder (6), the second support ring (802) is used to mount the second thin-walled cylinder (5), and the third support ring (803) is used to mount the first thin-walled cylinder (4).

6. The tail gas treatment device for epitaxial equipment according to any one of claims 1 to 5, characterized in that: The cooling assembly (3) comprises a cooling medium inlet pipe (301), a cooling medium outlet pipe (302), a cooling medium flow channel (303), a separator (304) and a cooling outer cylinder (305); the cooling outer cylinder (305) surrounds the outside of the exhaust pipe (2); the cooling medium inlet pipe (301) and the cooling medium outlet pipe (302) are provided on the cooling outer cylinder (305); the interior of the cooling outer cylinder (305) is divided into a plurality of cooling medium flow channels (303) by the separator (304); the purge assembly (7) is sealed and passes through the cooling outer cylinder (305) and the cooling medium flow channel (303), and is communicated with the vent hole on the inner side of the exhaust pipe (2).

7. The tail gas treatment device for epitaxial equipment according to claim 6, characterized in that: The purge assembly (7) comprises purge ports (701) evenly distributed on the cooling outer cylinder (305).

8. The tail gas treatment device for epitaxial equipment according to any one of claims 1 to 5, characterized in that: The air inlet interface (1) and the exhaust interface (9) both adopt KF flange interfaces; the cooling component (3) and the tail gas pipeline (2), as well as the purge component (7), the cooling component (3) and the tail gas pipeline (2) are all fixed by welding.

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