Reversible magnetron sputtering coater

Abstract

The application relates to the technical field of magnetron sputtering equipment, in particular to a reversible magnetron sputtering film coating machine, which comprises a base, a vacuum cavity arranged in the middle of the base, an ear seat arranged on the top of the base, the ear seats being arranged on the two sides of the vacuum cavity, a rotating shaft arranged in the ear seat, the vacuum cavity being rotatable relative to the base in a vertical plane through the rotating shaft, connecting ports arranged at the two ends of the vacuum cavity, sealing plates for plugging the connecting ports being rotatably connected to the connecting ports, a vacuum pump device arranged at one end of the vacuum cavity, the vacuum pump device being communicated with the connecting ports through a customized flange, and a sputtering target gun arranged at the bottom of the vacuum cavity. Compared with the conventional technology, the technical scheme realizes multi-direction sputtering, saves manpower and material resources, and improves the workpiece film coating efficiency.

Description

Technical Field

[0001] The present invention relates to the technical field of magnetron sputtering equipment, and in particular to a reversible magnetron sputtering coating machine. Background Art

[0002] Magnetron sputtering is a type of physical vapor deposition (PVD). Conventional sputtering methods can be used to prepare a variety of materials, including metals, semiconductors, and insulators, and have advantages such as simple equipment, easy control, large coating area, and strong adhesion. The magnetron sputtering method, developed in the 1970s, has achieved high speed, low temperature, and low damage. Because high-speed sputtering is performed under low pressure, the ionization rate of the gas must be effectively increased. Magnetron sputtering introduces a magnetic field on the target cathode surface, using the magnetic field to confine charged particles to increase the plasma density and thus the sputtering rate.

[0003] Most of the magnetron sputtering coating machines currently on the market can only meet the requirements of coating workpieces in a single direction, upward, downward or sideways coating. Coating in different directions requires adjusting the position of the magnetron sputtering coating machine, so different mounting methods are required to fix the magnetron sputtering coating machine. Among them, downward sputtering is suitable for more sample shapes, but the sample smoothness is poor; upward sputtering has excellent smoothness. When the workpiece needs to be multi-square coated, this single sputtering direction magnetron sputtering coating machine cannot meet the multi-directional coating requirements. It is necessary to configure multiple magnetron coating machines with different sputtering directions to meet the production needs of the workpiece. The disassembly and installation of the workpiece on different magnetron coating machines not only consumes manpower and material resources, but also reduces the coating efficiency.

[0004] Therefore, it is necessary to propose a reversible magnetron sputtering coating machine to save manpower and material resources and improve coating efficiency. Summary of the Invention

[0005] The purpose of the present invention is to solve the problem that the existing magnetron sputtering coating machine can only sputter in a single direction, resulting in the installation of the workpiece consuming manpower and material resources and reducing the workpiece coating efficiency. A reversible magnetron sputtering coating machine is now provided.

[0006] The technical solution of the present invention is:

[0007] A reversible magnetron sputtering coating machine includes a base, a vacuum chamber is provided in the middle of the base, and ears are provided on the top of the base. The ears are located on both sides of the vacuum chamber, and a rotating shaft is provided in the ear seat. The vacuum chamber can rotate in a vertical plane relative to the base through the rotating shaft. Connecting ports are provided at both ends of the vacuum chamber, and a sealing plate for sealing the connecting port is rotatably connected to the connecting port. A vacuum pump device is provided at one end of the vacuum chamber, and the vacuum pump device is connected to the connecting port through a customized flange. A sputtering target gun is installed at the bottom of the vacuum chamber.

[0008] Furthermore, the vacuum pump device includes a vacuum pump body and a vacuum pump valve, one end of the vacuum pump valve is connected to the customized flange, and the other end is connected to the vacuum pump body.

[0009] Furthermore, one end of the base is rotatably connected to a support frame, and the top of the support frame is fixedly connected to the vacuum pump body.

[0010] Furthermore, a workpiece disk is installed on the top of the vacuum chamber, and a rotating shaft is rotatably connected to the middle of the workpiece disk.

[0011] Furthermore, the customized flange and the connection port are connected in an easily detachable manner.

[0012] Furthermore, the sealing plate is rotatably connected to the vacuum cavity by a hinge, and the hinge connects the top of the sealing plate to the top of the vacuum cavity. The sealing plate can be turned over relative to the connection port in a vertical plane.

[0013] Furthermore, the vacuum pump valve is fixedly connected to the customized flange by screws.

[0014] Furthermore, the support frame is rotatably connected to the end of the base via a hinge, and the support frame can be flipped in the horizontal direction relative to the base, thereby driving the customized flange to move closer to or away from the connection port.

[0015] The present invention provides a reversible magnetron sputtering coating machine, in which a vacuum chamber that can rotate in the vertical direction is installed on the base. People can change the direction of the sputtering target gun at the bottom of the vacuum chamber according to the needs of the workpiece to be processed. When the workpiece is suitable for the sputtering target gun to sputter downward, the vacuum chamber is rotated so that the sputtering target gun is facing downward. When the workpiece is suitable for the sputtering target gun to sputter upward, the vacuum chamber is rotated so that the sputtering target gun is facing upward. Since connection ports connected to customized flanges are provided at both ends of the vacuum chamber, no matter whether the sputtering target gun of the vacuum chamber is rotated to face upward or downward, the customized flange can be connected to one of the connection ports, and the other connection port is vacuum-sealed by a sealing plate to ensure the overall operation of the equipment. Compared with traditional technologies, the present technical solution realizes multi-directional sputtering, saves manpower and material resources, and improves the workpiece coating efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is a structural diagram of the present invention.

[0017] Figure numerals: 1. base; 2. vacuum chamber; 3. ear seat; 4. rotating shaft; 5. connecting port; 6. sealing plate; 7. vacuum pump body; 8. customized flange; 9. sputtering target gun; 10. vacuum pump valve; 11. support frame; 12. workpiece disk; 13. rotating shaft. DETAILED DESCRIPTION

[0018] In order to make the technical means, technical features, invention objectives and technical effects achieved by the present invention easier to understand, the present invention is further described below with reference to specific illustrations.

[0019] Example 1:

[0020] like Figure 1 As shown, this embodiment provides a reversible magnetron sputtering coating machine, including a base 1, a vacuum chamber 2 is provided in the middle of the base 1, and ears 3 are provided on the top of the base 1. The ears 3 are located on both sides of the vacuum chamber 2. A rotating shaft 4 is provided in the ears 3. The vacuum chamber 2 can rotate relative to the base 1 in a vertical plane through the rotating shaft 4. Connecting ports 5 are provided at both ends of the vacuum chamber 2. A sealing plate 6 for sealing the connecting port 5 is rotatably connected to the connecting port 5. A vacuum pump device is provided at one end of the vacuum chamber 2. The vacuum pump device is connected to the connecting port 5 through a customized flange 8. A sputtering target gun 9 is installed at the bottom of the vacuum chamber 2.

[0021] Preferably, the vacuum pump device includes a vacuum pump body 7 and a vacuum pump valve 10 , one end of the vacuum pump valve 10 is connected to the customized flange 8 , and the other end is connected to the vacuum pump body 7 .

[0022] Preferably, one end of the base 1 is rotatably connected to a support frame 11 , and the top of the support frame 11 is screwed to the vacuum pump body 7 .

[0023] Preferably, a workpiece disk 12 is installed on the top of the vacuum chamber 2, and a rotating shaft 13 is rotatably connected to the middle of the workpiece disk 12 through a bearing.

[0024] Preferably, the customized flange 8 and the connecting port 5 are connected in an easily detachable manner, specifically by a snap-on connection or a screw connection.

[0025] Preferably, the sealing plate 6 is rotatably connected to the vacuum chamber 2 by a hinge, and the hinge connects the top of the sealing plate 6 to the top of the vacuum chamber 2. The sealing plate 6 can be flipped relative to the connecting port 5 in a vertical plane.

[0026] Preferably, the vacuum pump valve 10 is fixedly connected to the customized flange 8 by screws.

[0027] Preferably, the support frame 11 is rotatably connected to the end of the base 1 via a hinge, and the support frame 11 can be flipped in the horizontal direction relative to the base 1, thereby driving the customized flange 8 to move closer to or away from the connecting port 5.

[0028] When in use, a vacuum chamber 2 that can rotate in the vertical direction is installed on the base 1. People can change the direction of the sputtering target gun 9 at the bottom of the vacuum chamber 2 according to the needs of the workpiece to be processed. When the workpiece is suitable for the sputtering target gun 9 to sputter downward, the vacuum chamber 2 is rotated to make the sputtering target gun 9 face downward. When the workpiece is suitable for the sputtering target gun 9 to sputter upward, the vacuum chamber 2 is rotated to make the sputtering target gun 9 face upward. Since both ends of the vacuum chamber 2 are provided with connection ports 5 connected to the customized flange 8, no matter whether the sputtering target gun 9 of the vacuum chamber 2 is rotated to face upward or downward, the customized flange 8 can be connected to one of the connection ports 5, and the other Each connection port 5 is vacuum-sealed by a sealing plate 6 to ensure the overall operation of the device. When rotating the vacuum chamber 2, the customized flange 8 should first be disconnected from the connection port 5, the screws used for connection should be removed, and then the support frame 11 should be turned outward in the horizontal direction. Because when the customized flange 8 is connected to the connection port 5, the support frame 11 is flush with the side of the base 1 and perpendicular to the end of the base 1. Therefore, when flipping, the hinge connection is equivalent to the rotation center. The support frame 11 drives the customized flange 8 to flip outward, which can make the customized flange 8 away from the vacuum chamber 2, facilitating the vertical rotation of the vacuum chamber 2. Compared with traditional technologies, this technical solution realizes multi-directional sputtering, saves manpower and material resources, and improves the workpiece coating efficiency.

[0029] The above description is only a preferred embodiment of the present invention and is not intended to limit the scope of the present invention. That is, any equivalent changes and modifications made according to the content of the patent application of the present invention should fall within the technical scope of the present invention.

Claims

1. A reversible magnetron sputtering coating machine, characterized by: The invention comprises a base (1), wherein a vacuum cavity (2) is provided in the middle of the base (1), and an ear seat (3) is provided on the top of the base (1), wherein the ear seat (3) is located on both sides of the vacuum cavity (2), and a rotating shaft (4) is provided in the ear seat (3), wherein the vacuum cavity (2) can rotate relative to the base (1) in a vertical plane via the rotating shaft (4), and a connecting port (5) is provided at both ends of the vacuum cavity (2), and a sealing plate (6) for sealing the connecting port (5) is rotatably connected to the connecting port (5), and a vacuum pump device is provided at one end of the vacuum cavity (2), and the vacuum pump device is connected to the connecting port (5) via a customized flange (8), and a sputtering target gun (9) is installed at the bottom of the vacuum cavity (2); The vacuum pump device comprises a vacuum pump body (7) and a vacuum pump valve (10), wherein one end of the vacuum pump valve (10) is connected to the customized flange (8), and the other end is connected to the vacuum pump body (7); One end of the base (1) is rotatably connected to a support frame (11), and the top of the support frame (11) is fixedly connected to the vacuum pump body (7).

2. The reversible magnetron sputtering coating machine according to claim 1, characterized in that: A workpiece disk (12) is installed on the top of the vacuum chamber (2), and a rotating shaft (13) is rotatably connected to the middle of the workpiece disk (12).

3. The reversible magnetron sputtering coating machine according to claim 1, characterized in that: The customized flange (8) and the connecting port (5) are connected in an easily detachable manner.

4. The reversible magnetron sputtering coating machine according to claim 1, characterized in that: The sealing plate (6) is rotatably connected to the vacuum cavity (2) by a hinge, and the hinge connects the top of the sealing plate (6) to the top of the vacuum cavity (2). The sealing plate (6) can be turned over relative to the connection port (5) in a vertical plane.

5. The reversible magnetron sputtering coating machine according to claim 1, characterized in that: The vacuum pump valve (10) is fixedly connected to the customized flange (8) by screws.

6. The reversible magnetron sputtering coating machine according to claim 1, characterized in that: The support frame (11) is rotatably connected to the end of the base (1) via a hinge, and the support frame (11) can be flipped in the horizontal direction relative to the base (1), thereby driving the customized flange (8) to move closer to or away from the connection port (5).

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