Chemical vapor deposition equipment for improving electrochemical performance of negative electrode material

Abstract

The application relates to the technical field of vapor deposition equipment, in particular to chemical vapor deposition equipment for improving the electrochemical performance of negative electrode materials, which comprises a reaction box, the top end of the reaction box is provided with a cover plate, the upper side of the cover plate is provided with a storage box, the bottom end of the storage box is fixedly installed with a communicating pipe, the communicating pipe penetrates through the cover plate and communicates with the reaction box, one side of the reaction box is provided with a gas mixer, the output end of the gas mixer is fixedly installed with an air inlet pipe, the air inlet pipe communicates with the gas mixer, the side end of the air inlet pipe is fixedly installed with a control valve, one side of the reaction box is fixedly installed with a heater, and the reaction box is fixedly installed above the heater with a temperature controller. The chemical vapor deposition equipment for improving the electrochemical performance of negative electrode materials is high in connectivity, convenient to utilize the discharged hot air, resource-saving, and capable of improving the electrochemical performance of negative electrode materials.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of vapor deposition equipment, in particular to a chemical vapor deposition equipment for improving the electrochemical performance of negative electrode materials. BACKGROUND

[0002] The chemical vapor deposition method is one of the main methods for preparing carbon-coated composite materials. It is by passing hydrocarbon and other carbon source gases into a deposition furnace, and at high temperature, the carbon source gas pyrolyzes to produce pyrolytic carbon on the surface of the material to be coated, and finally a coating layer is formed on the surface of the material to be coated, thereby obtaining a carbon-coated composite material. It has the characteristics of simple process, suitable for large-scale production, etc.

[0003] The current chemical vapor deposition furnace and chemical vapor deposition equipment, such as the patent with the announcement number CN209522919U, includes a furnace body, a feeding port, a discharging port, a gas inlet, a gas outlet, and a stirring structure arranged inside the furnace body. The connecting pipeline between the raw material bin and the furnace body is provided with a conveying device and a driving device arranged outside the connecting pipeline for driving the conveying device to operate. The connecting pipeline is provided with a control valve for controlling the communication between the connecting pipeline and the raw material bin and the communication between the connecting pipeline and the furnace body.

[0004] For the above-mentioned related technology, the inventors believe that the existing chemical vapor deposition equipment exhausts tail gas containing a large amount of hot gas, which causes resource waste if directly discharged. Therefore, we propose a chemical vapor deposition equipment for improving the electrochemical performance of negative electrode materials. SUMMARY

[0005] The purpose of the present application is to solve or at least alleviate the problem that the tail gas discharged by the existing chemical vapor deposition equipment contains a large amount of hot gas, which causes resource waste if directly discharged.

[0006] To achieve the above-mentioned purpose, the present application provides the following technical solutions:

[0007] The utility model provides a chemical vapor deposition equipment of improving electrochemical performance of negative material, including reaction box, the top of reaction box is provided with cover plate, the top of cover plate is provided with storage box, the bottom of storage box is fixedly installed with the communicating pipe, the communicating pipe passes through cover plate and communicates with reaction box, one side of reaction box is provided with gas mixer, the output of gas mixer is fixedly installed with gas inlet pipe, gas inlet pipe communicates with gas mixer, the side end of gas inlet pipe is fixedly installed with control valve, one side of reaction box is fixedly installed with heater, temperature controller is fixedly installed above heater of reaction box, the bottom of storage box is fixedly installed with support block, one side of reaction box is fixedly installed with first exhaust pipe, one side of first exhaust pipe is fixedly installed with filter box, one side of filter box is fixedly installed with connecting pipe, the top of filter box is fixedly installed with suction pump, the input of suction pump is fixedly connected with connecting pipe, the output of suction pump is fixedly installed with gas guide pipe, the inner wall of storage box is provided with cavity, one side of storage box is fixedly installed with second exhaust pipe, gas guide pipe and second exhaust pipe all communicate with cavity.

[0008] Optionally, the locking structure is arranged between the cover plate and the reaction box.

[0009] Optionally, the locking structure comprises a mounting block, a mounting groove, a containing groove, an extension rod, a limiting block, a limiting groove, a placing groove, a second spring, a movable block, a plug rod and a first spring, the mounting block is fixedly installed at the bottom end of the cover plate, the mounting groove is formed at the top end of the reaction box, the mounting block is movably inserted into the mounting groove, the containing groove is formed at one side of the mounting block, the extension rod is fixedly installed in the containing groove, the limiting block is fixedly connected with the extension rod, the first spring is sleeved outside the extension rod, the first spring is fixedly connected with the limiting block, the limiting groove is formed at both sides of the reaction box, the limiting block is movably inserted into the limiting groove, the placing groove is formed at one side of the limiting groove, the second spring is fixedly installed in the placing groove, the movable block is fixedly connected with the second spring, the plug rod is fixedly connected with the movable block, and the plug rod is located in the limiting groove.

[0010] Optionally, a filter cloth is fixedly installed inside the filter box near the connecting pipe, and a collection box is slidably installed at the bottom end of the inside of the filter box.

[0011] Optionally, an opening is formed at one side of the filter box, and a movable plate is arranged at the opening of the filter box, and the movable plate and the filter box are fixedly connected through bolts.

[0012] Optionally, eyelets are fixedly installed at both sides of the top end of the cover plate.

[0013] Optionally, the bottom end of the cover plate is fixedly provided with a sealing ring, the top end of the reaction box is provided with a sealing groove, and the sealing ring is matched with the sealing groove.

[0014] Optionally, both sides of the reaction box are fixedly provided with bellows, the movable block is located in the bellows, and one side of the bellows is fixedly provided with a sealing ring.

[0015] Optionally, the bottom end of the reaction box is fixedly provided with support legs at four corners, the bottom end of the support leg is fixedly provided with a rubber block, and the bottom end of the reaction box is fixedly provided with a discharge pipe.

[0016] Compared with the prior art, the present application has the following advantages:

[0017] 1. By setting the heater and temperature controller and the control valve at the air inlet pipe, the gas flow and deposition temperature can be controlled, the increase of the gas flow is beneficial to the deposition of carbon on the fiber surface, when the deposition temperature is accurately controlled, the molecular thermal motion increases to control the carbon deposition amount on the fiber surface, thereby improving the electrochemical performance of the negative electrode material, the tail gas in the reaction box is discharged through the first exhaust pipe, the tail gas is sucked into the inner wall of the storage tank through the air pump, the negative electrode material in the storage tank is preheated, and the gas deposition efficiency is improved.

[0018] 2. By setting the locking structure, the locking structure comprises a mounting block, a mounting groove, a containing groove, an extension rod, a limiting block, a limiting groove, a placing groove, a second spring, a movable block, a plug rod and a first spring, the cover plate is installed through the insertion of the mounting block and the mounting groove, the limiting block is inserted into the limiting groove through the cooperation of the first spring and the extension rod, and the mounting block is locked, when disassembling, the second spring is contracted by pressing the movable block, the limiting block is extruded out of the limiting groove by the plug rod, the cover plate is opened, the inside of the reaction box is cleaned, and the practicality is enhanced.

[0019] 3. By setting the filter box, the impurities contained in the tail gas are filtered through the filter cloth in the filter box, and the filtered impurities fall into the collection box, the collection box is taken out through the opening of the movable plate, the cover plate is transported through the setting of the lifting ring, the placing groove is protected through the setting of the bellows, and the connection sealing property is enhanced through the setting of the sealing ring. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 It is a whole structure schematic view of the present application;

[0021] Figure 2 It is an inside structure schematic view of the reaction box of the present application;

[0022] Figure 3 It is an inside structure schematic view of the filter box of the present application;

[0023] Figure 4 For the application of Figure 1 The enlarged structural schematic view of A area in the application;

[0024] Figure 5 For the application of Figure 2 The enlarged structural schematic view of B area in the application;

[0025] Figure 6 For the application of Figure 2 The enlarged structural schematic view of C area in the application.

[0026] In the figure: 1, reaction box; 2, cover plate; 3, storage box; 4, communication pipe; 5, gas mixer; 6, gas inlet pipe; 7, control valve; 8, heater; 9, temperature controller; 10, support block; 11, first exhaust pipe; 12, filter box; 1201, filter cloth; 1202, collection box; 13, connecting pipe; 14, air pump; 15, air guide pipe; 16, cavity; 17, second exhaust pipe; 18, locking structure; 1801, mounting block; 1802, mounting groove; 1803, containing groove; 1804, telescopic rod; 1805, limiting block; 1806, limiting groove; 1807, placing groove; 1808, second spring; 1809, movable block; 1810, plug rod; 1811, first spring; 19, movable plate; 20, bolt; 21, lifting ring; 22, corrugated pipe; 23, sealing ring; 24, support leg; 25, discharge pipe. DETAILED DESCRIPTION

[0027] The technical solutions in the embodiments of the present application will be described clearly and completely below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0028] Please refer to Figures 1-6The utility model provides a chemical vapor deposition equipment of improving electrochemical performance of negative material, including reaction box 1, the top of reaction box 1 is provided with cover plate 2, the top of cover plate 2 is provided with storage box 3, the bottom of storage box 3 is fixedly installed with the communicating pipe 4, the communicating pipe 4 passes through cover plate 2, and is communicated with reaction box 1, and the lock structure 18 is arranged between cover plate 2 and reaction box 1, the lock structure 18 includes mounting block 1801, installation groove 1802, containing groove 1803, telescopic rod 1804, limiting block 1805, limiting slot 1806, placing groove 1807, second spring 1808, movable block 1809, plug rod 1810 and first spring 1811, mounting block 1801 is fixedly installed on the bottom of cover plate 2, installation groove 1802 is opened in the top of reaction box 1, mounting block 1801 is movably inserted with installation groove 1802, containing groove 1803 is opened in one side of mounting block 1801, telescopic rod 1804 is fixedly installed in containing groove 1803, limiting block 1805 is fixedly connected with telescopic rod 1804, first spring 1811 is sleeved on the outside of telescopic rod 1804, first spring 1811 is fixedly connected with limiting block 1805, limiting slot 1806 is opened in both sides of reaction box 1, limiting block 1805 is movably inserted with limiting slot 1806, cover plate 2 is installed by the insertion of mounting block 1801 and installation groove 1802, and then the cooperation of first spring 1811 and telescopic rod 1804 makes limiting block 1805 extend into limiting slot 1806, and limiting block 1801 is locked.

[0029] Please refer to Figures 1-6 Placing groove 1807 is opened in one side of limiting slot 1806, second spring 1808 is fixedly installed in placing groove 1807, movable block 1809 is fixedly connected with second spring 1808, plug rod 1810 is fixedly connected with movable block 1809, and plug rod 1810 is located in limiting slot 1806, when disassembling, second spring 1808 is shrunk by pressing movable block 1809, plug rod 1810 extrudes limiting block 1805 from limiting slot 1806, cover plate 2 is opened, the inside of reaction box 1 is cleaned conveniently, and practicality is enhanced.

[0030] Please refer to Figures 1-6The side of the reaction box 1 is provided with a gas mixer 5, the output end of the gas mixer 5 is fixedly installed with an air inlet pipe 6, the air inlet pipe 6 communicates with the gas mixer 5, the side end of the air inlet pipe 6 is fixedly installed with a control valve 7, the reaction box 1 is fixedly installed with a heater 8 on one side, the temperature controller 9 is fixedly installed above the heater 8, the support block 10 is fixedly installed at the bottom end of the storage tank 3, the first exhaust pipe 11 is fixedly installed on one side of the reaction box 1, the filter box 12 is fixedly installed on one side of the first exhaust pipe 11, the connecting pipe 13 is fixedly installed on one side of the filter box 12, the air suction pump 14 is fixedly installed at the top end of the filter box 12, the input end of the air suction pump 14 is fixedly connected with the connecting pipe 13, the air suction pump 14 is fixedly installed with the air guide pipe 15, the cavity 16 is formed in the inner wall of the storage tank 3, the second exhaust pipe 17 is fixedly installed on one side of the storage tank 3, the air guide pipe 15 and the second exhaust pipe 17 both communicate with the cavity 16, the heater 8 and the temperature controller 9 are arranged, and the control valve 7 is arranged at the air inlet pipe 6, so that the gas flow and the deposition temperature can be controlled, the increase of the gas flow is beneficial to the deposition of carbon on the surface of the fiber; when the deposition temperature is accurately controlled, the molecular thermal motion is increased, so that the carbon deposition amount on the surface of the fiber is controlled, so that the electrochemical performance of the negative electrode material can be improved, the tail gas in the reaction box 1 is discharged through the first exhaust pipe 11, the tail gas is sucked into the inner wall of the storage tank 3 through the air suction pump 14, the negative electrode material in the storage tank 3 is preheated, and the gas deposition efficiency is improved.

[0031] Please refer to Figures 1-6 The filter cloth 1201 is fixedly installed in the inner part of the filter box 12 close to the connecting pipe 13, the collecting box 1202 is slidingly installed at the bottom end of the inner part of the filter box 12, the opening is formed in one side of the filter box 12, the movable plate 19 is arranged at the opening of the filter box 12, the movable plate 19 and the filter box 12 are fixed through the bolts 20, the filter cloth 1201 in the filter box 12 filters the impurities contained in the tail gas, and the filtered impurities fall into the collecting box 1202, and the staff can conveniently take out the collecting box 1202 by opening the movable plate 19.

[0032] Please refer to Figures 1-6The outer side of the first exhaust pipe 11 and the second exhaust pipe 17 is fixedly provided with a valve, the top of the cover plate 2 is fixedly provided with a lifting ring 21 on both sides, the bottom of the cover plate 2 is fixedly provided with a sealing ring 23, the top of the reaction box 1 is provided with a sealing groove, and the sealing ring 23 is matched with the sealing groove. The two sides of the reaction box 1 are fixedly provided with corrugated pipes 22, the movable block 1809 is located in the corrugated pipe 22, and one side of the corrugated pipe 22 is fixedly provided with a sealing ring. The lifting ring 21 is convenient for the transportation of the cover plate 2, the corrugated pipe 22 protects the placing groove 1807, and the sealing ring 23 enhances the sealing property. The bottom of the reaction box 1 is fixedly provided with supporting legs 24 at four corners, the bottom of the supporting leg 24 is fixedly provided with a rubber block, and the bottom of the reaction box 1 is fixedly provided with a discharge pipe 25.

[0033] Working principle: the heater 8 and the temperature controller 9 are arranged, the control valve 7 is arranged at the air inlet pipe 6, the gas flow and the deposition temperature can be controlled, the increase of the gas flow is beneficial to the deposition of the carbon on the fiber surface; when the deposition temperature is accurately controlled, the molecular thermal motion is increased, thereby the carbon deposition amount on the fiber surface is controlled, thereby the electrochemical performance of the negative electrode material is improved, the exhaust gas in the reaction box 1 is discharged through the first exhaust pipe 11, the exhaust gas is sucked into the inner wall of the storage box 3 through the air suction pump 14, the negative electrode material in the storage box 3 is preheated, and the gas deposition efficiency is improved; the cover plate 2 is installed through the insertion of the mounting block 1801 and the mounting groove 1802, the limiting block 1805 is inserted into the limiting groove 1806 through the cooperation of the first spring 1811 and the telescopic rod 1804, and the mounting block 1801 is locked; when disassembled, the second spring 1808 is retracted by pressing the movable block 1809, the limiting block 1805 is extruded out of the limiting groove 1806 through the insertion rod 1810, the cover plate 2 is opened, the inside of the reaction box 1 is cleaned, and the practicability is improved; the filter box 12 is arranged, the impurities contained in the exhaust gas are filtered through the filter cloth 1201 in the filter box 12, and the filtered impurities fall into the collection box 1202; the collection box 1202 is taken out through the opening of the movable plate 19, the cover plate 2 is transported through the lifting ring 21, the placing groove 1807 is protected through the corrugated pipe 22, and the sealing property is enhanced through the sealing ring 23.

[0034] The above only describes the preferred embodiments of the present application and is not used to limit the present application. Although the present application is described in detail with reference to the foregoing embodiments, those skilled in the art can modify the technical solutions recorded in the foregoing embodiments or replace some technical features equivalently. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A chemical vapor deposition device for improving electrochemical performance of negative electrode material, comprising a reaction box (1), characterized in that: The top of the reaction box (1) is provided with a cover plate (2), the upper side of the cover plate (2) is provided with a storage box (3), the bottom of the storage box (3) is fixedly installed with a communication pipe (4), the communication pipe (4) passes through the cover plate (2) and communicates with the reaction box (1), one side of the reaction box (1) is provided with a gas mixer (5), the output end of the gas mixer (5) is fixedly installed with an air inlet pipe (6), the air inlet pipe (6) communicates with the gas mixer (5), the side end of the air inlet pipe (6) is fixedly installed with a control valve (7), one side of the reaction box (1) is fixedly installed with a heater (8), the reaction box (1) is located above the heater (8) and is fixedly installed with a temperature controller (9), the bottom of the storage box (3) is fixedly installed with a supporting block (10), one side of the reaction box (1) is fixedly installed with a first exhaust pipe (11), one side of the first exhaust pipe (11) is fixedly installed with a filter box (12), one side of the filter box (12) is fixedly installed with a connecting pipe (13), the top of the filter box (12) is fixedly installed with a suction pump (14), the input end of the suction pump (14) is fixedly connected with the connecting pipe (13), the output end of the suction pump (14) is fixedly installed with a gas guide pipe (15), the inner wall of the storage box (3) is provided with a cavity (16), one side of the storage box (3) is fixedly installed with a second exhaust pipe (17), the gas guide pipe (15) and the second exhaust pipe (17) both communicate with the cavity (16). 2.The chemical vapor deposition device for improving electrochemical performance of a negative electrode material according to claim 1, characterized in that: The cover plate (2) and the reaction box (1) are provided with a locking structure (18). 3.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 2, characterized in that: The locking structure (18) comprises a mounting block (1801), a mounting groove (1802), a containing groove (1803), a telescopic rod (1804), a limiting block (1805), a limiting groove (1806), a placing groove (1807), a second spring (1808), a movable block (1809), a plug rod (1810) and a first spring (1811), the mounting block (1801) is fixedly installed at the bottom end of the cover plate (2), the mounting groove (1802) is formed in the top end of the reaction box (1), the mounting block (1801) is movably inserted into the mounting groove (1802), the containing groove (1803) is formed in one side of the mounting block (1801), the telescopic rod (1804) is fixedly installed in the containing groove (1803), the limiting block (1805) is fixedly connected with the telescopic rod (1804), the first spring (1811) is sleeved outside the telescopic rod (1804), the first spring (1811) is fixedly connected with the limiting block (1805), the limiting groove (1806) is formed in the two sides of the reaction box (1), the limiting block (1805) is movably inserted into the limiting groove (1806), the placing groove (1807) is formed in one side of the limiting groove (1806), the second spring (1808) is fixedly installed in the placing groove (1807), the movable block (1809) is fixedly connected with the second spring (1808), the plug rod (1810) is fixedly connected with the movable block (1809), and the plug rod (1810) is located in the limiting groove (1806). 4.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 3, characterized in that: The inside of the filter box (12) is fixedly installed with filter cloth (1201) near the connecting pipe (13), and the inside bottom end of the filter box (12) is slidably installed with a collection box (1202). 5.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 1, characterized in that: An opening is formed in one side of the filter box (12), and the filter box (12) is provided with a movable plate (19) at the opening, and the movable plate (19) and the filter box (12) are fixed by bolts (20). 6.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 1, characterized in that: The top end of the cover plate (2) is fixedly installed with lifting rings (21) on both sides. 7.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 1, wherein: The bottom end of the cover plate (2) is fixedly installed with a sealing ring (23), and the top end of the reaction box (1) is provided with a sealing groove, and the sealing ring (23) is matched with the sealing groove. 8.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 3, characterized in that: The two sides of the reaction box (1) are fixedly installed with corrugated pipes (22), the movable block (1809) is located in the corrugated pipe (22), and the corrugated pipe (22) is fixedly installed with a sealing ring on one side. 9.The chemical vapor deposition device for improving electrochemical performance of negative electrode material according to claim 1, characterized in that: The bottom end of the reaction box (1) is fixedly installed with supporting legs (24) at four corners, the bottom end of the supporting leg (24) is fixedly installed with a rubber block, and the bottom end of the reaction box (1) is fixedly installed with a discharge pipe (25).

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