Crucible, evaporation source, evaporation method, vacuum processing apparatus, and method of manufacturing device

Abstract

A crucible for evaporating material is described. The crucible comprises a first material compartment configured to contain material to be evaporated, a first heater to heat the first material compartment, a second material compartment configured to contain material to be evaporated, and a second heater to heat the second material compartment. A vapor guiding compartment is provided. The vapor guiding compartment has a first opening providing a first fluid communication path between the first material compartment and the vapor guiding compartment, and a second opening providing a second fluid communication path between the second material compartment and the vapor guiding compartment. Furthermore, the vapor guiding compartment has a third opening connectable to a vapor distributor. The crucible further comprises a third heater for heating the vapor guiding compartment.

Description

Technical Field

[0001] This disclosure relates to apparatus, sources, and methods for evaporating materials (e.g., evaporating organic materials). Embodiments of this disclosure particularly relate to methods, sources, and apparatus for evaporating materials (especially organic materials used to generate organic light-emitting diodes (OLEDs) in vacuum deposition systems). Specifically, embodiments of this disclosure relate to methods for crucibles, evaporation sources, evaporation methods, vacuum processing systems, and manufacturing apparatus. Background Technology

[0002] Techniques for depositing layers on a substrate include evaporating materials in an evaporation source. For example, an evaporation source is a tool used to produce organic light-emitting diodes (OLEDs) and other electronic or optical devices that involve stacks of deposited materials. OLEDs are a special type of light-emitting diode in which the emitting layer contains a thin film of certain organic compounds. Organic light-emitting diodes (OLEDs) are used to manufacture television screens, computer monitors, mobile phones, and other handheld devices for displaying information. OLEDs can also be used for general spatial lighting. OLED displays have a wider range of possible colors, brightness, and viewing angles than conventional LCD displays because OLED pixels emit light directly without backlighting. Therefore, OLED displays consume significantly less energy than conventional LCD displays. Furthermore, the fact that OLEDs can be fabricated on flexible substrates creates further applications. Evaporation sources can also be used to deposit other material layers (e.g., metal layers) on substrates such as glass substrates or semiconductor wafers.

[0003] An evaporation source typically includes an evaporation device configured to evaporate source material by heating it to a temperature at or above its evaporation temperature. The evaporated source material can be propagated into a vapor distribution pipe configured to guide the evaporated source material onto a substrate.

[0004] During processing, a substrate may be supported on a carrier configured to hold the substrate. For example, the substrate may be held aligned with a mask. Vapor from an evaporation source (e.g., through a mask) is directed toward the substrate to create a film, such as a patterned film, on the substrate. One or more materials may be deposited onto the substrate to create small pixels, which can be individually addressed to create functional devices such as full-color displays.

[0005] The internal volume of an evaporation apparatus can be heated to evaporate the source material. The source material can be arranged in solid form inside the evaporation apparatus, such as as powder or granules. However, ensuring a predetermined evaporation rate for the source material over an extended period is challenging. Furthermore, the source material may be temperature-sensitive, posing a risk of chemical reactions associated with the source material if it is exposed to the high temperatures inside the evaporation apparatus, particularly over extended periods. If any impurities resulting from any chemical reaction (e.g., decomposed OLED material) reach the substrate, it could lead to a reduction in the luminous efficiency and lifetime of the OLED device. In the event of any chemical reaction that produces impurities with vapor pressures lower than that of the original material (e.g., polymerization and oxidation), at least a portion of the impurities remain in the crucible and can cover the surface area of ​​the original material. This results in higher temperatures required to maintain the predetermined evaporation rate, potentially increasing the risk of performance degradation in the OLED device.

[0006] In view of the above, it would be beneficial to provide an improved evaporation method and improved evaporation equipment, which ensures high-quality deposition of evaporation materials, particularly for the manufacture of OLED devices. Specifically, the risk of impurities in the substrate should be reduced while ensuring a predetermined evaporation rate over an extended period. Summary of the Invention

[0007] In view of the foregoing, crucibles, evaporation methods, evaporation equipment, evaporation systems, and evaporation sources have been provided. Further advantages, features, aspects, and details will become clear from the description and accompanying drawings.

[0008] According to one embodiment, a crucible for evaporating material is provided. The crucible includes a first material compartment configured to contain the material to be evaporated, a first heater for heating the first material compartment, a second material compartment configured to contain the material to be evaporated, and a second heater for heating the second material compartment. A vapor guiding compartment is also provided. The vapor guiding compartment has a first opening providing a first fluid communication path between the first material compartment and the vapor guiding compartment, and a second opening providing a second fluid communication path between the second material compartment and the vapor guiding compartment. Furthermore, the vapor guiding compartment has a third opening connectable to a vapor distributor. The crucible further includes a third heater for heating the vapor guiding compartment.

[0009] According to one embodiment, an evaporation source is provided. The evaporation source includes a crucible according to any embodiment described herein and a vapor distributor in fluid communication with a third opening.

[0010] According to one embodiment, an evaporation method is provided. The method includes providing a source material to be evaporated in a first material compartment of a crucible; heating the first material compartment to evaporate the source material, thereby producing evaporated source material, while a second material compartment of the crucible is idle; guiding the evaporated source material from the first material compartment to a vapor distributor; heating the second material compartment to evaporate condensed source material in the second material compartment, thereby producing evaporated source material; guiding the evaporated source material from the second material compartment to the vapor distributor; and switching the first material compartment to an idle state.

[0011] According to one embodiment, an evaporation source is provided. The evaporation source includes a crucible and a controller, the controller having a processor and a memory storing instructions, which, when executed by the processor, cause the evaporation source to perform an evaporation method according to an embodiment of this disclosure.

[0012] According to one embodiment, a method for manufacturing an apparatus having an organic material layer is provided. The method includes operating a crucible using an evaporation method according to any embodiment of this disclosure and depositing an organic material layer on a substrate. Attached Figure Description

[0013] To gain a more detailed understanding of the features described above, a more specific description of the present disclosure, which has been briefly summarized above, can be obtained by referring to embodiments. The accompanying drawings illustrate embodiments of the present disclosure and are described below:

[0014] Figures 1A to 1C A schematic cross-sectional view of a crucible having a first material compartment and a second material compartment (particularly a second material compartment separate from the first material compartment) according to the embodiments described herein is shown, and three subsequent control phases are shown according to the evaporation apparatus of the embodiments described herein for illustrating the evaporation method.

[0015] Figure 2 A schematic diagram of an evaporation source according to the embodiments described herein is shown.

[0016] Figure 3A and Figure 3B A schematic cross-sectional view of a crucible according to an embodiment described herein illustrates the conduction adjustment of the condensing material in the material compartment;

[0017] Figure 4 A schematic diagram of an evaporation source according to the embodiments described herein is shown.

[0018] Figure 5 A graph illustrating an evaporation method with two material compartments and a crucible is shown.

[0019] Figure 6A flowchart of an evaporation method according to an embodiment described herein is shown; and

[0020] Figure 7 A schematic diagram of a vacuum processing system according to an embodiment of the present disclosure is shown. Detailed Implementation

[0021] Various embodiments of this disclosure will now be described in detail, with one or more examples of these embodiments illustrated in the accompanying drawings. In the following description of the drawings, the same reference numerals refer to the same parts. Differences with respect to individual embodiments are described only. Each example is provided by way of interpretation of this disclosure and is not intended to be a limitation thereof. Furthermore, features illustrated or described as part of one embodiment may be used in or in combination with other embodiments to produce further embodiments. The description is intended to include such modifications and variations.

[0022] Many source materials, particularly organic ones and other material components, are temperature-sensitive, meaning that prolonged exposure to elevated temperatures can lead to chemical reactions related to the source materials. Especially for organic materials, the temperature at which any chemical reaction occurs may be close to the material's evaporation temperature, significantly increasing the risk of organic impurities forming within the crucible. For example, the risk of impurity formation can increase significantly when the temperature within the crucible rises by several degrees, particularly when the source material is exposed to the elevated temperature for an extended period. Accordingly, it would be beneficial to provide evaporation equipment and methods that reduce the risk of impurities in the substrate and improve the quality of the deposited material.

[0023] Embodiments of this disclosure provide an improved crucible, evaporation source, and evaporation method, particularly for increased system uptime of 100 hours or longer, or even 200 hours or longer. For a predetermined evaporation rate, increases in crucible temperature and / or material temperature become increasingly unacceptable over time. System uptime may be limited because the material's temperature limits or thermal exposure limits may be reached—that is, temperatures that could increase in the range that could lead to an increase in any impurities in the substrate (e.g., decomposed OLED material). It has been found that one or more of the following may occur: polymerization of organic materials, oxidation of organic materials, or degradation of organic materials through thermal exposure. This can produce impurities with vapor pressures lower than those of the original OLED material, creating a so-called "skin," which reduces the contribution of the material surface area to evaporation. Internal conductance at the material surface can be reduced, for example, close to total source conductance, where the material will need to be heated to higher temperatures to maintain the vapor pressure (or predetermined evaporation rate), resulting in even more unacceptable temperature rises.

[0024] For example, a 10°C increase in temperature may roughly double the evaporation rate. However, near the onset of decomposition, the decomposition rate may roughly quadruple. Furthermore, doubling the exposure time near the onset of decomposition can roughly triple the decomposition rate.

[0025] The embodiments described herein particularly relate to crucibles and evaporation sources, evaporation source materials for evaporation, and evaporation apparatus for guiding the evaporated source materials toward a substrate to deposit the evaporated source materials onto the substrate. According to one embodiment, a crucible for evaporating materials is provided. The crucible includes a first material compartment configured to receive the material to be evaporated and a first heater for heating the first material compartment. The crucible further includes a second material compartment configured to receive the material to be evaporated and a second heater for heating the second material compartment. A vapor guiding compartment is provided. The vapor guiding compartment has a first opening providing a first fluid communication path between the first material compartment and the second vapor guiding compartment; and has a second opening providing a second fluid communication path between the second material compartment and the vapor guiding compartment, the vapor guiding compartment further having a third opening connectable to a vapor distributor. Furthermore, the crucible includes a third heater for heating the vapor guiding compartment.

[0026] As used herein, "evaporation source" or "crucible" can be understood as an apparatus configured to evaporate source material by heating it to a temperature at or above the evaporation temperature of the source material. "Evaporation temperature" can be understood as the temperature at which the source material vaporizes, i.e., the temperature at which it transforms into the gas phase. In some embodiments, the evaporation temperature is a temperature in the range between 200°C and 400°C, particularly between 250°C and 350°C.

[0027] The source material can be provided in solid form in the crucible of the evaporation apparatus, such as as powder or granules. The source material can be organic material, particularly organic materials used in the manufacture of OLED devices. The typical evaporation temperature for organic materials is between 200°C and 400°C. In other words, under vacuum conditions, typical organic materials evaporate at evaporation temperatures between 200°C and 400°C.

[0028] According to the embodiments described herein, material evaporated from the first material compartment can be condensed in the second material compartment, where a purification process occurs. Accordingly, the so-called "skin" effect can be reduced by condensation. Evaporation from the first and second material compartments can be repeatedly switched. Accordingly, after purification has occurred during condensation in the second material compartment, the second material compartment can be used for evaporation, and condensation occurs in the first material compartment.

[0029] Figures 1A to 1CThe crucible 100 is shown during different operating scenarios. Figure 1A A first material compartment 102 is shown. The first material compartment 102 is heated by a first heater 112. A second material compartment 104 is also provided. The second material compartment can be heated by a second heater 114. A steam guiding compartment 106 is provided. The steam guiding compartment 106 is heated by a third heater 116. The heaters according to the embodiments described herein may surround the respective compartments and / or may be provided on the outer side of the walls of the respective compartments.

[0030] Figure 1A The source material to be evaporated in the first material compartment 102 is shown. Figure 1A In this configuration, the first heater 112 is turned on, the second heater 114 is turned off, and the third heater 116 is turned on. The second material compartment 104 is in an idle state. The steam guiding compartment 106 has a first opening 122 or channel, thereby providing a first fluid communication path between the first material compartment 102 and the steam guiding compartment 106. Steam generated during the operation of the active first heater 112 is guided into the steam guiding compartment 106 through the first opening, such as... Figure 1A As shown in the image.

[0031] A portion of the vapor generated by heating the first material compartment 102 with the first heater 112 is directed to the third opening 126. The third opening 126 can be connected to a vapor distributor to guide the evaporated material to the substrate to be processed. A portion of the evaporated source material (e.g., through the second opening 124 of the vapor guiding compartment) enters the second material compartment 104. The second opening 124 provides a passage for a second fluid communication path between the second material compartment and the vapor guiding compartment. The evaporated source material condenses in the second material compartment 104. Condensation provides a purification process. Condensation in the vapor guiding compartment can be avoided by activating the third heater 116.

[0032] Figure 1B The diagram shows the first material compartment having been heated, i.e., operated for a period of time. Due to evaporation, the amount of source material in the first material compartment 102 has decreased. The amount of source material in the second material compartment 104 has increased due to condensation. During the time when material decomposition may occur through heating the first material compartment 102 and / or evaporation from the first material compartment 102, the second heater 114 is activated, and the material accumulated in the second material compartment 104 is evaporated to operate the crucible 100 for substrate processing. Figure 1B This shows the state where both the first heater 112 and the second heater 114 are operating.

[0033] like Figure 1C As shown, the transfer of evaporation in the crucible has already occurred from the evaporation in the first material compartment 102 (see...). Figure 1A After switching to evaporation in the second material compartment 104, the first heater 112 can be disconnected. Figure 1C The state shown causes the source material to evaporate in the second material compartment 104, with a portion of the evaporated material being guided toward the vapor distributor through the third opening 126 of the crucible 100. The first heater 112 is inactive, allowing the material evaporated from the second material compartment to condense in the first material compartment. The purification process occurs in the first material compartment, i.e., the process can be improved by adding a condenser to the first material compartment to condense the source material. Figure 1A The poor operating conditions that may occur after the operation shown are based on the skin effect.

[0034] Embodiments of this disclosure provide an evaporation source and method for organic materials with a purification process, wherein processes such as polymerization, oxidation, or degradation of organic materials that can lead to a so-called "skin" effect can be at least partially recovered. The operating time of the crucible and the corresponding source can be increased.

[0035] According to some embodiments that can be combined with other embodiments described herein, the organic material can be separately filled into individual material compartments (e.g., a first material compartment 102 and a second material compartment 104). Each material compartment has a dedicated heating element or heater. While one material compartment is used to vaporize the material, another material compartment can collect a portion or a small portion of the vapor. The collected vapor is condensed back into the solid or liquid phase, while the remaining vapor can be directed to the substrate region. The function of the material compartments can be repeatedly switched. For example, in... Figure 1C Following the operations shown, once the material has been collected in the first material compartment 102, it can provide, as Figure 1B The intermediate operating conditions shown are used to move to, for example, Figure 1A The initial operating conditions are shown in the diagram. The process can then be started from scratch as described above.

[0036] The common concept of mitigating organic material degradation by minimizing thermal exposure through different temperature zones or temperature gradients within a crucible can reduce thermal exposure. However, the purification according to embodiments of this disclosure is not provided by such a temperature gradient concept. The crucible, evaporation source, and / or evaporation material method according to embodiments described herein can purify a portion of the material while depositing vapor on a substrate. At least a portion of the thermal exposure history can be reset by the purified material, particularly by continuously resetting it through the action of switching compartments. Evaporation area reduced due to reactions such as polymerization or oxidation caused by thermal exposure can be reset, i.e., the evaporation area can be increased again due to purification. According to examples of organic materials used for green dopants, the run time can be increased by approximately four times.

[0037] According to embodiments of this disclosure, evaporation from the crucible can be provided by switching between heating a first material compartment and heating a second material compartment, and vice versa. According to some embodiments that can be combined with other embodiments described herein, intermediate operating conditions can be provided, such as… Figure 1B As shown, the first heater of the first material compartment and the second heater of the second material compartment are switched on. Alternatively, switching can be performed without intermediate operating conditions. Intermediate operating conditions can advantageously provide a better current effect on the evaporation rate of the crucible used for substrate processing.

[0038] According to some embodiments that can be combined with other embodiments described herein, the switching can be triggered by at least one of the material properties of the evaporating material, the temperature of the active material compartment, and the fill level of the active material compartment. For example, a switching from one material compartment to another can occur if the active characteristic temperature is close to the temperature limit and / or the active material compartment is close to the empty fill level. As another example that can be used additionally or alternatively, the switching can be initiated at the evaporation source (e.g., see...). Figure 2 The ratio of the evaporation rate measured at point ) to the temperature of the active material compartment.

[0039] Multiple heaters, such as those related to Figures 1A to 1C The first heater, second heater, and third heater may each include several heating elements or heaters. For example... Figure 1A As exemplarily illustrated, a controller 150 connected to a first heater 112 via a first wire 132 is configured to control the first heater. The controller 150 may further be connected to a second heater 114 via a second wire 134 and may be configured to control the second heater. The controller 150 may further be connected to a third heater 116 via a third wire 136 and may be configured to control the third heater.

[0040] In some implementations, the controller can switch from operating the first heater to operating the second heater, and vice versa, with an optional intermediate operating condition in which both heaters are operated.

[0041] As used herein, "heater" can refer to one or more heating elements arranged next to a specific compartment of the crucible, which can be controlled by a controller to achieve a predetermined temperature in the specific compartment. "Heater" can also refer to multiple heating elements configured to function as a heater for a sub-volume of the crucible.

[0042] Figure 2A schematic cross-sectional view of an evaporation source 200 according to an embodiment described herein is shown. The evaporation source 200 includes a crucible 100 according to any embodiment described herein, and a vapor distributor 210, for example, in fluid communication with the crucible 100 via a third opening 126. Arrow 20 indicates... Figures 1A to 1C The orientation of the view on the crucible 100 shown. The vapor distributor 210 includes a plurality of vapor nozzles (nozzle openings 212) for guiding the evaporated source material toward the substrate 10.

[0043] The vapor distributor 210 can be connected to the vapor release port of the crucible, i.e., the third opening 126, so that the source material of the evaporation from each material compartment of the crucible can be propagated into the vapor distributor 210.

[0044] A “vapor distributor” or “vapor distribution assembly” can be understood as an assembly configured to direct evaporated material (particularly a plume of one or more evaporated materials) toward substrate 10. For example, a vapor distributor or vapor distribution assembly may include a distribution tube, which may be an elongated tube. For example, the distribution tube may provide a line source having a plurality of vapor nozzles arranged in at least one line along the length of the tube.

[0045] In some embodiments, the vapor distributor may be a linear distribution nozzle. The linear distribution nozzle may extend in a substantially vertical direction, allowing a substantially vertically oriented substrate to be coated with an evaporation source. The linear distribution nozzle may have a hollow space or tube in which the evaporating material may be guided, for example, from an evaporation apparatus to multiple vapor nozzles. Heating elements may be provided to heat the internal volume of the vapor distribution assembly to a temperature above the evaporation temperature to prevent the evaporating source material from condensing within the vapor distribution assembly.

[0046] As used herein, the term "substrate" can specifically cover generally non-flexible substrates, such as wafers, transparent crystal sheets (such as sapphire or the like), or glass plates. In some embodiments, the substrate may be a semiconductor wafer. However, this disclosure is not limited thereto, and the term "substrate" may also cover flexible substrates, such as rolls or foils.

[0047] As used herein, the term "substrate" encompasses large-area substrates. For example, a "large-area substrate" can have an area of ​​0.5m². 2 Or larger, especially 1m 2 Or a larger main surface area. In some embodiments, a large-area substrate may correspond to approximately 0.67m². 2 The substrate (0.73m x 0.92m) has a GEN 4.5 rating, corresponding to approximately 1.4m. 2 The substrate (1.1m x 1.3m) has a GEN 5 core, corresponding to approximately 4.29m.2 The substrate (1.95m x 2.2m) has a GEN7.5 rating, corresponding to approximately 5.7m. 2 The substrate (2.2m x 2.5m) is GEN8.5, or even corresponds to approximately 8.7m. 2 The substrate (2.85m x 3.05m) is GEN10. Similarly, even larger generations such as GEN11 and GEN 12 and corresponding substrate areas can be implemented.

[0048] like Figure 2 As shown, an additional opening 214 may be provided in the vapor distributor 210. This additional opening may direct a portion of the vapor to the deposition rate monitor 224. For example, the deposition rate monitor may include an oscillating quartz microbalance (QCM) and / or an optical inspection device that measures the amount of vapor material using a light source and a photodetector.

[0049] According to one embodiment, an evaporation source is provided. The evaporation source includes a crucible according to any embodiment described herein. The evaporation source further includes a vapor distributor in fluid communication with a third opening of the crucible (particularly a third opening of a vapor guiding compartment of the crucible). For example, the vapor distributor may have an inlet port connected to the third opening, the inlet port being provided between a first end and a second end of the vapor distributor. Figure 2 In this steam distributor, there is an upper end (i.e., a first end) of a pipe or conduit and a lower end (i.e., a second end) of a pipe or conduit. The inlet port of the steam distributor can be provided between the first and second ends, for example, adjacent to or at the center of the steam distributor. Particularly for long line sources, if the crucible is connected between the first and second ends, for example, at approximately the center of the steam distributor, a more uniform steam pressure can be provided in the steam distributor. As described above, according to some embodiments that can be combined with other embodiments described herein, the steam distributor may include multiple outlet nozzles to guide material vapor to the substrate.

[0050] According to some embodiments that can be combined with other embodiments described herein, the ratio between the deposition rate and purification rate on the substrate can be adjusted by the crucible design. Figure 3A and Figure 3B Two implementations are shown for adjusting the ratio between deposition rate and purification rate, which can be used alone or in combination with each other. Figure 3A and Figure 3B A first material compartment 102 with a first heater 112, a second material compartment 104 with a second heater 114, and a steam guiding compartment 106 with a third heater 116 are shown. Figure 3AIn this embodiment, a partition wall 326 is provided in the vapor-guiding compartment. The partition wall 326 can limit the amount of material collected in one material compartment while the source material evaporates from another material compartment. According to some embodiments that can be combined with other embodiments described herein, the partition wall can be provided to define fluid conductance between the first and second material compartments. According to alternative embodiments, the partition wall may include one or more openings (e.g., slit openings) to further define fluid conductance between the material compartments.

[0051] Figure 3B This includes, for example, a first orifice 322 at a first opening 122. Furthermore, the crucible 100 may include, for example, a second orifice 324 at a second opening 124, said opening being... Figures 1A to 1C The following is an illustrative reference. According to some embodiments that may be combined with other embodiments described herein, at least one of a first orifice in a first fluid communication path and a second orifice in a second fluid communication path is provided.

[0052] According to some embodiments, the partition walls as described herein and / or the orifices as described herein can be used to control and / or adjust the ratio between the deposition rate and the purification rate. For example, the ratio can be adjusted based on a predetermined run time for one cycle and can be limited by or adjusted based on the material properties of the crucible and the total run time requirements.

[0053] Figure 4 Another embodiment of the evaporation source 200 is shown. Figure 4 The evaporation source 200 shown includes a vapor distributor 210 with multiple nozzle openings 212 for guiding vapor from the source material to the substrate 10. (Regarding...) Figure 2 In contrast to the described embodiment, crucible 100 may be provided at one end of steam distributor 210. For example, crucible 100 may be provided at the lower end of steam distributor 210. A third opening of the steam guiding compartment of crucible 100 may be provided at the upper end of crucible 100 to be in fluid communication with the lower end of steam distributor 210.

[0054] Figure 5 and Figure 6 The diagram illustrates an evaporation method. Figure 5The graphs show the evaporation temperatures in the first and second compartments as a function of crucible operating time. Line 501 shows the temperature limit of the organic material to be evaporated. Line 502 shows the temperature increase, particularly for a predetermined evaporation rate in a standard crucible. Line 504 shows the evaporation temperature in the first material compartment. Line 506, with a shaded area, shows the evaporation temperature in the second material compartment. As the simulation of the evaporation temperatures shows, for the predetermined evaporation rate, the temperature of the material being evaporated in each material compartment is below the temperature limit indicated by line 501. Furthermore, given that the total amount of material in the crucible decreases after several hours of crucible operation, the switching frequency for switching between the first and second material compartments (and vice versa) increases. Due to the purification process, the evaporation temperature of the crucible can be maintained below the critical temperature for evaporation to avoid or reduce the decomposition of the source material to be evaporated.

[0055] Figure 6 An evaporation method is illustrated. According to operation 610, a source material to be evaporated is provided in a first material compartment of the crucible. Subsequently, as shown in block 620, the first material compartment is heated to evaporate the source material, producing evaporated source material, while the second material compartment of the crucible remains idle. For example, this corresponds to... Figure 5 The first portion of line 504. Evaporated source material is guided from the first material compartment to a vapor distributor (see operation 630). A portion of the evaporated source material guided to the vapor distributor is used for substrate processing and can be guided onto the substrate via the vapor distributor. According to operation 640, the second material compartment is heated to evaporate the condensed source material in the second material compartment, thereby producing evaporated source material. For example, this corresponds to... Figure 5 The first portion of line 506 shows the evaporation temperature of the second material compartment. The evaporating source material is guided from the second material compartment to the vapor distributor (see operation 650). According to operation 660, the first material compartment is switched to an idle state. According to some embodiments that can be combined with other embodiments described herein, at least one material compartment is heated to generate evaporating source material for substrate processing. During a first time period, the first material compartment is heated and the second material compartment is idle. During a second time period, the second material compartment is heated and the first material compartment is idle.

[0056] According to some embodiments that can be combined with other embodiments described herein, an idle material compartment refers to a material compartment provided with a temperature that allows the source material to condense within the material compartment. For example, disconnecting the heater corresponding to the material compartment and / or adjusting the temperature of the material compartment to a sufficiently low temperature to allow compensation in the respective material compartment.

[0057] According to some embodiments that can be combined with other embodiments described herein, the evaporation method further includes heating a vapor guiding compartment that is in fluid communication with a first material compartment and a second material compartment. Heating the vapor guiding compartment prevents condensation of the source material within the vapor guiding compartment and allows fluid communication between the vapor guiding compartment and the first material compartment, between the vapor guiding compartment and the second material compartment, and between the vapor guiding compartment and a vapor distributor.

[0058] As previously mentioned Figures 1A to 1C The process involves switching the first material compartment to an idle state, then (re)heating the first material compartment to evaporate the condensed source material within it, thereby generating evaporated source material. For example, this corresponds to... Figure 5 The second part of line 504 shown. The source material for evaporation is guided from the first material compartment to the vapor distributor, and the second material compartment is (again) switched to an idle state.

[0059] According to some embodiments that can be combined with other embodiments described herein, the crucible, evaporation source, or vacuum processing system may further include, as described herein. Figure 1A The controller 150 is illustrated in the example. Controller 150 can be connected to the heater. Controller 150 includes a central processing unit (CPU), memory, and, for example, support circuitry. For ease of evaporation control, the CPU can be one of any type of general-purpose computer processor that can be used in an industrial setup to control various chambers and subprocessors. Memory is coupled to the CPU. The memory or computer-readable medium can be one or more readily available memory devices, such as random access memory, read-only memory, hard disk, or any other form of local or remote digital storage. Support circuitry can be coupled to the CPU to support the processor in a conventional manner. This circuitry includes caches, power supplies, clock circuitry, input / output circuitry, and related subsystems and the like. Evaporation process instructions are typically stored in memory as software routines, typically referred to as recipes. The software routines can also be stored and / or executed by a second CPU (not shown), located remotely from the hardware controlled by the CPU. When executed by the CPU, the software routines transform the general-purpose computer into a dedicated computer (controller) controlling the evaporation (e.g., the heater of the crucible). Although the methods and / or processes of this disclosure are discussed as being implemented as software routines, some of the method operations disclosed herein can be performed in hardware as well as by a software controller. Accordingly, the invention can be implemented in software executing on a computer system, and in hardware implemented as an application-specific integrated circuit or other type of hardware, or in a combination of software and hardware. The controller can perform or carry out embodiments according to this disclosure and as per [the relevant information]. Figures 1A to 1C , Figure 5 and Figure 6 An evaporation method described exemplarily.

[0060] According to one embodiment, an evaporation source is provided. The evaporation source includes a crucible and a controller, the controller having a processor and a memory storing instructions that, when executed by the processor, cause the evaporation source to perform the method according to the embodiments described herein.

[0061] According to a further embodiment, a method for manufacturing an apparatus having an organic material layer is provided. The method includes operating a crucible according to an embodiment of the present disclosure and depositing an organic material layer on a substrate.

[0062] The embodiments described herein divide the source material into loading regions having at least two parts (e.g., a first material compartment as described herein and a second material compartment as described herein). Each part of the loading region has a dedicated heater for each material compartment. In an initial state, material is filled in at least one material compartment. One material compartment (e.g., a material compartment with a higher material filling volume is provided as active). The material compartment is heated. The temperature of the material compartment is provided to achieve a predetermined deposition rate on the substrate to be processed. A portion of the evaporated material will condense in another part of the loading region (i.e., this material compartment is idle during evaporation based on heating the active material compartment). Depending on the purification process, the condensed material is at least as pure as the material reaching the substrate. The effects of polymerization or oxidation in the compartment receiving the condensed source material (which may be based on previous evaporation in this compartment) are reduced. When the heater temperature of the active material compartment approaches its limit temperature or the material in the active part approaches empty, the active part is switched to another part of the loading region, particularly with a smooth transition. For example, intermediate operating conditions (see...) can be provided. Figure 1B In this process, the heaters in both the first and second material compartments are active. Even if a "skin" is formed, this will be covered by the "pure" material in the adjacent sections. Due to the "in-situ purification" process, when the active section switches from one material compartment to another, the temperature at which a certain deposition rate is achieved can be set back to the initial conditions.

[0063] According to one aspect of this disclosure, a vacuum deposition system 700 is provided, such as... Figure 7 As exemplarily shown in the figure. The vacuum deposition system includes a vacuum deposition chamber 710, an evaporation source in the vacuum deposition chamber 710 according to any embodiment described herein, and a substrate support configured to support a substrate 701 during material deposition.

[0064] Specifically, the evaporation source 200 can be provided on the track or linear guide 722, such as Figure 7As exemplarily shown in the diagram, the linear guide 722 can be configured for translational movement of the evaporation source 200. Furthermore, a drive can be provided for providing translational movement of the evaporation source 200. In particular, a transport device for contactless transport of the evaporation source 200 can be provided within a vacuum deposition chamber. Figure 7 As exemplarily shown, the vacuum deposition chamber 710 may have a gate valve 715, via which the vacuum deposition chamber may be connected to an adjacent routing module. The routing module may be configured to transport the substrate to another vacuum deposition system for further processing.

[0065] Exemplary Reference Figure 7 According to embodiments that can be combined with any other embodiments described herein, two substrates (e.g., first substrate 701A and second substrate 701B) may be supported on corresponding transport tracks within the vacuum deposition chamber 710. Furthermore, two tracks may be provided for providing a mask 733 on the tracks.

[0066] Exemplary Reference Figure 7 A source support 731 may be provided, configured for translational movement of the evaporation source 200 along the linear guide 722. The source support 731 supports the crucible 100 and, for example, a vapor distributor 210 provided above the evaporation crucible, such as... Figure 7 As illustrated schematically. Accordingly, the vapor generated in the evaporation crucible can move upward and exit through one or more outlets of the distribution tube. Accordingly, as described herein, the distribution tube is configured to provide a plume of evaporated material, particularly evaporated organic material, from the vapor distributor to the substrate 701.

[0067] According to one embodiment, a vacuum deposition system is provided. According to any embodiment described herein, the vacuum deposition system includes a vacuum deposition chamber and an evaporation source. Specifically, a crucible having a first material compartment and a second material compartment according to the embodiments described herein is provided. A substrate support is configured to support the substrate during material deposition, particularly in a substantially vertical orientation.

[0068] In this disclosure, "vacuum deposition system" should be understood as a vacuum chamber configured for vacuum deposition, wherein one or more evaporation sources as described herein may be arranged within the vacuum chamber. As used herein, the term "vacuum" can be understood as having a vacuum pressure of less than, for example, 10 mbar in the sense of a technical vacuum. Typically, the pressure in a vacuum chamber as described herein can be between 10⁻⁵ mbar and about 10⁻⁸ mbar, more typically between 10⁻⁵ mbar and 10⁻⁷ mbar, and even more typically between about 10⁻⁶ mbar and about 10⁻⁷ mbar.

[0069] While the foregoing describes embodiments of this disclosure, other and further embodiments of this disclosure may be devised without departing from the basic scope of this disclosure, the scope of which is defined by the appended claims.

[0070] In particular, this written description uses examples to disclose this disclosure, including the best mode; and also enables any person skilled in the art to practice the described subject matter, including making and using any apparatus or system and performing any incorporated methods. While various specific embodiments have been disclosed in the foregoing, the mutually non-exclusive features of the embodiments described above can be combined with each other. The patentable scope is defined by the claims, and other examples are intended to be within the scope of the claims if a claim has structural elements that are not different from the literal language of the claims, or if a claim includes equivalent structural elements that are not substantially different from the literal language of the claims.

Claims

1. A crucible to evaporate a material, comprising: a first material compartment configured to hold a material to be evaporated; a first heater to heat the first material compartment; a second material compartment configured to hold a material to be evaporated; a second heater to heat the second material compartment; a vapor directing compartment having a first opening providing a first fluid communication path between the first material compartment and the vapor directing compartment and having a second opening providing a second fluid communication path between the second material compartment and the vapor directing compartment, the vapor directing compartment further having a third opening connectable to a vapor distributor; a third heater to heat the vapor directing compartment, and at least one of a partition wall and an orifice to at least one of control and adjust a ratio between a deposition rate and a purification speed, wherein the at least one of a partition wall and an orifice comprises: at least one of a first orifice in the first fluid communication path and a second orifice in the second fluid communication path; or the partition wall provided in the vapor directing compartment to define a fluid conduction between the first material compartment and the second material compartment.

2. The crucible of claim 1, wherein the partition wall has an opening.

3. The crucible of claim 1, wherein the partition wall has a slit opening.

4. An evaporation source, comprising: the crucible of claim 1; and the vapor distributor in fluid communication with the third opening.

5. The evaporation source of claim 4, wherein the vapor distributor has an inlet port connected to the third opening, the inlet port provided between a first end of the vapor distributor and a second end of the vapor distributor.

6. The evaporation source of claim 4, wherein the vapor distributor has an inlet port connected to the third opening, the inlet port provided at a first end of the vapor distributor.

7. The evaporation source of any of claims 4 to 6, wherein the vapor distributor comprises a plurality of outlet nozzles to direct material vapor to a substrate.

8. An evaporation method, comprising: providing a source material to be evaporated in a first material compartment of a crucible; heating the first material compartment to evaporate the source material, thereby producing an evaporated source material, while a second material compartment of the crucible is in an idle state; directing the evaporated source material from the first material compartment to a vapor distributor; heating the second material compartment to evaporate a condensed source material in the second material compartment, thereby producing an evaporated source material; directing the evaporated source material from the second material compartment to the vapor distributor; and switching the first material compartment to the idle state.

9. The evaporation method of claim 8, further comprising: heating a vapor directing compartment in fluid communication with the first material compartment and with the second material compartment.

10. The evaporation method of any of claims 8 to 9, further comprising: ​ after switching the first material compartment to an idle state, heating the first material compartment to evaporate condensed source material in the first material compartment, thereby generating evaporated source material; directing the evaporated source material from the first material compartment to the vapor distributor; and switching the second material compartment to an idle state.

11. An evaporation source, comprising: a crucible; and a controller comprising a processor and a memory storing instructions that, when executed by the processor, cause the evaporation source to perform the method of claim 8.

12. The evaporation source of claim 11, wherein the crucible is the crucible of claim 1.

13. A vacuum processing apparatus, comprising: a vacuum deposition chamber; and the evaporation source of any of claims 4 to 6 or 11 within the vacuum deposition chamber.

14. A method of manufacturing a device having a layer of organic material, comprising: operating a crucible according to the evaporation method of any of claims 8 or 9; and depositing a layer of organic material on a substrate.

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