A polishing system for polishing mobile phone lens plates

Abstract

This invention relates to the field of polishing equipment technology and provides a polishing system for polishing mobile phone lens plates. It includes a polishing table, a first driving mechanism, and two polishing fluid delivery pipes. One axial surface of the polishing table is a mounting surface with multiple mounting grooves arranged symmetrically about the axis of the polishing table. The first driving mechanism is connected to the polishing table and drives it to rotate about its axis. The polishing fluid delivery pipes deliver polishing fluid to the mounting surface. The two pipes are arranged around the circumference of the polishing table, and their outlets are radially aligned with the axis of the polishing table. The lines connecting the two pipes to the axis of the polishing table form a first angle less than 180 degrees. This invention ensures that the contact effect between multiple lens plates and the polishing fluid and the upper grinding disc is as uniform as possible, reducing the difference in polishing effect between multiple lens plates and improving the utilization rate of the polishing fluid.

Description

Technical Field

[0001] This invention belongs to the field of polishing equipment technology, and specifically relates to a polishing system for polishing mobile phone lens plates. Background Technology

[0002] On the back panel of existing smartphones, the area used to mount the lens, i.e., the lens plate, is usually higher than other areas of the back panel. Therefore, when polishing the back panel of a mobile phone, the lens plate needs to be polished separately.

[0003] During the polishing process of the lens plate, the phone back panel is placed on the surface of the polishing table, and the upper grinding disc is positioned above the polishing table to polish the lens plate. Since the polishing fluid is introduced into the polishing table from the upper grinding disc, it is difficult to ensure that the contact effect between each lens plate and the polishing fluid is the same, and it is also difficult to ensure that the contact between the upper grinding disc and each lens plate is the same, resulting in differences in the polishing effect between multiple lens plates. Summary of the Invention

[0004] The purpose of this application is to provide a polishing system for polishing mobile phone lens plates, thereby solving the aforementioned technical problems in the background art.

[0005] This application is implemented as follows:

[0006] This application provides a polishing system for polishing mobile phone lens plates, including a polishing table, a first driving mechanism, and two polishing liquid delivery pipes; one axial surface of the polishing table is a mounting surface, and the mounting surface has multiple mounting grooves, which are symmetrically arranged around the axis of the polishing table; the first driving mechanism is connected to the polishing table and is used to drive the polishing table to rotate around its axis; the polishing liquid delivery pipes are used to deliver polishing liquid to the mounting surface, and the two polishing liquid delivery pipes are arranged around the polishing table along the circumference of the polishing table, and the outlets of the polishing liquid delivery pipes and the axis of the polishing table are arranged along the radial direction of the polishing table, and the lines connecting the two polishing liquid delivery pipes and the axis of the polishing table form a first included angle, which is less than 180 degrees.

[0007] The technical solution provided in this application can achieve the following beneficial effects:

[0008] In this application, by setting the mounting groove to be rotationally symmetrical around the axis of the polishing table, the end of the mounting groove near the axis is concentrated around the axis of the polishing table, thereby ensuring that the contact effect between the lens plates located at this end and the polishing liquid is as uniform as possible. Furthermore, by setting the polishing liquid delivery pipe along the circumference of the polishing table without affecting the structure of the upper grinding disc, the contact effect between the multiple lens plates and the upper grinding disc is also made as uniform as possible. The outlets of the two polishing liquid delivery pipes are both set towards the axis of the polishing table, so that the polishing liquid can be delivered to the axis position of the polishing table and contact the lens plates arranged around the axis of the polishing table. In addition, the first included angle is less than 180 degrees, so that the polishing liquid output from the two polishing liquid delivery pipes can converge and then flow towards the axis of the polishing table, ensuring that the polishing liquid can smoothly contact the lens plates located in the mounting groove. Attached Figure Description

[0009] To more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings used in the description of the embodiments of the present invention or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0010] Figure 1 This is a schematic diagram of the overall structure of the polishing system provided in some embodiments of this application;

[0011] Figure 2 This is a top view of a polishing system provided in some embodiments of this application;

[0012] Figure 3 This is a schematic diagram of the cooperation between the baffle and the polishing fluid delivery pipe provided in some embodiments of this application;

[0013] Figure 4 These are schematic diagrams of baffle structures provided in some embodiments of this application;

[0014] Figure 5 This is a schematic diagram of the cooperation between the polishing system and the annular baffle provided in some embodiments of this application;

[0015] Figure 6 This is a schematic diagram showing the interaction between the polishing system provided in some embodiments of this application and the back panel of a mobile phone.

[0016] In the diagram: 100-polishing table, 110-mounting surface, 111-mounting groove, 112-guide groove, 200-polishing fluid delivery pipe, a-first included angle, 300-baffle, 310-mounting through hole, 320-limiting part, 400-phone back panel, 410-lens plate, 500-ring enclosure. Detailed Implementation

[0017] The following description provides many different embodiments or examples for implementing various features of the invention. The elements and arrangements described in the specific examples below are only for concise expression of the invention and are merely examples, not intended to limit the invention.

[0018] In related technologies, the phone's back panel is placed on the surface of a lower grinding disc, and an upper grinding disc is used to polish the lens plate on the phone's back panel. A pipe is also installed on the upper grinding disc to deliver polishing fluid to the lower grinding disc, where the polishing fluid, in conjunction with the lower grinding disc, polishes the lens plate. However, in actual polishing processes, it was found that the polishing effect of the lens plate varies; even multiple lens plates polished in the same batch still exhibit different polishing results.

[0019] Further research revealed that the differences in polishing effects were due to variations in the contact between the lens plate and the upper and lower grinding discs, as well as the polishing slurry. Specifically, during the polishing process, both the upper and lower grinding discs rotate under the drive of a power mechanism. Simultaneously, the lower grinding disc reciprocates along a linear direction. The contact area between the upper grinding disc and the lens plate constantly changes. Furthermore, the upper grinding disc has a polishing slurry delivery pipe, but the pipe outlet cannot polish the lens plate. Therefore, it's impossible to guarantee that the contact between the upper grinding disc and each lens plate is identical during polishing, leading to differences in polishing effects across multiple lens plates. Additionally, because the contact area between the upper grinding disc and the lens plate is constantly changing, the placement of the polishing slurry as it is introduced onto the lower grinding disc also changes during the introduction of the slurry. This results in unstable contact between the polishing slurry and the lens plate, making it impossible to guarantee uniform contact between each lens plate and the polishing slurry, thus causing differences in polishing effects across multiple lens plates.

[0020] Therefore, this application provides a polishing system for polishing mobile phone lens plates. By limiting the structure of the polishing table 100 and the position of the polishing liquid delivery pipe 200, the contact effect between multiple lens plates 410 and the upper grinding disc and polishing liquid is made as similar as possible, thereby reducing the difference in polishing effect between multiple lens plates 410.

[0021] refer to Figures 1 to 5As shown, the polishing system provided in this application includes a polishing table 100, a first driving mechanism, and two polishing liquid delivery pipes 200. The polishing table 100 is equivalent to a lower grinding disc in related technologies and is used to place a mobile phone back panel 400. One axial surface of the polishing table 100 is a mounting surface 110, which has multiple mounting grooves 111 arranged symmetrically about the axis of the polishing table 100. For ease of understanding, the area of ​​the mounting groove 111 near the axis of the polishing table 100 is defined as the first region, and the area of ​​the mounting groove 111 near the peripheral edge of the polishing table 100 is defined as the second region. When the mobile phone back panel 400 is placed in the mounting groove 111, the first region corresponds to the lens plate 410 at the top of the mobile phone back panel 400, and the second region corresponds to the bottom region of the mobile phone back panel 400. The axial direction of the polishing table 100 is the axial direction of the polishing table 100, the mounting surface 110 is the surface located in the axial direction of the polishing table 100, and the circumferential edge of the polishing table 100 is the circumferential sidewall edge of the polishing table 100.

[0022] The first drive mechanism is a power system connected to the polishing table 100, used to drive the polishing table 100 to rotate around its axis, so that the polishing table 100 rotates on its own axis. The first drive mechanism can be a drive motor.

[0023] Polishing slurry delivery pipes 200 are used to deliver polishing slurry to the mounting surface 110. Two polishing slurry delivery pipes 200 are arranged around the polishing table 100 and around its circumference, distributed along the circumference of the polishing table 100. The outlet surface of the polishing table 100 faces its axis; specifically, the axis of the polishing table 100 and the outlet of any polishing slurry delivery pipe 200 are arranged along the radial direction of the polishing table 100. Furthermore, the distance between the two polishing slurry delivery pipes 200 should not be too large, and the lines connecting the two polishing slurry delivery pipes 200 to the axis of the polishing table 100 can form an angle, as shown in the reference diagram. Figure 2 As shown, the included angle is defined as the first included angle α, which is set to be less than 180 degrees. The polishing slurry delivery pipe 200 is not connected to the polishing table 100. The rotation of the polishing table 100 will not affect the delivery of polishing slurry in the polishing slurry delivery pipe 200, which can ensure the stable delivery of polishing slurry and avoid the situation where the contact effect between multiple lens plates 410 and polishing slurry is different due to the unstable input position of polishing slurry.

[0024] When the polishing slurry flows through the area around the axis of the polishing table 100, since the mounting slots 111 are concentrated around the axis of the polishing table 100, the polishing slurry can cover the first area of ​​the multiple mounting slots 111 as much as possible. When the mobile phone backplate 400 is mounted in the mounting slot 111, refer to... Figure 6As shown, this design ensures that the contact effect between the lens plates 410 in multiple first regions and the polishing slurry is as uniform as possible, thereby reducing the difference in polishing effect among the multiple lens plates 410. Furthermore, by placing the polishing slurry delivery pipe 200 around the polishing table 100, instead of placing it on the upper grinding disc in related technologies, the integrity of the upper grinding disc structure is ensured. During the polishing process of the lens plates 410 by the upper grinding disc, there are no areas on the upper grinding disc that cannot be polished, thus maximizing the uniform contact effect of the upper grinding disc on each lens plate 410.

[0025] Two polishing slurry delivery pipes 200 are positioned circumferentially around the polishing table 100, with their outlets arranged radially along the axis of the polishing table 100, so that the outlet faces of the polishing slurry delivery pipes 200 towards the axis of the polishing table 100. The polishing slurry output from the polishing slurry delivery pipes 200 flows towards the axis of the polishing table 100, ultimately covering the area around the axis of the polishing table 100 and making contact with the lens plate 410 located in that area. While increasing the polishing slurry flow rate, the two polishing slurry delivery pipes 200, by introducing the slurry in two directions, increase the coverage area of ​​the mounting surface 110. With the first included angle α less than 180 degrees, the polishing slurry output from the polishing slurry delivery pipes 200 flows a certain distance on the mounting surface 110 before converging and then flowing towards the axis of the polishing table 100 at a greater flow rate. This ultimately allows the polishing slurry to cover a larger area of ​​the mounting groove 111, minimizing the possibility of no polishing slurry flowing in the first area of ​​the mounting groove 111.

[0026] The first included angle α is less than 180 degrees, so the polishing slurry converges before reaching the axis of the polishing slurry, avoiding gaps in the polishing slurry during flow and preventing some lens plates 410 from not contacting the polishing slurry. Furthermore, the polishing slurry delivery pipes 200 are concentrated on one side of the polishing table 100, while the other side of the polishing table 100 serves as an outlet for the polishing slurry. If the first included angle α is set to 180 degrees, the convergence point of the polishing slurry from the two delivery pipes 200 is located at the axis of the polishing table 100. Gaps are likely to occur during the convergence process, preventing some lens plates 410 from contacting the polishing slurry. Moreover, since the polishing slurry flows in opposite directions in the two delivery pipes 200, the direction after convergence is uncertain, increasing the difficulty of utilizing the polishing slurry and potentially causing some polishing slurry to flow directly out of the mounting surface 110 without contacting the lens plate 410.

[0027] The first included angle α should not be too small. If the first included angle α is too small, the polishing slurry will cover less of the mounting surface 110 during the flow process. In some embodiments of this application, the first included angle α is greater than or equal to 60 degrees. After the polishing slurry in the two polishing slurry delivery pipes 200 is mixed, it can flow towards the axis of the polishing table 100 at a faster flow speed while ensuring that the coverage area of ​​the mounting surface 110 is as large as possible.

[0028] The polishing system also includes a baffle 300 movably connected to the polishing table 100. The baffle 300 surrounds the polishing table 100 and extends along the circumferential direction of the polishing table 100. At least a portion of the baffle 300 protrudes from the mounting surface 110 along the axial direction of the polishing table 100. (See reference...) Figure 1 As shown. Since the baffle 300 is movably connected to the polishing table 100, although the polishing table 100 can rotate under the drive of the first drive mechanism, the rotation of the polishing table 100 will not cause the baffle 300 to rotate synchronously.

[0029] The baffle 300 protruding from the mounting surface 110 is mainly designed to prevent the polishing liquid from flowing down from the mounting surface 110, increase the time the polishing liquid stays on the mounting surface 110, accumulate the polishing liquid on the mounting surface 110, improve the utilization rate of the polishing liquid, and make the polishing liquid contact the lens plate 410 as evenly as possible, thereby making the contact effect between the polishing liquid and the lens plate 410 better.

[0030] There are various installation positions for the baffle 300. In some embodiments, the baffle 300 can be positioned opposite the polishing fluid delivery pipe 200. In other embodiments, refer to... Figure 1 and Figure 2 As shown, the baffle 300 and the two polishing liquid delivery pipes 200 can also be installed in the same circumferential area of ​​the polishing table 100. Specifically, the baffle 300 is provided with two mounting through holes 310, which are arranged along the circumferential direction of the polishing table 100, as shown in the reference. Figure 4 As shown. One mounting through hole 310 corresponds to one polishing fluid delivery pipe 200. The polishing fluid delivery pipe 200 is directly fixed at the mounting through hole 310, as shown in the reference. Figure 3 As shown. The outlet end of the polishing slurry delivery pipe 200 can be directly inserted into the mounting through hole 310. The outer wall of the outlet end of the polishing slurry delivery pipe 200 is fixedly set to the inner wall of the mounting through hole 310. The cavity of the polishing slurry delivery pipe 200 is directly connected to the cavity above the mounting surface 110 of the polishing table 100. Alternatively, a protruding pipe can be provided at the mounting through hole 310. This pipe protrudes from the side wall of the baffle 300 and is located on the side of the baffle 300 away from the polishing table 100. The polishing slurry delivery pipe 200 is sleeved on the outside of this pipe, connecting the cavity of the polishing slurry delivery pipe 200 and the inner cavity of the mounting through hole 310.

[0031] The baffle 300 and the polishing fluid delivery pipe 200 are located on the same side. During the polishing of the lens plate 410, the polishing table 100 rotates under the drive of the first drive mechanism. Some of the polishing fluid located on the mounting surface 110 will flow towards the edge of the mounting surface 110 under the action of centrifugal force. Some of the polishing fluid is blocked by the baffle 300 and stays on the mounting surface 110. During the process of the polishing fluid delivery pipe 200 delivering polishing fluid towards the mounting surface 110, the polishing fluid delivered by the polishing fluid delivery pipe 200 can drive the polishing fluid blocked by the baffle 300 to flow together towards the area where the axis of the polishing table 100 is located, so that the polishing fluid comes into contact with the lens plate 410 installed in the first area and improves the utilization rate of the polishing fluid.

[0032] In some embodiments of this application, the polishing system further includes a second driving mechanism. The second mechanism is connected to the polishing table 100 and the baffle 300, and can simultaneously drive the polishing table 100 and the baffle 300. The second driving mechanism is used to drive the polishing table 100 and the baffle 300 to reciprocate synchronously along a first direction, changing the relative position between the polishing table 100 and the upper grinding disc, thereby changing the area on the upper grinding disc used for polishing in contact with the lens plate 410 and improving the utilization rate of the upper grinding disc. The first direction is determined by the baffle 300. On any cross-section of the baffle 300, the first direction is perpendicular to the line connecting the two ends of the baffle 300. The baffle 300 is connected to the polishing table 100, and the cross-section of the baffle 300 is the cross-section of the baffle 300 along the radial direction of the polishing table 100. On this cross-section, the line connecting the two ends of the baffle 300 is perpendicular to the first direction, as shown in the reference section. Figure 2 As shown, the line connecting the two ends of the baffle 300 is the x-axis direction, and the first direction is the y-axis direction.

[0033] During the reciprocating movement of the polishing table 100 and the baffle 300 along the first direction driven by the second drive mechanism, the polishing slurry located on the mounting surface 110 moves under the action of inertial force. When the baffle 300 and the polishing table 100 move in the positive y-axis direction, the polishing slurry located on the mounting surface 110 also has a speed moving in the positive y-axis direction under the action of inertia. When the baffle 300 and the polishing table 100 stop moving, the polishing slurry impacts the baffle 300 under the action of inertia, and the polishing slurry in the area around the axis of the polishing table 100 also flows towards the baffle 300. New polishing slurry flows into the area around the axis of the polishing table 100, and this part of the polishing slurry is replaced. When the second drive mechanism drives the baffle 300 and the polishing fluid to move in the opposite direction of the y-axis, the polishing fluid located on the mounting surface 110 has a speed in the opposite direction of the y-axis due to inertia. When the polishing table 100 and the baffle 300 stop moving, the polishing fluid flows down from the mounting surface 110 under the action of inertia, carrying away the impurities that appear during the polishing process. The polishing fluid output by the polishing fluid delivery pipe 200 replaces the polishing fluid around the axis of the polishing table 100.

[0034] The baffle 300, in conjunction with the second drive mechanism, utilizes the inertia of the polishing slurry to increase its flow speed during the reciprocating movement of the polishing table 100 along the first direction. This rapidly replaces the polishing slurry in the area around the axis of the polishing table 100, reducing its temperature. Furthermore, while the upper grinding disc is polishing the lens plate 410, it quickly removes impurities that appear during the polishing process and rapidly replaces the polishing slurry around the lens plate 410, thereby reducing the temperature of the polishing slurry around the lens plate 410 and improving the polishing effect of the upper grinding disc on the lens plate 410.

[0035] Since the baffle 300 serves to block the polishing fluid, it should not be too short. In some embodiments of this application, the central angle corresponding to the baffle 300 is greater than or equal to 180 degrees and less than or equal to 200 degrees. This ensures that the polishing fluid is blocked without affecting its normal flow from the mounting surface 110.

[0036] The baffle 300 works in conjunction with the second drive mechanism to replace the polishing liquid in the area around the axis of the polishing table 100. If the baffle 300 is too short, it will not be able to block the polishing liquid, and the polishing liquid will flow directly down from the mounting surface 110 under the action of inertia, resulting in a reduction in the utilization rate of the polishing liquid.

[0037] The baffle 300 also has a limiting portion 320, which is located on the portion of the baffle 300 that protrudes from the mounting surface 110 along the axial direction of the polishing table 100, and extends toward the side where the polishing table 100 is located. The limiting portion 320 is used to prevent polishing liquid from flowing down from the side where the baffle 300 is located. The structure of the limiting portion 320 can be found in [reference needed]. Figure 3 and Figure 4 As shown.

[0038] During the polishing process of lens plate 410, the polishing slurry will impact the baffle 300 due to inertia. To prevent the slurry from splashing and dripping into the working environment of the polishing table 100 and affecting the polishing operation, a ring-shaped baffle 300 can be installed around the polishing table 100. (See reference...) Figure 5 As shown, the annular baffle 300 completely encloses the polishing table 100, the polishing fluid delivery pipe 200, and the baffle 300 itself. The polishing table 100 rotates within the annular baffle 300 and reciprocates along the first direction, confining the liquid generated by the impact of the polishing fluid within the range of the annular baffle 300 to avoid affecting the polishing operation environment.

[0039] When the polishing slurry delivery pipes 200 are mounted on the baffle 300, the distances between the ends of the two polishing slurry delivery pipes 200 and their adjacent baffle 300 are equal along the extending direction of the baffle 300. The two polishing slurry delivery pipes 200 are symmetrically arranged about a first direction as an axis of symmetry, so that the flow of the polishing slurry delivery pipes 200 on the mounting surface 110 is smoother, and it is easier to move the polishing slurry delivery pipes 200 accumulated at the baffle 300 toward the axis of the polishing table 100.

[0040] To enhance the flowability of the polishing slurry on the mounting surface 110, at least one guide channel 112 is provided on the mounting surface 110. The extension path of the guide channel 112 is arc-shaped. The inlet of the guide channel 112 is close to the periphery of the polishing table 100, receiving the polishing slurry output from the polishing slurry delivery pipe 200 from the periphery of the polishing table 100. The outlet of the guide channel 112 is located close to the axis of the polishing table 100, aiming to guide the polishing slurry into the first area. During the polishing process of the lens plate 410, the polishing table 100 rotates around its axis under the drive of the first drive mechanism. Along the rotation direction of the polishing table 100, the center of the extension path of the guide channel 112 is located in front of the guide channel 112. Figure 2 As shown. The extension path of the guide channel 112 is an arc-shaped structure, which can be an elliptical arc or a circular arc.

[0041] The rotation direction of the polishing table 100 is Figure 2 As indicated by the arrow, during the rotation of the polishing table 100, the polishing fluid entering the inlet of the guide channel 112 contacts the side wall of the guide channel 112. (Refer to...) Figure 2 As shown, the dotted line indicates the flow direction of the polishing fluid in the guide channel 112. After the polishing fluid comes into contact with the side wall of the guide channel 112, it gradually approaches the outlet of the guide channel 112, i.e., the area where the lens plate 410 is located. This allows the polishing fluid to flow quickly to the area where the lens plate 410 is located as the polishing table 100 rotates, accelerating the replacement of the polishing fluid in the area where the lens plate 410 is located and improving the polishing effect of the lens plate 410.

[0042] The outlet of the guide channel 112 is located between two adjacent mounting slots 111, and the outlet face is set towards the axis of the polishing table 100. The polishing fluid flowing out of the outlet of the guide channel 112, no longer restricted by the guide channel 112, tends to diffuse forward. Since the outlet face is towards the axis of the polishing table 100, some of the polishing fluid will move in the axial direction of the polishing table 100, and finally move to the area where the lens plate 410 is located.

[0043] Along the radial direction of the polishing table 100, the outlet of the guide channel 112 is located on the side of the first region away from the axis of the polishing table 100. After a portion of the polishing fluid flows out from the outlet of the guide channel 112, the first regions of the three guide channels 112 are all located on the flow path of that portion of the polishing fluid, thereby improving the fluidity of the polishing fluid in the region where the lens plate 410 is located.

[0044] Corresponding to the mounting groove 111, there are also three guide grooves 112. The three guide grooves 112 are rotationally symmetrical about the axis of the polishing table 100, and the three guide grooves 112 and the three mounting grooves 111 are arranged at intervals along the circumference of the polishing table 100. This improves the uniformity of the polishing fluid distribution, thereby ensuring that the contact effect between the three lens plates 410 and the polishing fluid is as similar as possible.

[0045] In some embodiments of this application, the central angle of the guide groove 112 is 180 degrees to increase the flow rate of the polishing fluid.

[0046] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A polishing system for polishing mobile phone lens plates, characterized in that, include: A polishing table (100) has an axial surface that is a mounting surface (110). The mounting surface (110) has three mounting grooves (111) that are arranged symmetrically about the axis of the polishing table (100). A first driving mechanism is connected to the polishing table (100) and is used to drive the polishing table (100) to rotate about its axis. Two polishing fluid delivery pipes (200) are provided for delivering polishing fluid to the mounting surface (110). The two polishing fluid delivery pipes (200) are arranged around the polishing table (100) along the circumferential direction. The outlet of the polishing fluid delivery pipe (200) and the axis of the polishing table (100) are arranged along the radial direction of the polishing table (100). The line connecting the two polishing fluid delivery pipes (200) and the axis of the polishing table (100) forms a first included angle, which is less than 180 degrees. The polishing system further includes a baffle (300) movably connected to the polishing table (100). The baffle (300) is arranged around the polishing table (100) and extends along the circumferential direction of the polishing table (100). At least a portion of the baffle (300) protrudes along the axial direction of the polishing table (100) onto the mounting surface (110). The baffle (300) has two mounting through holes (310) arranged along the circumference of the polishing table (100). The mounting through holes (310) correspond one-to-one with the polishing liquid delivery pipe (200), and the polishing liquid delivery pipe (200) is fixedly installed in the mounting through holes (310). The polishing system further includes a second driving mechanism, which is connected to the polishing table (100) and the baffle (300). The second driving mechanism is used to drive the polishing table (100) and the baffle (300) to reciprocate synchronously along a first direction. On any cross-section of the baffle (300), the first direction is perpendicular to the line connecting the two ends of the baffle (300). The mounting surface (110) is also provided with three guide grooves (112). The three guide grooves (112) and the three mounting grooves (111) are arranged at intervals along the circumference of the polishing table (100). The extension path of the guide grooves (112) is arc-shaped. The inlet of the guide grooves (112) is close to the circumferential edge of the polishing table (100), and the outlet of the guide grooves (112) is arranged close to the axis of the polishing table (100). Along the rotation direction of the polishing table (100), the center of the circle corresponding to the extension path of the guide groove (112) is in front of the guide groove (112); The outlet of the guide groove (112) is located between two adjacent mounting grooves (111), and the outlet surface of the guide groove (112) is arranged facing the axis of the polishing table (100).

2. The polishing system for polishing mobile phone lens plates according to claim 1, characterized in that, The central angle corresponding to the baffle (300) is greater than or equal to 180 degrees and less than or equal to 200 degrees.

3. The polishing system for polishing mobile phone lens plates according to claim 1, characterized in that, The baffle (300) also has a limiting part (320), which is located on the part of the baffle (300) that protrudes from the mounting surface (110) along the axial direction of the polishing table (100) and extends toward the side where the polishing table (100) is located.

4. The polishing system for polishing mobile phone lens plates according to claim 1, characterized in that, Along the extending direction of the baffle (300), the distance between the ends of the two polishing fluid delivery pipes (200) and their adjacent baffles (300) is equal.

5. The polishing system for polishing mobile phone lens plates according to claim 1, characterized in that, The first included angle is greater than or equal to 60 degrees.

Images