Sputtering tool and sputtering tool assembly for semiconductor

Abstract

The present invention discloses a sputtering tool and a sputtering tool assembly for semiconductors, wherein the sputtering tool comprises: two first adjustment mechanisms symmetrically arranged along the Y-axis, the first adjustment mechanisms comprising a plurality of first adjustment components arranged side by side along the Y-direction, and the first adjustment components being movable in the X-direction; two second adjustment mechanisms symmetrically arranged along the X-axis, the second adjustment mechanisms being arranged below the first adjustment mechanisms, the second adjustment mechanisms comprising a plurality of second adjustment components arranged side by side along the X-direction, and the second adjustment components being movable in the Y-direction; the first adjustment component being movable in the X-direction, and the second adjustment component being movable in the Y-direction, wherein the UI adjusts the shape of the cavity formed by the first and second adjustment components. The technical solution provided in the present application has the characteristics of high compatibility, cost savings, and simple structure.

Description

Technical Field

[0001] The present application belongs to the field of semiconductor processing technology, and in particular relates to a sputtering tool and a sputtering tool assembly for semiconductors. Background Art

[0002] The SPT process (sputtering) is currently widely used in the packaging field, primarily for sputtering metal layers on product surfaces to provide electromagnetic shielding. However, with the rise of system-level packaging (SLP), electromagnetic shielding is required only for certain areas of the product, making selective sputtering an emerging trend.

[0003] In the prior art, when a metal layer is sputtered on a semiconductor, a tool with the same shape as the sputtering area is usually made for each sputtering area. After the sputtering is completed, the sputtering tool cannot be used anymore, which results in waste.

[0004] Therefore, it is necessary to improve the sputtering tooling. Summary of the Invention

[0005] The purpose of the embodiments of the present application is to provide a sputtering tool and a sputtering tool assembly for semiconductors.

[0006] According to a first aspect of an embodiment of the present application, a sputtering tool for a semiconductor is provided, comprising:

[0007] Two first adjustment mechanisms are arranged symmetrically along the Y-axis, wherein the first adjustment mechanisms include a plurality of first adjustment components arranged side by side along the Y-axis, and the first adjustment components are movable in the X-direction;

[0008] Two second adjustment mechanisms symmetrically arranged along the X-axis, the second adjustment mechanisms being arranged below the first adjustment mechanism, the second adjustment mechanisms comprising a plurality of second adjustment components arranged side by side along the X-direction, the second adjustment components being movable in the Y-direction;

[0009] The first adjustment component is movable in the X direction, and the second adjustment component is movable in the Y direction, so as to adjust the shape of the cavity formed by the first adjustment component and the second adjustment component.

[0010] Optionally, the sputtering tool further includes a control mechanism, which is capable of receiving a preset shape and controlling the first adjustment component and the second adjustment component to move to form the cavity shape that is the same as the preset shape.

[0011] Optionally, the sputtering tool further includes a frame having a first side plate arranged opposite to each other in the Y direction and a second side plate arranged opposite to each other in the X direction; the first side plate is provided with a first fixing rod arranged along the Y direction, and the second side plate is provided with a second fixing rod arranged along the X direction;

[0012] The first adjustment assembly includes a first adjustment block, wherein the first adjustment block has first limiting through holes extending along the X direction on two side walls opposite to each other in the Y direction, the first fixing rod passes through the first limiting through holes, the first limiting through holes can move relative to the first fixing rod, and the first limiting through holes and the first fixing rod can be locked; and / or

[0013] The second adjustment assembly includes a second adjustment block, and the second adjustment block is provided with a second limiting through hole extending along the Y direction on two side walls opposite to each other in the X direction. The second fixing rod passes through the second limiting through hole. The second limiting through hole can move relative to the second fixing rod, and the second limiting through hole and the second fixing rod can be locked.

[0014] Optionally, the first adjustment assembly further includes a first locking member, the first locking member is sleeved on the first fixing rod, and the first locking member is used to fix the position of the first adjustment block; and / or

[0015] The second adjustment assembly further includes a second locking member, which is sleeved on the second fixing rod and is used to fix the position of the second adjustment block.

[0016] Optionally, a plurality of first limiting portions arranged side by side along the X direction are provided in the first limiting through hole, and when the first adjustment block moves in the X direction, the first fixing rod can be engaged with the corresponding first limiting portion; and / or

[0017] A plurality of second limiting portions arranged side by side along the Y direction are provided in the second limiting through hole. When the second adjustment block moves in the Y direction, the second fixing rod can be engaged with the corresponding second limiting portion.

[0018] Optionally, the plurality of first limiting portions are sawtooth-shaped, and the first fixing rod can be clamped between two adjacent sawteeth;

[0019] The plurality of second limiting portions are sawtooth-shaped, and the second fixing rod can be clamped between two adjacent sawteeth.

[0020] Optionally, the first adjustment component includes a first elastic member, one end of the first elastic member is connected to the first adjustment block, the other end of the first elastic member is connected to the frame, and the elastic direction of the first elastic member is the X direction; and / or

[0021] The second adjustment component includes a second elastic member, one end of the second elastic member is connected to the second adjustment block, the other end of the second elastic member is connected to the frame, and the elastic direction of the second elastic member is the Y direction.

[0022] Optionally, the first adjustment assembly further includes a first drive assembly and a first adjustment block, the drive end of the first drive assembly is connected to the first adjustment block, the control mechanism is communicatively connected to the first drive assembly, and the control mechanism is used to control the first drive assembly to drive the first adjustment block to move in the X direction; and / or

[0023] The second adjustment component also includes a second drive component and a second adjustment block. The drive end of the second drive component is connected to the second adjustment block. The control mechanism is communicatively connected to the second drive component. The control mechanism is used to control the second drive component to drive the second adjustment block to move in the Y direction.

[0024] Optionally, the first adjustment component includes a first adjustment block, a first magnet and a first magnetic induction coil, and the first magnet is disposed inside the first adjustment block;

[0025] The second adjustment assembly includes a second adjustment block, a second magnet and a second magnetic induction coil, wherein the second magnet is disposed inside the second adjustment block;

[0026] The control mechanism is electrically connected to the first magnetic induction coil and the second magnetic induction coil, respectively. The control mechanism drives the first adjustment block to move in the X direction by controlling the current of the first magnetic induction coil, and drives the second adjustment block to move in the Y direction by controlling the current of the second magnetic induction coil.

[0027] Optionally, ends of the first adjustment blocks of the two first adjustment mechanisms that are opposite to each other and close to the second adjustment mechanism have a first angle with a horizontal plane, and the first angle is an acute angle;

[0028] Ends of the second adjustment blocks of the two second adjustment mechanisms that are opposite to and away from the first adjustment mechanism have a second angle with the horizontal plane, and the second angle is an acute angle.

[0029] According to a second aspect of an embodiment of the present application, a sputtering tool assembly for a semiconductor is provided, comprising:

[0030] Tooling frame;

[0031] The above-mentioned sputtering tooling, multiple sputtering tools are arranged in the tooling frame.

[0032] One technical effect of the embodiment of the present application is that the first adjustment mechanism 1 can adjust the size of the cavity 3 in the X direction, and the second adjustment mechanism 2 can adjust the size of the cavity 3 in the Y direction, thereby achieving adjustment in the X direction and the Y direction to form a required cavity shape. The cavity shape can be adjusted according to the shape required for sputtering and can adapt to different sputtering shapes, and its compatibility is high.

[0033] Other features and advantages of the present application will become apparent from the following detailed description of exemplary embodiments of the present application with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the application and, together with the description, serve to explain the principles of the application.

[0035] Figure 1 Schematic diagram of the structure of the initial state of the sputtering tooling in the embodiment of the present application;

[0036] Figure 2 A schematic diagram of the structure of the sputtering tooling forming the cavity shape in an embodiment of the present application;

[0037] Figure 3 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application;

[0038] Figure 4 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application;

[0039] Figure 5 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application;

[0040] Figure 6 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application;

[0041] Figure 7 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application;

[0042] Figure 8 This is a schematic structural diagram of a sputtering tool in one embodiment of the present application.

[0043] Explanation of the accompanying drawings: sputtering tool 100; first adjustment mechanism 1; first adjustment assembly 11; first adjustment block 111; first limiting through hole 1111; first locking member 112; first limiting portion 113; first elastic member 114; second adjustment mechanism 2; second adjustment assembly 21; second adjustment block 211; second limiting through hole 2111; second locking member 212; second limiting portion 213; second elastic member 214; cavity 3; frame 4; first side panel 41; second side panel 42; first fixing rod 43; second fixing rod 44; first angle a; second angle b. DETAILED DESCRIPTION

[0044] Various exemplary embodiments of the present application will now be described in detail with reference to the accompanying drawings. It should be noted that unless otherwise specifically stated, the relative arrangements of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present application.

[0045] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses.

[0046] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered part of the specification.

[0047] In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not limiting. Therefore, other examples of the exemplary embodiments may have different values.

[0048] It should be noted that like reference numerals and letters refer to like items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0049] like Figures 1-8 As shown, a first aspect of an embodiment of the present application provides a sputtering tool 100 for a semiconductor, comprising two first adjustment mechanisms 1 symmetrically arranged along the Y-axis, the first adjustment mechanism 1 comprising a plurality of first adjustment components 11 arranged side by side along the Y-direction, and the first adjustment component 11 being movable in the X-direction; two second adjustment mechanisms 2 symmetrically arranged along the X-axis, the second adjustment mechanism 2 being arranged below the first adjustment mechanism 1, the second adjustment mechanism 2 comprising a plurality of second adjustment components 21 arranged side by side along the X-direction, and the second adjustment component 21 being movable in the Y-direction; the first adjustment component 11 being movable in the X-direction, and the second adjustment component 21 being movable in the Y-direction, so as to adjust the shape of the cavity 3 formed by the first adjustment component 11 and the second adjustment component 21.

[0050] like Figure 1 As shown, the sputtering tool 100 includes two first adjustment mechanisms 1 symmetrically arranged along the Y-axis and two second adjustment mechanisms 2 symmetrically arranged along the X-axis.

[0051] Specifically, the two first adjustment mechanisms 1 are symmetrically arranged along the axis of the Y direction, as shown in FIG. Figure 1 As shown, in the initial state, the two first adjustment mechanisms 1 are in abutment state. When the shape of the cavity 3 needs to be formed, one of the first adjustment mechanisms 1 moves along the X- direction, and the other first adjustment mechanism 1 moves along the X+ direction.

[0052] To further illustrate, the first adjustment mechanism 1 includes a plurality of first adjustment components 11 arranged side by side along the Y direction, wherein the first adjustment components 11 are movable in the X direction, wherein the plurality of first adjustment components 11 can move different distances as needed.

[0053] Specifically, the two second adjustment mechanisms 2 are arranged below the two first adjustment mechanisms 1 , and the below refers to below in the Z direction.

[0054] Further explanation: the two second adjustment mechanisms 2 are symmetrically arranged along the axis of the X direction, such as Figure 1 As shown, in the initial state, the two second adjustment mechanisms 2 are in abutment state. When the cavity 3 shape needs to be formed, as shown in FIG. Figure 2 As shown, one of the second adjusting mechanisms 2 moves along the Y-direction, and the other second adjusting mechanism 2 moves along the Y+direction.

[0055] The first adjustment mechanism 1 moves in the X direction, and the second adjustment mechanism 2 moves in the Y direction, so that the shape of a cavity 3 can be formed between the two first adjustment mechanisms 2 and the two second adjustment mechanisms 2 .

[0056] To further illustrate, the second adjustment mechanism 2 includes a plurality of second adjustment components 21 arranged side by side along the X direction, wherein the second adjustment components 21 can move in the Y direction, wherein the plurality of second adjustment components 21 can move different distances as needed.

[0057] like Figure 1 and Figure 2 As shown, according to multiple first adjustment components 11 and multiple second adjustment components 21, the first adjustment component 11 moves in the X direction and the second adjustment component 21 moves in the Y direction, so after the first adjustment component 11 and the second adjustment component 21 move, a cavity 3 is formed, wherein the cavity 3 is the sputtering shape on the semiconductor.

[0058] To further illustrate, the number of first adjustment components 11 and second adjustment components 21 can be set according to the desired sputtering shape. If a sputtering shape with a curve is desired, the number of first adjustment components 11 can be increased and the width of the first adjustment components 11 can be reduced, while the number of second adjustment components 21 can be increased and the width of the second adjustment components 21 can be reduced, thereby enabling the first adjustment components 11 and the second adjustment components 21 to form a sputtering shape with a curve. If a sputtering shape that is both linear is desired, the number of first adjustment components 11 and the second adjustment components 21 can be correspondingly reduced, while the width of the first adjustment components 11 and the width of the second adjustment components 21 can be correspondingly increased, thereby saving costs.

[0059] Further explanation, the first adjustment mechanism 1 can adjust the size of the cavity 3 in the X direction, and the second adjustment mechanism 2 can adjust the size of the cavity 3 in the Y direction, thereby achieving adjustment in the X direction and the Y direction to form a required sputtering shape. The sputtering shape can be adjusted according to the shape required for sputtering and can adapt to different sputtering shapes required by different semiconductors, and its compatibility is high.

[0060] In this embodiment, the sputtering tool 100 further includes a frame 4, the frame 4 having a first side plate 41 arranged opposite to each other in the Y direction and a second side plate 42 arranged opposite to each other in the X direction; the first side plate 41 is provided with a first fixing rod 43 arranged along the Y direction, and the second side plate 42 is provided with a second fixing rod 44 arranged along the X direction; the first adjustment assembly 11 includes a first adjustment block 111, and the first adjustment block 111 is provided with a first limiting through hole 1111 extending along the X direction on two side walls opposite to each other in the Y direction, and the first fixing rod 43 passes through the first limiting through hole 1111, so that The first limiting through hole 1111 can move relative to the first fixing rod 43, and the first limiting through hole 1111 and the first fixing rod 43 can be locked; and / or the second adjustment component 21 includes a second adjustment block 211, and the second adjustment block 211 is provided with second limiting through holes 2111 extending along the Y direction on two side walls opposite to each other in the X direction, and the second fixing rod 44 passes through the second limiting through hole 2111, and the second limiting through hole 2111 can move relative to the second fixing rod 44, and the second limiting through hole 2111 and the second fixing rod 44 can be locked.

[0061] like Figure 1 As shown, the sputtering tool 100 further includes a frame 4 having two first side panels 41 disposed opposite each other in the Y direction and two second side panels 42 disposed opposite each other in the X direction. In one embodiment, the first side panels 41 and the second side panels 42 are fixedly connected at adjacent sides to form the rectangular frame 4; in another embodiment, the first side panels 41 and the second side panels 42 are not connected.

[0062] like Figure 1 As shown, the frame 4 further includes a first fixing rod 43 , both ends of which are fixed to two first side plates 41 opposite to each other in the Y direction, so the length direction of the first fixing rod 43 is arranged along the Y direction.

[0063] Further description, the first adjustment component 11 includes a first adjustment block 111, and a first limiting through hole 1111 is opened on the first adjustment block 111, wherein the first limiting through hole 1111 is opened from two side walls opposite to each other in the Y direction of the first adjustment block 111, and the first limiting through hole 1111 extends in the X direction, and the first fixing rod 43 can pass through the first limiting through hole 1111. When the first adjustment block 111 moves in the X direction, the first adjustment block 111 and the first fixing rod 43 move relative to each other.

[0064] To further illustrate, the first fixing rod 43 extends from one of the first side plates 41 to the other first side plate 41, so the first fixing rod 43 can pass through the first limiting through hole 1111 on the first adjustment block 111 of the multiple first adjustment components 11 of one of the first adjustment mechanisms 1, and a locking relationship can be formed between the first fixing rod 43 and the first limiting through hole 1111. When the first adjustment block 111 moves to a preset distance in the X direction, the first adjustment block 111 is locked with the first fixing rod 43, thereby preventing the first adjustment block 111 from continuing to move in the X direction.

[0065] To further explain, there are two first fixing rods 43 , one of which passes through one of the first adjustment mechanisms 1 , and the other first fixing rod 43 passes through the other first adjustment mechanism 1 .

[0066] In one embodiment, the frame 4 further includes a second fixing rod 44 , and both ends of the second fixing rod 44 are respectively fixed to two second side plates 42 opposite to each other in the X direction, so the length direction of the second fixing rod 44 is arranged along the X direction.

[0067] Further description, the second adjustment component 21 includes a second adjustment block 211, and a second limiting through hole 2111 is opened on the second adjustment block 211, wherein the second limiting through hole 2111 is opened from two side walls opposite to each other in the X direction of the second adjustment block 211, and the second limiting through hole 2111 extends in the Y direction, and the second fixing rod 44 can pass through the second limiting through hole 2111. When the second adjustment block 211 moves in the Y direction, the second adjustment block 211 and the second fixing rod 44 move relative to each other.

[0068] It is further explained that the second fixing rod 44 extends from one of the second side plates 42 to the other second side plate 42, so the second fixing rod 44 can pass through the second limiting through hole 2111 on the second adjustment block 211 of the multiple second adjustment components 21 of a second adjustment mechanism 2, and a locking relationship can be formed between the second fixing rod 44 and the second limiting through hole 2111. When the second adjustment block 211 moves to a preset distance in the Y direction, the second adjustment block 211 is locked with the second fixing rod 44, thereby preventing the second adjustment block 211 from continuing to move in the Y direction.

[0069] In one embodiment, the first adjustment component 11 further includes a first locking member 112, which is sleeved on the first fixing rod 43, and the first locking member 112 is used to fix the position of the first adjustment block 111; and / or the second adjustment component 21 further includes a second locking member 212, which is sleeved on the second fixing rod 44, and the second locking member 212 is used to fix the position of the second adjustment block 211.

[0070] Further explanation, such as Figure 3 As shown, the first adjustment assembly 11 also includes a first locking member 112, wherein the first locking member 112 is sleeved on the first fixing rod 43 and is located on both sides of the first limiting through hole 1111. After the first adjustment block 111 moves a preset distance in the X direction, the first locking member 112 can fix the first limiting block and the first fixing rod 43, thereby preventing the first adjustment block 111 and the first fixing rod 43 from moving during sputtering, thereby preventing the shape of the cavity 3 from changing.

[0071] To further illustrate, the first fixing rod 43 can be a threaded rod, the first locking member 112 is a nut, the diameter of the first limiting through hole 1111 is larger than the diameter of the first fixing rod 43, and the first adjusting block 111 moves in the X direction without being affected by the first fixing rod 43. After the first adjusting block 111 moves a preset distance in the X direction, the nut moves toward the direction of the first adjusting block 111, and the first adjusting block 111 is fixed by the nuts on both sides of the first adjusting block 111.

[0072] like Figure 4 As shown, the second adjustment assembly 21 also includes a second locking member 212, wherein the second locking member 212 is sleeved on the second fixing rod 44 and is located on both sides of the second limiting through hole 2111. After the second adjustment block 211 moves in the Y direction and a preset distance, the second locking member 212 can fix the second adjustment block 211 and the second fixing rod 44, thereby preventing the second adjustment block 211 and the second fixing rod 44 from moving during sputtering, and preventing the shape of the cavity 3 from changing.

[0073] To further illustrate, the second fixing rod 44 can be a threaded rod, the second locking piece 212 is a nut, the diameter of the second limiting through hole 2111 is larger than the diameter of the second fixing rod 44, and the second adjustment block 211 moves in the X direction without being affected by the second fixing rod 44. After the second adjustment block 211 moves a preset distance in the Y direction, the nut moves toward the direction of the second adjustment block 211, and the second adjustment block 211 is fixed by the nuts on both sides of the second adjustment block 211.

[0074] In another embodiment, a plurality of first limiting portions 113 arranged side by side along the X direction are provided in the first limiting through hole 1111, and when the first adjustment block 111 moves in the X direction, the first fixing rod 43 can be engaged with the corresponding first limiting portion 113; and / or a plurality of second limiting portions 213 arranged side by side along the Y direction are provided in the second limiting through hole 2111, and when the second adjustment block 211 moves in the Y direction, the second fixing rod 44 can be engaged with the corresponding second limiting portion 213.

[0075] like Figure 5As shown, a plurality of first limiting portions 113 arranged side by side along the X direction are provided in the first limiting through hole 1111. When the first adjusting block 111 moves a preset distance in the X direction, the first fixing rod 43 can be engaged with the corresponding first limiting portion 113, so that the first fixing rod 43 and the first adjusting block 111 are relatively fixed, thereby avoiding relative movement of the first fixing rod 43 and the first adjusting block 111 during sputtering.

[0076] It is further explained that a plurality of second limiting portions 213 arranged side by side along the Y direction are provided in the second limiting through hole 2111. When the second adjustment block 211 moves a preset distance in the Y direction, the second fixing rod 44 can be engaged with the corresponding second limiting portion 213, so that the second fixing rod 44 and the second adjustment block 211 are relatively fixed, thereby avoiding relative movement of the second fixing rod 44 and the second adjustment block 211 during sputtering.

[0077] In another embodiment, the first adjustment block 111 is fixed by the first locking member 112, and its specific structure is as described above and will not be repeated here; the second adjustment block 211 is fixed to the second fixing rod 44 by the second limiting portion 213, and its specific structure is as described above and will not be repeated here.

[0078] In another embodiment, the first adjustment block 111 is fixed to the first fixing rod 43 through the first limiting portion 113, and its specific structure is as described above and will not be repeated here; the second adjustment block 211 is fixed through the second locking member 212, and its specific structure is as described above and will not be repeated here.

[0079] In this embodiment, multiple first limiting portions 113 are serrated, and the first fixing rod 43 can be clamped between two adjacent serrations; multiple second limiting portions 213 are serrated, and the second fixing rod 44 can be clamped between two adjacent serrations.

[0080] like Figure 5 As shown, the plurality of first limiting portions 113 are sawtooth-shaped, and a clamping portion is provided between two adjacent sawteeth, wherein the first fixing rod 43 can be clamped in the clamping portion, thereby preventing the first fixing rod 43 and the first adjustment block 111 from moving relative to each other.

[0081] like Figure 6 As shown, the plurality of second limiting portions 213 are sawtooth-shaped, and a clamping portion is provided between two adjacent saw teeth 3 , wherein the second fixing rod 44 can be clamped in the clamping portion, thereby preventing the second fixing rod 44 and the second adjustment block 211 from moving relative to each other.

[0082] In this embodiment, the first adjustment component 11 includes a first elastic member 114, one end of the first elastic member 114 is connected to the first adjustment block 111, the other end of the first elastic member 114 is connected to the frame 4, and the elastic direction of the first elastic member 114 is the X direction; and / or the second adjustment component 21 includes a second elastic member 214, one end of the second elastic member 214 is connected to the second adjustment block 211, the other end of the second elastic member 214 is connected to the frame 4, and the elastic direction of the second elastic member 214 is the Y direction.

[0083] like Figures 1-6 As shown, the first adjustment assembly 11 includes a first elastic member 114. The two ends of the first elastic member 114 are respectively connected to the first adjustment block 111 and the first side plate 41, and the elastic direction of the first elastic member 114 is the X direction. When the first elastic member 114 is in a normal state, the first adjustment blocks 111 of the two first adjustment mechanisms 1 are in abutment. When the shape of the cavity 3 needs to be formed, the first adjustment block 111 moves in the X direction and compresses the first elastic member 114.

[0084] It is further explained that before the shape of the cavity 3 is formed, the mold needs to be embedded in the sputtering tooling 100. At this time, the first adjusting block 111 moves along the X- or X+ direction, and the first adjusting block 111 compresses the first elastic member 114. The first elastic member 114 will give the first adjusting block 111 an elastic force in the opposite direction of movement, so that the end of the first adjusting block 111 can abut against the mold, thereby reducing the dimensional error of the shape of the cavity 3 formed by the sputtering tooling 100, so as to improve the accuracy of the sputtering tooling 100.

[0085] like Figures 1-6 As shown, the second adjustment assembly 21 includes a second elastic member 214. The two ends of the second elastic member 214 are respectively connected to the second adjustment block 211 and the second side plate 42, and the elastic direction of the second elastic member 214 is the Y direction. When the second elastic member 214 is in a normal state, the second adjustment blocks 211 of the two second adjustment mechanisms 2 are in abutment. When the shape of the cavity 3 needs to be formed, the second adjustment block 211 moves in the X direction and compresses the second elastic member 214.

[0086] It is further explained that before the shape of the cavity 3 is formed, the mold needs to be embedded in the sputtering tooling 100. At this time, the second adjusting block 211 moves along the Y- or Y+ direction, and the second adjusting block 211 compresses the second elastic member 214. The second elastic member 214 will give the second adjusting block 211 an elastic force in the opposite direction of movement, so that the end of the second adjusting block 211 can abut against the mold, thereby reducing the dimensional error of the shape of the cavity 3 formed by the sputtering tooling 100, so as to improve the accuracy of the sputtering tooling 100.

[0087] To further illustrate, the first elastic member 114 and the second elastic member 214 may be tension springs or coil springs.

[0088] In this embodiment, the sputtering tool further includes a control mechanism, which is capable of receiving a preset shape and controlling the first adjustment component 11 and the second adjustment component 21 to move to form the shape of the cavity 3 that is the same as the preset shape.

[0089] In one embodiment, the first adjustment component 11 further includes a first drive component and a first adjustment block 111, the drive end of the first drive component is connected to the first adjustment block 111, the control mechanism is communicatively connected to the first drive component, and the control mechanism is used to control the first drive component to drive the first adjustment block 111 to move in the X direction; and / or the second adjustment component 21 further includes a second drive component and a second adjustment block 211, the drive end of the second drive component is connected to the second adjustment block 211, the control mechanism is communicatively connected to the second drive component, and the control mechanism is used to control the second drive component to drive the second adjustment block 211 to move in the Y direction.

[0090] To further illustrate, the first adjustment assembly 11 further includes a first driving assembly and a first adjustment block 111 . The driving end of the first driving assembly is connected to the first adjustment block 111 , and the first driving assembly can drive the first adjustment block 111 to move in the X direction.

[0091] To further illustrate, the second adjustment component 21 further includes a second driving component and a second adjustment block 211 . The driving end of the second driving component is connected to the second adjustment block 211 , and the second driving component can drive the second adjustment block 211 to move in the Y direction.

[0092] The first drive assembly and the second drive assembly are both communicatively connected to the control mechanism. When the control mechanism receives the required shape of the sputtering area, the control mechanism sends a control signal to the first drive assembly and the second drive assembly. The first drive assembly drives the first adjustment block 111 to move in the X direction, and the second drive assembly drives the second adjustment block 211 to move in the Y direction. By moving the first adjustment block 111 and the second adjustment block 211, a cavity 3 with the same shape as the sputtering area is formed.

[0093] To further illustrate, the first drive assembly and the second drive assembly may be motors, hydraulic cylinders or pneumatic cylinders.

[0094] In one embodiment, the first adjustment component 11 includes a first adjustment block 111, a first magnet and a first magnetic induction coil, and the first magnet is arranged inside the first adjustment block 111; the second adjustment component 21 includes a second adjustment block 211, a second magnet and a second magnetic induction coil, and the second magnet is arranged inside the second adjustment block 211; the control mechanism is electrically connected to the first magnetic induction coil and the second magnetic induction coil, respectively, and the control mechanism drives the first adjustment block 111 to move in the X direction by controlling the current of the first magnetic induction coil, and the control mechanism drives the second adjustment block 211 to move in the Y direction by controlling the current of the second magnetic induction coil.

[0095] Further description, the first adjustment component 11 includes a first adjustment block 111, a first magnet and a first magnetic induction coil, wherein the first magnet is arranged inside the first adjustment block 111, and the first magnetic induction coil is arranged adjacent to the first adjustment block 111; the second adjustment component 21 includes a second adjustment block 211, a second magnet and a second magnetic induction coil, wherein the second magnet is arranged inside the second adjustment block 211, and the second magnetic induction coil is arranged adjacent to the second adjustment block 211.

[0096] To further illustrate, the control mechanism is electrically connected to the first magnetic induction coil and the second magnetic induction coil, respectively. The control mechanism controls the current of the first magnetic induction coil to control the magnetism of the first magnetic induction coil, thereby controlling the movement distance of the first adjustment block 111, where the first magnet corresponding to the first magnetic induction coil resides, in the X direction. The control mechanism controls the current of the second magnetic induction coil to control the magnetism of the second magnetic induction coil, thereby controlling the movement distance of the second adjustment block 211, where the second magnet corresponding to the second magnetic induction coil resides, in the Y direction. Upon receiving the desired sputtering area shape, the control mechanism sends control signals to the first and second magnetic induction coils. By controlling the currents of the first and second magnetic induction coils, the control mechanism controls the magnetic forces of the first and second magnetic induction coils, thereby controlling the movement distance of the first adjustment block 111 in the X direction and the movement distance of the second adjustment block 211 in the Y direction. By moving the first and second adjustment blocks 111 and 211, a cavity 3 having the same shape as the sputtering area is formed.

[0097] In this embodiment, the ends of the first adjustment blocks 111 of the two first adjustment mechanisms 1 that are opposite to each other and close to the second adjustment mechanism 2 have a first angle a with the horizontal plane, and the first angle a is an acute angle;

[0098] Ends of the second adjustment blocks 211 of the two second adjustment mechanisms 2 that are opposite to and away from the first adjustment mechanism 1 form a second angle b with the horizontal plane, and the second angle b is an acute angle.

[0099] like Figure 7 As shown, the first adjustment blocks 111 of the two first adjustment mechanisms 1 are opposite to each other, and a first angle a is formed between the end close to the second adjustment mechanism 2 and the horizontal plane in the X direction, wherein the first angle a is an acute angle; Figure 8 As shown, the second adjustment blocks 211 of the two second adjustment mechanisms 2 are opposite to each other and away from the end of the first adjustment mechanism 1 and have a second angle b with the horizontal plane in the Y direction, wherein the second angle b is an acute angle; therefore, the cavity 3 formed after the first adjustment mechanism 1 moves in the X direction and the second adjustment mechanism 2 moves in the Y direction has an upper opening and a lower opening in the Z direction, wherein the upper opening is larger than the lower opening, and the sputtering area of ​​the semiconductor is located at the lower opening. During sputtering, the metal layer formed in the sputtering area can be made more uniform, and the edge can be prevented from being blocked by the tooling.

[0100] The second aspect of the embodiment of the present application provides a sputtering tool assembly for semiconductors, comprising: a tool frame and the sputtering tool 100, wherein a plurality of the sputtering tools 100 are arranged in the tool frame, thereby enabling sputtering of multiple semiconductors at the same time.

[0101] Although some specific embodiments of the present application have been described in detail by way of examples, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present application. It should be understood by those skilled in the art that the above embodiments may be modified without departing from the scope and spirit of the present application. The scope of the present application is defined by the appended claims.

Claims

1. A sputtering tool for semiconductors, characterized in that: include: Two first adjustment mechanisms are arranged symmetrically along the Y-axis, wherein the first adjustment mechanisms include a plurality of first adjustment components arranged side by side along the Y-axis, and the first adjustment components are movable in the X-direction; Two second adjustment mechanisms symmetrically arranged along the X-axis, the second adjustment mechanisms being arranged below the first adjustment mechanism, the second adjustment mechanisms comprising a plurality of second adjustment components arranged side by side along the X-direction, the second adjustment components being movable in the Y-direction; The first adjustment component is movable in the X direction, and the second adjustment component is movable in the Y direction, so as to adjust the shape of the cavity formed by the first adjustment component and the second adjustment component; The sputtering tool further includes a frame having a first side plate arranged opposite to each other in the Y direction and a second side plate arranged opposite to each other in the X direction; the first side plate is provided with a first fixing rod arranged along the Y direction, and the second side plate is provided with a second fixing rod arranged along the X direction; The first adjustment assembly includes a first adjustment block, wherein two side walls of the first adjustment block opposite to each other in the Y direction are provided with first limiting through holes extending in the X direction, and the first fixing rod passes through the first limiting through holes. The first limiting through holes are movable relative to the first fixing rod, and the first limiting through holes and the first fixing rod are lockable. The second adjustment assembly includes a second adjustment block, and the second adjustment block is provided with a second limiting through hole extending along the Y direction on two side walls opposite to each other in the X direction. The second fixing rod passes through the second limiting through hole. The second limiting through hole can move relative to the second fixing rod, and the second limiting through hole and the second fixing rod can be locked.

2. The sputtering tool according to claim 1, wherein: The sputtering tool further includes a control mechanism, which is capable of receiving a preset shape and controlling the first adjustment component and the second adjustment component to move to form the cavity shape that is the same as the preset shape.

3. The sputtering tool according to claim 1, wherein: The first adjustment assembly further includes a first locking member, the first locking member is sleeved on the first fixing rod, and the first locking member is used to fix the position of the first adjustment block; and / or The second adjustment assembly further includes a second locking member, which is sleeved on the second fixing rod and is used to fix the position of the second adjustment block.

4. The sputtering tool according to claim 1, wherein: A plurality of first limiting portions arranged side by side along the X direction are provided in the first limiting through hole, and when the first adjustment block moves in the X direction, the first fixing rod can be engaged with the corresponding first limiting portion; and / or A plurality of second limiting portions arranged side by side along the Y direction are provided in the second limiting through hole. When the second adjustment block moves in the Y direction, the second fixing rod can be engaged with the corresponding second limiting portion.

5. The sputtering tool according to claim 4, characterized in that: The first limiting portions are serrated, and the first fixing rod can be clamped between two adjacent serrations. The plurality of second limiting portions are sawtooth-shaped, and the second fixing rod can be clamped between two adjacent sawteeth.

6. The sputtering tool according to claim 1, wherein: The first adjustment assembly includes a first elastic member, one end of the first elastic member is connected to the first adjustment block, the other end of the first elastic member is connected to the frame, and the elastic direction of the first elastic member is the X direction; and / or The second adjustment component includes a second elastic member, one end of the second elastic member is connected to the second adjustment block, the other end of the second elastic member is connected to the frame, and the elastic direction of the second elastic member is the Y direction.

7. The sputtering tool according to claim 2, wherein: The first adjustment assembly further includes a first drive assembly and a first adjustment block, wherein a drive end of the first drive assembly is connected to the first adjustment block, and the control mechanism is communicatively connected to the first drive assembly, and the control mechanism is used to control the first drive assembly to drive the first adjustment block to move in the X direction; and / or The second adjustment component also includes a second drive component and a second adjustment block. The drive end of the second drive component is connected to the second adjustment block. The control mechanism is communicatively connected to the second drive component. The control mechanism is used to control the second drive component to drive the second adjustment block to move in the Y direction.

8. The sputtering tool according to claim 2, wherein: The first adjustment assembly includes a first adjustment block, a first magnet and a first magnetic induction coil, wherein the first magnet is disposed inside the first adjustment block; The second adjustment assembly includes a second adjustment block, a second magnet and a second magnetic induction coil, wherein the second magnet is disposed inside the second adjustment block; The control mechanism is electrically connected to the first magnetic induction coil and the second magnetic induction coil, respectively. The control mechanism drives the first adjustment block to move in the X direction by controlling the current of the first magnetic induction coil, and drives the second adjustment block to move in the Y direction by controlling the current of the second magnetic induction coil.

9. The sputtering tool according to any one of claims 1 to 8, characterized in that: The ends of the first adjustment blocks of the two first adjustment mechanisms that are opposite to each other and close to the second adjustment mechanism have a first angle with a horizontal plane, and the first angle is an acute angle; Ends of the second adjustment blocks of the two second adjustment mechanisms that are opposite to and away from the first adjustment mechanism have a second angle with the horizontal plane, and the second angle is an acute angle.

10. A sputtering tooling assembly for semiconductors, characterized in that: include: Tooling frame; A plurality of sputtering tools according to any one of claims 1 to 9, wherein the plurality of sputtering tools are arranged in the tool frame.

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