Residue removal composition, sensitive skin amino acid facial cleanser and preparation method thereof

Abstract

The present application relates to the technical field of toiletries, and specifically discloses a residue removal composition, a sensitive skin amino acid facial cleanser, and a preparation method thereof. A residue removal composition comprises the following raw materials in parts by weight stored separately: 15-30 parts of disodium lauryl sulfosuccinate; 1-5 parts of decyl glucoside; and 0.1-1 parts of glycolipids. The residue removal composition can be used in toiletries, preferably in facial cleansers. The residue removal composition of the present application not only has good hard water resistance, is easy to pass through water, improves the residue of surfactants on the skin surface, but also can reduce the irritation of the application system used, and thus has excellent applicability as a whole when targeting sensitive skin populations.

Description

Technical Field

[0001] The present application relates to the technical field of toiletries, and more specifically, to a residue removal composition, a sensitive skin amino acid cleanser, and a preparation method thereof. Background Art

[0002] Toiletries include: facial cleansing products, skin care products, shampoo products, hair care products, etc., and facial cleanser is a common type of toiletry product. The surfactant in facial cleanser is the main active ingredient in cleansing products. It can remove dirt on the surface of facial skin, keep the skin fresh and comfortable, and help maintain the normal physiological functions of the skin. However, the residual surfactant will also cause certain irritation to the skin.

[0003] During use, facial cleansers can dissolve oil-soluble facial dirt and excess oil with their oil phase, and dissolve water-soluble facial sweat and dirt with their water phase. Among these, the best-selling products on the market are mainly those based on amino acid surfactants. They have good moisturizing properties after use and do not leave the skin feeling tight after washing, making them popular among consumers. However, after application and rinsing, they tend to remain on the skin surface, reacting with oxygen or deposited molecules in the air. When exposed to sunlight or when bacteria are present on the skin, various physical, chemical, and biochemical reactions occur, forming irritants that can damage the skin. This is especially true for people with sensitive skin, as they can easily damage the skin's barrier function, leading to a series of skin problems.

[0004] Therefore, it is urgent to propose a solution to solve the above technical problems. Summary of the Invention

[0005] In order to reduce the residue left after washing of toiletries and make them more suitable for people with sensitive skin, the present application provides a residue removal composition, an amino acid cleanser for sensitive skin and a preparation method thereof.

[0006] In the first aspect, the present application provides a residue removal composition, which adopts the following technical solution:

[0007] A residue removal composition comprises the following raw materials in parts by weight stored separately:

[0008] 15-30 parts of disodium lauryl sulfosuccinate;

[0009] 1-5 parts of decyl glucoside;

[0010] 0.1-1 part of glycolipids.

[0011] By adopting the above technical solution, disodium lauryl sulfosuccinate is a relatively mild surfactant that has foaming and cleansing effects; decyl glucoside has the characteristics of both ordinary nonionic and anionic surfactants, can reduce the irritation of other surfactants, and has the effect of thickening and increasing moisturizing properties; glycolipid is a water-soluble lipid substance that can improve the skin barrier and has a soothing effect on irritation; and when disodium lauryl sulfosuccinate, decyl glucoside and glycolipid are used as a residue removal composition within the above-mentioned dosage range, they can have an excellent compounding and synergistic effect with each other, not only having good hard water resistance, easy water rinsing, improving the residue of surfactants on the skin surface, but also reducing the irritation of the application system used, and thus having excellent overall applicability when targeting people with sensitive skin.

[0012] Preferably, the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.5.

[0013] By adopting the above technical solution, when disodium lauryl sulfosuccinate, decyl glucoside and glycolipid in the above weight ratio are used as a residue removal composition, the cooperation effect between them is relatively excellent. After application, the irritation of the product to the skin can be greatly reduced, and the residue of the product after application and rinsing is also greatly reduced, and the applicability for people with sensitive skin is relatively excellent.

[0014] Preferably, trehalose and panthenol are further added to the raw materials of the residue removal composition, and the weight proportions of the raw materials are as follows:

[0015] Trehalose 0.5-2 parts;

[0016] Panthenol 0.5-1 parts.

[0017] By adopting the above technical solution, trehalose has a strong moisturizing effect, and can deeply clean facial dirt, oil, makeup residues, etc., and stabilize the skin condition; panthenol is a water-soluble, stable, small molecular weight active ingredient with excellent moisturizing effect, which can combine water and oil and maintain their stability; and the introduction of trehalose and panthenol into the residue removal composition and their combination can, on the one hand, improve the skin barrier function of people with sensitive skin, and on the other hand, reduce the irritation of surfactants in toiletries, thereby making the product obtained by applying the residue removal composition more suitable for people with sensitive skin, less likely to cause skin damage, and more stable.

[0018] Preferably, the following raw materials in parts by weight are contained separately:

[0019] 20 parts of disodium lauryl sulfosuccinate;

[0020] 3 parts of decyl glucoside;

[0021] 0.5 parts of glycolipids;

[0022] 1 part of trehalose;

[0023] 0.6 parts of panthenol.

[0024] By adopting the above technical solution, when the above-mentioned raw materials in parts by weight are used as a residue removal composition, the synergistic effect between each other is relatively excellent, which can enable the product obtained by application to have lower residue and lower irritation, and show relatively excellent applicability for people with sensitive skin.

[0025] In a second aspect, the present application provides an amino acid facial cleanser for sensitive skin, which adopts the following technical solution:

[0026] A sensitive skin amino acid facial cleanser, using the above-mentioned residue removal composition, is prepared from the following raw materials in parts by weight:

[0027] 5-15 parts water;

[0028] 10-20 parts of moisturizer;

[0029] 0.03-0.08 parts of chelating agent;

[0030] Thickener 0.5-1 part;

[0031] 0.2-0.5 parts of antioxidant;

[0032] 15-30 parts of disodium lauryl sulfosuccinate;

[0033] 5-10 parts of sodium methyl lauroyl taurate;

[0034] 1-5 parts of sodium cocoyl glycinate;

[0035] 0.1-0.5 parts of pH regulator;

[0036] 1-5 parts of decyl glucoside;

[0037] 5-15 parts of sodium methyl cocoyl taurate;

[0038] 1-5 parts of cocamidopropyl betaine;

[0039] 1-5 parts of stabilizer;

[0040] Trehalose 0.5-2 parts;

[0041] Glycolipid 0.1-1 part;

[0042] 0.5-1 part of sodium PCA;

[0043] 0.5-1 part panthenol;

[0044] Sodium hyaluronate 0.01-0.05 parts;

[0045] Proline 0.5-1 part;

[0046] Hydroxyproline 0.5-1 part;

[0047] 0.5-1 part of 1,2-hexanediol;

[0048] 0.05-0.2 parts of octanoylhydroxamic acid;

[0049] Glyceryl caprylate 0.5-1 part;

[0050] 2-6 parts of 1,3-propylene glycol;

[0051] 0.05-0.2 parts of fragrance.

[0052] By adopting the above technical scheme, in the above facial cleanser, disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, decyl glucoside, sodium methyl cocoyl taurate and cocamidopropyl betaine are used in combination as surfactants, which can exert a relatively excellent and stable cleaning effect; the use of glycolipids, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1,2-hexanediol can help the skin retain moisture and humidity and maintain the stability of the skin barrier function; wherein, the residue removal composition is used in the facial cleanser, so that the obtained facial cleanser has less surfactant residue after application and rinsing, and is not easy to cause greater irritation to the skin of people with sensitive skin, and is more gentle and stable to use, and has stronger applicability.

[0053] Preferably, the raw materials of the sensitive skin amino acid facial cleanser are further added with 2-5 parts by weight of a conditioning aid, the conditioning aid is composed of oligosaccharide chitosan and gelatin, and the weight ratio of oligosaccharide chitosan to gelatin is 1:(1.6-2.4).

[0054] By adopting the above technical solution, oligochitosan has the effects of helping to gently cleanse the skin, moisturize, and have antibacterial and anti-oxidant effects; gelatin has a promoting effect on maintaining the stability of the skin barrier function; and when oligochitosan and gelatin are used as a regulating auxiliary agent in a specific weight ratio, in addition to being able to stably exert their own effects, they can also create a relationship between the various surfactants in the facial cleanser, which is not easy to remain on the skin surface after rinsing, and the various surfactants with less residue are not easy to further form irritating substances under the action of the regulating auxiliary agent. In this way, the low residue and low irritation effect of the facial cleanser after application can be made better, and it is more suitable for people with sensitive skin.

[0055] Preferably, the weight ratio of the oligochitosan to gelatin is 1:2.

[0056] By adopting the above technical solution, the regulating auxiliary agent composed of oligochitosan and gelatin in the above weight ratio has a relatively excellent effect when used in facial cleansers, can further reduce the residual surfactants, and has lower irritation to the skin of people with sensitive skin, and the resulting facial cleanser has a correspondingly higher quality.

[0057] In a third aspect, the present application provides a method for preparing an amino acid facial cleanser for sensitive skin, which adopts the following technical solution:

[0058] A method for preparing an amino acid facial cleanser for sensitive skin, comprising the following steps:

[0059] (1) Prepare the raw materials of component A, component B, component C, component D and component E according to the proportions, component A includes water, moisturizer, chelating agent, thickener and antioxidant; component B includes disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, pH regulator, decyl glucoside and sodium methyl cocoyl taurate; component C includes cocamidopropyl betaine and stabilizer; component D includes trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1,2-hexanediol; component E includes caprylhydroxamic acid, glyceryl caprylate, 1, 3-propylene glycol and fragrance (2) are mixed with the raw materials of component A in step (1), heated to 80-85° C. and stirred. After dissolving and mixing evenly, the temperature is kept constant for 15-30 minutes, and stirring is continuously performed during the process; then, when the temperature is lowered to 70-75° C., the raw materials of component B are added, and stirring and mixing evenly; when the temperature is lowered to 60-65° C., the raw materials of component C are added, and stirring and mixing evenly; when the temperature is lowered to 45-50° C., the raw materials of component D are added, and stirring and mixing evenly; when the temperature is lowered to 38-42° C., the raw materials of component E are added, and stirring and mixing evenly; finally, the materials are discharged to obtain the amino acid facial cleanser for sensitive skin.

[0060] By adopting the above technical solution, the above preparation method is simple to operate and is convenient for large-scale process production. The raw materials are grouped and added and mixed, which facilitates quality control during the process and is conducive to obtaining a facial cleanser of excellent quality. At the same time, when the raw materials of each component are added and mixed, different temperature controls are adopted, which is conducive to the full combination of the components and is more conducive to the residue removal composition to play a stable role in the mixed system, thereby obtaining a facial cleanser product with less residue, less irritation, and more suitable for people with sensitive skin.

[0061] In summary, this application has the following beneficial effects:

[0062] 1. Since the present application uses disodium lauryl sulfosuccinate, decyl glucoside and glycolipids in a specific dosage range as a residue removal composition, they can have an excellent compound synergistic effect with each other, not only having good hard water resistance, easy water washing, improving the residue of surfactants on the skin surface, but also reducing the irritation of the application system used, and thus having excellent applicability for people with sensitive skin;

[0063] 2. The present application introduces trehalose and panthenol into the residue removal composition, and through the combination of the two, it can synergistically reduce the irritation of surfactants in toiletries and help maintain the stability of the skin barrier function. As a result, the product obtained by using the residue removal composition is more suitable for people with sensitive skin, is less likely to cause skin damage, and is more stable.

[0064] 3. When the residue removal composition is applied to facial cleanser products, by adding a regulating auxiliary agent composed of oligochitosan and gelatin in a specific weight ratio range, the various surfactants in the facial cleanser are not easily left on the skin surface after rinsing, and the various surfactants with less residue are not easy to further form irritating substances. In this way, the low residue and low irritation effects of the facial cleanser after application can be made better, and it is more suitable for people with sensitive skin. DETAILED DESCRIPTION

[0065] The present application is further described in detail below with reference to the embodiments.

[0066] Unless otherwise specified, the raw materials used in the preparation examples and embodiments of this application are commercially available:

[0067] Glycolipids were purchased from Deguan Biotechnology, daily chemical grade bioglycolipids, product number SLMP 3150;

[0068] Oligosaccharide was purchased from Chongqing Tianrun Biological Products Co., Ltd., CAS No. 9012-76-4;

[0069] Gelatin was purchased from Wuhan Jiyesheng Chemical Co., Ltd., CAS No. 9000-70-8.

[0070] Example

[0071] Examples 1-3

[0072] A residue removal composition comprises separately stored component raw materials and their corresponding weights as shown in Table 1.

[0073] Table 1 Raw materials of each component in Examples 1-3 and their weight parts (parts / kg)

[0074]

[0075] Example 4

[0076] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.5.

[0077] Example 5

[0078] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 21:3:0.5.

[0079] Example 6

[0080] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 19:3:0.5.

[0081] Example 7

[0082] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:2.9:0.5.

[0083] Example 8

[0084] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3.1:0.5.

[0085] Example 9

[0086] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.4.

[0087] Example 10

[0088] A residue removal composition is different from Example 1 in that the total weight of the residue removal composition remains unchanged, and the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.6.

[0089] Examples 11-15

[0090] A residue removal composition, which differs from Example 1 in that trehalose and panthenol are further added to the raw materials, comprises separately stored component raw materials and their corresponding weights as shown in Table 2.

[0091] Table 2 Raw materials of each component in Examples 11-15 and their weight parts (parts / kg)

[0092]

[0093] Example 16

[0094] A residue removal composition, which is different from Example 12 in that the raw materials do not contain trehalose.

[0095] Example 17

[0096] A residue removal composition, which differs from Example 12 in that the raw materials do not contain panthenol.

[0097] Example 18

[0098] A sensitive skin amino acid facial cleanser, the components and their corresponding weight percentages of which are shown in Table 3, is prepared by the following steps:

[0099] (1) Prepare the raw materials of component A, component B, component C, component D and component E according to the proportions, wherein component A includes water, moisturizer, chelating agent, thickener and antioxidant; component B includes disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, pH regulator, decyl glucoside and sodium methyl cocoyl taurate; component C includes cocamidopropyl betaine and stabilizer; component D includes trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1,2-hexanediol; component E includes caprylhydroxamic acid, glyceryl caprylate, 1,3-propylene glycol and fragrance

[0100] (2) Mix the raw materials of component A in step (1), heat to 80-85°C and stir, dissolve and mix evenly, keep the temperature constant for 15-30 minutes, and stir continuously during the process; then cool to 70-75°C and add the raw materials of component B, stir and mix evenly; cool to 60-65°C and add the raw materials of component C, stir and mix evenly; cool to 45-50°C and add the raw materials of component D, stir and mix evenly; cool to 38-42°C and add the raw materials of component E, stir and mix evenly; finally discharge the materials to obtain the sensitive skin amino acid facial cleanser.

[0101] Note: In the above operation, the mixing and heating temperature of component A is preferably 80°C, the stirring speed is 15r / min, the stirring time is 10min, and the constant temperature time is 20min; then preferably the temperature is lowered to 70°C and the raw material of component B is added, the stirring speed is 15r / min, and the stirring time is 10min; then preferably the temperature is lowered to 60°C and the raw material of component C is added, the stirring speed is 15r / min, and the stirring time is 5min; then preferably the temperature is lowered to 50°C and the raw material of component D is added, the stirring speed is 15r / min, and the stirring time is The mixture is preferably cooled to 40°C and the raw materials of component E are added with a stirring speed of 15 r / min for 10 min. The residue removal composition used is composed of disodium lauryl sulfosuccinate, decyl glucoside and glycolipids. The moisturizer used is glycerin. The chelating agent used is disodium EDTA. The thickener used is PEG-120 methyl glucose dioleate. The antioxidant used is p-hydroxyacetophenone. The pH adjuster used is citric acid. The stabilizer used is sodium chloride. The fragrance used is an essence, which is citronellol.

[0102] Examples 19-20

[0103] A sensitive skin amino acid facial cleanser, which is different from Example 18 in that its component raw materials and their corresponding weight parts are shown in Table 3.

[0104] Table 3 Raw materials of each component in Examples 18-20 and their weight parts (parts / kg)

[0105]

[0106]

[0107] Example 21

[0108] A sensitive skin amino acid facial cleanser is different from Example 18 in that 3.5 parts by weight of a regulating aid are also added to the raw materials. The regulating aid is composed of oligochitosan and gelatin in a weight ratio of 1:2, and is added together with the C component raw material.

[0109] Example 22

[0110] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the weight portion of the regulating auxiliary agent added is 2 parts.

[0111] Example 23

[0112] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the weight portion of the regulating auxiliary agent added is 5 parts.

[0113] Example 24

[0114] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the regulating auxiliary agent is composed of oligosaccharide chitosan and gelatin in a weight ratio of 1:1.6.

[0115] Example 25

[0116] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the regulating auxiliary agent is composed of oligosaccharide chitosan and gelatin in a weight ratio of 1:2.4.

[0117] Example 26

[0118] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the regulating auxiliary agent is composed of oligosaccharide chitosan and gelatin in a weight ratio of 1:1.5.

[0119] Example 27

[0120] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the regulating auxiliary agent is composed of oligosaccharide chitosan and gelatin in a weight ratio of 1:2.5.

[0121] Example 28

[0122] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the raw materials do not contain oligosaccharides.

[0123] Example 29

[0124] A sensitive skin amino acid facial cleanser, which is different from Example 21 in that the raw materials do not contain gelatin.

[0125] Comparative Example

[0126] Comparative Examples 1-6

[0127] A residue removal composition comprises separately stored component raw materials and their corresponding weights as shown in Table 4.

[0128] Table 4 Comparative Examples 1-6 Raw materials and their weight parts (parts / kg)

[0129]

[0130]

[0131] Comparative Example 7

[0132] A sensitive skin amino acid facial cleanser, which differs from Example 18 in that disodium lauryl sulfosuccinate is replaced by water.

[0133] Comparative Example 8

[0134] A sensitive skin amino acid facial cleanser, which is different from Example 18 in that decyl glucoside is replaced by water.

[0135] Comparative Example 9

[0136] A sensitive skin amino acid facial cleanser, which differs from Example 18 in that glycolipids and other substances are replaced by water.

[0137] Comparative Example 10

[0138] A sensitive skin amino acid facial cleanser, which is different from Example 18 in that disodium lauryl sulfosuccinate, decyl glucoside and other ingredients are replaced by water.

[0139] Comparative Example 11

[0140] A sensitive skin amino acid facial cleanser, which is different from Example 18 in that glycolipids, decyl glucoside and other substances are replaced by water.

[0141] Comparative Example 12

[0142] A sensitive skin amino acid facial cleanser, which is different from Example 18 in that disodium lauryl sulfosuccinate, glycolipids and other substances are replaced by water.

[0143] Comparative Example 13

[0144] A sensitive skin amino acid facial cleanser, which differs from Example 18 in that the mass of the residual composition is replaced by water.

[0145] Performance testing

[0146] Test samples: Disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid from the residue removal composition of Examples 1-10 were applied to the amino acid facial cleanser for sensitive skin of Example 18, and the amino acid facial cleanser for sensitive skin prepared by the same method was used as test samples 1-10;

[0147] The disodium lauryl sulfosuccinate, decyl glucoside, and glycolipid in Example 18 were replaced with the corresponding parts by weight of the raw materials in Examples 11-17, and corresponding parts by weight of oligochitosan and gelatin were added to prepare the sensitive skin amino acid cleansing milk as test samples 11-17;

[0148] Sensitive skin amino acid cleansing milk obtained using Examples 18-29 was used as test samples 18-29;

[0149] The disodium lauryl sulfosuccinate, decyl glucoside and glycolipids from the residual composition of Comparative Examples 1-6 were applied to the sensitive skin amino acid facial cleanser of Example 18, and the sensitive skin amino acid facial cleanser prepared by the same method was used as control sample 1-6; the sensitive skin amino acid facial cleanser obtained by comparative examples 7-13 was used as control sample 7-13.

[0150] Experimental method: (1) Residue test: take an artificial skin, 30 cm long and 20 cm wide, wet the artificial skin with water, apply 2 g of sensitive skin amino acid cleanser, rub for 2 minutes, and rinse with water three times to obtain a test artificial skin; rinse the test artificial skin with 60 ml of distilled water in a cycle, and grind the surface of the artificial skin with a glass rod during the rinsing process for five minutes to obtain a test solution; then use a Thermo Fisher UltiMateTM 3000 series liquid chromatography Corona Veo (RS) charged aerosol detector to measure the surfactant content in the test solution; use the above test method to test test samples 1-29 and control samples 1-13.

[0151] (2) 84 sensitive skin testers aged 18 to 50 were selected. Those who had not participated in drug clinical trials or other cosmetic efficacy evaluations in the past two months were excluded. Pregnant or breastfeeding women were excluded. Those who were at risk of allergy or hypersensitivity to cosmetics were excluded. Those who had acute inflammation, immunodeficiency, or other skin diseases in the test area were excluded. 42 groups were divided into two groups and the following tests were performed using test samples 1-29 and control samples 1-13:

[0152] The skin surface is usually in a weakly acidic state, with a pH range of 4.5-6.5. First, the test population was tested for skin pH using the ASCH ASP-02 skin pH tester, and the initial pH value was recorded to ensure that it was within the normal pH range. Then, 1.5g of Sensitive Skin Amino Acid Facial Cleanser was used each time, once in the morning, noon, and evening for five days. The skin pH was tested again to obtain the test pH value, and the skin pH change rate (%) was calculated, where skin pH change rate (%) = (test pH value - initial pH value) / initial pH value. The absolute value is taken. The greater the change rate, the greater the skin irritation.

[0153] Table 5 Test results of test samples 1-29 and control samples 1-13

[0154]

[0155]

[0156]

[0157] Combining Examples 1-3 and Comparative Examples 1-6 with Table 5, it can be seen that when disodium lauryl sulfosuccinate is used in an amount of 15-30 parts, decyl glucoside is used in an amount of 1-5 parts, and glycolipid is used in an amount of 0.1-1 parts, the resulting residue-removing composition exhibits low irritation to people with sensitive skin and leaves less residual surfactant. However, when the amount of any of the raw materials exceeds the above range, the measured residual surfactant amount (mg) increases, the skin pH change rate (%) increases, and the overall quality is significantly reduced.

[0158] In combination with Example 1, Example 4 and Examples 5-10 and Table 5, it can be seen that the weight ratio of disodium lauryl sulfosuccinate, decyl glucoside and glycolipid is 20:3:0.5, and the obtained residue removal composition has the best effect after application. The obtained facial cleanser has the best surfactant residue (mg) and skin pH change rate (%) measured in the experiment. When the ratio of one of the raw materials is changed, whether the ratio is increased or decreased, the application effect of the residue removal composition will be significantly reduced.

[0159] In combination with Example 1, Examples 11-15 and Table 5, it can be seen that the introduction of trehalose and panthenol into the residue removal composition allows the resulting facial cleanser to exhibit lower surfactant residue and lower irritation when used for people with sensitive skin. Among them, when 20 parts of disodium lauryl sulfosuccinate, 3 parts of decyl glucoside, 0.5 parts of glycolipids, 1 part of trehalose, and 0.6 parts of panthenol are taken, the resulting residue removal composition has the best application effect in the facial cleanser. In combination with Examples 16-17 and Table 5, it can be seen that trehalose and panthenol can play an excellent synergistic role in compounding. The addition of trehalose or panthenol alone is far inferior to the excellent effect of the combination of the two in terms of low residue and low irritation.

[0160] Combining Example 18 and Comparative Examples 7-13 with Table 5, it can be seen that disodium lauryl sulfosuccinate, decyl glucoside, and glycolipids can have an excellent compound synergistic effect. If the residue removal composition is not used in the facial cleanser, the surfactant residue (mg) and the skin pH change rate (%) obtained by the test are both high; and using one of them can evenly bring about the corresponding improvement effect. Using any two of them in combination is just a simple superposition of the effects. When the three are compounded, the surfactant residue (mg) and the skin pH change rate (%) can bring a larger positive improvement effect, and it is much higher than the sum of the improvement effects brought by the use of the three raw materials alone, and the overall application effect is outstanding.

[0161] In combination with Example 18 and Example 21-25 and Table 5, it can be seen that when the residue removal composition is applied to a facial cleanser product, by adding a regulating aid composed of oligochitosan and gelatin in a weight ratio of 1: (1.6-2.4), the surfactant residue and skin irritation of the facial cleanser can be further reduced, wherein when the oligochitosan and gelatin are in a weight ratio of 1: 2, the effect is more excellent. In combination with Examples 26-29 and Table 5, it can be seen that when the weight ratio of oligochitosan and gelatin exceeds the above range, the low residue and low irritation of the facial cleanser will be greatly lost. When any one of oligochitosan and gelatin is added and used alone, the improvement of low residue and low irritation is not good, and is far less than the excellent improvement effect brought by the compounding of the two.

[0162] This specific embodiment is merely an explanation of the present application and is not a limitation of the present application. After reading this specification, those skilled in the art may make non-creative modifications to the present embodiment as needed, but as long as they are within the scope of the claims of the present application, they are protected by the patent law.

Claims

1. A sensitive skin amino acid facial cleanser, characterized by: Made from the following raw materials in parts by weight: 5-15 parts water; 10-20 parts of moisturizer; 0.03-0.08 parts of chelating agent; Thickener 0.5-1 part; 0.2-0.5 parts of antioxidant; 15-30 parts of disodium lauryl sulfosuccinate; 5-10 parts of sodium methyl lauroyl taurate; 1-5 parts of sodium cocoyl glycinate; 0.1-0.5 parts of pH regulator; 1-5 parts of decyl glucoside; 5-15 parts of sodium methyl cocoyl taurate; 1-5 parts of cocamidopropyl betaine; 1-5 parts of stabilizer; Trehalose 0.5-2 parts; Glycolipid 0.1-1 part; Sodium PCA 0.5-1 part; 0.5-1 part panthenol; Sodium hyaluronate 0.01-0.05 parts; Proline 0.5-1 part; Hydroxyproline 0.5-1 part; 0.5-1 part of 1,2-hexanediol; 0.05-0.2 parts of octanoylhydroxamic acid; Glyceryl caprylate 0.5-1 part; 2-6 parts of 1,3-propylene glycol; 0.05-0.2 parts of fragrance; 2-5 parts of conditioning agent; The regulating auxiliary agent is composed of oligomolecular chitosan and gelatin, and the weight ratio of oligomolecular chitosan to gelatin is 1:(1.6-2.4); The stabilizer is sodium chloride.

2. The amino acid facial cleanser for sensitive skin according to claim 1, characterized in that: The weight ratio of the oligochitosan to gelatin is 1:

2.

3. The method for preparing the sensitive skin amino acid facial cleanser according to claim 1, wherein: The following steps are involved: (1) Prepare the raw materials of component A, component B, component C, component D, component E and conditioning aid according to the proportions, component A includes water, moisturizer, chelating agent, thickener and antioxidant; component B includes disodium lauryl sulfosuccinate, sodium methyl lauroyl taurate, sodium cocoyl glycinate, pH regulator, decyl glucoside and sodium methyl cocoyl taurate; component C includes cocamidopropyl betaine and stabilizer; component D includes trehalose, glycolipid, sodium PCA, panthenol, sodium hyaluronate, proline, hydroxyproline and 1,2-hexanediol; component E includes caprylhydroxamic acid, glyceryl caprylate, 1,3-propylene glycol and fragrance; (2) Mix the raw materials of component A in step (1), heat to 80-85℃ and stir, dissolve and mix evenly, keep the temperature constant for 15-30min, and stir continuously during the process; then add the raw materials of component B when the temperature is lowered to 70-75℃, and stir and mix evenly; then add the raw materials of component C when the temperature is lowered to 60-65℃, and stir and mix evenly, and add the regulating auxiliary agent together with the raw materials of component C; then add the raw materials of component D when the temperature is lowered to 45-50℃, and stir and mix evenly; then add the raw materials of component E when the temperature is lowered to 38-42℃, and stir and mix evenly; finally, discharge the materials to obtain the amino acid facial cleanser for sensitive skin.

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