Winding processing equipment

Abstract

The present invention provides a winding-type processing device, which includes a unwinding device, a winding device, a processing device and a guide device; the unwinding device is provided with a substrate to be processed, the unwinding device is used to unwind the substrate, the substrate passes through the guide device to the winding device, and the guide device is used to adjust the movement direction of the substrate; the processing device is arranged corresponding to the substrate of the first section, and the guide device abuts against the non-processed surface of the substrate from the first section to the winding device. The winding-type processing device of the present invention provides power for conveying the substrate through the winding device and the unwinding device, adjusts the movement direction of the substrate through the guide device, and processes the substrate through the processing device. By arranging the processing device corresponding to the substrate of the first section and abutting the guide device against the non-processed surface of the substrate from the first section to the winding device, the guide device does not contact the processed surface of the substrate, the impact on the substrate is limited, and the quality of the substrate after processing is guaranteed.

Description

Technical Field

[0001] The present invention relates to the technical field of flexible processing equipment, and in particular to a winding processing equipment. Background Art

[0002] When processing flexible materials, since they can be rolled up, they can be processed continuously in a roll-to-roll manner. The processing specifically includes deposition, etching, surface modification and other processes.

[0003] Coating involves depositing a very thin film layer on the surface of a target object. Roll-to-roll coating involves coating using a reel-to-reel process. In the semiconductor field, coating methods include atomic layer deposition, chemical deposition, and physical deposition. Existing roll-to-roll coating processes for barrier films or other functional thin films typically utilize horizontal coating equipment, which requires a guide device to direct the direction of the flexible material during the coating process.

[0004] However, in the current roll-to-roll method, the treated surface will be contacted by the guide device, which often affects the performance of the treated surface. Moreover, as the treatment method becomes more and more sophisticated and the size continues to shrink, the contact of the guide device often has a greater impact on the performance.

[0005] Based on the above technical problems, it is necessary to design a winding processing equipment that will not affect the surface of the substrate. Summary of the Invention

[0006] The object of the present invention is to provide a roll-to-roll processing device to improve the problem that the performance of the film is affected after the film coating process.

[0007] To achieve the above-mentioned objectives, the present invention provides a winding processing equipment, including a unwinding device, a winding device, a processing device and a guiding device; the unwinding device is provided with a substrate to be processed, and the unwinding device is used to unwind the substrate; the guiding device is arranged on one side of the unwinding device, and the substrate extends to the winding device through the guiding device, the guiding device is used to adjust the movement direction of the substrate, and the winding device is used to wind the substrate; the processing device is arranged corresponding to the substrate of the first section, and the guiding device abuts against the non-processed surface of the substrate from the first section to the winding device.

[0008] The beneficial effects of the winding processing equipment of the present invention are: the power for conveying the substrate is provided by the winding device and the unwinding device, the movement direction of the substrate is adjusted by the guiding device, the substrate is processed by the processing device, and the processing device is arranged corresponding to the first section of the substrate, and the guiding device is abutted against the non-processed surface of the substrate from the first section to the winding device, so that the guiding device will not contact the processed surface of the substrate, the impact on the substrate is limited, and the quality of the substrate after processing is guaranteed.

[0009] In one feasible solution, the guide device includes a first guide assembly and a second guide assembly; the first guide assembly is disposed on one side of the unwinding device, and the substrate extends through the first and second guide assemblies in sequence to the rewinding device. The first and second guide assemblies are both used to adjust the direction of movement of the substrate; the substrate in the first section is located between the first and second guide assemblies, the processing device is used to coat one side of the substrate, and the second guide assembly abuts the untreated surface. The beneficial effect is that since the substrate in the first section is located between the first and second guide assemblies, and the processing device is disposed corresponding to the substrate in the first section, that is, the processing device is disposed between the first and second guide assemblies, or in other words, the second guide assembly is disposed on the substrate between the first section and the rewinding device. By processing one side of the substrate with the processing device, the side of the substrate becomes the treated surface, and the second guide assembly abuts the other side of the substrate, the other side of the substrate becomes the untreated surface, the second guide assembly and the untreated surface can reduce the extent to which the quality of the substrate after coating is affected by the guide assembly, thereby ensuring the quality of the substrate after coating. In addition, the first guide component can be arbitrarily set as needed and can be used flexibly.

[0010] In one feasible solution, the first section of the substrate is partially vertically arranged. This advantageously prevents particles from the equipment from landing on the substrate, thereby preventing them from affecting the performance and appearance of the substrate, and thereby forming a substrate with stable performance.

[0011] In one feasible solution, the processing device is used to process the substrate of the first section; the first section includes a first sub-section and a second sub-section; the substrate of the first sub-section is arranged vertically, and the substrate of the second sub-section is arranged vertically or horizontally; the processing device has a portion corresponding to the side of the substrate of the first sub-section, and the processing device has a portion corresponding to the side or bottom of the substrate of the second sub-section. The beneficial effect is that this arrangement enables the processing device to coat vertically oriented substrates, and particles will not fall on the vertically oriented substrates. When the substrate of the second sub-section is horizontal, the processing device is arranged below the horizontally oriented substrate, so that particles will not fall onto the second sub-section, thereby reducing the impact on the appearance of the substrate, facilitating the layout of the equipment, and improving space utilization.

[0012] In one feasible solution, the processing device and the substrate in the first section are arranged perpendicular to each other. This advantageously provides the following advantages: Specifically, the perpendicular arrangement means that the processing direction of the processing device and the direction of the substrate in the first section are arranged perpendicular to each other, thereby facilitating the arrangement of the first guide assembly, the second guide assembly, and the processing device.

[0013] In a feasible solution, a substrate shape maintaining device is further included. The beneficial effect is that the provision of the substrate shape maintaining device can ensure the flatness of the substrate and ensure the uniformity of the substrate processing by the processing device.

[0014] In a feasible solution, the substrate shape maintaining device is a gas support device; the gas support device is arranged corresponding to the substrate of the first section, and the gas support device is used to output gas acting on the non-treated surface, and the gas is used to offset the force generated by the processing device when processing the substrate.

[0015] The beneficial effect is that the air support device can offset the force of the processing device on the substrate, reduce the influence of the processing device on the substrate, and ensure the quality of the substrate.

[0016] In one feasible solution, the air support device and the substrate in the first section are arranged perpendicular to each other. This arrangement facilitates the installation of the air support device and facilitates the calculation of the force exerted by the air support device on the substrate, thereby balancing the interaction forces between the processing device and the air support device on the substrate.

[0017] In a feasible solution, the processing device is a coating device, which has the beneficial effect of being able to coat the substrate with a film.

[0018] In one feasible solution, the coating device includes a first spray mechanism, a second spray mechanism, and a third guide assembly; the third guide assembly abuts against the uncoated surface of the substrate in the first section and is used to adjust the movement direction of the substrate in the first section; the first and second spray mechanisms are disposed corresponding to the substrate in the first section, and are both used to coat one side of the substrate in the first section. This advantageously allows the first and second spray mechanisms to coat the substrate, while the third guide assembly adjusts the direction of the substrate within the first section, facilitating the installation of the processing device and allowing the first and second spray mechanisms to be set at different angles.

[0019] In a feasible solution, the first spray mechanism and the second spray mechanism are arranged in parallel and / or symmetrically. The beneficial effect is that such an arrangement facilitates the arrangement of the first spray mechanism and the second spray mechanism, and facilitates improving the uniformity of the coating.

[0020] In one feasible solution, a first heating device is further included; the first heating device is disposed corresponding to the substrate between the unwinding device and the processing device, and is used to heat the substrate. This advantageously allows the first heating device to preheat the substrate, drying out moisture on the substrate and raising the substrate temperature when the processing device sprays the substrate, thereby improving the quality of the treatment.

[0021] In one feasible solution, a second heating device is further included; the second heating device is provided corresponding to the first section of the substrate and is used to heat the first section of the substrate. This advantageously allows the temperature of the first section of the substrate to be adjusted during treatment based on the power of the second heating device, thereby adjusting the treatment quality.

[0022] In one feasible solution, the invention further includes a housing; the housing is provided with an unwinding chamber, a process chamber, and a rewinding chamber that are not interconnected; the unwinding device is provided in the unwinding chamber, the processing device is provided in the process chamber, and the rewinding device is provided in the rewinding chamber; the housing is provided with a first passage connecting the unwinding chamber and the process chamber, and the housing is provided with a second passage connecting the process chamber and the rewinding chamber, and the substrate of the unwinding device extends to the rewinding device through the first passage and the second passage in sequence. The beneficial effect is that by providing the housing and arranging the various devices in the unwinding chamber, the rewinding chamber, and the process chamber, respectively, the influence of the processing device on the substrate in the chamber outside the process chamber can be reduced.

[0023] In one feasible solution, the process chamber and the take-up chamber are respectively arranged on different sides of the unwinding chamber. This has the beneficial effect of optimizing the layout of the coating equipment, shortening the span of the substrate, and reducing the floor space of the coating equipment.

[0024] In one feasible solution, an opening and closing assembly is further included; both the rewinding chamber and the unwinding chamber have openings, and the opening and closing assembly is disposed to cover the openings and control the openings. The beneficial effect of the opening and closing assembly is that the substrate can be easily retracted and released, and the space within the housing can be sealed during processing.

[0025] In one feasible solution, a cooling device is further included; the cooling device is in contact with the non-treated surface of the substrate between the processing device and the winding device, and is used to cool the substrate. This advantageously reduces the appearance of ripples on the substrate by cooling the treated substrate with the cooling device.

[0026] In one feasible solution, the cooling device includes a cooling drum and a driving member, the driving member being connected to the cooling drum, the cooling drum being in contact with the non-treated surface of the substrate, the cooling drum being used to cool the substrate, and the driving member being used to drive the cooling drum to rotate. This advantageously allows the cooling drum to rotate autonomously, flattening the substrate under the action of the cooling drum, and cooling the substrate.

[0027] In a feasible solution, the cooling device is arranged on the upper side of the processing device. The beneficial effect is that such an arrangement facilitates the arrangement of the second guide assembly and facilitates the rational use of space.

[0028] In one feasible solution, a tensioning assembly is further included; the tensioning assembly abuts against the substrate and is used to tension the substrate. The beneficial effect is that by providing the tensioning assembly, the substrate is kept in a tensioned state during movement, enabling the normal operation of the coating equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 A schematic structural diagram of a roll-to-roll processing device according to a first embodiment of the present invention;

[0030] Figure 2 A schematic structural diagram of a roll-to-roll processing device according to a second embodiment of the present invention;

[0031] Figure 3A schematic structural diagram of a roll-to-roll processing device according to a third embodiment of the present invention;

[0032] Figure 4 Schematic diagram of the structure of a roll-to-roll processing device in a fourth embodiment of the present invention;

[0033] Figure 5 Schematic diagram of the structure of a winding processing device in a fifth embodiment of the present invention;

[0034] Figure 6 Schematic diagram of the structure of the winding processing equipment in the sixth embodiment of the present invention.

[0035] Numbers in the figure:

[0036] 1. Unwinding device;

[0037] 2. Winding device;

[0038] 3. Processing device; 301. First spray mechanism; 302. Second spray mechanism; 303. Third guide assembly;

[0039] 4. First guide assembly;

[0040] 5. Second guide assembly;

[0041] 6. Air support device;

[0042] 7. A first heating device;

[0043] 8. Second heating device;

[0044] 9. Shell; 901. Unwinding chamber; 902. Processing chamber; 903. Rewinding chamber; 904. Transition chamber;

[0045] 10. Opening and closing components;

[0046] 11. Cooling device; 1101. Cooling drum;

[0047] 12. Tensioning assembly;

[0048] 13. Base material; 1301. First section; 1302. Second section; 1303. Third section; 1304. First sub-section; 1305. Second sub-section; 1306. Third sub-section. DETAILED DESCRIPTION

[0049] In order to make the purpose, technical solutions and advantages of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of the present invention. Unless otherwise defined, the technical terms or scientific terms used herein should be the common meanings understood by people with ordinary skills in the field to which the present invention belongs. The words "including" and similar words used in this article mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects.

[0050] In view of the problems existing in the prior art, an embodiment of the present invention provides a roll-to-roll processing device.

[0051] Figure 1 This is a schematic structural diagram of a roll-to-roll processing device according to a first embodiment of the present invention. Figure 2 It is a structural schematic diagram of the winding processing equipment in the second embodiment of the present invention.

[0052] In some embodiments of the present invention, referring to Figure 1 and Figure 2 The winding processing equipment includes a unwinding device 1, a winding device 2, a processing device 3 and a guiding device (not shown in the figure); the unwinding device 1 is provided with a substrate 13 to be processed, and the unwinding device 1 is used to unwind the substrate 13; the guiding device is arranged on one side of the unwinding device 1, and the substrate 13 extends to the winding device 2 through the guiding device, and the guiding device is used to adjust the movement direction of the substrate 13, and the winding device 2 is used to wind the substrate 13; the processing device 3 is arranged corresponding to the substrate 13 of the first section 1301, and the guiding device is in contact with the non-processed surface of the substrate 13 from the first section 1301 to the winding device 2.

[0053] In some embodiments, the substrate 13 of the first section 1301 is the substrate 13 between the unwinding device 1 and the rewinding device 2 , and the processing device 3 is used to coat the substrate 13 of the first section 1301 .

[0054] In some embodiments, the guide device includes a first guide component 4 and a second guide component 5; the first guide component 4 is arranged on one side of the unwinding device 1, and the substrate 13 passes through the first guide component 4 and the second guide component 5 in sequence and extends to the winding device 2, and the first guide component 4 and the second guide component 5 are both used to adjust the movement direction of the substrate 13; the substrate 13 of the first section 1301 is the substrate between the first guide component 4 and the second guide component 5, and the processing device 3 is used to process one side of the substrate 13, and the second guide component 5 is in contact with the non-treated surface.

[0055] In some embodiments, the processing device 3 is a coating device, which is used to coat the side of the substrate that needs to be processed. In some embodiments, the processing device 3 is an etching device or a surface modification device.

[0056] In some specific embodiments of the present invention, the unwinding device 1 and the winding device 2 are both motor-driven rotating rollers, the substrate 13 is a flexible film material, the first guide component 4 and the second guide component 5 are both freely rotatable rotating rollers, the two ends of the substrate 13 are respectively connected to the rotating rollers of the unwinding device 1 and the winding device 2, and the substrate 13 is respectively in contact with the respective rotating rollers of the first guide component 4 and the second guide component 5, that is, the substrate 13 starts from the unwinding device 1 and is connected to the winding device 2 through the first guide component 4 and the second guide component 5.

[0057] The processing device 3 is a spray plate or a spray head, which is used to spray raw materials onto the substrate, thereby coating the substrate. The processing device 3 is arranged corresponding to the substrate 13 between the first guide assembly 4 and the second guide assembly 5, and the processing device 3 is connected to the raw material pipeline for coating. The substrate 13 of the first section 1301 refers to the substrate 13 between the first guide assembly 4 and the second guide assembly 5. In other words, the substrate 13 within the range from the time when the substrate 13 enters the working range of the processing device 3 to the time when the substrate 13 leaves the working range of the processing device 3 is the substrate 13 of the first section 1301. The processing device 3 sprays the coating material onto the side of the substrate 13 of the first section 1301, thereby coating the side of the substrate 13, and this side is called the front side or the treated surface, and the side that is not coated is called the back side or the non-treated surface.

[0058] It is worth noting that the rotating rollers between the unwinding device 1 and the starting point of coating of the processing device 3 are all the first guide components 4. Similarly, the rotating rollers between the end of coating of the processing device 3 and the winding device 2 are all the second guide components 4.

[0059] In some embodiments, the substrate 13 of the first section 1301 is partially vertically arranged.

[0060] In some embodiments, the processing device 3 is used to process the substrate 13 of the first section 1301, and the first section 1301 includes a first sub-section 1304 and a second sub-section 1305; the substrate 13 of the first sub-section 1304 is vertically arranged, and the substrate 13 of the second sub-section 1305 is vertically or horizontally arranged; the processing device 3 has a portion corresponding to the side of the substrate 13 of the first sub-section 1304, and the processing device 3 has a portion corresponding to the side or bottom of the substrate 13 of the second sub-section 1305.

[0061] In some specific embodiments, the processing device 3 is disposed on the lower side of the substrate 13 of the second sub-section 1305. In some other specific embodiments, the substrate 13 of the second sub-section 1305 is oriented horizontally, the processing device 3 is disposed on the lower side of the second sub-section 1305, and the spraying direction of the processing device 3 is vertically upward.

[0062] In some other embodiments, the processing device 3 is disposed beside the substrate 13 of the first sub-segment 1304. In some embodiments, the side is the front side, the back side, the left side, or the right side.

[0063] In some specific embodiments, the substrate 13 of the first sub-section 1304 is oriented vertically, the processing device 3 is disposed on the left side of the first sub-section 1304 , and the spraying direction of the processing device 3 is disposed horizontally to the right.

[0064] In some other embodiments, the substrate 13 of the first sub-section 1304 is oriented vertically, the processing device 3 is disposed on the left side of the first sub-section 1304, and an angle is formed between the spraying direction of the processing device 3 and the horizontal direction. In some specific embodiments, the angle is 0 to 15 degrees.

[0065] In some other embodiments, the substrate 13 of the second sub-section 1305 is oriented in a vertical direction, and the processing device 3 is disposed on the right side of the second sub-section 1305 .

[0066] In some other embodiments, the first section 1301 includes a first sub-section 1304 , a second sub-section 1305 and a third sub-section 1306 , and the third sub-section 1306 is used to connect the first sub-section 1304 and the second sub-section 1305 .

[0067] In some embodiments, the number of rotating rollers of the first guide assembly 4 and the second guide assembly 5 can be set to different numbers as needed.

[0068] Figure 3 Schematic diagram of the structure of the winding processing equipment in the third embodiment of the present invention. Figure 4 Schematic diagram of the structure of the winding processing equipment in the fourth embodiment of the present invention. Figure 5 Schematic diagram of the structure of the winding processing equipment in the fifth embodiment of the present invention. Figure 6 Schematic diagram of the structure of the winding processing equipment in the sixth embodiment of the present invention.

[0069] In some embodiments of the present invention, referring to Figures 1 to 6 The processing device 3 and the substrate 13 of the first section 1301 are arranged perpendicular to each other.

[0070] In some specific embodiments of the present invention, the mutually perpendicular arrangement means that the spraying direction of the processing device 3 or the coating device is perpendicular to the direction of the substrate 13 of the first section 1301 .

[0071] In some embodiments, a substrate shape maintaining device (not shown) is further included. The substrate shape maintaining device is provided to support the reverse side of the substrate, thereby reducing the force exerted by the processing device 3 on the substrate 13 .

[0072] In some embodiments of the present invention, referring to Figure 1 and Figure 2 The substrate shape maintaining device is a gas support device 6; the gas support device 6 is arranged corresponding to the substrate 13 of the first section 1301, and the gas support device 6 is used to output gas acting on the non-treated surface, and the gas is used to offset the force generated by the processing device 3 when processing the substrate 13.

[0073] In some specific embodiments of the present invention, the air support device 6 is a gas injection device, which is connected to an air source. The gas source of the air support device 6 is air or an inert gas. The air support device 6 is arranged corresponding to the reverse side of the substrate 13 of the first section 1301. During the process of coating the substrate 13 of the first section 1301, the air support device 6 injects airflow toward the reverse side of the substrate 13 of the first section 1301 to support the reverse side of the first section 1301.

[0074] In some embodiments, the size of the airflow sprayed by the air supporting device 6 is adjustable.

[0075] In some other embodiments, the direction of the airflow ejected by the air supporting device 6 is adjustable.

[0076] In some specific embodiments, the processing device 3 is arranged on the left side of the substrate 13 of the first section 1301, and the air support device 6 is arranged on the right side of the substrate 13 of the first section 1301, and the spraying direction of the processing device 3 is horizontally to the right, and the spraying direction of the air support device 6 is horizontally to the left.

[0077] In some embodiments, an exhaust device (not shown) is further included. The exhaust device is arranged on one side of the gas support device 6. The exhaust device is used to extract the gas near the substrate 13 filled into the first section 1301 by the gas support device 6, thereby reducing the impact of the gas on the space where the processing device 3 is located.

[0078] In some embodiments of the present invention, referring to Figure 1 and Figure 2 The air supporting device 6 and the base material 13 of the first section 1301 are arranged perpendicular to each other.

[0079] In some specific embodiments of the present invention, the mutually perpendicular arrangement means that the spraying direction of the air supporting device 6 is perpendicular to the direction of the substrate 13 of the first section 1301 .

[0080] In some embodiments of the present invention, referring to Figures 1 to 6 The processing device 3 includes a first spray mechanism 301, a second spray mechanism 302 and a third guide component 303; the third guide component 303 abuts against the uncoated surface of the substrate 13 of the first section 1301, and the third guide component 303 is used to adjust the movement direction of the substrate 13 of the first section 1301; the first spray mechanism 301 and the second spray mechanism 302 are arranged corresponding to the substrate 13 of the first section 1301, and the first spray mechanism 301 and the second spray mechanism 302 are both used to coat one side of the substrate 13 of the first section 1301.

[0081] In some specific embodiments of the present invention, the first spray mechanism 301 and the second spray mechanism 302 are both spray plates, and the first spray mechanism 301 and the second spray mechanism 302 coat the front surface of the substrate 13. The first section 1301 includes a first sub-section 1304, a second sub-section 1305, and a third sub-section 1306. The substrate 13 in the first sub-section 1304 is oriented vertically, the substrate 13 in the second sub-section 1305 is oriented vertically, and the substrate 13 in the third sub-section 1306 is oriented horizontally. The third sub-section 1306 is located between the second sub-section 1305 and the first sub-section 1304. The first spray mechanism 301 is positioned corresponding to the substrate 13 in the first sub-segment 1304, the second spray mechanism 302 is positioned corresponding to the substrate 13 in the second sub-segment 1305, the third guide assembly 303 is positioned corresponding to the junction between the first sub-segment 1304 and the third sub-segment 136, and the third guide assembly 303 is positioned corresponding to the junction between the second sub-segment 1305 and the third sub-segment 1306. Both the first spray mechanism 301 and the second spray mechanism 302 are connected to the coating raw material pipeline. During coating, the first spray mechanism 301 and the second spray mechanism 302 spray the coating raw material onto the substrate 13 in the first sub-segment 1304 and the second sub-segment 1305, respectively. This creates a vertically folded structure for the substrate 13 in the first sub-segment 1301, utilizing the space available at the height of the equipment to ensure the coating length while reducing the equipment footprint.

[0082] In some embodiments, the diameter of the rotating roller of the third guide assembly 303 is equal to the length of the substrate 13 of the second sub-segment 1305 . In this case, the third guide assembly 303 only needs to be provided with one rotating roller.

[0083] In some other embodiments, the number of the rotating rollers of the third guide assembly 303 is two, three or more.

[0084] In some other embodiments, an angle is formed between the first spray mechanism 301 and the direction of the substrate 13 of the first sub-section 1304 .

[0085] In some embodiments of the present invention, referring to Figures 1 to 6 The first spraying mechanism 301 and the second spraying mechanism 302 are arranged in parallel and / or symmetrically.

[0086] In some specific embodiments of the present invention, the first spray mechanism 301 and the second spray mechanism 302 are arranged parallel and symmetrically. In some specific embodiments, the substrate 13 of the first sub-segment 1304 is arranged vertically, and the substrate 13 of the second sub-segment 1305 is arranged vertically. The first spray mechanism 301 is arranged vertically on the left side of the first sub-segment 1304, and the second spray mechanism 302 is arranged vertically on the right side of the second sub-segment 1305.

[0087] In some embodiments, the first spray mechanism 301 and the second spray mechanism 302 are arranged in parallel. In some specific embodiments, the substrate 13 of the first sub-segment 1304 is arranged vertically, and the substrate 13 of the second sub-segment 1305 is arranged vertically. The first spray mechanism 301 is arranged on the left side of the first sub-segment 1304, and the spray direction of the first spray mechanism 301 is at an angle to the horizontal direction. The second spray mechanism 302 is arranged parallel to the first spray mechanism 301 and on the right side of the second sub-segment 1305.

[0088] In some other embodiments, the first spray mechanism 301 and the second spray mechanism 302 are symmetrically arranged. In some specific embodiments, the substrate 13 of the first sub-segment 1304 is arranged vertically, and the substrate 13 of the second sub-segment 1305 is arranged vertically. The first spray mechanism 301 is arranged on the left side of the first sub-segment 1304, and the spray direction of the first spray mechanism 301 is at an angle to the horizontal direction. The second spray mechanism 302 is symmetrically arranged with the first spray mechanism 301 on the right side of the second sub-segment 1305.

[0089] In some embodiments of the present invention, referring to Figure 1 and Figure 2 , further comprising a first heating device 7 ; the first heating device 7 is arranged corresponding to the substrate 13 between the unwinding device 1 and the processing device 3 , and the first heating device 7 is used to heat the substrate 13 .

[0090] In some specific embodiments of the present invention, the first heating device 7 is a heating wire, and the first heating device 7 is arranged corresponding to a certain section of the substrate 13 between the unwinding device 1 and the processing device 3. During the movement of the substrate 13, the first heating device 7 can heat the corresponding substrate 13.

[0091] In some embodiments, the substrate 13 between the unwinding device 1 and the processing device 3 is referred to as the substrate 13 of the second section 1302 , and the substrate 13 between the processing device 3 and the winding device 2 is referred to as the substrate 13 of the third section 1303 .

[0092] In some specific embodiments, the first heating device 7 is disposed corresponding to a portion of the substrate 13 of the second section 1302 .

[0093] In some embodiments of the present invention, referring to Figure 1 and Figure 2 , further comprising a second heating device 8; the second heating device 8 is provided corresponding to the substrate 13 of the first section 1301, and the second heating device 8 is used to heat the substrate 13 of the first section 1301.

[0094] In some specific embodiments of the present invention, the second heating device 8 has a similar structure to the first heating device 7, and the second heating mechanism is arranged between the first sub-section 1304 and the second sub-section 1305, and the second heating mechanism is used to heat the first sub-section 1304 and the second sub-section 1305.

[0095] In some embodiments, the second heating device 8 is disposed between the air supporting device 6 and the first sub-section 1304 , and / or the second heating device 8 is disposed between the air supporting device 6 and the second sub-section 1305 .

[0096] In some further embodiments, the air supporting device 6 is disposed between the second heating device 8 and the first sub-section 1304 , and / or the air supporting device 6 is disposed between the second heating device 8 and the second sub-section 1305 .

[0097] In some other embodiments, the air supporting device 6 and the second heating device 8 are an integrated structure, or the air supporting device 6 and the second heating device 8 are spaced apart from each other.

[0098] In some embodiments, the first heating device 7 is arranged perpendicularly to the substrate 13 of the second section 1302 , and the processing device 3 , the second heating device 8 and the air support device 6 are all arranged perpendicularly to the substrate 13 of the first section 1301 .

[0099] In some embodiments of the present invention, referring to Figures 1 to 6 , and also includes a shell 9; the shell 9 is provided with an unwinding chamber 901, a process chamber 902 and a winding chamber 903 which are not connected to each other; the unwinding device 1 is arranged in the unwinding chamber 901, the processing device 3 is arranged in the process chamber 902, and the winding device 2 is arranged in the winding chamber 903; the shell 9 is provided with a first channel connecting the unwinding chamber 901 and the process chamber 902, and the shell 9 is provided with a second channel connecting the process chamber 902 and the winding chamber 903, and the substrate 13 of the unwinding device 1 extends to the winding device 2 through the first channel and the second channel in sequence.

[0100] In some specific embodiments of the present invention, part of the rotating rollers of the first guide assembly 4 are arranged in the unwinding chamber 901, another part of the rotating rollers of the first guide assembly 4 are arranged in the process chamber 902, the first heating device 7, the second heating device 8 and the air support device 6 are all arranged in the process chamber 902, a part of the rotating rollers of the second guide assembly 5 are placed in the process chamber 902, and another part of the rotating rollers of the second guide assembly 5 are arranged in the winding chamber 903.

[0101] In some embodiments of the present invention, referring to Figures 1 to 6 The process chamber 902 and the winding chamber 903 are respectively arranged on different sides of the unwinding chamber 901.

[0102] In some specific embodiments of the present invention, the process chamber 902 is disposed on the right side of the unwinding chamber 901 , and the winding chamber 903 is disposed on the upper side of the unwinding chamber 901 .

[0103] In some embodiments of the present invention, referring to Figures 1 to 6 , further comprising an opening and closing component 10; the winding chamber 903 and the unwinding chamber 901 are both provided with openings, the opening and closing component 10 is covered and arranged on the openings, and the opening and closing component 10 is used to control the opening and closing of the openings.

[0104] In some specific embodiments of the present invention, the opening and closing component 10 is similar to a door and window structure. When the opening and closing component 10 is in an open state, the unwinding chamber 901 or the winding chamber 903 is connected to the outside world. When the opening and closing component 10 is in a closed state, the unwinding chamber 901 or the winding chamber 903 is not connected to the outside world.

[0105] In some embodiments of the present invention, referring to Figures 1 to 6 , further comprising a cooling device 11; the cooling device 11 abuts against the non-treated surface of the substrate 13 between the processing device 3 and the winding device 2, and the cooling device 11 is used to cool the substrate 13.

[0106] In some embodiments, the cooling device 11 is disposed on the upper side of the processing device 3 .

[0107] In some specific embodiments of the present invention, the housing 9 further comprises a transition chamber 904, which is disposed above the process chamber 902 and to the right of the winding chamber 903. The second channel comprises a first sub-channel and a second sub-channel, wherein the first sub-channel is used to connect the process chamber 902 and the transition chamber 904, and the second sub-channel is used to connect the transition chamber 904 and the winding chamber 903. The cooling device 11 is disposed in the transition chamber 904.

[0108] The cooling device 11 is a water-cooled, air-cooled or electric cooling device. The substrate 13 in the transition cavity 904 is in contact with the cooling device 11. The cooling device 11 is provided to cool the substrate 13 and cool the heated substrate 13 to avoid deformation of the substrate 13 and reduce the possibility of wave patterns on the substrate 13.

[0109] In some embodiments of the present invention, referring to Figures 1 to 6 The cooling device 11 includes a cooling drum 1101 and a driving member (not shown in the figure). The driving member is connected to the cooling drum 1101. The cooling drum 1101 abuts against the non-treated surface of the substrate 13. The cooling drum 1101 is used to cool the substrate 13, and the driving member is used to drive the cooling drum 1101 to rotate.

[0110] In some specific embodiments of the present invention, the cooling drum 1101 is a circular roller, and a cooling structure is provided inside the circular roller, so that the temperature of the circular roller is relatively low. The driving member (not shown in the figure) is a motor, and the driving member drives the cooling drum 1101 to rotate in the same direction as the movement direction of the substrate 13.

[0111] In some embodiments, the roller diameter of the cooling drum 1101 is set to a larger value, which can extend the contact area between the substrate 13 and the cooling drum 1101.

[0112] In some embodiments of the present invention, referring to Figure 1 and Figure 2 , further comprising a tensioning component 12 ; the tensioning component 12 abuts against the substrate 13 , and the tensioning component 12 is used to tension the substrate 13 .

[0113] In some specific embodiments of the present invention, the tensioning assembly 12 is a rotating roller whose position can be adjusted. The tensioning assembly 12 is arranged corresponding to the substrate 13 of the second section 1302 and / or the third section 1303, and the tensioning assembly 12 arranged in the third section 1303 is arranged on the opposite side of the third section 1303.

[0114] While the embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations of these embodiments are possible. However, it should be understood that such modifications and variations are within the scope and spirit of the present invention as set forth in the claims. Furthermore, the invention described herein is susceptible to other embodiments and may be practiced or implemented in a variety of ways.

Claims

1. A winding processing equipment, characterized in that, It includes an unwinding device, a rewinding device, a processing device and a guiding device; The unwinding device is provided with a substrate to be processed, and the unwinding device is used to unwind the substrate; The guide device is provided on one side of the unwinding device, and the substrate extends to the winding device through the guide device. The guide device is used to adjust the movement direction of the substrate, and the winding device is used to wind the substrate; The processing device is arranged corresponding to the substrate of the first section, and the guiding device is in contact with the non-processed surface of the substrate from the first section to the winding device; The treatment is coating; The coating device includes a first spray mechanism, a second spray mechanism and a third guide assembly, wherein the third guide assembly abuts against the non-coating surface of the substrate of the first section, and the third guide assembly is used to adjust the movement direction of the substrate of the first section; The processing device is used to process the substrate of the first section, the first section includes a first sub-section and a second sub-section, the substrate of the first sub-section is arranged vertically, and the substrate of the second sub-section is arranged vertically or horizontally, the processing device has the first spray mechanism correspondingly arranged beside the substrate of the first sub-section, and the processing device has the second spray mechanism correspondingly arranged beside or below the substrate of the second sub-section; It also includes a substrate shape maintaining device, which is an air supporting device, and the air supporting device is used to offset the force generated by the processing device when processing the substrate.

2. The roll-to-roll processing equipment according to claim 1, characterized in that The guide device includes a first guide assembly and a second guide assembly; The first guide assembly is provided on one side of the unwinding device, and the substrate extends to the rewinding device through the first guide assembly and the second guide assembly in sequence, and the first guide assembly and the second guide assembly are both used to adjust the movement direction of the substrate; The substrate of the first section is the substrate between the first guide assembly and the second guide assembly, the processing device is used to process one side of the substrate, and the second guide assembly is in contact with the non-processed surface.

3. The roll-to-roll processing equipment according to claim 1, wherein The base material of the first section is partially arranged vertically.

4. The roll-to-roll processing equipment according to claim 1, wherein The spraying direction of the processing device is perpendicular to the direction of the substrate of the first section.

5. The roll-to-roll processing equipment according to claim 1, characterized in that The gas support device is provided corresponding to the substrate of the first section, and is used for outputting gas, and the gas acts on the opposite side of the coating surface of the substrate.

6. The roll-to-roll processing equipment according to claim 1, characterized in that The spraying direction of the air supporting device is perpendicular to the direction of the substrate of the first section.

7. The roll-to-roll processing equipment according to claim 1, wherein The first spray mechanism and the second spray mechanism are arranged in parallel and / or symmetrically.

8. The roll-to-roll processing equipment according to claim 1, wherein Also included is a first heating device; The first heating device is arranged corresponding to the substrate between the unwinding device and the processing device, and the first heating device is used to heat the substrate.

9. The roll-to-roll processing equipment according to claim 1, wherein Also comprising a second heating device; The second heating device is provided corresponding to the substrate of the first section, and is used to heat the substrate of the first section.

10. The roll-to-roll processing equipment according to claim 1, wherein Also includes the housing; The housing is provided with an unwinding chamber, a process chamber and a winding chamber which are not connected to each other; The unwinding device is arranged in the unwinding chamber, the processing device is arranged in the process chamber, and the winding device is arranged in the winding chamber; The shell is provided with a first channel connecting the unwinding chamber and the process chamber, and the shell is provided with a second channel connecting the process chamber and the winding chamber. The substrate of the unwinding device extends to the winding device through the first channel and the second channel in sequence.

11. The roll-to-roll processing equipment according to claim 1, wherein Also includes a cooling device; The cooling device is in contact with the non-processed surface of the substrate between the processing device and the winding device, and is used to cool the substrate.

12. The roll-to-roll processing equipment according to claim 11, characterized in that The cooling device includes a cooling drum and a driving member. The driving member is connected to the cooling drum. The cooling drum abuts against the non-treated surface of the substrate. The cooling drum is used to cool the substrate. The driving member is used to drive the cooling drum to rotate.

13. The roll-to-roll processing equipment according to claim 11, characterized in that The cooling device is arranged on the upper side of the processing device.

14. The roll-to-roll processing equipment according to claim 1, wherein Also included is a tensioning assembly; The tensioning assembly abuts against the substrate, and is used for tensioning the substrate.

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