A spectrometer, a spectral detection method

Abstract

The application discloses a spectrometer, which comprises an incident light, a collimating lens group, a cylindrical lens array, an F-P flat plate, a grating, a focusing lens group and a light signal processing assembly arranged in sequence along an optical axis; the collimating lens group, the cylindrical lens array, the F-P flat plate, the grating, the focusing lens group and the light signal processing assembly are coaxially arranged in the same height; the cylindrical lens array and the F-P flat plate are arranged in parallel and are inclined to one side so that the focal line of the cylindrical lens array is focused on the incident surface of the F-P flat plate; a slit array is arranged on the incident surface of the F-P flat plate; the slit array comprises a plurality of incident slits arranged on the incident surface of the F-P flat plate and equidistant along the Y-axis direction; a high reflection film is arranged on the incident surface of the F-P flat plate, and a reflection film is arranged on the exit surface; the spectrometer has the advantages of reducing the incident loss, increasing the light intensity, improving the detection signal strength, increasing the sensitivity detection and improving the detection precision; and the application further discloses a spectrum detection method, which has the advantages of improving the detection signal strength and increasing the sensitivity detection.

Description

[Technical Field]

[0001] This invention relates to a high-resolution spectrometer and a spectral detection method using an FP etalon. [Background Technology]

[0002] Typically, echelle grating spectrometers are characterized by their small size, high dispersion, and high resolution, representing a trend in advanced spectroscopic technology. The echelle grating used in these spectrometers has properties intermediate between small echelle gratings and echelle gratings. Unlike blazed gratings, it achieves high resolution and high dispersion by increasing the blaze angle (higher spectral order and larger grating area) rather than increasing the number of grating lines.

[0003] However, in actual processing and production, the processing of echelle gratings is difficult, and the requirements for the parallelism and consistency of each step are very high. Due to the limitations of the engraving process, it is not easy to achieve small error requirements. Therefore, such gratings are difficult to process or have high production costs. Therefore, there is now a method that uses FP etalon, whose spectral principle is similar to that of echelle spectrometers. By generating interference of light, the interference fringes of different wavelengths are in different positions, so as to achieve the same effect of separating the spectrum, while reducing the difficulty of production and saving costs.

[0004] The FP etalon referred to here is a flat plate with highly flat surfaces on both sides. The principle of wavelength separation using an FP etalon is basically similar to that of a Fabry-Perot interferometer. High-reflectivity coatings are applied to both sides of the plate. Light incident on the plate undergoes multiple reflections within the plate, forming multi-beam interference. The interference fringes of different wavelengths are positioned differently, achieving spectral dispersion. The problem with this type of spectrometer, which achieves spectral dispersion through interference, is that the light intensity required for interference is higher than that for spectral dispersion in grating space. Therefore, the light intensity entering the FP etalon needs to be sufficiently high. However, current methods of light entering the FP etalon use a slit or single window, which results in insufficient light intensity, poor performance, and significant light loss. Current technology often combines this single-slit incident plate method with focusing, adjusting the incident angle, applying anti-reflection coatings to the incident slit, and adding incident glass modules to increase the light intensity entering the etalon.

[0005] For existing FP etalons, the single-window incident method still suffers from low incident light efficiency, high loss, and insufficient accuracy. Using single-slit incident light requires increasing the slit width to improve light transmission efficiency, but conversely, reducing the slit width is necessary to increase resolution, creating a contradiction that limits performance. Furthermore, in actual manufacturing, coating methods struggle to minimize the slit size, while adding incident glass modules presents challenges in processing and assembly.

[0006] Note: The FP etalon and FP plate in this invention are the same.

[0007] Therefore, this invention addresses the aforementioned problems. [Summary of the Invention]

[0008] The purpose of this invention is to overcome the shortcomings of the prior art and provide a high-resolution spectrometer that can improve the problems existing in the prior art, reduce incident loss, increase light intensity, and improve the intensity of the detection signal, thereby increasing detection sensitivity and improving detection accuracy; in addition, it also has the characteristics of low processing difficulty, low manufacturing cost, and small size.

[0009] The present invention also provides a spectral detection method, which, by employing the above-mentioned spectrometer, can reduce incident loss, increase light intensity, and improve the intensity of the detection signal, thereby increasing detection sensitivity and improving detection accuracy.

[0010] This invention is achieved through the following technical solution:

[0011] A spectrometer, comprising, sequentially arranged along the optical axis:

[0012] 1. Incident light, 2. Collimating lens group, 3. Cylindrical lens array, 4. FP flat plate, 6. Grating, 7. Focusing lens group, 8. Optical signal processing component.

[0013] The collimating lens group 2, cylindrical lens array 3, FP plate 4, grating 6, focusing lens group 7, and optical signal processing component 8 are arranged coaxially and at the same height. The cylindrical lens array 3 is arranged parallel to the FP plate 4 and tilted to one side so that the focal line of the cylindrical lens array 3 is focused on the incident surface of the FP plate 4. The incident surface of the FP plate 4 is provided with a slit array 5, which includes a plurality of incident slits arranged on the incident surface of the FP plate 4 and equidistant along the Y-axis. The incident surface of the FP plate 4 is coated with a high-reflection film, and the exit surface is coated with a reflective film.

[0014] The incident light 1 is used to provide and emit the incident light beam.

[0015] The collimating lens group 2 is used to collimate the incident light 1 into a parallel beam 9 and direct it onto each cylindrical lens in the cylindrical lens array 3.

[0016] Each cylindrical lens in the cylindrical lens array 3 is used to focus the parallel beam 9 emitted from the collimating lens group 2 into a thin linear beam 10 and direct it onto the corresponding entrance slit on the FP plate 4.

[0017] The FP plate 4 is used to separate the fine linear beam 10 emitted by the cylindrical lens array 3 into angular fringes in the Y-axis direction according to the order. The FP plate 4 is also used to make the fine linear beam 10 entering the FP plate 4 undergo multiple reflections and exits to form a multi-beam interference, thereby generating a transverse fringe beam 11 with order fringes. The transverse fringe beam 11 is directed onto the grating 6 at different wavelengths and angles, and each bright fringe in the transverse fringe beam 11 has different orders of light with different wavelengths overlapping.

[0018] The grating 6 is used to disperse the transverse stripe beams 11 that overlap in the X-axis direction in the X-axis direction, and the transverse stripe beams 11 of different wavelengths will be in different positions in the X-axis direction due to the dispersion of the grating 6 to form a two-dimensional dispersed beam 12 that is directed onto the focusing lens group 7.

[0019] The focusing lens group 7 is used to focus the two-dimensional dispersive beam 12 emitted by the grating 6 onto the optical signal processing component 8.

[0020] The optical signal processing component 8 is used to receive and process the spectral pattern or spectral signal of the focused image formed by the focusing lens group 7.

[0021] As described above, the spectrometer includes a slit array 5 comprising a plurality of incident slits disposed on the incident surface of the FP plate 4 and equidistantly adjacent along the Y-axis.

[0022] In the spectrometer described above, the center-to-center distance between adjacent incident slits on the FP plate 4 is 0.1–10 mm.

[0023] In the spectrometer described above, the width of the entrance slit on the FP plate 4 is 1–100 μm.

[0024] In the spectrometer described above, the grating 6 is a transmission grating or a reflection grating.

[0025] In the spectrometer described above, the optical signal processing component 8 is a CCD detector or a CMOS device.

[0026] The present invention discloses a spectral detection method using a spectrometer as described above, comprising the following steps:

[0027] S1, Adjust collimating lens group 2, Cylindrical lens array 3, FP plate 4, Grating 6, Focusing lens group 7, Optical signal processing component 8, Coaxial and at the same height, and Adjust cylindrical lens array 3 to be parallel to FP plate 4 and tilted to one side;

[0028] S2. The incident light 1 is introduced. The incident light 1 is collimated into a parallel beam 9 by the collimating lens group 2 and directed onto each cylindrical lens in the cylindrical lens array 3. Each cylindrical lens in the cylindrical lens array 3 focuses the parallel beam 9 emitted by the collimating lens group 2 into multiple thin linear beams 10 in the X-axis direction and directs them onto the corresponding entrance slit on the FP plate 4.

[0029] S3. The thin linear beam 10 emitted by the cylindrical lens array 3 enters through the corresponding entrance slit on the FP plate 4 and strikes the exit surface of the FP plate 4. After multiple reflections between the exit surface and the entrance surface of the FP plate 4, the thin linear beam 10 forms multi-beam interference at different angles, thereby generating transverse fringe beams 11 that are directed onto the grating 6. Each bright fringe in the transverse fringe beam 11 has different orders of light with different wavelengths overlapping. Transverse fringe beams 11 at the same angle have the same wavelength combination, and their optical path difference is Δ, where Δ = 2π × 2ndCOS(θ), where n is the glass refractive index, d is the thickness of the FP plate, and θ is the angle of the light. When Δ is an integer multiple of the wavelength, it is a bright fringe.

[0030] For m = Δ / λ, where λ is the wavelength and m is an integer, all Δ are the same. When m is an integer, all wavelengths will appear at the same angle.

[0031] S4. Next, the grating 6 disperses the wavelengths of the horizontal stripe beam 11 that overlap in the X-axis direction to form a two-dimensional dispersive beam 12 in the Y-axis and X-axis directions, which is directed onto the focusing lens group 7. The focusing lens group 7 focuses the beam onto the optical signal processing component 8, and then the optical signal processing component 8 receives and processes the optical signal and transmits it to the external host computer for analysis and feedback.

[0032] As described above, in the spectral detection method, a FP plate 4 with a slit array 5 is used in steps S2 and S3 to increase the intensity of incident light through multiple incident slits on the FP plate 4.

[0033] Compared with the prior art, the present invention has the following advantages:

[0034] 1. Compared with spectrometers in the prior art, the FP flat panel used in the spectrometer of the present invention has the advantages of lower processing difficulty, lower manufacturing cost and smaller size compared with the echelle grating.

[0035] 2. This invention achieves multi-slit incident light onto an FP flat panel using existing equipment, solving the problems of low light transmission efficiency and low detection sensitivity in existing FP flat panel spectrometers. It has the advantages of reducing incident loss, increasing light intensity, improving detection signal strength, and increasing detection sensitivity to improve detection accuracy.

[0036] 3. The spectral detection method of the present invention, by employing the above-mentioned spectrometer, can reduce incident loss, increase light intensity, improve detection signal strength, and increase sensitivity detection to improve detection accuracy. [Attached Image Description]

[0037] The specific embodiments of the present invention will be further described in detail below with reference to the accompanying drawings, wherein:

[0038] Figure 1 This is a schematic diagram of the spectrometer of the present invention.

[0039] Figure 2 This is a schematic diagram illustrating the principle of multi-beam interference generated by a portion of the beam in the spectrometer of this invention on the FP plate.

[0040] Figure 3 This is a schematic diagram of the structure of the FP flat multi-slit etching apparatus involved in the present invention.

[0041] Figure 4 This is a schematic diagram of the beam of light after the horizontal stripe beam is converged by a focusing lens group without a grating, according to the present invention.

[0042] Figure 5 This is a schematic diagram of the image formed by focusing a two-dimensional dispersive beam through a focusing lens group in this invention.

Detailed Implementation Methods

[0043] The following is in conjunction with the appendix Figure 1-5 The embodiments of the present invention will be described in detail.

[0044] like Figure 1 , 2 As shown, the present invention provides a spectrometer comprising, along the optical axis, the following components arranged sequentially:

[0045] 1. Incident light, 2. Collimating lens group, 3. Cylindrical lens array, 4. FP flat plate, 6. Grating, 7. Focusing lens group, 8. Optical signal processing component.

[0046] The collimating lens group 2, cylindrical lens array 3, FP plate 4, grating 6, focusing lens group 7, and optical signal processing component 8 are arranged coaxially and at the same height. The cylindrical lens array 3 is arranged parallel to the FP plate 4 and tilted to one side so that the focal line of the cylindrical lens array 3 is focused on the incident surface of the FP plate 4. The incident surface of the FP plate 4 is provided with a slit array 5, which includes a plurality of incident slits arranged on the incident surface of the FP plate 4 and equidistant along the Y-axis. The incident surface of the FP plate 4 is coated with a high-reflection film, and the exit surface is coated with a reflective film.

[0047] The incident light 1 is used to provide and emit the incident light beam. Alternatively, the incident light 1 can be a standard light source. When using a standard light source, the sample to be tested can be placed between the collimating lens group 2 and the cylindrical lens array 3.

[0048] The collimating lens group 2 is used to collimate the incident light 1 into a parallel beam 9 and direct it onto each cylindrical lens in the cylindrical lens array 3.

[0049] Each cylindrical lens in the cylindrical lens array 3 is used to focus the parallel beam 9 emitted from the collimating lens group 2 into a thin linear beam 10 and direct it toward the corresponding entrance slit on the FP plate 4.

[0050] The FP plate 4 is used to separate the fine linear beam 10 emitted by the cylindrical lens array 3 into angular fringes in the Y-axis direction according to the order. The FP plate 4 is also used to make the fine linear beam 10 entering the FP plate 4 undergo multiple reflections and exits to form a multi-beam interference, thereby generating a transverse fringe beam 11 with order fringes. The transverse fringe beam 11 is directed onto the grating 6 at different wavelengths and angles, and each bright fringe in the transverse fringe beam 11 has different orders of light with different wavelengths overlapping.

[0051] The grating 6 is used to disperse the transverse stripe beams 11 that overlap in the X-axis direction in the X-axis direction, and the transverse stripe beams 11 of different wavelengths will be in different positions in the X-axis direction due to the dispersion of the grating 6 to form a two-dimensional dispersed beam 12 that is directed onto the focusing lens group 7.

[0052] The focusing lens group 7 is used to focus the two-dimensional dispersive beam 12 emitted by the grating 6 onto the optical signal processing component 8.

[0053] The optical signal processing component 8 is used to receive and process the spectral pattern or spectral signal of the focused image formed by the focusing lens group 7.

[0054] This invention discloses a spectrometer that utilizes a collimating lens group, a cylindrical lens array, a FP plate, a grating, a focusing lens group, and an optical signal processing component. The FP plate 4 has a slit array 5 on its incident surface, which includes multiple incident slits equidistantly spaced along the Y-axis on the incident surface of the FP plate 4. The incident surface of the FP plate 4 is coated with a high-reflectivity film, and the exit surface is coated with a reflective film. This invention has the advantages of low processing difficulty, low manufacturing cost, and small size. In addition, it can reduce incident loss, increase light intensity, improve detection signal strength, and increase sensitivity to improve detection accuracy.

[0055] Preferably, the slit array 5 includes a plurality of incident slits disposed on the incident surface of the FP plate 4 and equidistant from each other along the Y-axis.

[0056] like Figure 1 , 2 As shown, to further improve the multi-beam interference effect, the center-to-center distance between adjacent entrance slits on the FP plate 4 is 0.1–10 mm. Preferably, the center-to-center distance between adjacent entrance slits on the FP plate 4 is 1–3 mm, such as 1.5 mm or 2 mm.

[0057] like Figure 1 , 2 As shown, in order to improve incident light efficiency, reduce loss, and improve accuracy, the width of the incident slit on the FP plate 4 is 1–100 μm. Preferably, the width of the incident slit on the FP plate 4 is 10–30 μm, such as 15 μm or 20 μm.

[0058] like Figure 1 , 2 As shown, in order to improve the dispersion effect, the grating 6 is a transmissive grating or a reflective grating.

[0059] like Figure 1 , 2 As shown, in order to improve processing efficiency, the optical signal processing component 8 is a CCD detector or a CMOS device.

[0060] The present invention discloses a spectral detection method using a spectrometer as described above, comprising the following steps:

[0061] S1, Adjust collimating lens group 2, Cylindrical lens array 3, FP plate 4, Grating 6, Focusing lens group 7, Optical signal processing component 8, Coaxial and at the same height, and Adjust cylindrical lens array 3 to be parallel to FP plate 4 and tilted to one side;

[0062] S2. The incident light 1 is introduced. The incident light 1 is collimated into a parallel beam 9 by the collimating lens group 2 and directed onto each cylindrical lens in the cylindrical lens array 3. Each cylindrical lens in the cylindrical lens array 3 focuses the parallel beam 9 emitted by the collimating lens group 2 into multiple thin linear beams 10 in the X-axis direction and directed onto the corresponding entrance slit on the FP plate 4.

[0063] S3. The thin linear beam 10 emitted by the cylindrical lens array 3 enters through the corresponding entrance slit on the FP plate 4 and strikes the exit surface of the FP plate 4. After multiple reflections between the exit surface and the entrance surface of the FP plate 4, the thin linear beam 10 forms multi-beam interference at different angles, thereby generating transverse fringe beams 11 that are directed onto the grating 6. Each bright fringe in the transverse fringe beam 11 has different orders of light with different wavelengths overlapping. Transverse fringe beams 11 at the same angle have the same wavelength combination, and their optical path difference is Δ, where Δ = 2π × 2ndCOS(θ), where n is the glass refractive index, d is the thickness of the FP plate, and θ is the angle of the light. When Δ is an integer multiple of the wavelength, it is a bright fringe.

[0064] An FP plate can also be composed of two reflective surfaces to form a hollow FP plate. In this case, n = 1, and Δ = 2πx²dCOS(θ).

[0065] For m = Δ / λ, where λ is the wavelength and m is an integer, all Δ are the same. When m is an integer, all wavelengths will appear at the same angle.

[0066] S4. Next, the grating 6 disperses the overlapping wavelengths of the transverse stripe beam 11 along the X-axis to form a two-dimensional dispersive beam 12 along the Y-axis and X-axis, which is then directed onto the focusing lens group 7. The focusing lens group 7 focuses the beam onto the optical signal processing component 8, which then receives, processes, and transmits the optical signal to an external host computer for analysis and feedback. Therefore, the spectral detection method of this invention can reduce incident loss, increase light intensity, improve the strength of the detection signal, and increase detection sensitivity, thereby improving detection accuracy.

[0067] In steps S2 and S3, an FP plate 4 equipped with a slit array 5 is used to increase the intensity of incident light through multiple incident slits on the FP plate 4.

[0068] like Figure 2As shown, the first beam 10a is a portion of the thin linear beam 10, and the second beam 14 is the center beam of the first beam 10a; the first entrance slit 19a is one of the entrance slits of the slit array 5 provided on the entrance surface of the FP plate 4, and the second entrance slit 19b is the adjacent entrance slit of the first entrance slit 19a. The first beam 10a is incident through the first entrance slit 19a, so that the first beam 10a illuminates the exiting surface coated with a 95% reflective film. Here, the second beam 14 is used for simplified drawing and explanation. The first beam 10a is equivalent to the second beam 14. 5% of the second beam 14 is emitted as the fourth beam 16, and 95% is reflected to form the third beam 15, which illuminates the entrance surface coated with a high-reflective film. Then, the third beam 15 is completely reflected to form the fifth beam 17. The fifth beam 17 illuminates the exiting surface coated with a 95% reflective film, and 5% is emitted as the sixth beam 18. The rest of the fifth beam 17 is reflected. The above reflection and emission process is repeated. The optical path difference of the emitted fourth beam 16 and the sixth beam 18 is fixed. They are from the same source and have the same frequency. The other emitted beams are similarly affected, satisfying the interference conditions. These emitted beams form multi-beam interference.

[0069] For the beam incident from the second entrance slit 19b, it has the same optical path as the first beam 10a. Therefore, the optical path difference between the beam itself and the reflected light within its FP plate 4 and the first beam 10a is also stable, and the multi-beam interference condition is also satisfied.

[0070] like Figure 3 The diagram shows one implementation of multiple slits in the FP flat panel used in this invention. It is a schematic diagram of a self-aligned etching device and etching method for etching the incident slits of the FP flat panel. This device references part of the structure of the aforementioned spectrometer, replacing the incident light 1 with an etching light source 50. The etching light source 50 has a short wavelength and high power, and is generally an ultraviolet light source. The device includes the following components arranged sequentially along the optical axis:

[0071] The etching light source 50, collimating lens group 2, and cylindrical lens array 3 are provided. The collimating lens group 2 and the cylindrical lens array 3 are coaxially and at the same height. The cylindrical lens array 3 is parallel to the FP plate 4 and tilted to one side. The FP plate 4 is coated with photosensitive material.

[0072] The etching light source 50 provides and emits an etching beam of the required wavelength for etching;

[0073] The collimating lens group 2 is used to collimate the etching beam emitted by the etching light source 50 into a parallel beam 9 and direct it onto each cylindrical lens in the cylindrical lens array 3.

[0074] Each cylindrical lens in the cylindrical lens array 3 is used to focus the parallel beam 9 emitted by the collimating lens group 2 into multiple parallel thin linear beams 10 and direct them onto the incident surface of the FP plate 4, thereby exposing the photosensitive material on the incident surface of the FP plate 4 to develop and etch the required slit array.

[0075] Using the aforementioned apparatus, multi-incident slit etching of the FP flat panel is performed in the following manner:

[0076] S1. Adjust the collimating lens group 2, cylindrical lens array 3 and FP plate 4 to be coaxial and at the same height, and adjust the cylindrical lens array 3 to be parallel to FP plate 4 and tilted to one side.

[0077] S2. Turn on the etching light source 50. The etching beam emitted by the etching light source 50 is collimated into a parallel beam 9 by the collimating lens group 2 and directed onto each cylindrical lens in the cylindrical lens array 3. Each cylindrical lens in the cylindrical lens array 3 focuses the parallel beam 9 emitted by the collimating lens group 2 laterally into multiple thin linear beams 10 and directs them onto the incident surface of the FP plate 4, thereby performing photosensitive etching on the incident surface of the FP plate 4. After the photosensitive etching is completed, turn off the etching light source 50. After development and etching, multiple incident slits are etched on the incident surface of the FP plate 4, and the position of each incident slit is consistent with the focal line of each cylindrical lens.

[0078] Because the spectral instrument is directly used for etching, when the beam entering the instrument is at the same position as the incident light 1 or the etching light source 5, the beam line after passing through the cylindrical lens array 3 is located exactly on the incident slit. Therefore, the problem of difficult assembly and adjustment of the FP flat panel can be avoided. Thus, the present invention has the characteristics of low processing difficulty, low manufacturing cost, small size and good etching effect.

[0079] In addition, multiple methods can be used to fabricate FP flat panels with multiple slits, including engraving and marking.

[0080] Figure 4 This is a schematic diagram of the beam of light after the horizontal stripe beam 11 of the present invention is converged by the focusing lens group 7 without the addition of the grating 6. Each horizontal stripe beam 11 is converged by the focusing lens group 7 in the horizontal direction, forming a vertical spot area. The whole beam is represented as a vertical thin line, where 301 is the spot area after convergence.

[0081] Figure 5 This is a schematic diagram of a two-dimensional dispersed beam after the transverse stripe beam 11 is dispersed laterally by the grating in this invention. It can also be represented as a schematic diagram of the image after the two-dimensional dispersed beam 12 is focused and imaged by the focusing lens group 7. The image after focusing and imaged by the focusing lens group 7 is a two-dimensional spectral image distribution. For example... Figure 5As shown, the brightness or grayscale of the 401 image represents different wavelengths, not light intensity, and the 301 spot area is dispersed in the horizontal direction, that is, the horizontal order overlap is dispersed, thus obtaining a two-dimensional dispersive spectral image.

Claims

1. A spectrometer, characterized by It comprises, along the optical axis in turn: incident light (1), collimating lens group (2), cylindrical lens array (3), F-P flat plate (4), grating (6), focusing lens group (7), optical signal processing assembly (8); The collimating lens group (2), cylindrical lens array (3), F-P flat plate (4), grating (6), focusing lens group (7) and optical signal processing assembly (8) are coaxial and equal height, the cylindrical lens array (3) and F-P flat plate (4) are arranged in parallel and inclined to one side so that the cylindrical lens array (3) focal line focuses on the F-P flat plate (4) incident surface, the F-P flat plate (4) incident surface is provided with slit array (5), the slit array (5) comprises a plurality of incident slits arranged on the F-P flat plate (4) incident surface and equidistant along the Y axis direction, the F-P flat plate (4) incident surface is provided with high reflection film, the exit surface is provided with reflection film; The incident light (1) is used for providing and emitting incident light beam; The collimating lens group (2) is used for collimating the incident light (1) into parallel light beam (9) and shooting on each cylindrical lens in the cylindrical lens array (3); Each cylindrical lens in the cylindrical lens array (3) is used for focusing the parallel light beam (9) emitted by the collimating lens group (2) into a thin line light beam (10) and shooting on the corresponding incident slit on the F-P flat plate (4); The F-P flat plate (4) is used for separating the thin line light beam (10) emitted by the cylindrical lens array (3) into angle stripes in the Y axis direction according to the order, and the F-P flat plate (4) is used for making the thin line light beam (10) entering the F-P flat plate (4) multiple reflection and forming a multi-beam interference, and then generating a transverse stripe light beam (11) with order stripes, the transverse stripe light beam (11) is shot on the grating (6) at different wavelengths according to the angle, and each bright stripe in the transverse stripe light beam (11) has different orders of light of different wavelengths overlapping; The grating (6) is used for dispersing the transverse stripe light beam (11) existing X axis direction overlap in the X axis direction, and different wavelength transverse stripe light beam (11) will be in different positions in the X axis direction due to grating (6) dispersion and form two-dimensional dispersion light beam (12) to shoot on the focusing lens group (7); The focusing lens group (7) is used for focusing the two-dimensional dispersion light beam (12) emitted by the grating (6) on the optical signal processing assembly (8); The optical signal processing assembly (8) is used for receiving and processing the spectral pattern or spectral signal focused by the focusing lens group (7).

2. The optical spectrometer of claim 1, wherein The slit array (5) comprises a plurality of incident slits arranged on the F-P flat plate (4) incident surface and equidistant adjacent along the Y axis direction.

3. The optical spectrometer of claim 2, wherein The center distance between the adjacent incident slits on the F-P flat plate (4) is 0.1-10mm.

4. The optical spectrometer of claim 1, wherein The width of the incident slit on the F-P flat plate (4) is 1-100um.

5. The optical spectrometer of claim 1, wherein The grating (6) is a transmission type or reflection type grating.

6. The optical spectrometer of claim 1, wherein The optical signal processing assembly (8) is a CCD detector or CMOS device.

7. A method of spectral detection, characterized by The method comprises the following steps of: S1, adjusting the coaxial height of the collimating lens group (2), the cylindrical lens array (3), the F-P plate (4), the grating (6), the focusing lens group (7), and the light signal processing assembly (8), and adjusting the parallelism and the side inclination of the cylindrical lens array (3) and the F-P plate (4); S2, the incident light (1) is input, and the light beam emitted by the incident light (1) is collimated into a parallel light beam (9) by the collimating lens group (2) and is incident on each cylindrical lens of the cylindrical lens array (3), each cylindrical lens of the cylindrical lens array (3) focuses the parallel light beam (9) emitted by the collimating lens group (2) in the X-axis direction into a plurality of linear light beams (10) and is incident on the corresponding incident slit of the F-P plate (4); S3, the linear light beams (10) emitted by the cylindrical lens array (3) are incident on the F-P plate (4) through the corresponding incident slit of the F-P plate (4) and are incident on the exit surface of the F-P plate (4), then the linear light beams (10) are reflected and emitted between the exit surface and the incident surface of the F-P plate (4) multiple times, multiple-beam interference is formed at different angles, transverse stripe light beams (11) are generated, and each bright stripe of the transverse stripe light beams (11) has different orders of superposition of light of different wavelengths, the transverse stripe light beams (11) of the same angle have the same wavelength combination, the optical path difference is Δ, and Δ = 2π×2ndCOS(θ), wherein n is the refractive index of glass, d is the thickness of the F-P plate, and θ is the angle of the light; when Δ is an integer multiple of the wavelength, the bright stripe is obtained; For m = Δ / λ, wherein λ is the wavelength, m is an integer, all Δ are the same, and all wavelengths are present at the same angle when m is an integer; S4, the grating (6) disperses the wavelengths of the transverse stripe light beams (11) in the X-axis direction to form two-dimensional dispersion light beams (12) in the Y-axis direction and the X-axis direction, the two-dimensional dispersion light beams (12) are incident on the focusing lens group (7), the focusing lens group (7) focuses the two-dimensional dispersion light beams (12) on the light signal processing assembly (8), the light signal processing assembly (8) receives and processes the light signal and transmits the light signal to an external host computer for analysis and feedback.

8. The method of claim 7, wherein In steps S2 and S3, the F-P plate (4) provided with the slit array (5) is used, and the multiple incident slits on the F-P plate (4) are used to increase the intensity of the incident light.

Images