A multi-mode physical vapor deposition apparatus

Abstract

The application discloses a kind of multi-mode physical vapor deposition equipment, it is related to thin film preparation technical field, including vehicle body, the control system component is fixedly connected in the top of vehicle body, four support columns are fixedly connected with rectangular orientation in the top of vehicle body away from control system component side, reaction cylinder is installed in the top of four support columns, box door is hinged to the outer wall of the end of reaction cylinder away from control system component, the article plate is arranged in the inside of reaction cylinder, the heat insulation sealing plate is fixedly connected in the inside of reaction cylinder close to box door side, the discharge port is opened in the bottom inner wall of reaction cylinder, the auxiliary cleaning mechanism for being cleaned to the metal surface of film to be prepared by the rotary action of rotating brush is arranged on the outer wall of heat insulation sealing plate, the purpose of metal surface cleaning is realized, so that metal surface is dry and clean state, so as to facilitate the preparation of subsequent metal surface film, improve the uniformity of coating, and then improve the quality of film preparation.

Description

Technical Field

[0001] This invention relates to the field of thin film preparation technology, specifically to a multi-mode physical vapor deposition apparatus. Background Technology

[0002] Physical vapor deposition (PVD) equipment is a device used for thin film preparation. It utilizes gas-phase reactions to convert gas or volatile preforms into solid thin films, and physical vapor deposition has the following advantages;

[0003] First, a thin film can be formed on the metal surface through physical vapor deposition to protect it from corrosion and oxidation by the external environment. For example, metal nitride films prepared by physical vapor deposition can provide high hardness and corrosion resistance, protecting the metal surface from the erosion of chemical reagents.

[0004] Secondly, physical vapor deposition can prepare thin films with specific functions on metal surfaces, thereby enhancing their performance. For example, in optical devices, transparent conductive oxide thin films can be prepared on metal surfaces by physical vapor deposition, which can combine the conductivity of metals with the advantages of transparent materials to realize the function of transparent conductive thin films.

[0005] Third, physical vapor deposition can control the properties of metal surfaces, such as surface roughness and crystal structure, thereby affecting the interfacial properties between metals and other materials. This is crucial for some applications, such as device packaging, material chromatography, and interfacial diffusion.

[0006] In addition, physical vapor deposition is not only suitable for metal surfaces, but also for the preparation of thin films on other material surfaces. The reason for choosing physical vapor deposition is that it has a high deposition rate, good film uniformity and high film quality, which can meet the requirements of thin film preparation on metal surfaces.

[0007] A physical vapor deposition apparatus disclosed in patent publication number "CN201911210758.7" uses multiple second stages set on a first stage, with a rotational speed difference between the second stage and the first stage. That is, the rotational speed of the second stage is different from that of the first stage. Therefore, the movement trajectory of the substrate on the second stage is complex, which makes the sputtered ions more uniform in the deposition process and improves the uniformity of the coating.

[0008] However, compared with the device in the document and existing technology, the following shortcomings still exist in actual use:

[0009] 1. When a metal surface needs to be prepared by physical vapor deposition, it is necessary to ensure that the metal surface is clean. Dust will affect the quality of the prepared film and make the metal surface prone to uneven coating, thereby reducing the yield of the prepared metal surface film.

[0010] 2. Reaction chambers are often used in the preparation of thin films on metal surfaces. Since the inside of the reaction chamber is often in a high-temperature environment and changes occur during the metal surface coating process, impurities generated during the thin film preparation process will splash onto the inner wall of the reaction chamber, which can easily affect the subsequent preparation of thin films on metal surfaces, causing metal surface contamination and reducing the coating effect.

[0011] Therefore, in view of this, the present invention proposes a multi-mode physical vapor deposition apparatus to make up for and improve the shortcomings of the prior art. Summary of the Invention

[0012] To address the aforementioned technical problems, this invention provides a multi-mode physical vapor deposition apparatus to solve the technical problem mentioned in the background art where dust affects the quality of thin film preparation and makes the metal surface prone to uneven coating, thereby reducing the yield of thin film preparation on the metal surface.

[0013] To achieve the above objectives, the technical solution adopted by the present invention is as follows: It includes a vehicle body, a control system component fixedly connected to the top of the vehicle body, four support columns fixedly connected in a rectangular orientation on the side of the top of the vehicle body away from the control system component, a reaction cylinder mounted on the top of the four support columns, a door hinged to the outer wall of the end of the reaction cylinder away from the control system component, a storage plate inside the reaction cylinder, a heat-insulating sealing plate fixedly connected to the side of the reaction cylinder near the door, a discharge port on the inner wall of the bottom of the reaction cylinder, an auxiliary cleaning mechanism on the outer wall of the heat-insulating sealing plate for cleaning the metal surface of the film to be prepared by rotating a brush, a scraping mechanism inside the reaction cylinder for removing impurities adhering to the inner wall of the reaction cylinder by scraping with an annular scraper, and an auxiliary control mechanism inside the storage plate for controlling the entry and exit of the storage plate by pushing and pulling a handle.

[0014] Furthermore, the auxiliary cleaning mechanism includes a cleaning box fixedly connected to the outer wall of the heat-insulating sealing plate. A first fixing block is fixedly connected to the side wall of the cleaning box. A first rotating shaft is rotatably connected through the first fixing block. A gear is fixedly connected to the bottom of the first rotating shaft and below the first fixing block. A second fixing block is fixedly connected to the side wall of the cleaning box away from the first fixing block. A second rotating shaft is rotatably connected to the top of the second fixing block. A first pulley is fixedly connected to the top of the first rotating shaft. A second pulley is fixedly connected to the top of the second rotating shaft. A belt is drivingly connected between the first pulley and the second pulley. A rotating brush is rotatably disposed on the inner wall of the top of the cleaning box. The rotating brush is driven and connected to the belt.

[0015] Furthermore, four rotating brushes are evenly connected to the inner wall of the top of the cleaning box, and a dustproof plate is fixedly connected to the inner wall of the top of the cleaning box and to one side of the rotating brushes.

[0016] Furthermore, a fixing frame is fixedly connected to the inner wall of the reaction cylinder at the end away from the box door, and a fixing column is fixedly connected to the outer wall of the fixing frame on the side near the shelf, with a slide rail fixedly connected to the end of the fixing column.

[0017] Furthermore, the shelf is slidably connected to the top of the slide rail, and racks are symmetrically fixed to both outer walls of the shelf.

[0018] Furthermore, the scraping mechanism includes cylindrical guide rods symmetrically fixedly connected to the outer wall of the fixed frame. A first fixing ring is provided on the outer wall of the cylindrical guide rod. The inner wall of the first fixing ring is slidably engaged with the outer wall of the cylindrical guide rod. A second fixing ring is fixedly connected to the side of the first fixing ring away from the fixed frame. The outer diameter of the second fixing ring is smaller than the outer diameter of the first fixing ring. The annular scraper is fixedly connected to the outer wall of the first fixing ring. A dust collection hood is fixedly connected to the outer wall of the second fixing ring near the annular scraper.

[0019] Furthermore, a connecting rod is fixedly connected to the outer wall of the second fixing ring. The end of the connecting rod away from the second fixing ring is fixedly connected to the outer wall of the shelf. A dust guide plate is fixedly connected to the bottom of the connecting rod. Two connecting rods and two dust guide plates are symmetrically arranged.

[0020] Furthermore, the auxiliary control mechanism includes a long groove inside the shelf, a limit block is fixedly connected to the inner wall of the long groove, a pull ring is slidably arranged inside the long groove, the pull ring is located outside the limit block, the handle is fixedly connected to the end of the pull ring, and support rods are symmetrically fixedly connected to the outer walls on both sides of the pull ring. A guide wheel is rotatably connected to the top of the support rod, and the guide wheel rolls in cooperation with the side wall of the long groove.

[0021] Furthermore, a bracket is fixedly connected to the top of the cleaning box, and a cooling fan is rotatably connected to the bottom of the bracket.

[0022] Compared with the prior art, the beneficial effects of the present invention are:

[0023] (1) By setting up an auxiliary cleaning mechanism, when the belt drives, the rotating brush rotates and then the placement plate is continuously pushed in to achieve the purpose of cleaning the metal surface, so that the metal surface is dry and clean, which is conducive to the subsequent preparation of thin film on the metal surface, improves the coating uniformity, and thus improves the quality of thin film preparation.

[0024] (2) By setting up a scraping mechanism, the impurities on the inner wall of the reaction cylinder are removed by the movement of the annular scraper in conjunction with the first fixed ring, so that the inner wall of the reaction cylinder is kept clean, thereby ensuring that the metal surface is not contaminated during the thin film preparation process and the coating effect is better.

[0025] (3) By setting up an auxiliary control mechanism and using a handle, it is convenient for staff to put in and take out the metal in the storage plate, while avoiding the situation where staff are burned due to direct contact with the storage plate due to the high temperature inside the reaction cylinder, thereby improving the safety of the device during use. Attached Figure Description

[0026] Figure 1 This is a front-view three-dimensional structural schematic diagram of the present invention;

[0027] Figure 2 This is a side view of the three-dimensional structure of the reaction cylinder of the present invention;

[0028] Figure 3 This is a half-sectional view of the three-dimensional structure of the reaction cylinder of the present invention;

[0029] Figure 4 This is a partial cross-sectional view of the three-dimensional structure of the reaction cylinder of the present invention;

[0030] Figure 5 This is a side view of the three-dimensional structure of the shelf of the present invention;

[0031] Figure 6 This is a three-dimensional structural diagram of the auxiliary cleanroom mechanism of the present invention;

[0032] Figure 7 This is a three-dimensional structural diagram of the scraping mechanism of the present invention;

[0033] Figure 8 This is a three-dimensional structural diagram of the shelf of the present invention;

[0034] Figure 9 This is a three-dimensional structural diagram of the auxiliary control mechanism of the present invention;

[0035] Figure 10 This is a schematic diagram of the three-dimensional structure of the slide rail of the present invention.

[0036] The diagram is labeled as follows: 1. Vehicle body; 2. Control system components; 3. Reactor; 301. Support column; 302. Door; 31. Storage plate; 32. Heat insulation and sealing plate; 401. Cleaning box; 402. First fixing block; 403. First rotating shaft; 404. Gear; 405. Second fixing block; 406. Second rotating shaft; 407. First pulley; 408. Second pulley; 409. Belt; 410. Rotating brush; 501. Dustproof plate; 50 2. Fixing frame; 503. Fixing column; 504. Slide rail; 505. Rack; 601. Cylindrical guide rod; 602. First fixing ring; 603. Second fixing ring; 604. Annular scraper; 605. Dust collection hood; 701. Connecting rod; 702. Dust guide plate; 703. Discharge port; 801. Long groove; 802. Limiting block; 803. Pull ring; 804. Handle; 805. Support rod; 806. Guide wheel; 901. Bracket; 902. Cooling fan. Detailed Implementation

[0037] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present invention.

[0038] Embodiments of the present invention

[0039] Please refer to Figures 3 to 6 As shown, the device includes a vehicle body 1, a control system component 2 fixedly connected to the top of the vehicle body 1, four support columns 301 fixedly connected in a rectangular orientation on the side of the top of the vehicle body 1 away from the control system component 2, a reaction cylinder 3 installed on the top of the four support columns 301, a door 302 hinged to the outer wall of the end of the reaction cylinder 3 away from the control system component 2, a storage plate 31 provided inside the reaction cylinder 3, a heat insulation sealing plate 32 fixedly connected to the side of the inside of the reaction cylinder 3 near the door 302, a discharge port 703 opened on the inner wall of the bottom of the reaction cylinder 3, and an auxiliary cleaning mechanism provided on the outer wall of the heat insulation sealing plate 32 to achieve cleaning of the metal surface of the film to be prepared by the rotation of a rotating brush 410.

[0040] The auxiliary cleaning mechanism includes a cleaning box 401 fixedly connected to the outer wall of the heat-insulating sealing plate 32. A first fixing block 402 is fixedly connected to the side wall of the cleaning box 401. A first rotating shaft 403 is rotatably connected through the first fixing block 402. A gear 404 is fixedly connected to the bottom of the first rotating shaft 403 and located below the first fixing block 402. A second fixing block 405 is fixedly connected to the side wall of the cleaning box 401 away from the first fixing block 402. A second rotating shaft 406 is rotatably connected to the top of the second fixing block 405. A first pulley 407 is fixedly connected to the top of the first rotating shaft 403. A second pulley 408 is fixedly connected to the top of the second rotating shaft 406. The first pulley 407 and the second pulley 408... A belt 409 is connected for transmission. A rotating brush 410 is rotatably mounted on the inner wall of the top of the cleaning box 401. The rotating brush 410 is connected to the belt 409 for transmission. Four rotating brushes 410 are evenly connected to the inner wall of the top of the cleaning box 401. A dustproof plate 501 is fixedly connected to the inner wall of the top of the cleaning box 401 and to one side of the rotating brush 410. A bracket 901 is fixedly connected to the top of the cleaning box 401. A cooling fan 902 is rotatably connected to the bottom of the bracket 901. As the rotating brush 410 rotates and is continuously pushed in with the placement plate 31, the purpose of cleaning the metal surface is achieved, so that the metal surface is dry and clean, which is beneficial to the subsequent preparation of thin films on the metal surface and improves the quality of the thin film preparation.

[0041] Please refer to Figure 7 As shown, a fixing frame 502 is fixedly connected to the inner wall of the reaction cylinder 3 at the end away from the box door 302. A fixing column 503 is fixedly connected to the outer wall of the fixing frame 502 near the shelf 31. A slide rail 504 is fixedly connected to the end of the fixing column 503. The shelf 31 is slidably connected to the top of the slide rail 504. A rack 505 is symmetrically fixedly connected to both outer walls of the shelf 31.

[0042] Please refer to Figure 5 , Figure 7 As shown, preferably, the reaction cylinder 3 is provided with a scraping mechanism that removes impurities adhering to the inner wall of the reaction cylinder 3 by means of the scraping action of the annular scraper 604.

[0043] The scraping mechanism includes cylindrical guide rods 601 symmetrically fixed to the outer wall of the fixing frame 502. A first fixing ring 602 is provided on the outer wall of the cylindrical guide rods 601, with the inner wall of the first fixing ring 602 slidingly engaging with the outer wall of the cylindrical guide rods 601. A second fixing ring 603 is fixedly connected to the side of the first fixing ring 602 away from the fixing frame 502. The outer diameter of the second fixing ring 603 is smaller than the outer diameter of the first fixing ring 602. An annular scraper 604 is fixedly connected to the outer wall of the first fixing ring 602, and the outer wall of the second fixing ring 603 near the annular scraper 604 is fixedly connected to the outer wall of the second fixing ring 603. A dust collection hood 605 is fixedly connected to the outer wall of the second fixed ring 603, and a connecting rod 701 is also fixedly connected to the outer wall of the placement plate 31. The end of the connecting rod 701 away from the second fixed ring 603 is fixedly connected to the outer wall of the placement plate 31. A dust guide plate 702 is fixedly connected to the bottom of the connecting rod 701. There are two connecting rods 701 and two dust guide plates 702 symmetrically arranged. By setting an annular scraper 604 in conjunction with the movement of the first fixed ring 602, impurities are removed from the inner wall of the reaction cylinder 3, so that the inner wall of the reaction cylinder 3 is kept clean. This ensures that the metal surface is not contaminated during the thin film preparation process, resulting in a better coating effect.

[0044] Please refer to Figures 8 to 10 As shown, preferably, the shelf 31 is provided with an auxiliary control mechanism inside, which controls the entry and exit of the shelf 31 by pushing and pulling the handle 804.

[0045] The auxiliary control mechanism includes a long groove 801 inside the storage plate 31. A limit block 802 is fixedly connected to the inner wall of the long groove 801. A pull ring 803 is slidably arranged inside the long groove 801, located outside the limit block 802. A handle 804 is fixedly connected to the end of the pull ring 803. Support rods 805 are symmetrically fixedly connected to the outer walls on both sides of the pull ring 803. A guide wheel 806 is rotatably connected to the top of the support rod 805. The guide wheel 806 rolls with the side wall of the long groove 801, which facilitates the insertion and removal of metal from the storage plate 31 by the operator, while avoiding burns caused by direct contact with the storage plate 31 due to the high temperature inside the reaction cylinder 3, thereby improving the safety of the device during use.

[0046] The following are the complete usage steps and working principle of the above embodiments:

[0047] When in use, the device can prepare thin films on the surfaces of metals, semiconductors, and ceramics, thereby giving these materials better corrosion resistance. When preparing thin films on metal surfaces, the operator opens the door 302 and pulls the handle 804 towards the side where they are standing. This causes the handle 804 to move along with the pull ring 803, which slides inside the long groove 801. The limiting block 802 further restricts the movement of the pull ring 803, allowing it to pull the shelf 31 along the outer wall of the slide rail 504. The support rod 805, in conjunction with the guide wheel 806, provides support and limits the movement of the pull ring 803 within the long groove 801, improving the stability of the pull ring 803 and handle 804 during use. The handle 804 facilitates the insertion and removal of metal from the shelf 31 while preventing burns from direct contact with the shelf 31 due to the high temperature inside the reaction chamber 3, thus enhancing the safety of the device during use.

[0048] When the shelf 31 slides on the surface of the slide rail 504, it moves the second fixing ring 603 via the connecting rod 701. The second fixing ring 603 and the first fixing ring 602 slide on the outer wall of the cylindrical guide rod 601, causing the annular scraper 604, fixed to the outer wall of the first fixing ring 602, to contact the inner wall of the reaction cylinder 3. Simultaneously, the force generated by the movement scrapes away impurities adhering to the inner wall of the reaction cylinder 3. The scraped-off impurities can slide down through the gap between the first fixing ring 602 and the second fixing ring 603. The dust collection hood 605 acts as a barrier, preventing impurities from scattering and affecting the cleaning effect. The scraped-off impurities then slide down into the reaction cylinder. Impurities on the inner wall of the bottom of the cylinder 3 will leak out through the discharge port 703. The discharge port 703 needs to be opened in advance when unloading impurities, and the discharge port 703 is always closed during the operation of the reaction cylinder 3. The movement of the first fixing ring 602 drives the connecting rod 701 and the dust guide plate 702 to push the impurities falling on the inner wall of the bottom of the reaction cylinder 3, so that the impurities can be pushed into the discharge port 703, thereby speeding up the processing of impurities. The annular scraper 604 is set to work with the movement of the first fixing ring 602 to remove impurities from the inner wall of the reaction cylinder 3, so that the inner wall of the reaction cylinder 3 is kept clean, thereby preventing the metal surface from being contaminated during the thin film preparation process and making the coating effect better.

[0049] When the placement plate 31 is pulled out and placed outside the reaction cylinder 3, the operator places metal inside the placement plate 31 and then pushes the placement plate 31 into the reaction cylinder 3, causing the placement plate 31 to slide on the top of the slide rail 504. As the rack 505 on the outer wall of the placement plate 31 meshes with the gear 404 and rotates, the first rotating shaft 403 drives the first pulley 407 to rotate. Since the first pulley 407 and the second pulley 408 are connected by a belt 409, when the belt 409 drives, the rotating brush 410 rotates, which in turn works with the placement plate 31 to continuously push in, achieving the purpose of cleaning the metal surface, making the metal surface dry and clean, which is beneficial for subsequent thin-film treatment on the metal surface. The preparation of the film improves the uniformity of the coating and enhances the quality of the film preparation. After the placement plate 31 is pushed into place, the door 302 is closed, and the reaction cylinder 3 is controlled by the control system component 2 to start the film preparation work. The heat insulation sealing plate 32 can isolate heat, keeping the heat insulation sealing plate 32 and the door 302 at a normal temperature, thereby avoiding damage to the internal components of the cleaning box 401 by high temperature. By setting the cooling fan 902, when the placement plate 31 is pulled out from the inside of the reaction cylinder 3, the cooling fan 902 is activated to cool the surface of the placement plate 31. The use of air cooling can accelerate the heat dissipation of the placement plate 31, which helps to avoid burns when the staff handles the metal and improves the safety of film preparation.

[0050] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A multi-mode physical vapor deposition apparatus, comprising a vehicle body (1), wherein a control system component (2) is fixedly connected to the top of the vehicle body (1), and four support columns (301) are fixedly connected in a rectangular orientation on the side of the top of the vehicle body (1) away from the control system component (2), wherein a reaction cylinder (3) is installed on the top of the four support columns (301), and a door (302) is hinged to the outer wall of the end of the reaction cylinder (3) away from the control system component (2), characterized in that: The reaction cylinder (3) is provided with a storage plate (31) inside. A heat insulation sealing plate (32) is fixedly connected to the side of the reaction cylinder (3) near the box door (302). A discharge port (703) is opened on the inner wall of the bottom of the reaction cylinder (3). The outer wall of the heat-insulating sealing plate (32) is provided with an auxiliary cleaning mechanism for cleaning the metal surface of the film to be prepared by rotating a rotating brush (410). The auxiliary cleaning mechanism includes a cleaning box (401) fixedly connected to the outer wall of the heat-insulating sealing plate (32). A first fixing block (402) is fixedly connected to the side wall of the cleaning box (401). A first rotating shaft (403) is rotatably connected through the first fixing block (402). A gear (404) is fixedly connected to the bottom of the first rotating shaft (403) and below the first fixing block (402). The side wall of the cleaning box (401) is far from the... A second fixed block (405) is fixedly connected to one side of the first fixed block (402). A second rotating shaft (406) is rotatably connected to the top of the second fixed block (405). A first pulley (407) is fixedly connected to the top of the first rotating shaft (403). A second pulley (408) is fixedly connected to the top of the second rotating shaft (406). A belt (409) is drivingly connected between the first pulley (407) and the second pulley (408). The rotating brush (410) is rotatably disposed on the inner wall of the top of the cleaning box (401). The rotating brush (410) is drivingly connected to the belt (409). The reaction cylinder (3) is equipped with a scraping mechanism that removes impurities adhering to the inner wall of the reaction cylinder (3) by means of a scraping action of an annular scraper (604). The scraping mechanism includes cylindrical guide rods (601) symmetrically fixed to the outer wall of the fixing frame (502). A first fixing ring (602) is provided on the outer wall of the cylindrical guide rod (601). The inner wall of the first fixing ring (602) is slidably engaged with the outer wall of the cylindrical guide rod (601). A second fixing ring is fixedly connected to the side of the first fixing ring (602) away from the fixing frame (502). The outer diameter of the second fixed ring (603) is smaller than that of the first fixed ring (602). The annular scraper (604) is fixedly connected to the outer wall of the first fixed ring (602). A dust collection hood (605) is fixedly connected to the outer wall of the second fixed ring (603) near the annular scraper (604). A connecting rod (701) is also fixedly connected to the outer wall of the second fixed ring (603). The end of the connecting rod (701) away from the second fixed ring (603) is fixedly connected to the outer wall of the shelf (31). The shelf (31) is provided with an auxiliary control mechanism inside, which controls the entry and exit of the shelf (31) by pushing and pulling the handle (804). The auxiliary control mechanism includes a long groove (801) opened inside the shelf (31). A limit block (802) is fixedly connected to the inner wall of the long groove (801). A pull ring (803) is slidably arranged inside the long groove (801). The pull ring (803) is located outside the limit block (802). The handle (804) is fixedly connected to the end of the pull ring (803). Support rods (805) are symmetrically fixedly connected to the outer walls on both sides of the pull ring (803). A guide wheel (806) is rotatably connected to the top of the support rod (805). The guide wheel (806) rolls with the side wall of the long groove (801).

2. The multi-mode physical vapor deposition apparatus according to claim 1, characterized in that: Four rotating brushes (410) are evenly connected to the inner wall of the top of the cleaning box (401). A dustproof plate (501) is fixedly connected to the inner wall of the top of the cleaning box (401) and to one side of the rotating brushes (410).

3. The multi-mode physical vapor deposition apparatus according to claim 1, characterized in that: A fixing frame (502) is fixedly connected to the inner wall of the reaction cylinder (3) away from the box door (302). A fixing column (503) is fixedly connected to the outer wall of the fixing frame (502) near the shelf (31). A slide rail (504) is fixedly connected to the end of the fixing column (503).

4. The multi-mode physical vapor deposition apparatus according to claim 3, characterized in that: The shelf (31) is slidably connected to the top of the slide rail (504), and racks (505) are symmetrically fixed to the outer walls on both sides of the shelf (31).

5. The multi-mode physical vapor deposition apparatus according to claim 1, characterized in that: The bottom of the connecting rod (701) is fixedly connected to a guide plate (702), and there are two connecting rods (701) and two guide plates (702) symmetrically arranged.

6. The multi-mode physical vapor deposition apparatus according to claim 1, characterized in that: The top of the cleaning box (401) is fixedly connected to a bracket (901), and the bottom of the bracket (901) is rotatably connected to a cooling fan (902).

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