Method for transferring micro devices and micro device structure

CN117317072BActive Publication Date: 2026-08-28CHONGQING KONKA PHOTOELECTRIC TECH RES INST CO LTD
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Patent Information

Application Number
CN202210710809.8
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2022-06-22
Publication Date
2026-08-28
Estimated Expiration
2042-06-22

AI Technical Summary

Technical Problem

[0004]鉴于上述问题,本申请的目的在于提供一种微器件的转移方法及微器件结构,旨在解决微器件转移时,氮气的冲击力会使芯片无法平稳地转移至目标背板上,导致芯片出现倾斜、侧立、翻转、移位等的问题

Benefits of technology

[0025]多个间隔排布的微器件,位于所述缓冲结构的上表面,与所述缓冲结构一一对应设置;

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Abstract

The present application relates to a kind of transfer method of micro device and micro device structure.The transfer method of micro device includes: providing the micro device structure to be transferred, the micro device structure to be transferred includes substrate, multiple micro devices on substrate by buffer structure, elastic sealing structure;Elastic sealing structure is connected to substrate, and each buffer structure corresponding to micro device and at least part of the sidewall of each micro device is surrounded;Providing back plate, and the micro device structure to be transferred is arranged opposite to back plate;Using laser to decompose buffer structure, the gas generated when buffer structure decomposes makes elastic sealing structure expand and stretch, and micro device is topped to the surface of back plate;Remove elastic sealing structure, to transfer micro device to back plate.Can make micro device quickly and mass transfer to back plate, and can avoid micro device to incline, roll over and fall in back plate in the process of transfer, improve transfer yield, and simple and convenient operation.
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Citation Information

Patent Citations

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