Bottom uniformity plate of dual-chamber ald apparatus and dual-chamber ald apparatus

Abstract

The present disclosure relates to the technical field of double-cavity ALD equipment, and particularly relates to a bottom gas distribution plate of double-cavity ALD equipment and double-cavity ALD equipment. The bottom gas distribution plate of double-cavity ALD equipment comprises a plate body, an inlet gas cavity and an outlet gas cavity, the inlet gas cavity and the outlet gas cavity are arranged on the plate body, the inlet gas cavity comprises a first inlet gas chamber and a second inlet gas chamber, the first inlet gas chamber and the second inlet gas chamber are provided with an inlet gas interface and a plurality of reaction cavity outlet gas holes, the plurality of reaction cavity outlet gas holes are arranged on one side of the plate body close to the reaction cavity, the inlet gas interface is arranged on the side of the plate body away from the reaction cavity, and the plurality of reaction cavity outlet gas holes of the first inlet gas chamber and the second inlet gas chamber are alternately and spacedly arranged; the outlet gas cavity is provided with an outlet gas interface and a plurality of reaction cavity outlet gas holes, and the plurality of reaction cavity outlet gas holes and the plurality of reaction cavity outlet gas holes are arranged on the two sides of the plate surface of the plate body. The present disclosure makes the reaction medium of the reaction chamber more evenly distributed in the cavity during the inlet and outlet process, and makes the experimental results more stable.

Description

Technical Field

[0001] This disclosure relates to the field of dual-cavity ALD equipment technology, and in particular to a bottom air distribution plate and a dual-cavity ALD equipment. Background Technology

[0002] Atomic Layer Deposition (ALD) is a method for precisely controlling the thickness and composition of thin films at the micro- and nanoscale. Temperature has a significant impact on the deposition process and film properties. During ALD, the chemical reaction of the new atomic layer is directly related to the previous layer, allowing only one atomic layer to be deposited per reaction; hence, it is also called single-atom layer deposition. ALD involves the continuous introduction of at least two gaseous precursor species onto a substrate in a heated reactor. The chemisorption process automatically terminates when the surface becomes saturated. Appropriate process temperatures inhibit the physical adsorption of molecules on the surface.

[0003] In the process, the uniform diffusion of the two gaseous precursors in the cavity requires the help of a gas equalization plate to achieve higher uniformity in the experimental results. However, the existing gas equalization plate only has a single air inlet hole, and the uniformity of the two gases entering the reaction cavity one after the other or simultaneously is poor. Summary of the Invention

[0004] This disclosure aims to address at least one of the technical problems existing in the prior art or related technologies.

[0005] Therefore, in a first aspect of this disclosure, a bottom air distribution plate for a dual-cavity ALD device is provided, comprising a plate body, an air inlet cavity, and an air outlet cavity, wherein the air inlet cavity and the air outlet cavity are disposed on the plate body, wherein...

[0006] The air intake chamber includes a first air intake chamber and a second air intake chamber. The first air intake chamber and the second air intake chamber are provided with an air intake interface and a plurality of reaction chamber air outlets. The plurality of reaction chamber air outlets are provided on the side of the plate close to the reaction chamber, and the air intake interface is provided on the side of the plate opposite to the reaction chamber. The plurality of reaction chamber air outlets in the first air intake chamber and the second air intake chamber are alternately spaced.

[0007] The air outlet chamber is provided with an air extraction interface and multiple reaction chamber air extraction holes, and the multiple reaction chamber air extraction holes and multiple reaction chamber air outlet holes are located on both sides of the plate body.

[0008] In one feasible implementation, the first intake chamber and the second intake chamber have wavy surfaces, and the wavy surfaces of the first intake chamber and the second intake chamber are arranged opposite to each other and fit together.

[0009] In one feasible implementation, the first air intake chamber and the second air intake chamber are configured as arc-shaped.

[0010] In one feasible implementation, the multiple reaction chamber outlets of the first air intake chamber and the second air intake chamber are arranged on the same arc.

[0011] In one feasible implementation, the reaction chamber outlets of both the first and second air inlet chambers are provided with five.

[0012] In one feasible implementation, the number of vent holes in the reaction chamber is the same as the number of vent holes in the reaction chamber, and the vent holes in the reaction chamber are positioned opposite to the vent holes in the reaction chamber.

[0013] In one feasible implementation, the air inlet and the air extraction port are disposed on the same plate, and the air extraction port is disposed at the center of the air outlet cavity.

[0014] In one feasible implementation, the inner walls of the air intake chamber and the air outlet chamber are arc-shaped.

[0015] In one feasible implementation, the plate is characterized in that it is detachably connected to the bottom of the dual-cavity ALD device.

[0016] A second aspect of this disclosure provides a dual-cavity ALD device, including the bottom gas equalization plate of the aforementioned dual-cavity ALD device.

[0017] Compared with the prior art, this disclosure has at least the following beneficial effects: This disclosure provides an air inlet chamber and an air outlet chamber on the plate body of the gas equalization plate. The air inlet chamber includes a first air inlet chamber and a second air inlet chamber, each with a separate air inlet interface connected to the medium to be injected. Multiple reaction chamber outlet holes are provided on the side of the first and second air inlet chambers near the reaction chamber for injecting the reaction medium into the reaction chamber. The multiple reaction chamber outlet holes of the first and second air inlet chambers are alternately spaced, ensuring uniform injection of the two types of reaction media. The air outlet chamber of this disclosure is provided with a suction interface and multiple reaction chamber suction holes. The multiple reaction chamber suction holes and multiple reaction chamber air outlet holes are located on both sides of the plate body. The multiple reaction chamber suction holes ultimately converge into a single suction interface, further uniformizing the reaction medium injected through the multiple reaction chamber outlet holes and greatly improving the uniformity of the injected medium in the reaction chamber. Attached Figure Description

[0018] The accompanying drawings, which are incorporated in and form a part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure.

[0019] To more clearly illustrate the technical solutions in the embodiments of this disclosure or the prior art, the accompanying drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0020] Various other advantages and benefits will become apparent to those skilled in the art upon reading the following detailed description of exemplary embodiments. The accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this application. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings:

[0021] Figure 1 A schematic diagram of the structure of the plate body of this disclosure having a reaction chamber vent and a reaction chamber extraction port;

[0022] Figure 2 This is a schematic diagram of the structure of the plate facing the reaction chamber side of this disclosure.

[0023] in, Figures 1 to 2 The correspondence between the reference numerals and component names in the attached drawings is as follows: 1-plate; 2-first air inlet chamber; 3-second air inlet chamber; 4-air inlet interface; 5-air outlet of reaction chamber; 6-air extraction port of reaction chamber; 7-wavy surface; 8-air extraction interface. Detailed Implementation

[0024] To better understand the above-mentioned objectives, features, and advantages of this disclosure, the solutions disclosed herein will be further described below. It should be noted that, unless otherwise specified, the embodiments and features described herein can be combined with each other.

[0025] Numerous specific details are set forth in the following description in order to provide a full understanding of this disclosure, but this disclosure may also be implemented in other ways different from those described herein; obviously, the embodiments in the specification are only some, and not all, of the embodiments of this disclosure.

[0026] In the process, the uniform diffusion of the two gaseous precursors in the cavity requires the help of a gas equalization plate to achieve higher uniformity in the experimental results. However, the existing gas equalization plate only has a single air inlet hole, resulting in poor uniformity when the two gases enter the reaction cavity sequentially or simultaneously.

[0027] Based on this, the present disclosure provides a bottom gas equalization plate for a dual-cavity ALD device. The gas equalization plate has an inlet cavity and an outlet cavity. The inlet cavity includes a first inlet chamber 2 and a second inlet chamber 3. Both the first and second inlet chambers 2 and 3 have separate inlet ports 4 connected to the medium to be injected. Multiple reaction chamber outlet holes 5 are provided on the side of the first and second inlet chambers 2 and 3 near the reaction chamber for injecting the reaction medium into the reaction chamber. The multiple reaction chamber outlet holes 5 of the first and second inlet chambers 2 are alternately spaced to ensure uniform injection of the two types of reaction media. The outlet cavity is provided with an extraction port 8 and multiple reaction chamber extraction holes 6. The multiple reaction chamber extraction holes 6 and multiple reaction chamber outlet holes 5 are located on both sides of the plate surface. The multiple reaction chamber extraction holes 6 ultimately converge into a single extraction port 8, further uniformizing the reaction medium injected through the multiple reaction chamber outlet holes 5 and greatly improving the uniformity of the injected medium in the reaction chamber.

[0028] The bottom gas distribution plate of this dual-cavity ALD device will be described in detail below through a specific embodiment:

[0029] Reference Figures 1 to 2 As shown, this disclosure provides a bottom gas equalization plate for a dual-cavity ALD device, including a plate body 1, an air inlet chamber, and an air outlet chamber. The air inlet chamber and the air outlet chamber are disposed on the plate body 1. The air inlet chamber includes a first air inlet chamber 2 and a second air inlet chamber 3. The first air inlet chamber 2 and the second air inlet chamber 3 are provided with an air inlet interface 4 and multiple reaction chamber air outlets 5. The multiple reaction chamber air outlets 5 are disposed on the side of the plate body 1 close to the reaction chamber, and the air inlet interface 4 is disposed on the side of the plate body 1 opposite to the reaction chamber. The multiple reaction chamber air outlets 5 of the first air inlet chamber 2 and the second air inlet chamber 3 are alternately spaced. The air outlet chamber is provided with an air extraction interface 8 and multiple reaction chamber air extraction holes 6. The multiple reaction chamber air extraction holes 6 and the multiple reaction chamber air outlets 5 are disposed on both sides of the plate body 1.

[0030] This disclosure provides an air inlet chamber and an air outlet chamber on the plate 1. Specifically, the air inlet chamber and the air outlet chamber of this disclosure are provided with accommodating spaces that can accommodate the reaction medium. Further, the air inlet chamber of this disclosure is provided with a first air inlet chamber and a second air inlet chamber, so there should be two independent accommodating spaces. The first air inlet chamber 2 and the second air inlet chamber 3 are each provided with a separate air inlet port 4 connected to the medium to be injected. Multiple reaction chamber air outlets 5 are provided on the side of the first air inlet chamber 2 and the second air inlet chamber 3 near the reaction chamber for injecting into the reaction chamber. The reaction medium is provided, and the multiple reaction chamber outlets 5 of the first and second air inlet chambers 2 are alternately arranged to ensure uniform injection of the two types of injection reaction media. Specifically, the number of reaction chamber outlets 5 in the first and second air inlet chambers 2 and 3 can be set to three, five, or different to meet the ratio requirements of special injection media. In this disclosure, both the first and second air inlet chambers 2 and 3 are provided with five reaction chamber outlets 5. The air outlet chamber of this disclosure is provided with an air extraction interface 8 and multiple reaction chamber air extraction holes 6. The multiple reaction chamber air extraction holes 6 and multiple reaction chamber outlets 5 are located on both sides of the plate body. The multiple reaction chamber air extraction holes 6 are finally converged into a total air extraction interface 8, which further uniformizes the reaction medium injected through the multiple reaction chamber outlets 5 and greatly improves the uniformity of the injection medium in the reaction chamber. In use, the reaction medium is injected into the accommodating spaces of the first air inlet chamber 2 and the second air inlet chamber 3 through the air inlet port 4. The first air inlet chamber 2 and the second air inlet chamber 3 typically contain two different types of reaction media, which are not yet fused at this stage. Then, the two reaction media are injected into the reaction chamber of the ALD device through the reaction chamber outlets 5 on the first air inlet chamber 2 and the second air inlet chamber 3. Because the reaction chamber outlets 5 on the first air inlet chamber 2 and the second air inlet chamber 3 are alternately arranged on one side of the reaction chamber, the reaction media injected through the two reaction chamber outlets 5 are of different types. This smaller metering injection makes it easier for the two reaction media to fuse uniformly compared to a single injection port. Furthermore, the reaction chamber outlets 5 can be designed as Venturi orifices to increase the fluid velocity and give the reaction media a certain impact force when injected into the reaction chamber. The reaction media exiting from adjacent reaction chamber outlets 5 fuse together through this impact force, further improving uniformity. It should be noted that the fluid velocity should be increased according to the characteristics of the reaction medium, and the vent holes 5 of the reaction chamber should be set to different sizes according to different types of reaction media.

[0031] By implementing the technical solution disclosed herein, the non-uniformity of Al2O3 on a 6-inch silicon wafer can be reduced to within ±0.5%, and the non-uniformity of SnO2 on a 6-inch silicon wafer can be reduced to within ±1%. The lower the non-uniformity, the higher the uniformity. This disclosure greatly improves the uniformity of the reaction medium.

[0032] In some embodiments, the first air intake chamber 2 and the second air intake chamber 3 of this disclosure have a corrugated surface 7, and the corrugated surfaces 7 of the first air intake chamber 2 and the second air intake chamber 3 are arranged opposite to each other and fit together.

[0033] In this embodiment, the first air intake chamber 2 and the second air intake chamber 3 are combined, which saves space and allows the reaction chamber outlets 5 of the first air intake chamber 2 and the second air intake chamber 3 to be closer together. Specifically, the first air intake chamber 2 and the second air intake chamber 3 have wavy surfaces 7, and the wavy surfaces on both sides are as follows: Figure 2 The diagram shows a mutual fit. Under this configuration, the air outlet 5 of the reaction chamber can be located at each protrusion of the corrugated surface 7. Thus, the air outlet 5 of the first air inlet chamber 2 and the second air inlet chamber 3 will be spaced apart on a line to achieve a better uniformity. Furthermore, the first air inlet chamber 2 and the second air inlet chamber 3 are set in an arc shape to better fit the structure of the reaction chamber.

[0034] In some embodiments, the multiple reaction chamber outlets 5 of the first air inlet chamber 2 and the second air inlet chamber 3 are arranged on the same arc.

[0035] In this embodiment, multiple reaction chamber vents 5 are on the same arc, which makes the injection of reaction medium into the reaction chamber vents 5 more concentrated, which helps the reaction medium to fuse and improves the uniformity of the reaction medium.

[0036] In some embodiments, the number of reaction chamber evacuation holes 6 is the same as the number of reaction chamber outlet holes 5, and the reaction chamber evacuation holes 6 and the reaction chamber outlet holes 5 are positioned opposite each other.

[0037] In this embodiment, the number of extraction holes 6 in the reaction chamber is the same as the number of outlet holes 5 in the reaction chamber, so that the pressure of the extraction holes 6 and the outlet holes 5 is consistent. If the number of extraction holes 6 is greater than the number of outlet holes 5, the inlet flow rate is less than the extraction flow rate, which may cause incomplete and uneven fusion of the reaction medium within the same time. If the number of extraction holes 6 is less than the number of outlet holes 5, the extraction pressure will be increased to ensure consistent flow rates in the extraction holes 6, causing the reaction medium to flow rapidly to the extraction holes 6, which will also lead to the aforementioned problem. When the number of extraction holes 6 and the number of outlet holes 5 are the same and correspond one-to-one, the reaction medium will be more uniform.

[0038] In some embodiments, the air inlet 4 and the air extraction 8 are disposed on the same plate, and the air extraction 8 is disposed at the center of the air outlet cavity.

[0039] In this embodiment, because of the accommodating space in the gas outlet chamber, when the gas extraction port 8 is located at the center of the gas outlet chamber, the distance from the gas extraction port 8 to the reaction medium being drawn into the accommodating space is almost the same. When the pressure of multiple reaction chamber gas extraction ports 6 converges to a single gas extraction port 8, the uniformity of the reaction medium can be improved again.

[0040] In some embodiments, the inner walls of the air intake chamber and the air outlet chamber are arc-shaped.

[0041] In this embodiment, the inner walls of the air inlet chamber and the air outlet chamber are set to arc shape. It can be understood that part or all of the inner walls of the first air inlet chamber 2 and the second air inlet chamber 3 that together form the air inlet chamber are also arc-shaped. This arc shape is intended to reduce the flow resistance of the reaction medium. For example, the air inlet chamber and the air outlet chamber are set to a cylindrical structure. The interface of the cylindrical channel can be circular or elliptical. In order to compress the thickness of the gas equalization plate, this disclosure sets it to elliptical.

[0042] In some embodiments, the plate 1 is detachably connected to the bottom of the dual-cavity ALD device. The detachable design makes it easier to clean and saves on subsequent maintenance and parts replacement costs.

[0043] A second aspect of this disclosure provides a dual-cavity ALD device, including the bottom gas equalization plate of the aforementioned dual-cavity ALD device.

[0044] In this disclosure, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance; the term "multiple" refers to two or more unless otherwise expressly defined. The terms "install," "connect," "link," and "fix" should be interpreted broadly. For example, "connect" can be a fixed connection, a detachable connection, or an integral connection; "link" can be a direct connection or an indirect connection through an intermediate medium. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0045] In the description of this disclosure, it should be understood that the terms "upper," "lower," "left," "right," "front," "rear," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or unit referred to must have a specific orientation or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0046] In the description of this specification, the terms "one embodiment," "some embodiments," "specific embodiment," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of this disclosure. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0047] The above are merely preferred embodiments of this disclosure and are not intended to limit this disclosure. Various modifications and variations can be made to this disclosure by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this disclosure should be included within the scope of protection of this disclosure.

Claims

1. A bottom gas equalization plate for a dual-chamber ALD device, characterized in that, It includes a plate, an air inlet chamber, and an air outlet chamber, wherein the air inlet chamber and the air outlet chamber are disposed on the plate. The air intake chamber includes a first air intake chamber and a second air intake chamber. The first air intake chamber and the second air intake chamber are provided with an air intake interface and a plurality of reaction chamber air outlets. The plurality of reaction chamber air outlets are provided on the side of the plate close to the reaction chamber, and the air intake interface is provided on the side of the plate opposite to the reaction chamber. The plurality of reaction chamber air outlets in the first air intake chamber and the second air intake chamber are alternately spaced. The gas outlet cavity is provided with a gas extraction interface and multiple reaction chamber gas extraction holes. The multiple reaction chamber gas extraction holes and multiple reaction chamber gas outlet holes are located on both sides of the plate surface. The multiple reaction chamber gas extraction holes are connected to the gas extraction interface so that the gas from the multiple reaction chamber gas extraction holes is collected in one gas extraction interface. The first air intake chamber, the second air intake chamber, and the air outlet chamber are each provided with a corresponding accommodating space; Both the first and second air intake chambers are provided with separate air intake ports that are connected to the medium to be injected; the two reaction media are injected into the accommodating spaces of the first and second air intake chambers respectively through the air intake ports; The plurality of reaction chamber outlets provided in the first air inlet chamber and the second air inlet chamber are used to inject the reaction medium into the reaction chamber, and the reaction chamber outlets are Venturi orifices; The number of air extraction holes in the reaction chamber is the same as the number of air outlet holes in the reaction chamber, and the positions of the air extraction holes and the air outlet holes in the reaction chamber are opposite to each other.

2. The bottom gas equalization plate of the dual-cavity ALD device according to claim 1, characterized in that, The first air intake chamber and the second air intake chamber have wavy surfaces, and the wavy surfaces of the first air intake chamber and the second air intake chamber are arranged opposite to each other and fit together.

3. The bottom air distribution plate of the dual-cavity ALD device according to claim 2, characterized in that, The first air intake chamber and the second air intake chamber are configured to be arc-shaped.

4. The bottom gas equalization plate of the dual-cavity ALD device according to claim 1, characterized in that, The multiple reaction chamber outlets of the first and second air intake chambers are arranged on the same arc.

5. The bottom gas equalization plate of the dual-cavity ALD device according to claim 1, characterized in that, The reaction chamber of both the first and second air inlet chambers has five air outlets.

6. The bottom gas equalization plate of the dual-cavity ALD device according to claim 1, characterized in that, The air inlet and the air extraction port are located on the same plate, and the air extraction port is located at the center of the air outlet cavity.

7. The bottom air distribution plate of the dual-cavity ALD device according to claim 1, characterized in that, The inner walls of the air inlet chamber and the air outlet chamber are arc-shaped.

8. The bottom gas equalization plate of the dual-cavity ALD device according to any one of claims 1 to 7, characterized in that, The plate is detachably connected to the bottom of the dual-cavity ALD device.

9. A dual-chamber ALD device, characterized in that, The bottom air distribution plate of the dual-cavity ALD device as described in any one of claims 1 to 8.

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