Quartz cake product polishing jig

Abstract

The application discloses a quartz cake product polishing jig, and aims to solve the problems of inconvenient positioning during local polishing of a quartz product, and the need for manual multiple addition of polishing liquid during polishing, and low work efficiency. The quartz cake product polishing jig comprises a bottom disc and a locking mechanism connected with the bottom disc, the quartz cake product is clamped between the bottom disc and the locking mechanism, a liquid leakage prevention plate is loaded on the upper surface of the quartz cake product, a liquid blocking ring is connected to the outer edge of the quartz cake product, a liquid loading groove area is formed between the liquid leakage prevention plate and the liquid blocking ring on the upper surface of the quartz cake product, and the liquid loading groove area loads the polishing liquid. The quartz cake product polishing jig can realize clamping and positioning during local polishing of the quartz product, and the polishing liquid can be added once before polishing to meet the whole polishing process, thereby improving the work efficiency and ensuring the polishing effect.

Description

Technical Field

[0001] This invention relates to the field of quartz product processing, and more specifically, to a polishing fixture for quartz disc products. Background Technology

[0002] Currently, in the surface polishing of quartz products, the traditional method involves polishing the entire surface of the quartz product using a polishing machine. However, quartz products often do not have a fully polished surface. When customers request partial polishing of the quartz product surface, the existing methods are often unsuitable. Quartz product polishing mainly relies on fixing the product with a wax plate and then polishing it manually by applying polishing slurry. This method is inefficient, and the need to manually apply polishing slurry in a circular motion during polishing means that personnel cannot leave the area, requiring repeated work and resulting in wasted manpower. Furthermore, the polishing slurry application can be uneven, affecting the final polishing result. Summary of the Invention

[0003] To overcome the above shortcomings, the present invention provides a polishing fixture for quartz disc products, which can achieve clamping and positioning of quartz products during the local polishing process. The polishing liquid can be added once before polishing to meet the needs of the entire polishing process, thereby improving work efficiency and ensuring polishing effect.

[0004] To solve the above-mentioned technical problems, the present invention adopts the following technical solution: a polishing fixture for quartz disc products, including a chassis and a locking mechanism connected to the chassis, the quartz disc products are clamped between the chassis and the locking mechanism, a leak-proof plate is mounted on the upper surface of the quartz disc products, a liquid-retaining ring is connected to the outer edge of the quartz disc products, and a liquid-carrying tank area is formed between the leak-proof plate and the liquid-retaining ring on the upper surface of the quartz disc products, the liquid-carrying tank area is loaded with polishing liquid.

[0005] Quartz disc products are clamped between a chassis and a locking mechanism. The chassis is mounted on the polishing machine's worktable. Before polishing, polishing fluid is poured into the fluid-carrying tank. A leak-proof plate and a baffle ring prevent leakage of the polishing fluid. During polishing, the blade polishes the surface of the quartz disc product within the fluid-carrying tank. The polishing fluid in the tank does not leak or run off, so only one addition is needed before polishing to complete the entire process. The fluid-carrying tank is a localized polishing area on the surface of the quartz disc product, isolated by the leak-proof plate for convenient localized polishing operations.

[0006] The quartz disc polishing fixture disclosed in this patent application can achieve clamping and positioning of quartz products during the local polishing process. The polishing liquid can be added once before polishing to meet the needs of the entire polishing process, which improves work efficiency and ensures polishing effect.

[0007] Preferably, the locking mechanism includes a locking rod and a locking sleeve. The locking sleeve is connected to the locking rod, and the locking rod is connected to the chassis. A protective pad is mounted on the upper surface of the quartz disc product, and the locking sleeve presses the protective pad.

[0008] During clamping, first align the through hole in the middle of the quartz disc product with the locking rod and fit them together, then support the quartz disc product on the chassis. Next, install a protective pad on the surface of the quartz disc product, connect the locking sleeve to the locking rod, and press the locking sleeve against the protective pad to achieve clamping and positioning of the quartz disc product.

[0009] Preferably, the locking sleeve is threadedly connected to the locking rod.

[0010] The threaded connection method ensures convenient and reliable connection.

[0011] Preferably, a pressure plate is installed between the locking sleeve and the protective pad, and the pressure plate is sleeved together with the locking rod.

[0012] The pressure plate increases the force-bearing area, making the clamping of quartz disc products more reliable.

[0013] Preferably, a connecting block is installed on the chassis, and the locking rod is securely connected to the connecting block.

[0014] The connecting block facilitates the connection between the locking rod and the chassis.

[0015] Preferably, the chassis is provided with several countersunk holes, and fastening screws are connected to the countersunk holes.

[0016] The countersunk hole connection and fastening screws make it easy to secure the chassis to the worktable of the polishing machine.

[0017] Preferably, the liquid-retaining ring has an L-shaped cross-section, with its inner wall tightly fitted together with the outer wall of the quartz disc product, and its upper edge higher than the upper surface of the quartz disc product.

[0018] The liquid-retaining ring has an L-shaped structure to avoid interference with the polishing tool. The upper edge of the liquid-retaining ring is higher than the upper surface of the quartz disc product to prevent the polishing liquid from flowing outward.

[0019] Preferably, an anti-slip pad is placed between the leak-proof plate and the surface of the quartz disc product, and the leak-proof plate is sealed to the surface of the quartz disc product through the anti-slip pad.

[0020] The anti-slip rubber pad not only connects the anti-leakage plate to the quartz disc product, but also acts as a seal to prevent polishing fluid leakage.

[0021] Preferably, several arc-shaped guide plates are spaced apart on the inner wall of the liquid-retaining ring. One end of the guide plate is hinged to the liquid-retaining ring, and an elastic pull rope is connected between the other end of the guide plate and the liquid-retaining ring. A top block is provided on the upper part of the guide plate, and a pushing surface is provided on the top block. The pushing surface is inclined outward in the circumferential direction. A top rod is provided on the periphery of the liquid-retaining ring. The liquid-retaining ring rotates together with the chassis, so that the pushing surface hits the top rod, thereby pushing one end of the guide plate inward.

[0022] During the polishing of quartz disc products, the rotating chassis causes the polishing fluid to flow and accumulate towards the inner wall of the baffle ring due to centrifugal force. Furthermore, the centrifugal force from the rotating blade at the contact point between the blade and the quartz disc easily causes the polishing fluid to be thrown outwards. In this design, the baffle ring rotates with the chassis, causing the pushing surface to press against the push rod. This pushes one end of the guide plate inwards, directing the polishing fluid flowing towards the inner wall of the baffle ring inwards and away from it. This ensures a sufficient supply of polishing fluid at the contact point between the blade and the quartz disc, guaranteeing a high polishing effect. The polishing fluid temperature rises during polishing; however, the guide plate improves the fluid's flowability and enhances heat dissipation.

[0023] Preferably, grooves are provided on the inner wall of the liquid-retaining ring corresponding to the guide plate, and the guide plate is adapted to be installed in the grooves.

[0024] The guide plate is placed in the groove to prevent it from protruding from the inner wall of the baffle ring and thus obstructing the flow of polishing fluid.

[0025] Compared with the prior art, the beneficial effects of the present invention are: (1) The quartz disc polishing fixture of this patent application can realize the clamping and positioning of the local polishing process of quartz products. The polishing liquid can be added once before polishing to meet the entire polishing process, which improves the work efficiency and ensures the polishing effect; (2) During the polishing process of quartz disc products, the polishing liquid can flow away from the inner wall of the baffle ring, thereby ensuring that there is always sufficient polishing liquid at the contact position between the tool and the quartz disc product, thus ensuring the polishing effect; moreover, the polishing liquid has good fluidity, which improves the heat dissipation effect. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of the present invention;

[0027] Figure 2 This is a cross-sectional view of the present invention;

[0028] Figure 3 This is an exploded view of the present invention;

[0029] Figure 4 This is a schematic diagram of the structure of Embodiment 2 of the present invention;

[0030] In the diagram: 1. Chassis, 2. Countersunk hole, 3. Fastening screw, 4. Quartz disc product, 5. Locking rod, 6. Locking sleeve, 7. Protective pad, 8. Pressure plate, 9. Connecting block, 10. Leak-proof plate, 11. Liquid-retaining ring, 12. Liquid-carrying tank area, 13. Anti-slip pad, 14. Cutting tool, 15. Guide plate, 16. Groove, 17. Elastic pull rope, 18. Top block, 19. Pushing surface, 20. Top rod. Detailed Implementation

[0031] The technical solution of the present invention will be further described in detail below through specific embodiments and in conjunction with the accompanying drawings:

[0032] Example 1: A polishing fixture for quartz disc products (see attached document) Figure 1 To be continued Figure 3 The system includes a chassis 1 and a locking mechanism connected to the chassis. The chassis has a circular structure and several countersunk holes 2. Fastening screws 3 are connected to the countersunk holes. The chassis is mounted on the worktable of the polishing machine and secured by the fastening screws. A quartz disc product 4 is clamped between the chassis and the locking mechanism. The locking mechanism includes a locking rod 5 and a locking sleeve 6. The locking sleeve is connected to the locking rod, which is connected to the chassis. A protective pad 7 is mounted on the upper surface of the quartz disc product, and the locking sleeve presses against the protective pad. The locking rod is a threaded rod, and the locking sleeve is threadedly connected to the locking rod. A pressure plate 8 is installed between the locking sleeve and the protective pad, and the pressure plate is fitted together with the locking rod. Tightening the locking sleeve causes the pressure plate to press against the protective pad. A connecting block 9 is installed on the chassis, and the locking rod is securely connected to the connecting block. The connecting block has an inverted T-shaped structure, and the chassis has a connecting hole that matches the connecting block. The connecting block is inserted into the connecting hole. The lower part of the connecting block has a square structure, and the lower opening of the connecting hole is square. The lower part of the connecting block is adapted to be installed at the lower opening of the connecting hole.

[0033] A leak-proof plate 10 is mounted on the upper surface of the quartz disc product. The leak-proof plate has a ring structure and is placed around the protective pad. A liquid-retaining ring 11 is connected to the outer edge of the quartz disc product. A liquid-carrying groove area 12 is formed between the leak-proof plate and the liquid-retaining ring on the upper surface of the quartz disc product, and the liquid-carrying groove area is filled with polishing liquid. The liquid-retaining ring has an L-shaped cross-section, and its inner wall is tightly fitted with the outer wall of the quartz disc product. The upper edge of the liquid-retaining ring is higher than the upper surface of the quartz disc product. The liquid-retaining ring is made of plastic, which is lightweight and provides good sealing after being fitted with the quartz disc product. An anti-slip pad 13 is provided between the leak-proof plate and the surface of the quartz disc product, and the leak-proof plate is sealed to the surface of the quartz disc product through the anti-slip pad.

[0034] Quartz disc products are clamped between a chassis and a locking mechanism. The chassis is mounted on the polishing machine's worktable. Before polishing, polishing fluid is poured into the liquid-carrying tank. A leak-proof plate and a baffle ring prevent leakage of the polishing fluid. During polishing, the cutting tool 14 polishes the surface of the quartz disc product within the liquid-carrying tank. The polishing fluid in the tank does not leak or flow away; therefore, only one addition is needed before polishing to meet the requirements of the entire polishing process. The liquid-carrying tank is a localized polishing area on the surface of the quartz disc product, isolated by the leak-proof plate to facilitate localized polishing operations.

[0035] Example 2: A polishing fixture for quartz disc products (see attached document) Figure 4 Its structure is similar to that of Embodiment 1, the main difference being that in this embodiment, several arc-shaped guide plates 15 are spaced apart on the inner wall of the liquid-blocking ring, with six guide plates evenly distributed. Grooves 16 are correspondingly provided on the inner wall of the liquid-blocking ring and the guide plates, and the guide plates are fitted into the grooves. One end of the guide plate is hinged to the liquid-blocking ring, and an elastic pull rope 17 is connected between the other end of the guide plate and the liquid-blocking ring. The elastic pull rope is connected to the outer wall of the liquid-blocking ring. A top block 18 is provided on the upper part of the guide plate, and a pushing surface 19 is provided on the top block. The pushing surface is inclined outward in the circumferential direction. A top rod 20 is provided around the periphery of the liquid-blocking ring. The liquid-blocking ring rotates with the chassis, causing the pushing surface to hit the top rod, thereby pushing one end of the guide plate inward. Other structures are the same as in Embodiment 1.

[0036] During the polishing of quartz disc products, the rotating chassis causes the polishing fluid to flow and accumulate towards the inner wall of the baffle ring due to centrifugal force. Furthermore, the centrifugal force from the rotating blade at the contact point between the blade and the quartz disc easily causes the polishing fluid to be thrown outwards. In this design, the baffle ring rotates with the chassis, causing the pushing surface to press against the push rod. This pushes one end of the guide plate inwards, directing the polishing fluid flowing towards the inner wall of the baffle ring inwards and away from it. This ensures a sufficient supply of polishing fluid at the contact point between the blade and the quartz disc, guaranteeing a high polishing effect. The polishing fluid temperature rises during polishing; however, the guide plate improves the fluid's flowability and enhances heat dissipation.

[0037] The embodiments described above are merely preferred embodiments of the present invention and are not intended to limit the present invention in any way. Other variations and modifications may be made without departing from the technical solutions described in the claims.

Claims

1. A polishing fixture for quartz disc products, characterized in that, The device includes a chassis and a locking mechanism connected to the chassis. Quartz disc products are clamped between the chassis and the locking mechanism. A leak-proof plate is mounted on the upper surface of the quartz disc products. A liquid-retaining ring is connected to the outer edge of the quartz disc products. A liquid-carrying tank area is formed between the leak-proof plate and the liquid-retaining ring on the upper surface of the quartz disc products, and the liquid-carrying tank area is filled with polishing liquid. Several arc-shaped guide plates are arranged at intervals on the inner wall of the liquid-retaining ring. One end of the guide plate is hinged to the liquid-retaining ring, and an elastic pull rope is connected between the other end of the guide plate and the liquid-retaining ring. A top block is set on the upper part of the guide plate, and a pushing surface is provided on the top block. The pushing surface is inclined outward in the circumferential direction. A top rod is set around the periphery of the liquid-retaining ring. The liquid-retaining ring rotates with the chassis, so that the pushing surface hits the top rod, thereby pushing one end of the guide plate inward.

2. The polishing fixture for quartz disc products according to claim 1, characterized in that, The locking mechanism includes a locking rod and a locking sleeve. The locking sleeve is connected to the locking rod, and the locking rod is connected to the chassis. A protective pad is mounted on the upper surface of the quartz disc product, and the locking sleeve presses the protective pad.

3. A polishing fixture for quartz disc products according to claim 2, characterized in that, The locking sleeve is threadedly connected to the locking rod.

4. A polishing fixture for quartz disc products according to claim 2, characterized in that, A pressure plate is installed between the locking sleeve and the protective pad, and the pressure plate is sleeved together with the locking rod.

5. A polishing fixture for quartz disc products according to claim 2, characterized in that, A connecting block is installed on the chassis, and the locking rod is securely connected to the connecting block.

6. A polishing fixture for quartz disc products according to claim 1, characterized in that, Several countersunk holes are provided on the chassis, and fastening screws are connected to the countersunk holes.

7. A polishing fixture for quartz disc products according to claim 1, characterized in that, The liquid-retaining ring has an L-shaped cross-section. The inner wall of the liquid-retaining ring is tightly fitted together with the outer wall of the quartz disc product, and the upper edge of the liquid-retaining ring is higher than the upper surface of the quartz disc product.

8. A polishing fixture for quartz disc products according to any one of claims 1 to 7, characterized in that, An anti-slip pad is placed between the anti-leakage plate and the surface of the quartz disc product, and the anti-leakage plate is sealed to the surface of the quartz disc product through the anti-slip pad.

9. A polishing fixture for quartz disc products according to claim 1, characterized in that, Grooves are provided on the inner wall of the liquid-retaining ring and corresponding to the guide plate, and the guide plate is adapted to be installed in the grooves.

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