A cyclic wafer cleaning apparatus

Abstract

The application discloses a circulating wafer cleaning equipment, which comprises a cleaning tank, a pipeline is arranged at the bottom of the cleaning tank, a pump body and a filter are arranged on the pipeline, a hollow cylinder with a hollow interior and closed upper and lower ends is further arranged, a plurality of filters are arranged at the bottom of the hollow cylinder in a circumferential sealing mode, the liquid inlet end of the filter is communicated with the inner cavity of the hollow cylinder, a rotating plate is arranged in the inner cavity of the hollow cylinder, a liquid inlet hole matched with the liquid inlet end of the filter is formed in the rotating plate, and an automatic replacement unit is further arranged. The wafer cleaning equipment is provided with a plurality of filters and an automatic replacement unit. When the filter is blocked, the water pressure in the hollow cylinder increases, the automatic replacement unit is driven to replace the filter path through the increased water pressure, and the required replacement time is greatly shortened compared with the required replacement time of manual replacement, so that the wafer can be quickly cleaned.

Description

Technical Field

[0001] This invention relates to the field of wafer cleaning technology, and in particular to a circulating wafer cleaning device. Background Technology

[0002] In semiconductor manufacturing processes, techniques such as photolithography, etching, sputtering, and deposition are commonly used, inevitably leading to...

[0003] Metal particles or organic impurities left on the wafer surface can contaminate the wafer, so it is necessary to clean the wafer to remove residual photoresist, organic matter, and adsorbents from the wafer surface.

[0004] When cleaning wafers, it is usually necessary to immerse the wafers in an ultrasonic cleaning tank filled with cleaning solution. Multiple cleaning cycles are generally required, meaning that after each cleaning cycle, the cleaning solution in the tank needs to be drained and clean cleaning solution is added for a second or more cleaning cycles. This process results in a significant waste of cleaning solution.

[0005] To address the aforementioned issues, existing methods typically involve installing a circulating filtration device on the cleaning tank. This device includes a pump, connecting pipes, and a single filter. During cleaning, the pump draws the cleaning solution from the tank to the filter for filtration before returning it to the tank, creating a circulation of the cleaning solution. This significantly reduces waste and requires only a small amount of solution to clean the wafer. However, using a single filter presents several problems. For instance, if severe clogging is detected during cleaning (clogging of the internal filter components reduces the cleaning solution's filtration efficiency, prolongs wafer cleaning time, and can also cause excessive internal pressure, potentially leading to leaks), the operator must immediately stop the pump and replace the filter. During this process, the cleaning solution in the tank cannot continue circulating and filtering, and impurities cannot be removed in time, further extending the subsequent cleaning time. Therefore, this application provides a circulating wafer cleaning device to meet these needs. Summary of the Invention

[0006] The purpose of this application is to provide a circulating wafer cleaning device to solve the technical problem that existing cleaning devices cannot automatically replace filters when the filter elements are clogged.

[0007] To achieve the above objectives, this application provides the following technical solution: a circulating wafer cleaning device, including a cleaning tank, a pipe at the bottom of the cleaning tank, a pump and a filter installed on the pipe, the drain port of the filter located above the cleaning tank, and a hollow cylinder with a closed top and bottom, the inlet end of the hollow cylinder connected to the outlet end of the pipe, multiple filters arranged in a circumferentially sealed manner at the bottom of the hollow cylinder, each filter being detachably and washably installed with respect to the hollow cylinder, the inlet end of the filter communicating with the inner cavity of the hollow cylinder, and the inner cavity of the hollow cylinder being provided with... The system includes a rotating plate with an inlet hole adapted to the inlet end of the filter. An elastic sealing gasket is fixed to the bottom of the rotating plate, and the lower end of the elastic sealing gasket contacts the bottom of the inner cavity of the hollow cylinder. The upper ends of the multiple filters are flush with the bottom of the hollow cylinder. The system also includes an automatic replacement unit. When a filter becomes clogged, causing the internal pressure of the hollow cylinder to increase, the rotating plate is automatically rotated at a constant angle and in a quantitative manner. When the inlet hole coincides with the inlet end of the next filter, the rotating plate stops rotating, and the remaining filters do not perform filtration operations. This process is repeated to automatically replace the clogged filters.

[0008] In a preferred embodiment of this invention, the automatic replacement unit includes a pressure-sensitive drive unit and a rotating unit. When the water pressure inside the hollow cylinder increases, the pressure-sensitive drive unit drives the rotating unit to operate under the action of water pressure, and the rotating unit drives the optional plate to rotate.

[0009] In a preferred embodiment of this invention, the pressure-sensitive drive unit includes a mounting bracket mounted above the rotating unit. A hollow column is fixed to the mounting bracket. A sealing block is provided in the inner cavity of the hollow column, and an elastic sealing ring is wrapped around the outer wall of the sealing block. The outer wall of the elastic sealing ring slides against the inner wall of the hollow column. A pressing rod is fixed to the upper end of the sealing block, and the lower end of the pressing rod is located below the mounting bracket and above the rotating unit.

[0010] In a preferred embodiment of this invention, the rotating unit includes a cylinder disposed in a mounting hole at the center of the rotating plate. The lower end of the cylinder is rotatably connected to the bottom of the inner cavity of the hollow cylinder. A pressing column is slidably disposed inside the cylinder, and the pressing column is fixedly connected to the bottom of the inner cavity of the hollow cylinder by a spring. A driving rod is rotatably disposed on the pressing column, and the end of the driving rod is located in a running groove on the inner wall of the cylinder.

[0011] In a preferred embodiment of this invention, the inlet ends of the plurality of filters are threadedly connected to the bottom of the inner cavity of the hollow cylinder.

[0012] In a preferred embodiment of this invention, the bottom of the hollow cylinder is connected to a conical liquid receiving tank via multiple circumferentially arranged connecting rods, and the liquid outlet of the liquid receiving tank is located above the cleaning tank. An operating space is provided between the upper end of the liquid receiving tank and the lower end of the hollow cylinder to facilitate the disassembly of the filter.

[0013] In a preferred embodiment of this invention, the filter includes a housing with an inlet port at the upper end. A first annular filter and a second annular filter are installed in the inner cavity of the housing. The first annular filter is located above the second annular filter. The inner cavities of the first annular filter and the second annular filter are respectively filled with filter gauze and an ion filter membrane layer. The upper and lower ends of the first annular filter and the second annular filter are respectively fixedly connected to the housing and the sealing plate.

[0014] In summary, the technical effects and advantages of this invention are as follows:

[0015] First, the present invention has a reasonable structure. The wafer cleaning equipment is equipped with multiple filters and an automatic replacement unit. When the filter is clogged, the water pressure inside its hollow cylinder increases. This increased water pressure drives the automatic replacement unit to change the filter path. The replacement time is greatly shortened compared to the time required for manual replacement, which is conducive to the rapid cleaning of wafers.

[0016] Second, a rotating plate with a single liquid inlet is used. The filter path is changed by rotating the plate at a fixed angle. At the same time, the elastic sealing gasket at the bottom of the rotating plate can seal the liquid inlet of the filter that is not involved in the filtration operation and the filter installation port, so that personnel can replace the clogged filter without causing the cleaning fluid to overflow. Attached Figure Description

[0017] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0018] Figure 1 This is a three-dimensional structural diagram of the present invention;

[0019] Figure 2 for Figure 1 Schematic diagram of the split structure of the middle filter;

[0020] Figure 3 for Figure 2 Schematic diagram of the split structure of the pressure-sensitive drive unit and the rotary unit;

[0021] Figure 4 A schematic diagram of the cross-sectional structure of the three hollow columns;

[0022] Figure 5 for Figure 3 Schematic diagram of the cross-sectional structure of the middle cylinder;

[0023] Figure 6 for Figure 5 A schematic diagram showing the unfolded and partially enlarged movement groove inside the middle cylinder;

[0024] Figure 7 for Figure 3 Schematic diagram of the cross-sectional structure of the filter.

[0025] In the diagram: 1. Cleaning tank; 2. Pipeline; 3. Pump body; 4. Filter; 41. Housing; 42. First annular filter screen; 43. Second annular filter screen; 44. Ion filter membrane layer; 45. Filter gauze; 46. Sealing plate; 5. Hollow cylinder; 6. Connecting rod; 7. Liquid receiving tank; 8. Pressure-sensitive drive unit; 81. Hollow column; 82. Mounting bracket; 83. Extrusion rod; 84. Sealing block; 85. Elastic sealing ring; 9. Rotating unit; 91. Cylinder; 92. Downward pressure column; 93. Spring; 94. Drive rod; 95. Running groove; 10. Rotating plate; 11. Liquid inlet; 12. Elastic sealing gasket. Detailed Implementation

[0026] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0027] Example: Reference Figure 1A circulating wafer cleaning device is shown, comprising a cleaning tank 1, a pipe 2 at the bottom of the cleaning tank 1, a pump body 3 and a filter 4 mounted on the pipe 2, the drain port of the filter 4 being located above the cleaning tank 1, and a hollow cylinder 5 with its internal structure and closed at both ends, the inlet end of the hollow cylinder 5 being connected to the outlet end of the pipe 2. Multiple filters 4 are provided, arranged in a circumferentially sealed manner at the bottom of the hollow cylinder 5, and each filter 4 is detachably and washably installed in relation to the hollow cylinder 5. The inlet end of each filter 4 communicates with the inner cavity of the hollow cylinder 5, and a rotating plate 10 is provided within the inner cavity of the hollow cylinder 5. The plate 10 has an inlet hole 11 that matches the inlet end of the filter 4. An elastic sealing gasket 12 is fixed to the bottom of the rotating plate 10, and the lower end of the elastic sealing gasket 12 contacts the bottom of the inner cavity of the hollow cylinder 5. The upper ends of the multiple filters 4 are flush with the bottom of the inner cavity of the hollow cylinder 5. It also includes an automatic replacement unit. When the filter 4 is blocked, causing the water pressure inside the hollow cylinder 5 to increase, the rotating plate 10 is automatically driven to rotate at a constant angle and in a quantitative manner. When the inlet hole 11 coincides with the inlet end of the next filter 4, the rotating plate 10 stops rotating, and the remaining filters 4 do not perform filtration operations. This process is repeated to automatically replace the blocked filters 4.

[0028] This cleaning equipment is equipped with multiple filters. When the filter element inside one of the filters 4 becomes clogged, the automatic replacement unit on it can automatically make the inlet hole 11 coincide with the inlet end of the next filter 4. At this time, the fluid will enter the next filter 4 through the inlet hole 11 for filtration, while the other filters 4 do not work (the inlet ends of the other filters are blocked and sealed by the elastic sealing gasket 12). The replacement time is greatly shortened compared to the time required for manual replacement, which is conducive to the rapid cleaning of wafers. Since the elastic sealing gasket 12 is in contact with the bottom of the inner cavity of the hollow cylinder 5, it blocks and seals the installation port of the filter 4. At this time, the clogged filter 4 can be removed for cleaning or replacement without causing the cleaning fluid in the hollow cylinder 5 to overflow from this installation port.

[0029] As a preferred embodiment of this example, Figure 2 As shown, the automatic replacement unit includes a pressure-sensitive drive unit 8 and a rotating unit 9. When the water pressure inside the hollow cylinder 5 increases, the pressure-sensitive drive unit 8 drives the rotating unit 9 to operate through the water pressure, and the rotating unit drives the optional plate 10 to rotate.

[0030] As a preferred embodiment of this example, Figure 4As shown, the pressure-sensitive drive unit 8 includes a mounting bracket 82 mounted above the rotating unit 9. A hollow column 81 is fixed to the mounting bracket 82. A sealing block 84 is provided in the inner cavity of the hollow column 81, and an elastic sealing ring 85 is wrapped on the outer wall of the sealing block 84. The outer wall of the elastic sealing ring 85 slides against the inner wall of the hollow column 81. A pressing rod 83 is fixed to the upper end of the sealing block 84, and the lower end of the pressing rod 83 is located below the mounting bracket 82 and above the rotating unit 9.

[0031] When the filter element in filter 4 becomes clogged, the pressure inside the hollow cylinder 5 increases, causing the sealing block 84 to drive the extrusion rod 83 to move downward. The downward-moving extrusion rod 83 will contact the rotating unit and drive it to move. After the filter 4 is replaced, the extrusion force acting on the sealing block 84 decreases, and the high air pressure inside the hollow column 81 will push the sealing block 84 upward and eventually return it to its original position.

[0032] As a preferred embodiment of this example, Figure 5 and Figure 6 As shown, the rotating unit 9 includes a cylindrical body 91 installed in a mounting hole at the axis of the rotating plate 10. The lower end of the cylindrical body 91 is rotatably connected to the bottom of the inner cavity of the hollow cylinder 5. A downward pressure column 92 is slidably provided inside the cylindrical body 91, and the downward pressure column 92 is fixedly connected to the bottom of the inner cavity of the hollow cylinder 5 by a spring 93. A drive rod 94 is rotatably provided on the downward pressure column 92, and the end of the drive rod 94 is located in a running groove 95 on the inner wall of the cylindrical body 91.

[0033] The downward-moving extrusion rod 83 will contact the upper end of the pressure column 92 and drive it to move downward. The drive rod 94 on the pressure column 92 will make a V-shaped movement along the movement groove 95. After a V-shaped movement is completed, the liquid inlet 11 coincides with the liquid inlet end of the next filter 4. At this time, the cleaning fluid in the hollow cylinder 5 will be filtered through this filter 4. When this filter 4 is blocked, the liquid inlet 11 will automatically coincide with the next filter 4.

[0034] It should be noted that: 1. The 360° division by the number of filters is the angle by which the rotating plate 10 rotates when the drive rod 94 makes a V-shaped movement along the motion groove; 2. As... Figure 6As shown, when the drive rod 94 makes a V-shaped movement and the axis of the drive rod 94 moves to the left of the vertical dotted line L1, its liquid inlet 11 begins to move above the liquid inlet end of the next filter 4. As the overlap between the liquid inlet 11 and the liquid inlet end increases, the cleaning fluid in the hollow cylinder 5 can enter the filter 4 through this liquid inlet end for filtration. At this time, the water pressure in the hollow cylinder 5 will begin to decrease. Under the action of the spring 93, the drive rod 94 will move upward and make upward movement by squeezing and contacting the inclined surface of the running groove 95. When it moves to the highest point, the liquid inlet 11 overlaps with the liquid inlet end.

[0035] As a preferred embodiment of this example, Figure 3 As shown, the liquid inlet ends of the plurality of filters 4 are all threadedly connected to the bottom of the inner cavity of the hollow cylinder 5.

[0036] The threaded connection facilitates the disassembly and installation of the filter 4 and the hollow cylinder 5. The outer wall of the inlet end of the filter 4 is provided with threads, and the bottom of the hollow cylinder 5 is provided with a threaded mounting hole that matches it.

[0037] As a preferred embodiment of this example, Figure 1 As shown, the bottom of the hollow cylinder 5 is connected to a conical liquid receiving tank 7 by a plurality of circumferentially arranged connecting rods 6, and the liquid outlet of the liquid receiving tank 7 is located above the cleaning tank 1. An operating space is provided between the upper end of the liquid receiving tank 7 and the lower end of the hollow cylinder 5 to facilitate the disassembly of the filter 4.

[0038] The liquid receiving tank 7 is designed to collect the cleaning liquid flowing out from the bottom of the filter, so that it is discharged into the cleaning tank 1.

[0039] As a preferred embodiment of this example, Figure 7 As shown, the filter 4 includes a housing 41 with an inlet port at the upper end. A first annular filter 42 and a second annular filter 43 are installed in the inner cavity of the housing 41. The first annular filter 42 is located in the second annular filter 43. The inner cavities of the first annular filter 42 and the second annular filter 43 are respectively equipped with filter gauze 45 and an ion filter membrane layer 44. The upper and lower ends of the first annular filter 42 and the second annular filter 43 are fixedly connected to the housing 41 and the sealing plate 46, respectively.

[0040] Large particles or suspended matter in the cleaning solution are filtered out by the filter gauze 45, and ions in the cleaning solution are removed by the ion filter membrane 44. This has a good purification effect on the cleaning solution, making the filtered cleaning solution purer and improving the cleanliness of the refined wafer.

[0041] It should be noted that: first, the first annular filter screen 42 and the second annular filter screen 43 support the filter gauze 45 and the ion filter membrane layer 44 to prevent them from being crushed by high-pressure water; second, the filtered water is discharged downward from the gap between the shell 41 and the outer wall of the second annular filter screen 43.

[0042] Finally, it should be noted that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A circulating type wafer cleaning device, comprising a cleaning tank (1), a pipe (2) is arranged at the bottom of the cleaning tank (1), a pump body (3) and a filter (4) are arranged on the pipe (2), and the liquid outlet of the filter (4) is located above the cleaning tank (1), characterized in that: The application also comprises a hollow cylinder (5) with an internal cavity and closed upper and lower ends, wherein the liquid inlet end of the hollow cylinder (5) is connected to the liquid outlet end of the pipeline (2), and a plurality of filters (4) are circumferentially and tightly arranged at the bottom of the hollow cylinder (5), wherein the filters (4) are detachably and washably mounted on the hollow cylinder (5), the liquid inlet end of the filter (4) is communicated with the internal cavity of the hollow cylinder (5), the internal cavity of the hollow cylinder (5) is provided with a rotating plate (10), the rotating plate (10) is provided with a liquid inlet hole (11) matched with the liquid inlet end of the filter (4), the bottom of the rotating plate (10) is fixedly provided with an elastic sealing gasket (12), the lower end of the elastic sealing gasket (12) is in contact with the bottom of the internal cavity of the hollow cylinder (5), the upper end of the filter (4) is flush with the bottom of the internal cavity of the hollow cylinder (5), and the automatic replacement unit is further provided. ​ When the filter (4) is blocked and the water pressure in the hollow cylinder (5) is increased, the automatic replacement unit drives the rotating plate (10) to rotate at equal angles and quantitatively, and when the liquid inlet hole (11) is coincided with the liquid inlet end of the next filter (4), the rotating plate (10) stops rotating, and the remaining filters (4) do not perform the filtering operation, so that the replacement of the blocked filter (4) can be automatically realized. The automatic replacement unit comprises a pressure sensing driving unit (8) and a rotating unit (9), wherein when the water pressure in the hollow cylinder (5) is increased, the pressure sensing driving unit drives the rotating unit (9) to rotate by the water pressure. The pressure sensing driving unit (8) comprises a mounting frame (82) mounted above the rotating unit (9), a hollow column (81) fixedly arranged on the mounting frame (82), a sealing block (84) arranged in the internal cavity of the hollow column (81), an elastic sealing ring (85) wrapped on the outer wall of the sealing block (84), the outer wall of the elastic sealing ring (85) in sliding contact with the inner wall of the hollow column (81), an extrusion rod (83) fixedly arranged at the upper end of the sealing block (84), and the lower end of the extrusion rod (83) located below the mounting frame (82) and above the rotating unit (9).

2. The apparatus according to claim 1, wherein: The rotating unit (9) comprises a cylinder (91) arranged in the mounting hole at the shaft center of the rotating plate (10), the lower end of the cylinder (91) rotationally connected to the bottom of the internal cavity of the hollow cylinder (5), a pressing column (92) slidably arranged in the cylinder (91) and fixedly connected to the bottom of the internal cavity of the hollow cylinder (5) through a spring (93), and a driving rod (94) rotationally arranged on the pressing column (92) and located in the running groove (95) arranged on the inner wall of the cylinder (91). The liquid inlet end of the filter (4) is threadedly connected to the bottom of the internal cavity of the hollow cylinder (5).

3. The apparatus according to claim 1, wherein: The bottom of the hollow cylinder (5) is connected with a conical liquid receiving groove (7) through a plurality of circumferentially arranged connecting rods (6), and the liquid outlet of the liquid receiving groove (7) is located above the cleaning tank (1), and an operation space for facilitating dismounting of the filter (4) is arranged between the upper end of the liquid receiving groove (7) and the lower end of the hollow cylinder (5).

4. The apparatus according to claim 1, wherein: The filter (4) comprises a shell (41) provided with a liquid inlet port at the upper end, a first annular filter screen (42) and a second annular filter screen (43) are mounted in the inner cavity of the shell (41), the first annular filter screen (42) is located below the second annular filter screen (43), the inner cavities of the first annular filter screen (42) and the second annular filter screen (43) are respectively provided with filter gauze (45) and ion filter membrane layer (44), and the upper and lower ends of the first annular filter screen (42) and the second annular filter screen (43) are respectively fixedly connected with the shell (41) and a sealing plate (46).

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