Plasma Immersion Ion Implantation Device Facilitating Continuous Modification

Abstract

The present invention discloses a plasma immersion ion implantation device facilitating continuous modification, which includes a mounting table, a processing chamber, a pretreatment chamber and a rake frame. The mounting table is provided with a through hole. The processing chamber is connected to the top end of the mounting table. The processing chamber is provided with an air inlet. The bottom end of the processing chamber is provided with a first opening. The pretreatment chamber is slidably mounted at the bottom end of the mounting table. The pretreatment chamber is provided with a first vacuum port. The top end of the pretreatment chamber is provided with a second opening. The pretreatment chamber can slide to connect or separate the second opening from the through hole. The rake frame is mounted in the pretreatment chamber. Among them, the mounting table is provided with a first sealing door and / or the processing chamber is provided with a second sealing door. The bottom surface of the mounting table fits against the top surface of the pretreatment chamber and / or the pretreatment chamber is provided with a third sealing door. The plasma immersion ion implantation device facilitating continuous modification of the present invention can greatly shorten the operation time required other than modification, which is beneficial to the further application of the plasma immersion ion implantation modification technology in the industrial field.

Description

Technical Field

[0001] The present invention relates to the field of surface modification treatment of materials, and particularly to a plasma immersion ion implantation device facilitating continuous modification. Background Art

[0002] The plasma immersion ion implantation technology is a technology that changes the physical and chemical properties of the material surface by means of ion implantation without changing the overall material properties, thereby enhancing specific properties of the material. For example, it can improve the corrosion resistance and wear resistance of the material surface. The plasma immersion ion implantation technology is widely used in fields such as aerospace, automotive, and medical equipment.

[0003] In the prior art, when performing plasma immersion ion implantation modification on a material, it is generally carried out through the following steps: First, open the processing chamber, place the material on the rake in the processing chamber for fixation; then, close the processing chamber and start the vacuum pump to evacuate the processing chamber; when the vacuum degree in the processing chamber reaches a preset value, introduce the modification gas and connect the rake to the power supply to perform ion implantation surface modification; after the modification is completed, open the processing chamber again, take out the material, and prepare for the modification of the next batch of materials.

[0004] When performing modification treatment on a batch of materials, it is necessary to open the processing chamber, put in the materials and close the processing chamber each time, and each time it is necessary to evacuate the processing chamber, thus consuming a large amount of working time other than modification and unable to meet the requirements of industrial continuous operation. Summary of the Invention

[0005] The present invention aims to at least solve one of the technical problems existing in the prior art. For this purpose, the present invention provides a plasma immersion ion implantation device facilitating continuous modification, which can greatly shorten the working time required other than modification and is conducive to the further application of the plasma immersion ion implantation modification technology in the industrial field.

[0006] A plasma immersion ion implantation device facilitating continuous modification according to an embodiment of the present invention includes a mounting table, a processing chamber, at least two pretreatment chambers, and at least two rake frames. The mounting table is provided with a through opening penetrating up and down. The processing chamber is connected to the top end of the mounting table. The processing chamber is provided with an air inlet for connecting a modification gas generator. A first opening communicating with the through opening is provided at the bottom end of the processing chamber. At least two pretreatment chambers are slidably mounted at the bottom end of the mounting table. The pretreatment chamber is provided with a first vacuum port for connecting a vacuum generator. A second opening is provided at the top end of the pretreatment chamber. The pretreatment chamber can slide to make the second opening communicate with or separate from the through opening. At least two rake frames are respectively mounted in at least two pretreatment chambers. The rake frame is used for placing materials to be processed. Wherein, the mounting table is provided with a first sealing door for opening and closing the through opening and / or the processing chamber is provided with a second sealing door for opening and closing the first opening. The bottom surface of the mounting table is attached to the top surface of the pretreatment chamber and / or the pretreatment chamber is provided with a third sealing door for opening and closing the second opening.

[0007] The plasma immersion ion implantation device facilitating continuous modification according to an embodiment of the present invention has at least the following beneficial effects:

[0008] The processing chamber is connected to the modification gas generator through the air inlet, and the pretreatment chamber is connected to the vacuum generator through the first vacuum port. When it is necessary to perform modification treatment on the material, place some materials on the rake frame of one of the pretreatment chambers, and then slide the pretreatment chamber until the second opening thereon communicates with the through opening on the mounting table. At the same time, evacuate the air through the vacuum generator, so that the connected pretreatment chamber and the processing chamber can maintain a predetermined vacuum degree. Then, connect the rake frame to the power supply and input the modification gas through the modification gas generator, and the material to be processed on the rake frame can be modified. When modifying the material in this pretreatment chamber, other materials to be processed can be placed on the rake frames of other pretreatment chambers, and the other pretreatment chambers can be evacuated through the vacuum generator. After the modification treatment of the material in the first pretreatment chamber is completed, slide the pretreatment chamber away, and then slide another pretreatment chamber until the second opening thereon communicates with the through opening on the mounting table, and the remaining materials can be immediately modified without temporarily placing materials and temporarily evacuating the air, which can greatly shorten the operation time required other than modification and is conducive to the further application of the plasma immersion ion implantation modification technology in the industrial field.

[0009] According to some embodiments of the present invention, the rake frame is liftably mounted in the pretreatment chamber. When the second opening communicates with the through opening, the rake frame can rise through the through opening and be located in the processing chamber.

[0010] According to some embodiments of the present invention, a plurality of vertically arranged transmission lead screws are rotatably installed on the periphery of the rake frame in the pretreatment chamber. The transmission lead screws are drivingly connected to a driving motor, and the transmission lead screws are threadedly connected to a support frame, and all the support frames are connected to the rake frame.

[0011] According to some embodiments of the present invention, a mounting seat is provided at the bottom end of each transmission lead screw in the pretreatment chamber. The transmission lead screw is rotatably installed on the mounting seat. A first bevel gear is coaxially installed at the bottom end of the transmission lead screw. A transmission shaft is rotatably installed between adjacent two mounting seats. Second bevel gears are coaxially installed at both ends of the transmission shaft. The second bevel gear meshes with the adjacent first bevel gear, and the driving motor is drivingly connected to one of the transmission shafts to control the rotation of the transmission shaft.

[0012] According to some embodiments of the present invention, the processing chamber is provided with a wire passing port for the wires of the power supply to pass through. When the rake frame rises to be located in the processing chamber, the wires in the processing chamber contact the rake frame.

[0013] According to some embodiments of the present invention, the rake frame includes at least two target plates arranged one above the other. The target plates are used for placing the materials to be processed. A plurality of plug-in members are provided on one of the adjacent two target plates, and a plurality of insertion holes are provided on the other. The plug-in members are inserted into the insertion holes.

[0014] According to some embodiments of the present invention, the target plates are provided with a plurality of card slots for clamping the materials to be processed side by side. The extending directions of the card slots on the adjacent two target plates are staggered.

[0015] According to some embodiments of the present invention, the processing chamber is provided with a second vacuum port for connecting the vacuum generator.

[0016] According to some embodiments of the present invention, the pretreatment chamber can slide to expose the second opening on one side of the installation table.

[0017] According to some embodiments of the present invention, two rotating shafts are rotatably installed at the through port of the installation table. The rotating shafts are drivingly connected to an adjusting motor. The first sealing door includes two door bodies, and the two door bodies are respectively connected to the two rotating shafts. The two door bodies cooperate to close or open the through port during the rotation process.

[0018] Additional aspects and advantages of the present invention will be given in part in the following description, become apparent in part from the following description, or be understood through the practice of the present invention. Description of the Drawings

[0019] The present invention will be further described below in conjunction with the accompanying drawings and embodiments, where:

[0020] Figure 1 is a schematic diagram of the overall structure of the present invention;

[0021] Figure 2 is Figure 1 a schematic diagram of the structure of the mounting table in

[0022] Figure 3 is Figure 1 a schematic diagram of the structure of the processing chamber in

[0023] Figure 4 is Figure 1 a schematic diagram of the structure of the pretreatment chamber in

[0024] Figure 5 is a driving schematic diagram of the transmission lead screw;

[0025] Figure 6 is Figure 5 an enlarged view at A;

[0026] Figure 7 is Figure 4 a schematic diagram of the structure of the rake frame in

[0027] Reference numerals in the drawings:

[0028] Mounting table 100; Through port 101; First sealing door 102; Rotating shaft 103; Adjusting motor 104; Door body 105; Positioning pin shaft 106; Chute 107;

[0029] Processing chamber 200; Air inlet 201; Wiring port 202; Second vacuum port 203; Flange 204; Observation window 205;

[0030] Pretreatment chamber 300; First vacuum port 301; Second opening 302; Transmission lead screw 303; Driving motor 304; Support frame 305; Mounting seat 306; First bevel gear 307; Transmission shaft 308; Second bevel gear 309; Slide rail 310;

[0031] Rake frame 400; Target plate 401; Plug-in part 402; Socket 403; Card slot 404. Detailed implementation manners

[0032] The embodiments of the present invention will be described in detail below. The examples of the embodiments are shown in the accompanying drawings, where the same or similar reference numerals represent the same or similar elements or elements with the same or similar functions throughout. The embodiments described below by referring to the accompanying drawings are exemplary and are only used to explain the present invention and should not be construed as a limitation of the present invention.

[0033] In the description of the present invention, it should be understood that with respect to the orientation description, such as the upper and lower directions, the orientation or positional relationship indicated is based on the orientation or positional relationship shown in the drawings. This is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, it should not be construed as a limitation to the present invention.

[0034] In the description of the present invention, "a plurality of" means two or more. If there is a description of "first" and "second", it is only for the purpose of distinguishing technical features, and should not be construed as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features or implicitly specifying the sequence relationship of the indicated technical features.

[0035] In the description of the present invention, unless otherwise clearly defined, terms such as "arrangement", "installation", and "connection" should be understood in a broad sense. Those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific content of the technical solution.

[0036] Next, refer to Figures 1 to 7 to describe a plasma immersion ion implantation device for facilitating continuous modification according to an embodiment of the present invention.

[0037] As Figures 1 to 7 shown, a plasma immersion ion implantation device for facilitating continuous modification according to an embodiment of the present invention includes a mounting table 100, a processing chamber 200, at least two pretreatment chambers 300, and at least two rake frames 400.

[0038] For example, as Figure 1 and Figure 2 shown, the mounting table 100 may be a plate-like structure or other suitable shape. The mounting table 100 is provided with a through opening 101 penetrating up and down. The through opening 101 may be a square structure or other suitable shape. A first sealing door 102 may be installed in the through opening 101 for controlling the opening and closing of the through opening 101. A plurality of positioning pin shafts 106 may be vertically provided at the top end of the mounting table 100, and at least two sliding grooves 107 may be arranged side by side at the bottom end of the mounting table 100. The sliding grooves 107 extend to both sides of the mounting table 100, and the cross-section of the sliding grooves 107 may be in a T shape or other suitable shape.

[0039] As Figure 1 and Figure 3As shown, the processing chamber 200 is connected to the top end of the mounting table 100. Specifically, a plurality of flanges 204 are provided at the bottom end of the outer side wall of the processing chamber 200. The flanges 204 are provided with positioning holes. The bottom end of the processing chamber 200 is attached to the top end of the mounting table 100, and the positioning pin shafts 106 are inserted into the corresponding positioning holes, thereby realizing the installation and fixation of the processing chamber 200. An inner cavity is provided in the processing chamber 200, and an air inlet 201 communicating with the inner cavity of the processing chamber 200 is provided on the side wall of the processing chamber 200. The air inlet 201 is used to connect an external modified gas generator, and the modified gas generator is used to input modified gases such as nitrogen N2 or argon Ar2. The modified gas generator can be a modified gas storage tank or other equipment capable of inputting modified gases. A first opening is provided at the bottom end of the processing chamber 200, and the first opening communicates the inner cavity of the processing chamber 200 and the through hole 101 on the mounting table 100. In order to facilitate observing the modification operation condition, a plurality of observation windows 205 can be provided on the side wall of the processing chamber 200.

[0040] As Figure 1 and Figure 4 shown, two or more pretreatment chambers 300 can be provided. Taking two as an example, at least two slide rails 310 are provided at the top ends of the two pretreatment chambers 300. The cross section of the slide rails 310 can be in a T shape or other suitable shape. The slide rails 310 are slidably installed in the corresponding slide grooves 107. Through the cooperation of the T-shaped slide rails 310 and the T-shaped slide grooves 107, the installation of the pretreatment chamber 300 is more stable. An inner cavity is provided in the pretreatment chamber 300, and a first vacuum port 301 is provided in the pretreatment chamber 300. The first vacuum port 301 communicates with the inner cavity of the pretreatment chamber 300. The first vacuum port 301 is used to connect an external vacuum generator. The vacuum generator can be a vacuum pump or other suitable equipment capable of evacuating. A second opening 302 is provided at the top end of the pretreatment chamber 300. The second opening 302 communicates with the inner cavity of the pretreatment chamber 300. During the sliding process of the pretreatment chamber 300, the second opening 302 can be communicated with or separated from the through hole 101. The top surface of the pretreatment chamber 300 can be attached to the bottom surface of the mounting table 100. A rake frame 400 is installed in the pretreatment chamber 300. The rake frame 400 is used to place the material to be processed. The rake frame 400 can be set so that when the processing chamber 200 is communicated with the pretreatment chamber 300, the rake frame 400 can be connected to an external power supply. The power supply can be a negative high voltage power supply or other suitable types of power supplies. The power supply is used to generate an electric field near the material. When the modified gas passes through the electric field, discharge occurs, and plasma can be generated. The positive ions in the plasma are accelerated by the electric field and injected into the material surface, thereby improving the performance of the material.

[0041] It should be noted that, in addition to being connected through the positioning pin shaft 106 and the positioning hole, the processing chamber 200 and the mounting table 100 can also be connected by welding, clamping or integrally formed, which will not be elaborated here. In addition to providing the sliding groove 107 at the bottom end of the mounting table 100 and the sliding rail 310 at the top end of the pretreatment chamber 300, it is also possible to provide the sliding rail 310 at the bottom end of the mounting table 100 and the sliding groove 107 at the top end of the pretreatment chamber 300. A first sealing door 102 is provided in the through opening 101 of the mounting table 100 to close the processing chamber 200 during the process of switching the pretreatment chamber 300, so that the processing chamber 200 can be maintained in a certain vacuum state. Thus, when modifying the material next time, there is no need to temporarily evacuate the vacuum or only slightly evacuate the vacuum. Of course, a second sealing door for opening and closing the first opening can also be provided in the processing chamber 200, which will not be elaborated here. The bottom surface of the mounting table 100 is attached to the top surface of the pretreatment chamber 300, so that when the pretreatment chamber 300 slides to separate the second opening 302 from the through opening 101, that is, when the second opening 302 is located on one side of the through opening 101, the bottom surface of the mounting table 100 can close the second opening 302 of the pretreatment chamber 300, thereby making the vacuum pumping effect of the pretreatment chamber 300 better. Of course, a third sealing door for opening and closing the second opening 302 can also be provided in the pretreatment chamber 300, which will not be elaborated here.

[0042] In the present invention, when the material needs to be modified, a part of the material is placed on the rake 400 of one of the pretreatment chambers 300. Then, the pretreatment chamber 300 is slid until the second opening 302 thereon is communicated with the through opening 101 on the mounting table 100. At the same time, the vacuum generator is used to evacuate the vacuum, so that a predetermined vacuum degree can be maintained in the communicated pretreatment chamber 300 and the processing chamber 200. Then, the rake 400 is connected to the power supply and the modified gas is input through the modified gas generator, so as to modify the material to be processed on the rake 400. When modifying the material in this pretreatment chamber 300, other materials to be processed can be placed on the rake 400 of other pretreatment chambers 300, and the other pretreatment chambers 300 are evacuated by the vacuum generator. After the material modification treatment in the first pretreatment chamber 300 is completed, the first pretreatment chamber 300 is slid away, and then another pretreatment chamber 300 is slid until the second opening 302 thereon is communicated with the through opening 101 on the mounting table 100, so as to immediately perform the modification treatment on the remaining materials.

[0043] According to the plasma immersion ion implantation device for facilitating continuous modification of the embodiment of the present invention, compared with the existing modification method, when modifying the materials in the remaining pretreatment chambers 300 except for the materials in the first pretreatment chamber 300, there is no need to temporarily place the materials and temporarily evacuate the vacuum, thereby greatly shortening the operation time required other than the modification, which is beneficial to the further application of the plasma immersion ion implantation modification technology in the industrial field.

[0044] In some embodiments of the present invention, as Figure 3 and Figure 4 shown, the rake frame 400 is liftably installed in the pretreatment chamber 300. When the second opening 302 communicates with the through port 101, the rake frame 400 can rise through the through port 101 and be located in the processing chamber 200. When the pretreatment chamber 300 slides to make its second opening 302 communicate with the through port 101, that is, when the pretreatment chamber 300 communicates with the processing chamber 200, the rake frame 400 can rise through the through port 101 and be located in the processing chamber 200. Furthermore, the modified gas input from the modified gas generator can flow more conveniently to the vicinity of the material to be processed on the rake frame 400 and contact the material to be processed, thereby making the modification effect better. At the same time, the rake frame 400 can be lifted and lowered, which is more convenient for the staff to place the material to be processed on the rake frame 400 or remove the material. In addition, the rake frame 400 is set as a liftable and movable rake frame 400, which is convenient to adjust the height of the rake frame 400 according to the actual working conditions, so as to meet the requirements of different modification environments and make the modification effect better.

[0045] In some embodiments of the present invention, as Figures 4 to 6 shown, a plurality of vertically arranged transmission lead screws 303 are rotatably installed on the periphery of the rake frame 400 in the pretreatment chamber 300. The transmission lead screws 303 are drivingly connected to a driving motor 304. The transmission lead screws 303 are threadedly connected to a support frame 305, and all the support frames 305 are connected to the rake frame 400. For example, four transmission lead screws 303 can be provided. The four transmission lead screws 303 can be evenly distributed around the rake frame 400, and the four transmission lead screws 303 can be arranged at the same height. The support frame 305 is provided with a threaded hole and is threadedly connected to the corresponding transmission lead screw 303 through the threaded hole. Starting the driving motor 304, the driving motor 304 can control all the transmission lead screws 303 to rotate. Since the support frame 305 is threadedly connected to the transmission lead screw 303 and the support frame 305 is also connected to the rake frame 400, the support frame 305 cannot follow the transmission lead screw 303 to rotate, but will convert the rotation of the transmission lead screw 303 into the lifting of the support frame 305, thereby realizing the lifting of the rake frame 400. The structure is simple and the operation is convenient. Moreover, the rake frame 400 is supported by multiple transmission lead screws 303 and multiple support frames 305, and the support is more stable, avoiding the situation that the rake frame 400 is overturned due to unstable support, and the practicability is good.

[0046] It should be noted that the number of the transmission lead screws 303 can also be other numbers. For example, it can be three or five. The rake frame 400 can also be controlled to lift and lower in other ways. For example, it can be controlled to lift and lower by a cylinder or an electric push rod, which will not be elaborated here.

[0047] In some embodiments of the present invention, as Figures 4 to 6As shown in the figure, at the bottom end of each driving lead screw 303 in the pretreatment chamber 300, there is an installation seat 306. The driving lead screw 303 is rotatably installed on the installation seat 306. At the bottom end of the driving lead screw 303, a first bevel gear 307 is coaxially installed. Between two adjacent installation seats 306, a transmission shaft 308 is rotatably installed. At both ends of the transmission shaft 308, a second bevel gear 309 is coaxially installed. The second bevel gear 309 meshes with the adjacent first bevel gear 307. The driving motor 304 is drivingly connected to one of the transmission shafts 308 to control the rotation of this transmission shaft 308.

[0048] For example, four driving lead screws 303 can be provided. Correspondingly, four installation seats 306 and four first bevel gears 307 can be provided. The four installation seats 306 can be arranged at the bottom of the inner cavity of the pretreatment chamber 300. The installation seats 306 can be connected to the pretreatment chamber 300 through fasteners such as screws, or can be welded to the pretreatment chamber 300. The bottom end of the driving lead screw 303 is rotatably connected to the corresponding installation seat 306. The four first bevel gears 307 are respectively installed at the bottom ends of the four driving lead screws 303 and are coaxially arranged with the corresponding driving lead screws 303. Both ends of the transmission shaft 308 can be rotatably installed between two adjacent installation seats 306 through tapered roller bearings. The transmission shaft 308 can extend in the horizontal direction. Two adjacent transmission shafts 308 can be perpendicular to each other, and two opposite transmission shafts 308 can be parallel. The second bevel gears 309 at both ends of the transmission shaft 308 mesh with the adjacent first bevel gears 307, that is, mesh with the first bevel gears 307 near the same installation seat 306. The end of one of the transmission shafts 308 is drivingly connected to the driving motor 304. The transmission shaft 308 directly connected to the driving motor 304 can be defined as the input rotating shaft, and the remaining transmission shafts 308 can be defined as transmission rotating shafts.

[0049] Start the driving motor 304. The driving motor 304 can control the rotation of the input rotating shaft connected to it. The input rotating shaft can drive the second bevel gears 309 at both ends to rotate. The second bevel gears 309 can drive the first bevel gears 307 meshing with them to rotate. The first bevel gears 307 can thus drive the corresponding driving lead screws 303 to rotate, and at the same time can drive another second bevel gear 309 meshing with the first bevel gear 307 to rotate. The other second bevel gear 309 can drive other transmission rotating shafts to rotate, so as to drive the remaining second bevel gears 309 and first bevel gears 307 to rotate, and then realize the synchronous rotation of all the driving lead screws 303. It not only has a good linkage effect, but also is very convenient to operate, has a very ingenious design, and has good practicability.

[0050] It should be noted that when the number of drive lead screws 303 is not four but other numbers, the number of mounting seats 306, first bevel gears 307, second bevel gears 309, and drive shafts 308 can also correspond to other numbers, which will not be elaborated here. In addition, it is also possible that each drive lead screw 303 is drivingly connected to a drive motor 304, and each drive motor 304 drives the corresponding drive lead screw 303 to rotate independently.

[0051] In some embodiments of the present invention, as Figure 3 shown, the processing chamber 200 is provided with a wire passing opening 202 for the wires of the power supply to pass through. When the rake frame 400 rises to be located inside the processing chamber 200, the wires inside the processing chamber 200 contact the rake frame 400. During use, the wires of the power supply are passed through the wire passing opening 202. When the pretreatment chamber 300 slides until its second opening 302 communicates with the through opening 101, the rake frame 400 is raised. When the rake frame 400 rises to a preset height, the wires of the power supply can contact the rake frame 400, thereby realizing the energization of the rake frame 400 to facilitate the modification treatment of the materials on the rake frame 400. When the treatment is completed and the rake frame 400 descends into the pretreatment chamber 300, the rake frame 400 can be separated from the power supply, so that when the staff removes the processed materials, the staff can be prevented from getting an electric shock, and the safety is better. Moreover, by lifting, the connection and disconnection between the rake frame 400 and the power supply can be realized, and the operation is more convenient.

[0052] Of course, in some other embodiments of the present invention, it is also possible that there is a wire directly between the rake frame 400 and the power supply, and a switch is provided on the wire.

[0053] In some embodiments of the present invention, as Figure 7 shown, the rake frame 400 includes at least two target plates 401 arranged vertically. The target plates 401 are used to place the materials to be processed. One of the adjacent two target plates 401 is provided with a plurality of plug-in members 402, and the other is provided with a plurality of insertion holes 403, and the plug-in members 402 are inserted into the insertion holes 403. For example, the target plates 401 can be two, and the two target plates 401 are arranged vertically with a gap reserved between them. A plurality of plug-in members 402 are vertically provided at the top end of the lower target plate 401. The plug-in members 402 can be positioning pins, and the upper target plate 401 is correspondingly provided with a plurality of insertion holes 403, and the plug-in members 402 are inserted into the insertion holes 403. In this embodiment, by providing at least two target plates 401, more materials can be placed, thereby improving the quantity of single modification and thus the modification efficiency of the process. Moreover, different target plates 401 can be used to place different types of materials, which is more convenient to use and has better practicability. In addition, the two target plates 401 are connected by plugging, which is convenient for disassembly and assembly.

[0054] It should be noted that the connector 402 can be welded to the target plate 401, or can be snap-connected or connected to the target plate 401 through fasteners, or can be integrally formed with the target plate 401, which will not be elaborated here. The number of target plates 401 can also be more than two, for example, three or four. At least two target plates are arranged vertically, that is, at least two target plates are stacked vertically and spaced apart.

[0055] In some embodiments of the present invention, as Figure 7 shown, the target plate 401 is provided with a plurality of slots 404 for clamping the material to be processed side by side, and the extending directions of the slots 404 on two adjacent target plates 401 are staggered. Clamping the material in the slots 404 can achieve the installation and fixation of the material, with a simple structure and convenient operation. The extending directions of the slots 404 on two adjacent target plates 401 are staggered, so that the materials on two adjacent target plates 401 can be placed in different orientations. For example, when the materials are different, they can be placed in different orientations according to the actual situation. In addition, when the same material is modified multiple times, it can also be placed in different orientations, so that the modification is more comprehensive and the modification effect is further improved.

[0056] In some embodiments of the present invention, as Figure 3 shown, the processing chamber 200 is provided with a second vacuum port 203, and the second vacuum port 203 is used to connect a vacuum generator. By providing the second vacuum port 203 connected to the vacuum generator, the vacuum generator can also evacuate the inside of the processing chamber 200. Therefore, during the process of switching the pretreatment chamber 300, even if the vacuum degree in the processing chamber 200 is affected to a certain extent, the vacuum generator can still be used to evacuate and supplement, so that the vacuum degree in the processing chamber 200 is maintained within a suitable range. In addition, when the modified gas generator delivers the modified gas, the vacuum generator can continuously evacuate, so that the vacuum degree in the processing chamber 200 is maintained within a suitable range, which is not only convenient for the rapid pumping of the modified gas, but also enables the modified gas to be in a suitable negative pressure environment all the time, thus making the modification effect better.

[0057] It should be noted that in some other embodiments of the present invention, only the pretreatment chamber 300 may be connected to the vacuum generator. When the pretreatment chamber 300 is communicated with the processing chamber 200, the vacuum generator indirectly evacuates the processing chamber 200 through the pretreatment chamber 300.

[0058] In some embodiments of the present invention, the pretreatment chamber 300 can slide to expose the second opening 302 on one side of the mounting table 100. Specifically, as Figure 1 and Figure 2As shown, when a chute 107 is provided at the bottom end of the installation table 100, the chute 107 can extend to both sides of the installation table 100 and penetrate through. Furthermore, the pretreatment chamber 300 slidably installed on the chute 107 can slide to the outside of both sides of the installation table 100, so that the second opening 302 on the pretreatment chamber 300 can be exposed from one side of the installation table 100, facilitating the staff to place the materials to be processed or take the processed materials, making it more convenient to use and having better practicability.

[0059] In some embodiments of the present invention, as Figure 2 shown, two rotating shafts 103 are rotatably installed at the through opening 101 of the installation table 100. The rotating shafts 103 are drivingly connected to an adjusting motor 104. The first sealing door 102 includes two door bodies 105. The two door bodies 105 are respectively connected to the two rotating shafts 103, and the two door bodies 105 cooperate to close or open the through opening 101 during the rotation process.

[0060] For example, the two rotating shafts 103 can be arranged on both sides of the through opening 101 in the left-right direction. The two door bodies 105 are respectively a left door body and a right door body. The left door body can be key-connected to the corresponding rotating shaft 103, and the right door body can be key-connected to the corresponding rotating shaft 103. The two adjusting motors 104 are respectively connected to the ends of the corresponding rotating shafts 103.

[0061] By starting the adjusting motor 104, the corresponding rotating shaft 103 can be controlled to rotate. The rotating shaft 103 transmits power through the key, and then drives the corresponding door body 105 to rotate. When the two door bodies 105 rotate towards each other to the horizontal state, they can cooperate to close the through opening 101. When the two door bodies 105 rotate away from each other to the vertical state, the through opening 101 can be opened. The structure is simple, the operation is convenient, and the sealing effect is good.

[0062] It should be noted that when the processing chamber 200 is provided with a second sealing door for opening and closing the first opening, and the pretreatment chamber 300 is provided with a third sealing door for opening and closing the second opening 302, the structures of the second sealing door and the third sealing door can be similar to the structure of the first sealing door 102. Of course, the first sealing door 102, the second sealing door, and the third sealing door can also be set to other suitable structures. For example, they can be set to common valve structures, which will not be elaborated here.

[0063] Next, in combination with Figures 1 to 7 briefly describe the working process of the plasma immersion ion implantation device for facilitating continuous modification of the present invention. It can be understood that the following description is only an exemplary illustration and not a specific limitation.

[0064] In use, the batch materials are installed and fixed on the rake frame 400 in the pretreatment chamber 300. A vacuum generator such as a vacuum pump is connected to the second vacuum port 203 of the processing chamber 200 and the first vacuum port 301 of the pretreatment chamber 300. A modifying gas generator such as a modifying gas storage tank is connected to the intake port 201 of the processing chamber 200. The wires of a power source such as a negative high-voltage power supply pass through the wire passing port 202 of the processing chamber 200. The pretreatment chamber 300 is slidably installed at the bottom of the mounting table 100. One of the pretreatment chambers 300 is slid to directly below the through port 101, and the second opening 302 thereon is communicated with the through port 101. The adjusting motor 104 is adjusted to control the two door bodies 105 to rotate to the vertical state to open the through port 101, and the adjusting motor 104 stops working after adjustment. At the same time, the driving motor 304 controls the input rotating shaft in the transmission shaft 308 to rotate. The input rotating shaft can drive the second bevel gears 309 at both ends thereof to rotate. The second bevel gears 309 can drive the first bevel gears 307 engaged therewith to rotate. The first bevel gears 307 can thus drive the corresponding transmission lead screws 303 to rotate, and can also drive another second bevel gear 309 engaged with the first bevel gear 307 to rotate at the same time. The other second bevel gear 309 can drive the transmission rotating shaft in the transmission shaft 308 to rotate, so as to drive the remaining second bevel gears 309 and first bevel gears 307 to rotate, and further realize the synchronous rotation of all the transmission lead screws 303. The support frame 305 converts the rotation of the transmission lead screw 303 into the lifting of the support frame 305 through the threaded connection with the transmission lead screw 303, thereby driving the rake frame 400 to rise. When the rake frame 400 rises to a preset height in the processing chamber 200, the driving motor 304 stops working, and the wire of the negative high-voltage power supply contacts the rake frame 400. At this time, the vacuum pump is turned on for vacuuming until the vacuum degrees in the processing chamber 200 and the pretreatment chamber 300 reach the preset value, for example, reach 10 -3 Pa. Then, the negative high-voltage power supply and the modifying gas storage tank are started, and argon Ar2 is introduced to perform plasma cleaning on the material surface. After completion, nitrogen N2 is introduced to perform plasma immersion ion implantation modification treatment. At the same time, the remaining pretreatment chambers 300 are evacuated so that the vacuum degrees in the remaining pretreatment chambers 300 reach the preset value. After the material modification treatment in the first pretreatment chamber 300 is completed, the driving motor 304 on the first pretreatment chamber 300 rotates in reverse, and the rake frame 400 descends into the first pretreatment chamber 300. The two adjusting motors 104 rotate in reverse to control the two door bodies 105 to gradually rotate in the direction of approaching each other to the horizontal state until the through port 101 on the mounting table 100 is completely closed. Then, the first pretreatment chamber 300 is moved away from directly below the through port 101, and another pretreatment chamber 300 is slid to directly below the through port 101 and the second opening 302 thereon is communicated with the through port 101. Then, repeat the steps for processing the materials in the first pretreatment chamber 300 before, and the modification treatment of all the materials can be completed.

[0065] The embodiments of the present invention have been described in detail above in conjunction with the accompanying drawings. However, the present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present invention within the scope of knowledge possessed by those of ordinary skill in the art.

Claims

1. A plasma immersion ion implantation device facilitating continuous modification, characterized in that, Comprising: An installation platform provided with a through opening penetrating up and down; A processing chamber connected to the top end of the installation platform, the processing chamber being provided with an air inlet for connecting a modified gas generator, and a first opening communicating with the through opening being provided at the bottom end of the processing chamber; At least two pretreatment chambers slidably installed at the bottom end of the installation platform, the pretreatment chambers being provided with a first vacuum port for connecting a vacuum generator, a second opening being provided at the top end of the pretreatment chambers, and the pretreatment chambers being capable of sliding to communicate or separate the second opening from the through opening; At least two rake frames respectively installed in at least two of the pretreatment chambers, the rake frames being used for placing materials to be processed; Wherein, the installation platform is provided with a first sealing door for opening and closing the through opening and / or the processing chamber is provided with a second sealing door for opening and closing the first opening; The bottom surface of the installation platform is attached to the top surface of the pretreatment chamber and / or the pretreatment chamber is provided with a third sealing door for opening and closing the second opening; The rake frame is liftably installed in the pretreatment chamber, and when the second opening communicates with the through opening, the rake frame can rise to pass through the through opening and be located in the processing chamber; A plurality of vertically arranged transmission lead screws are rotatably installed on the periphery of the rake frame in the pretreatment chamber, the transmission lead screws are drivingly connected to a driving motor, and the transmission lead screws are threadedly connected to a support frame, and all the support frames are connected to the rake frame; An installation seat is provided at the bottom end of each of the transmission lead screws in the pretreatment chamber, the transmission lead screw is rotatably installed in the installation seat, a first bevel gear is coaxially installed at the bottom end of the transmission lead screw, a transmission shaft is rotatably installed between adjacent two of the installation seats, second bevel gears are coaxially installed at both ends of the transmission shaft, the second bevel gears are engaged with the adjacent first bevel gears, and the driving motor is drivingly connected to one of the transmission shafts to control the rotation of the transmission shaft; 2. The plasma immersion ion implantation device facilitating continuous modification according to claim 1, wherein, The processing chamber is provided with a wire passing port for the wires of the power supply to pass through, and when the rake frame rises to be located in the processing chamber, the wires in the processing chamber contact the rake frame; 3. The plasma immersion ion implantation device facilitating continuous modification according to claim 1, characterized in that, The rake frame comprises at least two target plates arranged up and down, the target plates being used for placing the materials to be processed, a plurality of plug-in members are provided on one of the adjacent two target plates, a plurality of insertion holes are provided on the other, and the plug-in members are inserted into the insertion holes; 4. The plasma immersion ion implantation device facilitating continuous modification according to claim 3, wherein, A plurality of card slots for clamping the materials to be processed are arranged side by side on the target plates, and the extending directions of the card slots on the adjacent two target plates are staggered; 5. The plasma immersion ion implantation device facilitating continuous modification according to claim 1, wherein, The processing chamber is provided with a second vacuum port for connecting the vacuum generator; 6. The plasma immersion ion implantation device facilitating continuous modification according to claim 1, wherein The pretreatment chamber can slide to expose the second opening on one side of the installation platform; 7. The plasma immersion ion implantation device for facilitating continuous modification according to claim 1, wherein, Two rotating shafts are rotatably installed at the through opening of the installation platform, the rotating shafts are drivingly connected to an adjusting motor, the first sealing door comprises two door bodies, the two door bodies are respectively connected to the two rotating shafts, and the two door bodies cooperate to close or open the through opening during the rotation process.

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