A quartz crucible high-pressure cleaning device

Abstract

The present invention relates to the technical field of quartz crucible cleaning, and specifically to a quartz crucible high-pressure cleaning device, comprising a shell, a plurality of evenly distributed first high-pressure water spray heads fixedly connected to the bottom outer wall of the first slide, two centrally symmetrically distributed outer wall cleaning devices meshing with the outer wall of the first gear, and an inner wall cleaning device fixedly connected to the top outer wall of the rotating disk. When the quartz crucible high-pressure cleaning device is rotated to a horizontal state by the first support column, the rubber support block supports the inner wall of the quartz crucible to fix the position of the quartz crucible, thereby preventing the quartz crucible from being damaged due to position deviation during the cleaning process. When the first support column continues to rotate, the fixing device is released, and the water in the second water inlet hose is flushed onto the second brush group, driving the first rotating plate to rotate continuously, so that the second brush group can continuously scrub the inner wall of the quartz crucible, thereby achieving a better scrubbing effect.

Description

Technical Field

[0001] The present invention relates to the technical field of quartz crucible cleaning, in particular to a quartz crucible high-pressure cleaning device. Background Art

[0002] Quartz crucible is a glass vessel formed by high-purity quartz sand melted at high temperature. It has the characteristics of high purity, strong high temperature resistance, large size, high precision, good thermal insulation performance and energy saving.

[0003] In the prior art, it is necessary to inspect the melted crucible, and this process easily leaves dust or gravel on the surface of the crucible. Whether the surface quality of the quartz crucible is smooth and clean will directly affect the quality of the quartz crucible smelting products and the service life of the quartz crucible itself. At present, the cleaning process mostly requires manual cleaning, and the cleaning work intensity is large, the quality is too low, and the cleaning quality is difficult to guarantee. In addition, quartz is brittle and easy to break, and the fixing effect of the crucible is not good during cleaning. The crucible cannot be avoided from shaking during cleaning, thereby reducing the cleaning effect of the cleaning device. Therefore, a quartz crucible high-pressure cleaning device is proposed. Summary of the Invention

[0004] The purpose of the present invention is to solve the problems in the background technology and to propose a quartz crucible high-pressure cleaning device.

[0005] In order to achieve the above object, the present invention adopts the following technical solutions:

[0006] A quartz crucible high-pressure cleaning device comprises a shell, wherein the top inner wall of the shell is fixedly connected to a first telescopic rod, the end of the first telescopic rod away from the shell is fixedly connected to a first motor, the output shaft of the first motor is fixedly connected to a first gear, the side of the first gear away from the first motor is rotatably connected to a first slide via a provided shaft, the inner wall of the shell is fixedly connected to two evenly distributed first slide rails, the first slide is slidably connected to the first slide rails, the bottom outer wall of the first slide is fixedly connected to a plurality of evenly distributed first high-pressure water spray heads, the outer wall of the first gear is meshed with two outer wall cleaning devices distributed symmetrically in the center, the bottom inner wall of the shell is fixedly connected to a second motor, the output shaft of the second motor is fixedly connected to a third telescopic rod, the inner wall of the shell is fixedly connected to a water leakage net, the center of the water leakage net is rotatably connected to a rotating disk, the bottom outer wall of the rotating disk is fixedly connected to a partition column, the end of the partition column away from the rotating disk is rotatably connected to the shell, the outer wall of the partition column is fixedly connected to a water tank, and the top outer wall of the rotating disk is fixedly connected to the inner wall cleaning device.

[0007] In the above-mentioned quartz crucible high-pressure cleaning device, the outer wall cleaning device includes a rack, the end of the rack away from the first gear is fixedly connected to a first connecting rod, the end of the first connecting rod away from the rack is fixedly connected to a first cleaning rod, the outer wall of the first cleaning rod away from the side of the shell is fixedly connected to a first polishing sand and a first brush group, the outer wall of the first slide is fixedly connected to two evenly distributed second slide rails, and the outer wall of each second slide rail is slidably connected to the rack respectively.

[0008] In the above-mentioned quartz crucible high-pressure cleaning device, the inner wall cleaning device includes a mounting column, the inner wall of the mounting column is slidably connected to a first sliding rod, the bottom end of the first sliding rod is fixedly connected to the third telescopic rod, the top inner wall of the mounting column is fixedly connected to a fixed plate, the top outer wall of the fixed plate is fixedly connected to a fourth telescopic rod, the top of the fourth telescopic rod is fixedly connected to a second cleaning rod, and the second cleaning rod is fixedly connected to a third brush group and a third polishing sand on the side away from the fourth telescopic rod.

[0009] In the above-mentioned quartz crucible high-pressure cleaning device, the inner wall of the mounting column is slidably connected to a first sliding rod, and the outer walls on both sides of the first sliding rod are fixedly connected to two polishing support devices, and the polishing support device includes a second tooth block group, and the outer wall of the second tooth block group is engaged with a third gear, and the side of the third gear away from the second tooth block group is fixedly connected to a mounting seat, and the outer walls on both sides of the mounting seat are fixedly connected to a first rotating shaft, and each of the first rotating shafts is rotatably connected to the mounting column.

[0010] In the above-mentioned quartz crucible high-pressure cleaning device, each of the mounting seats is fixedly connected to a first support column and a mounting block on a side away from the first sliding rod, the mounting block is fixedly connected to a second telescopic rod on a side away from the mounting seat, and the second telescopic rod is fixedly connected to a second polishing sand on a side away from the mounting block.

[0011] In the above-mentioned quartz crucible high-pressure cleaning device, the inner wall of one end of each first support column away from the mounting seat is rotatably connected to the first rotating plate, the left and right outer walls of each first rotating plate are fixedly connected to rubber support blocks, the upper and lower outer walls of each first rotating plate are fixedly connected to the second brush group, and the inner wall of each first support column is slidably connected to a fixing device.

[0012] In the above-mentioned quartz crucible high-pressure cleaning device, the fixing device includes two evenly distributed supporting slides, the inner wall of each first supporting column is provided with two evenly distributed first sliding grooves, a first connecting plate is provided between each two supporting slides and the mounting seat, each two supporting slides are fixedly connected to the first connecting plate, the outer wall of each first connecting plate close to the mounting seat is rotatably connected to a threaded rod, the inner wall of each mounting seat is provided with a thread, and the end of each threaded rod away from the first connecting plate is threadedly connected to the mounting seat, and the end of each threaded rod close to the mounting seat The ends are fixedly connected to a rotating ring, the outer wall of each rotating ring is slidably connected to the first sleeve, the end of each first sleeve close to the mounting seat is rotatably connected to the mounting seat, the end of each first sleeve away from the mounting seat is fixedly connected to the second gear, the outer wall of each second gear is meshed with a first tooth block group, each first tooth block group is fixedly connected to the inner wall of the mounting column, and limiting rods are provided on both sides of each threaded rod, the end of each limiting rod close to the supporting slide is fixedly connected to the first connecting plate, and the end of each limiting rod away from the supporting slide is slidably connected to the mounting seat.

[0013] In the above-mentioned quartz crucible high-pressure cleaning device, the inner wall of each mounting seat is fixedly connected to a second water inlet hose, the end of each second water inlet hose away from the mounting seat is fixedly connected to a second high-pressure water spray head, the outer wall of each second high-pressure water spray head is fixedly connected to a second connecting rod, both ends of each second connecting rod are fixedly connected to the inner wall of the first support column, the end of each second water inlet hose away from the fourth telescopic rod is connected to the first water inlet hose, the end of the first water inlet hose away from the mounting column is fixedly connected to a water inlet, and the water inlet is connected to the water tank.

[0014] Compared with the existing technology, the advantages of this quartz crucible high-pressure cleaning device are:

[0015] 1. By retracting the third telescopic rod, the first sliding rod moves downward, and the second gear block group drives the third gear to rotate. During the rotation process, the center of the bottom of the quartz crucible gradually moves to the center of the device. When the first support column rotates to a horizontal state, the rubber support blocks on both sides support the inner wall of the quartz crucible to form pressure, fixing the position of the quartz crucible, thereby further assisting the outer wall cleaning device to clean the outer wall of the quartz crucible, preventing the quartz crucible from being damaged due to position deviation during the cleaning process;

[0016] 2. The second and fourth telescopic rods begin to extend intermittently, driving the second and third polishing sands to polish some protrusions on the inner wall of the quartz crucible. After polishing one circle, the second and fourth telescopic rods are extended a little deeper and then polished to achieve the effect of polishing and scraping layer by layer, rather than directly polishing and scraping the roots of the protrusions to prevent damage to the outer wall of the quartz crucible. Since the second and third polishing sands are located at the bottom and middle of the quartz crucible respectively, when the annular plane where the second and third polishing sands are located is polished, the second and fourth telescopic rods are retracted to the shortest position, and the first telescopic rod begins to retract intermittently to start polishing the lower annular surface, so that the inner wall of the quartz crucible can be scrubbed in all directions;

[0017] 3. During the rotation of the mounting seat, the second gear is meshed with the first gear block group, and the rotation of the second gear drives the rotating ring to rotate, and the rotating ring drives the threaded rod to rotate. Due to the limiting effect of the limit rod, and because the outer wall of the rotating ring is fixedly connected to the sliding block, the first sleeve is fixedly connected to the corresponding sliding groove, so that the threaded rod and the rotating ring are retracted into the first sleeve, driving the first connecting plate to move, and the first connecting plate drives the supporting slide plate to move, thereby releasing the fixation of the first rotating plate. When the second polishing sand is in a horizontal state, the water inlet is opened, and the water in the second water inlet hose rushes to the second brush group, driving the first rotating plate to rotate continuously, so that the second brush group can continuously scrub the inner wall of the quartz crucible, so that the scrubbing effect is better, so that the first support column can play the role of clamping the inner wall positioning center when cleaning the outer wall, and can also play a promoting role when cleaning the inner wall;

[0018] To sum up, in the present invention, when the first support column rotates to a horizontal state, the rubber support block supports the inner wall of the quartz crucible to form pressure, fixes the position of the quartz crucible, and further assists the outer wall cleaning device to clean the outer wall of the quartz crucible, preventing the quartz crucible from being damaged due to position deviation during the cleaning process. When the first support column continues to rotate, the fixing device is released, and the water in the second water inlet hose rushes to the second brush group, driving the first rotating plate to rotate continuously, so that the second brush group can continuously wash the inner wall of the quartz crucible, so that the brushing effect is better. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0020] Figure 2 It is a schematic diagram of the internal structure of the present invention;

[0021] Figure 3 This is a schematic diagram of the structure of the present invention after removing part of the shell;

[0022] Figure 4 The present invention Figure 3 Schematic diagram of the structure at A in the middle;

[0023] Figure 5 It is a structural schematic diagram of the inner wall cleaning device of the present invention;

[0024] Figure 6 It is a schematic diagram of the structure inside the inner wall cleaning device of the present invention;

[0025] Figure 7 The present invention Figure 6 Schematic diagram of the structure at B in the middle;

[0026] Figure 8 This is a schematic diagram of the structure of the present invention after removing the mounting column;

[0027] Figure 9 The present invention Figure 8 Schematic diagram of the structure at C in the middle;

[0028] Figure 10 It is a schematic structural diagram of the polishing support device of the present invention;

[0029] Figure 11 The present invention Figure 10 Schematic diagram of the structure at D in the middle;

[0030] Figure 12 It is a structural schematic diagram of E in 10 of the present invention.

[0031] In the figure: 1, housing; 2, first high-pressure water spray head; 3, first connecting rod; 4, first cleaning rod; 5, mounting column; 6, first slide rail; 7, first telescopic rod; 8, first motor; 9, second slide rail; 10, first slide plate; 11, rack; 12, water leakage net; 13, partition column; 14, first gear; 15, first polishing sand; 16, first brush set; 17, first support column; 18, second polishing sand; 19, second telescopic rod; 20, rotating disk; 21, third telescopic rod; 22, water inlet; 23, second motor; 24, first slide rail; 25, support slide plate; 26, second brush set; 27 , rubber support block; 28, mounting seat; 29, first rotating shaft; 30, first rotating plate; 31, third brush group; 32, third polishing sand; 33, second cleaning rod; 34, fourth telescopic rod; 35, first water inlet hose; 36, second gear; 37, first sleeve; 38, first gear block group; 39, second water inlet hose; 40, third gear; 41, second gear block group; 42, fixing plate; 43, mounting block; 44, first connecting plate; 45, first slide groove; 46, limiting rod; 47, threaded rod; 48, rotating ring; 49, second high-pressure water sprinkler; 50, second connecting rod; 51, water tank. DETAILED DESCRIPTION

[0032] The technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0033] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as limiting the present invention.

[0034] Reference Figures 1-12 , a quartz crucible high-pressure cleaning device, including a shell 1, the top inner wall of the shell 1 is fixedly connected to a first telescopic rod 7, the end of the first telescopic rod 7 away from the shell 1 is fixedly connected to a first motor 8, the output shaft of the first motor 8 is fixedly connected to a first gear 14, the side of the first gear 14 away from the first motor 8 is rotatably connected to a first slide 10 through a set shaft, the inner wall of the shell 1 is fixedly connected to two evenly distributed first slide rails 6, the first slide 10 is slidably connected to the first slide rails 6, the bottom outer wall of the first slide 10 is fixedly connected to a number of evenly distributed first high-pressure water spray heads 2, the outer wall of the first gear 14 is engaged with two outer wall cleaning devices distributed symmetrically in the center, the bottom inner wall of the shell 1 is fixedly connected to a second motor 23, the output shaft of the second motor 23 is fixedly connected to the third telescopic rod 21, the shell 1 The inner wall is fixedly connected to a water leakage net 12, and the center of the water leakage net 12 is rotatably connected to a rotating disk 20. The bottom outer wall of the rotating disk 20 is fixedly connected to a partition column 13, and the end of the partition column 13 away from the rotating disk 20 is rotatably connected to the shell 1. The outer wall of the partition column 13 is fixedly connected to a water tank 51, and the top outer wall of the rotating disk 20 is fixedly connected to an inner wall cleaning device. The outer wall cleaning device includes a rack 11, and the end of the rack 11 away from the first gear 14 is fixedly connected to the first connecting rod 3, and the end of the first connecting rod 3 away from the rack 11 is fixedly connected to the first cleaning rod 4. The first cleaning rod 4 is fixedly connected to the outer wall of the side away from the shell 1 with a first polishing sand 15 and a first brush group 16. The outer wall of the first slide 10 is fixedly connected to two evenly distributed second slide rails 9, and the outer wall of each second slide rail 9 is slidably connected to the rack 11 respectively.

[0035] In this embodiment, it is placed upside down on the mounting column 5, and the third telescopic rod 21 is slowly retracted, driving the first slide bar 24 to move downward. At this time, the second gear block group 41 drives the third gear 40 to rotate. During the rotation process, the center of the bottom of the quartz crucible gradually moves to the center of the device, playing a role in center positioning. When the first support column 17 is rotated to a horizontal state, the rubber support blocks 27 on both sides support the inner wall of the quartz crucible to form pressure, and fix the position of the quartz crucible, thereby further assisting the outer wall cleaning device to clean the outer wall of the quartz crucible, preventing the outer wall of the quartz crucible from being damaged during the cleaning process. The quartz crucible is damaged due to position deviation, etc. After the inner wall of the crucible is fixed, the third telescopic rod 21 stops retracting and starts to clean the outer wall. The first motor 8 starts to rotate, driving the two racks 11 to move toward each other, thereby driving the first cleaning rods 4 on both sides to move toward the middle. When the first polishing sand 15 and the first brush group 16 are about to contact the outer wall of the quartz crucible, the second motor 23 is turned on to drive the quartz crucible to rotate. At this time, the first high-pressure water spray head 2 is turned on, and the first polishing sand 15 on the first cleaning rod 4 cleans and polishes the outer wall of the quartz crucible, and the outer wall cleaning is completed.

[0036] Among them, the inner wall cleaning device includes a mounting column 5, the inner wall of the mounting column 5 is slidingly connected to the first sliding rod 24, the bottom end of the first sliding rod 24 is fixedly connected to the third telescopic rod 21, the top inner wall of the mounting column 5 is fixedly connected to the fixing plate 42, the top outer wall of the fixing plate 42 is fixedly connected to the fourth telescopic rod 34, the top of the fourth telescopic rod 34 is fixedly connected to the second cleaning rod 33, and the side of the second cleaning rod 33 away from the fourth telescopic rod 34 is fixedly connected to the third brush group 31 and the third polishing sand 32.

[0037] Among them, the inner wall of the mounting column 5 is slidably connected to the first slide bar 24, and the outer walls on both sides of the first slide bar 24 are fixedly connected to two polishing support devices, and the polishing support device includes a second tooth block group 41, and the outer wall of the second tooth block group 41 is meshed with a third gear 40. The third gear 40 is fixedly connected to the mounting seat 28 on one side away from the second tooth block group 41. The outer walls of both sides of the mounting seat 28 are fixedly connected to the first rotating shaft 29, each first rotating shaft 29 is rotatably connected to the mounting column 5, and each mounting seat 28 is fixedly connected to the first rotating shaft 29 on one side away from the first slide bar 24. The support column 17 and the mounting block 43, the side of the mounting block 43 away from the mounting seat 28 is fixedly connected to the second telescopic rod 19, the side of the second telescopic rod 19 away from the mounting block 43 is fixedly connected to the second polishing sand 18, the inner wall of one end of each first support column 17 away from the mounting seat 28 is rotatably connected to the first rotating plate 30, the outer walls on the left and right sides of each first rotating plate 30 are fixedly connected to the rubber support block 27, the outer walls on the upper and lower sides of each first rotating plate 30 are fixedly connected to the second brush group 26, and the inner wall of each first support column 17 is slidably connected to a fixing device.

[0038] In this embodiment, the first high-pressure water spray head 2 is closed, the second motor 23 stops rotating, and the first motor 8 rotates to the point where the first cleaning rods 4 on both sides can clamp the quartz crucible and then stop. At this time, the outer wall of the quartz crucible is clamped and fixed, and the third telescopic rod 21 continues to contract, driving the third gear 40 to rotate. When the second telescopic rod 19 rotates to a horizontal position, since the inner wall of the quartz crucible is cylindrical, that is, when the two first support columns 17 are in a horizontal state, the pressure borne by the rubber support blocks 27 on both sides is the maximum value. When cleaning the inner wall of the crucible, the outer wall is clamped by the first cleaning rod 4. When the second telescopic rod 19 rotates to a horizontal position, the first support column 17 will rotate upward, and the rotation trajectory is circular, that is, the pressure on the rubber support blocks 27 on both sides will decrease during the rotation process until there is no pressure. The machine 23 starts to rotate, and the third brush group 31 and the third polishing sand 32 clean the bottom inner wall of the quartz crucible. The second telescopic rod 19 and the fourth telescopic rod 34 begin to extend intermittently, driving the second polishing sand 18 and the third polishing sand 32 to polish some protrusions on the inner wall of the quartz crucible. After grinding one circle, the second telescopic rod 19 and the fourth telescopic rod 34 are further extended and then polished to achieve the effect of grinding and scraping layer by layer, instead of directly grinding and scraping the roots of the protrusions to prevent damage to the outer wall of the quartz crucible. When the annular plane where the second polishing sand 18 and the third polishing sand 32 are located is polished, the second telescopic rod 19 and the fourth telescopic rod 34 are retracted to the shortest, and the first telescopic rod 7 begins to retract intermittently and begins to grind the annular surface below, so that the inner wall of the quartz crucible can be brushed in all directions.

[0039] Among them, the fixing device includes two evenly distributed supporting slides 25, and each first supporting column 17 has two evenly distributed first sliding grooves 45 on the inner wall. A first connecting plate 44 is provided between each two supporting slides 25 and the mounting seat 28, and each two supporting slides 25 are fixedly connected to the first connecting plate 44. The outer wall of each first connecting plate 44 close to the mounting seat 28 is rotatably connected to a threaded rod 47, and the inner wall of each mounting seat 28 is provided with a thread, and the end of each threaded rod 47 away from the first connecting plate 44 is threadedly connected to the mounting seat 28, and the end of each threaded rod 47 close to the mounting seat 28 is fixedly connected to a rotating ring 48, and the outer wall of each rotating ring 48 is slidably connected to a first sleeve 37, and the end of each first sleeve 37 close to the mounting seat 28 is rotatably connected to the mounting seat 28, and the end of each first sleeve 37 away from the mounting seat 28 is fixedly connected to the second gear 36, and the outer wall of each second gear 36 is meshed. It is equipped with a first gear block group 38, each first gear block group 38 is fixedly connected to the inner wall of the mounting column 5, and a limiting rod 46 is provided on both sides of each threaded rod 47, and each limiting rod 46 is fixedly connected to the first connecting plate 44 at one end close to the support slide 25, and each limiting rod 46 is slidably connected to the mounting seat 28 at one end away from the support slide 25, and the inner wall of each mounting seat 28 is fixedly connected to a second water inlet hose 39, and each second water inlet hose 39 is fixedly connected to a second high-pressure water sprinkler head 49 at one end away from the mounting seat 28, and the outer wall of each second high-pressure water sprinkler head 49 is fixedly connected to a second connecting rod 50, and both ends of each second connecting rod 50 are fixedly connected to the inner wall of the first support column 17, and each second water inlet hose 39 is connected to the first water inlet hose 35 at one end away from the fourth telescopic rod 34, and the first water inlet hose 35 is fixedly connected to the water inlet 22 at one end away from the mounting column 5, and the water inlet 22 is connected to the water tank 51.

[0040] When the second polishing sand 18 is in a horizontal state, the water inlet 22 is opened, and the water in the second water inlet hose 39 rushes onto the second brush group 26, driving the first rotating plate 30 to rotate continuously, so that the second brush group 26 can continuously scrub the inner wall of the quartz crucible, thereby achieving a better scrubbing effect.

[0041] The specific working principle and method of use of the present invention are explained in detail below: when in use, the quartz crucible to be cleaned is placed upside down on the mounting column 5, and the third telescopic rod 21 is slowly retracted, driving the first slide bar 24 to move downward. At this time, the second gear block group 41 drives the third gear 40 to rotate. During the rotation process, the center of the bottom of the quartz crucible gradually moves to the center of the device, playing a role in center positioning. When the first support column 17 is rotated to a horizontal state, the rubber support blocks 27 on both sides support the inner wall of the quartz crucible to form pressure, fix the position of the quartz crucible, thereby further assisting the outer wall cleaning device to clean the outer wall of the quartz crucible, preventing the quartz crucible from being damaged due to position deviation during the cleaning process, etc. After the inner wall of the crucible is fixed, the third telescopic rod 21 Pause the retraction and start cleaning the outer wall. The first motor 8 starts to rotate, driving the two racks 11 to move toward each other, thereby driving the first cleaning rods 4 on both sides to move toward the middle. When the first polishing sand 15 and the first brush group 16 are about to touch the outer wall of the quartz crucible, the second motor 23 is turned on to drive the quartz crucible to rotate. At this time, the first high-pressure water spray head 2 is turned on, and the first polishing sand 15 on the first cleaning rod 4 cleans and polishes the outer wall of the quartz crucible. After the outer wall cleaning is completed, the first high-pressure water spray head 2 is closed, and the second motor 23 stops rotating. The first motor 8 rotates to the point where the first cleaning rods 4 on both sides can clamp the quartz crucible and then stop. At this time, the outer wall of the quartz crucible is clamped and fixed, and the third telescopic rod 21 continues to retract, driving the third gear 40 to rotate. When the second telescopic rod 21 is retracted, the third gear 40 is driven to rotate. When the rod 19 is rotated to the horizontal position, since the inner wall of the quartz crucible is cylindrical, that is, when the two first support columns 17 are in a horizontal state, the pressure borne by the rubber support blocks 27 on both sides is the maximum value. When cleaning the inner wall of the crucible, the outer wall is clamped by the first cleaning rod 4. When the second telescopic rod 19 is rotated to the horizontal position, the first support column 17 will rotate upward, and the rotation trajectory is circular. That is, the pressure borne by the rubber support blocks 27 on both sides will decrease during the rotation process until there is no pressure. The second motor 23 starts to rotate, and the third brush group 31 and the third polishing sand 32 clean the bottom inner wall of the quartz crucible. The second telescopic rod 19 and the fourth telescopic rod 34 begin to extend intermittently, driving the second polishing sand 18 and the third polishing sand 32 to polish some protrusions on the inner wall of the quartz crucible. After one circle, the second telescopic rod 19 and the fourth telescopic rod 34 are further extended and polished to achieve the effect of layer-by-layer polishing and scraping, rather than directly polishing and scraping the roots of the protrusions to prevent damage to the outer wall of the quartz crucible. When the annular plane where the second polishing sand 18 and the third polishing sand 32 are located is polished, the second telescopic rod 19 and the fourth telescopic rod 34 are retracted to the shortest position, and the first telescopic rod 7 begins to retract intermittently and begins to polish the annular surface below, so that the inner wall of the quartz crucible can be scrubbed in all directions. In the process of rotation of the mounting seat 28, the second gear 36 is engaged with the first gear block group 38, and the rotation of the second gear 36 drives the rotating ring 48 to rotate, and the rotating ring 48 drives the threaded rod 47 to rotate. Due to the limiting effect of the limiting rod 46, the threaded rod 47 is limited.Because a slider is fixedly connected to the outer wall of the rotating ring 48 and a corresponding slide is fixedly connected to the interior of the first sleeve 37, the threaded rod 47 and the rotating ring 48 are retracted into the interior of the first sleeve 37, driving the first connecting plate 44 to move. The first connecting plate 44 drives the supporting slide 25 to move, thereby releasing the fixation of the first rotating plate 30. When the second polishing sand 18 is in a horizontal state, the water inlet 22 is opened, and the water in the second water inlet hose 39 rushes onto the second brush assembly 26, driving the first rotating plate 30 to rotate continuously, so that the second brush assembly 26 can continuously scrub the inner wall of the quartz crucible, achieving a better scrubbing effect.

[0042] It is further explained that the above-mentioned fixed connection should be understood in a broad sense unless otherwise clearly specified and limited. For example, it can be welding, gluing, or one-piece molding, etc., which are common means well known to those skilled in the art.

[0043] The above description is only a preferred specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any technician familiar with the technical field, within the technical scope disclosed by the present invention, who makes equivalent replacements or changes based on the technical solution and inventive concept of the present invention, should be covered by the scope of protection of the present invention.

Claims

1. A quartz crucible high-pressure cleaning device, comprising a housing (1), characterized in that: The top inner wall of the shell (1) is fixedly connected to a first telescopic rod (7), an end of the first telescopic rod (7) away from the shell (1) is fixedly connected to a first motor (8), an output shaft of the first motor (8) is fixedly connected to a first gear (14), a side of the first gear (14) away from the first motor (8) is rotatably connected to a first slide plate (10) via a provided shaft, the inner wall of the shell (1) is fixedly connected to two evenly distributed first slide rails (6), the first slide plate (10) is slidably connected to the first slide rails (6), a bottom outer wall of the first slide plate (10) is fixedly connected to a plurality of evenly distributed first high-pressure water spray heads (2), the outer wall of the first gear (14) is fixedly connected to the first high-pressure water spray heads (2), and the outer wall of the first gear (14) is fixedly connected to the first high-pressure water spray heads (2). The wall is engaged with two outer wall cleaning devices that are symmetrically distributed in the center, the bottom inner wall of the shell (1) is fixedly connected to a second motor (23), the output shaft of the second motor (23) is fixedly connected to a third telescopic rod (21), the inner wall of the shell (1) is fixedly connected to a water leakage net (12), the center of the water leakage net (12) is rotatably connected to a rotating disk (20), the bottom outer wall of the rotating disk (20) is fixedly connected to a partition column (13), one end of the partition column (13) away from the rotating disk (20) is rotatably connected to the shell (1), the outer wall of the partition column (13) is fixedly connected to a water tank (51), and the top outer wall of the rotating disk (20) is fixedly connected to the inner wall cleaning device; The inner wall cleaning device comprises a mounting column (5), the inner wall of the mounting column (5) is slidably connected to a first slide rod (24), the bottom end of the first slide rod (24) is fixedly connected to a third telescopic rod (21), the top inner wall of the mounting column (5) is fixedly connected to a fixing plate (42), the top outer wall of the fixing plate (42) is fixedly connected to a fourth telescopic rod (34), the top of the fourth telescopic rod (34) is fixedly connected to a second cleaning rod (33), and the side of the second cleaning rod (33) away from the fourth telescopic rod (34) is fixedly connected to a third brush group (31) and a third polishing sand (32); The inner wall of the mounting column (5) is slidably connected to a first slide bar (24), and the outer walls on both sides of the first slide bar (24) are fixedly connected to two polishing support devices, and the polishing support device includes a second tooth block group (41), and the outer wall of the second tooth block group (41) is meshed with a third gear (40), and the side of the third gear (40) away from the second tooth block group (41) is fixedly connected to a mounting seat (28), and the outer walls on both sides of the mounting seat (28) are fixedly connected to a first rotating shaft (29), and each of the first rotating shafts (29) is rotatably connected to the mounting column (5); Each of the mounting seats (28) is fixedly connected to a first support column (17) and a mounting block (43) on a side away from the first slide rod (24); the mounting block (43) is fixedly connected to a second telescopic rod (19) on a side away from the mounting seat (28); and the second telescopic rod (19) is fixedly connected to a second polishing sand (18) on a side away from the mounting block (43).

2. A quartz crucible high-pressure cleaning device according to claim 1, characterized in that: The outer wall cleaning device comprises a rack (11), an end of the rack (11) away from the first gear (14) is fixedly connected to a first connecting rod (3), an end of the first connecting rod (3) away from the rack (11) is fixedly connected to a first cleaning rod (4), an outer wall of the first cleaning rod (4) away from the shell (1) is fixedly connected to a first polishing sand (15) and a first brush group (16), the outer wall of the first slide (10) is fixedly connected to two evenly distributed second slide rails (9), and the outer wall of each second slide rail (9) is respectively slidably connected to the rack (11).

3. The quartz crucible high-pressure cleaning device according to claim 1, characterized in that: The inner wall of one end of each first support column (17) away from the mounting seat (28) is rotatably connected to a first rotating plate (30), the left and right outer walls of each first rotating plate (30) are fixedly connected to rubber support blocks (27), the upper and lower outer walls of each first rotating plate (30) are fixedly connected to a second brush group (26), and the inner wall of each first support column (17) is slidably connected to a fixing device.

4. The quartz crucible high-pressure cleaning device according to claim 3, characterized in that: The fixing device includes two evenly distributed support slides (25), the inner wall of each first support column (17) is provided with two evenly distributed first sliding grooves (45), a first connecting plate (44) is provided between each two support slides (25) and the mounting seat (28), each two support slides (25) are fixedly connected to the first connecting plate (44), the outer wall of each first connecting plate (44) close to the mounting seat (28) is rotatably connected to a threaded rod (47), the inner wall of each mounting seat (28) is provided with a thread, the end of each threaded rod (47) away from the first connecting plate (44) is threadedly connected to the mounting seat (28), the end of each threaded rod (47) close to the mounting seat (28) is fixedly connected to a rotating ring (48), and each The outer wall of each rotating ring (48) is slidably connected to a first sleeve (37), and the end of each first sleeve (37) close to the mounting seat (28) is rotatably connected to the mounting seat (28). The end of each first sleeve (37) away from the mounting seat (28) is fixedly connected to a second gear (36), and the outer wall of each second gear (36) is meshed with a first tooth block group (38). Each first tooth block group (38) is fixedly connected to the inner wall of the mounting column (5). Limit rods (46) are provided on both sides of each threaded rod (47), and the end of each limit rod (46) close to the supporting slide (25) is fixedly connected to the first connecting plate (44), and the end of each limit rod (46) away from the supporting slide (25) is slidably connected to the mounting seat (28).

5. The quartz crucible high-pressure cleaning device according to claim 3, characterized in that: The inner wall of each mounting seat (28) is fixedly connected to a second water inlet hose (39), and the end of each second water inlet hose (39) away from the mounting seat (28) is fixedly connected to a second high-pressure water spray head (49). The outer wall of each second high-pressure water spray head (49) is fixedly connected to a second connecting rod (50), and both ends of each second connecting rod (50) are fixedly connected to the inner wall of the first support column (17). The end of each second water inlet hose (39) away from the fourth telescopic rod (34) is connected to the first water inlet hose (35), and the end of the first water inlet hose (35) away from the mounting column (5) is fixedly connected to a water inlet (22), and the water inlet (22) is connected to the water tank (51).

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