Glass-based quantum dot panel and preparation method thereof, coating device

Abstract

The application relates to a glass-based quantum dot panel and a preparation method and a coating device thereof. The preparation method comprises the following steps: providing a glass substrate, setting a coating area on the surface of the glass substrate, the coating area comprising a protection area and a preset target coating area, the protection area being arranged on the outer side of the preset target coating area, and the width of the protection area being not less than 10 mm; adopting quantum dot glue liquid after vacuum defoaming treatment to perform slot coating treatment on the coating area of the glass substrate, and then performing solidification treatment to form a quantum dot film layer, so as to prepare the glass-based quantum dot panel. The surface thickness of the glass-based quantum dot panel prepared by the preparation method is more uniform.

Description

Technical Field

[0001] This invention relates to the field of functional device technology, and in particular to a glass-based quantum dot substrate, its preparation method, and coating apparatus. Background Technology

[0002] Quantum dots (QDs), often referred to as "artificial atoms" or "quantum dot atoms," are semiconductor nanostructures in which excitons are confined in three spatial directions. Quantum dots possess a discrete, quantized energy spectrum, and their unique properties are based on their own quantum effects. When particle sizes enter the nanoscale, size confinement will induce size effects, quantum confinement effects, macroscopic quantum tunneling effects, and surface effects, thereby deriving low-dimensional physical properties in nanoscale systems that differ from those in macroscopic systems. They exhibit many physicochemical properties that are different from those of macroscopic materials, and have promising applications in nonlinear optics, magnetic media, catalysis, medicine, and functional devices, especially in various optoelectronic devices.

[0003] Quantum dot materials are often deposited on glass substrates to prepare glass-based quantum dot panels with advantages such as high color gamut, rich colors in the displayed image, and high color saturation. However, when using traditional coating methods to prepare glass-based quantum dot panels, uneven film thickness, warping, or water and oxygen erosion are prone to occur, resulting in poor surface finish of the film on the glass substrate.

[0004] Therefore, traditional technologies still need further development. Summary of the Invention

[0005] Based on this, the present invention provides a glass-based quantum dot substrate, its preparation method, and coating device. The glass-based quantum dot substrate prepared by this method has a relatively uniform thickness and a good surface film formation effect.

[0006] This application provides a method for preparing a glass-based quantum dot substrate, comprising the following steps:

[0007] A glass substrate is provided, and a coating area is formed on the surface of the glass substrate. The coating area includes a protection zone and a preset target coating area. The protection zone is arranged around the outer side of the preset target coating area, and the width of the protection zone is not less than 10 mm.

[0008] The quantum dot adhesive, after vacuum degassing, is applied to the coating area of ​​the glass substrate via slot coating, followed by curing to form a quantum dot film, thus preparing a glass-based quantum dot substrate.

[0009] Research has found that while slit coating of quantum dot adhesive makes it easier to precisely control the film thickness, uneven thickness still exists. Further experiments revealed significant thickness unevenness at the cutting and retraction positions of the coating blade, particularly in the travel areas at both ends of the blade. Further experiments showed that this is mainly because when the quantum dot adhesive is released from the blade, it tends to overflow from both ends, resulting in a thicker coating at the edges. Consequently, the film is thicker at the edges than in the center, reducing the overall uniformity of the film thickness.

[0010] Based on this discovery, the applicant, after extensive experimental research, obtained the aforementioned method for preparing glass-based quantum dot substrates. When setting the coating area of ​​the glass substrate, a specific width is expanded around the desired target coating area to form a protection zone. As a result, during slit coating, the travel areas at both ends of the cutting head almost fall within the protection zone, while the coating thickness within the desired target coating area maintains good uniformity. Furthermore, before performing the slit coating step, the quantum dot adhesive is subjected to vacuum degassing treatment to reduce warping or uneven thickness caused by water or oxygen carried by the quantum dot adhesive itself eroding the film layer during coating. The synergistic effect of these factors improves the surface effect of the glass-based quantum dot substrates, and the method is simple to operate, making it more conducive to large-scale mass production.

[0011] In some embodiments, the width of the protected area is 10mm to 15mm.

[0012] In some embodiments, during the slot coating process, the tip of the coating blade is controlled to remain parallel to the surface of the coating area.

[0013] Control the blade tip of the coating blade to keep it parallel to the surface of the coating area to further improve the uniformity of coating throughout the coating area.

[0014] In some embodiments, the output of the quantum dot adhesive during the slot coating process is controlled by a metering pump.

[0015] Based on the target required thickness of the quantum dot film, the output amount during slot coating can be calculated. By controlling the output amount of quantum dot adhesive during slot coating with a metering pump, the uniformity of output during continuous cutting can be improved, thereby further enhancing the accuracy and uniformity of the quantum dot film thickness.

[0016] In some embodiments, during the slit coating process, the glass substrate is placed horizontally on a coating platform and bonded to the coating platform by vacuum adsorption.

[0017] The glass substrate is bonded to the coating platform by vacuum adsorption, which fixes the position of the glass substrate to prevent it from moving due to external forces during the coating process, thereby reducing the probability of uneven coating caused by the movement of the glass substrate.

[0018] In some embodiments, the curing process includes the following steps:

[0019] According to the desired quantum dot film pattern, the preset target coating area after the slit coating treatment is exposed to UV curing treatment.

[0020] In some embodiments, after the slot coating step and before the curing step, the following steps are further included:

[0021] After removing the glass substrate portion corresponding to the protected area following the slit coating treatment, the curing treatment is then applied to the preset target coating area.

[0022] By directly removing the glass substrate portion corresponding to the protected area, i.e., cutting off the portion with a large thickness difference, and then curing the preset target coating area, a target quantum dot film layer with good surface film formation effect can be obtained.

[0023] In some embodiments, the curing process includes the following steps:

[0024] According to the desired quantum dot film pattern, the preset target coating area after the slit coating treatment is exposed to UV curing treatment, and then the uncured quantum dot adhesive in the preset target coating area is removed.

[0025] Selectively expose the preset target coating area to UV curing treatment to obtain the desired target pattern film layer.

[0026] A second aspect of this application provides a coating apparatus, including a vacuum pressure tank and a slot coating head that are interconnected.

[0027] The vacuum pressure tank is equipped with a slurry bottle, which is used to hold quantum dot adhesive. The vacuum pressure tank is connected to the slurry bottle and is used to perform vacuum degassing treatment on the quantum dot adhesive in the slurry bottle before the slit coating process.

[0028] The slit coating head is used to perform slit coating on the coating area on the surface of the glass substrate to form a quantum dot film. The coating area includes a protection zone and a preset target coating area. The protection zone is set around the outside of the preset target coating area, and the width of the protection zone is not less than 10 mm.

[0029] In some embodiments, the coating apparatus further includes a metering pump, the inlet of which is connected to the outlet of the vacuum pressure tank, and the outlet of which is connected to the inlet of the slot coating head. The metering pump is used to control the output of the quantum dot adhesive during the slot coating process.

[0030] Based on the target required thickness of the quantum dot film, the output amount during slot coating can be calculated. By controlling the output amount of quantum dot adhesive from the slot coating head during slot coating with a metering pump, the uniformity of output during continuous cutting can be improved, thereby further enhancing the accuracy and uniformity of the quantum dot film thickness.

[0031] A third aspect of this application provides a glass-based quantum dot substrate, wherein the glass-based quantum dot substrate is prepared using the method for preparing glass-based quantum dot substrates of the first aspect. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the coating area in a glass substrate in some embodiments of this application;

[0033] Figure 2 This is a schematic diagram of a coating apparatus in some other embodiments of this application.

[0034] Reference numerals: S10, coating area; S11, preset target coating area; S12, protection zone; S100, coating device; S110, vacuum pressure tank; S120, slot coating head; S111, slurry bottle; S112, pressure gauge; S111a, stirring device ( Figure 2 (not shown in the image); S130, metering pump; S131, rotary valve; S132, pump core. Detailed Implementation

[0035] To facilitate understanding of this application, a more complete description is provided below, along with preferred embodiments. However, this application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of this application.

[0036] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0037] In the description of the embodiments of this application, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary and secondary relationship of the indicated technical features. In the description of the embodiments of this application, "multiple" means two or more, unless otherwise explicitly defined.

[0038] The "range" disclosed in this application can be defined in the form of a lower limit and an upper limit. A given range is defined by selecting a lower limit and an upper limit, which define the boundaries of a particular range. Ranges defined in this way can include or exclude endpoints. Any endpoint can be independently included or excluded, and they can be combined arbitrarily; that is, any lower limit can be combined with any upper limit to form a range. For example, if ranges of 60~120 and 80~110 are listed for a specific parameter, it is expected that ranges of 60~110 and 80~120 are also included. Furthermore, if minimum range values ​​of 1 and 2 are listed, and if maximum range values ​​of 3, 4, and 5 are also listed, then the following ranges are all expected: 1~3, 1~4, 1~5, 2~3, 2~4, and 2~5. In this application, unless otherwise stated, the numerical range "a~b" represents a shortened representation of any combination of real numbers between a and b, where a and b are real numbers. For example, the numerical range "0~5" indicates that all real numbers between "0" and "5" have been listed in this article; "0~5" is simply a shortened representation of these numerical combinations. Furthermore, when a parameter is described as an integer ≥2, it is equivalent to listing integers such as 2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, etc. For instance, when a parameter is described as an integer selected from "2~10", it is equivalent to listing the integers 2, 3, 4, 5, 6, 7, 8, 9, and 10.

[0039] In this application, "optionally," "optionally," and "optional" mean that something is optional, that is, it means that it is selected from either "with" or "without." If there are multiple "optional" entries in a technical solution, unless otherwise specified and there are no contradictions or mutual constraints, each "optional" entry shall be independent.

[0040] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this application. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0041] Unless otherwise specified, the steps in this application are performed at "room temperature" or "normal temperature". "Room temperature" or "normal temperature" generally refers to 4℃~30℃, and preferably 20±5℃.

[0042] According to one embodiment of this application, a method for preparing irregularly shaped seamless tubing is provided, comprising the following steps S10 to S20.

[0043] Step S10: Provide a glass substrate, and form a coating area on the surface of the glass substrate. The coating area includes a protection zone and a preset target coating area. The protection zone is set around the outer side of the preset target coating area, and the width of the protection zone is specified.

[0044] Understandably, the pre-defined target coating area is determined by dividing the shape and size of the quantum dot film layer of the glass-based quantum dot board according to the actual application requirements. Then, starting from the outer edge of the pre-defined target coating area, the area is expanded away from the pre-defined target coating area. The expanded area is the protected area, and the width of the expansion is the width of the protected area.

[0045] Step S20: The quantum dot adhesive solution after vacuum degassing is applied to the coating area of ​​the glass substrate in a slit coating process, and then cured to form a quantum dot film layer, thereby preparing a glass-based quantum dot substrate.

[0046] Research has found that while slit coating of quantum dot adhesive makes it easier to precisely control the film thickness, uneven thickness still exists. Further experiments revealed significant thickness unevenness at the cutting and retraction positions of the coating blade, particularly in the travel areas at both ends of the blade. Further experiments showed that this is mainly because when the quantum dot adhesive is released from the blade, it tends to overflow from both ends, resulting in a thicker coating at the edges. Consequently, the film is thicker at the edges than in the center, reducing the overall uniformity of the film thickness.

[0047] Based on this discovery, the applicant, after extensive experimental research, obtained the aforementioned method for preparing glass-based quantum dot substrates. When setting the coating area of ​​the glass substrate, a specific width is expanded around the desired target coating area to form a protection zone. As a result, during slit coating, the travel areas at both ends of the cutting head almost fall within the protection zone, while the coating thickness within the desired target coating area maintains good uniformity. Furthermore, before performing the slit coating step, the quantum dot adhesive is subjected to vacuum degassing treatment to reduce warping caused by water or oxygen carried by the quantum dot adhesive itself eroding the film layer during coating. The synergistic effect of these factors improves the surface effect of the glass-based quantum dot substrates, and the method is simple to operate, making it more conducive to large-scale mass production.

[0048] Please refer to the appendix. Figure 1 , Figure 1 This is a schematic diagram of a coating area S10 in a glass substrate in some embodiments of this application. The coating area S10 includes a preset target coating area S11 and an area that expands away from the preset target coating area from the outer edge of the preset target coating area. The expanded area is a protection area S12, that is, the protection area S12 is set around the outer side of the preset target coating area S11.

[0049] It can be understood that the width of the expansion is the vertical distance between the outer edge of the protected area and the outer edge of the preset target coating area. The shape of the coating area S10 can be various geometric shapes, which can be designed according to actual needs. Figure 1 The middle part is a rectangle.

[0050] In some embodiments, the width of the protected area is 10mm to 15mm.

[0051] The values ​​in “10mm~15mm” above include the minimum and maximum values ​​of the range, as well as every value between the minimum and maximum values. Specific examples include, but are not limited to, the point values ​​in the embodiments and the following point values: 10mm, 11mm, 12mm, 13mm, 14mm, 15mm; or any range of two values.

[0052] In some embodiments, during the slot coating process, the tip of the coating blade is controlled to remain parallel to the surface of the coating area.

[0053] Control the blade tip of the coating blade to keep it parallel to the surface of the coating area to further improve the uniformity of coating throughout the coating area.

[0054] In some embodiments, the output of the quantum dot adhesive during slot coating is controlled by a metering pump.

[0055] Based on the target required thickness of the quantum dot film, the output amount during slot coating can be calculated. By controlling the output amount of quantum dot adhesive during slot coating with a metering pump, the uniformity of output during continuous cutting can be improved, thereby further enhancing the accuracy and uniformity of the quantum dot film thickness.

[0056] In some embodiments, during the slot coating process, the glass substrate is placed horizontally on the coating platform and bonded to the coating platform by vacuum adsorption.

[0057] The glass substrate is bonded to the coating platform by vacuum adsorption, which fixes the position of the glass substrate to prevent it from moving due to external forces during the coating process, thereby reducing the probability of uneven coating caused by the movement of the glass substrate.

[0058] It can be understood that vacuum adsorption technology uses atmospheric pressure as the force to form a sealed volume between the horizontal surfaces of the glass substrate and the coating platform. Then, a certain amount of gas molecules are extracted by a vacuum source to reduce the pressure between the two contact interfaces. Under the action of the pressure difference, the two contact interfaces are tightly bonded together.

[0059] It should be noted that when the glass substrate is placed horizontally on the coating platform, the blade of the coating blade is parallel to the surface of the coating area, that is, the blade of the coating blade is also parallel to the surface of the coating platform.

[0060] In some embodiments, the curing process following the slot coating step includes the following steps:

[0061] According to the desired quantum dot film pattern, the pre-defined target coating area after slit coating is exposed to UV curing treatment.

[0062] In some embodiments, after the curing step, the following steps are further included:

[0063] Remove uncured quantum dot adhesive from the preset target coating area.

[0064] Selectively expose the preset target coating area to UV curing treatment to obtain the desired target pattern film layer.

[0065] In some embodiments, the uncured quantum dot adhesive in the target coating area can be removed by solvent cleaning. Specifically, a good solvent for the quantum dot adhesive can be used to dissolve the uncured quantum dot adhesive.

[0066] In some embodiments, prior to the curing step, the process further includes removing a portion of the corresponding protected area in the glass substrate after the slit coating process.

[0067] In this way, areas with uneven thickness can be directly removed, leaving a glass substrate with a more uniform film thickness in the predetermined target coating area.

[0068] Specifically, a diamond cutting wheel can be used to cut and remove the portion of the glass substrate corresponding to the protected area.

[0069] In some embodiments, the components of the quantum dot adhesive include quantum dots and an adhesive.

[0070] Quantum dots can be any type of quantum dot material commonly used in this field; however, the term quantum dot is not limited to this description.

[0071] Quantum dots include at least one of single-structure quantum dots and core-shell structure quantum dots.

[0072] In some embodiments, the material of the single-structure quantum dot is selected from at least one of group II-VI, IV-VI, III-V and I-III-VI compounds; the shell of the core-shell quantum dot is one or more layers.

[0073] In some embodiments, the II-VI compound is selected from at least one of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, ZnO, HgS, HgSe, HgTe, CdSeS, CdSeTe, CdSTe, ZnSeS, ZnSeTe, ZnSTe, HgSeS, HgSeTe, HgSTe, CdZnS, CdZnSe, CdZnTe, CdHgS, CdHgSe, CdHgTe, HgZnS, HgZnSe, HgZnTe, CdZnSeS, CdZnSeTe, CdZnSTe, CdHgSeS, CdHgSeTe, CdHgSTe, HgZnSeS, HgZnSeTe, and HgZnSTe.

[0074] In some embodiments, the IV-VI compound includes at least one of SnS, SnSe, SnTe, PbS, PbSe, PbTe, SnSeS, SnSeTe, SnSTe, PbSeS, PbSeTe, PbSTe, SnPbS, SnPbSe, SnPbTe, SnPbSSe, SnPbSeTe, and SnPbSTe.

[0075] In some embodiments, the III-V compound includes at least one of GaN, GaP, GaAs, GaSb, AlN, AlP, AlAs, AlSb, InN, InP, InAs, InSb, GaNP, GaNAs, GaNSb, GaPAs, GaPSb, AlNP, AlNAs, AlNSb, AlPAs, AlPSb, InNP, InNAs, InNSb, InPAs, InPSb, GaAlNP, GaAlNAs, GaAlNSb, GaAlPAs, GaAlPSb, GaInNP, GaInNAs, GaInNSb, GaInPAs, GaInPSb, InAlNP, InAlNAs, InAlNSb, InAlPAs, and InAlPSb.

[0076] In some embodiments, the group I−III−VI compounds include at least one of CuInS2, CuInSe2, and AgInS2.

[0077] In some embodiments, the core of the core-shell quantum dot includes any of the single-structure quantum dots.

[0078] In some embodiments, the shell material of the core-shell structured quantum dots includes at least one of CdS, CdTe, CdSeTe, CdZnSe, CdZnS, CdSeS, ZnSe, ZnSeS, ZnS, and single-structure quantum dots.

[0079] The adhesive may be any type of adhesive commonly used in the art, including but not limited to at least one of epoxy adhesives, acrylic adhesives, and polyurethane adhesives.

[0080] Some embodiments of this application also provide a coating apparatus, including a vacuum pressure tank and a slot coating head that are interconnected.

[0081] Please continue to refer to Figure 2 , Figure 2 This is a schematic diagram of a coating apparatus S100 in some other embodiments of this application, including a vacuum pressure tank S110 and a slit coating head S120 that are interconnected.

[0082] The vacuum pressure tank S110 contains a slurry bottle S111, which is used to hold quantum dot adhesive. The vacuum pressure tank S110 is connected to the slurry bottle S111 and is used to perform vacuum degassing treatment on the quantum dot adhesive in the slurry bottle S111 before the slit coating process.

[0083] The slit coating head S120 is used to perform slit coating on the coating area of ​​the glass substrate to form a quantum dot film. The coating area includes a protection zone and a preset target coating area. The protection zone is set around the outside of the preset target coating area, and the width of the protection zone is not less than 10 mm.

[0084] In some embodiments, the surface of the vacuum pressure tank S110 is also provided with a pressure gauge S112 to monitor the pressure inside the vacuum pressure tank S110.

[0085] In some embodiments, the slurry bottle S111 is also provided with a stirring device S111a. Figure 2 (Not shown in the image) is used to stir the quantum dot adhesive to make it mix evenly.

[0086] Please continue to refer to Figure 2 In some embodiments, the coating apparatus further includes a metering pump S130, the inlet of which is connected to the outlet of the vacuum pressure tank S110, and the outlet of which is connected to the inlet of the slit coating head S120. The metering pump S130 is used to control the amount of quantum dot adhesive discharged during slit coating.

[0087] Based on the target required thickness of the quantum dot film, the output amount during slot coating can be calculated. By controlling the output amount of quantum dot adhesive from the slot coating head during slot coating with a metering pump, the uniformity of output during continuous cutting can be improved, thereby further enhancing the accuracy and uniformity of the quantum dot film thickness.

[0088] Please continue to refer to Figure 2 The metering pump S130 includes a rotary valve S131 and a pump core S132. The rotary valve S131 is located in the middle of the connection line between the inlet and outlet of the metering pump S130, and controls the inlet and outlet of the quantum dot adhesive, which is equivalent to a switch control. The pump core S132 provides the power for the quantum dot adhesive to be transported in the metering pump S130.

[0089] It is understandable that the various components are connected through transmission channels.

[0090] The main process steps for preparing glass-based quantum dot substrates using the above-mentioned coating apparatus are as follows:

[0091] Before the slot coating process, the quantum dot adhesive is placed in a slurry bottle S111 to isolate it from external water and oxygen. It is then subjected to vacuum degassing treatment in a vacuum pressure tank S110 to remove the water and oxygen carried by the quantum dot adhesive itself. This vacuum degassing treatment is used to remove the quantum dot adhesive before the slot coating process. The quantum dot adhesive is then delivered to a metering pump S130. Based on the target thickness of the quantum dot film, the output amount during the slot coating process can be calculated. The metering pump controls the output amount of the quantum dot adhesive from the slot coating head during the slot coating process. The adhesive is then delivered to the slot coating head S120. The quantum dot adhesive then flows from the slot at the cutter head of the slot coating head S120 to the coating area on the glass substrate surface for coating, forming a coating film.

[0092] Another aspect of this application provides a glass-based quantum dot substrate, which is prepared by the above-described method for preparing glass-based quantum dot substrates.

[0093] The glass-based quantum dot substrate has a relatively uniform film thickness and a good surface finish.

[0094] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the description of the invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items. Specific Implementation

[0095] The following are specific examples.

[0096] Example 1

[0097] (1) Provide glass substrate: Place 730mm×920mm white glass on the laser marking machine table, use the laser marking machine table to make the cutting mark target required for subsequent processing at the diagonal position of the glass, and cut to form glass substrate.

[0098] like Figure 1 As shown, a coating area S10 is provided on the surface of a glass substrate. The coating area S10 includes a preset target coating area S11 and a protection zone S12 that extends away from the preset target coating area from the outer edge of the preset target coating area to form a protection zone S12 surrounding the outer side of the preset target coating area. The width of the expansion, i.e. the width of the protection zone S12, is 10 mm.

[0099] (2) Place the glass substrate horizontally on the coating platform and adhere the glass substrate to the coating platform by vacuum adsorption, and then proceed with the coating process. Figure 2 The coating apparatus shown performs slot coating treatment, as detailed below:

[0100] Please refer to Figure 2 Before performing slit coating, the quantum dot adhesive is placed in slurry bottle S111, and the stirring device S111a in slurry bottle S111 is turned on. Figure 2 (Not shown) The quantum dot adhesive solution is stirred to make it uniform, and then vacuum degassing is performed through vacuum pressure tank S110 to remove the water and oxygen carried by the quantum dot adhesive solution itself. Then the quantum dot adhesive solution is delivered to metering pump S130. Based on the target required thickness of the quantum dot film layer, the output amount during the slot coating process can be calculated. The output amount of quantum dot adhesive solution from the slot coating head during the slot coating process is controlled by the rotary valve S131 of metering pump S130. It continues to be transmitted to slot coating head S120. Then the quantum dot adhesive solution flows from the slot position at the cutter head of slot coating head S120 to the coating area on the surface of the glass substrate for coating.

[0101] After coating, the coated glass is transferred to the exposure platform. First, the glass part corresponding to the protected area S12 is removed by cutting with a diamond cutting wheel. Then, the required exposure mask is made according to the shape and size of the quantum dot film pattern. The quantum dot adhesive in the preset target coating area is selectively exposed to UV curing treatment through the mask. Then, the uncured quantum dot adhesive is cleaned with a good solvent of quantum dot adhesive. After drying, the glass-based quantum dot board is obtained.

[0102] The quantum dots in the quantum dot adhesive are low-cadmium quantum dots, the adhesive is acrylic resin, the target design thickness of the quantum dot film is 40 micrometers, and the good solvent for the quantum dot adhesive is ethyl acetate.

[0103] (3) Test

[0104] 1. Observe whether the film layer of the glass-based quantum dot board is warped or peeled off. If not, it is qualified.

[0105] 2. Test the uniformity of the glass-based quantum dot substrate. It is qualified when the following conditions are met: the difference between the thickness at each point and the preset target thickness does not exceed ±3 micrometers, and there are no foreign objects / discoloration on the surface of the glass-based quantum dot substrate when visually inspected from a vertical distance of 35cm.

[0106] If both of the above are qualified, the glass-based quantum dot substrate is determined to be a qualified product. Prepare 100 batches of glass-based quantum dot substrates according to the above steps (1) to (3), and calculate the yield rate according to the following formula:

[0107] Yield rate = (Number of qualified products / Total number of products) × 100%

[0108] Please see Table 1 for the specific results.

[0109] Examples 2-3

[0110] Examples 2 and 3 are basically the same as Example 1, except that the width of the protected area S12 in step (1) is different. In Example 2, the width of the protected area S12 is 12mm and in Example 3, the width of the protected area S12 is 15mm.

[0111] The other steps and process conditions are the same as in Example 1. For specific results, please see Table 1.

[0112] Comparative Example 1

[0113] Comparative Example 1 is basically the same as Example 1, except that the width of the protected area S12 in step (1) is different. The width of the protected area S12 in Comparative Example 1 is 7 mm.

[0114] The other steps and process conditions are the same as in Example 1. For specific results, please see Table 1.

[0115] Table 1

[0116]

[0117] Analysis of the data in Table 1 and comparison of the test results of Examples 1-3 and Comparative Example 1 show that the glass-based quantum dot substrate prepared by the method of this application has a more uniform surface thickness.

[0118] Furthermore, the preparation method of the glass-based quantum dot substrate of this application is simple to operate, which is more conducive to large-scale mass production and can maintain a high yield rate during large-scale production.

[0119] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0120] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A method for preparing a glass-based quantum dot substrate, characterized in that, The method comprises the following steps: providing a glass substrate, setting a coating area on the surface of the glass substrate, the coating area comprising a protection area and a preset target coating area, the protection area being set outside the preset target coating area, and the width of the protection area being not less than 10 mm; performing slot coating treatment on the coating area of the glass substrate using quantum dot glue liquid after vacuum defoaming treatment, cutting off the part of the glass substrate corresponding to the protection area, and then performing exposure UV curing treatment on the preset target coating area to form a quantum dot film layer, thereby preparing a glass quantum dot panel.

2. The method of making a glass-based quantum dot panel of claim 1, wherein, The width of the protection area is 10-15 mm.

3. The method of making a glass-based quantum dot panel of claim 1, wherein, During the slot coating treatment, the head of the coating doctor blade is kept parallel to the surface of the coating area.

4. The method of any one of claims 1 to 3, wherein the glass-based quantum dot panel is prepared by a method comprising: The discharge amount of the quantum dot glue liquid during the slot coating treatment is controlled by a quantitative pump. ​ 5. The method for preparing glass-based quantum dot substrates according to any one of claims 1 to 3, characterized in that, During the slot coating treatment, the glass substrate is placed horizontally on a coating platform, and the glass substrate is attached to the coating platform by vacuum adsorption.

6. The method of any one of claims 1 to 3, wherein the glass-based quantum dot panel is prepared by a method comprising: After the exposure UV curing treatment, the following steps are included: removing the uncured quantum dot glue liquid in the preset target coating area, thereby preparing the glass quantum dot panel. ​ 7. The method of making a glass-based quantum dot panel according to claim 6, wherein The uncured quantum dot glue liquid in the preset target coating area is removed by a solvent cleaning method.

8. A glass-based quantum dot panel, characterized by, The glass quantum dot panel is prepared by the method for preparing a glass quantum dot panel according to any one of claims 1-7.

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