Preparation method of high-purity nano-α-alumina with monodisperse sharp particle size distribution

CN117756152BActive Publication Date: 2026-05-26SHANGHAI UNIV
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Patent Information

Application Number
CN202311786877.3
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-12-22
Publication Date
2026-05-26
Estimated Expiration
2043-12-22

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Abstract

This invention relates to a method for preparing monodisperse, high-purity nano-α-alumina with a sharp particle size distribution, belonging to the field of integrated circuit polishing. The invention uses high-purity micron-sized α-alumina as raw material, and through steps such as preparing high-purity micron-sized α-alumina slurry, wet grinding, centrifugation to remove large particles, hydrochloric acid acidification, and centrifugation separation, prepares monodisperse, sharp-sized, high-purity α-alumina powder with a particle size of 75–85 nm. The method provided by this invention is simple, efficient, and environmentally friendly. The resulting nano-α-alumina exhibits excellent purity and dispersibility, making it particularly suitable for applications in integrated circuit polishing and other fields. This monodisperse, sharp-sized, high-purity nano-α-alumina powder with a particle size of approximately 80 nm has broad application prospects and provides strong support for domestic industrial needs.
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Citation Information

Patent Citations

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