Optical component, method for preparing optical component and electronic device

Abstract

The embodiment of the present application provides an optical component, a method for preparing the optical component, and an electronic device. The optical component includes an optical device and an optical cover plate. The optical cover plate includes an optical body layer, which blocks the light incident surface of the optical device and has a light-transmitting area arranged opposite to the optical device; the optical cover plate also includes a hydrophobic film layer, which is light-transmitting and is located on the side of the optical body layer facing the optical device and covers the light-transmitting area; the side of the hydrophobic film layer facing the optical device is a hydrophobic rough surface having a first micro-nano structure. The optical component of the present application can effectively reduce the proportion of haze-like dirt on the optical cover plate.

Description

Technical Field

[0001] The present application relates to the technical field of electronic equipment, and in particular to an optical component, a method for preparing the optical component, and an electronic device. Background Art

[0002] Camera modules have become an indispensable functional module in electronic devices such as mobile phones, tablets, laptops, and wearable devices. With the continuous development of electronic devices, people's demand for the shooting effect of camera modules has gradually improved.

[0003] The camera module usually includes a module body and an optical cover plate. The module body is arranged in the housing of the electronic device. The optical cover plate can be arranged on the housing and covers the lens of the module body. The peripheral edge of the module body can be bonded to the optical cover plate by foam glue or the like, and there is a distance between the optical cover plate and the module body, so as to achieve the zoom function of the camera module while realizing the fixation of the module body in the housing. Among them, the optical cover plate is provided with a light-transmitting area at a relative position to the lens, so that the light outside the electronic device can pass through the light-transmitting area into the module body. After the entire electronic device is coated, the original molecules, water vapor and some small molecules of the foam glue in the film layer will condense in the light-transmitting area, producing mist-like dirt.

[0004] Therefore, how to solve the haze-like dirt on the optical cover has become a technical problem to be solved. Summary of the invention

[0005] The present application provides an optical component, a method for preparing an optical component, and an electronic device, which can effectively reduce the proportion of haze-like dirt on an optical cover of the optical component.

[0006] A first aspect of an embodiment of the present application provides an optical component, the optical component comprising:

[0007] Optics;

[0008] An optical cover plate, wherein the optical cover plate comprises an optical body layer, the optical body layer shields the light incident surface of the optical device, and has a light-transmitting area arranged opposite to the optical device;

[0009] The optical cover plate further includes a hydrophobic film layer, which is light-transmissive and is located on the side of the optical body layer facing the optical device and covers the light-transmissive area; wherein,

[0010] The side of the hydrophobic film layer facing the optical device is a hydrophobic rough surface having a first micro-nano structure.

[0011] The present application provides a hydrophobic film layer in the optical cover plate. Since the hydrophobic film layer is light-transmissive and is located on the side of the optical body layer facing the optical device and covers the light-transmissive area, the optical cover plate not only has hydrophobic properties in the light-transmissive area to reduce the adhesion of liquids (such as water droplets) on the hydrophobic rough surface, but also, due to the presence of the first micro-nano structure, the hydrophobic rough surface presents a rough morphology with a surface structure of micrometer and / or nanometer size, and forms an undulating micro-nano structure on the hydrophobic rough surface. Since the hydrophobic rough surface has a lower surface energy and there is a larger surface tension between air and liquid, the droplets condensed on the first micro-nano structure will have a larger water drop angle and a very small rolling angle on the hydrophobic rough surface, thereby reducing the proportion of haze-like dirt appearing in the light-transmissive area of ​​the optical cover plate facing the optical device (the inner surface of the optical cover plate).

[0012] In an optional embodiment, the optical device is a camera module, which includes a lens, wherein the optical body layer blocks the light incident surface of the lens; and the position of the light-transmitting area in the optical body layer is opposite to the position of the lens, so as to reduce the proportion of haze-like dirt on the inner surface of the optical cover in the light-transmitting area.

[0013] In an optional embodiment, the camera module also includes a module body, and the lens is located on the side of the module body facing the optical cover, wherein the non-light-transmitting area in the optical body layer is surrounded by the peripheral edge of the light-transmitting area, and the non-light-transmitting area is blocked on the module body, so as to realize the combination of the camera module and the optical cover, ensure the amount of light entering the light-transmitting area, and also facilitate the blocking of more camera modules by the optical cover.

[0014] In an optional embodiment, the hydrophobic film layer of the optical cover includes a hydrophobic layer, which is located on the side of the optical body layer facing the optical device and covers the light-transmitting area. The side of the hydrophobic layer facing the optical device is a hydrophobic rough surface, so that a hydrophobic rough surface is formed by the setting of the hydrophobic layer, thereby increasing the water drop angle of the inner surface of the optical cover in the light-transmitting area.

[0015] In an optional embodiment, the optical body layer of the optical cover includes a substrate and a first anti-reflection layer, the first anti-reflection layer covers the side of the substrate facing the hydrophobic film layer, and the side of the first anti-reflection layer facing the hydrophobic film layer is a rough surface having a second micro-nano structure, wherein the first micro-nano structure is attached to and covers the second micro-nano structure.

[0016] In this way, by setting the first anti-reflection layer, not only can the reflectivity of the inner surface of the optical cover be reduced, and the intensity of ghost images in photos taken in general scenes and high-contrast environments can be weakened, but also due to the existence of the second micro-nano structure, it can also contribute to the formation of the first micro-nano structure.

[0017] In an optional embodiment, the shape of the first micro-nano structure matches the shape of the second micro-nano structure, so that the surface of the hydrophobic layer can form a first micro-nano structure that is compatible with the second micro-nano structure, while not affecting the anti-reflection effect of the first anti-reflection layer, and the inner surface of the optical cover plate can also have the anti-reflection effect of the first anti-reflection layer in the light-transmitting area.

[0018] In an optional embodiment, the refractive index of the first anti-reflection layer is configured to gradually change from the refractive index corresponding to the first anti-reflection layer to the refractive index corresponding to the air along the direction from the substrate to the hydrophobic film layer, so that the first anti-reflection layer forms a gradient film layer with a gradually changing refractive index along the direction from the substrate to the hydrophobic film layer, which reduces the reflectivity of the inner surface of the optical cover plate while absorbing the light reflected by the lens to the first anti-reflection layer, thereby weakening the intensity of ghost images in the captured photos.

[0019] In an optional embodiment, the second micro-nano structure includes a plurality of protrusions, wherein the bottom end of the protrusion is connected to the substrate, the top end of the protrusion is arranged toward the hydrophobic film layer, and the protrusion gradually tapers from the bottom end to the top end, so as to form the above-mentioned first anti-reflection layer to reduce the multi-level reflection of light in the optical cover and the lens, and weaken the intensity of ghost images in photos taken in a strong contrast environment. At the same time, it can also form a light trap effect on the surface of the first anti-reflection layer, absorb the light reflected by the lens to the first anti-reflection layer, thereby further weakening the intensity of ghost images in photos taken in a strong contrast environment.

[0020] In an optional embodiment, the bottom ends of the plurality of protrusions are connected to each other so as to increase the density of the protrusions on the surface of the first anti-reflection layer and enhance the light trapping effect.

[0021] In an optional embodiment, the protrusions are micrometer-scale and / or nanometer-scale protrusions, wherein the height of the protrusions is greater than or 50 nm and less than or equal to 200 nm, and the size of the bottom end is greater than or 150 nm and less than or equal to 500 nm, so that it can cooperate with the first micro-nano structure to increase the water drop angle and oil drop angle of the inner surface of the optical cover plate without affecting the transmittance of light on the optical cover plate and reducing the reflectivity of the inner surface of the optical cover plate.

[0022] In an optional embodiment, the thickness of the hydrophobic layer is greater than or equal to 5 nm and less than or equal to 30 nm, so as to reduce the influence of the thickness of the hydrophobic layer on the height of the first micro-nano structure without affecting the formation of the hydrophobic layer and the hydrophobic properties of the hydrophobic layer.

[0023] In an optional embodiment, the plurality of protrusions are arranged in an array, so that the arrangement of the plurality of protrusions on the inner surface of the optical body layer has a certain regularity, which is beneficial to the release of the stress of the film layer and the reduction of the stress deformation of the optical body layer.

[0024] In an optional embodiment, the second micro-nano structure includes a plurality of depressions, wherein the depressions are micrometer-scale and / or nanometer-scale depressions, and the plurality of depressions are evenly arranged on the optical body layer, so as to change the microscopic morphology of the surface of the first anti-reflection layer through the plurality of depressions, reduce the reflectivity of the inner surface of the optical cover plate, and weaken the intensity of ghost images taken in a strong contrast environment. At the same time, it can increase the water drop angle of the inner surface of the optical cover plate and reduce the rolling angle of the inner surface of the large optical cover plate in the light-transmitting area.

[0025] In an optional embodiment, the first anti-reflection layer is a light trap layer or a porous coating, so as to reduce the reflectivity of the inner surface of the optical cover plate, weaken the intensity of ghost images in photos taken in a high-contrast environment, and make the structure of the first anti-reflection layer more diversified.

[0026] In an optional embodiment, the hydrophobic film layer also includes a coating layer, which is attached to the light-transmitting area of ​​the optical body layer on the side facing the optical device, and the hydrophobic layer covers the coating layer, so as to increase the adhesion strength of the hydrophobic layer on the surface of the first anti-reflection layer through the coating layer, thereby enhancing the stability of the performance of the inner surface of the optical cover.

[0027] In an optional embodiment, one side of the hydrophobic layer of the base layer facing the hydrophobic film layer has a third micro-nano structure, wherein the third micro-nano structure covers the second micro-nano structure in the optical body layer and is adhered between the second micro-nano structure and the first micro-nano structure; and the shape of the third micro-nano structure matches the shape of the second micro-nano structure.

[0028] In this way, while the adhesion of the hydrophobic layer on the first anti-reflection layer is enhanced by the primer layer, the provision of the third micro-nano structure can help ensure the consistency of the first micro-nano structure and the second micro-nano structure.

[0029] In an optional embodiment, the thickness of the primer layer is smaller than the thickness of the hydrophobic layer in the hydrophobic film layer.

[0030] In this way, while ensuring that the hydrophobic layer is stably adsorbed on the first reflective layer, the influence of the thickness of the base layer on the height of the first micro-nano structure can be reduced.

[0031] In an optional embodiment, the primer layer is an active primer layer that is the same as the substrate of the first anti-reflection layer in the optical body layer, so that the primer layer and the first anti-reflection layer can achieve better bonding strength.

[0032] In an optional embodiment, the substrate of the first anti-reflection layer is silicon dioxide, and the active primer layer is a silicon dioxide layer. In this way, while ensuring that the primer layer has a good bonding strength on the first anti-reflection layer, the primer layer can have a high surface activity, so as to absorb the hydrophobic layer onto the first anti-reflection layer and increase the adhesion of the hydrophobic layer on the first anti-reflection layer.

[0033] In an optional embodiment, the hydrophobic layer in the hydrophobic film layer is a perfluoropolyether coating, so that the hydrophobic rough surface of the hydrophobic layer has good hydrophobic and oleophobic properties while not affecting the light transmission efficiency in the light transmission area.

[0034] In an optional embodiment, the water drop angle of the optical cover plate at the hydrophobic film layer is greater than 150°, and / or the rolling angle of the optical cover plate at the hydrophobic film layer is less than 40°, so that the optical cover plate has better hydrophobic properties at the hydrophobic film layer (i.e., the light-transmitting area).

[0035] In an optional embodiment, the optical body layer further includes a second anti-reflection layer, wherein the second anti-reflection layer is light-transmissive and is located on a side of the substrate of the optical body layer away from the hydrophobic film layer to reduce reflection of light on the outer surface of the optical cover plate and protect the outer surface of the optical cover plate from being scratched.

[0036] A second aspect of the embodiment of the present application further provides a method for preparing an optical component, the method for preparing the optical component of any one of the above items, the method comprising:

[0037] Prepare an optical stack, wherein the optical cover plate comprises an optical body layer and a hydrophobic film layer, and the optical body layer comprises an optical stack;

[0038] Forming a hydrophobic film layer on one side of the optical stack, wherein the hydrophobic film layer covers the light-transmitting area of ​​the optical stack corresponding to the optical body layer, and a side of the hydrophobic film layer away from the optical stack is a hydrophobic rough surface having a first micro-nano structure;

[0039] The optical cover plate including the optical stack is combined with an optical device to form an optical assembly, with the hydrophobic rough surface being arranged toward the optical device.

[0040] In this way, by setting the hydrophobic film layer, the side of the optical stack provided with the hydrophobic rough surface can have hydrophobic properties in the light-transmitting area. Since the hydrophobic rough surface is arranged toward the optical device, the side of the optical stack provided with the hydrophobic rough surface can be used as the inner surface of the optical cover plate, and the light-transmitting area of ​​the optical stack can be used as the light-transmitting area of ​​the optical cover plate, so that when the optical cover plate and the optical device are combined to form an optical component, the water drop angle of the inner surface of the optical cover plate in the light-transmitting area can be increased, thereby effectively avoiding the proportion of haze-like dirt on the optical cover plate after the entire electronic device is coated.

[0041] In an optional embodiment, preparing an optical stack specifically includes:

[0042] Treating one side of a plate to be treated to form an optical stack, wherein the plate to be treated is an untreated glass plate;

[0043] The optical stack includes a substrate and a first anti-reflection layer, wherein the first anti-reflection layer covers the side of the substrate facing the hydrophobic film layer, and the side of the first anti-reflection layer facing the hydrophobic film layer is a rough surface with a second micro-nano structure; the hydrophobic film layer is located on the first anti-reflection layer and covers the light-transmitting area of ​​the first anti-reflection layer corresponding to the optical body layer.

[0044] By setting the first anti-reflection layer, due to the existence of the second micro-nano structure on the first anti-reflection layer, not only can the first micro-nano structure on the hydrophobic film layer be easily formed, reducing the proportion of haze-like dirt in the light-transmitting area of ​​the optical cover, but also the reflectivity of the surface of the hydrophobic film layer can be reduced, weakening the intensity of ghost images in photos taken in general scenes and strong contrast environments.

[0045] In an optional embodiment, a hydrophobic film layer is formed on one side of the optical stack, specifically comprising:

[0046] forming a hydrophobic layer having a first micro-nano structure on a side of the substrate having a second micro-nano structure;

[0047] The first micro-nano structure is located on the second micro-nano structure and covers the light-transmitting area of ​​the first anti-reflection layer corresponding to the optical body layer. The side of the hydrophobic layer facing the optical device is a hydrophobic rough surface, and the hydrophobic film layer includes a hydrophobic layer.

[0048] In this way, by setting the hydrophobic layer, the side of the hydrophobic layer facing the optical device can form a hydrophobic rough surface so as to combine with the first micro-nano structure, increase the water drop angle of the substrate in the light-transmitting area, and reduce the proportion of haze-like dirt formed in the light-transmitting area.

[0049] In an optional embodiment, before forming the hydrophobic layer having the first micro-nano structure on the side of the substrate having the second micro-nano structure, the preparation method further comprises:

[0050] forming a base layer having a third micro-nano structure on a side of the substrate having the second micro-nano structure;

[0051] The third micro-nano structure covers the second micro-nano structure and is attached between the second micro-nano structure and the first micro-nano structure, and the hydrophobic film layer also includes a base layer.

[0052] In this way, by providing the bottom layer, the adhesion of the hydrophobic layer on the first anti-reflection layer is increased.

[0053] In an optional embodiment, one side of the plate to be processed is processed to form an optical stack, specifically comprising:

[0054] Under vacuum conditions, a metal film is formed on a plate to be processed, and the metal film is heat-treated to shrink the metal film and obtain a particle template having a plurality of particles;

[0055] Plasma etching the particle template to form a second micro-nano structure on the particle surface of the particle template;

[0056] The particle template is cleaned to obtain an optical stack, wherein the second micro-nano structure portion is the first anti-reflection layer, and the portion of the optical stack except the first anti-reflection layer is the substrate.

[0057] The arrangement of the metal film can selectively etch the surface of the plate to be processed to form a second micro-nano structure.

[0058] In an optional embodiment, one side of the plate to be processed is processed to form an optical stack, specifically comprising:

[0059] Chemically etching the plate to be processed to form a second micro-nano structure on one side of the plate to be processed to obtain an optical stack;

[0060] The second micro-nano structure is a first anti-reflection layer, and the portion of the optical stack except the first anti-reflection layer is a substrate.

[0061] In this way, while forming the first anti-reflection layer, the processing technology and structure of the first anti-reflection layer can be made more diversified.

[0062] In an optional embodiment, after forming a hydrophobic film layer on one side of the optical stack and before combining the optical cover plate containing the optical stack with an optical device to form the optical component, the preparation method further includes:

[0063] A second anti-reflection layer is formed on a side of the optical stack away from the hydrophobic film layer, and the optical body layer also includes the second anti-reflection layer.

[0064] In this way, by setting the second anti-reflection layer, the reflectivity of the optical body layer facing away from the hydrophobic film layer (the outer surface of the optical cover) can be reduced to below 0.3%, effectively preventing the generation of ghost images when electronic devices take pictures in general scenes and strong contrast scenes.

[0065] A third aspect of an embodiment of the present application further provides an electronic device, comprising a housing and any one of the optical components described above, wherein the optical device in the optical component is located in a receiving space of the housing, and the optical cover is located on the housing and covers the light incident surface of the optical device.

[0066] In this way, by protecting the optical device through the optical cover, the water drop angle in the light transmission area of ​​the side of the optical cover facing the optical device can be increased, and the proportion of haze-like dirt generated on the optical cover can be effectively reduced. BRIEF DESCRIPTION OF THE DRAWINGS

[0067] Figure 1 is a schematic diagram of a water drop angle of a water drop;

[0068] Figure 2 Schematic diagram of the rolling angle of a water drop on a solid surface;

[0069] Figure 3 A schematic diagram of the structure of the front side of an electronic device provided in an embodiment of the present application;

[0070] Figure 4 A schematic diagram of the disassembly of an electronic device according to an embodiment of the present application;

[0071] Figure 5 A schematic diagram of the structure of the back of an electronic device provided in an embodiment of the present application;

[0072] Figure 6 A schematic diagram of the structure of an optical cover plate on the back of an electronic device provided in an embodiment of the present application;

[0073] Figure 7 for Figure 6 A cross-sectional view of the electronic device in the AA direction;

[0074] Figure 8 It is a partial schematic diagram of an optical cover after coating of an electronic device in the related art;

[0075] Fig. 9 A schematic diagram of the structure of an optical component provided in an embodiment of the present application;

[0076] Fig.10 For the camera module Fig. 9 Schematic diagram of partial splitting of the optical cover in the light-transmitting area;

[0077] Fig.11 A partial schematic diagram of the optical cover provided in an embodiment of the present application after the entire electronic device is coated;

[0078] Fig.12 A schematic diagram of light transmission of an optical cover in the related art;

[0079] Fig.13 is another structural schematic diagram of an optical cover in the related art;

[0080] Fig.14 It is another structural schematic diagram of an optical cover plate in the related art;

[0081] Fig.15 for Fig.10 Schematic diagram of the structure of the optical bulk layer;

[0082] Fig.16 A schematic diagram of a partial disassembly of an optical cover plate provided in an embodiment of the present application;

[0083] Fig.17A schematic diagram of the layer structure of the second anti-reflection layer provided in an embodiment of the present application;

[0084] Fig.18 A schematic diagram of the structural changes of the optical cover plate provided in an embodiment of the present application during the preparation process;

[0085] Fig.19 A flow chart of a method for preparing an optical cover plate provided in an embodiment of the present application;

[0086] Fig. 20 A flow chart of a method for preparing a hydrophobic film layer in an optical cover plate provided in an embodiment of the present application.

[0087] Description of reference numerals:

[0088] 100-electronic device; 1-display screen; 2-housing; 21-middle frame; 211-frame; 212-middle plate; 22-back cover; 221-opening; 222-supporting part; 3-camera module; 31-module body; 311-driving device; 312-filter assembly; 313-image sensor assembly; 32-lens; 321-light incident surface;

[0089] 4-optical cover plate; 41-optical body layer; 411-substrate; 4111-plate to be processed; 412-first anti-reflection layer; 4121-second micro-nano structure; 4122-protrusion; 4123-bottom end; 4124-top end; 4125-particles; 413-second anti-reflection layer; 4131-first film layer; 4132-second film layer; 414-transparent area; 415-non-transparent area; 4151-fitting area; 4152-shielded area;

[0090] 42-hydrophobic film layer; 421-hydrophobic layer; 4211-first micro-nano structure; 422-bottom layer; 4221-third micro-nano structure; 43-haze-like dirt; 44-AR coating layer; 45-light trap layer;

[0091] 5-battery; 6-motherboard;

[0092] 200-solid phase; 300-liquid phase. DETAILED DESCRIPTION

[0093] The terms used in the implementation section of this application are only used to explain the specific embodiments of this application and are not intended to limit this application.

[0094] Water drop angle: also known as water contact angle, is a type of contact angle, usually defined as 200 in solid phase, 300 in liquid phase, and 200 in gas phase. Figure 1 The angle between the gas phase-liquid phase 300 interface and the solid phase 200-liquid phase 300 interface at the three-phase interface (not shown). Figure 1As shown in , the angle a represents the water drop angle. Generally, the water drop angle can be used to measure the mutual wettability of the solid phase 200 and the liquid phase 300 and the hydrophilicity or hydrophobicity exhibited.

[0095] A low (e.g., less than 90°) water drop angle indicates that the surface humidity of the solid phase 200 is high (hydrophilicity), which shows low energy and is easy to stick. A high water drop angle (e.g., greater than or equal to 90°) indicates that the surface of the solid phase 200 is hydrophobic and has poor surface adhesion. Generally, materials with a water drop angle exceeding 150° are called super-hydrophobic materials. The water drop angle can also be used to measure the anti-fouling (e.g., anti-fingerprint) effect of the solid phase 200. In order to achieve the anti-fingerprint effect, the water drop angle is generally required to be greater than 120°.

[0096] Hexadecane contact angle: also known as oil contact angle (oil drop angle for short). Like the water drop angle, it is also a type of contact angle. Similarly, when the oil drop angle is less than 90°, it indicates that the surface of the solid phase 200 is highly lipophilic. When the oil drop angle is greater than or equal to 90°, it indicates that the surface of the solid phase 200 is highly oleophobic, and the adhesion of the oil drop on the surface of the solid phase 200 is poor.

[0097] The water drop angle generally describes the performance of a water drop on a horizontal plane, while the plane in reality is more of an inclined plane. Liquids (such as water drops) may roll or stagnate on an inclined plane. The water drop in this state can be characterized by the rolling angle.

[0098] like Figure 2 As shown in , the rolling angle refers to the critical surface tilt angle when a liquid (such as a water droplet) starts to roll on the surface of the solid phase 200. Figure 2 The angle b in the figure is the sliding angle. The smaller the sliding angle, the better the hydrophobicity of the surface of the surface solid phase 200.

[0099] It can be seen that the larger the water drop angle and the smaller the rolling angle, the stronger the hydrophobicity of the material surface.

[0100] Micro-nano structure: It can be understood that the surface of the material has a surface structure of micrometer and / or nanometer size. The micro-nano structure is a morphology of the microscopic structure on the surface of the material.

[0101] An embodiment of the present application provides an electronic device, which may include but is not limited to a mobile phone, a tablet computer (i.e., a pad), a virtual reality (VR) device, a laptop computer, a personal computer (PC), an ultra-mobile personal computer (UMPC), a handheld computer, a smart wearable device, a point of sales (POS), and other electronic devices.

[0102] The structure of the electronic device in the embodiment of the present application is further described below using a mobile phone as an example.

[0103] Figure 3 is a schematic diagram of the three-dimensional structure of an electronic device. Figure 4 This is a schematic diagram of the disassembly of an electronic device. Figure 3 As shown, the electronic device 100 provided in the embodiment of the present application may include a shell 2, the shell 2 includes a middle frame 21 and a back cover 22, the back cover 22 is connected to one side of the middle frame 21, and together with the middle frame 21 constitutes the shell 2 of the electronic device 100, providing a structural frame for the electronic device 100.

[0104] refer to Figure 4 Combined with Figure 3 As shown, in some embodiments, the middle frame 21 includes a middle plate 212 and a frame 211 connected to each other, and the frame 211 is arranged around the peripheral edge of the middle plate 212 and together with the middle plate 212 constitutes the middle frame 21. The frame 211 is a square ring structure composed of multiple side frames 211 connected end to end.

[0105] refer to Figure 4 As shown, in some embodiments, when the electronic device 100 has a display function, the electronic device 100 also includes a display screen 1, which is installed on the side of the frame 211 opposite to the back cover 22. The back cover 22 is covered on one side of the middle frame 21, and together with the middle frame 21 and the back cover 22, forms a storage space for the electronic device 100 (not shown in the figure).

[0106] The receiving space may be provided with components such as a mainboard 6, a battery 5, a microphone, a speaker, and a receiver of the electronic device 100. Figure 4 As shown in FIG. 1 , the main board 6 and the battery 5 can be arranged together on the side of the middle board 212 facing the back cover 22 to facilitate the electrical connection between the main board 6 and the battery 5. The main board 6 can be understood as a printed main board 6 carrying electronic components. The electronic components in the main board can include but are not limited to system on a chip (SoC), antenna module, Bluetooth module, wireless communication module (such as WIFI module), positioning module, radio frequency chip (RF), radio frequency power amplifier (RFPA), storage module (such as double data rate DDR memory), power management module, charging module, screen display and operation module, etc.

[0107] Continue to refer Figure 4As shown, the side where the display screen 1 is located constitutes the front side of the electronic device 100, and the side where the back cover 22 is located constitutes the back side of the electronic device 100. The display screen 1 is electrically connected to the mainboard 6 so that the display screen 1 can realize display or operation functions.

[0108] refer to Figure 4 As shown, in some embodiments, the electronic device 100 also includes a camera module 3, which can be arranged in the receiving space and electrically connected to the mainboard 6, so that when the user inputs a shooting command, the camera module 3 can be controlled by the mainboard 6 to capture images.

[0109] Figure 4 It is shown that a camera module 3 is provided in the electronic device 100. It should be noted that in practical applications, the number of camera modules 3 is not limited to one, and the number of camera modules 3 may also be two or more than two. In order to enhance the shooting performance of the electronic device 100, a plurality of (for example, three, four or five) camera modules 3 are usually provided in the electronic device 100. Among them, some camera modules 3 may be provided on the side of the middle frame 21 facing the display screen 1 to form a front camera module.

[0110] Figure 3 As shown in FIG. 1 , it is shown that the front camera module (not shown in the figure) is arranged in the area near the edge of the middle frame 21 toward the top of the electronic device 100. It can be understood that the position of the camera module 3 is not limited to Figure 3 The position shown may also be located at other parts of the electronic device 100.

[0111] refer to Figure 4 As shown, a certain number of camera modules 3 can also be arranged on the side of the middle frame 21 facing the back cover 22 to form a rear camera module (not shown in the figure). The structure of the electronic device 100 is further described below by taking the rear camera module as an example.

[0112] Continue to refer Figure 4 As shown, the rear camera module can be arranged in an area on the middle frame 21 near the edge of the top of the electronic device 100. When there are multiple rear camera modules, the rear camera modules can be arranged arbitrarily in the XY plane of the electronic device 100. For example, multiple rear camera modules can be arranged along the X direction, or multiple rear camera modules can be arranged along the Y direction. Among them, the XY plane can be understood as a plane formed by the X direction and the Y direction, which is parallel to the display surface of the display screen 1 (not shown in the figure).

[0113] The rear camera module may include, but is not limited to, an auto focus (AF) module, a fixed focus (FF) module, a wide-angle camera module, a telephoto camera module, a color camera module, or a black and white camera module. Exemplarily, the telephoto camera module may include, but is not limited to, a periscope telephoto camera module (periscope camera module for short). The electronic device 100 may include any of the above camera modules 3, or may include two or more of the above camera modules 3.

[0114] Figure 5 The schematic diagram of the structure on the back of the electronic device is shown. Figure 6 A schematic diagram showing the structure of an optical cover on the back of an electronic device is shown. Figure 7 for Figure 6 A cross-sectional view of the electronic device in the AA direction.

[0115] In order to facilitate the light outside the electronic device 100 to enter the camera module 3, refer to Figures 5 to 7 As shown, the electronic device 100 further includes an optical cover plate 4a, and an opening 221 adapted to the structure of the optical cover plate 4a is provided at a position where the rear cover 22 and the camera module 3 are opposite, and the optical cover plate 4a is provided at the opening 221 and covers the plurality of camera modules 3 to shield the camera modules 3 and protect the camera modules 3. At this time, the optical cover plate 4 can also be referred to as a lens cover plate.

[0116] like Figure 7 As shown in , the camera module 3 may include a module body 31 and a lens 32, the module body 31 includes a driving device 311, a portion of the lens 32 is installed in the driving device 311, and the other portion is exposed to the outside of the driving device 311. The lens 32 is generally composed of one or more stacked lenses (such as lenses). The driving device 311 is used to drive the lens 32 to move. For example, the driving device 311 can also drive the lens 32 to move along the optical axis toward the rear cover 22 or away from the rear cover 22 to achieve the zoom or focus function of the camera module 3. Among them, the periscope camera module can provide 5x, 10x or other multiples of optical zoom).

[0117] Alternatively, in some embodiments, the driving device 311 can also drive the lens 32 to move (such as translate or rotate) within its own plane to compensate for the amount of hand shake of the user when shooting, so as to realize the anti-shake function of the camera module 3.

[0118] In some embodiments, reference Figure 6 and Figure 7As shown, the optical cover 4a can cover the light incident surface 321 of the lens 32, and a light-transmitting area 414a is provided on the optical cover 4a and at the position of the covered camera module 3, so that the light outside the electronic device 100 can pass through the light-transmitting area 414a and enter the lens 32, thereby realizing the shooting function of the camera module 3. Among them, the light-transmitting area 414a can also be called a camera hole area. The shape of the light-transmitting area 414a is adapted to the shape of the lens 32. Generally, in order to increase the amount of light entering the lens 32, the shape of the light-transmitting area 414a can be larger than the shape of the lens 32.

[0119] refer to Figure 6 and Figure 7 As shown, the optical cover plate 4a may also include a non-light-transmitting area 415a, which is arranged around the peripheral edge of the light-transmitting area 414a. The non-light-transmitting area 415a includes a shielding area 4152a and a bonding area 4151a, and the bonding area 4151a is arranged on the peripheral edge of the light-transmitting area 414a. The shielding area 4152a is arranged on the side of the bonding area 4151a away from the light-transmitting area 414a. The driving device 311 can be bonded to the bonding area 4151a (not shown in the figure) on the inner surface of the optical cover plate 4a by a buffer glue such as foam glue to achieve the fixation of the camera module 3 on the optical cover plate 4a and the back cover 22. When the optical cover plate 4a covers multiple camera modules 3 at the same time, the bonding areas 4151a corresponding to the multiple camera modules 3 can be connected to each other through the bonding area 4151a to form a non-light-transmitting area 415a.

[0120] The inner surface of the optical cover plate 4 a may be understood as the side of the optical cover plate 4 a facing the camera module 3 , and the outer surface of the optical cover plate 4 a may be understood as the side of the optical cover plate 4 a facing away from the camera module 3 .

[0121] Continue to refer Figure 7 As shown, the module body 31 also includes a filter component 312 and an image sensor component 313. The filter component 312 and the image sensor component 313 are sequentially arranged on the light exit side of the lens 32. Among them, the filter component 312 may include a filter, and the image sensor component 313 may include an image sensor electrically connected to the mainboard. In this way, the light outside the electronic device 100 enters the lens 32 through the light-transmitting area 414a, and after being emitted through the lens 32, it can pass through the filter component 312 and the image sensor component 313 in sequence, and after being processed by the image sensor, an image is formed, thereby realizing the shooting function of the camera module 3.

[0122] Continue to refer Figure 7As shown, the optical cover plate 4a includes a substrate 411a, which is the only light-transmitting optical element in the optical cover plate 4a, and is generally made of glass. Glass may include but is not limited to ordinary glass, tempered glass, etc. Among them, ordinary glass can be understood as unmodified glass with a smooth surface. Tempered glass is a chemically strengthened glass obtained by chemically strengthening ordinary glass such as ion exchange. The light-transmitting area 414a and the non-light-transmitting area 415a are both arranged on the optical body layer of the substrate.

[0123] Since the surface (such as the inner surface) of the existing optical cover plate 4a is generally a smooth planar structure, when liquid such as water drops fall onto the inner surface of the optical cover plate 4a, it will be pressed on the optical cover plate 4a under the action of its own weight, so that the water droplets are flattened and thus adhere to the optical cover plate 4a.

[0124] After the components of the electronic device 100 , such as a mobile phone, are assembled, the entire device is generally plated to enhance the waterproof performance of the electronic device 100 . Figure 8 FIG. 4 is a schematic diagram showing a structure of a light-transmitting area 414a of an optical cover plate 4a after the entire electronic device 100 is coated in the related art. Figure 8 As shown, after the whole device was coated, the applicant found that there was haze-like dirt 43 on the inner surface of the optical cover plate 4a and the light-transmitting area 414a corresponding to the camera module 3.

[0125] The presence of the haze-like dirt 43 will affect the cleanliness of the optical cover plate 4 a and the transmission of light within the optical cover plate 4 a and the camera module 3 .

[0126] The study found that the cause of the haze-like dirt 43 is that, in order to facilitate the movement of the lens 32 relative to the optical cover plate 4a along the optical axis under the drive of the driving device 311, the lens 32 is fixed to the optical cover plate 4 and there is a gap between the lens 32 and the optical cover plate 4a. During the coating process of the electronic device 100, the air inside the electronic device 100 will be evacuated, and the air between the lens 32 and the optical cover plate 4a will also be evacuated. During the degassing process after the coating of the whole device is completed, the original molecules of the coating film layer, water vapor and some small molecules of foam glue will be attached and condensed on the inner surface of the optical cover plate 4a with the water droplets in the air flow during the vacuum breaking period. After the water droplets evaporate, the original molecules of the coating film layer and some small molecules of foam glue will remain on the inner surface of the optical cover plate 4a, so that there is haze-like dirt 43 on the light-transmitting area 414a on the inner surface of the optical cover plate 4a corresponding to the camera module 3.

[0127] Since the periscope camera module needs to move a larger distance, the distance between the lens 32 of the periscope camera module and the optical cover 4a is larger than that of other rear camera modules. Therefore, after the whole machine is coated, the haze-like dirt 43 at the relative position of the optical cover 4a and the periscope camera module is more serious.

[0128] In view of this, an embodiment of the present application provides an optical component so that the optical cover plate in the optical component can replace the original optical cover plate 4a in the electronic device 100 to cover the light incident surface of the optical device, which can effectively avoid the proportion of haze-like dirt on the optical cover plate after the entire electronic device 100 is coated.

[0129] Fig. 9 A schematic diagram of the structure of an optical cover plate according to an embodiment of the present application is shown. Fig.10 Indicates the camera module Fig. 9 The schematic diagram of the partial disassembly of the optical cover plate in the light-transmitting area is provided to facilitate observation of the layered structure inside the optical cover plate 4 .

[0130] refer to Fig. 9 and Fig.10 As shown, the optical assembly includes an optical cover plate and an optical device. The optical cover plate 4 includes an optical body layer 41. The optical body layer 41 blocks the light incident surface 321 of the optical device (not shown in the figure).

[0131] Continue to refer Fig. 9 and Fig.10 As shown, the optical body layer 41 has a light-transmitting area 414 arranged opposite to the optical device. The optical cover plate 4 also includes a hydrophobic film layer 42, which is light-transmitting and is located on the side of the optical body layer 41 facing the optical device, and covers the light-transmitting area 414. Among them, the side of the hydrophobic film layer 42 facing the optical device is a hydrophobic rough surface (not shown in the figure) having a first micro-nano structure 4211. Among them, the side of the hydrophobic film layer 42 facing the optical device is the inner surface of the hydrophobic film layer 42. The side of the hydrophobic film layer 42 facing away from the optical device can be understood as the outer surface of the hydrophobic film layer 42. The positions of the inner and outer surfaces of the optical cover plate 4 and the internal layers can refer to the relevant description of the hydrophobic film layer 42. Since the optical body layer 41 is a part of the optical cover plate 4, the light-transmitting area 414 of the optical body layer 41 can also be understood as the light-transmitting area 414 of the optical cover plate 4.

[0132] Due to the presence of the hydrophobic rough surface, the inner surface of the hydrophobic film layer 42 has hydrophobic properties, which will result in low mutual wettability between the hydrophobic rough surface and the liquid phase 300, and poor adhesion of the liquid (such as water droplets) on the hydrophobic rough surface, so as to avoid the original molecules of the coating film layer and some small molecules of the foam glue adhering to and condensing on the hydrophobic rough surface with the liquid (such as oil droplets or water droplets in the air flow) after the electronic device 100 is coated, thereby reducing the proportion of haze-like dirt 43 appearing in the light-transmitting area 414 of the optical cover plate 4 facing the optical device (the inner surface of the optical cover plate).

[0133] Due to the presence of the first micro-nano structure 4211, the hydrophobic rough surface presents a rough morphology with a surface structure of micrometer and / or nanometer size, and forms an undulating micro-nano structure on the hydrophobic rough surface. Since the hydrophobic rough surface has a lower surface energy and there is a larger surface tension between air and liquid, when the original molecules of the coating film layer and some small molecules of the foam glue are attached to the liquid (such as oil droplets or water droplets in the air flow) and fall on the first micro-nano structure 4211 with the liquid, the liquid condenses into droplets and stands on the first micro-nano structure 4211, so that the droplets (such as water droplets) have a larger water drop angle on the hydrophobic rough surface.

[0134] When the hydrophobic and oleophobic properties of the hydrophobic rough surface are combined with the first micro-nano structure 4211, liquids such as water droplets and oil droplets can have an extremely small rolling angle on the hydrophobic rough surface, making it easier for the liquid condensed on the hydrophobic rough surface to slide out of the light-transmitting area 414, thereby further reducing the proportion of mist-like dirt 43 on the light-transmitting area 414 on the inner surface of the optical cover 4 corresponding to the camera module 3 (such as a periscope camera module 3), so that the side of the optical cover 4 facing the optical device has anti-fouling properties, which ensures the cleanliness of the optical cover 4 while facilitating the transmission of light in the light-transmitting area 414 and the optical device, ensuring that the use of the optical device is not affected.

[0135] In some embodiments, the optical device may be a camera module 3, which includes a lens 32. The optical body layer 41 blocks the light incident surface 321 of the lens 32. The light-transmitting area 414 is opposite to the position of the lens 32, so that while the optical cover plate 4 blocks the light incident surface 321 of the lens 32 to protect the lens 32, the proportion of haze-like dirt 43 on the inner surface of the optical cover plate 4 at the light-transmitting area 414 can be reduced.

[0136] Take camera module 3 as an example, refer to Fig.10 Combined with Figure 7 As shown, the optical body layer 41 can be located at the opening 221 of the back cover 22 and fixed to the back cover 22 by bonding or other means to achieve the fixation of the optical body layer 41 on the back cover 22. For example, Figure 7 As shown, the back cover 22 may be provided with a support portion 222 on the hole wall of the opening 221, and the optical body layer 41 may be supported on the support portion 222 and fixed on the support portion 222 by bonding or other means (such as Figure 7 As shown in ). Exemplarily, the support portion 222 may include but is not limited to a support step.

[0137] The optical body layer 41 may cover one camera module 3, or the optical body layer 41 may also cover two or more camera modules 3 at the same time. In the present application, the structure of the camera module 3 covered by the optical body layer 41 is not further limited.

[0138] The optical body layer 41 is provided with a light-transmitting area 414 at the lens 32 of the camera module 3 covered, so that the light of the electronic device 100 can pass through different light-transmitting areas 414 and enter the corresponding lens 32 of the camera module 3, thereby realizing the camera function of the camera module 3. It should be noted that the shape and size of the light-transmitting area 414 can refer to the relevant description of the optical cover plate 4 in the relevant technology, and no further description is given here.

[0139] Alternatively, in some embodiments, when the electronic device 100 is a smart wearable device, the optical cover plate 4 of the present application can also be used as a cover plate of a bio-tracking optical sensor (PPG) in the smart wearable device, covering the light incident surface of the bio-tracking optical sensor. The setting of the optical cover plate 4 in the smart wearable device can refer to the relevant description of the PPG cover plate in the relevant technology, and no further limitation is made here.

[0140] The structure of the optical cover plate 4 will be further described below by taking the camera module 3 as an example.

[0141] Among them, the water drop angle of the optical cover plate 4 of the present application at the hydrophobic film layer 42 can be greater than 150°, and the oil drop angle can be greater than 95°, so that the inner surface of the optical cover plate 4 has good hydrophobic and oleophobic properties in the light-transmitting area 414. The rolling angle of the inner surface of the optical cover plate 4 of the present application at the hydrophobic film layer 42 can be less than 40°, so that the droplets condensed on the first micro-nano structure 4211 can slide out of the light-transmitting area 414.

[0142] Fig.11 The partial schematic diagram of the optical cover plate 4 of the present application after the whole electronic device 100 is coated is shown. Fig.11 It can be seen that due to the provision of the hydrophobic film layer 42, after the electronic device 100 is coated, the haze-like dirt 43 is almost invisible in the light-transmitting area 414 of the inner surface of the optical cover plate 4. It can be seen that the present application can effectively reduce the proportion of haze-like dirt 43 appearing in the light-transmitting area 414 on the inner surface of the optical cover plate 4 corresponding to the camera module 3, and can even avoid the appearance of haze-like dirt 43 on the light-transmitting area 414 on the inner surface of the optical cover plate 4.

[0143] refer to Fig.10 Combined with Fig. 9As shown, the camera module 3 also includes a module body 31 , and the lens 32 is located on the side of the module body 31 facing the optical cover 4 , so that light outside the electronic device 100 can pass through the light-transmitting area 414 and enter the corresponding lens 32 .

[0144] like Fig. 9 As shown in the figure, the optical body layer 41 has a non-light-transmitting area 415, and the non-light-transmitting area 415 is arranged around the peripheral edge of the light-transmitting area 414. The non-light-transmitting area 415 is shielded on the module body 31, so that when the camera module 3 is combined with the optical cover plate 4, while ensuring the amount of light entering the light-transmitting area 414, the area of ​​the light-transmitting area 414 can be reduced, so that more camera modules 3 can be shielded by the optical cover plate 4.

[0145] In some embodiments, the module body 31 can also be bonded to the non-light-transmitting area. For example, the module body 31 can be fixed to the non-light-transmitting area 415 by a buffer glue such as foam glue. The area on the non-light-transmitting area 415 of the present application where the module body 31 is bonded is the bonding area 4151. Among them, the non-light-transmitting area 415 also includes a shielding area 4152, and the shielding area 4152 is surrounded on the side of the bonding area 4151 away from the light-transmitting area 414. The non-light-transmitting area 415 of the optical body layer 41 can also be understood as the non-light-transmitting area 415 of the optical cover plate 4. Among them, when the optical body layer 41 covers multiple camera modules 3 at the same time, the formation of the non-light-transmitting area 415 can refer to the relevant description of the optical cover plate 4 in the relevant technology, and no further details are given here.

[0146] It should be noted that the optical body layer 41 can be shielded by a light shielding material at the peripheral edge of the bonding area 4151 corresponding to each lens 32 covered, so as to form a shielding area 4152. Fig.10 As shown, the hydrophobic film layer 42 includes a hydrophobic layer 421, which is located on the side of the optical body layer 41 facing the optical device (such as the camera module 3) and covers the light-transmitting area 414. The side of the hydrophobic layer 421 facing the optical device is a hydrophobic rough surface. In this way, the hydrophobic layer 421 can be used to form a hydrophobic rough surface, and the hydrophobic film layer 42 has certain hydrophobic and oleophobic properties on the hydrophobic rough surface, so as to avoid the original molecules of the coating film layer and some small molecules of the foam glue from adhering to and condensing on the hydrophobic rough surface with the liquid (such as oil droplets or water droplets in the air flow), which not only reduces the proportion of haze-like dirt 43 on the inner surface of the optical cover plate 4 corresponding to the light-transmitting area 414 of the camera module 3, but also ensures the anti-fouling performance of the hydrophobic film layer 42 at the hydrophobic rough surface.

[0147] Among them, the hydrophobic layer 421 can be a perfluoropolyether coating. Alternatively, in some embodiments, the hydrophobic layer 421 can also be made of other transparent materials with hydrophobic and oleophobic properties. In the present application, the hydrophobic layer 421 adopts a perfluoropolyether coating. Perfluoropolyether is a kind of transparent lubricant. Since perfluoropolyether has good hydrophobic and oleophobic properties, a perfluoropolyether coating is formed by perfluoropolyether as the hydrophobic layer 421. While satisfying the hydrophobic rough surface of the hydrophobic layer 421 having good hydrophobic and oleophobic properties, the hydrophobic layer 421 has a good anti-fouling effect, and it will not affect the light transmission efficiency in the light-transmitting area 414.

[0148] According to the contrast of the shooting environment, the shooting environment of the camera module 3 in the electronic device 100 is generally divided into a general shooting environment and a strong contrast environment. Among them, the general shooting environment may include shooting objects in regular light during the day, shooting objects in a well-lit room, or other shooting environments with small contrast. The strong contrast environment may include shooting sunrise in the morning, shooting the sun in the evening, shooting street lights at night, and other backlit or strong contrast shooting environments.

[0149] Fig.12 Indicated Figure 8 Schematic diagram of light transmission of the optical cover plate 4a in FIG. Taking a mobile phone as an example, the electronic device 100 in the related art adopts Figure 8 When the optical cover plate 4a shown in FIG. 1 is used, since the optical cover plate 4a only includes a substrate 411a, the substrate 411a is made of ordinary glass, such as Fig.12 As shown, when the light enters the optical cover 4a, there is a high (for example, 4.2%) reflected light on the inner surface and the outer surface of the optical cover 4a, and the transmittance of the light on the optical cover 4a is generally 90%, so that the camera module 3 in the electronic device 100 has obvious ghost images when taking pictures in a general shooting environment and in the pictures taken.

[0150] The reason for this is mainly because the optical cover 4a (especially the inner surface of the optical cover 4a) has a high reflectivity. The optical cover 4a is covered on the lens 32, and will form a group of lenses with the multiple lenses in the lens 32. There will be reflection between two adjacent lenses. When the light passes through the optical cover 4a and the lens 32, it will produce multiple levels of reflection at the interface between the glass and the air. Some of the reflected light reaches the image sensor and is received by the image sensor, so that the object being photographed and its image are separated during the shooting process of the camera module 3, resulting in more obvious ghost images when taking pictures in general shooting environments and in the photos taken.

[0151] To reduce the severity of ghosting, Fig.13 The schematic diagram of the structure of another optical cover plate 4b proposed in the related art is shown. Fig.13As shown, the optical cover plate 4b includes a substrate 411a and an AR (Anti-Reflection) coating layer, and the AR coating layer 44 is located on two opposite sides of the substrate 411a, and together with the substrate 411a, forms an AR coated glass. AR coated glass can also be called transmission-enhancing glass or anti-reflection glass. Due to the presence of the AR coating layer 44, the AR coated glass has a lower reflectivity than that of only the optical cover plate 4a, and the reflectivity of the inner and outer surfaces of the optical cover plate 4b can be reduced from 4.2% to 0.5%.

[0152] Since the reflectivity of the inner and outer surfaces of the optical cover plate 4b is greatly reduced, the electronic device 100 carrying the optical cover plate 4b will basically not have ghost images when shooting in general scenes. However, the inner and outer surfaces of the optical cover plate 4b still have a reflectivity of 0.5%, and the electronic device 100 will still have obvious ghost images when shooting in a strong contrast environment.

[0153] Since the inner surface of the optical cover plate 4 b is coated with an AR coating layer 44 , the inner surface of the optical cover plate 4 b has strong hydrophilicity and lipophilicity, and water vapor and small organic molecules are easily attached to generate haze-like dirt 43 .

[0154] Fig.14 FIG. 4 is a schematic diagram showing another structure of an optical cover plate 4c in the related art. Fig.14 As shown, the optical cover plate 4c includes a substrate 411a, an AR coating layer 44 and a light trap layer 45, and the AR coating layer 44 and the light trap layer 45 are arranged on two opposite sides of the substrate 411a. The side where the AR coating layer 44 is located forms the outer surface of the optical cover plate 4c, and the side where the light trap layer 45 is located forms the inner surface of the optical cover plate 4c.

[0155] The light trap layer 45 includes a plurality of protrusions 4122a, the bottom of the protrusions 4122a is connected to the substrate 411a, and the top of the protrusions 4122a is located at the end of the substrate 411a away from the AR coating layer 44. The plurality of protrusions 4122a are arranged continuously on the substrate 411a to form the light trap layer 45, so that the surface of the light trap layer 45 presents a surface morphology in which a plurality of convex points (not marked in the figure) and concave points (not marked in the figure) are arranged alternately and continuously to form a light trap effect, so as to change the reflectivity of the surface of the light trap layer 45 to light. Among them, the convex points are the vertices of the protrusions 4122, and the concave points are located between adjacent protrusions 4122.

[0156] Due to the different refractive indices of air and the material of the film layer forming the light trap layer 45 (such as glass), as well as the surface morphology of multiple protrusions and concave points arranged alternately and continuously, the proportion of the material of the film layer in the light trap layer 45 gradually decreases from the bottom of the protrusion 4122a to the top of the protrusion 4122a, so that the light trap layer 45 forms a gradient film layer with a gradually changing refractive index. In the direction from the substrate 411a to the side away from the AR coating layer 44, the refractive index of the light trap layer 45 to light gradually changes from the refractive index corresponding to the film layer to the refractive index corresponding to air.

[0157] In this way, by setting the light trap layer 45, the reflectivity of the inner surface of the optical cover plate 4c can be further reduced from 0.5% to below 0.03%, and the ghost intensity when shooting in a strong contrast environment can be reduced by half compared to AR coated glass. However, due to the presence of the light trap layer 45, the inner surface of the optical cover plate 4c will be rougher than that of the AR coated glass. Since the surface energy of the optical cover plate 4c at the convex points is large, when the liquid falls on the inner surface of the optical cover plate 4c, it is easy to condense on the convex points to form droplets. Since the surface of the light trap layer 45 has a hydrophilic property, the droplets condensed on the convex points will be pulled apart by the siphon effect, and thus adhere to the convex points and concave points, which makes it easy for the original molecules of the coating film layer and some small molecules of the foam glue to adhere and condense on the inner surface of the optical cover plate 4c, and form haze-like dirt 43 in the light-transmitting area 414.

[0158] Fig.15 Indicated Fig.10 Schematic diagram of the structure of the optical body layer 41. Fig.15 Combined with Fig.10 As shown, the optical body layer 41 includes a substrate 411 and a first anti-reflection layer 412. The substrate 411 may be a glass substrate, and the glass substrate may be ordinary glass or tempered glass. The first anti-reflection layer 412 covers the side of the substrate 411 facing the hydrophobic film layer 42. The side of the first anti-reflection layer 412 facing the hydrophobic film layer 42 is a rough surface having a second micro-nano structure 4121. The side of the first anti-reflection layer 412 facing the hydrophobic film layer 42 forms the inner surface of the optical body layer 41, that is, the inner surface of the optical body layer 41 is a rough surface having the second micro-nano structure 4121. The first micro-nano structure 4211 is attached to and covers the second micro-nano structure 4121.

[0159] In this way, the hydrophobic film layer 42 is located on the rough surface of the first anti-reflection layer 412, so that the reflectivity of the inner surface of the optical cover 4 is reduced by the first anti-reflection layer 412, and the optical trap effect reflected by the internal lens of the covered lens 32 and the outer surface of the lens 32 is realized, thereby weakening the intensity of ghost images in photos taken in general scenes and high-contrast environments, and improving the shooting effect of the camera module 3.

[0160] Moreover, due to the presence of the second micro-nano structure 4121, the hydrophobic rough surface presents a rough morphology with a surface structure of micrometer and / or nanometer size, so that the hydrophobic film layer 42 can cover the rough surface of the first anti-reflection layer 412, so that the hydrophobic film layer 42 can be combined with the second micro-nano structure 4121 to form a first micro-nano structure 4211 on the surface of the hydrophobic layer 421, thereby increasing the water drop angle of the liquid (such as water droplets) on the hydrophobic rough surface through the second micro-nano structure 4121, while making the droplets have a very small rolling angle on the hydrophobic rough surface, making it easier for the droplets condensed on the first micro-nano structure 4211 to slide out of the light-transmitting area 414, thereby reducing the proportion of haze-like dirt 43 formed in the light-transmitting area 414.

[0161] The shape of the first micro-nano structure 4211 matches the shape of the second micro-nano structure 4121, so that the surface of the hydrophobic layer 421 can form the first micro-nano structure 4211 that matches the second micro-nano structure 4121, and the hydrophobic rough surface of the hydrophobic film layer 42 can also have the anti-reflection effect of the first anti-reflection layer 412 without affecting the anti-reflection effect of the first anti-reflection layer 412. Since the hydrophobic rough surface is located at the light-transmitting area 414 of the inner surface of the optical cover plate 4, the shape of the first micro-nano structure 4211 matches the second micro-nano structure 4121, while increasing the water drop angle of the inner surface of the optical cover plate 4 at the light-transmitting area 414, the inner surface of the optical cover plate 4 can also have the anti-reflection effect of the first anti-reflection layer 412 at the light-transmitting area 414.

[0162] In some embodiments, the refractive index of the first anti-reflection layer 412 is configured to gradually change from the refractive index corresponding to the first anti-reflection layer to the refractive index corresponding to the air along the direction from the substrate 411 to the hydrophobic film layer 42, so that the first anti-reflection layer 412 is a gradient film layer with a continuously changing refractive index along the direction from the substrate 411 to the hydrophobic film layer 42, so that while the first anti-reflection layer 412 reduces the reflectivity of the inner surface of the optical cover 4 to the light in the light-transmitting area 414, it can also form an optical trap effect to absorb the light reflected by the lens 32 to the first anti-reflection layer 412 (optical trap effect), thereby weakening the intensity of ghost images in photos taken in general scenes and in strong contrast environments.

[0163] Continue to refer Fig.15As shown, in some embodiments, the second micro-nano structure 4121 may include a plurality of protrusions 4122. The bottom end 4123 of the protrusion 4122 is connected to the substrate 411, the top end 4124 of the protrusion 4122 is arranged toward the hydrophobic film layer 42, and the protrusion 4122 gradually tapers from the bottom end 4123 to the top end 4124. The protrusion 4122 may be a pyramid, a steamed bun shape, or other shapes that meet the above requirements. Exemplarily, the pyramid may include but is not limited to a triangular pyramid, a quadrangular pyramid, or a pyramid formed by other numbers of polygons. The triangular pyramid may be regarded as a pyramid. Here, the shape of the protrusion 4122 is not further limited.

[0164] The present application forms a concave point (not shown in the figure) between two adjacent protrusions 4122 by defining the shape of the protrusions 4122, so as to form a surface morphology in which a plurality of protrusions (not shown in the figure) and concave points are alternately stacked on the inner surface of the optical body layer 41, so that the proportion of the substrate of the first anti-reflection layer 412 gradually decreases in the direction from the substrate 411 to the hydrophobic film layer 42, and the proportion of the air (the air at the concave point) in the first anti-reflection layer 412 gradually increases, thereby making the first anti-reflection layer 412 have a good surface appearance. The refractive index of the light 12 gradually changes from the refractive index corresponding to the first anti-reflection layer to the refractive index corresponding to the air, reducing the reflectivity of the inner surface of the optical body layer 41 and the inner surface of the optical cover plate 4 to the light in the light-transmitting area 414, thereby reducing the multi-level reflection of the light in the optical cover plate 4 and the lens 32, and weakening the intensity of ghost images in photos taken under a strong contrast environment. At the same time, a light trap effect can be formed on the side of the first anti-reflection layer 412 facing the hydrophobic film layer 42 to absorb the light reflected by the lens 32 to the first anti-reflection layer 412, thereby further weakening the intensity of ghost images in photos taken under a strong contrast environment.

[0165] Furthermore, a second micro-nano structure 4121 can be formed by the plurality of protrusions 4122 , so as to increase the water drop angle of the inner surface of the optical cover plate 4 in the light transmission area 414 and reduce the rolling angle of the inner surface of the optical cover plate 4 in the light transmission area 414 through the second micro-nano structure.

[0166] Continue to refer Fig.15 As shown, the bottom ends 4123 of the plurality of protrusions 4122 are interconnected, which can increase the density of the protrusions 4122 on the surface of the first anti-reflection layer 412, and form a surface morphology in which a plurality of protrusions and concave points are alternately and continuously arranged on the inner surface of the optical body layer 41, thereby forming the first anti-reflection layer 412 with a continuously changing refractive index, thereby enhancing the light trap effect and further weakening the intensity of ghost images in photos taken in a strong contrast environment.

[0167] Continue to refer Fig.15As shown, in some embodiments, the first anti-reflection layer 412 may be a light trap layer.

[0168] Taking the protrusion 4122 as an example, the protrusion 4122 on the surface of the light trap layer can be formed by coating a metal film on the plate to be processed 4111, and then etching after the metal film shrinks. Among them, the plate to be processed 4111 can be understood as an untreated (etched or corroded) glass plate. In this way, while reducing the reflectivity of the inner surface of the optical body layer 41 and the inner surface of the optical cover plate 4 to light in the light-transmitting area 414, and weakening the intensity of ghost images in photos taken in general scenes and under strong contrast environments, the structure of the first anti-reflection layer 412 can also be made more diversified.

[0169] When the first anti-reflection layer 412 is a light trap layer, it is the same as the light trap layer 45 in the related art. The first anti-reflection layer 412 can reduce the reflectivity of the inner surface of the optical cover 4 to below 0.03%, and can also achieve an optical trapping effect on the internal lens of the covered lens 32 and the reflection of the outer surface of the lens 32, thereby achieving basically ghost-free shooting in general scenes and weakening the intensity of ghosts in photos taken in a strong contrast environment.

[0170] In some embodiments, the second micro-nano structure 4121 may further include a plurality of depressions, wherein the depressions are micrometer-scale and / or nanometer-scale depressions, and the plurality of depressions are evenly arranged on the optical body layer 41 to form the first anti-reflection layer 412. Exemplarily, the depressions may include but are not limited to holes or grooves on the surface of the first anti-reflection layer 412. Accordingly, the first micro-nano structure 4211 is also a hole or groove that matches the shape of the second micro-nano structure 4121.

[0171] Due to the presence of multiple depressions, the microscopic morphology of the surface of the first anti-reflection layer 412 can also be changed, and a light trap layer can be formed, so that the reflectivity of the inner surface of the optical cover plate 4 is reduced to below 0.03%. While weakening the intensity of ghost images taken in a strong contrast environment, the connecting area between two adjacent depressions can form a relatively protruding convex point, so as to increase the water drop angle and oil drop angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414 through the first micro-nano structure 4211, and reduce the rolling angle of the inner surface of the large optical cover plate 4 in the light-transmitting area 414.

[0172] In some embodiments, the first anti-reflection layer 412 may also be a porous coating, so that the structure of the first anti-reflection layer 412 is more diverse. When the first anti-reflection layer 412 is a porous coating, the second micro-nano structure 4121 may also include a plurality of micron-scale and / or nano-scale depressions.

[0173] The structure of the optical cover plate 4 of the present application is further described below by taking the protrusion 4122 as an example.

[0174] In some embodiments, the protrusions 4122 are micrometer-scale and / or nanometer-scale protrusions, so as to form the first anti-reflection layer 412 with a microscopic morphology and reduce the thickness of the optical cover plate 4 .

[0175] Continue to refer Fig.15 As shown, the height H of the protrusion 4122 can be greater than or equal to 50nm and less than or equal to 200nm, and the size of the bottom 4123 is greater than or equal to 150nm and less than or equal to 500nm. Among them, the height H of the protrusion 4122 can also be greater than or equal to 50nm and less than or equal to 120nm, and the size of the bottom 4123 can also be greater than or equal to 170nm and less than or equal to 500nm. Exemplarily, the height H of the protrusion 4122 can be 50nm, 120nm or 200nm, and the size of the bottom 4123 can be 170nm, 220nm or 500nm. In order not to affect the transmittance of light on the optical cover plate 4 and reduce the reflectivity of the inner surface of the optical cover plate 4, it can cooperate with the first micro-nano structure 4211 to increase the water drop angle and oil drop angle of the inner surface of the optical cover plate 4 at the light-transmitting area 414, and reduce the rolling angle of the inner surface of the optical cover plate 4 at the light-transmitting area 414.

[0176] Among them, the size of the bottom end 4123 can be understood as the maximum size or distal size of the bottom end 4123 of the protrusion 4122 along the above-mentioned XY plane. As the shape of the protrusion 4122 is different, the size of the corresponding bottom end 4123 is also different. For example, when the protrusion 4122 is a triangular pyramid, the size of the bottom end 4123 can be understood as the maximum side length of the bottom end 4123 of the triangular pyramid. When the protrusion 4122 is a quadrangular pyramid, the size of the bottom end 4123 can be understood as the diagonal of the bottom end 4123 of the quadrangular pyramid. When the protrusion 4122 is a steamed bun shape, and the projection of the bottom end of the protrusion 4122 in the XY plane is a circle, the size of the bottom end 4123 can be understood as the diameter of the circle. When the protrusion 4122 is a steamed bun shape, and the projection of the bottom end of the protrusion 4122 in the XY plane is an ellipse, the size of the bottom end 4123 can be understood as the diameter of the major axis of the ellipse.

[0177] like Fig.10 As shown, the thickness D1 of the hydrophobic layer 421 can be greater than or equal to 5nm and less than or equal to 30nm. In some embodiments, the thickness D1 of the hydrophobic layer 421 can also be greater than or equal to 10nm and less than or equal to 30nm. In this way, by limiting the thickness D1 of the hydrophobic layer, it is possible to reduce the influence of the thickness of the hydrophobic layer 421 on the height of the first micro-nano structure 4211 without affecting the formation of the hydrophobic layer 421 and the hydrophobic performance, so as to ensure that the water drop angle and the oil drop angle of the inner surface of the optical cover plate 4 can be increased by the setting of the first micro-nano structure 4211, and it is possible to facilitate light to pass through the optical cover plate 4.

[0178] The plurality of protrusions 4122 are arranged in an array to form the second micro-nano structure 4121, and the arrangement of the plurality of protrusions 4122 on the inner surface of the optical body layer 41 has a certain regularity, which is conducive to the release of the stress of the film layer and reduces the stress deformation of the optical body layer 41. Alternatively, the plurality of protrusions 4122 can also be arranged irregularly on the inner surface of the optical body layer 41. The present application does not further limit the arrangement of the protrusions 4122.

[0179] Fig.16 The partially disassembled schematic diagram of the optical cover plate 4 provided in the embodiment of the present application is illustrated to facilitate observation of the layered structure in the optical cover plate 4. In order to enhance the adhesion effect of the hydrophobic layer 421 on the surface of the first anti-reflection layer 412, in some embodiments, reference Fig.16 As shown, the hydrophobic film layer 42 may further include a coating layer 422, which is attached to the light-transmitting area 414 on the side of the optical body layer 41 facing the optical device (such as the camera module 3), and the hydrophobic layer 421 covers the coating layer 422, so as to increase the adhesion strength of the hydrophobic layer 421 on the surface of the first anti-reflection layer 412 through the coating layer 422, thereby enhancing the stability of the performance of the inner surface of the optical cover 4.

[0180] Continue to refer Fig.16 As shown, the bottom layer 422 is an active bottom layer that is the same as the substrate of the first anti-reflection layer 412. Since the active bottom layer and the first anti-reflection layer 412 are the same substrate, the two have good bonding strength. At the same time, since the surface activity of the active bottom layer is very high, the hydrophobic layer 421 can be absorbed onto the first anti-reflection layer 412, increasing the adhesion of the hydrophobic layer 421 on the first anti-reflection layer 412, so that the hydrophobic layer 421 is stably adsorbed on the first anti-reflection layer 412 and is not easy to fall off.

[0181] In some embodiments, the substrate of the first anti-reflection layer 412 may be silicon dioxide or other light-transmitting optical substrates. Taking the substrate of the first anti-reflection layer 412 as silicon dioxide as an example, the base layer 422 may be a silicon dioxide layer. Since the silicon dioxide layer and the substrate of the first anti-reflection layer 412 are the same, both are silicon dioxide, the base layer 422 can be matched with the substrate of the first anti-reflection layer 412, so that the base layer 422 can obtain a good bonding strength on the first anti-reflection layer 412, and the base layer 422 can have a higher surface activity, so as to absorb the hydrophobic layer 421 onto the first anti-reflection layer 412, and increase the adhesion of the hydrophobic layer 421 on the first anti-reflection layer 412.

[0182] Continue to refer Fig.16As shown, the side of the bottom layer 422 facing the hydrophobic layer 421 has a third micro-nano structure 4221. The third micro-nano structure 4221 covers the second micro-nano structure 4121 and fits between the second micro-nano structure 4121 and the first micro-nano structure 4211. The shape of the third micro-nano structure 4221 matches the shape of the second micro-nano structure 4121. In this way, while the adhesion of the hydrophobic layer 421 on the first anti-reflection layer 412 is enhanced by the bottom layer 422, the consistency of the first micro-nano structure 4211 and the second micro-nano structure 4121 can be ensured due to the setting of the third micro-nano structure 4221, so that while increasing the water drop angle and the oil drop angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414, the setting of the first micro-nano structure 4211 can be avoided to affect the transmission of light in the optical cover plate 4, thereby ensuring the shooting effect of the camera module 3.

[0183] Continue to refer Fig.16 Combined with Fig.15 As shown, the thickness D2 of the bottom layer 422 may be less than the thickness D1 of the hydrophobic layer 421, wherein the thickness D2 of the bottom layer 422 may be greater than or equal to 8 nm and less than or equal to 13 nm. Alternatively, in some embodiments, the thickness D2 of the bottom layer 422 may also be greater than or equal to 3 nm and less than or equal to 13 nm. In this way, by limiting the thickness D2 of the bottom layer 422, while ensuring the adhesion of the hydrophobic layer 421 on the first anti-reflection layer 412, it is possible to avoid the thickness of the bottom layer 422 being too large, thereby affecting the height of the first micro-nano structure 4211 and the thickness of the optical cover 4.

[0184] On the basis of the above, continue to refer to Fig.16 As shown, in some embodiments, the optical body layer 41 further includes a second anti-reflection layer 413, which is light-transmissive and is located on the side of the substrate 411 away from the hydrophobic film layer 42. The side of the second anti-reflection layer 413 away from the substrate 411 forms the outer surface of the optical body layer 41 and the optical cover plate 4, and the outer surface of the optical cover plate 4 can be used as the incident surface of the light. In this way, by setting the second anti-reflection layer 413, the reflection of the outer surface of the optical cover plate 4 on the light can be reduced, and the outer surface of the optical cover plate 4 can be protected from being scratched.

[0185] The second anti-reflection layer 413 may be an optical anti-reflection film system, and the optical anti-reflection film system may include but is not limited to an ordinary optical AR film system, a hard AR film system, and an anti-scratch AR film system. An ordinary optical AR film system can be understood as an AR film system that only has optical properties such as anti-reflection. Since ordinary optical AR films, hard AR films, and anti-scratch AR films can be regarded as AR coating layers 44, the provision of the second anti-reflection layer 413 can reduce the reflectivity of the outer surface of the optical cover plate 4 from 0.5% to below 0.3%. Therefore, the reflectivity of the inner surface of the optical cover plate 4 of the present application can be reduced to below 0.03%, and the reflectivity of the outer surface can be reduced to below 0.3%, which can effectively prevent the generation of ghost images when the electronic device 100 takes pictures in general scenes and strong contrast scenes.

[0186] Fig.17 The schematic diagram of the layers of the second anti-reflection layer 413 is illustrated, but does not limit the number of layers of the second anti-reflection layer 413 .

[0187] refer to Fig.17 As shown, the second anti-reflection layer 413 includes a first film layer 4131 and a second film layer 4132 having a refractive index greater than that of the first film layer 4131. The first film layer 4131 and the second film layer 4132 are alternately stacked on the substrate 411 of the optical body layer 41 to form the second anti-reflection layer 413. In the thickness direction of the second anti-reflection layer 413, the first film layer 4131 is located on the surface of the second anti-reflection layer 413. In this way, while satisfying the requirement that the outer surface of the optical cover plate 4 has a lower reflectivity, the generation of ghost images when the electronic device 100 is photographed in general scenes and strong contrast scenes is effectively prevented.

[0188] Continue to refer Fig.17 As shown, the second anti-reflection layer 413 uses a film stack 2H (two film materials). In order to enhance the scratch resistance of the outer surface of the optical cover plate 4, the first film layer 4131 can use a film material with high hardness and relatively low refractive index, such as silicon dioxide, and the second film layer 4132 can use a film material with a refractive index greater than the first film layer 4131, such as silicon nitride. In this way, while satisfying the requirement that the outer surface of the optical cover plate 4 has a lower reflectivity, the outer surface of the optical cover plate 4 can have a certain hardness to protect the outer surface of the optical cover plate 4 from being scratched.

[0189] In order to verify the optical performance of the optical cover plate 4, the optical performance (such as reflectivity and transmittance) of the optical cover plate 4 is tested by a spectrophotometer. Taking the light wave with a wavelength of 380nm-780nm as an example, the reflectivity of the optical cover plate 4 is less than 0.3%, and the transmittance is greater than 98%.

[0190] According to the International Commission on Illumination, under normal incidence conditions, in the (L*, a*, b*) colorimetric system, a colorimeter is used to test the chromaticity of the reflected light and the transmitted light of the optical cover plate 4. Among them, L* represents lightness, a* represents red and green, and b* represents yellow and blue. The test results show that the deviation of the a value in the color value of the reflected light is ±2, the deviation of the b value is ±2, and the deviation of the a value in the color value of the transmitted light is ±2, and the deviation of the b value is ±2. It can be seen that the color of the visible light after passing through the optical cover plate 4 and after being reflected by the optical cover plate 4 will not be affected, and the original color will be retained to ensure the accuracy of the covered camera module 3 in shooting the object.

[0191] On the basis of the above, an embodiment of the present application further provides a method for preparing an optical component, and the preparation method is applied to the above optical component. Fig.18 The schematic diagram shows the structural changes of the optical cover plate 4 in the optical component during the preparation process. Fig.19 A flow chart of a method for preparing the optical cover plate 4 is shown.

[0192] refer to Fig.18 and Fig.19 As shown, the method for preparing the optical component includes:

[0193] Step S100: preparing an optical stack, wherein the optical cover plate comprises an optical body layer and a hydrophobic film layer, and the optical body layer comprises an optical stack.

[0194] Step S200: forming a hydrophobic film layer on one side of the optical stack, wherein the hydrophobic film layer covers the light-transmitting region of the optical stack corresponding to the optical body layer, and a side of the hydrophobic film layer facing away from the optical stack is a hydrophobic rough surface having a first micro-nano structure;

[0195] Step S300: combining an optical cover plate including an optical stack with an optical device to form an optical assembly, wherein the hydrophobic rough surface is arranged toward the optical device.

[0196] It should be noted that, by providing the hydrophobic film layer 42 and the hydrophobic rough surface, the side of the optical stack provided with the hydrophobic rough surface has hydrophobic properties at the light-transmitting area 414 of the optical body layer 41. Since the hydrophobic rough surface is provided toward the optical device, the side of the optical stack provided with the hydrophobic rough surface can be used as the inner surface of the optical cover plate 4, and the light-transmitting area 414 of the optical body layer 41 can be used as the light-transmitting area 414 of the optical cover plate 4. The light-transmitting area of ​​the optical stack is located at a position relative to the optical device (such as the camera module 3) to be blocked, so that the ambient light can pass through the light-transmitting area of ​​the optical stack and enter the optical device.

[0197] In this way, when the optical cover plate 4 is combined with the optical device to form an optical assembly and the inner surface of the optical cover plate 4 is facing the optical device, the water drop angle and the oil drop angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414 can be increased, and the rolling angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414 can be reduced, thereby effectively avoiding the proportion of haze-like dirt on the optical cover plate 4 after the entire electronic device 100 is coated.

[0198] The description of the light-transmitting region 414 and the first micro-nano structure 4211 may refer to the above-mentioned related description, and will not be further elaborated here.

[0199] The step S100 of preparing an optical stack may specifically include:

[0200] Treating one side of a plate to be treated 4111 to form an optical stack, wherein the plate to be treated is an untreated glass plate;

[0201] Among them, the optical stack may include a substrate 411 and a first anti-reflection layer 412, the first anti-reflection layer 412 covers the side of the substrate 411 facing the hydrophobic film layer 42, the side of the first anti-reflection layer 412 facing the hydrophobic film layer 42 is a rough surface having a second micro-nano structure 4121, the hydrophobic film layer 42 is located on the first anti-reflection layer 412, and covers the light-transmitting area 414 of the first anti-reflection layer 412 corresponding to the optical body layer 41.

[0202] It should be noted that the treatment of the plate 4111 to be treated may include but is not limited to etching or corrosion. In this way, by setting the first anti-reflection layer 412, due to the presence of the second micro-nano structure 4121, it is not only possible to facilitate the formation of the first micro-nano structure 4211 on the hydrophobic film layer 42, increase the water drop angle and oil drop angle of the optical cover plate 4 on the surface of the hydrophobic film layer 42, reduce the rolling angle, and reduce the proportion of haze-like dirt on the optical cover plate 4 in the light-transmitting area 414, but also reduce the reflectivity of the surface of the hydrophobic film layer 42, and weaken the intensity of ghost images in photos taken in general scenes and strong contrast environments.

[0203] The method for processing one side of the plate 4111 to be processed can be a corresponding processing method according to the different structures of the second micro-nano structure 4121. The method for processing one side of the plate 4111 to be processed is further described below in combination with the second micro-nano structure 4121 with different structures.

[0204] The second micro-nano structure 4121 includes a plurality of protrusions 4122. The protrusions 4122 are micrometer-scale and / or nanometer-scale protrusions, or the second micro-nano structure 4121 includes a plurality of depressions, and the depressions are micrometer-scale and / or nanometer-scale depressions.

[0205] When the second micro-nano structure 4121 includes a plurality of protrusions 4122, the plurality of protrusions 4122 can be obtained by surface processing methods well known to those skilled in the art such as metal mask, diamond fly cutter, chemical etching, etc., and the present application has no special limitation on this.

[0206] refer to Fig.19 As shown, taking a metal mask as an example, one side of the plate to be processed 4111 is processed to form an optical stack, which may specifically include:

[0207] Under vacuum conditions, a metal film is formed on the plate to be processed 4111, and the metal film is heat-treated to shrink the metal film, thereby obtaining a particle template (not shown in the figure) having a plurality of particles 4125;

[0208] Plasma etching is performed on the particle template to form a second micro-nano structure 4121 on the particle surface of the particle template;

[0209] The particle template is cleaned to obtain an optical stack, wherein the portion of the second micro-nano structure 4121 is the first anti-reflection layer 412 , and the portion of the optical stack excluding the first anti-reflection layer 412 is the substrate 411 .

[0210] In this way, the areas on the treated plate 4111 not covered by the particles 4125 can be etched by a metal mask method to form an optical stack including a substrate and a plurality of second micro-nano structures 4121. The layered structure where the plurality of second micro-nano structures 4121 are located forms a first anti-reflection layer 412, and the points where the plurality of second micro-nano structures 4121 are located form convex points on the surface of the first anti-reflection layer 412, and the points between the second micro-nano structures 4121 form concave points on the surface of the first anti-reflection layer 412, so that the first anti-reflection layer 412 forms a gradient film layer.

[0211] The first anti-reflection layer 412 can be a light trap layer to reduce the reflectivity of the inner surface of the optical cover plate 4 and weaken the ghosting of the electronic device 100 when taking pictures. At the same time, it can cooperate with the hydrophobic film layer 42 to increase the water drop angle and oil drop angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414, reduce the rolling angle of the light-transmitting area 414 on the inner surface of the optical cover plate 4, and reduce the proportion of fog-like dirt 43 in the light-transmitting area 414.

[0212] It should be noted that the present application can form a metal film on the to-be-processed board 4111 by vacuum deposition or liquid coating. Vacuum deposition may include but is not limited to chemical vapor deposition, physical vapor deposition, thermal deposition, electron beam evaporation deposition or atomic layer deposition, chemical vapor deposition may include but is not limited to vacuum evaporation, and physical vapor deposition may include but is not limited to sputtering. Liquid coating may include but is not limited to spraying, dipping, spin coating and the like.

[0213] Exemplarily, the metal film may include but is not limited to molybdenum film, indium film, etc. Taking vacuum sputtering and molybdenum film as an example, the process parameters required for forming the molybdenum film may be set in the coating machine first, and the process parameters include but are not limited to film thickness, vacuum degree, temperature, sputtering power, gas flow rate, time, etc., and then the plate to be coated 4111 is loaded onto the substrate rack, placed in the coating machine, and vacuumed to a corresponding degree to complete the coating.

[0214] It should be noted that after the coating is completed, the molybdenum target and the gas are turned off, and when the vacuum reaches the preset parameters, the molybdenum film is heat treated (such as heated). By setting the parameters in the heat treatment, such as the heating rate, the holding temperature after heating, and the insulation time, a particle template of nanoparticles of a preset diameter can be obtained. After obtaining the particle template, the part of the particle template where the particles 4125 are not provided can be etched by methods such as plasma etching to form a plurality of nano-scale protrusions 4122 (nano-protrusions) with a certain height and bottom size on the surface of the particle template covered by the particles 4125, and the plurality of protrusions 4122 are interconnected to form a second micro-nano structure 4121.

[0215] The particle template is cleaned, which may include:

[0216] At room temperature, after the molybdenum film on the surface of the protrusion 4122 is cleaned with a deplating solution, an optical stack having a first anti-reflection layer 412 can be obtained.

[0217] The present application embodiment has no special restrictions on the parameters of vacuum sputtering to form the molybdenum film, the parameters in the heat treatment, and the parameters in the plasma etching, and those skilled in the art can select them as needed. In order to subsequently form nanoparticles, in one embodiment, the thickness of the molybdenum film can be 3nm to 8nm.

[0218] In order to make the diameter of the obtained nanoparticles 50nm to 70nm and evenly distributed, the heating rate of the heat treatment is 15℃ / min to 25℃ / min, heated to 100℃ to 200℃, and kept warm for 6min to 10min. In order not to affect the transmission of light and reduce the reflectivity of the surface of the first anti-reflection layer 412, the height of the protrusion 4122 formed after etching can be 50nm to 200nm, and the size of the bottom 4123 is 150nm to 450nm.

[0219] Alternatively, in some embodiments, taking chemical etching as an example, processing is performed on one side of the to-be-processed board 4111 to form an optical stack, which may specifically include:

[0220] Chemically corrode the plate to be processed 4111 to form a second micro-nano structure 4121 on one surface of the plate to be processed 4111;

[0221] The second micro-nano structure 4121 is the first anti-reflection layer 412 , and the portion of the optical stack except the first anti-reflection layer 412 is the substrate 411 .

[0222] In this way, the second micro-nano structure 4121 can be formed on the surface of the plate to be processed 4111 by chemical etching, so as to reduce the reflectivity of the inner surface of the optical cover plate 4 at the light-transmitting area 414, and increase the water drop angle and oil drop angle of the inner surface of the optical cover plate 4 at the light-transmitting area 414. The first anti-reflection layer 412 formed by chemical etching can also be a light trap layer.

[0223] The chemical etching of the plate to be processed 4111 may specifically include:

[0224] After cleaning the surface of the treated board 4111, first, the treated board 4111 is placed in a corrosion tank filled with a first etching liquid, left for a first preset time, taken out for cleaning, and then, the treated board 4111 is placed in a corrosion tank filled with a second etching liquid, left for a second preset time, taken out for cleaning, and finally, the treated board 4111 is dried and cooled to obtain an optical laminate with a single-side reflectivity of less than 0.03%, which can also be called anti-reflection glass.

[0225] The embodiment of the present application has no special restrictions on the parameters of the optical stack formed by chemical etching with a single-side reflectivity of less than 0.03%, and those skilled in the art can select them according to their needs. In order to obtain the expected reflectivity, the first etching solution may include a mixed solution containing 0.001% HF and 1% HCl, and the second etching solution may include a mixed solution containing 0.001% HF and 0.0001% Na2SiO3.

[0226] It should be noted that, in some embodiments, a porous coating may be coated on the plate to be processed 4111 to form an optical stack. In this case, the porous coating may be understood as the first anti-reflection layer 412 in the optical stack, and the plate to be processed 4111 may be understood as the substrate 411 in the optical stack.

[0227] Fig. 20 The flowchart of the method for preparing the hydrophobic film layer 42 in the optical cover plate 4 is shown.

[0228] refer to Fig. 20 Combined with Fig.18 As shown, a hydrophobic film layer 42 is formed on one side of the optical stack, specifically comprising:

[0229] Step S210: A hydrophobic layer having a first micro-nano structure is formed on a side of the substrate having a second micro-nano structure, the first micro-nano structure is located on the second micro-nano structure, and covers a light-transmitting area of ​​the first anti-reflection layer corresponding to the optical body layer, the side of the hydrophobic layer facing the optical device is a hydrophobic rough surface, and the hydrophobic film layer includes a hydrophobic layer.

[0230] In this way, by setting the hydrophobic layer 421, a hydrophobic rough surface can be formed on the side of the hydrophobic layer 421 facing the optical device, so that the optical stack can have a hydrophobic and oleophobic function on the hydrophobic rough surface without affecting the reflectivity of the substrate 411 on the surface of the first anti-reflection layer 412, so as to combine with the first micro-nano structure 4211, increase the water drop angle and oil drop angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414, reduce the rolling angle of the inner surface of the optical cover plate 4 in the light-transmitting area 414, and thus reduce the proportion of the haze-like dirt 43 formed on the inner surface of the optical cover plate 4. Among them, the material and thickness of the hydrophobic layer 421 can refer to the relevant description above, and no further description is given here.

[0231] It should be noted that, similar to the formation of the metal film, the present application can form a hydrophobic layer 421 on the second micro-nano structure 4121 of the substrate 411 by vacuum deposition or liquid coating. The hydrophobic layer 421 may include but is not limited to a perfluoropolyether layer. Taking the perfluoropolyether layer as an example, the present application can form a hydrophobic layer 421 on the second micro-nano structure 4121 of the substrate 411 by vacuum deposition or liquid coating. The hydrophobic layer 421 may include but is not limited to a perfluoropolyether layer. Taking the perfluoropolyether layer as an example, the present application can form a hydrophobic layer 421 that is anti-pollution by vacuum evaporation, by setting the parameters in the vacuum evaporation process according to the desired thickness of the perfluoropolyether layer, so that the perfluoropolyether is heated and vaporized, thereby condensing on the second micro-nano structure 4121 of the substrate 411.

[0232] The present application embodiment has no special restrictions on the thickness of the perfluoropolyether layer and the parameters of the vacuum evaporation to form the perfluoropolyether layer, and those skilled in the art can select them according to their needs. In some embodiments, in order to form a perfluoropolyether layer with a good hydrophobic effect while not affecting the morphology of the first micro-nano structure 4211, the thickness of the perfluoropolyether layer can be 10nm-30nm.

[0233] refer to Fig. 20 Combined with Fig.18 As shown, in some embodiments, before forming the hydrophobic layer 421 having the first micro-nano structure 4211 on the side of the substrate 411 having the second micro-nano structure 4121, the preparation method may further include:

[0234] Step S201: forming a coating layer having a third micro-nano structure on one side of the substrate having the second micro-nano structure, wherein the third micro-nano structure covers the second micro-nano structure and is bonded between the second micro-nano structure and the first micro-nano structure, and the hydrophobic film layer also includes the coating layer.

[0235] It should be noted that, by setting the bottom layer 422, not only the bottom layer 422 has a good bonding strength on the first anti-reflection layer 412, but also because the bottom layer 422 has a high surface activity, it can absorb the hydrophobic layer 421 onto the first anti-reflection layer 412, increase the adhesion of the hydrophobic layer 421 on the first anti-reflection layer 412, and make the hydrophobic layer 421 stably adsorbed on the first anti-reflection layer 412 and not easy to fall off. Among them, the material and thickness of the bottom layer 422 can refer to the relevant description above, and no further description is given here.

[0236] Similar to the formation of the metal film, the present application can form the base layer 422 on the first anti-reflection layer 412 by vacuum deposition or liquid coating. Taking the silicon dioxide layer as an example, the present application can form the base layer 422 by sputtering coating. The present application embodiment has no special restrictions on the parameters of the sputtering coating for forming the base layer 422, and those skilled in the art can select as needed. In some embodiments, in order to ensure that the hydrophobic layer 421 is stably adsorbed on the first anti-reflection layer 412 without affecting the morphology of the first micro-nano structure 4211, the thickness of the base layer 422 can be 8nm-13nm.

[0237] It should be noted that in the process of forming the base layer 422 and the hydrophobic layer 421, the fully automatic visual special-shaped placement machine is required to accurately position to ensure the accuracy of the non-light-transmitting area 415 and prevent the base layer 422 and the hydrophobic layer 421 from being plated to the bonding area 4151 of the optical cover 4, affecting the bonding between the camera module 3 and the optical cover 4.

[0238] like Fig.18 As shown, after forming the hydrophobic film layer 42 on one side of the optical stack and before combining the optical cover plate 4 including the optical stack with the optical device to form an optical component, the preparation method may further include:

[0239] A second anti-reflection layer 413 is formed on a side of the optical stack away from the hydrophobic film layer 42 . The optical body layer 41 further includes the second anti-reflection layer 413 .

[0240] It should be noted that, since the optical cover plate 4 includes an optical body layer 41 and a hydrophobic film layer 42, the reflectivity of the optical body layer 41 facing away from the hydrophobic film layer 42 (the outer surface of the optical cover plate 4) can be reduced to less than 0.3% by setting the second anti-reflection layer 413, which effectively prevents the generation of ghost images when the electronic device 100 takes pictures in general scenes and strong contrast scenes, and can also protect the outer surface of the optical cover plate 4 from being scratched. Among them, the description of the second anti-reflection layer 413 can refer to the relevant description in the above, and will not be further elaborated here.

[0241] In the film design of the second anti-reflection layer 413, film design software such as TFCALC and Macleod can be used to design the film according to optical requirements, and then deposition is performed according to the designed film structure, so that the second anti-reflection layer 413 formed after deposition can meet the single-sided reflectivity average value requirement of visible light in the 380nm~780nm band is less than 0.3%, ensuring that the visible light in this band has a high transmittance.

[0242] Since the transmittance requirement for the above-mentioned visible light band is relatively high, a film stack 2H can be used, and the second film layer 4132 is made of a film material with high hardness and relatively low refractive index. For example, the film material of the second film layer 4132 can be SiO2. The first film layer 4131 uses a film material with a refractive index lower than that of the second film layer 4132. For example, the film material of the first film layer 4131 can be Si3N4. The initial film system is formed in the optical thin film software, thus forming a film system consisting of the first film layer 4131 and the second film layer 4132 stacked alternately. Then enter the band optimization conditions in the continuous target to ensure that the transmittance and reflectivity meet the requirements. Finally, enter the Lab value requirements in the color target to ensure that the color of the transmitted light is colorless. After a series of optimization designs, the second anti-reflection layer 413 that meets the above requirements is obtained.

[0243] In one embodiment, a vacuum sputtering coating machine can be used to coat the optical stack formed with a hydrophobic film layer 42 to form an optical cover plate 4 having a second anti-reflection layer 413. The coating parameters can be selected according to the materials of each layer of the film structure, and the present application has no special restrictions on this. For example, the coating parameters of the first film layer 4131 can be: sputtering power of silicon target: 7000W~8000W, Ar flow: 100sccm~150sccm, N2 flow: 50sccm~100sccm, RadicalSource (radical ion source) power: 4000W~5000W. The coating parameters of the second film layer 4132 can be: sputtering power of silicon target: 7500W~8500W, Ar flow: 200sccm~300sccm, O2 flow: 100sccm~150sccm; RadicalSource power: 4000W~5000W.

[0244] It should be noted that, in some embodiments, during the preparation of the optical cover plate 4, after forming the optical stack, a second anti-reflection layer 413 may be first formed on the side of the optical stack facing away from the first anti-reflection layer 412, and finally a hydrophobic film layer 42 may be formed on the first anti-reflection layer 412 of the optical stack.

[0245] Alternatively, in some embodiments, during the preparation process of the optical cover plate 4, the second anti-reflection layer 413 may be first formed on one side of the plate to be processed 4111, and then the first anti-reflection layer 412 and the hydrophobic film layer 42 may be sequentially formed on the other side of the plate to be processed 4111. In the present application, the preparation order of the second anti-reflection layer 413 is not further limited.

[0246] A method for preparing the optical cover plate 4 of the present application is further described below in conjunction with specific embodiments.

[0247] Example 1

[0248] 1. Preparation of optical stack

[0249] Step 1: Vacuum sputtering of molybdenum film on the plate to be processed

[0250] The thickness of the molybdenum film is set to 5 nm and input into the coating machine. Then the process parameters are set: background vacuum 5.0×10 - 4 Pa, the temperature was set to 80°C;

[0251] In order to enhance the adhesion between the film layer and the substrate 4111 to be processed, radio frequency magnetron sputtering (RF) is used for pre-treatment before coating. The specific parameters are as follows: the power of the Radical Source is 4500 W, the Ar flow rate is 0 sccm, the O2 flow rate is 120 sccm, the N2 flow rate is 0 sccm, and the time is 240 s.

[0252] In order to obtain the above molybdenum film with a thickness of 5 nm, the coating parameters were set as follows: the sputtering power of the molybdenum target was 3000 W, and the Ar flow rate was 120 sccm.

[0253] Load the plate 4111 to be coated onto the substrate rack, put it into the above-mentioned coating machine, close the door to evacuate, enter the coating program, click to start film formation (metal molybdenum coating), and complete the coating.

[0254] Step 2: Heat treatment of molybdenum film

[0255] 1) After the coating is completed, turn off the molybdenum target and gas, and wait until the vacuum reaches 5.0×10 -3 Pa, heat the molybdenum film at a heating rate of 20°C / min, heat to 120°C and keep warm for 7min, and obtain a uniformly distributed nanoparticle template, where the diameter of the particles 4125 on the nanoparticle template is 50-70nm;

[0256] 2) Air intake, cooling time 5min, air intake time: 3min;

[0257] 3) Take the wafer, transfer it into the plasma etching equipment, and wait for etching.

[0258] Step 3: Plasma Etching

[0259] 1) Plasma etching parameters: reactive ion etching power is 500W, the chamber pressure in the plasma etching equipment is 10Pa, and the background vacuum is 5.0×10 -3 Pa, reactive ion etching power of 500W, argon flow rate of 40SCCM, trifluoromethane of 5SCCM, etching time of 10min, after etching, a plurality of interconnected protrusions 4122 are constructed on the surface of the optical stack, and the protrusions 4122 are nano-scale protrusions. Among them, a plurality of nano-scale protrusions can form a second micro-nano structure 4121. The height of the protrusion 4122 is 120nm, and the size of the bottom 4123 is 200nm;

[0260] 2) Air intake, cooling time is 5 minutes, air intake time is 3 minutes;

[0261] 3) Take the film.

[0262] Step 4: Clean and remove the residual molybdenum film

[0263] At room temperature, the residual metal molybdenum film layer is cleaned with a deplating solution, and then the surface of the board 4111 to be treated is cleaned with pure water to obtain an optical stack with low single-sided reflectivity and high transmittance.

[0264] According to tests, the transmittance of visible light in the formed optical stack is 90%, and the reflectivity on the side of the optical stack having the second micro-nano structure 4121 is reduced to less than 0.03%.

[0265] 2. Preparation of hydrophobic membrane layer

[0266] Step 1: Plasma surface treatment

[0267] 1) The parameters of plasma surface treatment are: background vacuum 5.0×10 -3 Pa;

[0268] 2) In order to enhance the adhesion between the film layer and the substrate 411, the optical stack is subjected to anodic plasma treatment before coating, with specific parameters: power of 1KW-5KW, Ar flow of 200sccm, O2 flow of 80sccm, and time of 240s;

[0269] Step 2: Base coating

[0270] Taking the silicon dioxide layer as an example, in order to obtain the bottom layer 422, the background vacuum is 5.0×10 -3Pa, the magnetron sputtering coating parameters were set as follows: the sputtering power of the silicon target was 8KW, the Ar flow rate was 250sccm, the Ar flow rate was 250sccm, the O2 flow rate was 120sccm, and the coating time was 2min. According to the above-mentioned coating process of vacuum sputtering molybdenum film on the plate to be processed 4111, a base layer 422 with a thickness of 8nm-13nm was obtained.

[0271] Step 3: Hydrophobic coating

[0272] Taking the perfluoropolyether layer as an example, in order to obtain an anti-pollution hydrophobic layer 421, the vacuum evaporation parameters are set as follows: coating current is 260A, Ar flow rate is 220sccm, O2 flow rate is 220sccm, and coating time is 3min. Under the above vacuum evaporation parameters, perfluoropolyether can be evaporated on the base layer 422 to form a 10nm-30nm thick hydrophobic layer 421.

[0273] 3. Preparation of the Second Anti-reflection Layer

[0274] Step 1: Membrane structure design

[0275] The film system design of the second anti-reflection layer 413 is based on TFCALC. The average single-side reflectivity of 380-780nm is required to be less than 0.3%. Due to the high transmittance requirement in the visible light band, a film stack 2H is used in the film system. The film material of the first film layer 4131 (L) is SiO2 with high hardness and relatively low refractive index. The film material of the second film layer 4132 (H) is Si3N4. The initial film system LH is formed in the optical thin film software, thus forming a film system in which the first film layer 4131 and the second film layer 4132 are alternately stacked. After a series of optimization designs, the film system structure of the second anti-reflection layer 413 is shown in Table 1:

[0276] Table 1 shows the film structure of the optical cover plate including the second anti-reflection layer of the first film system.

[0277]

[0278]

[0279] Step 2: Forming a second anti-reflection layer 413 on the substrate 411 Input the film thickness of each layer in the second anti-reflection layer 413 designed in Table 1 into the coating machine and set the process parameters: background vacuum 5.0×10 -4 , the temperature is set to 80 degrees Celsius;

[0280] In order to enhance the adhesion between the film layer and the substrate 411, RF pretreatment is performed before coating, with specific parameters as follows: RadicalSource power of 4500 W, Ar flow of 0 sccm, O2 flow of 120 sccm, N2 flow of 0 sccm, and time of 240 s.

[0281] In order to obtain the physical thickness of Si3N4 designed above, the coating parameters were set as follows: the sputtering power of the aluminum target was 7500W, the Ar flow rate was 120sccm, the N2 flow rate was 80sccm, and the RadicalSource power was 4500W.

[0282] In order to obtain the physical thickness of SiO2 designed above, the coating parameters were set as follows: the sputtering power of the silicon target was 8000W, the Ar flow rate was 250sccm, the RadicalSource power was 4500W, the Ar flow rate was 250sccm, and the O2 flow rate was 120sccm.

[0283] After coating is completed, a high-performance optical cover plate 4 with a transmittance of 98.45%, a reflectivity of less than 0.3% on the outer surface, a water drop angle greater than 150° at the inner surface transmission area, a reflectivity of less than 0.03%, an outer surface Vickers hardness of 1580HV, a hardness of 1300 grams-force, and a Mohs hardness of 7 is obtained.

[0284] Example 2

[0285] 1. Preparation of optical stack

[0286] Step 1: Vacuum sputtering of molybdenum film on the plate to be processed

[0287] The thickness of the molybdenum film is set to 5 nm and input into the coating machine. Then the process parameters are set: background vacuum 5.0×10 - 4 Pa, the temperature was set to 80°C;

[0288] In order to enhance the adhesion between the film layer and the substrate 4111 to be processed, radio frequency magnetron sputtering (RF) is used for pre-treatment before coating. The specific parameters are as follows: the power of the Radical Source is 4500 W, the Ar flow rate is 0 sccm, the O2 flow rate is 120 sccm, the N2 flow rate is 0 sccm, and the time is 240 s.

[0289] In order to obtain the above molybdenum film with a thickness of 5 nm, the coating parameters were set as follows: the sputtering power of the molybdenum target was 3000 W, and the Ar flow rate was 120 sccm.

[0290] Load the plate 4111 to be coated onto the substrate rack, put it into the above-mentioned coating machine, close the door to evacuate, enter the coating program, click to start film formation (metal molybdenum coating), and complete the coating.

[0291] Step 2: Heat treatment of molybdenum film

[0292] 1) After the coating is completed, turn off the molybdenum target and gas, and wait until the vacuum reaches 5.0×10 -3 Pa, heat the molybdenum film at a heating rate of 25°C / min, heat to 150°C and keep warm for 6min-10min, obtain a uniformly distributed nanoparticle template, and the diameter of the nanoparticles on the nanoparticle template is 60nm-80nm;

[0293] 2) Air intake, cooling time is 5 minutes, air intake time is 3 minutes;

[0294] 3) Take the wafer, transfer it into the plasma etching equipment, and wait for etching.

[0295] Step 3: Plasma Etching

[0296] 1) Plasma etching parameters: reactive ion etching power is 500W, the chamber pressure in the plasma etching equipment is 10Pa, and the background vacuum is 5.0×10 -3 Pa, reactive ion etching power of 500W, argon flow rate of 40SCCM, trifluoromethane of 5SCCM, etching time of 10min, after etching, a plurality of interconnected protrusions 4122 are constructed on the surface of the optical stack, the protrusions 4122 are nano-scale protrusions, and a plurality of nano-scale protrusions form a second micro-nano structure 4121. The height of the protrusion 4122 is 50nm-120nm, and the size of the bottom 4123 is 170nm-500nm;

[0297] 2) Air intake, cooling time is 5 minutes, air intake time is 3 minutes;

[0298] 3) Take the film.

[0299] Step 4: Clean and remove the residual molybdenum film

[0300] At room temperature, the residual metal molybdenum film layer is cleaned with a deplating solution, and then the surface of the board 4111 to be treated is cleaned with pure water to obtain an optical stack with low single-sided reflectivity and high transmittance.

[0301] According to tests, the transmittance of visible light in the formed optical stack is 98.45%, and the reflectivity on the side of the optical stack having the second micro-nano structure 4121 is reduced to less than 0.03%.

[0302] 2. Preparation of hydrophobic membrane layer

[0303] Step 1: Plasma surface treatment

[0304] 1) The parameters of plasma surface treatment are: background vacuum 5.0×10 -3 Pa;

[0305] 2) In order to enhance the adhesion between the film layer and the substrate 411, the optical stack is subjected to anodic plasma treatment before coating, with specific parameters: power of 1KW-5KW, Ar flow of 200sccm, O2 flow of 80sccm, and time of 240s;

[0306] Step 2: Base coating

[0307] Taking the silicon dioxide layer as an example, in order to obtain the bottom layer 422, the background vacuum is 5.0×10 -3 Pa, the magnetron sputtering coating parameters were set as follows: the sputtering power of the silicon target was 8KW, the Ar flow rate was 250sccm, the Ar flow rate was 250sccm, the O2 flow rate was 120sccm, and the coating time was 2min. According to the above-mentioned coating process of vacuum sputtering molybdenum film on the plate to be processed 4111, a base layer 422 with a thickness of 3nm-13nm was obtained.

[0308] Step 3: Hydrophobic coating

[0309] Taking the perfluoropolyether layer as an example, in order to obtain an anti-pollution hydrophobic layer 421, the vacuum evaporation parameters are set as follows: coating current is 260A, Ar flow rate is 220sccm, O2 flow rate is 220sccm, and coating time is 3min. Under the above vacuum evaporation parameters, perfluoropolyether can be evaporated on the base layer 422 to form a 5nm-30nm thick hydrophobic layer 421.

[0310] 3. Preparation of the Second Anti-reflection Layer

[0311] Step 1: Membrane structure design

[0312] The film system design of the second anti-reflection layer 413 is based on TFCALC. The average single-side reflectivity of 380-780nm is required to be less than 0.3%. Due to the high transmittance requirement in the visible light band, a film stack 2H is used in the film system. The film material of the first film layer 4131 (L) is SiO2 with high hardness and relatively low refractive index. The film material of the second film layer 4132 (H) is Si3N4. The initial film system LH is formed in the optical thin film software, thus forming a film system composed of the first film layer 4131 and the second film layer 4132 alternately stacked. After a series of optimization designs, the film system structure of the second anti-reflection layer 413 is shown in Table 2:

[0313] Table 2 shows the film structure of the optical cover plate including the second anti-reflection layer of the second film system.

[0314]

[0315] Step 2: Forming a second anti-reflection layer 413 on the substrate 411 Input the film thickness of each layer in the second anti-reflection layer 413 designed in Table 2 into the coating machine and set the process parameters: background vacuum 5.0×10 -4 , the temperature is set to 80 degrees Celsius;

[0316] In order to enhance the adhesion between the film layer and the substrate 411, RF pretreatment is performed before coating, with specific parameters as follows: RadicalSource power of 4500 W, Ar flow of 0 sccm, O2 flow of 120 sccm, N2 flow of 0 sccm, and time of 240 s.

[0317] In order to obtain the physical thickness of Si3N4 designed above, the coating parameters were set as follows: the sputtering power of the aluminum target was 7500W, the Ar flow rate was 120sccm, the N2 flow rate was 80sccm, and the RadicalSource power was 4500W.

[0318] In order to obtain the physical thickness of SiO2 designed above, the coating parameters were set as follows: the sputtering power of the silicon target was 8000W, the Ar flow rate was 250sccm, the RadicalSource power was 4500W, the Ar flow rate was 250sccm, and the O2 flow rate was 120sccm.

[0319] After coating, an optical cover plate 4 with a transmittance of 98.45%, a reflectivity of the outer surface of less than 0.3%, a water drop angle of more than 150° at the inner surface transmission area, and a reflectivity of the inner surface of less than 0.03% is obtained.

[0320] Example 3

[0321] 1. Preparation of optical stack

[0322] Step 1:

[0323] The surface of the treated board 4111 is cleaned with a cleaning agent and then rinsed with deionized water. The cleaned treated board 4111 is placed in a corrosion tank containing a first etching solution for 3 hours, and then taken out and rinsed with deionized water. For example, the first etching solution is a mixed solution containing 0.001% HF and 1% HCl.

[0324] Step 2:

[0325] The cleaned board 4111 to be processed is placed in a corrosion tank containing a second etching solution for 20 hours, and then taken out and rinsed with deionized water. For example, the second etching solution is a mixed solution containing 0.001% HF and 0.0001% Na2SiO3.

[0326] Step 3:

[0327] The plate 4111 to be processed after cleaning again is placed in a drying oven at 300°C for 60 minutes, and the heating switch of the oven is turned off. When the temperature drops to 50°C, the plate 4111 to be processed is taken out of the oven to obtain an optical laminate with a single-sided reflectivity of less than 0.03%, which is a single-sided anti-reflection glass. The surface of the prepared optical laminate has a plurality of depressions, which are micron-scale and / or nano-scale depressions, and the plurality of depressions form a second micro-nano structure 4121. The layer where the second micro-nano structure 4121 is located is the first anti-reflection layer 412.

[0328] 2. Preparation of hydrophobic membrane layer

[0329] Step 1: Plasma surface treatment

[0330] 1) The parameters of plasma surface treatment are: background vacuum 5.0×10 -3 Pa;

[0331] 2) In order to enhance the adhesion between the film layer and the substrate 411, the optical stack is subjected to anodic plasma treatment before coating, with specific parameters: power of 1KW-5KW, Ar flow of 200sccm, O2 flow of 80sccm, and time of 240s;

[0332] Step 2: Base coating

[0333] Taking the silicon dioxide layer as an example, in order to obtain the bottom layer 422, the background vacuum is 5.0×10 -3 Pa, the magnetron sputtering coating parameters were set as follows: the sputtering power of the silicon target was 8KW, the Ar flow rate was 250sccm, the Ar flow rate was 250sccm, the O2 flow rate was 120sccm, and the coating time was 2min. According to the above-mentioned coating process of vacuum sputtering molybdenum film on the plate to be processed 4111, a base layer 422 with a thickness of 8nm-13nm was obtained.

[0334] Step 3: Hydrophobic coating

[0335] Taking the perfluoropolyether layer as an example, in order to obtain an anti-pollution hydrophobic layer 421, the vacuum evaporation parameters are set as follows: coating current is 260A, Ar flow rate is 220sccm, O2 flow rate is 220sccm, and coating time is 3min. Under the above vacuum evaporation parameters, perfluoropolyether can be evaporated on the base layer 422 to form a 10nm-30nm thick hydrophobic layer 421.

[0336] 3. Preparation of the Second Anti-reflection Layer

[0337] Step 1: Membrane structure design

[0338] The film system design of the second anti-reflection layer 413 is based on TFCALC. The average single-side reflectivity of 380-780nm is required to be less than 0.3%. Due to the high transmittance requirement in the visible light band, a film stack 2H is used in the film system. The film material of the first film layer 4131 (L) is SiO2 with high hardness and relatively low refractive index. The film material of the second film layer 4132 (H) is Si3N4. The initial film system LH is formed in the optical thin film software, thus forming a film system in which the first film layer 4131 and the second film layer 4132 are alternately stacked. After a series of optimization designs, the film system structure of the second anti-reflection layer 413 is shown in Table 1:

[0339] Table 3 shows the film structure of the optical cover plate including the second anti-reflection layer of the third film system

[0340]

[0341] Step 2: Forming a second anti-reflection layer 413 on the substrate 411 Input the film thickness of each layer in the second anti-reflection layer 413 designed in Table 3 into the coating machine and set the process parameters: background vacuum 5.0×10 -4 , the temperature is set to 80 degrees Celsius;

[0342] In order to enhance the adhesion between the film layer and the substrate 411, RF pretreatment is performed before coating, with specific parameters as follows: RadicalSource power of 4500 W, Ar flow of 0 sccm, O2 flow of 120 sccm, N2 flow of 0 sccm, and time of 240 s.

[0343] In order to obtain the physical thickness of Si3N4 designed above, the coating parameters were set as follows: the sputtering power of the aluminum target was 7500W, the Ar flow rate was 120sccm, the N2 flow rate was 80sccm, and the RadicalSource power was 4500W.

[0344] In order to obtain the physical thickness of SiO2 designed above, the coating parameters were set as follows: the sputtering power of the silicon target was 8000W, the Ar flow rate was 250sccm, the RadicalSource power was 4500W, the Ar flow rate was 250sccm, and the O2 flow rate was 120sccm.

[0345] After coating is completed, a high-performance optical cover plate 4 with a transmittance of 98.45%, a reflectivity of less than 0.3% on the outer surface, a water drop angle greater than 150° at the inner surface transmission area, a reflectivity of less than 0.03%, an outer surface Vickers hardness of 1580HV, a hardness of 1300 grams-force, and a Mohs hardness of 7 is obtained.

[0346] On the basis of the above, the electronic device 100 provided in the embodiment of the present application can adopt a housing and any of the above optical components, the optical device in the optical component is located in the receiving space of the housing 2, and the optical cover 4 replaces the original optical cover 4a and is located on the housing 2, and covers the light incident surface 321 of the optical device. While protecting the optical device (such as the camera module 3) and effectively preventing the intensity of ghost images in the photos taken by the camera module 3 in a strong contrast environment, it can also ensure that the water drop angle of the inner surface of the optical cover 4 in the light-transmitting area 414 is greater than 150°, effectively reducing the proportion of haze-like dirt 43 generated on the inner surface of the optical cover 4.

[0347] It should be noted that, taking the camera module 3 as an example, the structure of the shell 2, the formation of the receiving space and the arrangement of the optical device in the receiving space can refer to the above description of the electronic device 100, and no further details will be given here.

[0348] In the description of the embodiments of the present application, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, or it can be an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the embodiments of the present application can be understood according to specific circumstances.

[0349] The terms "first", "second", "third", "fourth", etc. (if any) in the description and claims of the embodiments of the present application and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence.

Claims

1. An optical component, characterized in that: include: Optics; An optical cover plate, wherein the optical cover plate comprises an optical body layer, the optical body layer shields the light incident surface of the optical device and has a light-transmitting area arranged opposite to the optical device; The optical cover plate further comprises a hydrophobic film layer, which is light-transmissive and is located on a side of the optical body layer facing the optical device and covers the light-transmissive area; wherein a side of the hydrophobic film layer facing the optical device is a hydrophobic rough surface having a first micro-nano structure; The optical body layer of the optical cover plate comprises a substrate and a first anti-reflection layer, wherein the first anti-reflection layer covers a side of the substrate facing the hydrophobic film layer, and a side of the first anti-reflection layer facing the hydrophobic film layer is a rough surface having a second micro-nano structure, wherein the first micro-nano structure is attached to and covers the second micro-nano structure; The shape of the first micro-nano structure matches the shape of the second micro-nano structure; The refractive index of the first anti-reflection layer is configured to gradually change from the refractive index corresponding to the first anti-reflection layer to the refractive index corresponding to air along the direction from the substrate to the hydrophobic film layer.

2. The optical component according to claim 1, characterized in that The optical device is a camera module, and the camera module includes a lens, wherein: The optical body layer blocks the light incident surface of the lens; and The position of the light-transmitting area in the optical body layer is opposite to the position of the lens.

3. The optical component according to claim 2, characterized in that The camera module also includes a module body, and the lens is located on a side of the module body facing the optical cover, wherein the non-light-transmitting area in the optical body layer is surrounded by the peripheral edge of the light-transmitting area, and the non-light-transmitting area is blocked on the module body.

4. The optical component according to any one of claims 1 to 3, characterized in that: The hydrophobic film layer of the optical cover plate comprises a hydrophobic layer, which is located on the side of the optical body layer facing the optical device and covers the light-transmitting area, and the side of the hydrophobic layer facing the optical device is the hydrophobic rough surface.

5. The optical component according to claim 1, characterized in that The second micro-nano structure includes a plurality of protrusions, wherein: The bottom end of the protrusion is connected to the substrate, the top end of the protrusion is arranged toward the hydrophobic film layer, and the protrusion gradually becomes thinner from the bottom end to the top end.

6. The optical component according to claim 5, characterized in that The bottom ends of the plurality of protrusions are connected to each other.

7. The optical component according to claim 5 or 6, characterized in that: The protrusions are micrometer-scale and / or nanometer-scale protrusions, wherein the height of the protrusions is greater than or equal to 50 nm and less than or equal to 200 nm, and the size of the bottom end of the protrusions is greater than or equal to 150 nm and less than or equal to 500 nm.

8. The optical component according to claim 4, characterized in that The thickness of the hydrophobic layer is greater than or equal to 5 nm and less than or equal to 30 nm.

9. The optical component according to any one of claims 7, characterized in that: The plurality of protrusions are arranged in an array.

10. The optical component according to claim 1, characterized in that The second micro-nano structure includes a plurality of depressions, wherein the depressions are micrometer-scale and / or nanometer-scale depressions, and the plurality of depressions are evenly arranged on the optical body layer.

11. The optical component according to claim 1, characterized in that The first anti-reflection layer is a light trap layer or a porous coating.

12. The optical component according to any one of claims 1, 5-6, 8-11, characterized in that: The hydrophobic film layer further includes a primer layer, which is attached to a light-transmitting region of the optical body layer on a side facing the optical device, and the hydrophobic layer of the hydrophobic film layer covers the primer layer.

13. The optical component according to claim 12, characterized in that The side of the bottom layer facing the hydrophobic layer of the hydrophobic film layer has a third micro-nano structure, wherein: The third micro-nano structure covers the second micro-nano structure in the optical body layer and is attached between the second micro-nano structure and the first micro-nano structure; and The shape of the third micro-nano structure matches the shape of the second micro-nano structure.

14. The optical component according to claim 12, characterized in that The thickness of the primer layer is smaller than the thickness of the hydrophobic layer in the hydrophobic film layer.

15. The optical component according to claim 12, characterized in that The primer layer is an active primer layer which is the same as the substrate of the first anti-reflection layer in the optical body layer.

16. The optical component according to claim 15, characterized in that The substrate of the first anti-reflection layer is silicon dioxide, and the active primer layer is a silicon dioxide layer.

17. The optical component according to any one of claims 1, 5-6, 8-11, characterized in that: The hydrophobic layer in the hydrophobic film layer is a perfluoropolyether coating.

18. The optical component according to any one of claims 1-3, 5-6, 8-11, characterized in that: A water drop angle of the optical cover plate at the hydrophobic film layer is greater than 150°, and / or a rolling angle of the optical cover plate at the hydrophobic film layer is less than 40°.

19. The optical component according to any one of claims 1-3, 5-6, 8-11, characterized in that: The optical body layer further comprises a second anti-reflection layer, wherein the second anti-reflection layer is light-transmissive and is located on a side of the substrate of the optical body layer away from the hydrophobic film layer.

20. A method for preparing an optical component, characterized in that: The preparation method is used to manufacture the optical component according to any one of claims 1 to 19, and the preparation method comprises: Treating one side of a plate to be treated to form an optical stack, wherein the plate to be treated is an untreated glass plate; the optical cover plate comprises an optical body layer and a hydrophobic film layer, the optical body layer comprises the optical stack, and the optical stack comprises a substrate and a first anti-reflection layer; The hydrophobic film layer is formed on one side of the optical stack, wherein the hydrophobic film layer covers the light-transmitting area of ​​the optical stack corresponding to the optical body layer, and the side of the hydrophobic film layer away from the optical stack is a hydrophobic rough surface having a first micro-nano structure, the first anti-reflection layer covers the side of the substrate facing the hydrophobic film layer, and the side of the first anti-reflection layer facing the hydrophobic film layer is a rough surface having a second micro-nano structure; wherein the first micro-nano structure is attached to and covers the second micro-nano structure, the shape of the first micro-nano structure matches the shape of the second micro-nano structure, and the refractive index of the first anti-reflection layer is configured as: along the direction from the substrate to the hydrophobic film layer, the refractive index corresponding to the first anti-reflection layer gradually changes to the refractive index corresponding to the air; The optical cover plate including the optical stack is combined with an optical device to form an optical assembly, wherein the hydrophobic rough surface is arranged toward the optical device.

21. The preparation method according to claim 20, characterized in that: The hydrophobic film layer is located on the first anti-reflection layer and covers a light-transmitting area on the first anti-reflection layer corresponding to the optical body layer.

22. The preparation method according to claim 21, characterized in that: The step of forming the hydrophobic film layer on one side of the optical stack specifically comprises: forming a hydrophobic layer having the first micro-nano structure on a side of the substrate having the second micro-nano structure; The first micro-nano structure covers the light-transmitting area of ​​the first anti-reflection layer corresponding to the optical body layer, the side of the hydrophobic layer facing the optical device is the hydrophobic rough surface, and the hydrophobic film layer includes the hydrophobic layer.

23. The preparation method according to claim 22, characterized in that: Before forming the hydrophobic layer having the first micro-nano structure on the side of the substrate having the second micro-nano structure, the preparation method further comprises: forming a base layer having a third micro-nano structure on a side of the substrate having the second micro-nano structure; The third micro-nano structure covers the second micro-nano structure and is attached between the second micro-nano structure and the first micro-nano structure, and the hydrophobic film layer also includes the primer layer.

24. The preparation method according to any one of claims 21 to 23, characterized in that: The step of processing one side of the plate to be processed to form an optical stack specifically includes: Under vacuum conditions, a metal film is formed on the plate to be processed, and the metal film is heat-treated to shrink the metal film and obtain a particle template having a plurality of particles; Plasma etching the particle template to form the second micro-nano structure on the particle surface of the particle template; The particle template is cleaned to obtain the optical stack, wherein the portion of the second micro-nano structure is the first anti-reflection layer, and the portion of the optical stack excluding the first anti-reflection layer is the substrate.

25. The preparation method according to any one of claims 21 to 23, characterized in that: The step of processing one side of the plate to be processed to form an optical stack specifically includes: Chemically etching the plate to be processed to form the second micro-nano structure on one side of the plate to be processed to obtain the optical stack; The second micro-nano structure portion is the first anti-reflection layer, and the portion of the optical stack except the first anti-reflection layer is the substrate.

26. The preparation method according to any one of claims 21 to 23, characterized in that: After forming a hydrophobic film layer on one side of the optical stack and before combining the optical cover plate including the optical stack with an optical device to form the optical component, the preparation method further includes: A second anti-reflection layer is formed on a side of the optical stack away from the hydrophobic film layer, and the optical body layer further includes the second anti-reflection layer.

27. An electronic device, characterized in that: It comprises a shell and the optical assembly according to any one of claims 1 to 19, wherein the optical device in the optical assembly is located in a receiving space of the shell, and the optical cover is located on the shell and covers the light incident surface of the optical device.

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