A method for double-sided embroidery of Qin embroidery

By employing specific needlework techniques in Qin embroidery double-sided embroidery, the problem of slanted weave on the back of the base material was solved, thus improving the overall aesthetics and smoothness of the embroidery.

CN117888303BActive Publication Date: 2026-04-28崔萌
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
崔萌
Filing Date
2023-04-10
Publication Date
2026-04-28

AI Technical Summary

Technical Problem

When performing double-sided embroidery in Qin embroidery, diagonal lines appear on the back of the base material, affecting the beauty and smoothness of the embroidery.

Method used

A specific stitching technique is used on the base material. The twill pattern on the back of the base material is covered by adding repeated steps in the continuous stitching. The specific steps include selecting mesh a and mesh c for stitching to fix the thread, and repeating the stitching to cover the twill pattern.

Benefits of technology

It effectively hides the diagonal lines on the back of the base material, making both the back and front smooth and neat, thus improving the beauty and flatness of the embroidery.

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Abstract

The application discloses a kind of qin embroidery double-sided embroidery embroidery methods, belong to embroidery technical field, the embroidery method of the application includes the following steps: selecting mesh a and pulling thread from the front of bottom material, leaving a section of thread end, then pulling thread from mesh b, pulling thread from mesh a again, so that silk thread is wound on warp for a week, repeat pulling thread from mesh b again pulling thread from mesh a, so that silk thread is firmly fixed on bottom material, cut off redundant thread end;Select mesh c and pull thread from the back of bottom material, then pull thread from mesh d, cover the thread end on mesh a.This application increases the repeated steps in continuous needle method to cover the diagonal of the back of bottom material and proceed to the next needle, so that the diagonal of the back is effectively hidden, and the front and back present smooth and neat effect, thereby improving the overall appearance and flatness of embroidery.
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Description

Technical Field

[0001] This invention relates to the field of embroidery technology, specifically to a Qin embroidery double-sided embroidery method. Background Technology

[0002] Qin embroidery originated in Shaanxi Province. In the 1970s, arts and crafts workers in Xi'an City unearthed and organized the ancient Shaanxi embroidery styles of Nasha embroidery and Chuanluo embroidery, which were prevalent among the people, and developed a new embroidery style called Qin embroidery. Qin embroidery is based on the unique history of its place of origin and was created by fully absorbing the folk embroidery techniques of Shaanxi.

[0003] Qin embroidery is characterized by its multiple layers and strong three-dimensionality. In Qin embroidery works, subtle changes in small patterns are often contrasted with large areas of color, which creates layers and a three-dimensional effect, enhancing the overall beauty and elegance of the embroidery.

[0004] In existing techniques for Qin embroidery double-sided embroidery, continuous stitches are typically performed on the mesh of the base fabric. This results in a smooth front side of the base fabric, but diagonal lines appear on the back side, affecting the overall aesthetics and smoothness of the embroidery. Therefore, we have proposed a Qin embroidery double-sided embroidery method to solve the problems mentioned above. Summary of the Invention

[0005] The purpose of this invention is to provide a method for double-sided embroidery of Qin embroidery, in order to solve the problem mentioned in the background art that when performing double-sided embroidery of Qin embroidery, continuous stitches are generally performed on the mesh of the base material. This results in a smooth front of the base material, but diagonal lines appear on the back of the base material, which affects the overall beauty and flatness of the embroidery.

[0006] To achieve the above objectives, this invention provides a Qin embroidery double-sided embroidery method. The method involves applying needlework with silk thread onto a base material according to a warp and weft mesh pattern. The base material has a plurality of warp and weft meshes neatly arranged, wherein meshes a, b, c, and d are on the same weft line, and meshes a and b are located between meshes c and d. Meshes a and b are adjacent meshes. Meshes e and f are on the same weft line, and meshes e and c are on the same warp line, as are meshes f and d. Meshes e and c are adjacent meshes, and meshes f and d are adjacent meshes. The embroidery method includes the following steps:

[0007] S1: Select mesh a and pull the needle and thread into the fabric from the front, leaving a short thread end. Then pull the needle and thread out from mesh b, and then pull the needle and thread into mesh a. This way, the thread will wrap around the warp once. Repeat this process of pulling the needle and thread out from mesh b and then pulling the needle and thread into mesh a to make the thread firmly fixed on the fabric. Cut off any excess thread ends.

[0008] S2: Select mesh c and pull the needle and thread out from the back of the base fabric, then pull the needle and thread in from mesh d to cover the thread end on mesh a;

[0009] S3: Pull the needle and thread out from mesh e, and then pull the needle and thread in from mesh f. At this time, a diagonal pattern will appear on the back of the base fabric from mesh d to mesh e. Repeat the process of pulling the needle and thread out from mesh e and then pulling the needle and thread in from mesh f to cover the diagonal pattern on the back of the base fabric. Then repeat the above needlework to cover the diagonal pattern.

[0010] Preferably, the base material is silk gauze.

[0011] Compared with the prior art, the beneficial effects of the present invention are: by adding repeated steps in the continuous stitching to cover the diagonal pattern on the back of the base material before proceeding to the next stitch, the diagonal pattern on the back is effectively hidden, and both the back and front present a smooth and neat effect, thereby improving the overall beauty and flatness of the embroidery. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the warp and weft mesh of the base material of the present invention. Detailed Implementation

[0013] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0014] Please see Figure 1 This invention provides a method for double-sided embroidery of Qin embroidery. The method involves applying needlework with silk thread on a base material according to a warp and weft mesh pattern. The base material is made of pure silk yarn, and several warp and weft meshes are neatly arranged on it. Mesh a, b, c, and d are on the same weft line, with mesh a and b located between mesh c and d. Mesh a and b are adjacent meshes. Mesh e and f are on the same weft line, with mesh e and c on the same warp line, and mesh f and d on the same warp line. Mesh e and c are adjacent meshes, and mesh f and d are adjacent meshes. The embroidery method includes the following steps:

[0015] S1: Select mesh a and pull the needle and thread into the fabric from the front, leaving a short thread end. Then pull the needle and thread out from mesh b, and then pull the needle and thread into mesh a. This way, the thread will wrap around the warp once. Repeat this process of pulling the needle and thread out from mesh b and then pulling the needle and thread into mesh a to make the thread firmly fixed on the fabric. Cut off any excess thread ends.

[0016] S2: Select mesh c and pull the needle and thread out from the back of the base fabric, then pull the needle and thread in from mesh d to cover the thread end on mesh a;

[0017] S3: Pull the needle and thread out from mesh e, and then pull the needle and thread in from mesh f. At this time, a diagonal pattern will appear on the back of the base fabric from mesh d to mesh e. Repeat the process of pulling the needle and thread out from mesh e and then pulling the needle and thread in from mesh f to cover the diagonal pattern on the back of the base fabric. Then repeat the above needlework to cover the diagonal pattern.

[0018] Any content not described in detail in this specification is prior art known to those skilled in the art.

[0019] Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A method for double-sided embroidery in Qin embroidery, characterized in that: The embroidery method involves stitching a pattern of warp and weft meshes onto a base fabric using silk thread. The base fabric has a series of neatly arranged warp and weft meshes, where meshes a, b, c, and d are on the same weft line, with meshes a and b located between meshes c and d. Meshes a and b are adjacent meshes. Meshes e and f are on the same weft line, with mesh e and c on the same warp line, and meshes f and d on the same warp line. Meshes e and c are adjacent meshes, and meshes f and d are adjacent meshes. The embroidery method includes the following steps: S1: Select mesh a and pull the needle and thread into the silk gauze base fabric from the front, leaving a short thread end. Then pull the needle and thread out from mesh b, and then pull the needle and thread into mesh a. In this way, the silk thread will wrap around the warp once. Repeat the process of pulling the needle and thread out from mesh b and then pulling the needle and thread into mesh a to make the silk gauze base fabric firmly fixed. Cut off the excess thread end. S2: Select mesh c and pull the needle and thread out from the back of the silk gauze base, then pull the needle and thread in from mesh d to cover the thread end on mesh a; S3: Pull the needle and thread out from mesh e, and then pull the needle and thread in from mesh f. At this time, a diagonal pattern will appear on the back of the silk gauze fabric from mesh d to mesh e. Repeat the process of pulling the needle and thread out from mesh e and then pulling the needle and thread in from mesh f to cover the diagonal pattern on the back of the silk gauze fabric. Then repeat the above needlework to cover the diagonal pattern.