A silicon electrode cleaning apparatus and cleaning method

Abstract

The application discloses a kind of silicon electrode cleaning equipment and cleaning method, including machine body, clamping mechanism for clamping silicon electrode and flushing nozzle are equipped in machine body, the rotating mechanism is equipped in the machine body, the rotating mechanism includes with the rotating shaft of machine body rotation connection, the tray fixed on rotating shaft, and with the rotating disc of tray rotation connection, the clamping mechanism is set on rotating disc, and the flushing nozzle is located the upside of rotating disc.By clamping mechanism, silicon electrode is clamped on rotating disc, by the rotation of tray, so that rotating disc is inclined, simultaneously can make silicon electrode also incline, in the process of flushing, water flow follows along the slope and carries away impurity particle, prevent particle to remain on silicon electrode surface;It can also be easier to clean the inner wall of silicon electrode hole;Again by the rotation of rotating disc, drive silicon electrode to rotate, it is convenient for flushing nozzle to completely clean every position of silicon electrode.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of silicon electrode processing, in particular to a silicon electrode cleaning device and a cleaning method. BACKGROUND

[0002] The silicon electrode is a core component and key consumable in the cavity of a plasma etching device, and it often has thousands of micro-holes that penetrate the silicon electrode in the thickness direction. During work, etching gas enters the cavity of the plasma etching device through each micro-hole to perform plasma etching on a wafer. Therefore, the silicon electrode surface and its micro-holes are required to have extremely high machining precision and consistency, and the particle count on the surface needs to be strictly controlled. The industry usually uses chemical reagents to clean the silicon electrode to control its particle size.

[0003] The existing silicon electrode cleaning device clamps the silicon electrode and then uses a high-pressure water jet to flush it, which can flush most impurity particles. However, some impurity particles tend to fall on the upper surface of the silicon electrode, and these impurity particles tend to remain on the horizontal silicon electrode surface during cleaning and are not easily washed away by water. SUMMARY

[0004] To solve at least one of the technical problems mentioned in the background, the purpose of the present application is to provide a silicon electrode cleaning device and a cleaning method that can easily flush away impurity particles and prevent them from remaining on the horizontal silicon electrode surface.

[0005] To achieve the above-mentioned purpose, the present application provides the following technical solutions:

[0006] A silicon electrode cleaning device includes a body, a clamping mechanism for clamping the silicon electrode, and a flushing nozzle inside the body. A rotating mechanism is provided in the body, which includes a rotating shaft rotatably connected to the body, a tray fixed to the rotating shaft, and a rotating disc rotatably connected to the tray. The clamping mechanism is arranged on the rotating disc, and the flushing nozzle is located on the upper side of the rotating disc.

[0007] Compared with the prior art, the present application has the following advantages:

[0008] The silicon electrode is clamped on the rotating disc by the clamping mechanism, and the rotating disc is inclined by the rotation of the tray, which also causes the silicon electrode to incline. During the flushing process, the water flow carries away the impurity particles along the inclined surface, preventing the particles from remaining on the surface of the silicon electrode. At the same time, it is also easier to clean the inner wall of the silicon electrode hole. The rotation of the rotating disc drives the rotation of the silicon electrode, which facilitates the flushing nozzle to thoroughly clean every position of the silicon electrode.

[0009] Preferably, the rotating mechanism further includes a base fixed to the body and a push block in sliding connection with the base. The bottom of the tray is provided with a concave arc-shaped groove, and the top of the push block abuts against the top inner wall of the concave arc-shaped groove.

[0010] Preferably, the number of the pushing blocks is two, the two pushing blocks slide along the same line in the same direction, and the two pushing blocks are located on the two sides of the rotating shaft respectively.

[0011] Preferably, the rotating mechanism further comprises a motor fixed on the tray, and the rotating disc is fixed on the output end of the motor.

[0012] Preferably, the clamping mechanism comprises a plurality of fixed blocks distributed in the circumferential direction of the rotating disc, a first sliding block in sliding connection with the fixed blocks, and a clamping block for clamping the silicon electrode fixed on the first sliding block, and the first sliding block slides in the radial direction of the rotating disc.

[0013] Preferably, the side of the plurality of clamping blocks close to each other is arranged in an inclined manner.

[0014] Preferably, the first sliding block is in sliding connection with an anti-falling mechanism, the anti-falling mechanism comprises a second sliding block in sliding connection with the first sliding block, a moving block fixed on the second sliding block, a top block in sliding connection with the moving block, and a compression spring, the bottom of the moving block is provided with a sliding groove for accommodating the top block; when the second sliding block is located at a first position, the bottom of the top block abuts against the top surface of the clamping block; when the second sliding block is located at a second position, the top block is located on the side of the clamping block away from the first sliding block.

[0015] Preferably, the second sliding block is rotatably connected with a pulley for driving the second sliding block to slide on the first sliding block, and a pulley motor for driving the pulley to rotate.

[0016] Preferably, the side of the top block close to the second sliding block is provided with an inclined surface, and the top of the inclined surface is inclined towards the second sliding block.

[0017] A silicon electrode cleaning method, the silicon electrode is clamped on the clamping mechanism by using the silicon electrode cleaning device, the moving block and the top block are moved towards the silicon electrode by the second sliding block, under the elastic force of the compression spring, the top block abuts against the top of the silicon electrode, so as to prevent the silicon electrode from sliding out of the clamping mechanism; the rotating disc, the clamping mechanism and the silicon electrode are rotated by the motor, the pushing block is moved, so as to incline the tray, open the flushing nozzle, and clean the silicon electrode. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is a schematic diagram of the overall structure of the present application;

[0019] Figure 2 It is a partial sectional view of the present application;

[0020] Figure 3 It is an internal explosion diagram of the present application;

[0021] Figure 4A sectional view of the clamping mechanism and the anti-off mechanism of the present application;

[0022] Figure 5 An internal sectional view of the present application;

[0023] In the figure: 1, body; 11, cover; 12, washing tank; 13, drainage tank; 131, drainage port; 14, support; 2, flushing nozzle; 21, water pipe; 3, rotating mechanism; 31, base; 32, tray; 320, concave arc-shaped groove; 321, rotating shaft; 33, rotating disc; 34, clamping mechanism; 341, fixed block; 342, first sliding block; 343, clamping block; 35, anti-off mechanism; 351, second sliding block; 352, moving block; 353, top block; 354, compression spring; 355, pulley; 36, push block; 37, motor. DETAILED DESCRIPTION

[0024] The technical solutions in the embodiments of the present application will be described clearly and completely below. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative work are within the protection scope of the present application.

[0025] Please refer to Figure 1 and Figure 2 The present embodiment provides a silicon electrode cleaning device, which comprises a body 1, wherein the body 1 comprises a cover 11, a washing tank 12, a drainage tank 13 and a support 14 from top to bottom in sequence, the bottom of the drainage tank 13 is provided with a drainage port 131, the washing tank 12 is provided with a flushing nozzle 2, the top of the cover 11 is provided with a water pipe 21, and the water pipe 21 is connected with the flushing nozzle 2.

[0026] Please refer to Figure 3 and Figure 5In the embodiment, the cleaning box 12 and the drainage box 13 are provided with a rotating mechanism 3, the rotating mechanism 3 comprises a base 31 fixedly arranged in the drainage box 13, a rotating shaft 321 rotatably connected with the machine body 1, a tray 32 fixedly arranged on the rotating shaft 321, and a rotating disc 33 rotatably connected with the tray 32, two push blocks 36 are slidably connected to the base 31, the bottom of the tray 32 is provided with a concave arc-shaped groove 320, the top of the push block 36 abuts against the inner wall of the top of the concave arc-shaped groove 320, the bottom of the tray 32 is fixedly provided with a motor 37, the rotating disc 33 is fixedly arranged on the output end of the motor 37, and the motor 37 does not contact the base 31; the top surfaces of the tray 32 and the base 31 are circular, the cross section of the rotating disc 33 is circular, the two push blocks 36 slide along one diameter of the base 31 in the same direction, and the two push blocks 36 are located on the two sides of the rotating shaft 321 respectively, the sliding directions of the two push blocks 36 are perpendicular to the circumferential direction of the rotating shaft 321, through the same direction movement of the two push blocks 36, the top of the two push blocks 36 abuts against the inner wall of the concave arc-shaped groove 320, so that the tray 32 rotates along the rotating shaft 321 and drives the rotating disc 33 to overturn.

[0027] Please refer to Figure 3 、 Figure 4 and Figure 5 , the rotating disc 33 is provided with a clamping mechanism 34, the clamping mechanism 34 comprises three fixed blocks 341 arranged in the circumferential direction on the rotating disc 33, a first sliding block 342 slidably connected with the fixed block 341, and a clamping block 343 fixedly arranged on the first sliding block 342 for clamping the silicon electrode, the first sliding block 342 slides in the radial direction of the rotating disc 33, and the clamping blocks 343 are arranged in an inclined manner on the side close to each other (for example Figure 4 ).

[0028] The first sliding block 342 is slidably connected with an anti-falling mechanism 35, the anti-falling mechanism 35 comprises a second sliding block 351 slidably connected with the first sliding block 342, a moving block 352 fixedly arranged on the second sliding block 351, a top block 353 slidably connected with the moving block 352, and a compression spring 354, the bottom of the moving block 352 is provided with a sliding groove for accommodating the top block 353; when the second sliding block 351 is located at a first position (for example Figure 4 ), the bottom of the top block 353 abuts against the top surface of the clamping block 343; when the second sliding block 351 is located at a second position, the top block 353 is located on the side of the clamping block 343 away from the first sliding block 342; the second sliding block 351 is rotatably connected with a pulley 355 for driving the second sliding block 351 to slide on the first sliding block 342, and a pulley motor for driving the pulley 355 to rotate; the side close to the second sliding block 351 of the top block 353 is provided with an inclined surface, and the top of the inclined surface is inclined towards the second sliding block 351.

[0029] In operation, the motor 37 drives the rotating disc 33 to rotate, and the two push blocks 36 slide on the base 31, one of the push blocks 36 lifts the tray 32, and the other push block 36 supports the tray 32, so that the tray 32 is inclined, facilitating the cleaning of the surface and the hole wall of the silicon electrode from various directions by the cleaning nozzle 2, and preventing the cleaning liquid from remaining on the silicon electrode and the rotating disc 33, so that the cleaning is more thorough. The pulley motor drives the pulley 355 to rotate forward, so that the second sliding block 351 drives the moving block 352 and the top block 353 to move towards the silicon electrode, and under the elastic force of the compression spring 354, the top block 353 abuts against the top of the silicon electrode, preventing the silicon electrode from sliding out of the clamping mechanism 34 from the top; after cleaning, the pulley motor drives the pulley 355 to rotate reversely, so that the second sliding block 351 drives the moving block 352 and the top block 353 to move away from the silicon electrode, and while the top block 353 moves, the clamping block 343 on the top abuts against the inclined surface of the top block 353, driving the top block 353 to move upwards and retract into the sliding groove of the moving block 352 for accommodating the top block 353, until the top block 353 returns to the first position.

[0030] A silicon electrode cleaning method, using the above-mentioned silicon electrode cleaning device, clamps the silicon electrode between the three clamping blocks 343 on the clamping mechanism 34, drives the moving block 352 and the top block 353 to move towards the silicon electrode through the second sliding block 351, and under the elastic force of the compression spring 354, the top block 353 abuts against the top of the silicon electrode, preventing the silicon electrode from sliding out of the clamping mechanism 34 from the top; the motor 37 drives the rotating disc 33, the clamping mechanism 34, and the silicon electrode to rotate, the push block 36 moves, the tray 32 is inclined, the cleaning nozzle 2 is opened, and the silicon electrode is cleaned. After cleaning, the push block 36 drives the tray 32 to return to the horizontal position, the top block 353 returns to the first position, and the clamping blocks 343 move away from each other, releasing the silicon electrode.

[0031] It is apparent for a person skilled in the art that the present application is not limited to the details of the above-mentioned exemplary embodiments, but can be implemented in other concrete forms without departing from the spirit or essential characteristics of the present application. Therefore, the embodiments should be considered as exemplary and non-limiting, the scope of the present application being defined by the appended claims and not by the above-mentioned description, and all the changes falling within the meaning and the scope of the equivalent elements of the claims are intended to be embraced in the present application.

Claims

1. A silicon electrode cleaning apparatus comprising a machine body (1) in which a clamping mechanism (34) for clamping a silicon electrode and a rinsing nozzle (2) are provided, characterized in that, The body (1) is internally provided with a rotating mechanism (3), the rotating mechanism (3) comprises a rotating shaft (321) rotatably connected with the body (1), a tray (32) fixedly arranged on the rotating shaft (321), and a rotating disc (33) rotatably connected with the tray (32), the clamping mechanism (34) is arranged on the rotating disc (33), and the flushing nozzle (2) is located on the upper side of the rotating disc (33); The rotating mechanism (3) further comprises a base (31) fixedly arranged on the body (1), and a push block (36) slidably connected with the base (31), the bottom of the tray (32) is provided with a concave arc-shaped groove (320), and the top of the push block (36) abuts against the inner wall of the top of the concave arc-shaped groove (320); The number of the push block (36) is two, the two push blocks (36) slide along the same straight line in the same direction, and the two push blocks (36) are located on the two sides of the rotating shaft (321) respectively; The rotating mechanism (3) further comprises a motor (37) fixedly arranged on the tray (32), and the rotating disc (33) is fixedly arranged on the output end of the motor (37); The clamping mechanism (34) comprises a plurality of fixed blocks (341) arranged in a circumferential direction on the rotating disc (33), a first sliding block (342) slidably connected with the fixed block (341), and a clamping block (343) fixedly arranged on the first sliding block (342) and used for clamping the silicon electrode, and the first sliding block (342) slides in the radial direction of the rotating disc (33).

2. The apparatus for cleaning a silicon electrode according to claim 1, wherein The side, on which the plurality of clamping blocks (343) are close to each other, is arranged to be inclined.

3. The apparatus for cleaning a silicon electrode according to claim 1, wherein The first sliding block (342) is slidably connected with an anti-disengagement mechanism (35), the anti-disengagement mechanism (35) comprises a second sliding block (351) slidably connected with the first sliding block (342), a moving block (352) fixedly arranged on the second sliding block (351), a top block (353) slidably connected with the moving block (352), and a compression spring (354), the bottom of the moving block (352) is provided with a sliding groove for accommodating the top block (353); when the second sliding block (351) is located at a first position, the bottom of the top block (353) abuts against the top surface of the clamping block (343); when the second sliding block (351) is located at a second position, the top block (353) is located on the side, away from the first sliding block (342), of the clamping block (343).

4. The apparatus of claim 3, wherein the cleaning fluid is applied to the surface of the silicon electrode by a spray nozzle. The second sliding block (351) is rotatably connected with a pulley (355) for driving the second sliding block (351) to slide on the first sliding block (342), and a pulley motor for driving the pulley (355) to rotate.

5. The apparatus for cleaning a silicon electrode according to claim 3, wherein The side, close to the second sliding block (351), of the top block (353) is provided with an inclined surface, and the top of the inclined surface is inclined towards the second sliding block (351).

6. A method of cleaning a silicon electrode, characterized by, The silicon electrode cleaning device of any one of claims 3-5 is used to clamp the silicon electrode on the clamping mechanism (34), drive the moving block (352) and the top block (353) to move towards the silicon electrode through the second sliding block (351), and under the elastic force of the compression spring (354), the top block (353) abuts against the top of the silicon electrode to prevent the silicon electrode from sliding out of the clamping mechanism (34); the motor (37) drives the rotating disc (33), the clamping mechanism (34) and the silicon electrode to rotate, the push block (36) moves to make the tray (32) tilt, open the flushing nozzle (2), and clean the silicon electrode.

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