Dual stage optical processing system and method

Abstract

The application relates to a double-workbench optical processing system and a processing method, which comprises a base, a first workbench assembly, a second workbench assembly, a positioning system and an optical processing system. The optical processing system comprises a plurality of fixed optical lenses located between the first workbench assembly and the second workbench assembly. The first workbench assembly and the second workbench assembly each comprise a scanning direction movement mechanism, a sub-scanning direction movement mechanism, a vertical supporting mechanism and a supporting platform. The scanning direction movement mechanism is installed on the base, the sub-scanning direction movement mechanism is installed on the scanning direction movement mechanism, the vertical supporting mechanism is installed on the sub-scanning direction movement mechanism, and the supporting platform is installed on the vertical supporting mechanism. The first workbench assembly and the second workbench assembly pass through the positioning system and the optical processing system in sequence respectively. The first workbench assembly and the second workbench assembly drive the workpiece to be processed to move, avoid errors caused by the movement of the optical lenses, and improve the processing precision.

Description

Technical Field

[0001] The present invention relates to the field of photovoltaic product processing, in particular to a double-workbench optical processing system and a processing method for photovoltaic products. Background Art

[0002] Optical processing is widely used in the production of semiconductors, PCBs, photovoltaic cells, 3D printing and other fields. It is an important processing method for manufacturing products such as semiconductor devices, chips, PCB boards and photovoltaic cells. It is used for photoetching feature patterns on the surface of workpieces, processing solder mask inks on printed circuit boards, and punching holes for electrical interconnections between multi-layer circuit boards.

[0003] The production speed of the traditional single-workbench mode has reached its limit, and a dual-workbench design is needed to increase the production speed. The optical engine is expensive, and the dual-table design can improve the utilization rate of the optical part, save costs, and improve the cost performance of the equipment. There are currently two types of dual-workbench processing systems on the market, both of which have their unsatisfactory aspects. One is the upper and lower interactive dual-workbench mode. In this mode, the workbench needs to move up and down for a long stroke, and long-term use will lead to a decrease in accuracy. The other is the left and right dual-workbench structure. The two workbenches are installed on the left and right, and the optical system needs to move left and right. Because the optics are very sensitive, the active optical system reduces the exposure accuracy. Summary of the Invention

[0004] The technical problem to be solved by the present invention is to provide a dual-worktable processing system and a processing method that ensure exposure accuracy.

[0005] In order to solve the above problems, the present invention provides a dual-workbench optical processing system, which includes a base, a first workbench assembly, a second workbench assembly, an alignment system and an optical processing system. The optical processing system includes a plurality of fixed optical lenses, which are located between the first workbench assembly and the second workbench assembly. The first workbench assembly and the second workbench assembly both include a scanning direction movement mechanism, a sub-scanning direction movement mechanism, a vertical supporting mechanism and a supporting platform. The scanning direction movement mechanism is installed on the base, the sub-scanning direction movement mechanism is installed on the scanning direction movement mechanism, the vertical supporting mechanism is installed on the sub-scanning direction movement mechanism, and the supporting platform is installed on the vertical supporting mechanism. The first workbench assembly and the second workbench assembly pass through the alignment system and the optical processing system respectively in turn.

[0006] Furthermore, the scanning direction motion mechanism includes relatively arranged scanning direction guide rails, scanning direction sliders arranged corresponding to the scanning direction guide rails, and a scanning direction slide. The scanning direction guide rails are arranged on the base, and the scanning direction slide and the scanning direction guide rails are connected through the first scanning direction slider.

[0007] Furthermore, the sub-scanning direction movement mechanism includes relatively arranged sub-scanning direction guide rails and correspondingly arranged sub-scanning direction sliders, the sub-scanning direction guide rails are arranged on the scanning direction slide, and the sub-scanning direction sliders carry the vertical supporting mechanism.

[0008] Furthermore, the centers of gravity of the vertical supporting mechanism and the supporting platform are collinear with the center of gravity of the secondary scanning direction slider in the vertical direction.

[0009] Furthermore, the vertical supporting mechanism includes a main supporting mechanism and a secondary supporting mechanism, the secondary supporting mechanism is placed on the upper part of the main supporting mechanism, and the main supporting mechanism is connected to the secondary scanning direction slider.

[0010] Furthermore, the secondary supporting mechanism carries the supporting platform, is partially connected to the first main supporting mechanism, and extends inward.

[0011] Furthermore, the main supporting mechanism has a trapezoidal structure, which gradually widens from a side close to the secondary supporting mechanism to a side close to the secondary scanning direction slider.

[0012] Furthermore, the main supporting mechanism is inclined toward the inside.

[0013] Furthermore, the stroke of the first vertical supporting mechanism in the secondary scanning direction is set according to the center of gravity position of the vertical supporting mechanism. When the first vertical supporting mechanism moves in the secondary scanning direction, the center of gravity of the vertical supporting mechanism is located between the relatively arranged scanning direction guide rails.

[0014] Furthermore, the maximum spacing between the support platforms of the first workbench assembly and the second workbench assembly in the secondary scanning direction is greater than the width of one support platform in the secondary scanning direction.

[0015] Furthermore, the optical lens is a direct-write exposure lens.

[0016] In the above-mentioned processing method of the dual-workbench optical processing system, the first workbench assembly and the second workbench assembly perform alignment operations and optical processing operations in sequence. When the first workbench assembly and the second workbench assembly meet, one of the workbench assemblies is in the middle position and the other workbench assembly is in the side position.

[0017] Compared to existing technologies, the optical lens is fixed, and the workpiece to be processed is moved by the first and second worktable assemblies, avoiding errors caused by the movement of the optical lens and improving processing accuracy. Furthermore, the first and second worktable assemblies work closely together, improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1It is a three-dimensional schematic diagram of a double-workbench optical processing system.

[0019] Figure 2 is a schematic diagram of the first workbench assembly.

[0020] Figure 3 It is a schematic diagram of the stroke of the first workbench component.

[0021] Figure 4 This is a top view of the optical processing system with two workbenches. Figure 1 .

[0022] Figure 5 This is a top view of the optical processing system with two workbenches. Figure 2 . DETAILED DESCRIPTION

[0023] In order to make the objectives, technical solutions and advantages of the present invention more clear, the present invention is described below with reference to specific embodiments shown in the accompanying drawings.

[0024] like Figure 1-5 As shown, a dual-workbench optical processing system includes a base 1, a first workbench component 2, a second workbench component 3, an alignment system 4 and an optical processing system 5. The first workbench component 1, the second workbench component 2, the alignment system 4 and the optical processing system 5 are all arranged on the base 1, and the first workbench component 2 and the second workbench component 3 are arranged in parallel, and alignment is performed by the alignment system 4, and optical processing is performed by the optical processing system 5.

[0025] The first workbench assembly 2 includes a first scanning direction motion mechanism 20, a first sub-scanning direction motion mechanism 21, a first vertical supporting mechanism 22 and a first supporting platform 23. The first sub-scanning direction motion mechanism 21 is arranged on the first scanning direction motion mechanism 20, the first vertical supporting mechanism 22 is arranged on the first sub-scanning direction motion mechanism 21, and the first supporting platform 23 is arranged on the first vertical supporting mechanism 22.

[0026] The second workbench assembly 3 includes a second scanning direction motion mechanism 30, a second secondary scanning direction motion mechanism 31, a second vertical supporting mechanism 32, and a second supporting platform 33. The second secondary scanning direction motion mechanism 31 is disposed on the second scanning direction motion mechanism 30, the second vertical supporting mechanism 32 is disposed on the second secondary scanning direction motion mechanism 31, and the second supporting platform 33 is disposed on the second vertical supporting mechanism 32. The second scanning direction motion mechanism 30 is parallel to the first scanning direction motion mechanism 20.

[0027] The maximum distance between the support platforms of the first workbench assembly 2 and the second workbench assembly 3 in the secondary scanning direction is greater than the width of one support platform in the secondary scanning direction, so as to avoid collision between the first workbench assembly 2 and the second workbench assembly 3 during relative movement.

[0028] The alignment system 4 includes a drive mechanism and an image acquisition mechanism 40. The drive mechanism drives the movement of the image acquisition mechanism 40. The image acquisition mechanism 40 of the alignment system is provided for each worktable assembly, or the image acquisition mechanism 40 is provided for one worktable assembly, and the drive mechanism moves between two worktable assemblies to complete the alignment of each worktable assembly. Alternatively, the image acquisition mechanism 40 is in an intermediate position, and the first worktable assembly 2 or the second worktable assembly 3 is moved to the intermediate position to complete the alignment.

[0029] The optical processing system 5 includes a plurality of fixed optical lenses 50. The optical processing system 5 is located in the middle of the optical processing system in the secondary scanning direction. Both the first workbench assembly 2 and the second workbench assembly 3 require the first work platform 23 and the second work platform 33 to move in the secondary scanning direction to reach the operating area of ​​the optical processing system 5. The optical lenses 50 can be arranged in a single row or in a staggered arrangement of multiple rows and columns.

[0030] For high-precision optical processing systems, preferably, the optical lens includes an automatic focusing system, and the automatic focusing system includes an upper right-angle wedge prism and a lower right-angle wedge prism that can move relatively, and the focal plane of the optical lens is adjusted by the automatic focusing system.

[0031] The first motion mechanism 20 includes a first scanning direction guide rail 200 arranged relatively to each other, a first scanning direction slider 201 arranged corresponding to the first scanning direction guide rail, and a first scanning direction slide 202. The first scanning direction guide rail 200 is arranged on the base 1. The first scanning direction slide 202 and the first scanning direction guide rail 200 are connected through the first scanning direction slider 201, so that the first scanning direction slide 203 moves in the scanning direction along the first scanning direction guide rail 200.

[0032] The first sub-scanning direction movement mechanism 21 includes a first sub-scanning direction guide rail 210 and a corresponding first sub-scanning direction slider 211 that are relatively arranged. The first sub-scanning direction guide rail 210 is arranged on the first scanning direction slide 202. The first sub-scanning direction slider 211 moves in the sub-scanning direction along the first sub-scanning direction guide rail 210. The first sub-scanning direction slider 211 carries the first vertical supporting mechanism 22.

[0033] The first vertical supporting mechanism 22 includes a first main supporting mechanism 220 and a first secondary supporting mechanism 221. The first secondary supporting mechanism 221 is positioned above the first main supporting mechanism 220, which is connected to the first secondary scanning direction slider 211. The center of gravity of the first vertical supporting mechanism 22 and the first supporting platform 23 is vertically collinear with the center of gravity of the first secondary scanning direction slider 211. Preferably, the center of gravity of the first secondary scanning direction slider 211 is located at the center of the first secondary scanning direction slider 211.

[0034] The first main support mechanism 210 has a trapezoidal structure, widening from the side closest to the first secondary support mechanism 211 toward the side closest to the first secondary scanning direction slider 211, providing stable support for the secondary support mechanism 211 and the first support platform 23. The trapezoidal structure is similar to or approximates a trapezoidal structure. Preferably, the first main support mechanism 210 is tilted inward. The first secondary support mechanism 211 supports the first support platform 23 and is partially connected to the first main support mechanism 210. The first secondary support mechanism 211 extends toward the second working assembly 3. This shortens the travel of the first vertical support mechanism 22 in the secondary scanning direction and reduces the distance between the first worktable assembly 2 and the second worktable assembly 3. By providing multiple weight-reducing portions within the first main support mechanism 210, such as through-holes or recesses, the center of gravity of the first vertical support mechanism 22 and the center of gravity of the first secondary scanning direction slider 211 are vertically aligned.

[0035] Preferably, the secondary supporting mechanism 211 can move vertically. A sliding assembly can be provided within the primary supporting mechanism to drive the secondary supporting mechanism 211 to move vertically. The vertical movement of the secondary supporting mechanism 211 drives the first supporting platform 23 to move vertically, facilitating the search for the focal plane of the optical lens 50.

[0036] The travel of the first vertical support mechanism 210 in the secondary scanning direction is preferably such that the center of gravity of the first vertical support mechanism 210 is located between the opposing first scanning direction guide rails 200. This prevents the first scanning direction slider 201 from experiencing any overturning moment, which could affect its motion accuracy, provided the first scanning direction slider 202 does not deform. However, under normal circumstances, the first scanning direction slider 202 is susceptible to slight deformation when subjected to force. In particular, when the first vertical support mechanism 22 reaches its maximum travel, the first scanning direction slider 202 is susceptible to slight micron-level deformation due to pressure, subjecting the first scanning direction guide rail 200 to lateral pressure. If the maximum vertical deformation of the first scanning direction slide 202 is S when the first vertical supporting mechanism 22 moves to its maximum stroke, the relationship between the combined gravity G of the first vertical supporting mechanism and the first secondary scanning direction slider and the lateral pressure F applied to the first scanning direction guide rail is F = G * S / L, where L is the maximum movable stroke of the first vertical supporting mechanism. The maximum lateral pressure that the first scanning direction guide rail 200 can withstand is M. Assuming the service factor of the guide rail is k, when k * F is significantly less than the maximum lateral pressure M applied to the first scanning direction guide rail 200, even if the first scanning direction slide 202 undergoes slight deformation, the movement of the first vertical supporting mechanism 22 in the secondary scanning direction will not affect the accuracy of the first scanning direction guide rail 200. Therefore, the smaller the maximum vertical deformation of the first scanning direction slide 202, the better. Preferably, the first scanning direction slide 202 is made of a material with high hardness, such as aviation aluminum.

[0037] The second motion mechanism 3 has the same structure as the first motion mechanism 2 and includes opposing second scanning direction guide rails, a second scanning direction slider corresponding to the second scanning direction guide rails, and a second scanning direction slide. The second scanning direction guide rails are mounted on the base, and the second scanning direction slide and the second scanning direction guide rails are connected via the second scanning direction slider, allowing the second scanning direction slide to move along the second scanning direction guide rails in the scanning direction. The second secondary scanning direction motion mechanism includes opposing second secondary scanning direction guide rails and a corresponding second secondary scanning direction slider. The second secondary scanning direction guide rails are mounted on the second scanning direction slider, and the second secondary scanning direction slider moves along the second secondary scanning direction guide rails in the secondary scanning direction. The second secondary scanning direction slider supports the second vertical support mechanism. The second vertical support mechanism includes a second main support mechanism and a second secondary support mechanism. The second secondary support mechanism is positioned above the second main support mechanism, partially connected to the second main support mechanism, and extends toward the first working assembly. Both the first and second secondary support mechanisms extend inward, shortening the travel in the secondary scanning direction.

[0038] When the optical processing system with two work tables is in operation, the processing of the workpiece is completed through the following steps.

[0039] At the first moment T1, the workpiece P1 to be processed is placed on the first workbench assembly.

[0040] At the second moment T2, the first workbench assembly drives the workpiece P1 to be processed to move in the scanning direction to the alignment station, and the alignment system aligns the workpiece P1 to be processed on the first workbench assembly, and simultaneously places the workpiece P2 to be processed on the second workbench assembly.

[0041] At the third moment T3, the first worktable assembly moves the workpiece P1 to be processed in the scanning direction to the optical processing station. The first scanning direction slide moves the workpiece P1 to be processed in the secondary scanning direction to below the optical lens for optical processing. Simultaneously, the second worktable assembly moves the workpiece P2 to be processed in the scanning direction to the alignment station. The alignment system aligns the workpiece P2 on the second worktable assembly.

[0042] At the fourth moment T4, the first scanning direction slide drives the workpiece P1 to be processed to move in the secondary scanning direction to the initial secondary scanning direction position. The first worktable assembly drives the workpiece P1 to be processed to move in the scanning direction to the unloading station for unloading. Simultaneously, the second worktable assembly drives the workpiece P2 to be processed to move in the scanning direction to the optical processing station. The second scanning direction slide drives the workpiece P2 to be processed to move in the secondary scanning direction below the optical lens for optical processing.

[0043] At the fifth moment T5, the first worktable assembly moves in the scanning direction to the loading station, and the workpiece P3 to be processed is placed on the first worktable assembly. The second scanning direction slide drives the workpiece P2 to be processed in the secondary scanning direction to the secondary scanning direction initial position. The second worktable assembly then drives the workpiece P2 to be processed in the scanning direction to the unloading station, and the workpiece P2 is unloaded.

[0044] At the sixth moment, T6, the first worktable assembly moves the workpiece P3 in the scanning direction to the alignment station, where the alignment system aligns the workpiece P3 on the first worktable assembly. Simultaneously, the second worktable assembly moves in the scanning direction to the loading station, where the workpiece P4 is placed on the second worktable assembly.

[0045] Repeat the above steps to complete batch processing of workpieces.

[0046] In the above-mentioned processing method, the first working component and the second working component move to the center position along the sub-scanning direction only when they are in the processing station, and after completing the optical processing, the first workbench component and the second workbench component move in the opposite direction to the side position. In another embodiment of the processing method of the dual-workbench optical processing system, after the first workbench component and the second workbench component complete the workpiece loading, one of the workbench components moves to the center position along the sub-scanning direction, then moves to the alignment station along the scanning direction to perform the alignment operation, and then moves to the processing station to perform optical processing. After the aforementioned workbench component leaves the alignment station, the other workbench component moves to the center position along the sub-scanning direction, then moves to the alignment station along the scanning direction to perform the alignment operation, and then moves to the processing station to complete the optical processing. A detailed explanation is given below.

[0047] At the first moment T1, the workpiece P1 to be processed is placed on the first workbench assembly.

[0048] At the second moment T2, the first workbench assembly moves the workpiece P1 to the center in the secondary scanning direction and then moves to the alignment station along the scanning direction. The alignment system aligns the workpiece P1 on the first workbench assembly. Simultaneously, the workpiece P2 is placed on the second workbench assembly.

[0049] At the third moment T3, the first worktable assembly moves the workpiece P1 in the scanning direction to the optical processing station for optical processing. Simultaneously, the second worktable assembly moves the workpiece P2 in the secondary scanning direction to the center position and then moves along the scanning direction to the alignment station. The alignment system aligns the workpiece P2 on the second worktable assembly.

[0050] At the fourth moment T4, the first worktable assembly moves the workpiece P1 to be processed in the secondary scanning direction to the side position in the secondary scanning direction. The first worktable assembly then moves the workpiece P1 to be processed in the scanning direction to the unloading station for unloading. Simultaneously, the second worktable assembly moves the workpiece P2 to be processed in the scanning direction to the optical processing station for optical processing.

[0051] At the fifth moment T5, the first worktable assembly moves in the scanning direction to the loading station, and the workpiece P3 to be processed is placed on the first worktable assembly. The second scanning direction slide drives the workpiece P2 to be processed in the secondary scanning direction to the side position in the secondary scanning direction. The second worktable assembly drives the workpiece P2 to be processed in the scanning direction to the unloading station, and the workpiece P2 is unloaded.

[0052] At the sixth moment, T6, the first worktable assembly moves workpiece P3 in the secondary scanning direction to the center position and then moves along the scanning direction to the alignment station. The alignment system aligns workpiece P3 on the first worktable assembly. Simultaneously, the second worktable assembly moves in the scanning direction to the loading station, where workpiece P4 is placed on the second worktable assembly.

[0053] Repeat the above steps to complete batch processing of workpieces.

[0054] The first workbench assembly and the second workbench assembly can also move in the secondary scanning direction after moving to the alignment station, so as to drive the workpiece to be processed to move to the middle position.

[0055] The loading station and the unloading station can be located at both ends or at the same station.

[0056] The first and second workbench assemblies perform alignment and optical processing operations at a central location, reducing the travel distance of the image acquisition mechanism in the alignment system. The optical lens is fixedly positioned, and the first and second workbench assemblies drive the workpiece to be processed, thereby avoiding errors caused by the movement of the optical lens and improving processing accuracy.

[0057] When a dual-workbench optical processing system is applied to the field of direct-write exposure, the optical processing system adopts a direct-write exposure lens, and the direct-write exposure lens includes a spatial light modulation element.

Claims

1. A dual-worktable optical processing system, comprising a base, a first worktable assembly, a second worktable assembly, an alignment system, and an optical processing system, characterized in that: The optical processing system includes a plurality of fixed optical lenses, which are located between the first workbench assembly and the second workbench assembly. The first workbench assembly and the second workbench assembly both include a scanning direction movement mechanism, a sub-scanning direction movement mechanism, a vertical supporting mechanism and a supporting platform. The scanning direction movement mechanism is installed on the base, the sub-scanning direction movement mechanism is installed on the scanning direction movement mechanism, the vertical supporting mechanism is installed on the sub-scanning direction movement mechanism, and the supporting platform is installed on the vertical supporting mechanism. The vertical supporting mechanism includes a main supporting mechanism and a sub-supporting mechanism. The sub-supporting mechanism is placed on the upper part of the main supporting mechanism. The main supporting mechanism is connected to the sub-scanning direction movement mechanism. The sub-supporting mechanism carries The support platform is partially connected to the main supporting mechanism and extends inward. The main supporting mechanism has a trapezoidal structure, gradually widening from the side close to the secondary supporting mechanism to the side close to the secondary scanning direction movement mechanism and tilting toward the inside; the first workbench assembly and the second workbench assembly pass through the alignment system and the optical processing system respectively in turn, and the alignment station of the first workbench assembly and the alignment station of the second workbench assembly are located on both sides of the optical processing system. After the first workbench assembly and the second workbench assembly are aligned, they are moved in the secondary scanning direction to the optical processing system for optical processing. When one workbench assembly is performing alignment processing at the side position, the other workbench assembly is performing optical processing at the middle position.

2. The dual-worktable optical processing system according to claim 1, characterized in that: The scanning direction motion mechanism includes relatively arranged scanning direction guide rails, scanning direction sliders arranged corresponding to the scanning direction guide rails, and a scanning direction slide seat. The scanning direction guide rails are arranged on the base, and the scanning direction slide seat and the scanning direction guide rails are connected through the scanning direction sliders.

3. The dual-worktable optical processing system according to claim 2, characterized in that: The secondary scanning direction movement mechanism includes a secondary scanning direction guide rail and a corresponding secondary scanning direction slider. The secondary scanning direction guide rail is arranged on the scanning direction slide, and the secondary scanning direction slider carries the vertical supporting mechanism.

4. The dual-worktable optical processing system according to claim 3, characterized in that: The centers of gravity of the vertical supporting mechanism and the supporting platform are collinear with the center of gravity of the secondary scanning direction slider in the vertical direction.

5. The dual-worktable optical processing system according to claim 3, characterized in that: The travel of the vertical supporting mechanism in the secondary scanning direction is set according to the position of the center of gravity of the vertical supporting mechanism. When the vertical supporting mechanism moves in the secondary scanning direction, the center of gravity of the vertical supporting mechanism is located between the oppositely arranged scanning direction guide rails.

6. The dual-worktable optical processing system according to claim 3, characterized in that: The maximum spacing between the supporting platforms of the first workbench assembly and the second workbench assembly in the secondary scanning direction is greater than the width of one supporting platform in the secondary scanning direction.

7. The dual-worktable optical processing system according to claim 1, characterized in that: The optical lens is a direct-write exposure lens.

8. The processing method of the dual-worktable optical processing system according to any one of claims 1 to 7, characterized in that: The first workbench assembly and the second workbench assembly perform alignment operations and optical processing operations in sequence. When the first workbench assembly and the second workbench assembly meet, one of the workbench assemblies is in the middle position and the other workbench assembly is in the side position.

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