Light source alignment determination method and apparatus, electronic device, and storage medium

Abstract

The application provides a light source alignment determination method and device, electronic equipment and a storage medium, and the method comprises the following steps: obtaining an interference pattern generated by holographic imaging or a target mask after adjusting a mask; obtaining the light intensity of light transmitted through a grating detected after irradiation on the grating according to the interference pattern or the target mask; generating a corresponding line change graph according to the light intensity, wherein the line change graph is used to represent an optical signal; determining an alignment point according to the line change graph, and taking the first position information of the current mask corresponding to the alignment point and the second position information of the current silicon wafer as the constraint condition of the light source alignment. Through the application, the problem of high cost, complex system and insufficient stability leading to inaccurate alignment caused by introducing an additional alignment system in the related art is solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of holographic lithography, and in particular, to a light source alignment determination method and device, an electronic device, and a storage medium. BACKGROUND

[0002] Laser holographic lithography is a very promising lithography technology, and its basic principle is to obtain a desired pattern on a silicon wafer by holographic imaging and irradiation of a specially designed holographic mask. During irradiation, light source alignment is often required. In the existing field of holographic lithography, alignment is performed by introducing an additional alignment system. However, the introduction of an additional alignment system often means an additional optical path and a dedicated alignment light source, which increases the cost and complexity and instability of the system.

[0003] Therefore, the related art has the problem of high cost, complex system, and insufficient stability of the additional alignment system, which leads to inaccurate alignment. SUMMARY

[0004] The present application provides a light source alignment determination method and device, an electronic device, and a storage medium to at least solve the problem of high cost, complex system, and insufficient stability of the additional alignment system, which leads to inaccurate alignment in the related art.

[0005] According to an aspect of an embodiment of the present application, a light source alignment determination method is provided, which includes:

[0006] obtaining an interference pattern generated by holographic imaging or a target mask adjusted from a mask;

[0007] obtaining, according to the interference pattern or the target mask, an irradiation intensity of light detected after irradiation on a grating and transmitted through the grating;

[0008] generating a corresponding line change graph according to the irradiation intensity, wherein the line change graph is used to represent an optical signal;

[0009] determining an alignment point according to the line change graph, and taking first position information of a current mask corresponding to the alignment point and second position information of a current silicon wafer as constraint conditions for light source alignment.

[0010] According to another aspect of an embodiment of the present application, a light source alignment determination device is also provided, which includes:

[0011] an acquisition module configured to obtain an interference pattern generated by holographic imaging or a target mask adjusted from a mask;

[0012] a obtaining module configured to obtain, according to the interference pattern or the target mask, an illumination intensity of light transmitted through a grating after the grating is irradiated;

[0013] a first generating module configured to generate a corresponding line variation graph according to the illumination intensity, wherein the line variation graph is used to represent an optical signal;

[0014] a determining module configured to determine an alignment point according to the line variation graph, and take first position information of a current mask corresponding to the alignment point and second position information of a current silicon wafer as constraint conditions for light source alignment.

[0015] Optionally, the obtaining module comprises:

[0016] a first acquiring unit configured to acquire a spatial distribution of the illumination intensity of the interference pattern in a preset period;

[0017] a second acquiring unit configured to acquire a grating containing the preset period;

[0018] a third acquiring unit configured to acquire the illumination intensity of the light transmitted through the grating after the grating is irradiated in a process of aligning the spatial distribution to the grating.

[0019] Optionally, the first generating module comprises:

[0020] a first generating unit configured to generate an optical signal from the spatial distribution and the grating;

[0021] a first generating unit configured to generate a first curve variation graph according to the optical signal.

[0022] Optionally, the obtaining module comprises:

[0023] a second generating unit configured to use the target mask to make the light source irradiate to the grating through the target mask, and generate the illumination intensity of the light transmitted through the grating as a first order function of a signal.

[0024] Optionally, the first generating module comprises:

[0025] a second generating unit configured to generate an optical signal from the illumination intensity of the first order function;

[0026] a third generating unit configured to generate a polyline variation graph according to the optical signal.

[0027] Optionally, the apparatus further comprises:

[0028] The setting module is configured to set a light intensity distribution of the light intensity that is a linear function in a first preset period as a first preset distribution and set a light intensity distribution of the light intensity that is a linear function in a second preset period as a second preset distribution after the light intensity that is a linear function is generated through the grating;

[0029] The generating module is configured to generate an optical signal based on the first preset distribution and the second preset distribution.

[0030] The second generating module is configured to generate a second curve change graph according to the optical signal.

[0031] Optionally, the determining module comprises:

[0032] The judging unit is configured to judge whether the intersection point generated by the intersection of the vertexes is contained in the line change graph.

[0033] The setting unit is configured to set the intersection point as an alignment point in a case where it is determined that the intersection point exists.

[0034] According to still another aspect of the embodiments of the present application, an electronic device is provided, which comprises a processor, a communication interface, a memory and a communication bus, wherein the processor, the communication interface and the memory complete communication with each other through the communication bus; the memory is configured to store a computer program; and the processor is configured to execute the method steps in any of the above embodiments by running the computer program stored in the memory.

[0035] According to still another aspect of the embodiments of the present application, a computer readable storage medium is provided, which stores a computer program, wherein the computer program is configured to execute the method steps in any of the above embodiments when running.

[0036] In the embodiment of the present application, the interference pattern generated by holographic imaging or the target mask after adjusting the mask is obtained; the light intensity transmitted through the grating after being detected by the grating is obtained according to the interference pattern or the target mask; the corresponding line change graph is generated according to the light intensity, wherein the line change graph is used to represent the optical signal; the alignment point is determined according to the line change graph, and the first position information of the current mask corresponding to the alignment point and the second position information of the current silicon wafer are used as the constraint condition of the light source alignment. Since the spatial light intensity distribution can be designed by the holographic lithography technology in the embodiment of the present application, the light intensity transmitted through the grating is obtained by using the interference pattern generated by the holographic imaging or the target mask after adjusting the mask, and then the alignment point is determined according to the signal line change graph received by the signal receiver. This set of alignment method does not need additional optical path, device and optical process, so it can reduce energy consumption, reduce cost, reduce error, simplify system, reduce installation and deployment difficulty, reduce processing difficulty, improve the integrity, stability and accuracy of the whole system, and solve the problems of high cost, complex system and poor stability caused by introducing additional alignment system in the related art. BRIEF DESCRIPTION OF DRAWINGS

[0037] The accompanying drawings, which are incorporated into and form a part of the specification, illustrate one embodiment consistent with the present application and, together with the description, serve to explain the principles of the application.

[0038] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the accompanying drawings needed to be used in the embodiments or prior art description will be briefly introduced.

[0039] Figure 1 is a schematic diagram of an optional conventional phase grating alignment system according to an embodiment of the present application;

[0040] Figure 2 is a schematic diagram of an optional variation trend of trigonometric function according to an embodiment of the present application;

[0041] Figure 3 is a schematic diagram of an optional determination method of light source alignment according to an embodiment of the present application;

[0042] Figure 4 is a spatial distribution diagram of light intensity generated by a holographic mask according to an embodiment of the present application;

[0043] Figure 5 is an optional grating structure pattern according to an embodiment of the present application;

[0044] Figure 6 is an optional first curve change graph according to an embodiment of the present application;

[0045] Figure 7 is an optional fold line variation diagram according to an embodiment of the application;

[0046] Figure 8 is an optional first preset distribution of light intensity distribution according to an embodiment of the application;

[0047] Figure 9 is an optional second preset distribution of light intensity distribution according to an embodiment of the application;

[0048] Figure 10 is an optional second curve variation diagram according to an embodiment of the application;

[0049] Figure 11 is a schematic diagram of a laser holographic lithography alignment system for determining light source alignment according to an embodiment of the application;

[0050] Figure 12 is a structural block diagram of an optional device for determining light source alignment according to an embodiment of the application;

[0051] Figure 13 is a structural block diagram of an optional electronic device according to an embodiment of the application. DETAILED DESCRIPTION

[0052] In order to make the person skilled in the art better understand the scheme of the present application, the technical scheme in the embodiments of the present application will be described clearly and completely below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by the person skilled in the art without creative labor should belong to the scope of protection of the present application.

[0053] It should be noted that the terms "first", "second" and the like in the specification and claims of the present application and the above-described drawings are used to distinguish similar objects, and do not necessarily indicate a specific order or a chronological sequence. It should be understood that the data thus used can be interchanged under appropriate circumstances, so that the embodiments of the present application described herein can be implemented in an order other than that illustrated or described herein. In addition, the terms "include" and "have" and any variations thereof are intended to cover non-exclusive inclusion, for example, a process, method, system, product or device that includes a series of steps or units does not have to be limited to those steps or units clearly listed, but can include other steps or units not clearly listed or inherent to these processes, methods, products or devices.

[0054] Lithography is a process of transferring a pattern on a mask to a silicon wafer, which is the main production process in the manufacture of integrated circuits. The process is fundamentally different from traditional mechanical manufacturing techniques in that the structure of an integrated circuit is not formed by three-dimensional solid processing, but is formed by stacking layers on a silicon wafer using planar technology. This process requires precise alignment between layers.

[0055] The integration level of integrated circuits is closely related to the development of lithography technology. More advanced lithography technology leads to higher integration of integrated circuits. Optical projection exposure technology, which projects the pattern on the mask onto the wafer through the projection objective, is currently the most advanced, fastest developing, and most widely used lithography technology in integrated circuit production. However, the market's demand for feature size of integrated circuits is becoming increasingly high, making the requirement for lithography resolution increasingly stringent. How to make the wavelength of the light source shorter, how to make the numerical aperture of the objective larger, how to improve the coating process and assembly technology, etc. are all challenges faced by traditional optical projection technology. Under such technical requirements, new lithography technologies have become a hot research topic at home and abroad. Various new lithography technologies based on completely new methods and processes have emerged, such as extreme ultraviolet lithography, X-ray lithography, ion beam lithography, laser holographic lithography, and nanoimprint lithography.

[0056] Laser holographic lithography is a very promising lithography technology. Its basic principle is to irradiate a specially designed holographic mask to obtain the desired pattern on the wafer through holographic imaging. Compared with traditional projection lithography technology, laser holographic lithography technology does not require a complex projection objective system with extremely stringent process requirements. The light transmission area of the holographic mask is generally larger than that of the traditional mask, so it has higher energy utilization. Moreover, due to the special nature of holographic imaging, each part of the holographic mask records all the information of the desired pattern, so even if the mask is contaminated or damaged to some extent, it will not affect the imaging result. Therefore, this technology has the advantages of low cost and high flexibility. In the existing field of holographic lithography, alignment is often performed by introducing an additional alignment system.

[0057] Introducing an additional alignment system often means introducing an additional optical path and a special alignment light source, which increases the cost and complexity and instability of the system. One of the advantages of laser holographic lithography technology is that it simplifies the optical process and avoids the huge difficulties in processing the optical devices in the projection objective. Introducing an additional alignment system inevitably requires high precision in processing and installing the optical devices in the alignment system, which is contrary to its original intention. The additional alignment system increases energy consumption, improves process requirements, reduces flexibility, and introduces new error quantities, which is contradictory to the advantages of laser holographic lithography technology.

[0058] In addition, traditional phase grating alignment systems, such as Figure 1 As shown, taking a silicon wafer alignment mask as an example, a laser generator serves as the alignment light source. It illuminates the alignment marks on the silicon wafer, causing diffraction. Then, through the optical system of the alignment system, a spatial filter, and a lens in the projection lens, interference imaging occurs at the alignment marks on the mask, forming a set of interference fringes. The alignment marks on the mask are designed as a grating with the same period as the fringes. Thus, when the silicon wafer and the mask undergo relative displacement, the light intensity received by the sensor behind this grating exhibits a trigonometric function trend, such as... Figure 2 As shown, the alignment marks in this system appear in pairs with a small periodicity difference. Thus, when the light intensities produced by these two sets of alignment marks with different periods are the same and they intersect at the vertices, they can be considered aligned. In other words, traditional phase grating alignment systems first form an image containing the mask's positional information or an image containing the silicon wafer's positional information, and then allow one image to interact with the other to obtain a signal containing the positional information of both. How to form the image, and what kind of image is more suitable for this type of work, are challenging problems in this field.

[0059] To address the aforementioned problems, embodiments of this application propose a method for determining light source alignment, such as... Figure 3 As shown, this method can be applied to electronic devices with independent data processing capabilities, such as computer terminals. The method includes:

[0060] Step S301: Obtain the interference pattern generated by holographic imaging or the target mask after adjusting the mask;

[0061] Step S302: Based on the interference pattern or target mask, obtain the light intensity detected after the light is irradiated through the grating.

[0062] Step S303: Generate a corresponding line change graph based on the light intensity, wherein the line change graph is used to characterize the optical signal;

[0063] Step S304: Determine the alignment point based on the line change diagram, and use the first position information of the current mask and the second position information of the current silicon wafer corresponding to the alignment point as constraints for light source alignment.

[0064] Optionally, all masks used in a laser holographic lithography system are holographic masks. By designing the holographic mask, the desired light intensity can be obtained at any location. An interference pattern can then be obtained using holographic imaging technology, or an adjusted target mask can be obtained by adjusting the design of the holographic mask.

[0065] The spatial distribution of the light intensity formed by the interference pattern or the target mask is shown in FIG. 1. Figure 4 The spatial distribution is aligned with a grating of the same period on a wafer worktable, and then during the alignment, the light source is irradiated to the grating, and the light intensity transmitted through the grating is detected, and then a signal receiver, such as a sensor, is arranged behind the grating, and the light intensity received by the sensor presents a line variation graph.

[0066] The intersection point at the vertex is found according to the line variation graph, and the intersection point is taken as an alignment point, and then the position information of the current mask corresponding to the alignment point (i.e., first position information) and the position information of the current wafer (i.e., second position information) are found, so that the first position information and the second position information are the prerequisite or constraint condition for the final alignment of the mask and the wafer.

[0067] In the embodiment of the present application, the interference pattern generated by holographic imaging or the target mask adjusted from the mask is obtained; the light intensity transmitted through the grating detected after the grating is irradiated is obtained according to the interference pattern or the target mask; the corresponding line variation graph is generated according to the light intensity, wherein the line variation graph is used to represent the optical signal; the alignment point is determined according to the line variation graph, and the first position information of the current mask corresponding to the alignment point and the second position information of the current wafer are taken as the constraint condition for the alignment of the light source. Since the spatial light intensity distribution can be designed by the holographic lithography technology in the embodiment of the present application, the light intensity transmitted through the grating is obtained by the interference pattern generated by the holographic imaging or the target mask adjusted from the mask, and then the alignment point is determined according to the signal line variation graph received by the signal receiver. This set of alignment method does not need additional optical path, device and optical process, so it can reduce energy consumption, cost, error, simplify the system, reduce the difficulty of installation and deployment, reduce the processing difficulty, improve the integrity, stability and accuracy of the whole system, and solve the problems of high cost, complex system and poor stability in the related art.

[0068] As an optional embodiment, the light intensity transmitted through the grating detected after the grating is irradiated according to the interference pattern comprises:

[0069] The spatial distribution of the light intensity of the interference pattern in the preset period is obtained;

[0070] The grating containing the preset period is obtained;

[0071] The light intensity transmitted through the grating after the grating is irradiated is obtained during the process of aligning the spatial distribution with the grating.

[0072] Optionally, as shown in Figure 5It is shown that the grating mentioned in the embodiment of the present application includes two structural patterns on the x-axis and y-axis respectively, and the grating structure parameters are set to 16 μm and 17.6 μm. It should be understood that 16 μm and 17.6 μm in the present application are only example data, and the embodiment of the present application should include but not limited to Figure 5 The grating structure parameters are shown. In addition, the smaller the numerical difference between the parameters of the grating structure, the more convenient the grating alignment.

[0073] According to the grating structure pattern, the grating lines in a certain preset period are obtained. At this time, the same light intensity spatial distribution as the preset period in the interference image is also obtained. Then, the light intensity spatial distribution is aligned with the grating, and the light intensity transmitted through the grating after the light source is irradiated on the grating in the alignment process is obtained.

[0074] As an optional embodiment, a corresponding line change graph is generated according to the light intensity, including:

[0075] An optical signal is generated between the spatial distribution and the grating;

[0076] A first curve change graph is generated according to the optical signal.

[0077] Optionally, a sensor for receiving signals is arranged behind the grating, and the optical signal generated between the spatial distribution and the grating is obtained by using the sensor. Then, a first curve change graph is generated according to the optical signal, such as Figure 6 It is shown that it is consistent with the variation trend diagram of the trigonometric function of Figure 2 .

[0078] In the embodiment of the present application, expensive and extremely difficult to process optical devices are not required, and the final spatial light intensity distribution can also be obtained. The same alignment theory model and algorithm as the traditional ones are used, but the alignment accuracy is improved while the energy consumption is reduced.

[0079] As an optional embodiment, according to the target mask, the light intensity transmitted through the grating detected after the light source is irradiated on the grating is obtained, including:

[0080] The target mask is used so that the light source is irradiated on the grating through the target mask, and the signal generated by transmitting through the grating is a first-order function of the light intensity.

[0081] Optionally, since the holographic imaging has the characteristics of realizing any light intensity spatial distribution, the target mask is adjusted so that the adjusted target mask can generate a 1:1 strict spatial distribution similar to a square wave. In this way, the target mask is used so that the light source is irradiated on the grating through the target mask, and the optical signal generated by detecting the light intensity transmitted through the grating will be in the form of a first-order function.

[0082] In the embodiments of this application, since the spatial light intensity distribution can be designed and arbitrarily implemented, this alignment method has great flexibility and adaptability.

[0083] As an optional embodiment, generating a corresponding line change graph based on light intensity includes:

[0084] Optical signals are generated by illumination intensity, which is a linear function.

[0085] A piecewise linear graph is generated based on the optical signal.

[0086] Optionally, such as Figure 7 As shown, the signal receiver (i.e., sensor) placed behind the grating generates a line graph corresponding to the linear function of the signal. Figure 7 It can be seen that, compared to a smooth curve at the vertex, it is easier to see whether there is an intersection between two lines. Compared to a curve, it is easier to judge whether the alignment is accurate.

[0087] As an optional embodiment, after generating the illumination intensity signal as a linear function through the grating, the method further includes:

[0088] Set the light intensity distribution of the linear function of light intensity under the first preset period as the first preset distribution, and set the light intensity distribution of the linear function of light intensity under the second preset period as the second preset distribution;

[0089] Optical signals are generated based on the first and second preset distributions.

[0090] A second curve variation graph is generated based on the optical signal.

[0091] Optionally, after generating a line graph in the form of a linear function from the above embodiments, since... Figure 7 The angle formed when the lines of light intensity on the two sets of alignment marks intersect at their vertices is too small to clearly reflect the intersection. In this embodiment, to make the alignment points more accurate and the viewing clearer, the light intensity distribution is designed to be a strict 1:1 ratio of light to dark: the light intensity distribution of the linear function of the light intensity under the first preset period is set as the first preset distribution, for example, making the light intensity distribution of the bright part show the characteristics of being weak in the middle and strong at both ends, such as... Figure 8 As shown; the light intensity distribution of the linear function of the illumination intensity under the second preset period is set to the second preset distribution, for example, so that the light intensity distribution of the bright part has the characteristics of being strong in the middle and weak at both ends, such as... Figure 9 As shown; this will result in a noticeable difference in the alignment signal near the alignment point, such as Figure 10 The second curve variation graph is shown below. From... Figure 10 and Figure 7The comparison can also be seen that the included angle at the vertex intersection in the upper left corner becomes a larger included angle from the smaller included angle in Figure 7

[0092] As an optional embodiment, the alignment point is determined according to the line variation diagram, comprising:

[0093] determining whether the intersection point generated by the vertex intersection is contained in the line variation diagram;

[0094] In the case where it is determined that the intersection point is generated, the intersection point is taken as the alignment point.

[0095] Optionally, Figure 3 , Figure 7 , Figure 10 are line variation diagrams of the illumination intensity of the two sets of alignment marks with respect to the relative displacement. In the embodiment of the present application, the intersection point where the vertex intersection occurs in the line variation diagram is taken as the alignment point, so that the alignment point can be found without additional optical path, device and optical process.

[0096] Meanwhile, Figure 11 A schematic diagram of a laser holographic lithography alignment system using the alignment determination method of the light source according to the embodiment of the present application is provided, which contains four parts: a holographic laser light source, a holographic mask, a mark on a silicon wafer workbench and a signal receiver. A special spatial light intensity distribution is directly obtained by using the system for aligning the mask and the silicon wafer workbench, without introducing additional optical path and device into the whole system, so that the integrity, stability and accuracy of the whole system are improved. In addition, the system can obtain the spatial light intensity distribution result which is difficult or even impossible to obtain by the traditional optical process, and a brand-new alignment algorithm can be designed based on the result, which has extremely high potential.

[0097] It should be noted that, for the foregoing method embodiments, in order to simply describe, they are all expressed as a series of action combinations, but those skilled in the art should know that the present application is not limited by the action sequence described, because according to the present application, certain steps can be performed in other sequences or simultaneously. Secondly, those skilled in the art should know that the embodiments described in the specification all belong to preferred embodiments, and the actions and modules involved are not necessarily necessary for the present application.

[0098] ​Through the description of the above embodiments, those skilled in the art can clearly understand that the method according to the above embodiments can be realized by means of software on a general hardware platform as necessary, and of course can also be realized by hardware, but in many cases the former is a better embodiment. Based on such understanding, the technical solutions of the present application can be embodied in the form of a software product in essence or in the form of a part of the prior art that makes a contribution, and the computer software product is stored in a storage medium (such as a ROM (Read-Only Memory) / RAM (Random Access Memory), a magnetic disc, an optical disc), and includes a plurality of instructions for causing an end device (which can be a mobile phone, a computer, a server, or a network device, etc.) to execute the method of each embodiment of the present application.

[0099] According to another aspect of the embodiments of the present application, a light source alignment determination device for implementing the above-mentioned light source alignment determination method is also provided. Figure 12 is a structural block diagram of an optional light source alignment determination device according to the embodiments of the present application, as shown in the figure, the device can include: Figure 12

[0100] The acquisition module 1201 is configured to acquire an interference pattern generated by holographic imaging or a target mask after adjustment of the mask.

[0101] The obtaining module 1202 is configured to obtain, according to the interference pattern or the target mask, an illumination intensity of light transmitted through the grating detected after the grating.

[0102] The first generation module 1203 is configured to generate a corresponding line change graph according to the illumination intensity, wherein the line change graph is used to represent an optical signal.

[0103] The determination module 1204 is configured to determine an alignment point according to the line change graph, and take first position information of a current mask corresponding to the alignment point and second position information of a current silicon wafer as constraint conditions of light source alignment.

[0104] It should be noted that the acquisition module 1201 in this embodiment can be used to execute the above-mentioned step S301, the obtaining module 1202 in this embodiment can be used to execute the above-mentioned step S302, the first generation module 1203 in this embodiment can be used to execute the above-mentioned step S203, and the determination module 1204 in this embodiment can be used to execute the above-mentioned step S304.

[0105] ​By the above module, the spatial light intensity distribution can be self-designed by using holographic lithography technology, the interference pattern generated by holographic imaging or the target mask obtained after adjusting the mask is used to obtain the light intensity transmitted through the grating, and then the alignment point is determined according to the signal line change map received by the signal receiver. This set of alignment method does not need additional optical path, device and optical process, so it can reduce energy consumption, reduce cost, reduce error, simplify system, reduce installation and deployment difficulty, reduce processing difficulty, improve the integrity, stability and accuracy of the whole system, and solve the problems of high cost, complex system and poor stability caused by introducing additional alignment system in related technologies.

[0106] As an optional embodiment, the obtaining module comprises:

[0107] The first obtaining unit is configured to obtain the spatial distribution of the light intensity of the interference pattern in the preset period;

[0108] The second obtaining unit is configured to obtain the grating containing the preset period;

[0109] The third obtaining unit is configured to obtain the light intensity transmitted through the grating after the grating is irradiated in the process of aligning the spatial distribution with the grating.

[0110] As an optional embodiment, the first generating module comprises:

[0111] The first generating unit is configured to generate an optical signal from the spatial distribution and the grating;

[0112] The first generating unit is configured to generate a first curve change map according to the optical signal.

[0113] As an optional embodiment, the obtaining module comprises:

[0114] The second generating unit is configured to use the target mask to make the light source irradiate the grating through the target mask, so that the signal transmitted through the grating is a first function of the light intensity.

[0115] As an optional embodiment, the first generating module comprises:

[0116] The second generating unit is configured to generate an optical signal from the first function of the light intensity;

[0117] The third generating unit is configured to generate a polyline change map according to the optical signal.

[0118] As an optional embodiment, the device further comprises:

[0119] The setting module is configured to set a light intensity distribution of the first-order function light intensity in a first preset period as a first preset distribution and set a light intensity distribution of the first-order function light intensity in a second preset period as a second preset distribution after the light intensity of the light passing through the grating is generated as a first-order function;

[0120] The generating module is configured to generate an optical signal based on the first preset distribution and the second preset distribution;

[0121] The second generating module is configured to generate a second curve change graph according to the optical signal.

[0122] As an optional embodiment, the determining module comprises:

[0123] The judging unit is configured to judge whether the intersection point generated by the intersection of the vertexes is contained in the line change graph.

[0124] The setting unit is configured to set the intersection point as the alignment point in a case where it is determined that the intersection point exists.

[0125] According to still another aspect of the embodiments of the present application, an electronic device for implementing the above-mentioned alignment determination method of the light source is further provided, which can be a server, a terminal, or a combination thereof.

[0126] Figure 13 is a structural block diagram of an optional electronic device according to the embodiments of the present application, as shown in Figure 13 the processor 1301, the communication interface 1302 and the memory 1303 complete mutual communication through the communication bus 1304, wherein,

[0127] The memory 1303 is configured to store a computer program;

[0128] The processor 1301 is configured to implement the following steps when executing the computer program stored in the memory 1303:

[0129] obtaining an interference pattern generated by holographic imaging or a target mask after adjustment of a mask;

[0130] According to the interference pattern or the target mask, the light intensity of the light passing through the grating after irradiation on the grating is obtained;

[0131] generating a corresponding line change graph according to the light intensity, wherein the line change graph is used to represent an optical signal;

[0132] determining an alignment point according to the line change graph, and taking first position information of a current mask corresponding to the alignment point and second position information of a current silicon wafer as constraint conditions of the alignment of the light source.

[0133] Optionally, in the embodiment, the communication bus described above can be a PCI (Peripheral Component Interconnect) bus, or an EISA (Extended Industry Standard Architecture) bus, or the like. The communication bus can be divided into an address bus, a data bus, a control bus, and the like. For the convenience of representation, Figure 13 Only one thick line is used in the figure, but it does not mean that there is only one bus or only one type of bus.

[0134] The communication interface is used for communication between the electronic device and other devices.

[0135] The memory can include a RAM, and can also include a non-volatile memory, for example, at least one disk memory. Optionally, the memory can also be at least one storage device located away from the aforementioned processor.

[0136] As an example, as shown in the figure, the memory 1303 can include, but is not limited to, the acquisition module 1201, the obtaining module 1202, the first generation module 1203, and the determination module 1204 in the light source alignment determination device described above. In addition, other module units in the light source alignment determination device described above can also be included, but not limited to, which will not be described in detail in this example. Figure 13

[0137] The processor described above can be a general-purpose processor, which can include, but is not limited to, a CPU (Central Processing Unit), an NP (Network Processor), and the like; and can also be a DSP (Digital Signal Processing), an ASIC (Application Specific Integrated Circuit), an FPGA (Field-Programmable Gate Array) or other programmable logic device, a discrete gate or transistor logic device, a discrete hardware component.

[0138] In addition, the electronic device described above further includes a display for displaying the determination result of the light source alignment.

[0139] Optionally, the specific examples in the embodiment can refer to the examples described in the above embodiments, which will not be described in detail in this embodiment.

[0140] Those skilled in the art can understand that, Figure 13 ​The structure shown is only schematic, and the device implementing the method for determining the alignment of the light source can be a terminal device, which can be a smart phone (such as an Android phone, an iOS phone, etc.), a tablet computer, a palm computer, a Mobile Internet Device (MID), a PAD, or the like. Figure 13 This does not limit the structure of the electronic device described above. For example, the terminal device can further include more or fewer components (such as a network interface, a display device, etc.) than those shown in FIG. 1, or have a different configuration from that shown in FIG. 1. Figure 13 ​ The structure shown is only schematic, and the device implementing the method for determining the alignment of the light source can be a terminal device, which can be a smart phone (such as an Android phone, an iOS phone, etc.), a tablet computer, a palm computer, a Mobile Internet Device (MID), a PAD, or the like.

[0141] A person of ordinary skill in the art can understand that all or part of the steps in the various methods of the above-described embodiments can be completed by a program instructing the relevant hardware of the terminal device, and the program can be stored in a computer-readable storage medium, which can include a flash disk, a ROM, a RAM, a magnetic disk, or an optical disk, etc.

[0142] According to yet another aspect of the embodiments of the present application, a storage medium is further provided. Optionally, in the present embodiment, the storage medium can be used to store program code for executing the method for determining the alignment of the light source.

[0143] Optionally, in the present embodiment, the storage medium can be located on at least one of the plurality of network devices in the network shown in the above-described embodiments.

[0144] Optionally, in the present embodiment, the storage medium is configured to store program code for executing the following steps:

[0145] obtaining an interference pattern generated by holographic imaging or a target mask after adjustment of the mask;

[0146] According to the interference pattern or the target mask, obtaining the light intensity detected after the grating and transmitted through the grating;

[0147] According to the light intensity, generating a corresponding line change graph, wherein the line change graph is used to represent the optical signal;

[0148] According to the line change graph, determining the alignment point, and taking the first position information of the current mask corresponding to the alignment point and the second position information of the current silicon wafer as the constraint condition for the alignment of the light source.

[0149] Optionally, specific examples in the present embodiment can refer to the examples described in the above-described embodiments, and the present embodiment will not be described again.

[0150] ​Optionally, in the embodiment, the storage medium can include, but is not limited to, a U disk, a ROM, a RAM, a mobile hard disk, a magnetic disk or an optical disk, and various storage program codes.

[0151] According to still another aspect of the embodiments of the present application, a computer program product or computer program is also provided, which includes computer instructions stored in a computer readable storage medium; a processor of a computer device reads the computer instructions from the computer readable storage medium, and the processor executes the computer instructions to enable the computer device to perform the steps of the light source alignment determination method in any of the above embodiments.

[0152] The serial numbers of the above embodiments of the present application are only for description, and do not represent the advantages or disadvantages of the embodiments.

[0153] The integrated units in the above embodiments, if realized in the form of software function units and sold or used as independent products, can be stored in the above computer readable storage medium. Based on such understanding, the technical solutions of the present application essentially or the parts that make contributions to the prior art or the whole or part of the technical solutions can be embodied in the form of software products. The computer software product is stored in a storage medium, and includes a plurality of instructions to enable one or more computer devices (which can be personal computers, servers or network devices, etc.) to perform all or part of the steps of the light source alignment determination method of the embodiments of the present application.

[0154] In the above embodiments of the present application, the description of each embodiment has its own focus, and the parts not described in detail in a certain embodiment can be referred to the relevant description of other embodiments.

[0155] In the several embodiments provided by the present application, it should be understood that the disclosed client can be implemented in other ways. Of course, the above device embodiment is only illustrative, for example, the division of units is only a logical function division, and there can be another division manner in actual implementation, for example, a plurality of units or components can be combined or integrated into another system, or some features can be ignored or not executed. In addition, the coupling or direct coupling or communication connection between the shown or discussed mutual units can be indirect coupling or communication connection through some interfaces, units or modules, and can be electrical or other forms.

[0156] The units described as separate components can or can not be physically separate, and the components shown as units can or can not be physical units, i.e. can be located in one place or distributed on a plurality of network units. Part or all of the units can be selected according to actual needs to achieve the purpose of the scheme provided in the embodiments.

[0157] In addition, each of the functional units in the various embodiments of the present application can be integrated in one processing unit, or each unit can exist physically, or two or more units can be integrated in one unit. The integrated unit can be implemented in the form of hardware or in the form of a software functional unit.

[0158] The above is only the preferred embodiment of the present application, and it should be pointed out that, for those skilled in the art, without departing from the principles of the present application, a number of improvements and refinements can be made, which should be considered as the protection scope of the present application.

Claims

1. A method of determining alignment of a light source, characterized by, The method includes: Obtain a target mask after adjusting the mask, wherein the mask is a holographic mask; According to the target mask, the light intensity detected after the light source illuminates the grating is obtained, wherein obtaining the light intensity detected after the light source illuminates the grating according to the target mask includes: using the target mask, after the light source illuminates the grating through the target mask, the light intensity generated by the light source through the grating is a linear function. A corresponding line variation diagram is generated based on the light intensity, wherein the line variation diagram is used to characterize the optical signal; The alignment point is determined based on the line change diagram, and the first position information of the current mask and the second position information of the current silicon wafer corresponding to the alignment point are used as constraints for light source alignment.

2. The method according to claim 1, characterized in that, The step of generating a corresponding line change graph based on the light intensity includes: Optical signals are generated from the light intensity, which is a linear function. A piecewise linear curve is generated based on the optical signal.

3. The method according to claim 1, characterized in that, After generating the illumination intensity through the grating as a linear function of the signal, the method further includes: The light intensity distribution of the light intensity of the linear function under the first preset period is set as the first preset distribution, and the light intensity distribution of the light intensity of the linear function under the second preset period is set as the second preset distribution; An optical signal is generated based on the first preset distribution and the second preset distribution; A second curve variation graph is generated based on the optical signal.

4. The method according to any one of claims 1 to 3, characterized in that, Determining the alignment point based on the line change diagram includes: Determine whether the line variation diagram contains intersection points generated by the intersection of vertices; If the intersection point is determined to exist, the intersection point is used as the alignment point.

5. A device for determining the alignment of a light source, characterized in that, The device includes: An acquisition module is used to acquire a target mask after the mask has been adjusted, wherein the mask is a holographic mask; The obtaining module is used to obtain the light intensity detected after the light source illuminates the grating based on the target mask. The obtaining module further includes: a second generating unit, used to generate the light intensity signal as a linear function after the light source illuminates the grating through the target mask using the target mask. The first generation module is used to generate a corresponding line change graph based on the light intensity, wherein the line change graph is used to characterize the optical signal; The determination module is used to determine the alignment point based on the line change diagram, and to use the first position information of the current mask and the second position information of the current silicon wafer corresponding to the alignment point as constraints for light source alignment.

6. An electronic device comprising a processor, a communication interface, a memory, and a communication bus, wherein, The processor, the communication interface, and the memory communicate with each other via the communication bus, characterized in that... The memory is used to store computer programs; The processor is configured to perform the method steps of any one of claims 1 to 4 by running the computer program stored in the memory.

7. A computer-readable storage medium, characterized in that, The storage medium stores a computer program, wherein the computer program, when executed by a processor, implements the steps of the method described in any one of claims 1 to 4.

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