Substrate processing apparatus
By designing a processing module with a common maintenance opening in the substrate processing device, the problems of large floor space and low exhaust efficiency are solved, and the effect of improving exhaust efficiency and productivity while reducing floor space is achieved.
Patent Information
- Application Number
- CN202310706160.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2023-01-26
- Filing Date
- 2023-06-14
- Publication Date
- 2025-10-17
- Estimated Expiration
- 2043-06-14
AI Technical Summary
In the prior art, batch-type substrate processing apparatuses occupy a large area and have low exhaust efficiency, making it difficult to improve the exhaust efficiency while reducing the area occupied.
A processing module design is adopted, with a first side wall and a second side wall separated in a first horizontal direction, and a common maintenance opening for maintaining the first and second processing containers is provided on the second side wall. By narrowing the width of the maintenance opening, a compact arrangement of the exhaust box is achieved, thereby improving the exhaust efficiency.
While reducing the floor space, the exhaust efficiency of the substrate processing device is improved, the exhaust time is shortened, the productivity is improved, and the occurrence of the loading effect is effectively suppressed.
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Figure CN118398517B_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to a substrate processing apparatus. Background Art
[0002] There is known a technique in which two processing containers are arranged adjacent to each other in one apparatus in a batch-type substrate processing apparatus and a common maintenance area is formed between equipment boxes provided on the rear sides thereof (see, for example, Patent Document 1).
[0003] <Prior Art Literature>
[0004] <Patent Document>
[0005] Patent Document 1: International Publication No. 2018 / 003072 Summary of the Invention
[0006] <Problems to be Solved by the Invention>
[0007] The present disclosure provides a technology capable of improving exhaust efficiency while reducing floor space.
[0008] <Methods used to solve the problem>
[0009] According to one aspect of the present disclosure, a substrate processing device includes: a processing module having a first side wall and a second side wall separated in a first horizontal direction; and a conveying module arranged adjacent to the first side wall and conveying substrates to the processing module, wherein the processing module has a first processing container and a second processing container adjacent to each other in a second horizontal direction orthogonal to the first horizontal direction, and a common maintenance opening for maintaining the first processing container and the second processing container is provided on the second side wall.
[0010] <Effects of the Invention>
[0011] According to the present disclosure, it is possible to improve exhaust efficiency while reducing the footprint. BRIEF DESCRIPTION OF THE DRAWINGS
[0012] Figure 1 It is a plan view showing the substrate processing apparatus according to the first embodiment.
[0013] Figure 2 It is along Figure 1 A cross-sectional view taken along line II-II.
[0014] Figure 3 It is along Figure 1 A cross-sectional view taken along line III-III.
[0015] Figure 4 It is along Figure 1 A cross-sectional view taken along line IV-IV.
[0016] Figure 5 is a plan view showing a substrate processing apparatus according to a second embodiment.
[0017] Figure 6 is a plan view showing a substrate processing apparatus according to a third embodiment.
[0018] Figure 7 is a plan view showing a substrate processing apparatus according to a fourth embodiment.
[0019] Figure 8 is a plan view showing a substrate processing apparatus according to a fifth embodiment. DETAILED DESCRIPTION
[0020] Hereinafter, non-limiting and exemplary embodiments of the present disclosure will be described with reference to the accompanying drawings. In all the drawings, the same or corresponding parts or components are given the same or corresponding reference numerals, and overlapping description will be omitted. In the present specification, the X-axis direction, the Y-axis direction, and the Z-axis direction are mutually orthogonal directions. The X-axis direction and the Y-axis direction are horizontal directions, and the Z-axis direction is a vertical direction. The X-axis direction is one example of a first horizontal direction, and the Y-axis direction is one example of a second horizontal direction.
[0021] [First Embodiment]
[0022] Reference Figures 1 to 4 The substrate processing apparatus 1A according to the first embodiment will be described. Figure 1 is a plan view showing the substrate processing apparatus 1A according to the first embodiment. Figure 2 is a cross-sectional view taken along the line II-II of Figure 1 is a cross-sectional view taken along the line III-III of Figure 3 is a cross-sectional view taken along the line IV-IV of Figure 1 is a cross-sectional view taken along the line IV-IV of Figure 3 (a) shows a case where the first boat 33 is in a position thereof relative to the processing module 3 when being carried in and out. Figure 3 (b) shows a case where the first processing container 31 is in a position thereof relative to the processing module 3 when being carried in and out. Figure 4 is a cross-sectional view taken along the line IV-IV of Figure 1 is a cross-sectional view taken along the line IV-IV of
[0023] The substrate processing apparatus 1A includes a transport module 2, a processing module 3, an exhaust unit 4, and a gas supply unit 5.
[0024] The transport module 2 is arranged adjacent to the first side wall 3a of the processing module 3. The transport module 2 transports the substrate W to the processing module 3. The transport module 2 has a load port 21, a stocker 22, and a substrate transfer device 23.
[0025] The load port 21 is disposed on the negative side in the X-axis direction of the transport module 2. The load port 21 is disposed with a plurality of (for example, 2) in the Y-axis direction. However, the number of the load port 21 is not particularly limited. The cassette C is placed on the load port 21. The cassette C accommodates a plurality of (for example, 25) substrates W. The cassette C is carried in and carried out with respect to the load port 21. The cassette C holds the substrates W horizontally. The cassette C is, for example, a FOUP (Front Opening Unified Pod).
[0026] The stocker 22 is disposed with a plurality of (for example, 2) in the Z-axis direction on the negative side in the X-axis direction of the transport module 2. The stocker 22 is disposed with a plurality of (for example, 2) in the Z-axis direction on the positive side in the X-axis direction of the transport module 2. The stocker 22 can also be disposed with a plurality in the Y-axis direction. However, the number of the stocker 22 is not particularly limited. The stocker 22 temporarily stores the cassette C.
[0027] The substrate transfer device 23 transports the substrate W between the cassette C placed on the load port 21 and the first boat 33 and the second boat 34. The substrate transfer device 23, for example, simultaneously transports a plurality of substrates W. For example, the substrate transfer device 23 takes out the substrate W before processing from the cassette C placed on the load port 21 and transports it to the first boat 33 and the second boat 34. For example, the substrate transfer device 23 takes out the substrate W after processing from the first boat 33 and the second boat 34 and transports it to the cassette C placed on the load port 21.
[0028] The transport module 2 can have a cassette transfer device that transfers the cassette C between the load port 21 and the stocker 22. The transport module 2 can have a loader for handing over the substrate between the substrate transfer device 23 in addition to the load port 21.
[0029] The processing module 3 has a processing chamber Al and a transport chamber A2. The processing chamber Al and the transport chamber A2 are adjacent in the Z-axis direction. The transport chamber A2 is located on the negative side in the Z-axis direction of the processing chamber Al. The processing module 3 includes a first side wall 3a and a second side wall 3b. The first side wall 3a is located on the negative side in the X-axis direction of the processing module 3. The second side wall 3b is located on the positive side in the X-axis direction of the processing module 3. The first side wall 3a and the second side wall 3b are spaced apart in the X-axis direction. The first side wall 3a and the second side wall 3b respectively extend from the end on the negative side in the Y-axis direction to the end on the positive side in the Y-axis direction of the processing module 3.
[0030] The first side wall 3a and the second side wall 3b respectively extend from the lower end of the transport chamber A2 to the upper end of the processing chamber Al.
[0031] The processing module 3 includes a first processing container 31 , a second processing container 32 , a first boat 33 , a second boat 34 , a first driving mechanism 35 , a second driving mechanism 36 , a maintenance door 37 , and a cleaning unit 38 .
[0032] The first and second processing containers 31 and 32 are arranged in the processing chamber A1. The first and second processing containers 31 and 32 are arranged between the first and second side walls 3a and 3b in the X-axis direction. The first and second processing containers 31 and 32 are arranged adjacent to each other in the Y-axis direction.
[0033] The first processing container 31 is heated by a heater (not shown). The first processing container 31 is configured to accommodate a first boat 33 holding substrates W. A processing gas is supplied from a gas supply unit 5 to the interior of the first processing container 31. The processing gas is selected according to the type of processing. The processing gas supplied to the interior of the first processing container 31 is exhausted by an exhaust unit 4. Inside the first processing container 31, the desired processing is performed on the substrates W held on the first boat 33 using the processing gas supplied from the gas supply unit 5. The second processing container 32 may also have the same structure as the first processing container 31.
[0034] The first boat 33 holds the plurality of substrates W in a shelf-like manner along the Z-axis direction in such a manner that the plurality of substrates W are held horizontally and arranged in multiple layers in the Z-axis direction. Figure 2 Position shown), processing position, and loading and unloading position ( Figure 3 (a) shown in Figure 2). The handover position is a position below the first processing container 31. The handover position can be directly below the first processing container 31. The processing position is a position where the first boat 33 is accommodated in the first processing container 31, and is a position above the handover position. The processing position can be directly above the handover position. The carry-in and carry-out position is a position on the negative side of the Z-axis direction of the processing module 3, and is a position in the center of the Y-axis direction of the processing module 3. The carry-in and carry-out position can be a position that is offset more toward the positive side in the X-axis direction than the handover position. In this case, it is easy to carry the first boat 33 in and out relative to the processing module 3.
[0035] For example, the first boat 33 moves to the transfer position when transferring substrates W to and from the substrate transfer device 23. For example, the first boat 33 moves to the processing position when performing desired processing on the substrates W. For example, the first boat 33 moves to the loading / unloading position when being unloaded from the processing module 3 for maintenance.
[0036] The second boat 34 holds a plurality of substrates W in a rack shape along the Z-axis direction in a manner that holds the plurality of substrates W horizontally and arranged in multiple layers in the Z-axis direction. The second boat 34 is movable between a handover position, a processing position (positions shown in (a) and (b)), and an input / output position. The handover position is a position below the second processing container 32. The handover position can be directly below the second processing container 32. The processing position is a position in which the second boat 34 is housed in the second processing container 32, and is a position above the handover position. The processing position can be directly above the handover position. The in-out position is a position of the Z-axis direction negative side of the processing module 3, and is a position of the Y-axis direction center of the processing module 3. The in-out position can be a position of the X-axis direction positive side of the processing module 3. In this case, it is easy to in-out the second boat 34 with respect to the processing module 3. The in-out position of the second boat 34 can be the same position as the in-out position of the first boat 33. Figure 3 (a) and Figure 3 (b) shown. The handover position is a position below the second processing container 32. The handover position can be directly below the second processing container 32. The processing position is a position in which the second boat 34 is housed in the second processing container 32, and is a position above the handover position. The processing position can be directly above the handover position. The in-out position is a position of the Z-axis direction negative side of the processing module 3, and is a position of the Y-axis direction center of the processing module 3. The in-out position can be a position of the X-axis direction positive side of the processing module 3. In this case, it is easy to in-out the second boat 34 with respect to the processing module 3. The in-out position of the second boat 34 can be the same position as the in-out position of the first boat 33.
[0037] For example, the second boat 34 moves to the handover position when handing over the substrate W with the substrate transfer device 23. For example, the second boat 34 moves to the processing position when performing a desired process on the substrate W. For example, the second boat 34 moves to the in-out position when being in-out from the processing module 3 for maintenance.
[0038] The first drive mechanism 35 is configured to move the first boat 33 at least between the handover position and the processing position. The first drive mechanism 35 can include a boat elevator. The first drive mechanism 35 can also be configured to move the first boat 33 between the handover position, the processing position, and the in-out position.
[0039] The second drive mechanism 36 is configured to move the second boat 34 at least between the handover position and the processing position. The second drive mechanism 36 can include a boat elevator. The second drive mechanism 36 can also be configured to move the second boat 34 between the handover position, the processing position, and the in-out position.
[0040] A maintenance opening 3c is provided on the second side wall 3b. The maintenance opening 3c is provided on the negative side in the Z-axis direction of the second side wall 3b. The maintenance opening 3c is provided at the same height position as the transport chamber A2. The maintenance opening 3c is provided at a position in the Y-axis direction that contains the middle of the first process container 31 and the second process container 32. The maintenance opening 3c is provided between the first exhaust tank 41a and the second exhaust tank 42a in the Y-axis direction. The maintenance opening 3c is an opening for maintenance of the process module 3. The maintenance opening 3c is a common opening used when the first process container 31, the second process container 32, the first boat 33, and the second boat 34 are carried in and out with respect to the process module 3. Therefore, the maintenance opening 3c has a size that allows the first process container 31, the second process container 32, the first boat 33, and the second boat 34 to pass therethrough.
[0041] For example, the maintenance opening 3c is used when the first process container 31 (second process container 32) is carried out from the inside of the process module 3 in order to replace or clean the first process container 31 (second process container 32) due to breakage of the first process container 31 (second process container 32). For example, the maintenance opening 3c is used when the first boat 33 (second boat 34) is carried out from the inside of the process module 3 in order to replace or clean the first boat 33 (second boat 34) due to breakage of the first boat 33 (second boat 34).
[0042] The maintenance door 37 opens and closes the maintenance opening 3c by horizontal rotation. The maintenance door 37 includes a hinge 37a and a door body 37b. The hinge 37a links the second side wall 3b and the door body 37b. The hinge 37a is provided, for example, on the negative side in the Y-axis direction. The door body 37b can be configured to be able to horizontally rotate with respect to the second side wall 3b via the hinge 37a. When the door body 37b is opened, the first process container 31, the second process container 32, the first boat 33, and the second boat 34 can be carried in and out via the maintenance opening 3c. In Figure 1 In the middle, the door body 37b in the open state is shown in a solid line, the door body 37b in the closed state is shown in a dashed line, and the trajectory of the top end of the door body 37b when the door body 37b is opened and closed is shown in a dot-dash line.
[0043] A cleaning unit 38 is installed on the door body 37b. The cleaning unit 38 is configured to circulate cleaning air into the transport chamber A2. The cleaning air is, for example, an inert gas. The cleaning air supplied into the transport chamber A2 is exhausted from the transport chamber A2 through an exhaust portion (not shown) provided on the first side wall 3a opposite the cleaning unit 38, and is again supplied into the transport chamber A2 from the cleaning unit 38.
[0044] The exhaust unit 4 has a first exhaust tank 41a, a first exhaust duct 41b, a first pressure control valve 41c, a second exhaust tank 42a, a second exhaust duct 42b, and a second pressure control valve 42c.
[0045] The first exhaust tank 41a is disposed adjacent to the second side wall 3b on the positive side in the Y-axis direction of the processing module 3. The first exhaust duct 41b connects the exhaust port 31a of the first processing container 31 with a vacuum pump (not shown). The portion of the first exhaust duct 41b between one end and the other end is housed inside the first exhaust tank 41a. The first pressure control valve 41c is provided inside the first exhaust tank 41a. The first pressure control valve 41c is provided midway through the first exhaust duct 41b. The first pressure control valve 41c controls the pressure inside the first processing container 31 to a desired pressure.
[0046] The second exhaust tank 42a is disposed adjacent to the second side wall 3b on the negative side in the Y-axis direction of the processing module 3. The second exhaust tank 42a is disposed at a spacing apart from the first exhaust tank 41a in the Y-axis direction. The first exhaust tank 41a and the second exhaust tank 42a can be disposed in line symmetry with respect to an imaginary line L that is located at an equal distance from the center of the first processing container 31 and the center of the second processing container 32. The area between the first exhaust tank 41a and the second exhaust tank 42a becomes a maintenance area in which the maintenance opening 3c is exposed. The second exhaust duct 42b connects the exhaust port 32a of the second processing container 32 with a vacuum pump (not shown). The portion of the second exhaust duct 42b between one end and the other end is housed inside the second exhaust tank 42a. The second pressure control valve 42c is provided inside the second exhaust tank 42a. The second pressure control valve 42c is provided midway through the second exhaust duct 42b.
[0047] The second pressure control valve 42c controls the pressure inside the second processing container 32 to a desired pressure.
[0048] The gas supply unit 5 has a first supply tank 51a, a first supply unit 51b, first supply ducts 51c, 51d, and first supply valves 51e, 51f.
[0049] The first supply box 51a is arranged adjacent to the positive side in the X-axis direction of the first exhaust box 41a. The first supply unit 51b is housed inside the first supply box 51a. The first supply conduits 51c, 51d connect the first supply unit 51b to nozzles (not shown) that supply a processing gas to the inside of the first processing container 31, respectively. The first supply valve 51e is provided in the first supply conduit 51c. The first supply valve 51f is provided in the first supply conduit 51d. A mass flow controller (not shown) can also be provided in the first supply conduit 51c and the first supply conduit 51d. The first supply unit 51b supplies a processing gas to the inside of the first processing container 31 via the first supply conduits 51c, 51d.
[0050] The gas supply unit 5 has a second supply box 52a, a second supply unit (not shown), a second supply conduit (not shown), and a second supply valve (not shown).
[0051] The second supply box 52a is arranged adjacent to the positive side in the X-axis direction of the second exhaust box 42a. The second supply unit, the second supply conduit, and the second supply valve can be the same structure as the first supply unit 51b, the first supply conduits 51c, 51d, and the first supply valves 51e, 51f.
[0052] As described above, according to the substrate processing apparatus 1A, there are provided: the processing module 3 having the first side wall 3a and the second side wall 3b that are spaced apart in the X-axis direction; and the transport module 2 arranged adjacent to the first side wall 3a and transporting the substrate W to the processing module 3. The processing module 3 has the first processing container 31 and the second processing container 32 adjacent to each other in the Y-axis direction. On the second side wall 3b, the common maintenance opening 3c for maintaining the first processing container 31 and the second processing container 32 is provided. In this case, the opening width of the maintenance opening 3c can be narrowed to about half the total of the opening widths of the two maintenance openings in the case where the maintenance openings are respectively provided on the first processing container 31 and the second processing container 32. Thus, the first exhaust box 41a and the second exhaust box 42a can be arranged adjacent to the processing module 3, and the width (length in the Y-axis direction) of the first exhaust box 41a and the second exhaust box 42a can be increased. Therefore, the first exhaust conduit 41b and the second exhaust conduit 42b can be arranged in the vicinity of the first processing container 31 and the second processing container 32, respectively, and the first exhaust conduit 41b and the second exhaust conduit 42b can be upsized. Thus, the floor space of the substrate processing apparatus 1A can be reduced, and the exhaust efficiency can be improved.
[0053] For example, in the case where a film is formed on the substrate W by atomic layer deposition (ALD), the exhaust time can be shortened by improving the exhaust efficiency, and thus the productivity can be improved.
[0054] For example, in a case where a film is formed on a surface of a substrate W on which a pattern is formed, it is possible to use a large flow of a processing gas for processing by improving the exhaust efficiency, and thus it is possible to suppress the occurrence of a loading effect regardless of the shape of the pattern.
[0055] [2nd Embodiment]
[0056] Reference Figure 5 A substrate processing apparatus 1B according to the 2nd embodiment will be described. Figure 5 is a plan view illustrating the substrate processing apparatus 1B according to the 2nd embodiment.
[0057] The substrate processing apparatus 1B is different from the substrate processing apparatus 1A in that the second side wall 3b has a pair of second inclined portions 3f, 3g which are arranged in a V shape with a second top portion 3h protruding toward the first side wall 3a side when viewed from the Z-axis direction. Hereinafter, a description will be made focusing on the difference from the substrate processing apparatus 1A.
[0058] As Figure 5 illustrated, the second side wall 3b has a pair of second non-inclined portions 3d, 3e and a pair of second inclined portions 3f, 3g.
[0059] The pair of second non-inclined portions 3d, 3e are arranged at intervals in the Y-axis direction. The second non-inclined portion 3d and the second non-inclined portion 3e can be arranged to be line-symmetric with respect to an imaginary line L located at an equal distance from the center of the first processing container 31 and the center of the second processing container 32. On the second non-inclined portion 3d, the first exhaust box 41a is arranged adjacently. On the second non-inclined portion 3e, the second exhaust box 42a is arranged adjacently.
[0060] The pair of second inclined portions 3f, 3g are arranged between the second non-inclined portion 3d and the second non-inclined portion 3e in the Y-axis direction. The pair of second inclined portions 3f, 3g are arranged in a V shape with a second top portion 3h protruding toward the first side wall 3a side when viewed from the Z-axis direction. The second top portion 3h is located between the first processing container 31 and the second processing container 32 in the Y-axis direction. The second inclined portion 3f and the second inclined portion 3g can be arranged to be line-symmetric with respect to the imaginary line L located at an equal distance from the center of the first processing container 31 and the center of the second processing container 32. The angle of the second top portion 3h is, for example, 90° or more.
[0061] The maintenance openings 3c are continuously provided in a manner that spans from one second inclined portion 3f to another second inclined portion 3g. The maintenance openings 3c are provided, for example, so as to extend over the entirety of the pair of second inclined portions 3f, 3g when viewed in the Z-axis direction. In this case, since the opening width of the maintenance openings 3c is widened, the first process container 31, the second process container 32, the first boat 33, and the second boat 34 are easily carried in and out with respect to the process module 3 when maintenance is performed on the process module 3. However, the maintenance openings 3c can also be provided only on a portion of the pair of second inclined portions 3f, 3g when viewed in the Z-axis direction.
[0062] The maintenance door 37 opens and closes the maintenance openings 3c by horizontal rotation. The maintenance door 37 has a first hinge 37c, a first door body 37d, a second hinge 37e, and a second door body 37f. The first hinge 37c links the second side wall 3b and the first door body 37d. The first hinge 37c is provided, for example, at a boundary portion of the second non-inclined portion 3e and the second inclined portion 3g. The first door body 37d can be configured to be able to horizontally rotate with respect to the second side wall 3b via the first hinge 37c. The second hinge 37e links the first door body 37d and the second door body 37f. The second door body 37f can be configured to be able to horizontally rotate with respect to the first door body 37d via the second hinge 37e. When the first door body 37d and the second door body 37f are opened, the first process container 31, the second process container 32, the first boat 33, and the second boat 34 can be carried in and out via the maintenance openings 3c. In Figure 5 In the embodiment, the first door body 37d and the second door body 37f in the opened state are shown by solid lines, and the first door body 37d and the second door body 37f in the closed state are shown by dashed lines.
[0063] As described above, according to the substrate processing apparatus 1B, the second side wall 3b has a pair of second inclined portions 3f, 3g that are arranged in a V shape with the second top portion 3h protruding toward the first side wall 3a side when viewed in the Z-axis direction. In this case, the length of the maintenance openings 3c in the width direction (Y-axis direction) of the substrate processing apparatus 1B is reduced without changing the opening width of the maintenance openings 3c. Thus, the apparatus width of the substrate processing apparatus 1B can be reduced.
[0064] [3RD EMBODIMENT]
[0065] Reference Figure 6 The substrate processing apparatus 1C according to the 3rd embodiment will be described. Figure 6 is a plan view showing the substrate processing apparatus 1C according to the 3rd embodiment.
[0066] The substrate processing apparatus 1C differs from the substrate processing apparatus 1B in that independent maintenance openings (a first maintenance opening 3c1 and a second maintenance opening 3c2) are provided on the pair of second inclined portions 3f and 3g.
[0067] like Figure 6 As shown, the second side wall 3b has a pair of second non-inclined portions 3d, 3e, and a pair of second inclined portions 3f, 3g.
[0068] The pair of second inclined portions 3f and 3g are arranged between the second non-inclined portion 3d and the second non-inclined portion 3e in the Y-axis direction. When viewed from the Z-axis direction, the pair of second inclined portions 3f and 3g are arranged in a V-shape, with a second top portion 3h protruding toward the first sidewall 3a. The second top portion 3h is located between the first processing container 31 and the second processing container 32 in the Y-axis direction. The second inclined portions 3f and the second inclined portions 3g can be arranged symmetrically with respect to an imaginary line L located equidistant from the center of the first processing container 31 and the center of the second processing container 32.
[0069] A first maintenance opening 3c1 is provided on the second inclined portion 3f. A second maintenance opening 3c2 is provided on the second inclined portion 3g. The first maintenance opening 3c1 and the second maintenance opening 3c2 are respectively located at the same height as the transfer chamber A2. The first maintenance opening 3c1 and the second maintenance opening 3c2 are located between the first exhaust box 41a and the second exhaust box 42a in the Y-axis direction. The first maintenance opening 3c1 and the second maintenance opening 3c2 are openings for performing maintenance on the process module 3. The first maintenance opening 3c1 is used when loading and unloading the first process container 31 and the first boat 33 into and out of the process module 3. The second maintenance opening 3c2 is used when loading and unloading the second process container 32 and the second boat 34 into and out of the process module 3. The first process container 31 and the first boat 33 are loaded and unloaded, for example, in a direction perpendicular to the second inclined portion 3f (the first maintenance opening 3c1). The second process container 32 and the second boat 34 are loaded and unloaded, for example, in a direction perpendicular to the second inclined portion 3g (the second maintenance opening 3c2). The direction in which the first processing container 31 and the first boat 33 are loaded and unloaded may intersect with the direction in which the second processing container 32 and the second boat 34 are loaded and unloaded. A first maintenance door 371 is provided on the first maintenance opening 3c1. A second maintenance door 372 is provided on the second maintenance opening 3c2.
[0070] The first maintenance door 371 opens and closes the first maintenance opening 3c1 by horizontal rotation. The first maintenance door 371 has a first hinge 371a and a first door body 371b. The first hinge 371a links the second side wall 3b and the first door body 371b. The first hinge 371a is provided, for example, at a boundary portion of the second non-inclined portion 3d and the second inclined portion 3f. The first door body 371b can be configured to be able to horizontally rotate with respect to the second side wall 3b via the first hinge 371a. When the first door body 371b is opened, the first process container 31 and the first boat 33 can be carried in and out via the first maintenance opening 3c1. In Figure 6 In the first embodiment, the first door body 371b in the opened state is shown by a solid line, the first door body 371b in the closed state is shown by a dashed line, and the trajectory of the top end of the first door body 371b when the first door body 371b is opened and closed is shown by a dotted line.
[0071] The second maintenance door 372 opens and closes the second maintenance opening 3c2 by horizontal rotation. The second maintenance door 372 has a second hinge 372a and a second door body 372b. The second hinge 372a links the second side wall 3b and the second door body 372b. The second hinge 372a is provided, for example, at a boundary portion of the second non-inclined portion 3e and the second inclined portion 3g. The second door body 372b can be configured to be able to horizontally rotate with respect to the second side wall 3b via the second hinge 372a. When the second door body 372b is opened, the second process container 32 and the second boat 34 can be carried in and out via the second maintenance opening 3c2. The rotational trajectory of the second door body 372b can overlap the rotational trajectory of the first door body 371b when viewed from the Z-axis direction. In Figure 6 In the second embodiment, the second door body 372b in the opened state is shown by a solid line, the second door body 372b in the closed state is shown by a dashed line, and the trajectory of the top end of the second door body 372b when the second door body 372b is opened and closed is shown by a dotted line.
[0072] The process module 3 can have a partition wall 3i for partitioning the first process container 31 and the second process container 32. The cleaning unit 38 can be provided on the partition wall 3i.
[0073] As described above, according to the substrate processing apparatus 1C, the second side wall 3b has a pair of second inclined portions 3f, 3g arranged in a V shape with the second top portion 3h protruding toward the first side wall 3a side when viewed from the Z-axis direction. In this case, the length of each maintenance opening in the width direction (Y-axis direction) of the substrate processing apparatus 1C is made smaller without changing the opening width of each maintenance opening (the first maintenance opening 3c1, the second maintenance opening 3c2). Thus, the apparatus width of the substrate processing apparatus 1C can be reduced.
[0074] [4th Embodiment]
[0075] Referring to Figure 7 The substrate processing apparatus 1D according to the fourth embodiment will be described. Figure 7 is a plan view showing the substrate processing apparatus 1D according to the fourth embodiment.
[0076] The substrate processing apparatus 1D differs from the substrate processing apparatus 1C in that the first side wall 3a has a pair of first inclined portions 3l, 3m arranged in a V shape with a first top portion 3n protruding toward the second side wall 3b side when viewed from the Z-axis direction. Hereinafter, description will be made focusing on the difference from the substrate processing apparatus 1C.
[0077] As shown in Figure 7 , the first side wall 3a has a pair of first non-inclined portions 3j, 3k and a pair of first inclined portions 3l, 3m.
[0078] The pair of first non-inclined portions 3j, 3k are arranged at intervals in the Y-axis direction. The first non-inclined portion 3j and the first non-inclined portion 3k can be arranged line-symmetrically with respect to an imaginary line L located at an equal distance from the center of the first processing container 31 and the center of the second processing container 32.
[0079] The pair of first inclined portions 3l, 3m are arranged between the first non-inclined portion 3j and the first non-inclined portion 3k in the Y-axis direction. The pair of first inclined portions 3l, 3m are arranged in a V shape with a first top portion 3n protruding toward the second side wall 3b side when viewed from the Z-axis direction. The first top portion 3n is located between the first processing container 31 and the second processing container 32 in the Y-axis direction. The first inclined portion 3l and the first inclined portion 3m can be arranged line-symmetrically with respect to the imaginary line L located at an equal distance from the center of the first processing container 31 and the center of the second processing container 32. The angle of the first top portion 3n is, for example, 90° or more.
[0080] As described above, in the substrate processing apparatus 1D, the first side wall 3a has a pair of first inclined portions 3l and 3m. When viewed from the Z-axis direction, the first inclined portions 3l and 3m are arranged in a V-shape with a first top portion 3n protruding toward the second side wall 3b. This increases the space available for movement of the substrate transfer device 23. Therefore, even if the substrate processing apparatus 1D is narrow and the space available for movement of the substrate transfer device 23 in the Y-axis direction is narrow, the substrate transfer device 23 can access each boat (the first boat 33 and the second boat 34) from near the center in the Y-axis direction. Furthermore, since the Y-axis movement distance of the substrate transfer device 23 when transferring a substrate W to a boat located opposite the cassette C placed on the load port 21 is shortened, the transport time of the substrate W can be shortened.
[0081] [Fifth embodiment]
[0082] Reference Figure 8 , a substrate processing apparatus 1E according to a fifth embodiment will be described. Figure 8 It is a plan view showing a substrate processing apparatus 1E according to the fifth embodiment.
[0083] The difference between substrate processing apparatus 1E and substrate processing apparatus 1D is that it shares a maintenance area with the adjacent substrate processing apparatus 1F. The following description focuses on the differences from substrate processing apparatus 1D. Substrate processing apparatus 1F can have the same structure as substrate processing apparatus 1E.
[0084] like Figure 8 As shown, the second side wall 3b has a second non-inclined portion 3o, a second inclined portion 3p, and a second inclined portion 3q.
[0085] The second non-inclined portion 3o is provided at the middle of the second side wall 3b in the Y-axis direction. The first exhaust box 41a and the second exhaust box 42a are adjacently provided on the second non-inclined portion 3o. The first exhaust box 41a and the second exhaust box 42a are adjacently arranged in the Y-axis direction.
[0086] The second inclined portion 3p is located on the positive side of the second non-inclined portion 3o in the Y-axis direction. The second inclined portion 3p tilts toward the negative side in the X-axis direction as it moves away from the second non-inclined portion 3o. The second inclined portion 3q is located on the negative side of the second non-inclined portion 3o in the Y-axis direction. The second inclined portion 3q tilts toward the negative side in the X-axis direction as it moves away from the second non-inclined portion 3o.
[0087] A first maintenance opening 3c1 is provided on the second inclined portion 3p. A second maintenance opening 3c2 is provided on the second inclined portion 3q. The first maintenance opening 3c1 and the second maintenance opening 3c2 are provided at the same height position as the transfer chamber A2. The first maintenance opening 3c1 and the second maintenance opening 3c2 are openings for maintenance of the processing module 3. The first maintenance opening 3c1 is an opening used when the first processing container 31 and the first boat 33 are carried in and out with respect to the processing module 3. The second maintenance opening 3c2 is an opening used when the second processing container 32 and the second boat 34 are carried in and out with respect to the processing module 3. A first maintenance door 371 is provided on the first maintenance opening 3c1. A second maintenance door 372 is provided on the second maintenance opening 3c2.
[0088] The second maintenance opening 3c2 of the substrate processing apparatus 1E and the first maintenance opening 3c1 of the substrate processing apparatus 1F are provided in the Y-axis direction between the second exhaust box 42a of the substrate processing apparatus 1E and the first exhaust box 41a of the substrate processing apparatus 1F. That is, no exhaust unit 4 and gas supply unit 5 are provided between the second maintenance opening 3c2 of the substrate processing apparatus 1E and the first maintenance opening 3c1 of the substrate processing apparatus 1F. In this case, the area between the second exhaust box 42a of the substrate processing apparatus 1E and the first exhaust box 41a of the substrate processing apparatus 1F becomes a common maintenance area in which the second maintenance opening 3c2 of the substrate processing apparatus 1E and the first maintenance opening 3c1 of the substrate processing apparatus 1F are exposed.
[0089] The first maintenance door 371 opens and closes the first maintenance opening 3c1 by horizontal rotation. The first maintenance door 371 has a first hinge 371a and a first door body 371b. The first hinge 371a links the second side wall 3b and the first door body 371b. The first hinge 371a is provided, for example, at the boundary portion of the second non-inclined portion 3o and the second inclined portion 3p. The first door body 371b can be configured to be able to horizontally rotate with respect to the second side wall 3b via the first hinge 371a. When the first door body 371b is opened, the first processing container 31 and the first boat 33 can be carried in and out via the first maintenance opening 3c1. In Figure 8 In the first door body 371b, the first door body 371b in the opened state is shown by a solid line, the first door body 371b in the closed state is shown by a dashed line, and the trajectory of the top end of the first door body 371b when the first door body 371b is opened and closed is shown by a dot-dash line.
[0090] The second maintenance door 372 opens and closes the second maintenance opening 3c2 by horizontal rotation. The second maintenance door 372 has a second hinge 372a and a second door body 372b. The second hinge 372a links the second side wall 3b and the second door body 372b. The second hinge 372a is provided, for example, at a boundary portion of the second non-inclined portion 3o and the second inclined portion 3q. The second door body 372b can be configured to be able to horizontally rotate with respect to the second side wall 3b via the second hinge 372a. When the second door body 372b is opened, the second process container 32 and the second boat 34 can be carried in and out via the second maintenance opening 3c2. In Figure 8 In the above-described embodiment, the second door body 372b in the open state is shown by a solid line, the second door body 372b in the closed state is shown by a dashed line, and the trajectory of the top end of the second door body 372b when the second door body 372b is opened and closed is shown by a dotted line.
[0091] When viewed from the Z-axis direction, the rotation trajectory of the first door body 371b of the substrate processing apparatus 1F can overlap the rotation trajectory of the second door body 372b of the substrate processing apparatus 1E.
[0092] As described above, according to the substrate processing apparatus 1E, each of the pair of second inclined portions 3p, 3q is inclined toward the first side wall 3a side as it moves away from the middle position in the Y-axis direction of the second side wall 3b. In this case, the length occupied by each maintenance opening in the width direction of the substrate processing apparatus 1E is made smaller without changing the opening width of each maintenance opening (the first maintenance opening 3c1, the second maintenance opening 3c2). Thus, the apparatus width of the substrate processing apparatus 1E can be reduced. In addition, the exhaust unit 4 and the gas supply unit 5 are not provided between the second maintenance opening 3c2 of the substrate processing apparatus 1E and the first maintenance opening 3c1 of the substrate processing apparatus 1F. In this case, a maintenance region can be shared between the substrate processing apparatus 1E and the substrate processing apparatus 1F arranged adjacent to the substrate processing apparatus 1E. In this way, by the two substrate processing apparatuses 1E, 1F arranged adjacent to each other, a maintenance region having a width (length in the Y-axis direction) equivalent to that of the maintenance regions of the substrate processing apparatus 1C and the substrate processing apparatus 1D is formed.
[0093] It should be understood that the embodiments of the present disclosure are exemplary in all aspects and are not limited. In addition, the above-described embodiments can be omitted, replaced, or changed in various forms without departing from the scope of the appended claims and the spirit thereof.
Claims
1. A substrate processing device, comprising: a processing module having a first sidewall and a second sidewall spaced apart in a first horizontal direction; as well as a conveying module, arranged adjacent to the first side wall and conveying the substrate to the processing module, wherein the processing module comprises a first processing container and a second processing container adjacent to each other in a second horizontal direction orthogonal to the first horizontal direction, A common maintenance opening for maintaining the first processing container and the second processing container is provided on the second side wall. The maintenance opening is arranged to include a middle position between the first processing container and the second processing container in the second horizontal direction. The second side wall has a pair of second inclined portions, and when viewed from a vertical direction, the pair of second inclined portions are arranged in a V-shape with a second top portion protruding toward the first side wall. The second top portion is located between the first processing container and the second processing container in the second horizontal direction.
2. The substrate processing apparatus according to claim 1, wherein: The maintenance opening is provided continuously across from one of the pair of second inclined portions to the other.
3. The substrate processing apparatus according to claim 2, wherein: The processing module includes a maintenance door that opens and closes the maintenance opening by horizontally rotating.
4. The substrate processing apparatus according to claim 3, wherein: The processing module has a cleaning unit mounted on the maintenance door, The cleaning unit supplies clean air into the processing module.
5. The substrate processing apparatus according to any one of claims 1 to 4, further comprising: The first exhaust box and the second exhaust box are arranged at intervals in the second horizontal direction and are adjacent to the second side wall. The first exhaust box contains a first exhaust pipe for exhausting the first processing container. The second exhaust box houses a second exhaust duct for exhausting the second processing container. The substrate processing apparatus according to claim 1 , wherein: The maintenance opening has a size capable of allowing the first processing container and the second processing container to pass therethrough.
7. A substrate processing device comprising: a processing module having a first sidewall and a second sidewall spaced apart in a first horizontal direction; as well as a conveying module, arranged adjacent to the first side wall and conveying the substrate to the processing module, wherein the processing module comprises a first processing container and a second processing container adjacent to each other in a second horizontal direction orthogonal to the first horizontal direction, The second side wall has a pair of second inclined portions arranged in a V-shape when viewed from a vertical direction. A first maintenance opening for maintaining the first processing container is provided on one of the pair of second inclined portions. A second maintenance opening for maintaining the second processing container is provided on the other of the pair of second inclined portions. The processing module has a first maintenance door that opens and closes the first maintenance opening by rotating horizontally; as well as a second maintenance door that opens and closes the second maintenance opening by rotating horizontally; When viewed from a vertical direction, the rotation trajectory of the first maintenance door overlaps with the rotation trajectory of the second maintenance door.
8. The substrate processing apparatus according to claim 7, wherein: The pair of second inclined portions have second top portions that protrude toward the first side wall.
9. The substrate processing apparatus according to claim 8, wherein: The second top portion is located between the first processing container and the second processing container in the second horizontal direction.
10. The substrate processing apparatus according to claim 7, wherein: The first side wall has a pair of first inclined portions, and when viewed from a vertical direction, the pair of first inclined portions are arranged in a V-shape with a first top portion protruding toward the second side wall. The first top portion is located between the first processing container and the second processing container in the second horizontal direction.
11. The substrate processing apparatus according to any one of claims 7 to 10, further comprising: The first exhaust box and the second exhaust box are arranged at intervals in the second horizontal direction and are adjacent to the second side wall. The first exhaust box contains a first exhaust pipe for exhausting the first processing container. The second exhaust box houses a second exhaust duct for exhausting the second processing container.
12. The substrate processing apparatus according to claim 7, wherein: Each of the pair of second inclined portions is inclined toward the first side wall as it moves away from a middle position of the second side wall in the second horizontal direction.
13. The substrate processing apparatus according to claim 12, further comprising: A first exhaust box and a second exhaust box are arranged between the first maintenance opening and the second maintenance opening in the second horizontal direction and are adjacent to the second side wall. The first exhaust box contains a first exhaust pipe for exhausting the first processing container. The second exhaust box houses a second exhaust duct for exhausting the second processing container.
Citation Information
Patent Citations
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