Mixed tail gas separation equipment, method and semiconductor process system

Abstract

The present invention relates to a mixed tail gas separation device, method and semiconductor process system, wherein the mixed tail gas separation device comprises a first condensation unit, a second condensation unit, a phosphine removal unit, an acid gas removal unit and a gas analysis unit. The advantages of the mixed tail gas separation device are that, by connecting the first condensation unit with an upstream semiconductor process device, the first condensation unit can liquefy gaseous trichlorosilane in the mixed gas to achieve the removal of trichlorosilane in the mixed gas; by connecting the second condensation unit with the first condensation unit, the second condensation unit can liquefy gaseous dichlorosilane in the first condensed gas to achieve the removal of dichlorosilane in the mixed gas; by connecting the phosphine removal unit with the second condensation unit, PH3 gas in the second condensed gas can be removed; by connecting the acid gas removal unit with the phosphine removal unit, the acid gas in the first filtered gas can be removed, and H2 with a purity of 2N to 4N can be obtained, thereby improving the purity of hydrogen.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor process gas processing, and in particular to a mixed tail gas separation device, method and semiconductor process system. Background Art

[0002] The most widely used and largest amount of gas in semiconductor technology is hydrogen. This system is a recovery system for H2 tail gas in semiconductors. At present, in the production of semiconductor processes, the residual gases after these processes come out of the clean room through the vacuum tube, and need to be treated by tail gas treatment equipment through combustion or water washing, condensation, adsorption and other methods before being discharged into the central exhaust gas treatment system. This treatment method causes great waste.

[0003] At present, the most common way for semiconductor factories to treat hydrogen is to directly discharge it into the atmosphere after burning and washing. However, the existing hydrogen treatment method of direct combustion will cause a huge waste of hydrogen; in addition, the tail gas of semiconductor factories is a mixed tail gas, which also contains other toxic, harmful and highly corrosive gases, and the combustion method will pollute the environment; in addition, in the process of direct combustion of the mixed tail gas, if the concentration of hydrogen in the mixed tail gas is not well controlled, an explosion may occur, posing a safety hazard.

[0004] Currently, no effective solution has been proposed to address the problems of hydrogen waste, environmental pollution, and safety hazards caused by the mixed tail gas treatment methods existing in related technologies. Summary of the invention

[0005] The purpose of the present invention is to provide a mixed tail gas separation device, method and semiconductor process system to address the deficiencies in the prior art, so as to solve the problems of hydrogen waste, environmental pollution and safety hazards caused by the mixed tail gas treatment method in the related art.

[0006] To achieve the above object, the technical solution adopted by the present invention is:

[0007] In a first aspect, the present invention provides a mixed tail gas separation device, comprising:

[0008] a first condensation unit, the first condensation unit being in communication with an upstream semiconductor process device and being used for removing trichlorosilane from the mixed gas;

[0009] a second condensing unit, the second condensing unit being in communication with at least one of an upstream semiconductor process device and the first condensing unit, and being used for removing dichlorosilane from the mixed gas;

[0010] a phosphine removal unit, the phosphine removal unit being in communication with the second condensing unit and being located downstream of the second condensing unit, and being used for removing phosphine from the mixed gas;

[0011] an acid gas removal unit, the acid gas removal unit being connected to the phosphine removal unit and being located downstream of the phosphine removal unit, and being used for removing acid gas from the mixed gas to obtain H2 with a purity of 2N to 4N;

[0012] A gas analysis unit is connected to each of the phosphine removal units and is used to detect whether the gas treated by the phosphine removal unit meets the standard.

[0013] In some of the embodiments, it also includes:

[0014] A borane removal unit is connected to the phosphine removal unit and the acid gas removal unit respectively, and is used to remove borane in the mixed gas.

[0015] In some of the embodiments, it also includes:

[0016] A germane removal unit is connected to the phosphine removal unit and the acid gas removal unit respectively, and is used to remove germane in the mixed gas.

[0017] In some of the embodiments, it also includes:

[0018] a purge unit, the purge unit being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to purge the first condensation unit, the second condensation unit, and the phosphine removal unit;

[0019] A vacuum unit, the vacuum unit being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to discharge gas inside the first condensation unit, the second condensation unit, and the phosphine removal unit;

[0020] A pressure relief unit is connected to the first condensing unit, the second condensing unit and the acid gas removal unit respectively, and is used to relieve pressure on the first condensing unit, the second condensing unit and the acid gas removal unit.

[0021] In a second aspect, the present invention further provides a mixed tail gas separation method, comprising:

[0022] The first condensation unit obtains the mixed gas and condenses the mixed gas to obtain liquid trichlorosilane and a first condensed gas;

[0023] The second condensation unit obtains the first condensed gas and condenses the first condensed gas to obtain liquid dichlorosilane and a second condensed gas;

[0024] The phosphine removal unit obtains the second condensed gas and reacts the second condensed gas with iron powder under high temperature conditions to remove phosphine in the second condensed gas and obtain the first filtered gas;

[0025] The acid gas removal unit obtains the first filtered gas and makes the first filtered gas react with a sodium hydroxide solution at room temperature to remove the acid gas in the first filtered gas and obtain high-purity H2.

[0026] In some of the embodiments, it also includes:

[0027] The borane removal unit obtains the first filtered gas and reacts the first filtered gas with an aqueous solution at room temperature to remove diborane in the first filtered gas and obtain a second filtered gas;

[0028] The germane removal unit obtains the second filtered gas and reacts the second filtered gas with a silver nitrate solution at room temperature to remove germanium hydride from the second filtered gas and obtain a third filtered gas;

[0029] The acid gas removal unit obtains the first filtered gas and makes the third filtered gas react with a sodium hydroxide solution at room temperature to remove the acid gas in the third filtered gas and obtain H2 with a purity of 2N to 4N.

[0030] In a third aspect, the present invention further provides a semiconductor process system, comprising:

[0031] The mixed tail gas separation equipment as described in the first aspect.

[0032] The present invention adopts the above technical solution, and has the following technical effects compared with the prior art:

[0033] The invention discloses a mixed tail gas separation device, method and semiconductor process system. By connecting a first condensing unit with an upstream semiconductor process device, the first condensing unit can liquefy gaseous trichlorosilane in the mixed gas, thereby removing trichlorosilane in the mixed gas and improving gas purity; by connecting a second condensing unit with the first condensing unit, the second condensing unit can liquefy gaseous dichlorosilane in the first condensed gas, thereby removing dichlorosilane in the mixed gas and improving gas purity; by connecting a phosphine removal unit with the second condensing unit, the phosphine removal unit can remove PH3 gas in the second condensed gas and improve gas purity; by connecting an acidic gas removal unit with the phosphine removal unit, the acidic gas removal unit can remove acidic gas in the first filtered gas and obtain H2 with a purity of 2N to 4N, thereby improving the purity of hydrogen, thereby facilitating the operation of subsequent processes. BRIEF DESCRIPTION OF THE DRAWINGS

[0034] Figure 1is a schematic diagram of a mixed tail gas separation device according to an embodiment of the present invention (I);

[0035] Figure 2 is a schematic diagram of a first condensation unit, a second condensation unit, a phosphine removal unit, an acid gas removal unit and a gas analysis unit according to an embodiment of the present invention;

[0036] Figure 3 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the present invention (II);

[0037] Figure 4 is a schematic diagram of a borane removal unit according to an embodiment of the present invention;

[0038] Figure 5 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the present invention (III);

[0039] Figure 6 is a schematic diagram of a germane removal unit according to an embodiment of the present invention;

[0040] Figure 7 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the present invention (IV);

[0041] Figure 8 is a schematic diagram of a mixed tail gas separation device according to an embodiment of the present invention (V);

[0042] Fig. 9 is a schematic diagram of a purge unit, a vacuum unit and a pressure relief unit according to an embodiment of the present invention;

[0043] Fig.10 Schematic diagram of a specific embodiment of a mixed tail gas separation device according to an embodiment of the present invention.

[0044] The reference numerals are: 100, first condensing unit; 110, first condensing element; 120, first heat exchange element; 130, first liquid storage element; 140, first valve element; 150, second valve element; 160, third valve element; 170, first monitoring element; 180, second monitoring element; 190, third monitoring element; 200, second condensing unit; 210, second condensing element; 220, second heat exchange element; 230, second liquid storage element; 240, fourth valve element; 250, fifth valve element; 260, fourth monitoring element; 270, fifth monitoring element; 280, sixth monitoring element; 300, phosphine removal unit; 310, phosphine removal element; 320, sixth valve element; 330, seventh monitoring element; 400, acid gas removal unit; 410, acid gas removal element; 420, seventh valve element; 430, eighth monitoring element; 440, ninth monitoring element; 450, 10th monitoring element; 500, gas analysis unit; 510, first gas analysis element; 520, second gas analysis element; 530, third gas analysis element; 600, borane removal unit; 610, borane removal element; 620, eighth valve element; 630, eleventh monitoring element; 640, twelfth monitoring element; 700, germane removal unit; 710, germane removal element; 720, ninth valve element; 730, thirteenth monitoring element; 740 , the fourteenth monitoring element; 800, the purge unit; 810, the purge element; 820, the tenth valve element; 830, the fifteenth monitoring element; 900, the vacuum unit; 910, the vacuum element; 920, the eleventh valve element; 930, the sixteenth monitoring element; 1000, the pressure relief unit; 1010, the first pressure relief element; 1020, the second pressure relief element; 1030, the third pressure relief element; 1040, the fourth pressure relief element; 1050, the fifth pressure relief element. DETAILED DESCRIPTION

[0045] In order to make the purpose, technical solutions and advantages of the present application clearer, the present application is described and illustrated below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application. Based on the embodiments provided in the present application, all other embodiments obtained by ordinary technicians in the field without making creative work are within the scope of protection of the present application.

[0046] Obviously, the drawings described below are only some examples or embodiments of the present application. For ordinary technicians in this field, the present application can also be applied to other similar scenarios based on these drawings without creative work. In addition, it can also be understood that although the efforts made in this development process may be complicated and lengthy, for ordinary technicians in this field related to the content disclosed in this application, some changes in design, manufacturing or production based on the technical content disclosed in this application are just conventional technical means, and should not be understood as insufficient content disclosed in this application.

[0047] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those of ordinary skill in the art that the embodiments described in this application may be combined with other embodiments without conflict.

[0048] Unless otherwise defined, the technical terms or scientific terms involved in this application should be understood by people with ordinary skills in the technical field to which this application belongs. The words "one", "a", "a", "the" and the like involved in this application do not indicate a quantitative limitation, and may represent the singular or plural. The terms "include", "comprise", "have" and any of their variations involved in this application are intended to cover non-exclusive inclusions; for example, a process, method, system, product or device that includes a series of steps or modules (units) is not limited to the listed steps or units, but may also include steps or units that are not listed, or may also include other steps or units inherent to these processes, methods, products or devices. The words "connect", "connected", "coupled" and the like involved in this application are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. The "multiple" involved in this application refers to two or more. "And / or" describes the association relationship of associated objects, indicating that there may be three relationships, for example, "A and / or B" can represent: A exists alone, A and B exist at the same time, and B exists alone. The character " / " generally indicates that the objects before and after are in an "or" relationship. The terms "first", "second", "third", etc. involved in this application are only used to distinguish similar objects and do not represent a specific ordering of the objects.

[0049] Example 1

[0050] This embodiment relates to the mixed tail gas separation device in the present invention.

[0051] like Figure 1 As shown, a mixed tail gas separation device includes a first condensation unit 100, a second condensation unit 200, a phosphine removal unit 300, an acid gas removal unit 400 and a gas analysis unit 500. The first condensation unit 100 is connected to the upstream semiconductor process equipment and is used to remove trichlorosilane in the mixed gas; the second condensation unit 200 is connected to at least one of the upstream semiconductor process equipment and the first condensation unit 100 and is used to remove dichlorosilane in the mixed gas; the phosphine removal unit 300 is connected to the second condensation unit 200 and is located downstream of the second condensation unit 200 and is used to remove phosphine in the mixed gas; the acid gas removal unit 400 is connected to the phosphine removal unit 300 and is located downstream of the phosphine removal unit 300 and is used to remove acid gas in the mixed gas to obtain H2 with a purity of 2N to 4N; the gas analysis unit 500 is connected to the phosphine removal unit 300 and the acid gas removal unit 400 respectively and is used to detect whether the gas treated by the phosphine removal unit 300 and the acid gas removal unit 400 meets the standard.

[0052] In the present invention, the first end and the second end refer to both ends in the length direction.

[0053] like Figure 2As shown, the first condensing unit 100 includes a first condensing element 110, a first heat exchange element 120, a first liquid storage element 130, a first thermostatic element, a first valve element 140, a second valve element 150, a third valve element 160, a first monitoring element 170, a second monitoring element 180 and a third monitoring element 190. The first condensing element 110 is connected to the upstream semiconductor process equipment and the second condensing unit 200 respectively, and is located downstream of the upstream semiconductor process equipment and upstream of the second condensing unit 200, and is used to condense the mixed gas to obtain liquid trichlorosilane and the first condensed gas; the first heat exchange element 120 is connected to the first condensing element 110, and is used to transport the cooling liquid to the first condensing element 110; the first liquid storage element 130 is connected to the first condensing unit 100 and the waste liquid treatment equipment, and is used to store liquid trichlorosilane; the first constant temperature element is arranged on the first liquid storage element 130, and covers the outer wall of the first liquid storage element 130, and is used to maintain the internal temperature of the first liquid storage element 130 constant; the first valve element 140 is arranged between the first condensing element 110 and the upstream semiconductor process The device and the first liquid storage unit are connected on the pipeline to control the circulation of the pipeline; the second valve element 150 is arranged on the pipeline connecting the first heat exchange element 120 and the first condensing element 110, and is used to control the circulation of the pipeline; the third valve element 160 is arranged on the pipeline connecting the first liquid storage element 130 and the first condensing unit 100 and the waste liquid treatment device, and is used to control the circulation of the pipeline; the first monitoring element 170 is connected to the first liquid storage element 130, and is used to monitor the pressure inside the first liquid storage element 130; the second monitoring element 180 is arranged inside the first liquid storage element 130, and is used to monitor the temperature inside the first liquid storage element 130; the third monitoring element 190 is arranged inside the first liquid storage element 130, and is used to monitor the liquid level inside the first liquid storage element 130.

[0054] Specifically, the first condensation element 110 includes a first condenser, a first condensation pipeline, a second condensation pipeline, and a third condensation pipeline. The first end of the first condensation pipeline is connected to the upstream semiconductor process equipment, and the second end of the first condensation pipeline is connected to the condenser for conveying the mixed gas; the first end of the second condensation pipeline is connected to the first condenser, and the second end of the second condensation pipeline is connected to the first liquid storage element 130 for conveying liquid trichlorosilane; the first end of the third condensation pipeline is connected to the first condenser, and the second end of the third condensation pipeline is connected to the second condensation unit 200 for conveying the first condensed gas.

[0055] More specifically, the first condenser includes a first condenser body, a first condensation port, a second condensation port, a third condensation port, a fourth condensation port, and a fifth condensation port. The first condensation port is formed in the first condenser body for communicating with the second end of the first condensation pipeline; the second condensation port is formed in the first condenser body for communicating with the first end of the second condensation pipeline; the third condensation port is formed in the first condenser body for communicating with the first end of the third condensation pipeline; the fourth condensation port and the fifth condensation port are formed in the first condenser body for communicating with the first heat exchange element 120.

[0056] It should be noted that the temperature of the coolant in the first condenser body is 10° C. to 20° C. Preferably, the temperature of the coolant in the first condenser body is 15° C.

[0057] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the first condensation pipeline includes but is not limited to a stainless steel pipe; the second condensation pipeline includes but is not limited to a stainless steel pipe; and the third condensation pipeline includes but is not limited to a stainless steel pipe.

[0058] Specifically, the first heat exchange element 120 includes a first water bath, a first water bath pipeline, and a second water bath pipeline. The first end of the first water bath pipeline is connected to the first water bath, and the second end of the first water bath pipeline is connected to the first condenser for conveying cooling liquid; the first end of the second water bath pipeline is connected to the first condenser, and the second end of the second water bath pipeline is connected to the first water bath for conveying cooling liquid.

[0059] More specifically, the first water bath includes a first water bath body, a first water bath port, and a second water bath port. The first water bath port is formed in the first water bath body for communicating with the first water bath pipeline; the second water bath port is formed in the first water bath body for communicating with the second water bath pipeline.

[0060] More specifically, the first end of the first water bath pipeline is communicated with the first water bath port of the first water bath body, and the second end of the first water bath pipeline is communicated with the fourth condensation port of the first condenser body.

[0061] More specifically, the first end of the second water bath pipeline is communicated with the fifth condensation port of the first condenser body, and the second end of the second water bath pipeline is communicated with the second water bath port of the first water bath body.

[0062] In some of the embodiments, the first water bath includes but is not limited to a heat exchanger; the first water bath pipeline includes but is not limited to a stainless steel pipe; and the second water bath pipeline includes but is not limited to a stainless steel pipe.

[0063] Specifically, the first liquid storage element 130 includes a first liquid storage tank, a first liquid storage pipeline, and a second liquid storage pipeline. The first end of the first liquid storage pipeline is connected to the second end of the second condensation pipeline, and the second end of the first liquid storage pipeline is connected to the first liquid storage tank for conveying liquid trichlorosilane; the first end of the second liquid storage pipeline is connected to the first liquid storage tank, and the second end of the second liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid trichlorosilane.

[0064] It should be noted that there are at least two first liquid storage elements 130 , and several first liquid storage elements 130 are connected to the first condensing element 110 respectively.

[0065] In some embodiments, there are two first liquid storage elements 130, and the two first liquid storage elements 130 are respectively connected to the first condensing element 110; when the liquid level height inside a first liquid storage element 130 exceeds a preset threshold, it can be switched to another first liquid storage element 130.

[0066] More specifically, the first liquid storage tank includes a first liquid storage tank body, a first liquid storage port, a second liquid storage port, and a third liquid storage port. The first liquid storage port is formed in the first liquid storage tank body for communicating with the first liquid storage pipeline; the second liquid storage port is formed in the first liquid storage tank body for communicating with the second liquid storage pipeline; the third liquid storage port is formed in the first liquid storage tank body for communicating with the first monitoring element 170.

[0067] In some embodiments, the first liquid storage tank includes but is not limited to a stainless steel tank; the first liquid storage pipeline includes but is not limited to a stainless steel pipe; and the second liquid storage pipeline includes but is not limited to a stainless steel pipe. Specifically, the cooling coil of the first thermostatic element is coiled around the outer wall of the first liquid storage tank, and the temperature inside the first liquid storage tank can be kept constant through heat exchange between the cooling coil and the first liquid storage tank.

[0068] In some of these embodiments, the first thermostatic element includes, but is not limited to, a thermostatic refrigerator compressor.

[0069] Specifically, the first valve element 140 includes a first regulating valve, a first non-return valve and a first pneumatic diaphragm valve. The first regulating valve is arranged in the first condensation pipeline to regulate the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation equipment to prevent excessive pressure from affecting the subsequent process; the first non-return valve is arranged in the first condensation pipeline and is located downstream of the first regulating valve to prevent the gas inside the first condensation pipeline from backflowing; the first pneumatic diaphragm valve is arranged in the first condensation pipeline and is located downstream of the first filter to control the flow of the first condensation pipeline.

[0070] In some embodiments, the first valve element 140 includes, but is not limited to, a regulating valve, a one-way valve, and a diaphragm valve.

[0071] Specifically, the second valve element 150 includes a first ball valve and a second ball valve. The first ball valve is disposed on the first condenser body and communicated with the fourth condensation port to control the flow between the first condenser body and the first water bath pipeline; the second ball valve is disposed on the first condenser body and communicated with the fifth condensation port to control the flow between the first condenser body and the second water bath pipeline.

[0072] In some of the embodiments, the second valve element 150 includes, but is not limited to, a ball valve.

[0073] Specifically, the third valve element 160 includes a second pneumatic diaphragm valve, a first manual diaphragm valve, a second manual diaphragm valve and a third manual diaphragm valve. The second pneumatic diaphragm valve is arranged on the first liquid storage pipeline to control the circulation of the first liquid storage pipeline; the first manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the first liquid storage port to control the circulation between the first liquid storage tank body and the first liquid storage pipeline; the second manual diaphragm valve is arranged on the top of the first liquid storage tank body and is connected to the third liquid storage port to control the circulation between the first liquid storage tank body and the first monitoring element 170; the third manual diaphragm valve is arranged on the side wall at the bottom of the first liquid storage tank body and is connected to the second liquid storage port to control the circulation between the first liquid storage tank body and the second liquid storage pipeline.

[0074] In some of the embodiments, the third valve element 160 includes, but is not limited to, a diaphragm valve.

[0075] Specifically, the first monitoring element 170 is connected to the first liquid storage tank body through a pipeline and is located downstream of the second manual diaphragm valve, and is used to monitor the pressure inside the first liquid storage tank body.

[0076] In some of the embodiments, the first monitoring element 170 includes but is not limited to a pressure sensor.

[0077] Specifically, the second monitoring element 180 is disposed inside the first liquid storage tank body and is used to monitor the temperature of the liquid inside the first liquid storage tank body.

[0078] In some of the embodiments, the second monitoring element 180 includes but is not limited to a temperature sensor.

[0079] Specifically, the third monitoring element 190 is disposed inside the first liquid storage tank body and is used to monitor the liquid level inside the first liquid storage tank body.

[0080] In some of the embodiments, the third monitoring element 190 includes but is not limited to a liquid level sensor.

[0081] Furthermore, the first condensing unit 100 further includes a first filter element, wherein the first filter element is disposed in the first condensing element 110 and is located downstream of the first valve element 140, and is used to filter particulate matter in the mixed gas.

[0082] Specifically, the first filter element is disposed in the first condensation pipeline and is located downstream of the first one-way valve.

[0083] In some of these embodiments, the first filter element includes, but is not limited to, a gas particle filter.

[0084] like Figure 2 As shown, the second condensing unit 200 includes a second condensing element 210, a second heat exchange element 220, a second liquid storage element 230, a second thermostatic element, a fifth valve element 250, a fourth monitoring element 260, a fifth monitoring element 270 and a sixth monitoring element 280. The second condensing element 210 is respectively connected to the first condensing unit 100 and the phosphine removal unit 300, and is located downstream of the first condensing unit 100 and upstream of the phosphine removal unit 300, and is used to condense the mixed gas to obtain liquid dichlorosilane and the second condensed gas; the second heat exchange element 220 is connected to the second condensing element 210, and is used to transport the cooling liquid to the second condensing element 210; the second liquid storage element 230 is respectively connected to the second condensing element 210 and the waste liquid treatment equipment, and is used to store liquid dichlorosilane; the second thermostatic element is arranged on the second liquid storage element 230, and covers the outer wall of the second liquid storage element 230, and is used to maintain the internal temperature of the second liquid storage element 230 constant; the fourth The valve element 240 is arranged on the pipeline connecting the second heat exchange element 220 and the second condensing element 210, and is used to control the circulation of the pipeline; the fifth valve element 250 is arranged on the pipeline connecting the second liquid storage element 230 and the second condensing element 210 and the waste liquid treatment equipment, and is used to control the circulation of the pipeline; the fourth monitoring element 260 is connected to the second liquid storage element 230, and is used to monitor the pressure inside the second liquid storage element 230; the fifth monitoring element 270 is arranged inside the second liquid storage element 230, and is used to monitor the temperature inside the second liquid storage element 230; the sixth monitoring element 280 is arranged inside the second liquid storage element 230, and is used to monitor the liquid level inside the second liquid storage element 230.

[0085] Specifically, the second condensing element 210 is in communication with the first condensing element 110, and is used to condense the first condensed gas to obtain liquid dichlorosilane and the second condensed gas.

[0086] Specifically, the second condensation element 210 includes a second condenser, a fourth condensation pipeline and a fifth condensation pipeline. The first end of the fourth condensation pipeline is connected to the second condenser, and the second end of the fourth condensation pipeline is connected to the second liquid storage element 230 for conveying liquid dichlorosilane; the first end of the fifth condensation pipeline is connected to the second condenser, and the second end of the fifth condensation pipeline is connected to the phosphine removal unit 300 for conveying the second condensed gas.

[0087] More specifically, the second condenser includes a second condenser body, a sixth condensation port, a seventh condensation port, an eighth condensation port, a ninth condensation port, and a tenth condensation port. The sixth condensation port is formed on the second condenser body for communicating with the second end of the third condensation line; the seventh condensation port is formed on the second condensation body for communicating with the first end of the fourth condensation line; the eighth condensation port is formed on the second condensation body for communicating with the first end of the fifth condensation line; the ninth condensation port and the tenth condensation port are formed on the second condenser body for communicating with the second heat exchange element 220.

[0088] It should be noted that the temperature of the coolant in the second condenser body is 1°C to 10°C; preferably, the temperature of the coolant in the second condenser body is 5°C.

[0089] In some of the embodiments, the first condenser includes but is not limited to a water-cooled condenser; the fourth condensation pipeline includes but is not limited to a stainless steel pipe; and the fifth condensation pipeline includes but is not limited to a stainless steel pipe.

[0090] Specifically, the second heat exchange element 220 includes a second water bath, a third water bath pipeline and a fourth water bath pipeline. The first end of the third water bath pipeline is connected to the second water bath, and the second end of the third water bath pipeline is connected to the second condenser for conveying coolant; the first end of the fourth water bath pipeline is connected to the second condenser, and the second end of the fourth water bath pipeline is connected to the second water bath for conveying coolant.

[0091] More specifically, the second water bath includes a second water bath body, a third water bath port and a fourth water bath port. The third water bath port is formed in the second water bath body for communicating with the third water bath pipeline; the fourth water bath port is formed in the second water bath body for communicating with the fourth water bath pipeline.

[0092] More specifically, a first end of the third water bath pipeline is communicated with the third water bath port of the second water bath body, and a second end of the third water bath pipeline is communicated with the ninth condensation port of the second condenser body.

[0093] More specifically, the first end of the fourth water bath pipeline is communicated with the tenth condensation port of the second condenser body, and the second end of the fourth water bath pipeline is communicated with the fourth water bath port of the second water bath body.

[0094] In some of the embodiments, the second water bath includes but is not limited to a heat exchanger; the third water bath pipeline includes but is not limited to a stainless steel pipe; and the fourth water bath pipeline includes but is not limited to a stainless steel pipe.

[0095] Specifically, the second liquid storage element 230 includes a second liquid storage tank, a third liquid storage pipeline and a fourth liquid storage pipeline. The first end of the third liquid storage pipeline is connected to the second end of the fourth condensation pipeline, and the second end of the third liquid storage pipeline is connected to the second liquid storage tank for conveying liquid dichlorosilane; the first end of the fourth liquid storage pipeline is connected to the second liquid storage tank, and the second end of the fourth liquid storage pipeline is connected to the waste liquid treatment equipment for conveying liquid dichlorosilane.

[0096] It should be noted that there are at least two second liquid storage elements 230 , and several second liquid storage elements 230 are respectively connected to the second condensing element 210 .

[0097] In some embodiments, there are two second liquid storage elements 230, and the two second liquid storage elements 230 are respectively connected to the second condensing element 210; when the liquid level height inside a second liquid storage element 230 exceeds a preset threshold, it can be switched to another second liquid storage element 230.

[0098] More specifically, the second liquid storage tank includes a second liquid storage tank body, a fourth liquid storage port, a fifth liquid storage port, and a sixth liquid storage port. The fourth liquid storage port is formed in the second liquid storage tank body for communicating with the third liquid storage pipeline; the fifth liquid storage port is formed in the second liquid storage tank body for communicating with the fourth liquid storage pipeline; the sixth liquid storage port is formed in the second liquid storage tank body for communicating with the fourth monitoring element 260.

[0099] In some of the embodiments, the second liquid storage tank includes but is not limited to a stainless steel tank; the third liquid storage pipeline includes but is not limited to a stainless steel pipe; and the fourth liquid storage pipeline includes but is not limited to a stainless steel pipe.

[0100] Specifically, the cooling coil of the second thermostatic element is coiled on the outer side wall of the second liquid storage tank, and the temperature inside the second liquid storage tank can be kept constant through heat exchange between the cooling coil and the second liquid storage tank.

[0101] In some of these embodiments, the second thermostatic element includes, but is not limited to, a thermostatic refrigerator compressor.

[0102] Specifically, the fourth valve element 240 includes a third ball valve and a fourth ball valve. The third ball valve is disposed on the second condenser body and communicated with the ninth condensation port to control the flow between the second condenser body and the third water bath pipeline; the fourth ball valve is disposed on the second condenser body and communicated with the tenth condensation port to control the flow between the second condenser body and the fourth water bath pipeline.

[0103] In some of the embodiments, the fourth valve element 240 includes, but is not limited to, a ball valve.

[0104] Specifically, the fifth valve element 250 includes a third pneumatic diaphragm valve, a fourth manual diaphragm valve, a fifth manual diaphragm valve and a sixth manual diaphragm valve. The third pneumatic diaphragm valve is arranged on the third liquid storage pipeline to control the circulation of the third liquid storage pipeline; the fourth manual diaphragm valve is arranged on the top of the second liquid storage tank body and is connected to the fourth liquid storage port to control the circulation between the second liquid storage tank body and the third liquid storage pipeline; the fifth manual diaphragm valve is arranged on the top of the second liquid storage tank body and is connected to the sixth liquid storage port to control the circulation between the second liquid storage tank and the fourth monitoring element 260; the sixth manual diaphragm valve is arranged on the side wall at the bottom of the second liquid storage tank body and is connected to the fifth liquid storage port to control the circulation between the second liquid storage tank body and the fourth liquid storage pipeline.

[0105] In some of the embodiments, the fifth valve element 250 includes, but is not limited to, a diaphragm valve.

[0106] Specifically, the fourth monitoring element 260 is connected to the second liquid storage tank body through a pipeline and is located downstream of the fifth manual diaphragm valve, and is used to monitor the pressure inside the second liquid storage tank body.

[0107] In some of the embodiments, the fourth monitoring element 260 includes but is not limited to a pressure sensor.

[0108] Specifically, the fifth monitoring element 270 is disposed inside the second liquid storage tank body and is used to monitor the temperature of the liquid inside the second liquid storage tank body.

[0109] In some of the embodiments, the fifth monitoring element 270 includes but is not limited to a temperature sensor.

[0110] Specifically, the sixth monitoring element 280 is disposed inside the second liquid storage tank body and is used to monitor the liquid level inside the second liquid storage tank body.

[0111] In some of the embodiments, the sixth monitoring element 280 includes but is not limited to a liquid level sensor.

[0112] like Figure 2As shown, the phosphine removal unit 300 includes a phosphine removal element 310, a sixth valve element 320 and a seventh monitoring element 330. The phosphine removal element 310 is connected to the second condensing unit 200, the acid gas removal unit 400, the iron powder feeding device and the waste collection device, and is located downstream of the second condensing unit 200 and upstream of the acid gas removal unit 400, and is used to remove phosphine in the mixed gas and obtain the first filtered gas; the sixth valve element 320 is arranged on the pipeline connecting the phosphine removal element 310 with the second condensing unit 200, the acid gas removal unit 400, the iron powder feeding device and the waste collection device, and is used to control the flow of the pipeline; the seventh monitoring element 330 is connected to the phosphine removal element 310, and is used to monitor the temperature inside the phosphine removal element 310.

[0113] Specifically, the phosphine removal element 310 is in communication with the second condensing element 210 for removing phosphine from the second condensed gas and obtaining the first filtered gas.

[0114] Specifically, the phosphine removal element 310 includes a phosphine removal reactor, a first phosphine removal pipeline, a second phosphine removal pipeline, a third phosphine removal pipeline, a fourth phosphine removal pipeline and a temperature controller. The first end of the first phosphine removal pipeline is connected to the second end of the fifth condensation pipeline, and the second end of the first phosphine removal pipeline is connected to the phosphine removal reactor for conveying the second condensed gas; the first end of the second phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the second phosphine removal pipeline is connected to the acid gas removal unit 400 for conveying the first filtered gas; the first end of the third phosphine removal pipeline is connected to the iron powder feeding device, and the second end of the third phosphine removal pipeline is connected to the phosphine removal reactor for conveying iron powder; the first end of the fourth phosphine removal pipeline is connected to the phosphine removal reactor, and the second end of the fourth phosphine removal pipeline is connected to the waste collection device; the temperature controller is arranged inside the phosphine removal reactor, and is used to control the temperature inside the phosphine removal reactor.

[0115] More specifically, the phosphine removal reactor includes a phosphine removal reactor body, a first reactor port, a second reactor port, a third reactor port, a fourth reactor port, and a fifth reactor port. The first reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the second end of the first phosphine removal pipeline; the second reactor port is formed at the bottom of the phosphine removal reactor body, and is used to communicate with the first end of the second phosphine removal pipeline; the third reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the second end of the third phosphine removal pipeline; the fourth reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the first end of the fourth phosphine removal pipeline; the fifth reactor port is formed at the top of the phosphine removal reactor body, and is used to communicate with the seventh monitoring element 330.

[0116] It should be noted that the PH3 gas in the second condensed gas flowing into the phosphine removal reactor can react with the iron powder under high temperature conditions to generate solid FeP and hydrogen, thereby achieving the removal of the PH3 gas in the second condensed gas.

[0117] In some of the embodiments, the phosphine removal reactor includes but is not limited to a high temperature reactor; the first phosphine removal pipeline includes but is not limited to a stainless steel pipe; the second phosphine removal pipeline includes but is not limited to a stainless steel pipe; the third phosphine removal pipeline includes but is not limited to a stainless steel pipe; and the fourth phosphine removal pipeline includes but is not limited to a stainless steel pipe.

[0118] Specifically, the sixth valve element 320 includes a fourth pneumatic diaphragm valve, a seventh manual diaphragm valve, a fifth pneumatic diaphragm valve, an eighth manual diaphragm valve, a fifth ball valve, and a sixth ball valve. Among them, the fourth pneumatic diaphragm valve is arranged on the first phosphine removal pipeline to control the circulation of the first phosphine removal pipeline; the seventh manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the first reactor port to control the circulation between the phosphine removal reactor body and the first phosphine removal pipeline; the fifth pneumatic diaphragm valve is arranged on the second phosphine removal pipeline to control the circulation of the second phosphine removal pipeline; the eighth manual diaphragm valve is arranged on the phosphine removal reactor body and is connected to the second reactor port to control the circulation between the phosphine removal reactor body and the second phosphine removal pipeline; the fifth ball valve is arranged on the phosphine removal reactor body and is connected to the third reactor port to control the circulation between the phosphine removal reactor body and the third phosphine removal pipeline; the sixth ball valve is arranged on the phosphine removal reactor body and is connected to the fourth reactor port to control the circulation between the phosphine removal reactor body and the fourth phosphine removal pipeline.

[0119] In some embodiments, the sixth valve element 320 includes but is not limited to a diaphragm valve and a ball valve.

[0120] Specifically, the seventh monitoring element 330 is connected to the phosphine removal reactor body through a pipeline and is located on the top of the phosphine removal reactor body to monitor the temperature inside the phosphine removal reactor body.

[0121] In some of the embodiments, the seventh monitoring element 330 includes but is not limited to a temperature sensor.

[0122] like Figure 2As shown, the acid gas removal unit 400 includes an acid gas removal element 410 , a seventh valve element 420 , an eighth monitoring element 430 , a ninth monitoring element 440 , and a tenth monitoring element 450 . Among them, the acid gas removal element 410 is connected to the phosphine removal unit 300, the waste liquid treatment equipment, and the downstream gas treatment equipment respectively, and is located downstream of the phosphine removal unit 300 and upstream of the downstream gas treatment equipment, and is used to remove acid gases in the mixed gas to obtain H2 with a purity of 2N to 4N; the seventh valve element 420 is arranged on the pipeline connecting the acid gas removal element 410 with the phosphine removal unit 300, the waste liquid treatment equipment, and the downstream gas treatment equipment, and is used to control the flow of the pipeline; the eighth monitoring element 430 is connected to the acid gas removal element 410, and is used to monitor the pressure inside the acid gas removal element 410; the ninth monitoring element 440 is arranged inside the acid gas removal element 410, and is used to monitor the liquid level inside the acid gas removal element 410; the tenth monitoring element 450 is arranged inside the acid gas removal element 410, and is used to monitor the acidity value inside the acid gas removal element 410.

[0123] Specifically, the acid gas removal element 410 is in communication with the phosphine removal element 310, and is used to remove the acid gas in the first filtered gas to obtain H2 with a purity of 2N to 4N.

[0124] Specifically, the acid gas removal element 410 includes a first reaction water tank, a first acid gas removal pipeline, a second acid gas removal pipeline, a third acid gas removal pipeline and a fourth acid gas removal pipeline. The first end of the first acid gas removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first acid gas removal pipeline is connected to the first reaction water tank for conveying the first filtered gas; the first end of the second acid gas removal pipeline is connected to the first reaction water tank, and the second end of the second acid gas removal pipeline is connected to the downstream gas treatment equipment for conveying H2 with a purity of 2N to 4N; the first end of the third acid gas removal pipeline is connected to the NaOH solution source, and the second end of the third acid gas removal pipeline is connected to the first reaction water tank; the first end of the fourth acid gas removal pipeline is connected to the first reaction water tank, and the second end of the fourth acid gas removal pipeline is connected to the waste liquid treatment equipment.

[0125] More specifically, the first reaction water tank includes a first reaction water tank body, a first reaction interface, a second reaction interface, a third reaction interface, a fourth reaction interface and a fifth reaction interface. The first reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the second end of the first acid gas removal pipeline; the second reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the first end of the second acid gas removal pipeline; the third reaction interface is formed at the top of the first reaction water tank body, and is used to communicate with the eighth monitoring element 430; the fourth reaction interface is formed at the top of the side wall of the first reaction water tank body, and is used to communicate with the second end of the third acid gas removal pipeline; the fifth reaction interface is formed at the bottom of the side wall of the first reaction water tank body, and is used to communicate with the first end of the fourth acid gas removal pipeline.

[0126] It should be noted that the acidic gas in the first filtered gas flowing into the first reaction water tank can react with the NaOH solution inside the first reaction water tank at room temperature, that is, the NaOH solution can absorb the acidic gas in the first filtered gas to achieve the effect of removing the acidic gas in the first filtered gas.

[0127] In some of the embodiments, the first reaction water tank includes but is not limited to a stainless steel water tank; the first acid gas removal pipeline includes but is not limited to a stainless steel pipe; the second acid gas removal pipeline includes but is not limited to a stainless steel pipe; the third acid gas removal pipeline includes but is not limited to a stainless steel pipe; the fourth acid gas removal pipeline includes but is not limited to a stainless steel pipe.

[0128] Specifically, the seventh valve element 420 includes a sixth pneumatic diaphragm valve, a ninth manual diaphragm valve, a seventh pneumatic diaphragm valve, a tenth manual diaphragm valve, an eleventh manual diaphragm valve, a seventh ball valve, and an eighth ball valve. Among them, the sixth pneumatic diaphragm valve is arranged on the first acid gas removal pipeline to control the circulation of the first acid gas removal pipeline; the ninth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the first reaction interface to control the circulation between the first reaction water tank body and the first acid gas removal pipeline; the seventh pneumatic diaphragm valve is arranged on the second acid gas removal pipeline to control the circulation of the second acid gas removal pipeline; the tenth manual diaphragm valve is arranged on the first reaction water tank body and is connected to the second reaction interface to control the circulation between the first reaction water tank body and the second acid gas removal pipeline; the eleventh manual diaphragm valve is arranged on the first reaction water tank body and is connected to the third reaction interface to control the circulation between the first reaction water tank body and the eighth monitoring element 430; the seventh ball valve is arranged on the first reaction water tank body and is connected to the fourth reaction interface to control the circulation between the first reaction water tank body and the NaOH solution source; the eighth ball valve is arranged on the first reaction water tank body and is connected to the fifth reaction interface to control the circulation between the first reaction water tank body and the waste liquid treatment equipment.

[0129] In some embodiments, the seventh valve element 420 includes but is not limited to a diaphragm valve and a ball valve.

[0130] Specifically, the eighth monitoring element 430 is communicated with the first reaction water tank body and is located downstream of the eleventh manual diaphragm valve, and is used to monitor the pressure inside the first reaction water tank body.

[0131] In some of the embodiments, the eighth monitoring element 430 includes but is not limited to a pressure sensor.

[0132] Specifically, the ninth monitoring element 440 is disposed inside the first reaction water tank body, and is used to monitor the liquid level inside the first reaction water tank body.

[0133] In some of the embodiments, the ninth monitoring element 440 includes but is not limited to a liquid level sensor.

[0134] Specifically, the tenth monitoring element 450 is disposed inside the first reaction water tank body, and is used to monitor the acidity value inside the first reaction water tank body.

[0135] In some of these embodiments, the tenth monitoring element 450 includes but is not limited to a pH meter.

[0136] like Figure 2 As shown, the gas analysis unit 500 includes a first gas analysis element 510. The first gas analysis element 510 is connected to the phosphine removal unit 300 and is located downstream of the phosphine removal unit 300 to detect whether the gas processed by the phosphine removal unit 300 meets the standard.

[0137] Specifically, the first gas analysis element 510 is in communication with the phosphine removal element 310 and is located downstream of the phosphine removal element 310, and is used to detect whether the gas processed by the phosphine removal element 310 meets the standards.

[0138] More specifically, the first gas analysis element 510 is in communication with the second phosphine removal line and is located downstream of the fifth pneumatic diaphragm valve.

[0139] In some of the embodiments, the first gas analysis component 510 includes, but is not limited to, a gas analyzer.

[0140] The method of using this embodiment is as follows:

[0141] (Preparation process)

[0142] The second valve element 150 and the fourth valve element 240 are opened so that the first heat exchange element 120 and the second heat exchange element 220 are connected to the first condensation element 110 and the second condensation element 210 respectively, so that the coolant in the first heat exchange element 120 and the second heat exchange element 220 can flow to the first condensation element 110 and the second condensation element 210, thereby making the internal temperature of the first condensation element 110 and the second condensation element 210 meet the requirements.

[0143] (First Condensation Step)

[0144] Opening the first valve element 140 allows the mixed gas generated by the upstream semiconductor process equipment to flow to the first condensing element 110, so that the first condensing element 110 liquefies the gaseous trichlorosilane in the mixed gas and obtains liquid trichlorosilane and the first condensed gas;

[0145] The third valve element 160 is opened to allow the first condensing element 110 to communicate with the first liquid storage element 130 , so that liquid trichlorosilane is stored in the first liquid storage element 130 .

[0146] (Second condensation step)

[0147] The first condensed gas flows to the second condensation element 210 through the pipeline, and the second condensation element 210 can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and the second condensed gas;

[0148] The fifth valve element 250 is opened so that the second condensing element 210 is communicated with the second liquid storage element 230 , thereby allowing liquid dichlorosilane to be stored in the first liquid storage element 130 .

[0149] (Phosphine Removal Process)

[0150] The sixth valve element 320 is opened to connect the phosphine removal element 310 with the second condensing element 210. The phosphine removal element 310 removes the PH3 gas in the second condensed gas by reacting the PH3 gas (phosphine gas) in the second condensed gas with iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas.

[0151] (Acid gas removal process)

[0152] The seventh valve element 420 is opened to connect the acid gas removal element 410 with the phosphine removal element 310. The NaOH solution in the acid gas removal element 410 can absorb the acid gas in the first filtered gas, thereby obtaining H2 with a purity of 2N to 4N.

[0153] The advantage of this embodiment is that by connecting the first condensing unit with the upstream semiconductor process equipment, the first condensing unit can liquefy the gaseous trichlorosilane in the mixed gas, thereby removing the trichlorosilane in the mixed gas and improving the gas purity; by connecting the second condensing unit with the first condensing unit, the second condensing unit can liquefy the gaseous dichlorosilane in the first condensed gas, thereby removing the dichlorosilane in the mixed gas and improving the gas purity; by connecting the phosphine removal unit with the second condensing unit, the phosphine removal unit can remove PH3 gas in the second condensed gas and improve the gas purity; by connecting the acid gas removal unit with the phosphine removal unit, the acid gas removal unit can remove the acid gas in the first filtered gas and obtain H2 with a purity of 2N to 4N, thereby improving the purity of hydrogen, thereby facilitating the operation of subsequent processes.

[0154] Example 2

[0155] This embodiment is a variation of Embodiment 1.

[0156] like Figure 3 As shown, the mixed tail gas separation device further includes a borane removal unit 600. The borane removal unit 600 is respectively connected to the phosphine removal unit 300, the acid gas removal unit 400, and the gas analysis unit 500, and is used to remove borane in the mixed gas.

[0157] like Figure 4 As shown, the gas analysis unit 500 includes a second gas analysis element 520. The second gas analysis element 520 is connected to the borane removal unit 600 and is located downstream of the borane removal unit 600 to detect whether the gas treated by the borane removal unit 600 meets the standard.

[0158] In some of the embodiments, the second gas analysis component 520 includes, but is not limited to, a gas analyzer.

[0159] like Figure 4As shown, the borane removal unit 600 includes a borane removal element 610, an eighth valve element 620, an eleventh monitoring element 630 and a twelfth monitoring element 640. The borane removal element 610 is connected to the phosphine removal unit 300, the acid gas removal unit 400, the gas analysis unit 500 and the waste liquid treatment equipment, and is located downstream of the phosphine removal unit 300 and upstream of the acid gas removal unit 400, and is used to remove borane in the mixed gas and obtain a second filtered gas; the eighth valve element 620 is arranged on the pipeline connecting the borane removal element 610 with the phosphine removal unit 300, the acid gas removal unit 400 and the waste liquid treatment equipment, and is located upstream of the gas analysis unit 500, and is used to control the flow of the pipeline; the eleventh monitoring element 630 is connected to the borane removal element 610, and is used to monitor the pressure inside the borane removal element 610; the twelfth monitoring element 640 is arranged inside the borane removal element 610, and is used to monitor the liquid level inside the borane removal element 610.

[0160] Specifically, the borane removal element 610 is connected to the phosphine removal element 310 and the acid gas removal element 410 respectively, and is used to remove borane in the first filtered gas and obtain the second filtered gas; the eighth valve element 620 is located upstream of the second gas analysis element 520.

[0161] Specifically, the borane removal element 610 includes a second reaction water tank, a first borane removal pipeline, a second borane removal pipeline, a third borane removal pipeline, and a fourth borane removal pipeline. The first end of the first borane removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first borane removal pipeline is connected to the second reaction water tank for conveying the first filtered gas; the first end of the second borane removal pipeline is connected to the second reaction water tank, and the second end of the second borane removal pipeline is connected to the first end of the first acid gas removal pipeline and the second gas analysis element 520 for conveying the second filtered gas; the first end of the third borane removal pipeline is connected to the water source, and the second end of the third borane removal pipeline is connected to the second reaction water tank for conveying water; the first end of the fourth borane removal pipeline is connected to the second reaction water tank, and the second end of the fourth borane removal pipeline is connected to the waste liquid treatment equipment for conveying waste liquid.

[0162] More specifically, the second reaction water tank includes a second reaction water tank body, a sixth reaction interface, a seventh reaction interface, an eighth reaction interface, a ninth reaction interface, and a tenth reaction interface. The sixth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the second end of the first borane removal pipeline; the seventh reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the first end of the second borane removal pipeline; the eighth reaction interface is formed at the top of the second reaction water tank body, and is used to communicate with the eleventh monitoring element 630; the ninth reaction interface is formed at the top of the side wall of the second reaction water tank body, and is used to communicate with the second end of the third borane removal pipeline; the tenth reaction interface is formed at the bottom of the side wall of the second reaction water tank body, and is used to communicate with the first end of the fourth borane removal pipeline.

[0163] It should be noted that the borane gas in the first filtered gas flowing into the second reaction water tank can react with the aqueous solution inside the second reaction water tank at room temperature, that is, the aqueous solution can absorb the borane gas in the first filtered gas to achieve the effect of removing the borane gas in the first filtered gas.

[0164] In some of the embodiments, the second reaction water tank includes but is not limited to a stainless steel water tank; the first borane removal pipeline includes but is not limited to a stainless steel pipe; the second borane removal pipeline includes but is not limited to a stainless steel pipe; the third borane removal pipeline includes but is not limited to a stainless steel pipe; and the fourth borane removal pipeline includes but is not limited to a stainless steel pipe.

[0165] Specifically, the eighth valve element 620 includes an eighth pneumatic diaphragm valve, a twelfth manual diaphragm valve, a ninth pneumatic diaphragm valve, a thirteenth manual diaphragm valve, a fourteenth manual diaphragm valve, a ninth ball valve, and a tenth ball valve. Among them, the eighth pneumatic diaphragm valve is arranged on the first borane removal pipeline to control the circulation of the first borane removal pipeline; the twelfth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the sixth reaction interface to control the circulation between the second reaction water tank body and the first borane removal pipeline; the ninth pneumatic diaphragm valve is arranged on the second borane removal pipeline and is located upstream of the second gas analysis element 520 to control the circulation of the second borane removal pipeline; the thirteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the seventh reaction interface to control the circulation between the second reaction water tank body and the second borane removal pipeline; the fourteenth manual diaphragm valve is arranged on the second reaction water tank body and is connected to the eighth reaction interface to control the circulation between the second reaction water tank body and the eleventh monitoring element 630; the ninth ball valve is arranged on the second reaction water tank body and is connected to the ninth reaction interface to control the circulation between the second reaction water tank body and the aqueous solution source; the tenth ball valve is arranged on the second reaction water tank body and is connected to the tenth reaction interface to control the circulation between the second reaction water tank body and the waste liquid treatment equipment.

[0166] In some embodiments, the eighth valve element 620 includes but is not limited to a diaphragm valve and a ball valve.

[0167] Specifically, the eleventh monitoring element 630 is communicated with the second reaction water tank body and is located downstream of the fourteenth manual diaphragm valve, and is used to monitor the pressure inside the second reaction water tank body.

[0168] In some of the embodiments, the eleventh monitoring element 630 includes but is not limited to a pressure sensor.

[0169] Specifically, the twelfth monitoring element 640 is disposed inside the second reaction water tank body, and is used to monitor the liquid level inside the second reaction water tank body.

[0170] In some of the embodiments, the twelfth monitoring element 640 includes but is not limited to a liquid level sensor.

[0171] The method of using this embodiment is as follows:

[0172] After (phosphine removal step), it also includes:

[0173] (Borane Removal Process)

[0174] The eighth valve element 620 is opened to connect the phosphine removal element 310 and the borane removal element 610. The aqueous solution inside the borane removal element 610 allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature to obtain the second filtered gas.

[0175] (Acid gas removal process)

[0176] The seventh valve element 420 is opened to connect the acid gas removal element 410 with the phosphine removal element 310. The NaOH solution in the acid gas removal element 410 can absorb the acid gas in the second filtered gas, thereby obtaining H2 with a purity of 2N to 4N.

[0177] The advantage of this embodiment is that by arranging a borane removal unit between the phosphine removal unit and the acid gas removal unit, the B2H6 gas in the first filtered gas can be removed, thereby further improving the gas purity.

[0178] Example 3

[0179] This embodiment is a variation of Embodiment 1.

[0180] like Figure 5 As shown, the mixed tail gas separation device further includes a germane removal unit 700. The germane removal unit 700 is respectively connected to the phosphine removal unit 300, the acid gas removal unit 400, and the gas analysis unit 500, and is used to remove germane from the mixed gas.

[0181] like Figure 6 As shown, the gas analysis unit 500 includes a third gas analysis element 530. The third gas analysis element 530 is connected to the germane removal unit 700 and is located downstream of the germane removal unit 700 to detect whether the gas processed by the germane removal unit 700 meets the standard.

[0182] In some of the embodiments, the third gas analysis component 530 includes but is not limited to a gas analyzer.

[0183] like Figure 6 As shown, the germane removal unit 700 includes a germane removal element 710, a ninth valve element 720, a thirteenth monitoring element 730 and a fourteenth monitoring element 740. The germane removal element 710 is connected to the phosphine removal unit 300, the acid gas removal unit 400, the gas analysis unit 500 and the waste liquid treatment equipment respectively, and is located downstream of the phosphine removal unit 300 and upstream of the acid gas removal unit 400, and is used to remove germane in the mixed gas and obtain a third filtered gas; the ninth valve element 720 is arranged on the pipeline connecting the germane removal element 710 with the borane removal unit 600, the acid gas removal unit 400 and the waste liquid treatment equipment, and is used to control the flow of the pipeline; the thirteenth monitoring element 730 is connected to the germane removal element 710, and is used to monitor the pressure inside the germane removal element 710; the fourteenth monitoring element 740 is arranged inside the germane removal element 710, and is used to monitor the liquid level inside the germane removal element 710.

[0184] Specifically, the germane removal element 710 is connected to the phosphine removal element 310 and the acid gas removal element 410 respectively, and is used to remove germane from the first filtered gas and obtain a third filtered gas; the ninth valve element 720 is located upstream of the third gas analysis element 530. Specifically, the germane removal element 710 includes a third reaction water tank, a first germane removal pipeline, a second germane removal pipeline, a third germane removal pipeline, and a fourth germane removal pipeline. Among them, the first end of the first germane removal pipeline is connected to the second end of the second phosphine removal pipeline, and the second end of the first germane removal pipeline is connected to the third reaction water tank for conveying the first filtered gas; the first end of the second germane removal pipeline is connected to the third reaction water tank, the second end of the second germane removal pipeline is connected to the first end of the first acidic gas removal pipeline, and is connected to the third gas analysis element 530 for conveying the third filtered gas; the first end of the third germane removal pipeline is connected to the silver nitrate solution source, and the second end of the third germane removal pipeline is connected to the third reaction water tank for conveying the silver nitrate solution source; the first end of the fourth germane removal pipeline is connected to the third reaction water tank, and the second end of the fourth germane removal pipeline is connected to the waste liquid treatment equipment for conveying waste liquid.

[0185] More specifically, the third reaction water tank includes a third reaction water tank body, an eleventh reaction interface, a twelfth reaction interface, a thirteenth reaction interface, a fourteenth reaction interface and a fifteenth reaction interface. The eleventh reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the second end of the first germane removal pipeline; the twelfth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the first end of the second germane removal pipeline; the thirteenth reaction interface is formed at the top of the third reaction water tank body, and is used to communicate with the thirteenth monitoring element 730; the fourteenth reaction interface is formed at the top of the side wall of the third reaction water tank body, and is used to communicate with the second end of the third germane removal pipeline; the fifteenth reaction interface is formed at the bottom of the side wall of the third reaction water tank body, and is used to communicate with the first end of the fourth germane removal pipeline.

[0186] It should be noted that the germane gas in the first filtered gas flowing into the third reaction water tank can react with the silver nitrate solution inside the third reaction water tank at room temperature, that is, the silver nitrate solution can absorb the germane gas in the first filtered gas to achieve the effect of removing the germane gas in the first filtered gas.

[0187] In some of the embodiments, the third reaction water tank includes but is not limited to a stainless steel water tank; the first germane removal pipeline includes but is not limited to a stainless steel pipe; the second germane removal pipeline includes but is not limited to a stainless steel pipe; the third germane removal pipeline includes but is not limited to a stainless steel pipe; and the fourth germane removal pipeline includes but is not limited to a stainless steel pipe.

[0188] Specifically, the ninth valve element 720 includes a tenth pneumatic diaphragm valve, a fifteenth manual diaphragm valve, an eleventh pneumatic diaphragm valve, a sixteenth manual diaphragm valve, a seventeenth manual diaphragm valve, an eleventh ball valve and a twelfth ball valve. Among them, the tenth pneumatic diaphragm valve is arranged in the first germane removal pipeline to control the circulation of the first germane removal pipeline; the fifteenth manual diaphragm valve is arranged in the third reaction water tank body and is connected to the eleventh reaction interface to control the circulation between the third reaction water tank body and the first germane removal pipeline; the eleventh pneumatic diaphragm valve is arranged in the second germane removal pipeline and is located upstream of the third gas analysis element 530 to control the circulation of the second germane removal pipeline; the sixteenth manual diaphragm valve is arranged in the third reaction water tank body and is connected to the twelfth reaction interface to control the third The circulation between the reaction water tank body and the second germane removal pipeline; the seventeenth manual diaphragm valve is arranged on the third reaction water tank body and is connected to the thirteenth reaction interface, and is used to control the circulation between the third reaction water tank body and the thirteenth monitoring element 730; the eleventh ball valve is arranged on the third reaction water tank body and is connected to the fourteenth reaction interface, and is used to control the circulation between the third reaction water tank body and the silver nitrate solution source; the twelfth ball valve is arranged on the third reaction water tank body and is connected to the fifteenth reaction interface, and is used to control the circulation between the third reaction water tank body and the waste liquid treatment equipment.

[0189] In some embodiments, the ninth valve component 720 includes but is not limited to a diaphragm valve and a ball valve.

[0190] Specifically, the thirteenth monitoring element 730 is communicated with the third reaction water tank body and is located downstream of the seventeenth manual diaphragm valve, and is used to monitor the pressure inside the third reaction water tank body.

[0191] In some of the embodiments, the thirteenth monitoring element 730 includes but is not limited to a pressure sensor.

[0192] Specifically, the fourteenth monitoring element 740 is disposed inside the third reaction water tank body, and is used to monitor the liquid level inside the third reaction water tank body.

[0193] In some of the embodiments, the fourteenth monitoring element 740 includes but is not limited to a liquid level sensor.

[0194] The method of using this embodiment is as follows:

[0195] After (phosphine removal step), it also includes:

[0196] (Gemane Removal Process)

[0197] Open the ninth valve element 720 to connect the phosphine removal element 310 and the germane removal element 710. The silver nitrate solution inside the germane removal element 710 can react with the GeH4 gas (germane gas) in the first filtered gas at room temperature to obtain a third filtered gas.

[0198] (Acid gas removal process)

[0199] The seventh valve element 420 is opened to connect the acid gas removal element 410 with the phosphine removal element 310. The NaOH solution in the acid gas removal element 410 can absorb the acid gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N.

[0200] The advantage of this embodiment is that, by arranging the germane removal unit between the phosphine removal unit and the acid gas removal unit, the GeH 4 gas in the first filtered gas can be removed, thereby further improving the gas purity.

[0201] Example 4

[0202] This embodiment is a variation of Embodiment 1.

[0203] like Figure 7 As shown, the mixed tail gas separation device further includes a borane removal unit 600 and a germane removal unit 700. The borane removal unit 600 is respectively connected to the phosphine removal unit 300 and the gas analysis unit 500 to remove borane from the mixed gas; the germane removal unit 700 is respectively connected to the borane removal unit 600, the acid gas removal unit 400 and the gas analysis unit 500 to remove germane from the mixed gas.

[0204] The method of using this embodiment is as follows:

[0205] After (phosphine removal step), it also includes:

[0206] (Borane Removal Process)

[0207] The eighth valve element 620 is opened to connect the phosphine removal element 310 and the borane removal element 610. The aqueous solution inside the borane removal element 610 allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature to obtain the second filtered gas.

[0208] (Gemane Removal Process)

[0209] Open the ninth valve element 720 to connect the phosphine removal element 310 and the germane removal element 710. The silver nitrate solution inside the germane removal element 710 can react with the GeH4 gas (germane gas) in the second filtered gas at room temperature to obtain the third filtered gas.

[0210] (Acid gas removal process)

[0211] The seventh valve element 420 is opened to connect the acid gas removal element 410 with the phosphine removal element 310. The NaOH solution in the acid gas removal element 410 can absorb the acid gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N.

[0212] The advantages of this embodiment are the same as those of embodiments 1 to 3, and will not be repeated here.

[0213] Example 5

[0214] This embodiment is a variation of Embodiment 4.

[0215] There are at least two phosphine removal units 300. Among them, several phosphine removal units 300 are arranged in parallel.

[0216] In some embodiments, there are two phosphine removal units 300. The two phosphine removal units 300 are connected in parallel.

[0217] It should be noted that, when one phosphine removal unit 300 needs to discharge waste and add iron powder, it can be switched to another phosphine removal unit 300 .

[0218] There are at least two acid gas removal units 400. Among them, several acid gas removal units 400 are arranged in parallel.

[0219] In some embodiments, there are two acid gas removal units 400. The two acid gas removal units 400 are arranged in parallel.

[0220] It should be noted that, when one acid gas removal unit 400 needs to discharge waste liquid and add sodium hydroxide solution, it can be switched to another acid gas removal unit 400.

[0221] There are at least two borane removal units 600. Among them, several borane removal units 600 are arranged in parallel.

[0222] In some embodiments, there are two borane removal units 600. The two borane removal units 600 are connected in parallel.

[0223] It should be noted that, when one borane removal unit 600 needs to discharge waste liquid and add aqueous solution, it can be switched to another borane removal unit 600.

[0224] There are at least two germane removal units 700. Among them, several germane removal units 700 are arranged in parallel.

[0225] In some embodiments, there are two germane removal units 700. The two germane removal units 700 are connected in parallel.

[0226] It should be noted that, when one germane removal unit 700 needs to discharge waste liquid and add silver nitrate solution, it can be switched to another germane removal unit 700.

[0227] The usage and advantages of this embodiment are the same as those of embodiments 1 to 3, and will not be described in detail here.

[0228] Example 6

[0229] This embodiment is a variation of Embodiments 1 to 5.

[0230] like Figure 8 As shown, the mixed tail gas separation equipment also includes a purge unit 800, a vacuum unit 900 and a pressure relief unit 1000. The purge unit 800 is respectively connected to the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300, and is used to purge the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300; the vacuum unit 900 is respectively connected to the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300, and is used to discharge the gas inside the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300; the pressure relief unit 1000 is respectively connected to the first condensation unit 100, the second condensation unit 200 and the acid gas removal unit 400, and is used to relieve the pressure of the first condensation unit 100, the second condensation unit 200 and the acid gas removal unit 400.

[0231] Furthermore, the pressure relief unit 1000 is also communicated with the borane removal unit 600 respectively, so as to relieve the pressure of the borane removal unit 600.

[0232] Furthermore, the pressure relief unit 1000 is also communicated with the germane removal unit 700 respectively, so as to relieve the pressure of the germane removal unit 700 .

[0233] like Fig. 9As shown, the purge unit 800 includes a purge element 810, a tenth valve element 820 and a fifteenth monitoring element 830. The purge element 810 is respectively connected to the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300, and is used to purge the first condensation unit 100, the second condensation unit 200 and the phosphine removal unit 300; the tenth valve element 820 is arranged on the pipeline connecting the purge element 810 with the first condensation unit 100, the second condensation unit 200, the phosphine removal unit 300, the borane removal unit 600, the germane removal unit 700 and the acid gas removal unit 400, and is used to control the flow of the pipeline; the fifteenth monitoring element 830 is arranged on the pipeline connected to the purge element 810, and is used to monitor the pressure inside the pipeline.

[0234] Specifically, the purge element 810 includes a purge gas source, a purge main line, a first purge branch line, a second purge branch line, a third purge branch line and a fourth purge branch line. The first end of the purge main line is connected to the purge gas source, and the second end of the purge main line is connected to the first purge branch line, the second purge branch line, the third purge branch line, the fourth purge branch line, the fifth purge branch line and the sixth purge branch line respectively; the first end of the first purge branch line is connected to the purge main line, and the second end of the first purge branch line is connected to the first liquid storage line, and the connection point between the first purge branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying purge gas; the first end of the second purge branch line is connected to the purge main line, and the second end of the second purge branch line is connected to the third liquid storage line, and the second purge branch line The connection point with the third liquid storage pipeline is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used to transport purge gas; the first end of the third purge branch pipeline is connected to the purge main pipeline, the second end of the third purge branch pipeline is connected to the first phosphine removal pipeline, and the connection point between the third purge branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used to transport purge gas; the first end of the fourth purge branch pipeline is connected to the third purge branch pipeline, the second end of the fourth purge branch pipeline is connected to the second phosphine removal pipeline, and the connection point between the fourth purge branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used to transport purge gas.

[0235] In some of the embodiments, the purge gas source includes but is not limited to a PN2 gas source.

[0236] In some of the embodiments, the main purge pipeline includes but is not limited to a stainless steel pipe; the first purge branch pipeline includes but is not limited to a stainless steel pipe; the second purge branch pipeline includes but is not limited to a stainless steel pipe; the third purge branch pipeline includes but is not limited to a stainless steel pipe; and the fourth purge branch pipeline includes but is not limited to a stainless steel pipe.

[0237] Specifically, the tenth valve element 820 includes an eighteenth manual diaphragm valve, a second regulating valve, a twelfth pneumatic diaphragm valve, a second non-return valve, a thirteenth pneumatic diaphragm valve, a third non-return valve, a fourteenth pneumatic diaphragm valve, a fourth non-return valve, a fifteenth pneumatic diaphragm valve and a fifth non-return valve. Among them, the eighteenth manual diaphragm valve is arranged in the purge main line to control the flow of the purge main line; the second regulating valve is arranged in the purge main line and is located downstream of the eighteenth manual diaphragm valve to adjust the pressure inside the purge main line; the twelfth pneumatic diaphragm valve is arranged in the first purge branch line to control the flow of the first purge branch line; the second non-return valve is arranged in the first purge branch line and is located downstream of the twelfth pneumatic diaphragm valve to prevent the gas inside the first purge branch line from backflowing; the thirteenth pneumatic diaphragm valve is arranged in the second purge branch line to control the flow of the second purge branch line; the third non-return valve is arranged in the second purge branch line The fourth pneumatic diaphragm valve is arranged on the third purge branch pipeline and is located downstream of the thirteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the second purge branch pipeline; the fourteenth pneumatic diaphragm valve is arranged on the third purge branch pipeline and is used to control the circulation of the third purge branch pipeline; the fourth one-way valve is arranged on the third purge branch pipeline and is located downstream of the fourteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third purge branch pipeline; the fifteenth pneumatic diaphragm valve is arranged on the fourth purge branch pipeline and is located downstream of the fifteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the fourth purge branch pipeline.

[0238] In some of the embodiments, the tenth valve element 820 includes but is not limited to a diaphragm valve, a regulating valve, and a one-way valve.

[0239] Specifically, the fifteenth monitoring element 830 is in communication with the main purge line and is located downstream of the second regulating valve, and is used to monitor the pressure inside the main purge line.

[0240] In some of the embodiments, the fifteenth monitoring element 830 includes but is not limited to a pressure sensor.

[0241] Furthermore, the purge unit 800 further includes a second filter element, wherein the second filter element is disposed at the purge element 810 and is located downstream of the fifteenth monitoring element 830, and is used to filter particulate matter in the purge gas.

[0242] Specifically, the second filter element is arranged in the main purge line.

[0243] In some of these embodiments, the second filter element includes, but is not limited to, a gas particle filter.

[0244] like Fig. 9As shown, the vacuum unit 900 includes a vacuum element 910, an eleventh valve element 920 and a sixteenth monitoring element 930. The vacuum element 910 is respectively connected to the first condensing unit 100, the second condensing unit 200 and the phosphine removal unit 300, and is used to discharge the gas inside the first condensing unit 100, the second condensing unit 200 and the phosphine removal unit 300; the eleventh valve element 920 is arranged on the pipeline connecting the vacuum element 910 with the first condensing unit 100, the second condensing unit 200 and the phosphine removal unit 300, and is used to control the flow of the pipeline; the sixteenth monitoring element 930 is arranged on the pipeline connecting with the vacuum element 910, and is used to monitor the pressure inside the pipeline.

[0245] Specifically, the vacuum element 910 includes a vacuum pump, a vacuum main line, a first vacuum branch line, a second vacuum branch line, a third vacuum branch line, and a fourth vacuum branch line. The first end of the vacuum main line is connected to the vacuum pump, and the second end of the vacuum main line is connected to the first vacuum branch line, the second vacuum branch line, the third vacuum branch line, the fourth vacuum branch line, and the pressure relief unit 1000 respectively; the first end of the first vacuum branch line is connected to the vacuum main line, and the second end of the first vacuum branch line is connected to the first liquid storage line, and the connection point between the first vacuum branch line and the first liquid storage line is located between the second pneumatic diaphragm valve and the first manual diaphragm valve for conveying gas; the first end of the second vacuum branch line is connected to the vacuum main line, and the second end of the second vacuum branch line is connected to the third liquid storage line, and the second vacuum branch line and the third The connecting point of the liquid storage pipeline is located between the third pneumatic diaphragm valve and the fourth manual diaphragm valve, and is used for conveying gas; the first end of the third vacuum branch pipeline is connected to the vacuum main pipeline, the second end of the third vacuum branch pipeline is connected to the first phosphine removal pipeline, and the connecting point of the third vacuum branch pipeline and the first phosphine removal pipeline is located between the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, and is used for conveying gas; the first end of the fourth vacuum branch pipeline is connected to the third vacuum branch pipeline, the second end of the fourth vacuum branch pipeline is connected to the second phosphine removal pipeline, and the connecting point of the fourth vacuum branch pipeline and the second phosphine removal pipeline is located between the fifth pneumatic diaphragm valve and the eighth manual diaphragm valve, and is used for conveying gas.

[0246] In some of the embodiments, the main vacuum pipeline includes but is not limited to a stainless steel pipe; the first vacuum branch pipeline includes but is not limited to a stainless steel pipe; the second vacuum branch pipeline includes but is not limited to a stainless steel pipe; the third vacuum branch pipeline includes but is not limited to a stainless steel pipe; and the fourth vacuum branch pipeline includes but is not limited to a stainless steel pipe.

[0247] Specifically, the eleventh valve element 920 includes a sixteenth pneumatic diaphragm valve, a sixth one-way valve, a seventeenth pneumatic diaphragm valve, a seventh one-way valve, an eighteenth pneumatic diaphragm valve, an eighth one-way valve, a nineteenth pneumatic diaphragm valve and a ninth one-way valve. Among them, the sixteenth pneumatic diaphragm valve is arranged in the first vacuum branch pipeline to control the flow of the first vacuum branch pipeline; the sixth one-way valve is arranged in the first vacuum branch pipeline and is located downstream of the sixteenth pneumatic diaphragm valve to prevent the gas inside the first vacuum branch pipeline from flowing back; the seventeenth pneumatic diaphragm valve is arranged in the second vacuum branch pipeline to control the flow of the second vacuum branch pipeline; the seventh one-way valve is arranged in the second vacuum branch pipeline and is located downstream of the seventeenth pneumatic diaphragm valve to prevent the gas inside the second vacuum branch pipeline from flowing back flow; the eighteenth pneumatic diaphragm valve is arranged on the third vacuum branch pipeline, for controlling the flow of the third vacuum branch pipeline; the eighth one-way valve is arranged on the third vacuum branch pipeline, and is located downstream of the eighteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the third vacuum branch pipeline; the nineteenth pneumatic diaphragm valve is arranged on the fourth vacuum branch pipeline, for controlling the flow of the fourth vacuum branch pipeline; the ninth one-way valve is arranged on the fourth vacuum branch pipeline, and is located downstream of the nineteenth pneumatic diaphragm valve, for preventing the backflow of gas inside the fourth vacuum branch pipeline.

[0248] In some of the embodiments, the eleventh valve element 920 includes but is not limited to a diaphragm valve and a one-way valve.

[0249] Specifically, the sixteenth monitoring element 930 is in communication with the vacuum main line and is used to monitor the pressure inside the vacuum main line.

[0250] In some of these embodiments, the sixteenth monitoring element 930 includes but is not limited to a pressure sensor.

[0251] like Fig. 9 As shown, the pressure relief unit 1000 includes a first pressure relief element 1010, a second pressure relief element 1020, a third pressure relief element 1030, a fourth pressure relief element 1040 and a fifth pressure relief element 1050. The first pressure relief element 1010 is respectively connected to the first condensing unit 100 and the vacuum unit 900, and is used to relieve pressure on the first condensing unit 100; the second pressure relief element 1020 is respectively connected to the second condensing unit 200 and the vacuum unit 900, and is used to relieve pressure on the second condensing unit 200; the fifth pressure relief element 1050 is respectively connected to the acid gas removal unit 400 and the vacuum unit 900, and is used to relieve pressure on the acid gas removal unit 400.

[0252] Specifically, the first pressure relief element 1010 includes a first pressure relief pipeline and a first pressure relief valve. The first end of the first pressure relief pipeline is connected to the first liquid storage element 130, and the second end of the first pressure relief pipeline is connected to the first vacuum branch pipeline; the first pressure relief valve is arranged on the first pressure relief pipeline, and is used for automatically releasing pressure when the internal pressure of the first liquid storage element 130 is too high.

[0253] Specifically, the second pressure relief element 1020 includes a second pressure relief pipeline and a second pressure relief valve. The first end of the second pressure relief pipeline is connected to the second liquid storage element 230, and the second end of the second pressure relief pipeline is connected to the second vacuum branch pipeline; the second pressure relief valve is arranged on the second pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the second liquid storage element 230 is too high.

[0254] Specifically, the fifth pressure relief element 1050 includes a fifth pressure relief pipeline and a fifth pressure relief valve. The first end of the fifth pressure relief pipeline is connected to the third reaction water tank, and the second end of the fifth pressure relief pipeline is connected to the vacuum main pipeline; the fifth pressure relief valve is arranged on the fifth pressure relief pipeline, and is used for automatically relieving pressure when the internal pressure of the third reaction water tank is too high.

[0255] Furthermore, the pressure relief unit 1000 further includes a third pressure relief element 1030. The third pressure relief element 1030 is connected to the borane removal unit 600 and the vacuum unit 900 respectively, and is used to relieve pressure on the borane removal unit 600.

[0256] Specifically, the third pressure relief element 1030 includes a third pressure relief pipeline and a third pressure relief valve. The first end of the third pressure relief pipeline is connected to the first reaction water tank, and the second end of the third pressure relief pipeline is connected to the vacuum main pipeline; the third pressure relief valve is arranged on the third pressure relief pipeline, and is used for automatically releasing pressure when the pressure inside the first reaction water tank is too high.

[0257] Furthermore, the pressure relief unit 1000 further includes a fourth pressure relief element 1040. The fourth pressure relief element 1040 is connected to the germane removal unit 700 and the vacuum unit 900 respectively, and is used to relieve the pressure of the germane removal unit 700.

[0258] Specifically, the fourth pressure relief element 1040 includes a fourth pressure relief pipeline and a fourth pressure relief valve. The first end of the fourth pressure relief pipeline is connected to the second reaction water tank, and the second end of the fourth pressure relief pipeline is connected to the vacuum main pipeline; the fourth pressure relief valve is arranged on the fourth pressure relief pipeline, and is used for automatically relieving pressure when the pressure inside the second reaction water tank is too high.

[0259] The method of using this embodiment is as follows:

[0260] On the basis of Embodiment 1 to Embodiment 5, the following is also included:

[0261] (Purge process)

[0262] Open the tenth valve element 820 and the eleventh valve element 920, and the purge element 810 will fill the entire equipment and pipelines with purge gas. Then, open the vacuum element 910 to discharge the purge gas and residual gas in the equipment and pipelines to ensure the cleanliness of the equipment and pipelines.

[0263] (Pressure relief process)

[0264] When the internal pressure of the first liquid storage element 130, the second liquid storage element 230, the borane removal element 610, the germane removal element 710, and the acid gas removal element 410 is too high, the first pressure relief element 1010, the second pressure relief element 1020, the third pressure relief element 1030, the fourth pressure relief element 1040, and the fifth pressure relief element 1050 can respectively automatically relieve the pressure of the first liquid storage element 130, the second liquid storage element 230, the borane removal element 610, the germane removal element 710, and the acid gas removal element 410 to ensure the safety of the overall equipment.

[0265] Among them, the purging process is carried out before the preparation process, and can also be carried out simultaneously with the preparation process; the pressure relief process can be carried out at any time.

[0266] The advantage of this embodiment is that by providing a purge unit and a vacuum unit, the entire equipment and pipelines can be purged to ensure the cleanliness of the pipelines; the pressure relief unit can be used to relieve the pressure of the entire equipment to ensure the safety of the entire equipment.

[0267] Example 7

[0268] This embodiment relates to the mixed tail gas separation method of the present invention, which is applied to the mixed tail gas separation equipment as described in Examples 1 to 6.

[0269] A mixed tail gas separation method, comprising:

[0270] The first condensing unit 100 obtains the mixed gas and condenses the mixed gas to obtain liquid trichlorosilane and a first condensed gas;

[0271] The second condensing unit 200 obtains the first condensed gas and condenses the first condensed gas to obtain liquid dichlorosilane and a second condensed gas;

[0272] The phosphine removal unit 300 obtains the second condensed gas and reacts the second condensed gas with iron powder under high temperature conditions to remove phosphine in the second condensed gas and obtain the first filtered gas;

[0273] The acid gas removal unit 400 obtains the first filtered gas and makes the first filtered gas react with a sodium hydroxide solution under normal temperature conditions, thereby removing the acid gas in the first filtered gas and obtaining high-purity H2.

[0274] Furthermore, it also includes:

[0275] The borane removal unit 600 obtains the first filtered gas and reacts the first filtered gas with an aqueous solution at room temperature to remove diborane from the first filtered gas and obtain a second filtered gas;

[0276] The germanium removal unit 700 obtains the second filtered gas and reacts the second filtered gas with a silver nitrate solution at room temperature to remove germanium hydride from the second filtered gas and obtain a third filtered gas;

[0277] The acid gas removal unit 400 obtains the first filtered gas and makes the third filtered gas react with a sodium hydroxide solution at room temperature to remove the acid gas in the third filtered gas and obtain H2 with a purity of 2N to 4N.

[0278] Specifically, the mixed tail gas separation method refers to Example 1 to Example 6.

[0279] More specifically, the mixed tail gas separation method of this embodiment is as follows:

[0280] (1) opening the eighteenth manual diaphragm valve, the twelfth pneumatic diaphragm valve, the thirteenth pneumatic diaphragm valve, the fourteenth pneumatic diaphragm valve and the fifteenth pneumatic diaphragm valve, and the second regulating valve adjusting the pressure of the gas entering the purge main pipeline so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor and the pipeline;

[0281] (2) turning on the vacuum pump, and opening the sixteenth pneumatic diaphragm valve, the seventeenth pneumatic diaphragm valve, the eighteenth pneumatic diaphragm valve, and the nineteenth pneumatic diaphragm valve, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the inside of the pipeline is discharged;

[0282] (3) Open the first ball valve, the second ball valve, the third ball valve, and the fourth ball valve so that the first water bath and the second water bath are connected to the first condenser and the second condenser respectively, so that the coolant in the first water bath and the second water bath can flow to the first condenser and the second condenser, thereby making the internal temperatures of the first condenser and the second condenser meet the requirements;

[0283] (4) opening the first pneumatic diaphragm valve and the first manual diaphragm valve, and adjusting the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through the first regulating valve, so that the mixed gas generated by the upstream semiconductor process equipment flows to the first condenser, so that the first condenser liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0284] (5) opening the second pneumatic diaphragm valve and the first manual diaphragm valve so that the first condenser is connected to the first liquid storage tank, thereby allowing liquid trichlorosilane to be stored in the first liquid storage tank;

[0285] (6) The first condensed gas flows to the second condenser through the pipeline, and the second condenser can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and the second condensed gas;

[0286] (7) opening the third pneumatic diaphragm valve and the fourth manual diaphragm valve so that the second condenser is connected to the second liquid storage tank, thereby allowing liquid dichlorosilane to be stored in the first liquid storage tank;

[0287] (8) opening the fourth pneumatic diaphragm valve and the seventh manual diaphragm valve, so that the phosphine removal reactor is connected to the second condenser, and the phosphine removal reactor removes the PH3 gas (phosphine gas) in the second condensed gas by reacting with iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain a first filtered gas, thereby removing the PH3 gas in the second condensed gas;

[0288] (9) Opening the fifth pneumatic diaphragm valve, the eighth manual diaphragm valve, the eighth pneumatic diaphragm valve, and the twelfth manual diaphragm valve, so that the phosphine removal reactor is connected to the second reaction tank, and the aqueous solution inside the second reaction tank allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature, thereby obtaining a second filtered gas;

[0289] (10) opening the ninth pneumatic diaphragm valve, the thirteenth manual diaphragm valve, the tenth pneumatic diaphragm valve and the fifteenth manual diaphragm valve, so that the second reaction tank and the third reaction water tank are connected, and the silver nitrate solution in the third reaction water tank can react with the GeH4 gas (germane gas) in the second filtered gas at room temperature to obtain the third filtered gas;

[0290] (11) Open the eleventh pneumatic diaphragm valve, the sixteenth manual diaphragm valve, the sixth pneumatic diaphragm valve, and the ninth manual diaphragm valve, so that the third reaction tank is connected to the first reaction tank, and the NaOH solution in the first reaction tank can absorb the acidic gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N;

[0291] (12) Open the seventh pneumatic diaphragm valve and the tenth manual diaphragm valve to connect the first reaction tank with the downstream gas processing equipment, so that H2 with a purity of 2N to 4N can be passed to the downstream gas processing equipment.

[0292] Furthermore, the mixed tail gas separation method also includes:

[0293] (13) when the liquid level inside the first liquid storage tank monitored by the third monitoring element 190 exceeds a preset threshold, opening the third manual diaphragm valve so that the liquid inside the first liquid storage tank can be discharged to the waste liquid treatment equipment;

[0294] (14) When the internal pressure of the first liquid storage tank monitored by the first monitoring element 170 exceeds a preset threshold, the first pressure relief valve automatically opens, and the gas inside the first liquid storage tank can be discharged through the first pressure relief pipeline;

[0295] (15) When the internal pressure of the second liquid storage tank monitored by the fourth monitoring element 260 exceeds a preset threshold, the second pressure relief valve automatically opens, and the gas inside the second liquid storage tank can be discharged through the second pressure relief pipeline;

[0296] (16) when the liquid level inside the second liquid storage tank monitored by the sixth monitoring element 280 exceeds a preset threshold, opening the sixth manual diaphragm valve so that the liquid inside the second liquid storage tank can be discharged to the waste liquid treatment equipment;

[0297] (17) When the iron powder in the phosphine removal reactor needs to be replaced, the sixth ball valve is opened to discharge the waste in the phosphine removal reactor; then, the fifth ball valve is opened and the sixth ball valve is closed to add iron powder to the phosphine removal reactor;

[0298] (18) When it is necessary to replace the aqueous solution in the second reaction tank, open the tenth ball valve to discharge the waste liquid in the second reaction tank to the waste liquid treatment equipment; then, open the ninth ball valve and close the tenth ball valve so that the aqueous solution source can add the aqueous solution to the second reaction tank;

[0299] (19) When the pressure monitored by the eleventh monitoring element 630 exceeds a preset threshold, the third pressure relief valve is automatically opened, so that the gas inside the second reaction tank can be discharged through the third pressure relief pipeline;

[0300] (20) When the silver nitrate solution in the third reaction tank needs to be replaced, the twelfth ball valve is opened to discharge the waste liquid in the third reaction tank to the waste liquid treatment equipment; then, the eleventh ball valve is opened and the twelfth ball valve is closed, so that the silver nitrate solution source can add the silver nitrate solution to the third reaction tank;

[0301] (21) When the pressure monitored by the thirteenth monitoring element 730 exceeds a preset threshold, the fourth pressure relief valve is automatically opened, so that the gas inside the third reaction tank can be discharged through the fourth pressure relief pipeline;

[0302] (22) When the NaOH solution in the first reaction tank needs to be replaced, the eighth ball valve is opened to discharge the waste liquid in the first reaction tank to the waste liquid treatment equipment; then, the seventh ball valve is opened and the eighth ball valve is closed, so that the NaOH solution source can add NaOH solution to the first reaction tank;

[0303] (23) When the pressure monitored by the eighth monitoring element 430 exceeds a preset threshold, the fifth pressure relief valve automatically opens, so that the gas inside the first reaction tank can be discharged through the fifth pressure relief pipeline.

[0304] Example 8

[0305] This embodiment relates to a semiconductor process system in the present invention.

[0306] A semiconductor process system includes the mixed tail gas separation equipment as described in Examples 1 to 6.

[0307] Furthermore, the mixed tail gas separation device also includes an iron powder feeding device, a waste liquid treatment device, and the iron powder feeding device is connected. Among them, the iron powder feeding device and the iron powder feeding device are connected to the phosphine removal unit, and the waste liquid treatment device is connected to the first liquid storage element of the first condensation unit, the second liquid storage element of the second condensation unit, the borane removal unit, the germane removal unit, and the acid gas removal unit.

[0308] Example 9

[0309] This embodiment relates to a specific implementation of the mixed tail gas separation device and method of the present invention.

[0310] like Fig.10 As shown, the TCS condensing unit includes a condenser (CO1), a liquid storage tank (CA1.1, CA1.2), a pneumatic diaphragm valve (PV1, PV1.5, PV1.6), a manual diaphragm valve (MV1, MV1.1, MV1.2, MV1.3, MV1.4, MV1.5, MV1.6), a regulating valve (REG1), a one-way valve (CV1), a filter (FILITER1), a pressure sensor (PT1, PT1.1, PT1.2), a thermostat (CJ1.1, CJ1.2), a temperature sensor (TE1.1, TE1.2), a liquid level sensor (LE1.1, LE1.2), and a ball valve (BV1.1, BV1.2).

[0311] The DCS condensing unit includes a condenser (CO2), a liquid storage tank (CA2.1, CA2.2), a pneumatic diaphragm valve (PV2.5, PV2.6), a manual diaphragm valve (MV2.1, MV2.2, MV2.3, MV2.4, MV2.5, MV2.6), a pressure sensor (PT2.1, PT2.2), a thermostat (CJ2.1, CJ2.2), a temperature sensor (TE2.1, TE2.2), a liquid level sensor (LE2.1, LE2.2), and a ball valve (BV2.1, BV2.2).

[0312] The phosphine removal unit includes a high-temperature reaction furnace (HO3.1, HO3.2), a pneumatic diaphragm valve (PV3.1, PV3.2, PV3.11, PV3.12), a manual diaphragm valve (MV3.1, MV3.2, MV3.3, MV3.4), a ball valve (BV3.1, BV3.2, BV3.3, BV3.4), and a temperature sensor (TIC3.1, TIC3.2).

[0313] The borane removal unit includes a reaction water tank (HLS4.1, HLS4.2), a pneumatic diaphragm valve (PV4.1, PV4.2, PV4.3, PV4.4), a manual diaphragm valve (MV4.1, MV4.2, MV4.3, MV4.4, MV4.5, MV4.6), a ball valve (BV4.1, BV4.2, BV4.3, BV4.4), and a pressure sensor (PT4.1, PT4.2).

[0314] The germane removal unit includes a reaction water tank (HLS5.1, HLS5.2), a pneumatic diaphragm valve (PV5.1, PV5.2, PV5.3, PV5.4), a manual diaphragm valve (MV5.1, MV5.2, MV5.3, MV5.4, MV5.5, MV5.6), a ball valve (BV5.1, BV5.2, BV5.3, BV5.4), and a pressure sensor (PT5.1, PT5.2).

[0315] The acid gas removal unit includes a reaction water tank (HLS6.1, HLS6.2), a pneumatic diaphragm valve (PV6.1, PV6.2, PV6.3, PV6.4), a manual diaphragm valve (MV6.1, MV6.2, MV6.3, MV6.4, MV6.5, MV6.6), a ball valve (BV6.1, BV6.2, BV6.3, BV6.4), a pressure sensor (PT6.1, PT6.2), and a PH detector (PH6.1, PH6.2).

[0316] The gas analysis unit includes gas analyzers (GD3, GD4, GD5).

[0317] The purge unit includes a manual diaphragm valve (MV2), a regulating valve (REG2), a filter (FILITER2), a pneumatic diaphragm valve (PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, PV3.6), a one-way valve (CV1.1, CV1.3, CV2.1, CV2.3, CV3.2, CV3.4), and a pressure sensor (PT2).

[0318] The vacuum unit includes a pneumatic diaphragm valve (PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, PV3.5), a one-way valve (CV1.2, CV1.3, CV2.2, CV2.4, CV3.1, CV3.3), and a pressure sensor (PT3).

[0319] The pressure relief unit includes pressure relief valves (SV1.1, SV1.2, SV2.1, SV2.2, SV4.1, SV4.2, SV5.1, SV5.2, SV6.1, SV6.2).

[0320] Specifically, the mixed tail gas separation method of this embodiment is as follows:

[0321] (1) Open MV2, PV1.1, PV1.3, PV2.1, PV2.3, PV3.4, and PV3.6, and REG2 adjusts the gas pressure entering the purge main line so that the purge gas fills the first liquid storage tank, the second liquid storage tank, the phosphine removal reactor, and the pipeline;

[0322] (2) Turn on the vacuum pump, and open PV1.2, PV1.4, PV2.2, PV2.4, PV3.3, and PV3.5, so that the vacuum pump forms a vacuum negative pressure at the first end of the vacuum main line, so that the gas in CA1.1, CA1.2, CA2.1, CA2.2, HLS4.1, HLS4.2 and the pipeline is discharged;

[0323] (3) Open BV1.1, BV1.2, BV2.1, and BV2.2, so that the first water bath and the second water bath are connected to CO1 and CO2, respectively, so that the coolant in the first water bath and the second water bath can flow to CO1 and CO2, thereby making the internal temperature of CO1 and CO2 meet the requirements;

[0324] (4) Open MV1 and PV1, and adjust the gas pressure of the upstream semiconductor process equipment input into the mixed tail gas separation device through REG1, so that the mixed gas generated by the upstream semiconductor process equipment flows to CO1, so that CO1 liquefies the gaseous trichlorosilane in the mixed gas, and obtains liquid trichlorosilane and the first condensed gas;

[0325] (5) Open PV1.5 and MV1.1 to connect CO1 with CA1.1, so that liquid trichlorosilane is stored in CA1.1; when switching to CA1.2, open PV1.6 and MV1.2, close PV1.5 and MV1.1, so that CO1 is connected with CA1.2;

[0326] (6) The first condensed gas flows to CO2 through a pipeline, and CO2 can liquefy the gaseous dichlorosilane in the first condensed gas to obtain liquid dichlorosilane and a second condensed gas;

[0327] (7) Open PV2.5 and MV2.1 to connect CO2 with CA2.1, so that liquid trichlorosilane is stored in CA2.1; when switching to CA2.2, open PV2.6 and MV2.2, close PV2.5 and MV2.1, so that CO2 is connected with CA2.2, so that liquid trichlorosilane is stored in CA2.2;

[0328] (8) Open PV3.1 and MV3.1 to connect HO3.1 and CO2. HO3.1 removes PH3 gas in the second condensed gas by reacting PH3 gas (phosphine gas) in the second condensed gas with iron powder under high temperature conditions to generate solid FeP and hydrogen and obtain the first filtered gas;

[0329] When switching to HO3.2, open PV3.2 and MV3.3, and close PV3.1 and MV3.1, so that HO3.2 and CO2 are connected;

[0330] (9) Open PV3.12, MV3.2 or PV3.11, MV3.4, PV4.2, MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.1, and the aqueous solution inside HLS4.1 allows the B2H6 gas (borane gas) in the first filtered gas to react with water at room temperature, thereby obtaining a second filtered gas;

[0331] When switching to HLS4.2, turn on PV4.4 and MV4.6, and turn off PV4.2 and MV4.2, so that HO3.1 or HO3.2 is connected to HLS4.2;

[0332] (10) Open PV4.1, MV4.1 or PV4.3, MV4.4, PV5.2, MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.1, and the silver nitrate solution in HLS5.1 can react with the GeH4 gas (germane gas) in the second filtered gas at room temperature to obtain the third filtered gas;

[0333] When switching to HLS5.2, turn on PV5.4 and MV5.5, and turn off PV5.2 and MV5.2, so that HLS4.1 or HLS4.2 is connected to HLS5.2;

[0334] (11) Open PV5.1, MV5.1 or PV5.3, MV5.4, PV6.1, MV6.1, so that HLS5.1 or HLS5.2 is connected to HLS6.1, and the NaOH solution inside HLS6.1 can absorb the acid gas in the third filtered gas, thereby obtaining H2 with a purity of 2N to 4N;

[0335] When switching to HLS6.2, open PV6.3 and MV6.4, and close PV6.1 and MV6.1, so that HLS5.1 or HLS5.2 is connected with HLS6.2;

[0336] (12) Open PV6.2, MV6.2 or PV6.4, MV6.5, so that HLS6.1 or HLS6.2 is connected to the downstream gas processing equipment, and H2 with a purity of 2N to 4N can be delivered to the downstream gas processing equipment.

[0337] Furthermore, the mixed tail gas separation method also includes:

[0338] (13) When the liquid level inside CA1.1 or CA1.2 monitored by LE1.1 or LE1.2 exceeds a preset threshold, open MV1.5 or MV1.6 so that the liquid in CA1.1 or CA1.2 can be discharged to the waste liquid treatment equipment;

[0339] (14) When the internal pressure of CA1.1 or CA1.2 monitored by PT1.1 or PT1.2 exceeds a preset threshold, SV1.1 or SV1.2 automatically opens, and the gas inside CA1.1 or CA1.2 can be discharged through the first pressure relief pipeline;

[0340] (15) When the internal pressure of CA2.1 or CA2.2 monitored by PT2.1 or PT2.2 exceeds a preset threshold, SV2.1 or SV2.2 automatically opens, and the gas inside CA2.1 or CA2.2 can be discharged through the second pressure relief pipeline;

[0341] (16) When the liquid level inside CA2.1 or CA2.2 monitored by LE2.1 or LE2.2 exceeds a preset threshold, open MV2.5 or MV2.6 so that the liquid inside CA2.1 or CA2.2 can be discharged to the waste liquid treatment equipment;

[0342] (17) When the iron powder in HO3.1 or HO3.2 needs to be replaced, open BV3.2 or BV3.4 to discharge the waste in HO3.1 or HO3.2; then, open BV3.1 or BV3.3, close BV3.2 or BV3.4, and add iron powder to HO3.1 or HO3.2;

[0343] (18) When it is necessary to replace the aqueous solution in HLS4.1 or HLS4.2, open BV4.2 or BV4.4 to discharge the waste liquid in HLS4.1 or HLS4.2 to the waste liquid treatment equipment; then, open BV4.1 or BV4.3 and close BV4.2 or BV4.4 so that the aqueous solution source can add aqueous solution to HLS4.1 or HLS4.2;

[0344] (19) When the pressure monitored by PT4.1 or PT4.2 exceeds a preset threshold, SV4.1 or SV4.2 automatically opens, so that the gas inside HLS4.1 or HLS4.2 can be discharged through the third pressure relief pipeline;

[0345] (20) When the silver nitrate solution in HLS5.1 or HLS5.2 needs to be replaced, open BV5.2 or BV5.4 to discharge the waste liquid in HLS5.1 or HLS5.2 to the waste liquid treatment equipment; then, open BV5.1 or BV5.3 and close BV5.2 or BV5.4 so that the silver nitrate solution source can add silver nitrate solution to HLS5.1 or HLS5.2;

[0346] (21) When the pressure monitored by PT5.1 or PT5.2 exceeds a preset threshold, SV5.1 or SV5.2 automatically opens, so that the gas inside HLS5.1 or HLS5.2 can be discharged through the fourth pressure relief pipeline;

[0347] (22) When it is necessary to replace the NaOH solution in HLS6.1 or HLS6.2, open BV6.2 or BV6.4 to discharge the waste liquid in HLS6.1 or HLS6.2 to the waste liquid treatment equipment; then, open BV6.1 or BV6.3 and close BV6.2 or BV6.4 so that the NaOH solution source can add NaOH solution to HLS6.1 or HLS6.2;

[0348] (23) When the pressure monitored by PT6.1 or PT6.2 exceeds a preset threshold, SV6.1 or SV6.2 automatically opens, allowing the gas inside HLS6.1 or HLS6.2 to be discharged through the fifth pressure relief pipeline.

[0349] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0350] The above-mentioned embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the invention patent. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent of the present application shall be subject to the attached claims.

Claims

1. A mixed tail gas separation device, characterized in that: include: A first condensation unit, which is in communication with an upstream semiconductor process device and is used to remove trichlorosilane from the mixed gas; a second condensing unit, which is in communication with the first condensing unit and is used to remove dichlorosilane from the mixed gas; a phosphine removal unit, which is in communication with the second condensation unit and is located downstream of the second condensation unit, and is used to remove phosphine from the mixed gas; an acid gas removal unit, which is connected to the phosphine removal unit and is located downstream of the phosphine removal unit, and is used to remove acid gas in the mixed gas to obtain H2 with a purity of 2N~4N; a gas analysis unit, which is in communication with the phosphine removal unit and is used to detect whether the gas treated by the phosphine removal unit meets the standards; a borane removal unit located downstream of the phosphine removal unit and upstream of the acid gas removal unit; a germane removal unit located downstream of the borane removal unit and upstream of the acid gas removal unit; The first condensation unit obtains the mixed gas and condenses the mixed gas to obtain liquid trichlorosilane and the first condensed gas; The second condensation unit obtains the first condensed gas and condenses the first condensed gas to obtain liquid dichlorosilane and a second condensed gas; The phosphine removal unit obtains the second condensed gas and reacts the second condensed gas with iron powder under high temperature conditions to remove phosphine in the second condensed gas and obtain the first filtered gas; The borane removal unit obtains the first filtered gas and reacts the first filtered gas with an aqueous solution at room temperature to remove diborane in the first filtered gas and obtain a second filtered gas; The germane removal unit obtains the second filtered gas and reacts the second filtered gas with a silver nitrate solution at room temperature to remove germanium hydride in the second filtered gas and obtain a third filtered gas.

2. The mixed tail gas separation equipment according to claim 1, characterized in that: The first condensing unit comprises: A first condensing element, which is connected to an upstream semiconductor process equipment and the second condensing unit, respectively, and is located downstream of the upstream semiconductor process equipment and upstream of the second condensing unit, and is used to condense the mixed gas to obtain liquid trichlorosilane and a first condensed gas; a first heat exchange element, the first heat exchange element being in communication with the first condensing element and configured to deliver cooling liquid to the first condensing element; a first liquid storage element, the first liquid storage element being in communication with the first condensing unit and the waste liquid treatment equipment and being used for storing liquid trichlorosilane; A first constant temperature element, which is disposed on the first liquid storage element and covers the outer wall of the first liquid storage element, and is used to maintain a constant internal temperature of the first liquid storage element; a first valve element, the first valve element being disposed on a pipeline connecting the first condensing element with an upstream semiconductor process device and the first liquid storage unit, and being used to control the flow of the pipeline; a second valve element, the second valve element being disposed on a pipeline communicating between the first heat exchange element and the first condensing element, and being used to control the flow of the pipeline; a third valve element, the third valve element being disposed on a pipeline connecting the first liquid storage element and the first condensing unit and the waste liquid treatment device, and being used to control the flow of the pipeline; a first monitoring element, the first monitoring element being in communication with the first liquid storage element and being used to monitor the pressure inside the first liquid storage element; a second monitoring element, the second monitoring element being disposed inside the first liquid storage element and being used to monitor the temperature inside the first liquid storage element; a third monitoring element, the third monitoring element being disposed inside the first liquid storage element and being used to monitor the liquid level inside the first liquid storage element; and / or The second condensing unit comprises: a second condensing element, which is connected to the first condensing unit and the phosphine removal unit respectively, and is located downstream of the first condensing unit and upstream of the phosphine removal unit, and is used to condense the mixed gas to obtain liquid dichlorosilane and a second condensed gas; a second heat exchange element, the second heat exchange element being in communication with the second condensing element and configured to deliver cooling liquid to the second condensing element; a second liquid storage element, the second liquid storage element being connected to the second condensing element and the waste liquid treatment device, respectively, and being used for storing liquid dichlorosilane; A second constant temperature element, which is disposed in the second liquid storage element and covers the outer wall of the second liquid storage element, and is used to maintain a constant internal temperature of the second liquid storage element; a fourth valve element, the fourth valve element being disposed on a pipeline communicating between the second heat exchange element and the second condensing element, and being used to control the flow of the pipeline; a fifth valve element, the fifth valve element being disposed on a pipeline connecting the second liquid storage element, the second condensing element and the waste liquid treatment device, and being used to control the flow of the pipeline; a fourth monitoring element, the fourth monitoring element being in communication with the second liquid storage element and being used for monitoring the pressure inside the second liquid storage element; a fifth monitoring element, the fifth monitoring element being disposed inside the second liquid storage element and being used to monitor the temperature inside the second liquid storage element; a sixth monitoring element, the sixth monitoring element being disposed inside the second liquid storage element and being used to monitor the liquid level inside the second liquid storage element; and / or The phosphine removal unit comprises: A phosphine removal element, which is connected to the second condensing unit, the acid gas removal unit, the iron powder feeding device, and the waste collection device, and is located downstream of the second condensing unit and upstream of the acid gas removal unit, and is used to remove phosphine in the mixed gas and obtain a first filtered gas; a sixth valve element, the sixth valve element being disposed on a pipeline connecting the phosphine removal element with the second condensation unit, the acid gas removal unit, the iron powder feeding device, and the waste collection device, and being used to control the flow of the pipeline; a seventh monitoring element, the seventh monitoring element being in communication with the phosphine removal element and being used for monitoring the temperature inside the phosphine removal element; and / or The acid gas removal unit comprises: An acid gas removal element, which is connected to the phosphine removal unit, the waste liquid treatment equipment, and the downstream gas treatment equipment, and is located downstream of the phosphine removal unit and upstream of the downstream gas treatment equipment, and is used to remove acid gas in the mixed gas to obtain H2 with a purity of 2N~4N; a seventh valve element, the seventh valve element being disposed on a pipeline connecting the acid gas removal element with the phosphine removal unit, the waste liquid treatment equipment, and the downstream gas treatment equipment, and being used to control the flow of the pipeline; an eighth monitoring element, the eighth monitoring element being in communication with the acid gas removal element and configured to monitor the pressure inside the acid gas removal element; a ninth monitoring element, the ninth monitoring element being disposed inside the acid gas removal element and used for monitoring a liquid level inside the acid gas removal element; a tenth monitoring element, the tenth monitoring element being disposed inside the acid gas removal element and being used to monitor the acidity value inside the acid gas removal element; and / or The gas analysis unit comprises: A first gas analysis element is connected to the phosphine removal unit and is located downstream of the phosphine removal unit, and is used to detect whether the gas processed by the phosphine removal unit meets the standard.

3. The mixed tail gas separation equipment according to claim 1, characterized in that: The gas analysis unit also includes: a second gas analysis element, which is in communication with the borane removal unit and is located downstream of the borane removal unit, and is used to detect whether the gas treated by the borane removal unit meets the standard; and / or The gas analysis unit also includes: a third gas analysis element, the third gas analysis element being in communication with the germane removal unit and being located downstream of the germane removal unit, and being used for detecting whether the gas processed by the germane removal unit meets the standard; and / or The borane removal unit comprises: a borane removal element, the borane removal element being connected to the phosphine removal unit, the acid gas removal unit, the gas analysis unit, and the waste liquid treatment equipment, and being located downstream of the phosphine removal unit and upstream of the acid gas removal unit, for removing borane from the mixed gas and obtaining a second filtered gas; an eighth valve element, the eighth valve element being disposed on a pipeline connecting the borane removal element with the phosphine removal unit, the acid gas removal unit, and the waste liquid treatment equipment, and being used to control the flow of the pipeline; an eleventh monitoring element, the eleventh monitoring element being in communication with the borane removal element and being used for monitoring the pressure inside the borane removal element; a twelfth monitoring element, the twelfth monitoring element being disposed inside the borane removal element and being used to monitor the liquid level inside the borane removal element; and / or The germane removal unit comprises: a germane removal element, which is connected to the borane removal unit, the acid gas removal unit, the gas analysis unit, and the waste liquid treatment equipment, and is located downstream of the borane removal unit and upstream of the acid gas removal unit, and is used to remove germane from the mixed gas and obtain a third filtered gas; a ninth valve element, the ninth valve element being disposed on a pipeline connecting the germane removal element with the borane removal unit, the acid gas removal unit, and the waste liquid treatment equipment, and being used to control the flow of the pipeline; a thirteenth monitoring element, the thirteenth monitoring element being in communication with the germane removal element and being used to monitor the pressure inside the germane removal element; A fourteenth monitoring element is disposed inside the germane removal element and is used to monitor the liquid level inside the germane removal element.

4. The mixed tail gas separation equipment according to claim 1, characterized in that: Also includes: a purge unit, the purge unit being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to purge the first condensation unit, the second condensation unit, and the phosphine removal unit; a vacuum unit, the vacuum unit being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to discharge gas inside the first condensation unit, the second condensation unit, and the phosphine removal unit; A pressure relief unit is connected to the first condensing unit, the second condensing unit and the acid gas removal unit respectively, and is used to relieve pressure on the first condensing unit, the second condensing unit and the acid gas removal unit.

5. The mixed tail gas separation equipment according to claim 4, characterized in that: The purge unit comprises: a purge element, the purge element being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to purge the first condensation unit, the second condensation unit, and the phosphine removal unit; a tenth valve element, the tenth valve element being disposed on a pipeline connecting the purge element with the first condensation unit, the second condensation unit, and the phosphine removal unit, and being used to control the flow of the pipeline; A fifteenth monitoring element, the fifteenth monitoring element is disposed on a pipeline connected to the purge element, and is used to monitor the pressure inside the pipeline; and / or The vacuum unit comprises: A vacuum element, the vacuum element being connected to the first condensation unit, the second condensation unit, and the phosphine removal unit, respectively, and being used to discharge gas inside the first condensation unit, the second condensation unit, and the phosphine removal unit; an eleventh valve element, the eleventh valve element being disposed on a pipeline connecting the vacuum element and the first condensation unit, the second condensation unit, and the phosphine removal unit, and being used to control the flow of the pipeline; A sixteenth monitoring element, the sixteenth monitoring element being disposed on a pipeline connected to the vacuum element and used for monitoring the pressure inside the pipeline; and / or The pressure relief unit comprises: a first pressure relief element, the first pressure relief element being connected to the first condensing unit and the vacuum unit respectively, and being used for relieving pressure on the first condensing unit; a second pressure relief element, the second pressure relief element being connected to the second condensing unit and the vacuum unit respectively, and being used for relieving pressure on the second condensing unit; A third pressure relief element is connected to the acid gas removal unit and the vacuum unit respectively, and is used to relieve pressure on the acid gas removal unit.

6. The mixed tail gas separation equipment according to claim 5, characterized in that: The pressure relief unit also includes: a fourth pressure relief element, the fourth pressure relief element being connected to the borane removal unit and the vacuum unit respectively, and being used for relieving pressure on the borane removal unit; and / or A fifth pressure relief element, wherein the fifth pressure relief element is connected to the germane removal unit and the vacuum unit respectively, and is used for relieving the pressure of the germane removal unit.

7. A mixed tail gas separation method, applied to the mixed tail gas separation device as claimed in any one of claims 1 to 6, characterized in that: include: The first condensation unit obtains the mixed gas and condenses the mixed gas to obtain liquid trichlorosilane and a first condensed gas; The second condensation unit obtains the first condensed gas and condenses the first condensed gas to obtain liquid dichlorosilane and a second condensed gas; The phosphine removal unit obtains the second condensed gas and makes the second condensed gas react with iron powder under high temperature conditions to remove the phosphine in the second condensed gas and obtain the first filtered gas.

8. The mixed tail gas separation method according to claim 7, characterized in that: Also includes: The borane removal unit obtains the first filtered gas and reacts the first filtered gas with an aqueous solution at room temperature to remove diborane in the first filtered gas and obtain a second filtered gas; The germane removal unit obtains the second filtered gas and reacts the second filtered gas with a silver nitrate solution at room temperature to remove germanium hydride from the second filtered gas and obtain a third filtered gas; The acid gas removal unit obtains the third filtered gas and reacts the third filtered gas with a sodium hydroxide solution at room temperature to remove the acid gas in the third filtered gas and obtain H2 with a purity of 2N~4N.

9. A semiconductor process system, characterized in that: include: The mixed tail gas separation device according to any one of claims 1 to 6.

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