An EUV light source system and method

Abstract

The application relates to the technical field of plasma, in particular to an EUV light source system and method, the EUV light source system comprising a detection assembly, a control module, a power module, a gas device and a discharge cavity, the detection assembly comprising an air flow meter; the gas device is used for introducing working gas into the discharge cavity; the power module is used for applying voltage to the discharge cavity to ionize the working gas; the detection assembly is signal-connected with the power module, the gas device, the discharge cavity and the control module; the detection assembly monitors voltage signals of the power module / discharge cavity, gas flow of the gas device and working parameters of the discharge cavity and feeds back to the control module; the control module controls the air flow meter to adjust the size of the gas flow according to the information fed back by the detection assembly and when the voltage signals, the gas flow and the working parameters of the discharge cavity are not in the corresponding preset ranges; the control module receives the information fed back by the detection assembly to adjust the gas flow so that the EUV radiation power in the cavity reaches the optimum.

Description

Technical Field

[0001] The present invention relates to the field of plasma technology, and in particular to an EUV light source system and method. Background Art

[0002] The principle of EUV generation using the electrodeless z-pinch is based on z-pinch scaling. During operation, the main pulse strikes the working material in the discharge region, forming an ion loop. Under the influence of a magnetic field, the charged ions interact with the plasma, generating an axial Lorentz force that causes the plasma column to undergo a z-pinch, resulting in a high-temperature, high-density plasma that radiates EUV light. The effectiveness of this axial pinching of the plasma depends on the competition between the magnetic pressure in the plasma path and the thermal pressure generated by the working gas flow rate. High-density plasma generated by a high flow rate experiences greater thermal pressure during its motion, creating a significant resistance to the magnetic pressure generated by the discharge current, making plasma pinching difficult. Consequently, plasma convergence in the cavity is poor, and the energy of the magnetic field is not easily converted into kinetic energy for the ions and thermal energy for the electrons. This results in low electron temperatures and weak collision mechanisms, hindering the generation of high-valence ions. Consequently, the system's light output is low, or even absent. If the working gas flow rate is too low, the electron temperature is too high, and the working material is punctured by the high-energy pulse, reducing or even eliminating the light output. Summary of the Invention

[0003] In order to solve the problems of too small gas flow in the discharge chamber during electrodeless z-pinch discharge, resulting in the working material in the chamber being broken down by high-energy pulses, and too large gas flow, making it difficult to form plasma in the chamber, the present invention provides an EUV light source system and method.

[0004] The solution to the technical problem of the present invention is to provide an EUV light source system including a detection component, a control module, a power module, a gas device and a discharge chamber, the detection component including an airflow meter; the gas device is used to introduce working gas into the discharge chamber, the power module is used to apply voltage to the discharge chamber to ionize the working gas, the detection component is respectively connected to the power module, the gas device, the discharge chamber and the control module signal, the detection component monitors the voltage signal of the power module / the discharge chamber, the gas flow of the gas device and the working parameters of the discharge chamber and feeds back to the control module, and the control module controls the airflow meter to adjust the size of the gas flow according to the information fed back by the detection component and when the voltage signal, the gas flow and the working parameters of the discharge chamber are not within the corresponding preset range.

[0005] Preferably, the detection component includes an oscilloscope, a barometer, a vacuum gauge and a CCD. The oscilloscope is arranged in the power module to detect the voltage signal of the power module. The airflow meter is arranged in the gas device to detect the gas flow rate input into the discharge chamber. The barometer, the vacuum gauge and the CCD are arranged in the discharge chamber to detect the gas pressure value, vacuum degree and EUV radiation power in the discharge chamber.

[0006] Preferably, the working end of the airflow meter is communicated with the discharge chamber, and the working gas flows into the discharge chamber through the airflow meter.

[0007] Preferably, the system further comprises a vacuum module, which is signal-connected to the control module. The control module controls the vacuum module to maintain the discharge chamber at a predetermined vacuum level according to information fed back by the detection component.

[0008] Preferably, the system further comprises a collection module, which is signal-connected to the detection component, and collects EUV radiated from the discharge chamber and detects the radiation power through the CCD.

[0009] In order to solve the above technical problems, the present invention further provides a method for generating an EUV light source, which can be implemented using the above EUV light source system and includes the following steps:

[0010] S1, introducing working gas into the discharge chamber at a preset state at an initial flow rate and applying voltage;

[0011] S2, detecting whether the voltage drop exceeds a preset value, if so, proceeding to the next step, otherwise returning to step S1 to increase the initial flow rate by a first preset value;

[0012] S3, calculating whether the ion abundance reaches a preset value, if yes, proceed to the next step, otherwise return to step S1 and reduce the initial flow rate by a second preset value;

[0013] S4, detecting whether the EUV output power reaches a preset value, if yes, maintaining the current gas flow rate, otherwise returning to step S1 to increase the initial flow rate by a third preset value.

[0014] Preferably, the first preset value is greater than the second preset value, and the second preset value is greater than the third preset value.

[0015] Preferably, the step S1 further includes the following steps:

[0016] S11, evacuating the discharge chamber;

[0017] S12, detecting the vacuum degree in the discharge chamber;

[0018] S13, judging whether the vacuum degree reaches the preset value, if so, introducing working gas and applying voltage, otherwise returning to step S11.

[0019] Preferably, in step S3, the ion abundance is calculated in the following manner:

[0020] The detected gas flow, gas pressure and voltage data are input into the preset code to calculate the ion abundance.

[0021] Preferably, the step S4 further includes the following steps:

[0022] S41, collecting the radiated EUV;

[0023] S42. Detect the collected EUV radiation power and record it.

[0024] Compared with the prior art, the EUV light source system and method provided by the present invention have the following advantages:

[0025] 1. An embodiment of the present invention provides an EUV light source system, comprising a detection assembly, a control module, a power module, a gas device, and a discharge chamber. The gas device is used to introduce a working gas into the discharge chamber, and the power module is used to apply a voltage to the discharge chamber to ionize the working gas. The detection assembly is signal-connected to the power module, the gas device, the discharge chamber, and the control module, respectively. The detection assembly monitors the voltage signal of the power module / discharge chamber, the gas flow rate of the gas device, and the operating parameters of the discharge chamber, and feeds these signals back to the control module. The control module controls an airflow meter to adjust the gas flow rate based on the information fed back by the detection assembly and when the voltage signal, gas flow rate, and operating parameters of the discharge chamber are not within corresponding preset ranges. Based on the information monitored by the detection assembly, the control module dynamically adjusts the input gas flow rate and ultimately determines the gas flow rate that can output a preset EUV radiation power.

[0026] 2. The EUV light source system provided in an embodiment of the present invention includes a detection component comprising an oscilloscope, an airflow meter, a barometer, a vacuum gauge, and a CCD. The oscilloscope is located in the power module to detect the voltage signal of the power module. The airflow meter is located in the gas device to detect the gas flow rate entering the discharge chamber. The barometer, vacuum gauge, and CCD are located in the discharge chamber to detect the pressure, vacuum level, and EUV radiation power within the discharge chamber. The detection components are installed in each module to monitor the data changes of the corresponding parameters in real time.

[0027] 3. In the EUV light source system provided by an embodiment of the present invention, the working end of the airflow meter is connected to the discharge chamber, and the working gas is introduced into the discharge chamber through the airflow meter. The airflow meter can adjust the gas flow rate according to the instructions of the control module.

[0028] 4. The EUV light source system provided in an embodiment of the present invention further includes a vacuum module, the vacuum module being signal-connected to the control module. The control module controls the vacuum module based on information fed back by the detection assembly to maintain a predetermined vacuum level in the discharge chamber, thereby providing an excellent working environment for the working gas.

[0029] 5. An embodiment of the present invention provides a method for generating an EUV light source, which can be implemented using the above-mentioned EUV light source system, comprising the following steps:

[0030] S1, introducing working gas into the discharge chamber at a preset state at an initial flow rate and applying voltage;

[0031] S2, detecting whether the voltage drop exceeds a preset value, if so, proceeding to the next step, otherwise returning to step S1 to increase the initial flow rate by a first preset value;

[0032] S3, calculating whether the ion abundance reaches a preset value, if yes, proceed to the next step, otherwise return to step S1 and reduce the initial flow rate by a second preset value;

[0033] S4, detecting whether the EUV output power reaches a preset value, if yes, maintaining the current gas flow rate, otherwise returning to step S1 to increase the initial flow rate by a third preset value.

[0034] The above method can adjust the gas flow rate in a targeted manner by judging whether the voltage signal, ion abundance and output power are in a preset state, so as to achieve the expected power EUV output.

[0035] 6. In the EUV light source generation method provided in an embodiment of the present invention, step S1 further includes the following steps:

[0036] S11, evacuating the discharge chamber;

[0037] S12, detecting the vacuum degree in the discharge chamber;

[0038] S13, judging whether the vacuum degree reaches the preset value, if so, introducing working gas and applying voltage, otherwise returning to step S11.

[0039] The discharge chamber is evacuated to create a vacuum environment suitable for gas operation.

[0040] 7. In the EUV light source generation method provided by an embodiment of the present invention, in step S3, the ion abundance is calculated by the following method:

[0041] The detected gas flow, gas pressure and voltage values ​​are input into the preset code to calculate the ion abundance.

[0042] The code can quickly and accurately calculate the ion abundance in the current cavity.

[0043] 8. In the EUV light source generation method provided in an embodiment of the present invention, step S4 further includes the following steps:

[0044] S41, collecting the radiated EUV;

[0045] S42. Detect the collected EUV radiation power and record it.

[0046] Detect the EUV power radiated in the current state to determine whether to adjust the gas flow rate, and record the EUV radiation power to provide data for subsequent analysis. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0048] Figure 1 It is a structural schematic diagram of the EUV light source system provided by the first embodiment of the present invention.

[0049] Figure 2 It is a schematic structural diagram of a vacuum pump provided by the first embodiment of the present invention.

[0050] Figure 3 It is a flow chart of a method for generating an EUV light source provided by the second embodiment of the present invention.

[0051] Figure 4 This is a detailed flow chart of step S1 of the EUV light source generation method provided by the second embodiment of the present invention.

[0052] Figure 5 This is a detailed flow chart of step S4 of the EUV light source generation method provided by the second embodiment of the present invention.

[0053] Description of the accompanying drawings:

[0054] 1. EUV light source system;

[0055] 11. Detection assembly; 12. Power module; 13. Discharge chamber; 14. Collection module; 15. Control module; 16. Gas device; 17. Vacuum module;

[0056] 111. Oscilloscope; 112. Airflow meter; 113. Barometer; 114. Vacuum gauge; 115. CCD;

[0057] 171. Molecular pump; 172. Mechanical pump. DETAILED DESCRIPTION

[0058] In order to make the objects, technical solutions and advantages of the present application clearer, the present application will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and should not be used to limit the present application.

[0059] The terms "vertical", "horizontal", "left", "right", "up", "down", "upper left", "upper right", "lower left", "lower right", and similar expressions used herein are for illustrative purposes only.

[0060] Referring to Figure 1 The first embodiment of the present application provides an EUV light source system, which comprises a detection assembly 11, a control module 15, a power module 12, a gas device 16 and a discharge cavity 13. The detection assembly 11 comprises a gas flow meter 112. The gas device 16 is used to introduce working gas into the discharge cavity 13. The power module 12 is used to apply voltage to the discharge cavity 13 to ionize the working gas. The detection assembly 11 is signal connected with the power module 12, the gas device 16, the discharge cavity 13 and the control module 15, respectively. The detection assembly 11 detects the voltage signal of the power module 12 / discharge cavity 13, the gas flow of the gas device 16 and the working parameter feedback of the discharge cavity 13 to the control module 15. The control module 15 controls the gas flow meter 112 to adjust the size of the gas flow according to the information feedback by the detection assembly 11 when the voltage signal, the gas flow and the working parameter of the discharge cavity 13 are not in the corresponding preset range.

[0061] It should be noted that in the present embodiment, the gas device 16 introduces Xe gas into the discharge cavity 13. At the same time, the voltage source of the power module 12 applies voltage to the discharge cavity 13 to ionize the Xe gas to generate ion circuit. The detection assembly 11 feeds back the detected information of the gas device 16, the power module 12 and the discharge cavity 13 to the control module 15. The control module 15 dynamically controls the gas flow meter 112 to adjust the size of the gas flow according to the information.

[0062] Furthermore, the detection assembly 11 includes an oscilloscope 111, an airflow meter 112, a barometer 113, a vacuum gauge 114, and a CCD 115. The oscilloscope 111 is provided in the power module 12 for detecting the voltage signal of the power module 12. It should be noted that the voltage source of the power module 12 is adjustable. When the voltage source applies voltage to the discharge chamber 13, the oscilloscope 111 can be used to determine whether the output voltage reaches the rated value. At the same time, since the voltage source only applies voltage to the discharge chamber 13, the voltage signal of the power module 12 monitored by the oscilloscope 111 is also equal to the voltage signal of the discharge chamber 13. The airflow meter 112 is provided in the gas device 16 for detecting the gas flow rate input to the discharge chamber 13. The barometer 113, vacuum gauge 114, and CCD 115 are provided in the discharge chamber 13 for detecting the gas pressure, vacuum level, and EUV radiation power within the discharge chamber 13.

[0063] It can be understood that the detection component 11 includes a series of monitoring devices, which are correspondingly arranged on each module of the EUV light source system 1 to monitor relevant information and feed back the detected information to the control module 15. The control module 15 controls each module to perform predetermined operations based on the information fed back by the detection component 11.

[0064] Furthermore, the working end of the airflow meter 112 is communicated with the discharge chamber 13 , and the working gas flows into the discharge chamber 13 through the airflow meter 112 .

[0065] It can be understood that the gas device 16 is connected to the discharge chamber 13 through the airflow meter 112, and the Xe gas in the gas device 16 is passed into the discharge chamber 13 through the airflow meter 112, and the airflow meter 112 can adjust the gas flow rate input into the discharge chamber 13 according to the control signal of the control system.

[0066] See also Figure 1 and Figure 2 Furthermore, the EUV light source system 1 also includes a vacuum module 17, which is signal-connected to the control module 15. The control module 15 controls the vacuum module 17 to maintain the discharge chamber 13 at a predetermined vacuum degree based on information feedback from the detection component 11. The vacuum module 17 includes a vacuum pump, and a working end of the vacuum pump is connected to the discharge chamber 13.

[0067] It should be noted that the vacuum pump is at least one device capable of creating a vacuum environment, such as a molecular pump, a mechanical pump, a water ring pump, a variable displacement pump, a diffusion pump, or an adsorption pump. The specific configuration can be determined based on actual needs. The vacuum pump in this embodiment includes a mechanical pump 172 and a molecular pump 171. Mechanical pump 172 first evacuates discharge chamber 13 to create a rough vacuum environment. Molecular pump 171 then evacuates discharge chamber 13 to create a high vacuum space. In this embodiment, the vacuum pump is required to create an optimal vacuum environment in discharge chamber 13 for EUV radiation from Xe gas, i.e., a vacuum of 10e-6 Pa.

[0068] Please continue reading Figure 1 Furthermore, the EUV light source system 1 further includes a collecting module 14 , which is signal-connected to the detection assembly 11 . The collecting module 14 collects EUV radiated from the discharge chamber 13 and detects the radiation power through the CCD 115 .

[0069] See also Figure 3 A second embodiment of the present invention provides a method for generating an EUV light source. The method can be implemented using the EUV light source system provided in the first embodiment, and includes the following steps:

[0070] S1, introducing working gas into the discharge chamber at a preset state at an initial flow rate and applying voltage;

[0071] S2, detecting whether the voltage drop exceeds a preset value, if so, proceeding to the next step, otherwise returning to step S1 to increase the initial flow rate by a first preset value;

[0072] S3, calculating whether the ion abundance reaches a preset value, if yes, proceed to the next step, otherwise return to step S1 and reduce the initial flow rate by a second preset value;

[0073] S4, detecting whether the EUV output power reaches a preset value, if yes, maintaining the current gas flow rate, otherwise returning to step S1 to increase the initial flow rate by a third preset value.

[0074] It should be noted that in step S1, the preset state of the discharge chamber is a vacuum environment that satisfies the working gas, the working gas introduced is a gas that can radiate EUV, and the initial flow rate does not exceed the maximum flow rate that the relevant device can control. The specific flow rate can be set according to actual needs. In this embodiment, the preset state discharge chamber is a discharge chamber with an internal vacuum degree of 10e-6Pa, the working gas is Xe gas, and the initial flow rate is preferably selected within the flow range of Xe gas to generate EUV. In order to accurately find the optimal gas flow rate, this embodiment selects 0.3 sccm, the minimum value of the optimal range for EUV generation, as the initial flow rate. While Xe gas is introduced into the discharge chamber, a voltage is applied to the discharge chamber to ionize the Xe gas to generate an ion circuit.

[0075] See also Figure 4, step S1 specifically further includes the following steps:

[0076] S11, evacuating the discharge chamber;

[0077] S12, detecting the vacuum degree in the discharge chamber;

[0078] S13, judging whether the vacuum degree reaches the preset value, if so, introducing working gas and applying voltage, otherwise returning to step S11.

[0079] It should be noted that the preset vacuum level in step S13 is manually set based on actual needs and is typically set to a vacuum range that satisfies the working conditions of the materials within the discharge chamber to ensure effective operation. In this embodiment, the working gas is Xe gas, and the optimal vacuum environment for EUV radiation from Xe gas is 10e-6 Pa, so the preset value is set to 10e-6 Pa in this embodiment.

[0080] Please refer again Figure 3 In step S2, the preset value of the voltage drop amplitude is usually set based on human experience and is usually set to 10%. It should be noted that since the power module only discharges into the discharge chamber, the voltage detected by the oscilloscope is both the voltage of the power module and the voltage of the discharge chamber. When the power module applies voltage to the discharge chamber to the rated value, the oscilloscope has a specific waveform. When the voltage drops rapidly, the oscilloscope voltage waveform will change, specifically becoming sharp. This means that the Xe gas concentration in the discharge chamber is low and the gas in the chamber is broken down. It is necessary to increase the gas flow rate to increase the Xe gas concentration in the discharge chamber.

[0081] In this embodiment, the voltage drop is set to a preset value of 10%, and the first preset value is set to 0.01 sccm. It is understood that when the voltage drop is greater than 10%, the first preset value of 0.01 sccm is added to the initial flow rate of 0.3 sccm, i.e., 0.31 sccm is used as the initial flow rate. While the voltage drop is greater than 10%, steps S1 and S2 will continue to cycle, i.e., the first preset value of 0.01 sccm is continuously added to the initial flow rate of 0.3 sccm, until the voltage stabilizes. At this point, the initial flow rate value in step S1 is the value obtained by iterating the original initial flow rate of 0.3 sccm multiple times over the first preset value of 0.01 sccm.

[0082] Furthermore, in step S3, the next step or the gas flow rate is determined based on the ion abundance value in the cavity.

[0083] Understandably, ion abundance is negatively correlated with the degree of Xe gas ionization. Low ion abundance indicates that the Xe gas concentration in the chamber is too high, and the current rated voltage is insufficient to ionize the Xe in the system. Therefore, it is necessary to reduce the gas flow rate to lower the Xe gas concentration in the discharge chamber.

[0084] Furthermore, in step S3, the ion abundance is calculated as follows:

[0085] The detected gas flow, gas pressure and voltage values ​​are input into the preset code to calculate the ion abundance.

[0086] In this embodiment, the ion abundance calculation code set in advance is used to calculate the ion abundance in the discharge chamber in real time. The data such as the gas flow rate, gas pressure value and voltage value detected in the current state are input into the code, and the code can automatically calculate the ion abundance value in the current state chamber. The preset limit for judging the high and low ion abundance is 50%, that is, if the ion abundance is greater than 50%, it means that the Xe gas concentration in the chamber meets the ionization condition at this time; if the ion abundance is less than 50%, it means that the Xe gas concentration in the chamber is too high at this time, and it is not easy to generate Xe+10 ions at this time. It is necessary to reduce the second preset value of 0.005sccm based on the initial flow rate. It should be noted that the initial flow rate here is the flow rate after iterating the first preset value. Before Xe+10<50%, the initial flow rate will cyclically reduce the second preset value by 0.005sccm until the ion abundance reaches 50%. At this time, the Xe gas flow rate introduced in step S2 is the initial flow rate value, which is the value after iterating the first preset value and the second preset value.

[0087] Furthermore, step S4 adjusts the gas flow rate by detecting EUV radiation power.

[0088] In this embodiment, the EUV output power is preset to 18W, and the third preset value is set to 0.002sccm. The Xe gas flow rate is fine-tuned by increasing the gas flow rate by 0.002sccm at a time to adjust the EUV radiation power and record the radiation power. When the EUV radiation power reaches 18W, the corresponding gas flow rate is considered optimal. Xe gas is then introduced into the discharge chamber at the current gas flow rate to continuously radiate EUV at the expected optimal power.

[0089] See also Figure 5 , the step S4 specifically further includes the following steps:

[0090] S41, collecting the radiated EUV;

[0091] S42. Detect the collected EUV radiation power and record it.

[0092] It is understandable that after EUV is radiated in the discharge chamber, the light needs to be collected by a specific device and then the power is detected by a detection device.

[0093] Compared with the prior art, the EUV light source system and method of the present invention have the following advantages:

[0094] 1. An embodiment of the present invention provides an EUV light source system, comprising a detection assembly, a control module, a power module, a gas device, and a discharge chamber. The gas device is used to introduce a working gas into the discharge chamber, and the power module is used to apply a voltage to the discharge chamber to ionize the working gas. The detection assembly is signal-connected to the power module, the gas device, the discharge chamber, and the control module, respectively. The detection assembly monitors the voltage signal of the power module / discharge chamber, the gas flow rate of the gas device, and the operating parameters of the discharge chamber, and feeds these signals back to the control module. The control module controls an airflow meter to adjust the gas flow rate based on the information fed back by the detection assembly and when the voltage signal, gas flow rate, and operating parameters of the discharge chamber are not within corresponding preset ranges. Based on the information monitored by the detection assembly, the control module dynamically adjusts the input gas flow rate and ultimately determines the gas flow rate that can output a preset EUV radiation power.

[0095] 2. The EUV light source system provided in an embodiment of the present invention includes a detection component comprising an oscilloscope, an airflow meter, a barometer, a vacuum gauge, and a CCD. The oscilloscope is located in the power module to detect the voltage signal of the power module. The airflow meter is located in the gas device to detect the gas flow rate entering the discharge chamber. The barometer, vacuum gauge, and CCD are located in the discharge chamber to detect the pressure, vacuum level, and EUV radiation power within the discharge chamber. The detection components are installed in each module to monitor the data changes of the corresponding parameters in real time.

[0096] 3. In the EUV light source system provided by an embodiment of the present invention, the working end of the airflow meter is connected to the discharge chamber, and the working gas is introduced into the discharge chamber through the airflow meter. The airflow meter can adjust the gas flow rate according to the instructions of the control module.

[0097] 4. The EUV light source system provided in an embodiment of the present invention further includes a vacuum module, the vacuum module being signal-connected to the control module. The control module controls the vacuum module based on information fed back by the detection assembly to maintain a predetermined vacuum level in the discharge chamber, thereby providing an excellent working environment for the working gas.

[0098] 5. An embodiment of the present invention provides a method for generating an EUV light source, which can be implemented using the above-mentioned EUV light source system, comprising the following steps:

[0099] S1, introducing working gas into the discharge chamber at a preset state at an initial flow rate and applying voltage;

[0100] S2, detecting whether the voltage drop exceeds a preset value, if so, proceeding to the next step, otherwise returning to step S1 to increase the initial flow rate by a first preset value;

[0101] S3, calculating whether the ion abundance reaches a preset value, if yes, proceed to the next step, otherwise return to step S1 and reduce the initial flow rate by a second preset value;

[0102] S4, detecting whether the EUV output power reaches a preset value, if yes, maintaining the current gas flow rate, otherwise returning to step S1 to increase the initial flow rate by a third preset value.

[0103] The above method can adjust the gas flow rate in a targeted manner by judging whether the voltage signal, ion abundance and output power are in a preset state, so as to achieve the expected power EUV output.

[0104] 6. In the EUV light source generation method provided in an embodiment of the present invention, step S1 further includes the following steps:

[0105] S11, evacuating the discharge chamber;

[0106] S12, detecting the vacuum degree in the discharge chamber;

[0107] S13, judging whether the vacuum degree reaches the preset value, if so, introducing working gas and applying voltage, otherwise returning to step S11.

[0108] The discharge chamber is evacuated to create a vacuum environment suitable for gas operation.

[0109] 7. In the EUV light source generation method provided by an embodiment of the present invention, in step S3, the ion abundance is calculated by the following method:

[0110] The detected gas flow, gas pressure and voltage values ​​are input into the preset code to calculate the ion abundance.

[0111] The code can quickly and accurately calculate the ion abundance in the current cavity.

[0112] 8. In the EUV light source generation method provided in an embodiment of the present invention, step S4 further includes the following steps:

[0113] S41, collecting the radiated EUV;

[0114] S42. Detect the collected EUV radiation power and record it.

[0115] Detect the EUV power radiated in the current state to determine whether to adjust the gas flow rate, and record the EUV radiation power to provide data for subsequent analysis.

[0116] In the embodiments provided herein, it should be understood that "B corresponding to A" means that B is associated with A and B can be determined based on A. However, it should also be understood that determining B based on A does not mean determining B based solely on A; B can also be determined based on A and / or other information.

[0117] It should be understood that "an embodiment" or "one embodiment" as described throughout this specification means that a particular feature, structure, or characteristic described is included in at least one embodiment of the application. Therefore, appearances of "in one embodiment" or "in an embodiment" in various places throughout this specification are not necessarily referring to the same embodiment. Furthermore, particular features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. It will also be appreciated by those of skill in the art that references to a process, module, or the like, of the application do not necessarily imply that the steps or functionality must be implemented in the particular order in which they are described.

[0118] In various embodiments of the present application, it should be understood that the magnitude of the serial number of the above-mentioned processes does not mean the inevitable sequence of execution order, and the execution order of each process should be determined according to its function and inherent logic, and should not constitute any limitation on the implementation process of the embodiments of the present application.

[0119] The flow diagrams and block diagrams in the accompanying drawings illustrate possible architectures, functions, and operations of modules, methods, and computer program products according to various embodiments of the present application. In this regard, each block in the flow diagrams or block diagrams can represent a module, a segment, or a portion of code, which comprises one or more executable instructions for implementing the specified logical function. It should also be noted that in some alternative implementations, the functions noted in the blocks can occur out of the order noted in the figures. For example, two blocks shown in succession can in fact be executed substantially concurrently or the blocks can sometimes be executed in the reverse order, depending upon the involvement of the functionality involved. It will also be noted that each block of the block diagrams and / or flow diagrams, and combinations of blocks in the block diagrams and / or flow diagrams, can be implemented by a dedicated hardware-based module which performs a particular logic function or operation, or can be implemented by a combination of dedicated hardware-based modules and computer instructions.

Claims

1. An EUV light source system, characterized in that: The EUV light source system includes a detection component, a control module, a power module, a gas device and a discharge chamber, and the detection component includes an airflow meter; The gas device is used to pass the working gas into the discharge chamber, the power module is used to apply voltage to the discharge chamber to ionize the working gas, the detection component is respectively connected to the power module, the gas device, the discharge chamber and the control module for signal connection, the detection component monitors the voltage signal of the power module / the discharge chamber, the gas flow of the gas device and the operating parameters of the discharge chamber and feeds back to the control module, and the control module controls the airflow meter to adjust the gas flow according to the information fed back by the detection component and when the voltage signal, the gas flow and the operating parameters of the discharge chamber are not within the corresponding preset range.

2. The EUV light source system according to claim 1, wherein: The detection component includes an oscilloscope, a barometer, a vacuum gauge and a CCD. The oscilloscope is arranged in the power module to detect the voltage signal of the power module. The airflow meter is arranged in the gas device to detect the gas flow rate input into the discharge chamber. The barometer, the vacuum gauge and the CCD are arranged in the discharge chamber to detect the gas pressure value, vacuum degree and EUV radiation power in the discharge chamber.

3. The EUV light source system according to claim 2, wherein: The working end of the airflow meter is communicated with the discharge chamber, and the working gas flows into the discharge chamber through the airflow meter.

4. The EUV light source system according to claim 1, wherein: The system further includes a vacuum module, which is connected to the control module by signal. The control module controls the vacuum module to maintain the discharge chamber at a predetermined vacuum level according to information fed back by the detection component.

5. The EUV light source system according to claim 1, wherein: The system further includes a collection module, which is signal-connected to the detection component. The collection module collects EUV radiated from the discharge chamber and detects radiation power through the detection component.

6. A method for generating an EUV light source, characterized in that: The EUV light source generation method can be implemented using the EUV light source system according to any one of claims 1 to 5, comprising the following steps: S1, introducing working gas into the discharge chamber at a preset state at an initial flow rate and applying voltage; S2, detecting whether the voltage drop exceeds a preset value, if so, proceeding to the next step, otherwise returning to step S1 to increase the initial flow rate by a first preset value; S3, calculating whether the ion abundance reaches a preset value, if yes, proceed to the next step, otherwise return to step S1 and reduce the initial flow rate by a second preset value; S4, detecting whether the EUV output power reaches a preset value, if yes, maintaining the current gas flow rate, otherwise returning to step S1 to increase the initial flow rate by a third preset value.

7. The EUV light source generation method according to claim 6, wherein: The first preset value is greater than the second preset value, and the second preset value is greater than the third preset value.

8. The EUV light source generation method according to claim 6, wherein: The step S1 specifically further includes the following steps: S11, evacuating the discharge chamber; S12, detecting the vacuum degree in the discharge chamber; S13, judging whether the vacuum degree reaches the preset value, if so, introducing working gas and applying voltage, otherwise returning to step S11.

9. The EUV light source generation method according to claim 6, wherein: In step S3, the ion abundance is calculated as follows: The detected gas flow, gas pressure and voltage data are input into the preset code to calculate the ion abundance.

10. The EUV light source generation method according to claim 6, wherein: The step S4 specifically further includes the following steps: S41, collecting the radiated EUV; S42. Detect the collected EUV radiation power and record it.

Images