A pure water preparation device and a pure water preparation system

Abstract

The application discloses a pure water preparation device and a pure water preparation system, which comprise a sealed box body, a first cavity, a second cavity and a third cavity are arranged below the inside of the sealed box body, a fourth cavity and a fifth cavity are arranged above the inside of the sealed box body, the first cavity and the second cavity are in communication with the fourth cavity, the fourth cavity is in communication with the fifth cavity, and the fifth cavity is in communication with the third cavity. The application has the advantages that segmented stepless adjustment of water outlet resistivity between 0.5-18.2 M Omega cm can be realized, the water outlet speed of the device is fast, and target water quality can be quickly realized from low to high or from high to low. In addition, suitable ultrapure water can be selected in different application scenarios, and the economic cost of using ultrapure water in some scenarios is reduced.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of pure water preparation, in particular to a pure water preparation device and a pure water preparation system. BACKGROUND

[0002] The application scenarios of pure water and ultrapure water are increasingly widespread, from the semiconductor industry to daily life. The existing pure water preparation process is mostly a combination of membrane treatment and ion exchange. For daily drinking water, microfiltration, nanofiltration, ultrafiltration, and reverse osmosis technology for treating raw water by membrane method has been relatively perfect. In terms of industrial pure water, the combination method of double-stage RO+EDI is already common, and even to ensure that the water resistivity is stable at 18.2MΩ·cm or above, polishing mixed bed, TOC / UV, and degassing membrane devices are added at the back end of the EDI.

[0003] Ordinary industrial pure water (first grade) and pharmaceutical industry purified water generally require a resistivity of 10MΩ·cm or more to meet the use requirements; electronic semiconductor industry ultrapure water EW-II and EW-III need to meet 15 and 12MΩ·cm respectively. Some small biological, pharmaceutical and chemical laboratories need pure water with a resistivity of about 5MΩ·cm. The solubility of ultrapure water with too high water quality is too strong, which can dissolve materials such as rubber, carbon steel, and copper pipes, so it is not the higher the water quality, the better, but to choose the appropriate water quality of pure water according to the actual demand. As can be seen from the above, different industries require different water quality of ultrapure water, although the current ultrapure water preparation process has been relatively mature, but generally get the I-grade RO water with a resistivity of about 0.1MΩ·cm, the II-grade RO water with a resistivity of about 0.5-1MΩ·cm, or the ultrapure water with a resistivity of about 18.2MΩ·cm through EDI and polishing mixed bed. Currently, it is a very difficult problem in the field to simultaneously and stably prepare pure water with a resistivity in the range of 0.5-18.2MΩ·cm, although there is a way of mixing by gas (such as carbon dioxide), for example, the Chinese patent for invention with publication number CN111013425A discloses a mixing device, which discloses a mixing method by carbon dioxide. However, for ultrapure water, a small amount of carbon dioxide will cause the resistivity to drop rapidly, and it is impossible to stably prepare pure water with a resistivity in the range of 0.5-18.2MΩ·cm. SUMMARY

[0004] The technical problem to be solved by the present application is how to stably prepare pure water with a resistivity in the range of 0.5-18.2MΩ·cm.

[0005] To solve the above technical problems, the present application provides the following technical solutions:

[0006] A pure water preparation device, comprising a sealed box body, a first cavity, a second cavity and a third cavity are arranged below the inside of the sealed box body, a fourth cavity and a fifth cavity are arranged above the inside of the sealed box body, the first cavity and the second cavity are communicated with the fourth cavity, the fourth cavity is communicated with the fifth cavity, and the fifth cavity is communicated with the third cavity.

[0007] A first water inlet pipe is arranged on the sealed box body of the first cavity, a second water inlet pipe is arranged on the sealed box body of the second cavity, an exhaust pipe is arranged on the top of the sealed box body of the fourth cavity, a plurality of partition plates are arranged in the fifth cavity, so that the inside of the fifth cavity is divided into a plurality of flow channels, the flow channels are in "S" shape, a first resistivity instrument and a second resistivity instrument are respectively arranged on the sealed box bodies of the two flow channels close to the output end of the fifth cavity, and a third resistivity instrument and a third water outlet pipe are arranged on the sealed box body of the third cavity.

[0008] The pure water preparation device discharges the air in the sealed box body, prevents the oxygen and carbon dioxide in the air from affecting the preparation of pure water, improves the precision of pure water preparation, and realizes the segmented stepless adjustment of the water resistivity between 0.5-18.2 MΩ·cm through the "S" shaped flow channels in the fifth cavity. In addition, the water outlet speed of the device is fast, and the target water quality can be quickly realized from low to high or from high to low. In addition, suitable ultrapure water can be selected in different application scenarios, which reduces the economic cost of using ultrapure water in some scenarios.

[0009] Preferably, the first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

[0010] Preferably, flow meters are arranged on the first water inlet pipe and the second water inlet pipe.

[0011] Preferably, a first water outlet pipe is arranged on the sealed box body of the first cavity.

[0012] Preferably, a second water outlet pipe is arranged on the sealed box body of the second cavity.

[0013] Preferably, a third adjusting valve is arranged on the pipeline communicated between the first cavity and the fourth cavity.

[0014] Preferably, a fourth adjusting valve is arranged on the pipeline communicated between the second cavity and the fourth cavity.

[0015] Preferably, a fifth adjusting valve is arranged on the pipeline communicated between the fourth cavity and the fifth cavity.

[0016] Preferably, a sixth adjusting valve is arranged on the pipeline communicated between the fifth cavity and the third cavity.

[0017] Preferably, the application further provides a pure water preparation system, comprising a pure water preparation device and a raw water tank, a sand filter, an activated carbon filter, a first RO device, a first high-pressure pump, a first degassing membrane device, a second RO device, a second high-pressure pump, an RO water tank, an EDI device, a pure water tank, a second degassing membrane device, an ultraviolet sterilizer, a polishing mixed bed, a 0.2 mu m filter and a UPW booster pump, the output end of the raw water tank is connected with the sand filter, the activated carbon filter, the first RO device, the first high-pressure pump, the second RO device, the second high-pressure pump, the RO water tank, the EDI device, the pure water tank, the second degassing membrane device, the ultraviolet sterilizer, the polishing mixed bed, the 0.2 mu m filter and the UPW booster pump in sequence, the output end of the first high-pressure pump is further connected with the input end of the first degassing membrane device, the output end of the first degassing membrane device is connected with a first water inlet pipe, and the output end of the UPW booster pump is connected with a second water inlet pipe.

[0018] Compared with the prior art, the application has the following beneficial effects:

[0019] 1. The pure water preparation device can discharge the air in the sealed box body, prevent the oxygen and carbon dioxide in the air from affecting the preparation of pure water, improve the precision of pure water preparation, and realize stepless adjustment of the water resistivity between 0.5-18.2 M Omega cm through the setting of the “S” type flow channel in the fifth cavity. In addition, the water outlet speed of the device is fast, and the target water quality can be quickly realized from low to high or from high to low. In addition, suitable ultrapure water can be selected in different application scenarios, thereby reducing the economic cost of using ultrapure water in some scenarios.

[0020] 2. The pure water preparation system can perform air removal treatment on the water discharged into the pure water preparation device through the setting of the first degassing membrane device and the second degassing membrane device, so as to prevent the water discharged into the pure water preparation device from containing air and affecting the precision of the pure water preparation device. In addition, the pure water preparation system can obtain pure water in the interval of 0.1-18.2 M Omega cm, and has strong applicability. BRIEF DESCRIPTION OF DRAWINGS

[0021] Figure 1 It is a structure schematic view of the embodiment one of the application;

[0022] Figure 2 It is another structure schematic view of the embodiment one of the application;

[0023] Figure 3 It is a local structure schematic view of the embodiment one of the application;

[0024] Figure 4 It is another local structure schematic view of the embodiment one of the application;

[0025] Figure 5The structural schematic diagram of the second embodiment of the present application. DETAILED DESCRIPTION

[0026] For the skilled in the art to understand the technical scheme of the present application, the technical scheme of the present application will be further described in combination with the drawings of the specification.

[0027] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connecting", "fixing" and the like should be understood in a broad sense, for example, can be fixed connection, can also be detachable connection, or integrated; can be mechanical connection, can also be electrical connection, or communication; can be directly connected, or indirectly connected through an intermediate medium; can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0028] In the present application, unless otherwise explicitly specified and limited, the terms "first", "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise explicitly specified and limited.

[0029] Embodiment one

[0030] Reference Figures 1 to 4 The present embodiment discloses a pure water preparation device, comprising a sealed box body 1, a first cavity 101, a second cavity 102 and a third cavity 103 are arranged inside and below the sealed box body, a fourth cavity 104 and a fifth cavity 105 are arranged inside and above the sealed box body 1, the first cavity 101 and the second cavity 102 are in communication with the fourth cavity 104 above, the fourth cavity 104 is in communication with the fifth cavity 105, and the fifth cavity 105 is in communication with the third cavity 103 below.

[0031] A first water inlet pipe 106 and a first water outlet pipe 107 are arranged on the sealed box body 1 of the first cavity 101, a first adjusting valve 108 is arranged on the first water inlet pipe 106, a second water inlet pipe 109 and a second water outlet pipe 110 are arranged on the sealed box body 1 of the second cavity 102, a second adjusting valve 111 is arranged on the second water inlet pipe 109, a flow meter 112 is arranged on the first water inlet pipe 106 and the second water inlet pipe 109, and a drain valve (not marked in the figure) is arranged on the first water outlet pipe 107 and the second water outlet pipe 110.

[0032] The sealing box 1 on the top of the fourth cavity 104 is provided with an exhaust pipe 113, and the exhaust pipe 113 is provided with an exhaust valve.

[0033] The fifth cavity 105 is provided with a plurality of partition plates 114, so that the fifth cavity 105 is internally provided with a plurality of flow channels, and the flow channels are in an "S" shape. The sealing box 1 on the two flow channels near the output end of the fifth cavity 105 is respectively provided with a first resistivity instrument 115 and a second resistivity instrument 116, which respectively detect the resistivity of the water in the last two flow channels in the fifth cavity 105. The sealing box of the third cavity 103 is provided with a third resistivity instrument (not shown in the figure) and a third water outlet pipe 117, and the third water outlet pipe 117 is provided with a water outlet valve 118.

[0034] The pipeline connecting the first cavity 101 and the fourth cavity 104 is provided with a third adjusting valve 119, the pipeline connecting the second cavity 102 and the fourth cavity 104 is provided with a fourth adjusting valve 120, the pipeline connecting the fourth cavity 104 and the fifth cavity 105 is provided with a fifth adjusting valve 121, and the pipeline connecting the fifth cavity 105 and the third cavity 103 is provided with a sixth adjusting valve 122.

[0035] Specifically, the working principle of the embodiment is as follows: first, set the resistivity interval of the target water quality (such as 2-5MΩ·cm, 5-10MΩ·cm, etc.), and in this embodiment, the resistivity interval of the target water quality is 2-5MΩ·cm; the first water inlet pipe 106 is used to communicate with the I-grade RO water with a resistivity of about 0.1MΩ·cm, and the second water inlet pipe 10 is used to communicate with the ultrapure water with a resistivity of about 18.2MΩ·cm.

[0036] Then, the second adjusting valve 111 is opened, the first cavity 101, the second cavity 102, the third cavity 103, the fourth cavity 104, and the fifth cavity 105 are filled with ultrapure water with a resistivity of about 18.2MΩ·cm, the air in the sealing box 1 is discharged through the exhaust pipe 113, and the exhaust valve is closed after the air is discharged, until the resistivity on the side of each resistivity instrument is about 18.2MΩ·cm, and then the input of the ultrapure water is stopped; the air in the sealing box 1 is discharged to prevent the oxygen and carbon dioxide in the air from affecting the preparation of pure water and improving the precision of the preparation of pure water.

[0037] Then the ultrapure water in the first cavity 101, the third cavity 103, the fourth cavity 104 and the fifth cavity 105 is discharged by opening the outlet valve 118 and the drain valve on the first outlet pipe 107, and then the first adjusting valve 108 is opened to discharge the I-grade RO water with the electric resistivity of about 0.1 MΩ·cm into the first cavity 101, and when the first cavity 101 is filled, the second adjusting valve 111, the third adjusting valve 119 and the fourth adjusting valve 120 are started to discharge the I-grade RO water in the first cavity 101 and the ultrapure water in the second cavity 102 into the fourth cavity 104 for rough mixing, and then the fifth adjusting valve 121 is opened to discharge the rough mixed water into the fifth cavity 105 and flow through the "S"-shaped flow channel for further mixing, and the electric resistivity of the water in the last two flow channels is detected by the first electric resistivity instrument 115 and the second electric resistivity instrument 116, if the data detected by the first electric resistivity instrument 115 and the second electric resistivity instrument 116 are approximately the same and the electric resistivity interval is 2-5 MΩ·cm, it is indicated that the flow of the water with two different electric resistivities discharged from the first inlet pipe 106 and the second inlet pipe 109 meets the requirement of preparing the target water quality, and the target water quality is prepared according to the flow, and the sixth adjusting valve 122 is opened to discharge the target water quality obtained in the fifth cavity 105 into the third cavity 103 for storage; if the data detected by the first electric resistivity instrument 115 and the second electric resistivity instrument 116 are not the same or the electric resistivity interval is not 2-5 MΩ·cm, the size of the first adjusting valve 108 and the second adjusting valve 111 is adjusted to change the flow of the water with two different electric resistivities until the data detected by the first electric resistivity instrument 115 and the second electric resistivity instrument 116 are approximately the same and the electric resistivity interval is 2-5 MΩ·cm, and then the change of the flow is stopped.

[0038] In the process of adjusting the size of the first adjusting valve 108 and the second adjusting valve 111 to change the flow of the water with two different electric resistivities, according to the value of the electric resistivity of the target water quality and the flow of the water with two different electric resistivities, a mixing formula for obtaining the value of the electric resistivity of the target water quality can be obtained:

[0039]

[0040] Wherein, f(R) is the target electric resistivity, Q1 is the flow rate of the first inlet pipe 106, t1 is the water inlet time of the first inlet pipe 106, R1 is the electric resistivity of the water in the first inlet pipe 106, Q2 is the flow rate of the second inlet pipe 109, t2 is the water inlet time of the second inlet pipe 109, and R2 is the electric resistivity of the water in the second inlet pipe 109.

[0041] Specifically, when the value of the electric resistivity instrument 25 is the target electric resistivity, i.e. f(R), the first adjusting valve 108 and the second adjusting valve 111 can be adjusted according to the value of the electric resistivity instrument 25 to make the flow in a preset interval to obtain the target water quality.

[0042] In the embodiment, the air in the sealed box 1 is discharged, the oxygen and carbon dioxide in the air are prevented from affecting the preparation of pure water, the accuracy of the preparation of pure water is improved, and through the arrangement of the "S"-shaped flow channel in the fifth cavity, the segmented stepless adjustment of the water resistivity between 0.5-18.2 MΩ·cm can be realized. In addition, the water outlet speed of the device is fast, and the target water quality can be quickly realized from low to high or from high to low. In addition, in different application scenarios, appropriate ultrapure water can be selected, and the economic cost of using ultrapure water in some scenarios is reduced.

[0043] Embodiment two:

[0044] Referring to Figure 5 In the embodiment, the air in the sealed box 1 is discharged, the oxygen and carbon dioxide in the air are prevented from affecting the preparation of pure water, the accuracy of the preparation of pure water is improved, and through the arrangement of the "S"-shaped flow channel in the fifth cavity, the segmented stepless adjustment of the water resistivity between 0.5-18.2 MΩ·cm can be realized. In addition, the water outlet speed of the device is fast, and the target water quality can be quickly realized from low to high or from high to low. In addition, in different application scenarios, appropriate ultrapure water can be selected, and the economic cost of using ultrapure water in some scenarios is reduced.

[0045] Through the arrangement of the first degassing membrane device 7 and the second degassing membrane device 13, the water discharged into the pure water preparation device is deaerated, so that the water discharged into the pure water preparation device does not contain air to affect the accuracy of the pure water preparation device. And the pure water preparation system can obtain pure water in the range of 0.1-18.2 MΩ·cm, which has strong applicability.

[0046] It is apparent for a person skilled in the art that the present application is not limited to the details of the above-described exemplary embodiments, but can be implemented in other concrete forms without departing from the spirit or essential characteristics of the application. Consequently, the embodiments should be considered in all respects as illustrative and not restrictive, the scope of the application being defined by the appended claims rather than the above description, and it is therefore intended that all changes and modifications that fall within the meaning and range of equivalency of the claims be embraced therein, no matter

[0047] The above-described embodiments are merely exemplary and are not intended to limit the scope of the present application, and it is apparent for a person skilled in the art that various modifications and improvements can be made thereto without departing from the spirit of the present application, and such modifications and improvements are intended to fall within the scope of the present application.

Claims

1. A pure water production system, characterized by: The pure water preparation device comprises a raw water tank, a sand filter, an activated carbon filter, an I-grade RO device, an I-grade high-pressure pump, a first degassing membrane device, a II-grade RO device, a II-grade high-pressure pump, an RO water tank, an EDI device, a pure water tank, a second degassing membrane device, an ultraviolet sterilizer, a polishing mixed bed, a 0.2 mu m filter and an UPW booster pump. The first cavity and the second cavity are in communication with the fourth cavity, the fourth cavity is in communication with the fifth cavity, and the fifth cavity is in communication with the third cavity. The first cavity is provided with a first water inlet pipe on the sealed box body, the second cavity is provided with a second water inlet pipe on the sealed box body, the fourth cavity is provided with an exhaust pipe on the top of the sealed box body, and the fifth cavity is provided with a plurality of partition plates to form a plurality of flow channels inside the fifth cavity.

2. The pure water producing system according to claim 1, characterized by: The output end of the raw water tank is sequentially connected with the sand filter, the activated carbon filter, the I-grade RO device, the I-grade high-pressure pump, the II-grade RO device, the II-grade high-pressure pump, the RO water tank, the EDI device, the pure water tank, the second degassing membrane device, the ultraviolet sterilizer, the polishing mixed bed, the 0.2 mu m filter and the UPW booster pump.

3. The pure water preparation system according to claim 1, characterized in that: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

4. The pure water producing system according to claim 1, characterized by: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

5. The pure water producing system according to claim 1, characterized by: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

6. The pure water producing system according to claim 1, characterized by: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

7. The pure water preparation system according to claim 1, characterized in that: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

8. The pure water producing system according to claim 1, characterized by: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

9. The pure water producing system according to claim 1, characterized by: The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve. The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve. The first water inlet pipe and the second water inlet pipe are respectively provided with a first adjusting valve and a second adjusting valve.

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