A scattered laser collection debugging system, a debugging method, a device and a storage medium

Abstract

The present application relates to the technical field of automatic detection, in particular to a scattered laser collection debugging system, a debugging method, equipment and a storage medium. The output signal intensity of the photomultiplier tube is determined to determine the debugging result, which meets the debugging requirements of the precise positioning of the optical system of the laser scattering detection equipment, and the position accuracy of the debugging is high, and the debugging process is rapid and accurate.

Description

Technical Field

[0001] This invention relates to the field of semiconductor front-end testing technology, and in particular to a scattered laser collection and debugging system, debugging method, equipment and storage medium. Background Technology

[0002] Laser scattering wafer inspection equipment is based on the principle of light scattering. It uses photodetectors to detect the scattered light signals from defects on the wafer surface, enabling the detection of minute defects on the order of hundreds or even tens of nanometers. Because the scattered light signals are very weak, photodetectors with signal amplification capabilities are typically used. A PMT (photomultiplier tube) is a commonly used, highly sensitive, high-gain photodetector with advantages such as low noise, ultra-fast response speed, and simple readout circuitry. Commonly used PMT detection surface diameters include... Several specifications exist, with dimensional tolerances potentially reaching ±0.2mm or ±0.5mm. While this tolerance is acceptable for some applications, precision inspection equipment like laser scattering wafer inspection devices requires precise installation and adjustment of the photodetector (PMT) to ensure the PMT's detection center coincides as closely as possible with the optical path axis. Furthermore, the distance between the PMT's detection surface and the image plane of the optical system needs to be quantifiable. Because commonly used PMTs are single-point photodetectors, receiving light signals within a single spot area at a time, it's impossible to directly locate the center of the detection surface and its relative position to the spot using output signal characteristics. Therefore, the optical system assembly and adjustment process lacks a quantitative benchmark, making it difficult to intuitively feedback the adjustment results, resulting in a cumbersome and complex process. Summary of the Invention

[0003] In view of this, in order to solve the above-mentioned technical problems, the purpose of this invention is to provide a scattered laser collection and debugging system, debugging method, equipment and storage medium that can adjust the requirements with high precision.

[0004] In a first aspect, embodiments of the present invention provide a scattered laser collection and debugging system, applied to a scattered laser collection system. The scattered laser collection system includes a photomultiplier tube (PMT). The debugging system is arranged sequentially along the light projection axis as follows: a backlight module for generating a point light source; an elliptical mirror for reflecting the point light source to form reflected light; a PMT placement position for placing the PMT and capable of moving the PMT along a first direction and a second direction, wherein the PMT receives the reflected light and generates a corresponding output signal according to the light intensity; and a controller connected to the PMT placement position, controlling the PMT placement position to move along the first direction and the second direction based on changes in the PMT output signal.

[0005] Furthermore, the debugging system also includes: an adjustable aperture placement position, which is set at the focal plane of the elliptical mirror and connected to the controller, for placing the adjustable aperture, which is used to restrict the passage of reflected light.

[0006] Furthermore, the controller is also connected to the adjustable aperture and first adjusts the aperture of the adjustable aperture to its minimum size.

[0007] Furthermore, the controller, based on the changes in the output signal of the photomultiplier tube, sequentially controls the movement of the adjustable aperture placement position and the photomultiplier tube placement position.

[0008] Furthermore, controlling the adjustable aperture placement position to move includes: controlling the adjustable aperture placement position to move laterally.

[0009] Furthermore, the first direction and the second direction are not parallel.

[0010] Furthermore, the first direction is the movement along the optical projection axis, and the second direction is the lateral movement direction.

[0011] Furthermore, the debugging system also includes a processor, which is connected to the photomultiplier tube and acquires the real-time output signal of the photomultiplier tube, and issues a control strategy to the controller based on the changes in the real-time output signal.

[0012] In a second aspect, a scattered laser collection and debugging method is provided, applied to the scattered laser collection and debugging system according to any one of the preceding claims, the method comprising: controlling the photomultiplier tube placement position to move along a first direction to a first position, and controlling the photomultiplier tube placement position to move along a second direction to a second position.

[0013] Furthermore, before controlling the photomultiplier tube placement position to move along the first direction, the method further includes: controlling the adjustable aperture placement position to move to the first target position.

[0014] Furthermore, controlling the adjustable aperture placement position to move to the first target position includes: controlling the adjustable aperture placement position to move, acquiring multiple output signals of the photomultiplier tube during the movement, selecting the position corresponding to the output signal with the highest intensity as the first target position, and controlling the adjustable aperture placement position to move to the first target position.

[0015] Furthermore, controlling the adjustable aperture placement position to move includes: controlling the adjustable aperture placement position to move along a plane.

[0016] Furthermore, controlling the photomultiplier tube placement position to move along the first direction to the first position includes: controlling the photomultiplier tube placement position to move based on the first direction to the critical point of photoelectric signal intensity change as the first position.

[0017] Furthermore, controlling the photomultiplier tube to move along the second direction to the second position includes: based on the first position, controlling the photomultiplier tube placement position to move along the second direction to the position with the highest photoelectric signal strength, which is the second position.

[0018] Furthermore, the first direction is the direction of the projection light axis, and the second direction is the direction of the planar axis.

[0019] Furthermore, controlling the adjustable aperture placement position to the first target position includes: controlling the adjustable aperture placement position to align the aperture with the center of the elliptical mirror.

[0020] Furthermore, controlling the adjustable aperture placement position to align the aperture with the center of the elliptical mirror includes: controlling the adjustable aperture placement position to move along a first direction to align the aperture with the center of the elliptical mirror.

[0021] Furthermore, controlling the photomultiplier tube placement position to move along the first direction to the first position, and controlling the photomultiplier tube to move along the second direction to the second position, includes: controlling the photomultiplier tube placement position to move along the first direction to the critical point of photoelectric signal intensity change as the first position, and then controlling the photomultiplier tube placement position to move based on the second direction to the position where the center of the photomultiplier tube coincides with the center of the elliptical mirror as the second position.

[0022] Furthermore, the second position is the position where the center of the photomultiplier tube coincides with the center of the elliptical mirror.

[0023] Thirdly, an electronic device is provided, including a processor and a memory, the memory storing computer-executable instructions executable by the processor, the processor executing the computer-executable instructions to implement the scattered laser collection and debugging method described in any of the preceding claims.

[0024] Fourthly, a computer-readable storage medium is provided, the computer-readable storage medium storing computer-executable instructions, which, when called and executed by a processor, cause the processor to implement the scattered laser collection and debugging method described in any of the above claims.

[0025] Thirdly, an electronic device is provided, including a processor and a memory, the memory storing computer-executable instructions executable by the processor, the processor executing the computer-executable instructions to implement the scattered laser collection and debugging method described in any of the preceding claims.

[0026] Fourthly, a computer-readable storage medium is provided, the computer-readable storage medium storing computer-executable instructions, which, when called and executed by a processor, cause the processor to implement the scattered laser collection and debugging method described in any of the above claims.

[0027] The embodiments of the present invention bring the following beneficial effects:

[0028] This invention provides a scattered laser collection and debugging system, debugging method, equipment, and storage medium. The debugging result is determined by measuring the output signal intensity of the photomultiplier tube, which meets the debugging requirements for precise positioning of the optical system of the laser scattering detection equipment. The debugging position accuracy is high, and the debugging process is rapid and accurate.

[0029] Other features and advantages of this disclosure will be set forth in the following description, or some features and advantages may be inferred from the description or determined without doubt, or may be learned by practicing the techniques described above.

[0030] To make the above-mentioned objects, features and advantages of this disclosure more apparent and understandable, preferred embodiments are described below in detail with reference to the accompanying drawings. Attached Figure Description

[0031] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0032] Figure 1 This is a schematic diagram of the scattered laser collection and debugging system provided in Embodiment 1 of the present invention;

[0033] Figure 2 This is a schematic diagram of the scattered laser collection and debugging system provided in Embodiment 2 of the present invention;

[0034] Figure 3 A schematic flowchart of the debugging control method based on Embodiment 1 is provided for embodiments of the present invention;

[0035] Figure 4 This is a schematic diagram of the critical point of phase shift of a photomultiplier tube along the first direction provided in an embodiment of the present invention;

[0036] Figure 5 This is a schematic diagram of the trial control method provided in Embodiment 2 of the present invention;

[0037] Figure 6 This is a schematic diagram showing the result after debugging, as provided in an embodiment of the present invention.

[0038] Figure 7 This is a schematic diagram of the electronic device structure provided in an embodiment of the present invention. Detailed Implementation

[0039] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0040] The debugging system and method provided in this application are applied to laser scattering detection scenarios to debug and calibrate key components in these scenarios, ensuring the accuracy of the detection process. Specifically, the laser scattering detection scenario primarily involves wafer laser scattering detection, where a laser beam is incident on the wafer surface at a certain angle. If defects exist on the wafer surface, the incident laser will scatter. The scattered light signal is collected and detected by key components. Based on the strength of the received scattered light signal and the distribution of the scattering field, the size range and type of defects on the wafer surface are determined, thus enabling the detection of wafer surface defects. Due to its operating characteristics, it can be used for precision detection of minute defects. Specifically, it can be directly used in wafer inspection, receiving the scattered light signal reflected from the wafer surface to detect minute defects on the wafer surface at the level of hundreds or even tens of nanometers. The device used to receive the reflected scattered light signal is also configured as a photodetector, which is a type of sensor. However, due to the limitations of the application scenario, the reflected scattered light signal is relatively weak and may not be directly received by the sensor. To solve this technical problem, existing technologies use photodetectors with signal amplification functions, i.e., photomultiplier tubes.

[0041] In this embodiment, "wafer" generally refers to a substrate formed of semiconductor or non-semiconductor materials. Examples include (but are not limited to) single-crystal silicon, gallium arsenide, gallium nitride, and indium phosphide. Such substrates are typically found and / or processed in semiconductor manufacturing facilities. In some cases, a wafer may contain only a substrate (i.e., a bare die). Alternatively, a wafer may contain one or more layers of different materials formed on the substrate. The one or more layers formed on the wafer may be "patterned" or "unpatterned." For example, a wafer may contain multiple dies with repeatable pattern features.

[0042] The debugging and calibration of the key components in the embodiments of this application are the debugging and calibration of the photomultiplier tube. The purpose is to ensure that the photomultiplier tube is coaxial with the reflected scattered light, that is, the reflected scattered light will not be not received or be received incompletely due to the placement of the photomultiplier tube.

[0043] Example 1:

[0044] See Figure 1 This application first provides a scattered laser collection and debugging system 100a. This system is applied to a scattered laser collection system, and the debugging is directly set in a laser scattering detection machine. Multiple fixtures are provided in this debugging system. Because this debugging system is used to debug photomultiplier tubes (PMTs), the fixtures include a PMT placement position for clamping and fixing the PMT. In addition, to simulate scattered light in a real scene, a light source and an elliptical mirror are provided at the object to be tested position. The elliptical mirror is used to reflect the light generated by the light source. Therefore, according to the light propagation path, the above components are arranged along the light propagation path axis as follows: a backlight module 110a, an elliptical mirror 120a, and a PMT placement position 130a. The point light source generated by the backlight module is reflected by the elliptical mirror and enters the PMT through the light-passing hole of an adjustable aperture.

[0045] The underlying principle for debugging this system is to use the intensity of reflected light received by the photomultiplier tube (PMT) as the evaluation standard. When the PMT is in its optimal position, with the reflected light output intensity remaining constant, the PMT should receive all the reflected light, meaning its reflected light intensity is at its highest, and its output signal is strongest. This indicates that the center of the PMT coincides with the center of the elliptical mirror. Therefore, the goal of debugging is to maximize the intensity of reflected light received by the PMT. Since the PMT's position cannot be directly adjusted, the adjustment is made to the PMT's placement position. This involves moving the PMT's placement position to move it to its optimal position.

[0046] In this embodiment of the application, the moving direction of the photomultiplier tube placement position includes a first direction and a second direction. The control logic is to first control the photomultiplier tube placement position to move along the first direction to the target position, and then control the second direction to move to the target position to complete the debugging of the photomultiplier tube.

[0047] Specifically, the first direction is the movement along the optical projection axis, and the second direction is the lateral movement direction. That is, firstly, the photomultiplier tube placement position is controlled to move along the optical projection axis to the target position, and then the photomultiplier tube placement position is controlled to move laterally to the final target position to complete the debugging of the photomultiplier tube.

[0048] Example 2:

[0049] See Figure 2 In other embodiments, because the photomultiplier tube is a single-point sensor, the light source is a point light source capable of generating a single point of light, which can be received by the photomultiplier tube. Furthermore, to make the single-point light sufficiently close to the scattered light in a real detection scenario, an aperture 140 is provided between the photomultiplier tube and the elliptical mirror. This aperture is adjustable and is used to restrict the passage of the point light source, thereby creating a point light source capable of simulating a real detection scenario. To achieve clamping and fixing of the aperture, an adjustable aperture placement position is also provided in this system for fixing the aperture. That is, the function of the aperture is to restrict the passage of reflected light, forming a sufficiently small point light source that can be received by the photomultiplier tube.

[0050] The aperture is placed at an aperture placement position, which is located between the elliptical mirror and the photomultiplier tube in the entire system, specifically at the focal plane of the elliptical mirror.

[0051] In this embodiment, because adding an aperture will cause a change in the intensity of reflected light received by the photomultiplier tube, the adjustment of the photomultiplier tube's position in this embodiment also needs to take into account the influence of the aperture. To avoid the aperture setting affecting the intensity of reflected light received by the photomultiplier tube, the aperture position needs to be adjusted before adjusting the photomultiplier tube's placement.

[0052] Specifically, firstly, the aperture of the adjustable aperture is adjusted to its minimum size by the controller to constrain the light reflected from the point light source by the elliptical mirror. Then, based on the change in the output signal of the photomultiplier tube, the adjustable aperture is moved to the target position.

[0053] In this process, the adjustable aperture placement position moves laterally, meaning that the adjustable aperture placement position is controlled to move laterally. During the movement, the intensity of the reflected light received by the photomultiplier tube changes synchronously, and the output signal of the photomultiplier tube also changes synchronously, generating multiple output signals. The position corresponding to the output signal with the highest intensity among the multiple output signals is taken as the first target position, and the adjustable aperture placement position is controlled to move to the first target position to complete the adjustment of the aperture.

[0054] Then, based on the aperture adjustment results, the photomultiplier tube placement position is controlled to move along the first direction to the target position, and then controlled to move along the second direction to the target position to complete the photomultiplier tube adjustment.

[0055] In this embodiment of the application, the control process described above is implemented based on a controller. In addition to the controller, a processor is also configured in this embodiment of the application. The processor is connected to the photomultiplier tube and is used to obtain the real-time output signal of the photomultiplier tube. Based on the changes in the real-time output signal, the processor sends the control strategy to the controller, which then performs the control execution.

[0056] Example 3:

[0057] Therefore, regarding the processing of output signals and control execution by the controller and processor, a method is also provided to control the collection and adjustment of scattered laser light. This method can be found in [reference needed]. Figure 3 The scattered laser collection and debugging system applied in Example 1 specifically includes the following processes:

[0058] Step S310. Control the photomultiplier tube placement position to move along the first direction to the first position.

[0059] Step S320. Control the photomultiplier tube placement position to move to the second position along the second direction.

[0060] In this embodiment, the first direction and the second direction are relative directions and the relationship between them is non-parallel.

[0061] Specifically, the first direction is the direction of movement along the optical projection axis, and the second direction is the lateral movement direction. The lateral movement refers to the movement direction relative to the plane parallel to the elliptical mirror, that is, including the x-axis and y-axis directions of the parallel plane.

[0062] First, the photomultiplier tube (PMT) is moved along the optical projection axis, i.e., vertically relative to the elliptical mirror. During this movement, the intensity of the reflected light received by the PMT may change, resulting in a corresponding change in the PMT's output signal intensity. The PMT's output signal intensity is recorded during the movement, and the critical point of change in output signal intensity is determined. The critical point is defined as when the output signal intensity begins to decrease or increase. (See reference...) Figure 4 , Figure 4 This diagram illustrates the critical point of the photomultiplier tube's phase movement along the first direction. It shows the situation where a portion of the converging light reflected by the elliptical mirror falls outside the detection area. When the output signal intensity decreases, it indicates that part of the reflected light falls outside the photomultiplier tube's detection area, and this point is considered the critical point. Conversely, when the output signal intensity increases, it indicates that before any movement, part of the reflected light fell outside the photomultiplier tube's detection area, and this point is also considered the critical point. The photomultiplier tube's placement is adjusted by a preset standard movement distance based on whether the output signal intensity decreases or increases; the adjusted position is the first position.

[0063] Specifically, when the output signal decreases, it indicates that the current distance between the photomultiplier tube and the elliptical mirror is less than the optimal distance. In this case, the photomultiplier tube is moved upward along the light projection axis based on a preset standard distance, and it is determined whether the strength of the output signal has recovered.

[0064] When the output signal increases from small to large, it indicates that the distance between the photomultiplier tube and the elliptical mirror was less than the optimal distance. Therefore, the current position of the photomultiplier tube is taken as the first position.

[0065] In this embodiment of the application, the purpose of moving the photomultiplier tube along the light projection axis in step S310 is to determine that the photomultiplier tube can receive all the reflected light at the height position, so as to ensure that the height adjustment is complete and accurate.

[0066] Step S320 is used to adjust the photomultiplier tube on the xy-axis of the plane after the height adjustment is completed.

[0067] Specifically, the debugging process is judged by obtaining the output signal strength of the photomultiplier tube during the debugging process. The x and y axes of the photomultiplier tube placement position are adjusted to move it, and the output signal strength of the photomultiplier tube is recorded during the movement. The position with the highest output signal strength is selected as the second position.

[0068] This second position is the final position of the photomultiplier tube, which is also the position where the center of the photomultiplier tube coincides with the center of the elliptical mirror.

[0069] Example 4:

[0070] Regarding the scattered light laser collection system in Embodiment 2, because an aperture and its placement position are added, and the presence of the aperture will also cause changes in the intensity of the received reflected light, the position of the aperture needs to be adjusted to the optimal position during the photomultiplier tube debugging process. The debugging process in this embodiment differs from that in Embodiment 3 in that, in this embodiment, the position of the aperture needs to be adjusted before debugging the photomultiplier tube. For details, please refer to... Figure 5 The embodiments of this application include the following processes:

[0071] Step S510. Control the adjustable aperture placement position to move to the first target position.

[0072] Step S520. Control the photomultiplier tube placement position to move along the first direction to the first position.

[0073] Step S530. Control the photomultiplier tube placement position to move to the second position along the second direction.

[0074] The processing procedures for steps S520 and S530 adopt the schemes in steps S310 and S320 of Embodiment 3, and will not be described again in this embodiment. This embodiment focuses on describing the processing procedure for step S510.

[0075] Regarding step S510, which is used to adjust the aperture, firstly, in order to ensure that the size of the reflected light passing through the aperture is small enough, the aperture diameter needs to be adjusted to its minimum. Then, the adjustable aperture position is moved.

[0076] In this embodiment, the adjustment of the adjustable aperture is also controlled by the output signal intensity of the photomultiplier tube. However, unlike in Embodiment 3, the photomultiplier tube in this embodiment is the one initially positioned. The aperture is controlled by moving the adjustable aperture placement position, acquiring multiple output signals from the photomultiplier tube during the movement, selecting the position corresponding to the highest intensity output signal as the first target position of the adjustable aperture placement position, and then controlling the adjustable aperture placement position to move to the first target position.

[0077] See Figure 6 This is a schematic diagram of the debugging results in this embodiment. As can be seen from this diagram, after the debugging is completed, the center of the detection surface of the photomultiplier tube gradually approaches the principal optical axis of the reflector.

[0078] In this embodiment, the moving direction of the adjustable aperture placement position is the same as the second direction of the photomultiplier tube placement position in Embodiment 3, that is, it moves along the xy axis in the plane, and its movement control is also the same, so it will not be described again.

[0079] In this embodiment, the overall debugging of the system is achieved by controlling the debugging system equipped with an aperture and an adjustable aperture placement position, and controlling the aperture, the adjustable aperture placement position and the photomultiplier tube placement position respectively.

[0080] For Embodiments 1 to 4, two scattered laser collection and debugging systems and corresponding debugging control methods are provided respectively. The debugging result is determined by determining the output signal intensity of the photomultiplier tube, which meets the debugging requirements of precise positioning of the optical system of the laser scattering detection equipment. The debugging position accuracy is high and the debugging process is fast and accurate.

[0081] Example 5:

[0082] This invention also provides an electronic device for running the above-described scattered laser collection and debugging method; see [link to related documentation]. Figure 7The diagram shows the structure of an electronic device, which includes a memory 100 and a processor 101. The memory 100 is used to store one or more computer instructions, which are executed by the processor 101 to implement the crane control method described above.

[0083] Furthermore, Figure 7 The electronic device shown also includes a bus 102 and a communication interface 103, with the processor 101, the communication interface 103 and the memory 100 connected via the bus 102.

[0084] The memory 100 may include high-speed random access memory (RAM) or non-volatile memory, such as at least one disk storage device. Communication between this system network element and at least one other network element is achieved through at least one communication interface 103 (which can be wired or wireless), such as the Internet, wide area network, local area network, or metropolitan area network. The bus 102 may be an ISA bus, PCI bus, or EISA bus, etc. The bus can be divided into address bus, data bus, control bus, etc. For ease of representation, Figure 7 The symbol is represented by a single double-headed arrow, but this does not mean that there is only one bus or one type of bus.

[0085] Processor 101 may be an integrated circuit chip with signal processing capabilities. In implementation, each step of the above method can be completed by the integrated logic circuitry in the hardware of processor 101 or by instructions in software form. Processor 101 can be a general-purpose processor, including a Central Processing Unit (CPU), a Network Processor (NP), etc.; it can also be a Digital Signal Processor (DSP), an Application Specific Integrated Circuit (ASIC), a Field-Programmable Gate Array (FPGA), or other programmable logic devices, discrete gate or transistor logic devices, or discrete hardware components. It can implement or execute the methods, steps, and logic block diagrams disclosed in the embodiments of this invention. The general-purpose processor can be a microprocessor or any conventional processor. The steps of the methods disclosed in the embodiments of this invention can be directly manifested as execution by a hardware decoding processor, or execution by a combination of hardware and software modules in the decoding processor. The software module can reside in a readily available storage medium in the art, such as random access memory, flash memory, read-only memory, programmable read-only memory, electrically erasable programmable memory, or registers. This storage medium is located in memory 100, and processor 101 reads information from memory 100 and, in conjunction with its hardware, completes the steps of the method described in the foregoing embodiments.

[0086] This invention also provides a computer-readable storage medium storing computer-executable instructions. When these computer-executable instructions are called and executed by a processor, they cause the processor to implement the above-described debugging and control method for the scattered laser collection system. For specific implementation details, please refer to the method embodiments, which will not be repeated here.

[0087] The computer program product of the scattered laser collection and debugging system, debugging method, device and storage medium provided in the embodiments of the present invention includes a computer-readable storage medium storing program code. The instructions included in the program code can be used to execute the methods in the preceding method embodiments. For specific implementation, please refer to the method embodiments, which will not be repeated here.

[0088] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the specific working process of the system and / or device described above can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.

[0089] Furthermore, in the description of the embodiments of the present invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in the present invention based on the specific circumstances.

[0090] If a function is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of this invention, or the part that contributes to the prior art, or a part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods of the various embodiments of this invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0091] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0092] Finally, it should be noted that the above-described embodiments are merely specific implementations of the present invention, used to illustrate the technical solutions of the present invention, and not to limit it. The scope of protection of the present invention is not limited thereto. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that any person skilled in the art can still modify or easily conceive of changes to the technical solutions described in the foregoing embodiments within the technical scope disclosed in the present invention, or make equivalent substitutions for some of the technical features; and these modifications, changes, or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention, and should all be covered within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A scattered laser collection and adjustment system, applied to a scattered laser collection system, wherein the scattered laser collection system includes a photomultiplier tube, characterized in that, The debugging system is arranged sequentially along the optical projection axis as follows: Backlight module, used to generate point light sources; An elliptical mirror is used to reflect the point light source to form reflected light; A photomultiplier tube placement position is used to place the photomultiplier tube and can drive the photomultiplier tube to move along a first direction and a second direction. The photomultiplier tube is used to receive the reflected light and generate a corresponding output signal according to the light intensity. The controller is connected to the photomultiplier tube placement position and controls the photomultiplier tube placement position to move along a first direction and a second direction based on the change of the photomultiplier tube output signal; the first direction is the movement along the light projection axis and the second direction is the lateral movement direction.

2. The scattered laser collection and debugging system according to claim 1, characterized in that, The debugging system also includes: An adjustable aperture placement position is set at the focal plane of the elliptical mirror and connected to the controller. It is used to place the adjustable aperture, which is used to restrict the passage of reflected light.

3. The scattered laser collection and debugging system according to claim 2, characterized in that, The controller is also connected to the adjustable aperture and first adjusts the aperture of the adjustable aperture to its minimum size.

4. The scattered laser collection and debugging system according to claim 2, characterized in that, The controller, based on the changes in the output signal of the photomultiplier tube, sequentially controls the movement of the adjustable aperture placement position and the photomultiplier tube placement position.

5. The scattered laser collection and debugging system according to claim 4, characterized in that, The control of the adjustable aperture placement position to move includes: controlling the adjustable aperture placement position to move laterally.

6. The scattered laser collection and debugging system according to claim 1, characterized in that, The debugging system also includes a processor, which is connected to the photomultiplier tube and acquires the real-time output signal of the photomultiplier tube, and issues a control strategy to the controller based on the changes in the real-time output signal.

7. A method for collecting and adjusting scattered laser light, characterized in that, The scattered laser collection and debugging system according to any one of claims 1-6, the method includes: controlling the photomultiplier tube placement position to move to a first position along a first direction, and controlling the photomultiplier tube placement position to move to a second position along a second direction; the first direction is the direction of the projection light axis, and the second direction is the direction of the planar axis.

8. The scattered laser collection and adjustment method according to claim 7, characterized in that, Before controlling the photomultiplier tube placement position to move along the first direction, the method further includes: controlling the adjustable aperture placement position to move to the first target position.

9. The scattered laser collection and adjustment method according to claim 8, characterized in that, The step of controlling the adjustable aperture placement position to move to the first target position includes: controlling the adjustable aperture placement position to move, acquiring multiple output signals of the photomultiplier tube during the movement, selecting the position corresponding to the output signal with the highest intensity as the first target position, and controlling the adjustable aperture placement position to move to the first target position.

10. The scattered laser collection and adjustment method according to claim 9, characterized in that, The control of the adjustable aperture placement position to move includes: controlling the adjustable aperture placement position to move along a plane.

11. The scattered laser collection and adjustment method according to claim 7, characterized in that, The step of controlling the photomultiplier tube placement position to move along the first direction to the first position includes: controlling the photomultiplier tube placement position to move based on the first direction to the critical point of photoelectric signal intensity change as the first position.

12. The scattered laser collection and adjustment method according to claim 11, characterized in that, The step of controlling the photomultiplier tube to move along the second direction to the second position includes: based on the first position, controlling the placement position of the photomultiplier tube to move along the second direction to the position with the highest photoelectric signal strength, which is the second position.

13. The scattered laser collection and adjustment method according to claim 8, characterized in that, The step of controlling the placement of the adjustable aperture to the first target position includes: controlling the placement of the adjustable aperture to the position where the aperture is aligned with the center of the elliptical mirror.

14. The scattered laser collection and adjustment method according to claim 13, characterized in that, The step of controlling the adjustable aperture placement position to align the aperture with the center of the elliptical mirror includes: controlling the adjustable aperture placement position to move along a first direction to align the aperture with the center of the elliptical mirror.

15. The scattered laser collection and adjustment method according to claim 7, characterized in that, The step of controlling the photomultiplier tube placement position to move along a first direction to a first position and controlling the photomultiplier tube to move along a second direction to a second position includes: controlling the photomultiplier tube placement position to move along the first direction to a critical point of photoelectric signal intensity change as the first position, and then controlling the photomultiplier tube placement position to move along the second direction to a position where the center of the photomultiplier tube coincides with the center of the elliptical mirror as the second position.

16. The scattered laser collection and adjustment method according to claim 7, characterized in that, The second position is the position where the center of the photomultiplier tube coincides with the center of the elliptical mirror.

17. An electronic device, characterized in that, The method includes a processor and a memory, the memory storing computer-executable instructions that can be executed by the processor, the processor executing the computer-executable instructions to implement the scattered laser collection and debugging method according to any one of claims 7 to 16.

18. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores computer-executable instructions, which, when invoked and executed by a processor, cause the processor to implement the scattered laser collection and debugging method according to any one of claims 7 to 16.

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