A new type of diffusion quartz boat equipment for improving light and dark films

By designing multiple partition plates and connecting columns in diffusion quartz boat equipment, combining optimized diffusion process and adjustment device of insulating silicon wafers, the problems of diffusion uniformity differences and high equipment transformation cost in the prior art are solved. , achieving more efficient diffusion uniformity and lower production costs.

CN118782510BActive Publication Date: 2025-02-07HEFEI XICHANGXIN NEW ENERGY TECH CO LTD
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Patent Information

Application Number
CN202411267736.5
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-09-11
Publication Date
2025-02-07
Estimated Expiration
2044-09-11

AI Technical Summary

Technical Problem

The prior art is difficult to improve diffusion uniformity differences in specific locations in improving diffusion processes, and it takes a long time and high cost to modify the diffusion furnace structure, resulting in capacity loss.

Method used

The new diffusion quartz boat equipment is adopted, including placing quartz boats in quartz tubes. The quartz boat consists of multiple partition plates and connecting columns, and the insulating silicon wafers and adjustment devices are added. By optimizing the diffusion process and the design of the quartz boat, the diffusion uniformity is improved. .

Benefits of technology

It reduces the impact of gas on edge insulated silicon wafers during diffusion, improves the diffusion uniformity of the air intake at edge locations, reduces equipment costs and production downtime, and improves the poor lighting and darkness of the battery cells.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to a novel diffusion quartz boat device for improving the light and shade film in the field of light and shade film manufacturing. During the dispersing work of insulating silicon wafers, an adjustable baffle will be continuously eroded by the gas blown in from the air inlet. Once the adjustable baffle is excessively eroded, the wind speed detected by the wind pressure sensor will also change accordingly. At this time, a hammering device will remove the upper part of the adjustable baffle that is excessively eroded under the control of a control terminal. The remaining adjustable baffle will be re-uploaded under the action of a compression spring and play a protective role again. In order to avoid direct contact and impact of the gas on the insulating silicon wafer at the edge position during the diffusion process, the position of the quartz boat in the quartz tube and the diffusion process flow are matched to optimize the diffusion uniformity, especially the diffusion uniformity of the insulating silicon wafer near the air inlet, so as to achieve the purpose of improving the poor light and shade of the battery cell EL and improving the efficiency and yield of the battery cell.
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Description

Technical Field

[0001] The present invention relates to a novel diffusion quartz boat device for improving light and shade films, and in particular to a novel diffusion quartz boat device for improving light and shade films used in the field of light and shade film manufacturing. Background Art

[0002] Crystalline silicon solar cell technology has developed rapidly in the past decade, and topcon cell technology has become increasingly mature. Diffusion is the core of crystalline silicon solar cells and a key factor affecting the quality of solar cells. The deviation of diffusion uniformity near the air inlet during the diffusion process is an important reason for the EL dark patches or local dark patches on the solar cells, and it is also a problem that the industry has been continuously solving.

[0003] At present, the main way to improve the diffusion uniformity at the diffusion inlet position is to optimize the diffusion process and improve the structure of the diffusion machine equipment, such as adopting a long-term slow deposition diffusion process, using a larger diffusion furnace tube, switching to a multi-position air intake device, and adding a uniform flow plate in the furnace tube.

[0004] The existing diffusion method to improve the poor EL brightness of battery cells is mainly achieved by optimizing the diffusion process and modifying the diffusion furnace body and furnace tube equipment. The diffusion process optimization mainly improves the overall diffusion uniformity. It is more difficult to improve the uniformity difference at a specific position. Modifying the diffusion furnace structure requires designing and manufacturing corresponding devices or accessories, and then installing and debugging. The cycle is long and requires a large investment in equipment costs. In addition, the machine cannot be produced during the modification and debugging period, which will bring additional economic losses in production capacity. Summary of the invention

[0005] In view of the above-mentioned prior art, the technical problem to be solved by the present invention is that the optimization of the diffusion process is mainly to improve the overall diffusion uniformity. It is difficult to improve the uniformity difference at a specific position. The modification of the diffusion furnace structure requires the design and manufacture of corresponding devices or accessories, and then installation and debugging. The cycle is long and requires a large investment in equipment costs. Moreover, the machine cannot be produced during the modification and debugging period, which will bring additional economic losses in production capacity.

[0006] To solve the above problems, the present invention provides a new type of diffusion quartz boat equipment for improving light and dark films, including a quartz boat placed in a quartz tube, the quartz boat includes multiple partitions, multiple connecting columns are fixedly connected between the multiple partitions, multiple insulating silicon wafers are placed in the quartz boat, the quartz tube is drilled with an air inlet, the quartz tube is fixedly connected with an air outlet, and one end of the air outlet passes through the quartz tube and extends to the outside of the quartz tube, the height of the multiple partitions is 128 cm, the height of the partition closest to the air inlet among the multiple partitions is increased by 66 cm, and the distance between the quartz boat and the air inlet is 4 cm.

[0007] The outer side of the quartz tube is covered with a heating furnace body, one end of the quartz tube away from the air inlet is rotatably connected with a furnace door, and a heat insulation bag is fixedly connected between the furnace door and the quartz tube.

[0008] In the above-mentioned new type of diffusion quartz boat equipment for improving light and dark films, compared with the modification of the diffusion furnace body and furnace tubes, the cost of using a new type of optimized diffusion insulating silicon wafer is lower and can be used immediately. There is no loss of production capacity during the modification process, and it has obvious economic and time cost advantages. It reduces the direct contact impact of gas on the edge insulating silicon wafer during the diffusion process and improves the diffusion uniformity of the air inlet at the edge position, thereby improving the poor EL light and dark of the battery cell.

[0009] As a further improvement of the present application, the partition plate closest to the air inlet is fixedly connected to an adjusting device at one end close to the air inlet, and the adjusting device includes a fixed frame fixedly connected to the air inlet, a pair of electric rods are fixedly connected to the upper end of the fixed frame, and the ends of the two electric rods away from the fixed frame are respectively fixedly connected to limiting blocks, and a pair of limiting rods are fixedly connected to the fixed frame, and the two limiting rods are plugged with adjustable baffles matching themselves, and compression springs are sleeved on the outer sides of the two limiting rods, and the two ends of the two compression springs are respectively fixedly connected to the fixed frame and the adjustable baffle, and a wind pressure sensor is connected to the upper end of the partition plate, which can be used for diffusion work of insulating silicon wafers of different specifications, thereby reducing the improvement cost of the quartz boat corresponding to insulating silicon wafers of different specifications.

[0010] As a further improvement of the present application, the adjustable baffle includes a baffle body, a plurality of prefabricated grooves are chiseled at one end of the baffle body close to the connecting column, a hammer device is fixedly connected to the end of the partition plate away from the adjustable baffle, the hammer device includes a fixing device fixedly connected to the partition plate, an electric shaft is rotatably connected in the fixing device, a connecting arm is fixedly connected to the electric shaft, a hammer head is fixedly connected to the end of the connecting arm away from the electric shaft, and when excessive erosion occurs on the adjustable baffle, the switching and resetting work can be automatically performed, which is not easy to affect the dispersion work of the insulating silicon wafer and is not easy to produce excessive defective insulating silicon wafers.

[0011] As a further improvement to the present application, the hammering device will strike once every 10 seconds before the wind pressure sensor detects that the wind pressure reaches a preset value. When the baffle body is broken but the upper end is not completely flat, the hammering device can continue to strike the baffle body, thereby facilitating the manufacture of a flat upper end surface on the upper part of the adjustable baffle.

[0012] As another improvement of the present application, a pair of limit grooves are opened in the baffle body, whose positions match the limit rods, and the upper ends of the limit grooves are located at the lower side of the uppermost prefabricated grooves, so that after the adjustable baffle as a whole is impacted, the broken part can be naturally separated from the baffle body.

[0013] As another improvement supplement to the present application, a vertical traction line is buried in the baffle body, and both ends of the traction line are fixedly connected with a knot. The traction line is used to limit the broken part of the baffle body, which on the one hand reduces the possibility of the quartz tube being damaged by the impact of the baffle body remnants, and on the other hand facilitates the recovery of the baffle body remnants.

[0014] As another improvement supplement of the present application, countersunk grooves are chiseled at both the upper and lower ends of the baffle body, and the dead knots are located in the countersunk grooves, which are not easy to affect the connection effect between the adjustment device and the adjustable baffle.

[0015] As another improvement supplement of the present application, the traction line is woven from a plurality of elastic thin ropes, and the portion of the traction line located inside the baffle body is in a relaxed state, so that the traction line is not easily torn under the impact of the baffle body breaking, and the traction line is not easily caused to fail.

[0016] In summary, in order to avoid direct contact and impact of gas on the edge position of the insulating silicon wafer during the diffusion process, the position of the quartz boat in the quartz tube and the diffusion process flow are optimized to improve the diffusion uniformity, especially the diffusion uniformity of the insulating silicon wafer near the air inlet, so as to achieve the purpose of improving the EL brightness of the battery cell and improving the efficiency and yield of the battery cell.

[0017] In addition, during the dispersion of the insulating silicon wafers, the adjustable baffle will continue to be eroded by the gas blown in from the air inlet. Once the adjustable baffle is excessively eroded, the wind speed detected by the wind pressure sensor will also change accordingly. At this time, the hammer device will be under the control of the control terminal and strike the adjustable baffle, breaking the adjustable baffle along the uppermost prefabricated groove, removing the upper part of the adjustable baffle that has been excessively eroded, and the remaining adjustable baffle will be re-upped under the action of the compression spring and play a protective role again. When the adjustable baffle is excessively eroded, it can automatically switch and reset, which is not easy to affect the dispersion of the insulating silicon wafers and not easy to produce excessive defective insulating silicon wafers. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic diagram of the partial structure of the quartz boat device in the furnace tube according to the first embodiment of the present application;

[0019] Figure 2 This is a schematic diagram of the structure of the existing quartz boat equipment in this application;

[0020] Figure 3 This is a schematic diagram of the structure of a quartz boat device according to the first embodiment of the present application;

[0021] Figure 4 This is a schematic diagram of the structure of a quartz boat device according to the second embodiment of the present application;

[0022] Figure 5 for Figure 4 The structural diagram at A in the middle;

[0023] Figure 6 for Figure 4 Schematic diagram of the structure at A in the middle that changes with the work;

[0024] Figure 7 This is a schematic structural diagram of an adjustable baffle and its accessory components according to a second embodiment of the present application;

[0025] Figure 8 This is a schematic cross-sectional structure diagram of an adjustable baffle and its accessory components according to a second embodiment of the present application;

[0026] Fig. 9 A side view of the adjustable baffle after being destroyed according to the second embodiment of the present application;

[0027] Fig.10 This is a schematic structural diagram of a hammering device according to a second embodiment of the present application.

[0028] Description of the numbers in the figure:

[0029] 1 quartz boat, 101 partition plate, 102 connecting column, 2 insulating silicon wafer, 3 quartz tube, 4 air inlet, 5 air outlet, 6 heating furnace body, 7 insulation bag, 8 furnace door, 9 adjustment device, 901 fixing frame, 902 electric rod, 903 limit block, 904 limit rod, 905 compression spring, 10 adjustable baffle, 1001 baffle body, 1002 prefabricated groove, 1003 limit groove, 11 wind pressure sensor, 12 hammering device, 1201 fixing device, 1202 electric shaft, 1203 connecting arm, 1204 hammering head, 13 traction line. DETAILED DESCRIPTION

[0030] Two implementation modes of the present application are described in detail below with reference to the accompanying drawings.

[0031] The first implementation method:

[0032] Figure 1 and Figure 3 A new type of diffusion quartz boat equipment for improving light and dark films is shown, including a quartz boat 1 placed in a quartz tube 3, the quartz boat 1 includes a plurality of partition plates 101, a plurality of connecting columns 102 are fixedly connected between the plurality of partition plates 101, a plurality of insulating silicon wafers 2 are placed in the quartz boat 1, an air inlet 4 is drilled in the quartz tube 3, an air outlet 5 is fixedly connected in the quartz tube 3, and one end of the air outlet 5 passes through the quartz tube 3 and extends to the outside of the quartz tube 3, the height of the plurality of partition plates 101 is 128 cm, the height of the partition plate 101 closest to the air inlet 4 among the plurality of partition plates 101 increases by 66 cm, and the distance between the quartz boat 1 and the air inlet 4 is 4 cm.

[0033] The outer side of the quartz tube 3 is covered with a heating furnace body 6 , and one end of the quartz tube 3 away from the air inlet 4 is rotatably connected to a furnace door 8 , and a heat insulation bag 7 is fixedly connected between the furnace door 8 and the quartz tube 3 .

[0034] In order to avoid direct contact and impact of gas on the edge position of the insulating silicon wafer 2 during the diffusion process, this solution matches the position of the quartz boat 1 in the quartz tube 3 and optimizes the diffusion process flow to improve the diffusion uniformity, especially the diffusion uniformity of the insulating silicon wafer 2 near the air inlet 4, so as to achieve the purpose of improving the poor EL brightness of the battery cell and improving the efficiency and yield of the battery cell.

[0035] See also Figure 2 and Figure 3 Compared with the existing quartz boat 1, the quartz boat 1 closest to the air inlet 4 in the present application is mainly heightened at the partition plate 101 near the air inlet 4, so that it is slightly higher than the height of the insulating silicon wafer 2 in the quartz boat 1, thereby avoiding direct contact and impact of the air inlet 4 on the insulating silicon wafer 2 at the edge during the diffusion process, thereby improving the diffusion uniformity of the insulating silicon wafer 2 at the edge. At the same time, the distance between the quartz tube 3 and the air inlet 4 is controlled, thereby further reducing the impact of the gas at the air inlet 4 on the edge insulating silicon wafer 2, thereby improving the diffusion uniformity of the insulating silicon wafer 2 at the edge.

[0036] At the same time, in order to match the new quartz boat 1, the diffusion process adopts a long-time, small-flow, slow deposition process, which further improves the uniformity of the diffusion gas field atmosphere, is beneficial to reducing temperature differences, improving diffusion uniformity, consistency, and process repeatability and stability, and improving the ability of the process to resist unstable factors. Without changing any parameter settings, long-term continuous production, the square resistance can be well stabilized within the control range, which greatly reduces the difficulty of process control in actual production.

[0037] Compared with the transformation of the diffusion furnace body and furnace tube, the cost of using a new optimized diffusion insulating silicon wafer 2 is lower and can be used immediately. There is no loss of production capacity during the transformation process. It has obvious economic and time cost advantages, reduces the direct contact impact of gas on the edge insulating silicon wafer 2 during the diffusion process, and improves the diffusion uniformity of the edge position air inlet 4, thereby improving the poor brightness of the battery cell EL.

[0038] The second implementation method:

[0039] Figure 4-10A new type of diffusion quartz boat equipment for improving light and dark films is shown, in which the partition plate 101 closest to the air inlet 4 is fixedly connected to an adjustment device 9 at one end close to the air inlet 4, and the adjustment device 9 includes a fixed frame 901 fixedly connected to the air inlet 4, and a pair of electric rods 902 are fixedly connected to the upper end of the fixed frame 901, and the ends of the two electric rods 902 away from the fixed frame 901 are respectively fixedly connected to limiting blocks 903, and a pair of limiting rods 904 are fixedly connected to the corresponding fixed frame 901, and the two limiting rods 904 are plugged with adjustable baffles 10 matching themselves, and the outer sides of the two limiting rods 904 are both sleeved with compression springs 905, and the two ends of the two compression springs 905 are respectively fixedly connected to the fixed frame 901 and the adjustable baffle 10, and the upper end of the partition plate 101 is connected to a wind pressure sensor 11.

[0040] The control and power supply methods of electrical structures such as the electric pole 902 and the wind pressure sensor 11 in this application are well-known technologies to those skilled in the art, so they are not disclosed in detail in this application. Those skilled in the art can make reasonable settings based on the existing technology.

[0041] In this embodiment, an adjustable adjustment device 9 and an adjustable baffle 10 are used to replace the directly heightened partition plate 101 of the first embodiment, so as to facilitate the diffusion of insulating silicon wafers 2 of different specifications. The wind pressure sensor 11 can effectively monitor the wind speed at one end of the quartz boat 1 close to the air inlet 4, so as to prevent the insulating silicon wafer 2 placed on the quartz boat 1 from being directly blown by excessively high wind speed, and it is not easy to affect the diffusion uniformity of the air inlet 4 at the edge position:

[0042] After the diffusion process, the electric rod 902 will be controlled to lift upward until the wind speed detected by the wind pressure sensor 11 meets the requirements of the diffusion process. The specific requirements for the wind speed can be tested by establishing a corresponding standard control experiment based on the process requirements of the insulating silicon wafer 2 and the final parameters of the finished product. After that, the electric rod 902 will be fixed and its length will no longer be changed. The diffusion work of insulating silicon wafers 2 of different specifications can be carried out, reducing the improvement cost of the quartz boat 1 corresponding to insulating silicon wafers 2 of different specifications.

[0043] The adjustable baffle 10 includes a baffle body 1001, and a plurality of prefabricated grooves 1002 are cut at one end of the baffle body 1001 close to the connecting column 102. The end of the partition plate 101 away from the adjustable baffle 10 is fixedly connected to a hammer device 12, and the hammer device 12 includes a fixing device 1201 fixedly connected to the partition plate 101, and an electric shaft 1202 is rotatably connected in the fixing device 1201, and a connecting arm 1203 is fixedly connected to the electric shaft 1202, and the end of the connecting arm 1203 away from the electric shaft 1202 is fixedly connected to the connecting arm 1203. The adjustable baffle 10 is connected to a hammer head 1204. During the dispersion work of the insulating silicon wafer 2, the adjustable baffle 10 will continue to be eroded by the gas blown in from the air inlet 4. Once the adjustable baffle 10 is excessively eroded, its ability to resist the air inlet 4 will decrease, and the wind speed detected by the wind pressure sensor 11 will also change accordingly. At this time, the hammer device 12 will use the electric shaft 1202 to drive the connecting arm 1203 and the hammer head 1204 to rotate under the control of the control terminal, and knock the adjustable baffle 10 to adjust the adjustable baffle 10. 0 is broken along the uppermost prefabricated groove 1002, and the upper part of the adjustable baffle 10 that is excessively eroded is removed. The remaining adjustable baffle 10 is re-uploaded under the action of the compression spring 905 and plays a protective role again. The wind speed detected by the wind pressure sensor 11 returns to normal. When the adjustable baffle 10 is excessively eroded, it can automatically switch and reset. It is not easy to affect the dispersion work of the insulating silicon wafer 2, nor is it easy to produce excessive defective parts of the insulating silicon wafer 2. The hammer device 12 is used before the wind pressure sensor 11 detects that the wind pressure reaches the preset value. A knock will be performed every 10 seconds. When the baffle body 1001 is broken but the upper end is not completely flat, the hammer device 12 can continue to knock on the baffle body 1001, so as to facilitate the manufacture of a flat upper end surface on the upper part of the adjustable baffle 10. A pair of limit grooves 1003 are opened in the baffle body 1001, and the positions of the limit grooves 1003 match the limit rods 904, and the upper ends of the limit grooves 1003 are located on the lower side of the uppermost prefabricated grooves 1002, so that after the adjustable baffle 10 is impacted as a whole, the broken part can be naturally separated from the baffle body 1001.

[0044] A vertical traction line 13 is buried in the baffle body 1001, and both ends of the traction line 13 are fixedly connected with a knot. The traction line 13 is used to limit the broken part of the baffle body 1001. On the one hand, it reduces the possibility of the quartz tube 3 being damaged by the impact of the remaining part of the baffle body 1001, and on the other hand, it is convenient for the recovery of the remaining part of the baffle body 1001. Countersunk grooves are drilled at the upper and lower ends of the baffle body 1001, and the knots are located in the countersunk grooves, which are not easy to affect the connection effect between the adjustment device 9 and the adjustable baffle 10. The traction line 13 is woven from a plurality of elastic thin ropes, and the part of the traction line 13 located in the baffle body 1001 is in a relaxed state, so that the traction line 13 is not easy to be torn under the impact of the baffle body 1001 breaking, and it is not easy to cause the traction line 13 to fail.

[0045] In view of current practical needs, the above-mentioned implementation mode adopted in this application is not limited to the scope of protection. Various changes made within the knowledge scope of technical personnel in this field without departing from the concept of this application still fall within the scope of protection of the present invention.

Claims

1. A diffusion quartz boat device for improving light and dark films, characterized in that: The quartz boat (1) comprises a quartz tube (3), wherein the quartz boat (1) comprises a plurality of partition plates (101), a plurality of connecting columns (102) are fixedly connected between the plurality of partition plates (101), a plurality of insulating silicon wafers (2) are placed in the quartz boat (1), an air inlet (4) is drilled in the quartz tube (3), an air outlet (5) is fixedly connected in the quartz tube (3), and one end of the air outlet (5) passes through the quartz tube (3) and extends to the outside of the quartz tube (3), the heights of the plurality of partition plates (101) are all 128-130 cm, the height of the partition plate (101) closest to the air inlet (4) among the plurality of partition plates (101) increases by 65-67 cm, and the distance between the quartz boat (1) and the air inlet (4) is 3-5 cm; The outer side of the quartz tube (3) is coated with a heating furnace body (6); one end of the quartz tube (3) away from the air inlet (4) is rotatably connected to a furnace door (8); and a heat insulation bag (7) is fixedly connected between the furnace door (8) and the quartz tube (3); An end of the partition plate (101) close to the air inlet (4) is fixedly connected to an adjusting device (9), the adjusting device (9) comprising a fixing frame (901) fixedly connected to the air inlet (4), a pair of electric rods (902) being fixedly connected to the upper end of the fixing frame (901), ends of the two electric rods (902) away from the fixing frame (901) being respectively fixedly connected to limiting blocks (903), a pair of limiting rods (904) being fixedly connected to the fixing frame (901), the two limiting rods (904) being plugged with an adjustable baffle (10) matching the baffle, the adjustable baffle (10) comprising a baffle body (100 1), a plurality of prefabricated grooves (1002) are bored at one end of the baffle body (1001) close to the connecting column (102), a hammer device (12) is fixedly connected to one end of the partition plate (101) away from the adjustable baffle plate (10), the hammer device (12) comprises a fixing device (1201) fixedly connected to the partition plate (101), an electric shaft (1202) is rotatably connected inside the fixing device (1201), a connecting arm (1203) is fixedly connected to the electric shaft (1202), and a hammer head (1204) is fixedly connected to one end of the connecting arm (1203) away from the electric shaft (1202).

2. The diffusion quartz boat device for improving the light and dark film according to claim 1, characterized in that: Compression springs (905) are sleeved on the outer sides of the two limit rods (904), and the two ends of the two compression springs (905) are respectively fixedly connected to the fixed frame (901) and the adjustable baffle (10), and the upper end of the partition plate (101) is connected to a wind pressure sensor (11).

3. The diffusion quartz boat equipment for improving the light and dark film according to claim 1, characterized in that: The hammering device (12) will perform a hammering operation every 10 seconds before the wind pressure sensor (11) detects that the wind pressure reaches a preset value, when the baffle body (1001) is broken but the upper end is not completely flat.

4. The diffusion quartz boat device for improving the light and dark film according to claim 1, characterized in that: A pair of limiting grooves (1003) whose positions match the limiting rods (904) are bored in the baffle body (1001), and the upper ends of the limiting grooves (1003) are located at the lower side of the uppermost prefabricated groove (1002).

5. The diffusion quartz boat device for improving the light and dark film according to claim 1, characterized in that: A vertical traction line (13) is embedded in the baffle body (1001), and both ends of the traction line (13) are fixedly connected with a knot.

6. The diffusion quartz boat device for improving the light and dark film according to claim 5, characterized in that: Countersunk grooves are formed at both the upper and lower ends of the baffle body (1001), and the dead knots are located in the countersunk grooves.

7. The diffusion quartz boat device for improving the light and dark film according to claim 5, characterized in that: The traction line (13) is formed by braiding a plurality of elastic thin ropes, and the portion of the traction line (13) located inside the baffle body (1001) is in a relaxed state.

Citation Information

Patent Citations

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    CN1327490A

  • Device for improving diffusion sheet resistance uniformity of silicon wafer

    CN203674241U

  • Novel quartz boat holder

    CN204497206U