A gas supply device for TCS bubbling

Abstract

The application discloses a kind of TCS bubble with gas supply device for bubble, it is related to the technical field of semiconductor epitaxial equipment.The present application includes outer tank, inner tank, first bubble mechanism and secondary bubble mechanism;First bubble mechanism includes first partition, first mixer, carrier gas branch line, carrier gas main pipe;Secondary bubble mechanism includes second partition and second mixer;First mixer and second mixer are densely arranged;Supplementing liquid pipe is vertically inserted in inner tank, the bottom of supplementing liquid pipe is above first partition;Gas guide pipe and gas release pipe are installed on the top of inner tank, and load cell is installed on the bottom of outer tank to support inner tank.The present application keeps the quality stable in storage space all the time, so as to stabilize vaporization;The structure does not need additional energy supply, and the efficiency is high, which can output stable and saturated steam;By the interval cavity between outer tank and inner tank, a firewall can be set to achieve protection;Temperature sensor can discover and give an early warning in time when encountering temperature anomaly.

Description

Technical Field

[0001] This invention belongs to the field of semiconductor epitaxial equipment technology, and in particular relates to a gas supply device for TCS bubbling. Background Technology

[0002] TCS is the industrial abbreviation for trichlorosilane, also known as silicon trichloride (SiHCl3). It is an inorganic compound that is a colorless, easily flowing, and volatile solution with a pungent, irritating odor. It is highly corrosive, flammable, and toxic, and is extremely flammable in air. In epitaxial processes, H2 is used as a carrier to vaporize TCS, which is then introduced into the deposition chamber as a silicon source. The bubbling method involves passing process gas as a carrier gas into a liquid source, forming bubbles containing liquid source vapor, which are then output to the process equipment. To ensure a stable TCS supply, the TCS bubbler design must guarantee the stability of the TCS liquid temperature, internal pressure, and bubble rise height to obtain a stable TCS gas flow rate.

[0003] Existing technologies, such as Publication No. 101333678A, entitled "A Scheme for Control Piping of a Distribution and Evaluation System for Trichlorosilane or Silicon Tetrachloride Supply," include purging and vacuuming functions in the system piping, but do not provide leakage detection or protection structures after leakage. Furthermore, existing structures that directly use H2 as a carrier to vaporize TCS result in insufficient contact between the carrier gas and TCS, leading to relatively poor stability. Since TCS is consumed after vaporization, it requires real-time replenishment, necessitating automated control to maintain a stable mass within the storage space for stable vaporization. Therefore, to address these issues, this technical solution proposes a gas supply device for TCS bubbling. Summary of the Invention

[0004] This invention provides a gas supply device for TCS bubbling, which solves the problems of existing TCS bubbling gas supply devices that directly use H2 as a carrier to vaporize TCS, resulting in insufficient contact between the carrier gas and TCS, leading to relatively poor stability, inability to replenish liquid in time, and unstable vaporization.

[0005] To solve the above-mentioned technical problems, the present invention is achieved through the following technical solution:

[0006] The present invention provides a TCS bubbling gas supply device, comprising an outer tank, an inner tank fitted inside the outer tank, a primary bubbling mechanism installed inside the inner tank, and a secondary bubbling mechanism;

[0007] The primary bubbling mechanism includes a primary baffle located near the bottom of the inner tank, a primary mixer vertically mounted on the surface of the primary baffle via a fixed rib, a carrier gas branch pipe located at the bottom of the primary baffle and connected to the primary mixer, and a carrier gas main pipe extending from the outer tank into the inner tank and connected to the carrier gas branch pipe at its bottom.

[0008] The secondary bubbling mechanism includes a secondary partition located above the primary partition and a secondary mixer mounted on the secondary partition; the secondary partition has at least one layer.

[0009] Both the primary mixer and the secondary mixer are densely arranged;

[0010] A replenishment pipe is vertically inserted into the inner tank, with the bottom of the replenishment pipe located above the primary baffle.

[0011] The inner tank is equipped with a vent pipe and a vent pipe at the top, and the outer tank is equipped with a weighing device at the bottom to support the inner tank.

[0012] Furthermore, the carrier gas branch line includes a cross-shaped connecting pipe connected to the main carrier gas pipe, multiple first ring pipes arranged in a plane around the cross-shaped connecting pipe, a vertical connecting branch pipe vertically arranged on the first ring pipe, multiple second ring pipes connected to the vertical connecting branch pipe and arranged parallel to the first ring pipe, and an outlet pipe connected to the second ring pipe and arranged vertically; the main carrier gas pipe is located at the center of the cross-shaped connecting pipe.

[0013] Furthermore, the primary mixer includes a constricted liquid inlet and an air outlet pipe mounted on the surface of the primary partition plate via a fixed rib, and an outwardly expanding first diffuser pipe connected to the smaller diameter end of the liquid inlet; the air outlet pipe is located inside the liquid inlet, and a conical nozzle is provided at the front end of the air outlet pipe.

[0014] Furthermore, the fixing rib is arranged around the liquid inlet; the first diffuser, liquid inlet, air outlet and conical nozzle are coaxially arranged.

[0015] Furthermore, the secondary mixer includes a connecting pipe that passes through the secondary partition, a second diffuser pipe located at the end of the secondary partition, and a rotating fan that is installed via a support arm arranged laterally inside the connecting pipe; the rotating fan is installed in the middle of the connecting pipe, and the axis of the rotating fan is coaxial with the connecting pipe.

[0016] Furthermore, the connecting pipe, support arm, and rotating fan are made of stainless steel.

[0017] Furthermore, a first top cover is sealed on the top of the outer tank, and a second top cover is sealed on the top of the inner tank; a cavity is formed between the inner tank and the outer tank by a spacing.

[0018] Furthermore, a nitrogen protection pipe connected to the cavity is installed on the outer tank, the nitrogen protection pipe is connected to the nitrogen storage tank and is equipped with a switch valve; a trichlorosilane vapor concentration detector is sealed and installed at the bottom of the inner tank; and a sealed external temperature sensor is installed on the outer surface of the inner tank.

[0019] Furthermore, a switch valve is installed on the replenishment pipe, the carrier gas main pipe, and the gas guide pipe respectively; a one-way switch valve is installed on the vent pipe.

[0020] The present invention has the following advantages over the prior art:

[0021] (1) This technical solution is equipped with a weighing device to replenish the vaporized material in real time. This process requires automated control to maintain a stable mass in the storage space, thereby stabilizing vaporization.

[0022] (2) The primary mixer includes a narrowed liquid inlet and an exhaust pipe mounted on the surface of the primary partition via a fixed rib, and an outwardly expanding first diffuser connected to the smaller diameter end of the liquid inlet; the exhaust pipe is located inside the liquid inlet, and a conical nozzle is provided at the front end of the exhaust pipe; the liquid source is drawn in from the lower part of the liquid inlet under the jet action of the conical nozzle, and diffused by the first diffuser, so that the bubbles generated by the carrier gas are fully contacted and mixed with the liquid source in the first diffuser, and then move upward stably. The structure does not require additional energy supply and has high efficiency.

[0023] (3) The secondary mixer includes a connecting pipe that runs through the secondary partition, a second diffuser pipe located at the end of the secondary partition, and a rotating fan installed through a horizontally arranged support arm inside the connecting pipe; the rotating fan is installed in the middle of the connecting pipe, and the axis of the rotating fan is coaxial with the connecting pipe; the rotating fan cuts the fully mixed bubbles and liquid source from the bottom, eliminating the bubbles and increasing the contact, and provides upward force under the action of the second diffuser; the two-layer secondary mixer can reduce the bubbles that finally reach the liquid source surface in the inner tank to a small number of fully contacted and smaller bubbles, reducing the situation where droplets are thrown out after the bubbles break at the liquid surface, thereby outputting stable and saturated steam;

[0024] (4) A trichlorosilane vapor concentration detector is sealed and installed at the bottom of the outer tank; a sealed external temperature sensor is installed on the outer surface of the inner tank; a firewall can be set by setting up a cavity between the outer tank and the inner tank, and the trichlorosilane vapor concentration detector can detect whether there is a leak in the cavity in advance to make a leak warning and achieve protection; the temperature sensor can detect the temperature of the outer wall of the inner tank in real time, and can detect and warn in time when an abnormal temperature is encountered.

[0025] Of course, any product implementing this invention does not necessarily need to achieve all of the advantages described above at the same time. Attached Figure Description

[0026] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0027] Figure 1 This is a schematic diagram of the structure of a TCS bubbling gas supply device according to the present invention;

[0028] Figure 2 for Figure 1 A schematic diagram showing the connection between the main carrier gas pipe and the branch carrier gas pipes.

[0029] Figure 3 This is a schematic diagram of the structure of a primary mixer;

[0030] Figure 4 This is a schematic diagram of a two-stage mixer;

[0031] The attached diagram lists the components represented by each number as follows:

[0032] 1-Outer tank, 101-First top cover, 102-Nitrogen protection pipe, 2-Inner tank, 201-Second top cover, 202-Temperature sensor, 203-Secondary partition, 204-Secondary mixer, 2041-Second diffuser, 2042-Connecting pipe, 2043-Support arm, 2044-Rotating fan, 205-Gas guide pipe, 206-Vent pipe, 207-First partition, 3-Replenishment pipe, 4-Carrier gas main pipe, 5-First mixer, 51-Second ring pipe, 52-Vertical connecting branch pipe, 53-First ring pipe, 54-Cross connecting pipe, 501-First diffuser, 502-Liquid inlet, 503-Fixing rib, 504-Conical nozzle, 505-Gas outlet pipe. Detailed Implementation

[0033] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0034] In the description of this invention, it should be understood that the terms "inner", "bottom", "surface", "vertical", "bottom", "vertical", etc., which indicate orientation or positional relationship, are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the components or elements referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting this invention.

[0035] For the TCS bubbling process, after the carrier gas is introduced into the liquid source material, in order to promote evaporation and bring the vapor to near saturation, it is necessary to maximize the contact area and contact time between the carrier gas and the liquid. Furthermore, the existing structure that directly uses H2 as a carrier to vaporize TCS results in relatively insufficient contact between the carrier gas and TCS, leading to relatively poor stability. Since TCS is consumed after vaporization, it needs to be replenished in real time. This process requires automated control to maintain a stable mass in the storage space, thereby ensuring stable vaporization. Therefore, this technical solution proposes a gas supply device for TCS bubbling.

[0036] Please see Figure 1-4 As shown, a TCS bubbling gas supply device of the present invention includes an outer tank 1, an inner tank 2 sleeved inside the outer tank 1, a primary bubbling mechanism and a secondary bubbling mechanism installed inside the inner tank 2. The primary bubbling mechanism is located at the bottom of the inner tank 2, and the secondary bubbling mechanism is located above the primary bubbling mechanism. In this specific embodiment, the secondary bubbling mechanism has two layers with the same structure. Of course, using a single layer or more layers is also within the protection scope of this technical solution.

[0037] The primary bubbling mechanism includes a primary baffle 207 located near the bottom of the inner tank 2, a primary mixer 5 vertically mounted on the surface of the primary baffle 207 via a fixing rib 505, a carrier gas branch pipe located at the bottom of the primary baffle 207 and connected to the primary mixer 5, and a carrier gas main pipe 4 extending from the outer tank 1 into the inner tank 2 and connected to the carrier gas branch pipe at the bottom. The carrier gas main pipe 4 passes through the first top cover 101, the second top cover 201, the two secondary baffles 203 and the primary baffle 207 in sequence, and is connected to the center of the cross connecting pipe 54 for gas supply. The carrier gas main pipe 4 is externally connected to the carrier gas supply tank.

[0038] The secondary bubbling mechanism includes a secondary partition 203 located above the primary partition 207 and a secondary mixer 204 installed on the secondary partition 203; the secondary partition 203 is provided with at least one layer, specifically two layers in this embodiment;

[0039] Both the primary mixer 5 and the secondary mixer 204 are densely arranged, and in this specific embodiment, they are arranged in a multi-ring configuration around a set of rings.

[0040] A liquid replenishment pipe 3 is vertically inserted into the inner tank 2. The bottom of the liquid replenishment pipe 3 is located above the first-stage baffle 207. The liquid replenishment pipe 3, like the carrier gas main pipe 4, extends into the inner tank 2. The difference is that the liquid outlet of the liquid replenishment pipe 3 is located above the first-stage baffle 207, and is externally connected to a liquid source replenishment storage tank. Based on the weight change sensed in real time by the weighing device 105, the liquid replenishment action is performed by controlling the switch valve on the liquid replenishment pipe 3, so that the liquid source in the inner tank 2 always maintains a stable weight state, thereby achieving stable evaporation.

[0041] The inner tank 2 is equipped with a vent pipe 205 and a vent pipe 206 at the top, and the outer tank 1 is equipped with a weighing device 105 to support the inner tank 2 at the bottom. The vent pipe 205, the vent pipe 206, the main gas carrier pipe 4, and the liquid replenishment pipe 3 are all airtightly connected to the first top cover 101 and the second top cover 201. The side wall friction between them and the through hole is much smaller than the weight of the inner tank, so the influence of the weight sensing of the weighing device 105 is negligible.

[0042] Among them, such as Figure 2 As shown, the carrier gas branch pipeline includes a cross-shaped connecting pipe 54 connected to the main carrier gas pipe 4, multiple first ring pipes 53 arranged in a plane around the cross-shaped connecting pipe 54, a vertical connecting branch pipe 52 vertically arranged on the first ring pipe 53, multiple second ring pipes 51 connected to the vertical connecting branch pipe 52 and arranged parallel to the first ring pipe 53, and an outlet pipe 505 connected to the second ring pipe 51 and arranged vertically. The main carrier gas pipe 4 is located at the center of the cross-shaped connecting pipe 54. The carrier gas entering through the main carrier gas pipe 4 is evenly distributed in the multiple first ring pipes 53 by the cross-shaped connecting pipe 54, and evenly distributed upwards in the multiple second ring pipes 51 by the vertical connecting branch pipe 52, so that the outlet pipe 505 on the surface obtains uniform and stable gas output.

[0043] The primary mixer 5 includes a narrowed liquid inlet 502 and an outlet pipe 505 mounted on the surface of the primary partition 207 via a fixed rib 503, and an outwardly expanding first diffuser pipe 501 connected to the smaller diameter end of the liquid inlet 502. The outlet pipe 505 is located inside the liquid inlet 502, and a conical nozzle 504 is provided at the front end of the outlet pipe 505. The liquid source is drawn in from the lower part of the liquid inlet 502 under the spray action of the conical nozzle 504, and diffused by the first diffuser pipe 501, so that the bubbles generated by the carrier gas are fully contacted and mixed with the liquid source in the first diffuser pipe 501, and then move upward stably.

[0044] The fixed rib plate 503 is arranged around the liquid inlet 502; the first diffuser 501, the liquid inlet 502, the air outlet 505 and the conical nozzle 504 are coaxially arranged.

[0045] The secondary mixer 204 includes a connecting pipe 2042 that runs through the secondary partition 203, a second diffuser pipe 2041 located at the end of the secondary partition 203, and a rotating fan 2044 mounted on a support arm 2043 arranged laterally within the connecting pipe 2042. The rotating fan 2044 is installed in the middle of the connecting pipe 2042, and its axis is coaxial with the connecting pipe 2042. The rotating fan 2044 cuts the fully mixed bubbles and liquid source from the bottom, eliminating the bubbles and increasing contact, and provides upward force under the action of the second diffuser pipe 2041. The arrangement of the two-layer secondary mixer 204 reduces the number of bubbles that finally reach the liquid source surface in the inner tank 2 to a small number of fully contacted and smaller bubbles, reducing the situation where droplets are ejected after the bubbles break at the liquid surface, thereby outputting stable and saturated steam.

[0046] Among them, the connecting pipe 2042, the support arm 2043 and the rotating fan 2044 are made of stainless steel, which is corrosion resistant and avoids corrosion by liquid sources.

[0047] The outer tank 1 is sealed with a first top cover 101, and the inner tank 2 is sealed with a second top cover 201; a cavity is formed between the inner tank 2 and the outer tank 1 through a gap.

[0048] The outer tank 1 is equipped with a nitrogen protection pipe 102 that communicates with the cavity. The nitrogen protection pipe 102 is connected to the nitrogen storage tank and is equipped with a switch valve. A trichlorosilane vapor concentration detector 104 is sealed and installed at the bottom of the inner tank 1. A sealed external temperature sensor 202 is installed on the outer surface of the inner tank 2. The cavity between the outer tank 1 and the inner tank 2 can be used to set up a firewall. The trichlorosilane vapor concentration detector 104 can detect whether there is a leak in the cavity and provide early warning of leakage, thus achieving protection. The temperature sensor 202 can detect the temperature of the outer wall of the inner tank in real time and can detect and warn of abnormal temperature in a timely manner.

[0049] The liquid replenishment pipe 3, the carrier gas main pipe 4, and the gas guide pipe 205 are each equipped with a switch valve; the vent pipe 206 is equipped with a one-way switch valve to facilitate the control of the corresponding actions.

[0050] The preferred embodiments of the present invention disclosed above are merely illustrative of the invention. These preferred embodiments do not exhaustively describe all details, nor do they limit the invention to the specific implementations described. Clearly, many modifications and variations can be made based on the content of this specification. This specification selects and specifically describes these embodiments to better explain the principles and practical applications of the invention, thereby enabling those skilled in the art to better understand and utilize the invention. The invention is limited only by the claims and their full scope and equivalents.

Claims

1. A gas supply device for TCS bubbling, characterized in that, It includes an outer tank (1), an inner tank (2) fitted inside the outer tank (1), a primary bubbling mechanism and a secondary bubbling mechanism installed inside the inner tank (2); The primary bubbling mechanism includes a primary baffle (207) located near the bottom of the inner tank (2), a primary mixer (5) vertically mounted on the surface of the primary baffle (207) via a fixed rib (503), a carrier gas branch line located at the bottom of the primary baffle (207) and connected to the primary mixer (5), and a carrier gas main line (4) extending from the outer tank (1) into the inner tank (2) and connected to the carrier gas branch line at its bottom. The secondary bubbling mechanism includes a secondary partition (203) located above the primary partition (207) and a secondary mixer (204) mounted on the secondary partition (203); the secondary partition (203) is provided with at least one layer; The primary mixer (5) and the secondary mixer (204) are arranged densely; A replenishment pipe (3) is vertically inserted into the inner tank (2), and the bottom of the replenishment pipe (3) is located above the first-stage partition (207); The inner tank (2) is equipped with a vent pipe (205) and a vent pipe (206) at the top, and the outer tank (1) is equipped with a weighing device (105) to support the inner tank (2) at the bottom. The carrier gas branch pipeline includes a cross-shaped connecting pipe (54) connected to the main carrier gas pipe (4), multiple first ring pipes (53) arranged in a plane around the cross-shaped connecting pipe (54), a vertical connecting branch pipe (52) vertically arranged on the first ring pipe (53), multiple second ring pipes (51) connected to the vertical connecting branch pipe (52) and arranged parallel to the first ring pipe (53), and an outlet pipe (505) connected to the second ring pipe (51) and arranged vertically; the main carrier gas pipe (4) is located at the center of the cross-shaped connecting pipe (54); The primary mixer (5) includes a constricted liquid inlet (502) and an air outlet (505) mounted on the surface of the primary partition (207) via a fixed rib (503), and an outwardly expanding first diffuser (501) connected to the smaller diameter end of the liquid inlet (502); the air outlet (505) is located inside the liquid inlet (502), and a conical nozzle (504) is provided at the front end of the air outlet (505); The secondary mixer (204) includes a connecting pipe (2042) that passes through the secondary partition (203), a second diffuser pipe (2041) that is disposed at the end of the secondary partition (203), and a rotating fan (2044) that is installed through a support arm (2043) arranged laterally inside the connecting pipe (2042); the rotating fan (2044) is installed in the middle position of the connecting pipe (2042), and the axis of the rotating fan (2044) is coaxial with the connecting pipe (2042); The outer tank (1) is sealed with a first top cover (101) and the inner tank (2) is sealed with a second top cover (201); a cavity is formed between the inner tank (2) and the outer tank (1) by means of a gap. The fixed rib (503) is arranged around the liquid inlet (502); the first diffuser (501), the liquid inlet (502), the air outlet (505) and the conical nozzle (504) are coaxially arranged.

2. The gas supply device for TCS bubbling according to claim 1, characterized in that, The connecting pipe (2042), the support arm (2043), and the rotating fan (2044) are made of stainless steel.

3. The gas supply device for TCS bubbling according to claim 1, characterized in that, The outer tank (1) is equipped with a nitrogen protection pipe (102) that communicates with the cavity. The nitrogen protection pipe (102) is connected to the nitrogen storage tank and is equipped with a switch valve. A trichlorosilane vapor concentration detector (104) is sealed and installed at the bottom of the inner tank (1). A sealed external temperature sensor (202) is installed on the outer surface of the inner tank (2).

4. The gas supply device for TCS bubbling according to claim 1, characterized in that, A switch valve is installed on the replenishment pipe (3), the carrier gas main pipe (4) and the gas guide pipe (205); a one-way switch valve is installed on the vent pipe (206).

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