A photolithography plate-making system and plate-making process thereof

Abstract

The present application specifically discloses a photolithography platemaking system and a platemaking process thereof, which includes a movable motion stage, a projection photolithography module and an interference photolithography system; the motion stage includes two horizontal brackets, two vertical brackets, a control device and a clamping device; the inner side wall of the vertical bracket is provided with a placement plate for placing the plate body; the control device includes a transmission mechanism, an adjustment mechanism and a buffer mechanism; the transmission mechanism includes two transmission rollers, two sections of transmission ropes and a reset assembly; one end of the two sections of transmission ropes is fixedly connected to the outer wall of the corresponding transmission roller, and the other end is fixedly connected to the end of the vertical bracket, the transmission rope is in a straight state, and the rotation axis of the two transmission rollers is vertically arranged. The present application has the effect of facilitating the fixing of the plate body, and through the superposition exposure of the projection photolithography system and the interference photolithography system, the diffraction waveguide structure can be photolithographically formed in the specified area of ​​the substrate, and there is no diffraction waveguide structure outside the specified area of ​​the substrate, thereby improving the precision of optical waveguide manufacturing.

Description

Technical Field

[0001] The present application relates to the field of photolithography, and in particular to a photolithography system and a photolithography process. Background Art

[0002] At present, labels made by laser color hologram platemaking technology and mold embossing replication technology can realize plate making technology, and laser holographic anti-counterfeiting materials have been widely used due to their high anti-counterfeiting strength, low production cost and good packaging effect. The existing laser holographic anti-counterfeiting materials are further combined with the molded plates, and the laser holographic anti-counterfeiting information is transferred from the nickel plate to the material through the molding process. Usually, the material for recording the anti-counterfeiting information is a polymer thermoplastic resin. During the molding process of the molding machine, the high temperature of the molding machine roller softens the resin, and then the laser holographic information on the nickel plate fixed on the plate roller is pressed onto the polymer resin through pressure. After the resin is cooled, the laser holographic information is fixed on the resin layer, which plays a holographic anti-counterfeiting role.

[0003] In the related art, a Chinese patent with application number CN202321002716.6 proposes a high-precision positioning platemaking device, including a substrate, a plate body is movably connected to the front of the substrate, a bearing is arranged on the front of the substrate, a disc is fixedly connected to the front of the inner ring of the bearing, a connecting plate is fixedly connected to the lower surface of the disc, a locking rod is threadedly connected to the front of the connecting plate, a control rod is fixedly connected to the side of the locking rod, and a buffer layer is arranged on the back of the locking rod, and a threaded rod is threadedly connected to the upper surface of the substrate. Through the movable push plate and locking rod, it is convenient to position and fix the plate body in the platemaking, and at the same time, by arranging a scale on the surface of one end of the threaded rod, it is convenient to adjust the position of the plate body according to the length of the threaded rod, and then the plate body is more accurately positioned, which is convenient for subsequent processing of the plate body to form a master plate, and convenient for subsequent production and manufacturing. The platemaking device increases the effect of positioning the plate.

[0004] With respect to the above-mentioned related technologies, the inventors believe that the following defects exist: when restricting the plate body, it is necessary to rotate the threaded rod and the locking rod to lock the plate body, which is troublesome to operate and affects the work efficiency of photolithography. Summary of the invention

[0005] In order to improve the problem of complicated plate fixing, the present application provides a photolithography platemaking system and a platemaking process thereof.

[0006] The present application provides a photolithography system that adopts the following technical solution:

[0007] A photolithography platemaking system comprises a movable motion stage, a projection photolithography module and an interference photolithography system;

[0008] The moving platform includes two horizontal brackets, two vertical brackets moving on the horizontal brackets, a control device for realizing the automatic movement of the two vertical brackets toward the plate body, and a clamping device for clamping the plate body on the vertical brackets; the inner side wall of the vertical bracket is provided with a placement plate for placing the plate body;

[0009] The control device comprises a transmission mechanism for controlling the relative movement of the two longitudinal supports, an adjustment mechanism for braking the longitudinal supports, and a buffer mechanism for buffering the movement of the longitudinal supports;

[0010] The transmission mechanism comprises two transmission rollers rotatably arranged on the transverse bracket, two sections of transmission ropes and a reset assembly for realizing automatic reset of the two transmission rollers;

[0011] One end of the two transmission ropes is fixedly connected to the outer wall of the corresponding transmission roller, and the other end is fixedly connected to the end of the longitudinal bracket. The transmission ropes are in a stretched state, and the rotation axes of the two transmission rollers are vertically arranged.

[0012] Optionally, the reset assembly includes two torsion springs, one end of the torsion spring is fixedly connected to the transmission roller, and the other end is fixedly connected to the transverse bracket, and the torsion spring is in a deformed state when the longitudinal bracket is away from the plate body.

[0013] Optionally, the adjustment mechanism includes a brake plate that elastically rotates with the transverse bracket, a brake disc coaxially fixed with the transmission roller, and a clamping assembly for controlling whether the brake plate and the brake disc are in tight contact, and when the brake plate and the brake disc are in tight contact, the movement of the longitudinal bracket is locked.

[0014] Optionally, the clamping assembly includes a clamping rope, a winding roller for winding the clamping rope, a gear coaxially fixed with the winding roller, a first bevel gear coaxially fixed with the gear, a second bevel gear meshing with the first bevel gear, a rack slidably connected to the longitudinal bracket, a clamping block fixedly connected to the top of the rack, and a telescopic part for controlling the length of the clamping rope, the cross bracket is provided with a clamping hole for movement of the clamping block at a middle position, the upper end of the clamping block passes through the cross bracket, and the bottom end of the clamping block is fixedly connected to the rack, the first bevel gear is arranged perpendicular to the movement direction of the rack and the axial direction of the second bevel gear is the same as the movement direction of the rack, the second bevel gear is coaxially fixed with the winding roller, and the end of the clamping rope away from the winding roller is connected to the middle position of the brake plate.

[0015] Optionally, the telescopic part includes a rotating rod rotatably connected to the horizontal bracket and a limiting block elastically arranged on the longitudinal bracket, the rotating rod is provided with a rotating opening for the tightening rope to pass through, the part of the rotating rod located above the horizontal bracket is provided with a limiting groove for the movement of the limiting block, the rotating rod is provided with a rotating groove for the sliding of the limiting block at the bottom end of the limiting groove, the rotating groove is arranged in a ring shape, and the rotating rod starts to wind the tightening rope when the limiting block is in the rotating groove.

[0016] Optionally, the buffer mechanism includes a buffer block and a plurality of foldable and telescopic shielding skins, the cross bracket is provided with a buffer groove for the movement of the buffer block along its length direction, one end of the shielding skin is fixedly connected to the cross bracket, and the other end is fixedly connected to the side wall corresponding to the longitudinal bracket, the shielding skin is used to shield the buffer groove, the buffer groove is filled with a buffer medium, and the buffer block is provided with a buffer hole for the buffer medium to pass through.

[0017] Optionally, the clamping device includes two clamping blocks elastically arranged on the longitudinal bracket and a detection mechanism for detecting whether the plate body is displaced. The clamping block is arranged in an L shape and has a clamping port, which is adapted to the end of the plate body.

[0018] Optionally, the detection mechanism includes a capillary rope, a detection roller for winding the capillary rope, a tension sensor for detecting the stress condition of the capillary rope, and a connecting assembly for connecting the end of the capillary rope to the end of a plate body; the clamping block is provided with a detection hole for the capillary rope to pass through; the clamping block is fixedly connected to the detection hole with a conical cylinder; the cross-sectional radius of the end of the conical cylinder facing the plate body is the smallest; the end of the capillary rope is fixedly connected to a limit plate; the limit plate is in contact with the plate body; the longitudinal bracket is also provided with an electromagnet for locking the detection roller; the detection roller is locked after the electromagnet adsorbs the detection roller.

[0019] Optionally, the connecting component includes a film layer and a heating element arranged at the end of the limiting plate, and the heating element is arranged in the cone. The film layer softens and has fluidity after heating and is bonded to the plate body after curing.

[0020] The present application also provides a photolithography plate-making system and a plate-making process thereof, which adopt the following technical solutions:

[0021] A plate-making process of a photolithography plate-making system comprises the following steps:

[0022] S1. Fix the plate body on the moving table, and clamp the plate body with two longitudinal brackets and four clamping blocks;

[0023] S2, only the interference lithography system is turned on, and the moving stage carries the plate body to move to expose different areas of the plate body. When all the areas to be exposed have been exposed by the interference lithography system, the interference lithography system is turned off;

[0024] S3. Only the projection lithography system is turned on, and the moving stage carries the plate to move to expose different areas on the surface of the plate, until the exposure dose of the plate after projection exposure modulation meets the requirements of optical waveguide patterning.

[0025] In summary, the present application includes at least one of the following beneficial technical effects:

[0026] 1. First, the limiting block needs to be squeezed to the position of the rotating groove, and the staff controls the rotating rod to rotate, and the rotating rod starts to wind the tightening rope. This operation will only wind the tightening rope previously wound on the winding roller onto the rotating rod, and will not affect the tightening effect of the brake pad on the brake disc, and at this time the tightening rope can still rotate around the rotating mouth position; when the plate body is placed on the top of the tightening block, the tightening block continues to be squeezed, and the tightening block drives the rack to move in the vertical direction, the gear is driven to start rotating, and the first bevel gear starts to rotate with the gear. The axial direction of the first bevel gear is set vertically, so the winding roller starts to wind the tightening rope, and the tightening rope moves around the rotating mouth on the rotating rod at this time, and the tightening rope starts to rotate around the rotating mouth, moving the brake pad in the direction away from the brake disc; under the action of the torsion spring and the transmission rope, the two longitudinal brackets start to move on the horizontal bracket and move toward the plate body until the plate body is clamped, and the bottom surface of the plate body is placed on the placement plate, completing the positioning of the plate body;

[0027] 2. After the longitudinal bracket positions the plate body, in order to prevent the longitudinal bracket from moving, the limiting block is also controlled to move to the position of the rotating groove, and the rotating rod is rotated. The tightening rope wound on the rotating rod is released. At this time, the brake pad just locks the brake disc under the elastic force of the spring, and then the longitudinal bracket is also locked;

[0028] 3. Under the elastic force of the third spring, during the movement of the clamping block toward the plate body, the capillary rope is continuously released from the detection roller and also moves toward the plate body. When the limit plate abuts against the plate body, the film layer softens and becomes fluid after heating and adheres to the plate body after solidification. At this time, the electromagnet starts to energize and locks the detection roller. At this time, the capillary rope is in a straightened state, and the values ​​of multiple tension sensors are also recorded. It is necessary to observe whether the tension applied to the tension sensor changes in the future, which indicates whether the plate body is displaced during this process. When the plate making work is completed, the cone can be heated by the heating element. At this time, the limit plate will also be heated, and the film layer will be heated and softened, so that the clamping block, the fiber disk and the plate body can be separated. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1It is a schematic diagram of the overall structure of an embodiment of the present application;

[0030] Figure 2 It is a partial structural schematic diagram of an embodiment of the present application;

[0031] Figure 3 yes Figure 2 The enlarged view of point A in the middle;

[0032] Figure 4 Schematic diagram of a tightening block, a limiting block and a tightening rope in an embodiment of the present application;

[0033] Figure 5 is a schematic diagram of a cross bracket and a buffer block in an embodiment of the present application;

[0034] Figure 6 is a cross-sectional view of a clamping device in an embodiment of the present application;

[0035] Figure 7 yes Figure 2 Enlarged view of point C in the middle.

[0036] 1. The camshaft is provided with a plurality of teeth, and a plurality of teeth are provided with a plurality of teeth. The plurality of teeth are provided with a plurality of teeth. The plurality of teeth are provided with a plurality of teeth. The plurality of teeth are provided with a plurality of teeth. DETAILED DESCRIPTION

[0037] The following is combined with Figure 1-7 This application is described in further detail.

[0038] Embodiment 1

[0039] The present application embodiment discloses a photolithography system. Figure 1-Figure 2A lithography platemaking system includes a movable moving stage 1, a projection lithography module and an interference lithography system; the moving stage 1 is used to carry a plate body and drive the plate body to move; the projection lithography system includes a first projection objective lens, which is used to expose a substrate to form a patterned exposure field on the substrate; the interference lithography system includes a second projection objective lens and a third projection objective lens, and the second projection objective lens and the third projection objective lens are used to expose the same area of ​​the substrate to form an interference exposure field on the substrate; and a controller, the controller is electrically connected to the projection lithography system, the interference lithography system and the moving stage 1, the projection lithography and the interference lithography systems adopt the principles of the existing technology, and this embodiment will not be repeated.

[0040] The moving platform 1 includes two horizontal supports 2, two vertical supports 3 moving on the horizontal supports 2, a control device for realizing automatic movement of the two vertical supports 3 toward the version body, and a clamping device for clamping the version body on the vertical supports 3; the inner wall of the vertical supports 3 is provided with a placement plate 4 for placing the version body; the control device includes a transmission mechanism for controlling the relative movement of the two vertical supports 3, an adjustment mechanism for braking the vertical supports 3, and a buffer mechanism for buffering the movement of the vertical supports 3; the distance between the two horizontal supports 2 is quantitative in this embodiment, and can also be set to a variable in other embodiments, which can ensure that different specifications of versions can be loaded, so the two ends of the version body in this embodiment are respectively located on the two horizontal supports 2, and the distance between the two vertical supports 3 can be adjusted; in addition, the bottom surface of the placement plate 4 and the bottom surface of the vertical support 3 are located in the same horizontal plane, but the height of the top surface of the placement plate 4 is lower than the height of the top surface of the vertical support 3, and the length of the placement plate 4 is smaller than the length of the version body, which can ensure that the placement plate 4 supports the version body.

[0041] Reference Figure 1-Figure 3The transmission mechanism is used to realize the movement of the two longitudinal brackets 3 toward the plate body, and the adjustment mechanism starts to work under two working conditions respectively. When the longitudinal bracket 3 needs to move, the adjustment mechanism needs to contact the brake of the longitudinal bracket 3. When the longitudinal bracket 3 moves to support the plate body, the adjustment mechanism needs to brake the longitudinal bracket 3. When the plate body is removed, the adjustment mechanism also needs to release the lock of the longitudinal bracket 3. The buffer mechanism is used to buffer the impact force of the longitudinal bracket 3 on the plate body, and the clamping device does not need to adopt a buffer mechanism because the clamping device moves a small distance and the impact force itself is very small, so there is no need to worry about the plate body being overloaded. Large impact force; the transmission mechanism includes two transmission rollers 5 rotatably arranged on the horizontal bracket 2, two sections of transmission ropes 6 and a reset component for realizing automatic reset of the transmission roller 5; the transmission roller 5 is arranged below the horizontal bracket 2, and the rotation axes of the two transmission rollers 5 are vertically arranged. One end of the two sections of transmission rope 6 is fixedly connected to the outer wall of the corresponding transmission roller 5, and bolts or glue can be used for bonding, and the other end is fixedly connected to the end of the longitudinal bracket 3. In this embodiment, it is necessary to ensure that the transmission rope 6 is in a straight state. Therefore, a partial guide roller can be selected to guide the transmission rope 6 and keep it in a straight state.

[0042] Reference Figure 1-Figure 4 The reset assembly includes two torsion springs 7, one end of the torsion spring 7 is fixedly connected to the transmission roller 5, and the other end is fixedly connected to the horizontal bracket 2. When the longitudinal bracket 3 is away from the plate body, the torsion spring 7 is in a deformed state. In the initial state, the two longitudinal brackets 3 need to be pulled in a direction away from each other. At this time, the transmission rope 6 on the transmission roller 5 is continuously released, and the torsion spring 7 is in a deformed state. At this time, an adjustment mechanism is required to brake the transmission roller 5; the adjustment mechanism includes a brake plate 8 that rotates elastically with the horizontal bracket 2, a brake disc 9 coaxially fixed to the transmission roller 5, and a brake plate 8 for controlling the brake plate 8 and the brake disc 9 is a tightening component that determines whether the brake pad 8 is pressed tightly against the brake disc 9. When the brake pad 8 is pressed tightly against the brake disc 9, the movement of the longitudinal bracket 3 is locked. In this embodiment, the brake pad 8 is arranged in an arc shape and is adapted to the peripheral wall of the brake disc 9. One end of the brake pad 8 is rotatably connected to the cross bracket 2 and the rotation axis is vertically arranged. The side of the brake pad 8 away from the brake disc 9 is fixed to the cross bracket 2 by a spring. Even when the brake pad stops the brake disc 9, the spring is still in a compressed state, which is beneficial to ensure the braking effect on the transmission roller 5. The brake disc 9 is close to the bottom of the cross bracket 2, which is convenient for the brake pad and the brake disc 9 to cooperate with each other.

[0043] The clamping assembly includes a clamping rope 10, a winding roller 11 for winding the clamping rope 10, a gear 12 coaxially fixed with the winding roller 11, a first bevel gear 13 coaxially fixed with the gear 12, a second bevel gear 15 meshingly connected with the first bevel gear 13, a rack 14 slidably connected with the longitudinal bracket 3, a clamping block 16 fixedly connected to the top of the rack 14, and a telescopic portion for controlling the length of the clamping rope 10. The winding roller 11 is rotatably arranged on the transverse bracket 2, and the transverse bracket 2 is provided with a clamping hole 17 for the movement of the clamping block 16 in the middle position. In this embodiment, the default position of the clamping hole 17 is the position commonly used for placing the plate body, and the side wall of the clamping block is fixedly connected with a movable The movable block and the clamping hole 17 are provided with a movable groove for the movement of the movable block, and the two ends of the movable groove along the vertical direction are closed, thereby preventing the clamping block 16 from slipping out of the clamping hole 17, and the bottom end of the clamping block 16 is fixedly connected to the top end of the rack 14, the first bevel gear 13 is perpendicular to the movement direction of the rack 14 and the axial direction of the second bevel gear 15 is the same as the movement direction of the rack 14, the second bevel gear 15 is coaxially fixed with the winding roller 11, and the end of the clamping rope 10 away from the winding roller 11 is connected to the middle position of the brake pad 8. In this embodiment, a plurality of guide rollers are also installed on the bottom surface of the cross bracket 2, and the guide rollers are used to ensure that the clamping rope 10 can smoothly pull the brake pad to move.

[0044] Reference Figure 1-Figure 4 The telescopic portion includes a rotating rod 18 rotatably connected to the cross bracket 2 and a limiting block 19 elastically arranged on the cross bracket 2. The bottom end of the rotating rod 18 is provided with a rotating port for the tightening rope 10 to pass through. The opening size of the rotating port 20 is adapted to the size of the tightening rope 10. The portion of the rotating stem located above the cross bracket 2 is provided with a limiting groove 21 for the movement of the limiting block 19. The cross bracket 2 is provided with a vertical groove for the movement of the limiting block 19. The vertical groove is arranged on the wall surface where the rotating rod 18 contacts the cross bracket 2. The bottom end of the vertical groove is also connected to the limiting block 19 through a second spring. When the second spring is in a state of natural deformation, the limiting block 19 is located in the limiting groove 21, and the other part of the limiting block 19 is located in the vertical groove. At this time, the rotation of the rotating rod 18 is restricted, and the rotating groove 22 is set to be annular. When the limiting block 19 is squeezed into the rotating groove 22, the limiting groove 21 is not restricted at this time, and the lock of the rotating rod 18 is contacted, and the rotating rod 18 can start to rotate and wind the tightening rope 10.

[0045] First, it is necessary to squeeze the limiting block 19 to the position of the rotating groove 22, and the staff controls the rotating rod 18 to rotate, and the rotating rod 18 begins to wind the tensioning rope 10. This operation will only wind the tensioning rope 10 previously wound on the winding roller 11 onto the rotating rod 18, and will not affect the tensioning effect of the brake pad on the brake disc 9, and at this time the tensioning rope 10 can still be rotated around the rotating mouth 20 position; when the plate body is placed on the top of the tensioning block 16, the tensioning block 16 is continued to be squeezed at this time, and the tensioning block 16 drives the rack 14 to move in the vertical direction, the gear 12 is driven to start rotating, and the first bevel gear 13 starts to rotate following the gear 12. The axial direction of the first bevel gear 13 is set vertically, so the winding roller 11 starts to wind the tensioning rope 10, and this At the same time, the tensioning rope 10 moves around the rotating opening 20 on the rotating rod 18, and the tensioning rope 10 begins to rotate around the rotating opening 20, moving the brake pad in the direction away from the brake disc 9. Under the action of the torsion spring 7 and the transmission rope 6, the two longitudinal brackets 3 both begin to move on the transverse bracket 2 and both move toward the plate body until the plate body is clamped and the bottom surface of the plate body is placed on the placement plate 4, completing the positioning of the plate body; when the longitudinal bracket 3 positions the plate body, in order to prevent the longitudinal bracket 3 from moving, the limiting block 19 is also controlled to move to the position of the rotating groove 22, and after the rotating rod 18 is rotated, the tensioning rope 10 wound on the rotating rod 18 is released. At this time, the brake pad just locks the brake disc 9 under the elastic force of the spring, and then the longitudinal bracket 3 is also locked.

[0046] Reference Figure 1-Figure 5 The buffer mechanism includes a buffer block 36 and a plurality of foldable and telescopic shielding skins 24. The horizontal bracket 2 is provided with a buffer groove (not shown in the figure) for the movement of the buffer block along its length direction. One end of the shielding skin 24 is fixedly connected to the horizontal bracket 2, and the other end is fixedly connected to the side wall of the corresponding longitudinal bracket 3. The shielding skin 24 is used to shield the buffer groove, and the buffer groove is filled with a buffer medium. The buffer block 36 is provided with a buffer hole 37 for the buffer medium to pass through. During the movement of the longitudinal bracket 3, due to the large elastic force of the torsion spring 7 on the winding roller 11, the impact force of the longitudinal bracket 3 toward the plate body is large. During the movement of the longitudinal bracket 3, the buffer medium continuously passes through the buffer hole 37 and flows in the opposite direction of the movement of the buffer block 36, thereby slowing down the movement speed of the buffer block 36. In this process, the sunshade skin completely blocks the buffer groove, and the buffer medium in the buffer groove will not splash out of the buffer groove. In this embodiment, the buffer medium can be selected from buffer oil or water.

[0047] Reference Figure 6-Figure 7The clamping device includes two clamping blocks 25 elastically arranged on the longitudinal bracket 3 and a detection mechanism for detecting whether the plate body is displaced. The clamping block 25 is arranged in a concave shape, and the clamping block 25 is provided with a clamping port 26, and the clamping port 26 is adapted to the end of the plate body. In this embodiment, four clamping blocks 25 are arranged, and the four clamping blocks 25 correspond to the four corners of the plate body respectively. The clamping block 25 is fixedly connected with an elastic block, and an elastic groove for the movement of the elastic block is provided on the longitudinal bracket 3. Similarly, a T-shaped matching arrangement is adopted between the elastic block and the elastic groove, and between the buffer block 36 and the buffer groove to ensure that the elastic block will not slide out of the elastic groove or the buffer block 36 will slide out of the buffer groove. A third spring 23 is also fixedly connected between one end of the elastic block and the inner wall of the corresponding end of the elastic groove to achieve the elastic effect of the clamping block 25 and the longitudinal bracket 3.

[0048] The detection mechanism includes a capillary rope 27, a detection roller 28 for winding the capillary rope 27, a tension sensor 29 for detecting the stress condition of the capillary rope 27, and a connecting assembly for connecting the end of the capillary rope 27 to the end of the plate body. The clamping block 25 is provided with a detection hole 30 for the capillary rope 27 to pass through. The clamping block 25 is fixedly connected with a cone 31 at the detection hole 30. The cross-sectional radius of the end of the cone 31 facing the plate body is the smallest. The end of the capillary rope 27 is fixedly connected with a limit plate 32, and the limit plate 32 is in contact with the plate body. The longitudinal bracket 3 is also provided with an electromagnet 35 for locking the detection roller 28. After the electromagnet 35 adsorbs the detection roller 28, the detection roller 28 is locked. The detection hole 30 is arranged on the bottom surface of the clamping block 25. The cross-sectional radius of the cone 31 gradually decreases along the direction toward the plate body, and the minimum cross-sectional radius of the cone 31 is adapted to the size of the capillary rope 27. The size of the limit plate 32 is larger than the size of the smallest cross-sectional circle of the cone 31. Therefore, under the elastic force of the third spring 23, when the clamping block 25 moves toward the plate body, the capillary rope 27 is continuously released from the detection roller 28 and also moves toward the plate body. When the limit plate 32 abuts against the plate body, the electromagnet 35 starts to be energized and locks the detection roller 28. In this embodiment, when the clamping block 25 clamps the plate body, an electromagnet can also be set on the clamping block. The electromagnet is adsorbed on the longitudinal bracket 3, and the position of the clamping block 25 will not change. If the clamping block 25 can ensure that the plate body will not shake easily, there is no need to use an electromagnet. At this time, the capillary rope 27 is in a straightened state, and the values ​​of multiple tension sensors 29 are also recorded. It is necessary to observe whether the tension applied to the tension sensor 29 changes later, which indicates whether the plate body is displaced during this process.

[0049] Reference Figure 6-Figure 7The connecting component includes a film layer 33 and a heating element 34 arranged at the end of the limiting plate 32. The heating element 34 is arranged in the cone 31. The film layer 33 softens and has fluidity after heating and is bonded to the plate body after curing. In this embodiment, the film layer 33 is made of hot melt adhesive. The hot melt adhesive is a thermoplastic product. It can be softened and restored to its viscosity by heating, so as to achieve multiple bonding. This feature makes the hot melt adhesive have significant advantages in occasions that require multiple curing and bonding. Of course, the hot melt adhesive cannot be used unlimitedly. After a certain number of uses, the hot melt adhesive still needs to be replaced. The limiting plate 32 is The three springs 23 are tightly fitted with the side wall of the plate body under the elastic force. In this process, the staff may make a mistake, resulting in the clamping block 25 not being completely fitted with the plate body, or because of other factors during the plate making process, the position of the clamping block 25 changes. The above factors will cause the plate body to shift. If the plate body shifts, the values ​​of the four tension sensors 29 may change, two of which become larger and the other two become smaller. At this time, it means that the plate body has shifted, and the fixed clamping of the plate body needs to be readjusted before the photolithography plate making work can be continued. When the plate making work is completed, the cone 31 can be heated by the heating element 34, and the limit plate 32 will also be heated. In this embodiment, the cone 31 can be heated by reduced iron powder and air or electric heating wire. As long as the film layer 33 can be heated and softened, the clamping block 25 and the fiber disk can be separated from the plate body.

[0050] The implementation principle of a photolithography platemaking system in an embodiment of the present application is as follows: first, the limiting block 19 needs to be squeezed to the position of the rotating groove 22, and the staff controls the rotating rod 18 to rotate, and the rotating rod 18 starts to wind the tensioning rope 10. This operation will only wind the tensioning rope 10 previously wound on the winding roller 11 onto the rotating rod 18, and will not affect the tensioning effect of the brake pad on the brake disc 9, and at this time the tensioning rope 10 can still be rotated around the rotating mouth 20 position; when the plate body is placed on the top of the tensioning block 16, the tensioning block 16 is continued to be squeezed at this time, and the tensioning block 16 drives the rack 14 to move in the vertical direction, the gear 12 is driven to start rotating, and the first bevel gear 13 starts to rotate following the gear 12, and the axial direction of the first bevel gear 13 is set vertically, so the winding roller 11 starts to tension The tension rope 10 is wound, and at this time, the tension rope 10 moves around the rotating mouth 20 on the rotating rod 18, and the tension rope 10 begins to rotate around the rotating mouth 20, moving the brake pad in the direction away from the brake disc 9; under the action of the torsion spring 7 and the transmission rope 6, the two longitudinal brackets 3 both begin to move on the transverse bracket 2 and both move toward the plate body until the plate body is clamped and the bottom surface of the plate body is placed on the placement plate 4, completing the positioning of the plate body; when the longitudinal bracket 3 positions the plate body, in order to prevent the longitudinal bracket 3 from moving, the limiting block 19 is also controlled to move to the position of the rotating groove 22, and after the rotating rod 18 is rotated, the tension rope 10 wound on the rotating rod 18 is released, and at this time, the brake pad just locks the brake disc 9 under the elastic force of the spring, and then the longitudinal bracket 3 is also locked.

[0051] Under the elastic force of the third spring 23, when the clamping block 25 moves toward the plate body, the capillary rope 27 is continuously released from the detection roller 28 and also moves toward the plate body. When the limit plate 32 abuts against the plate body, the film layer 33 softens and becomes fluid after heating and adheres to the plate body after solidification. At this time, the electromagnet 35 starts to be energized and locks the detection roller 28. At this time, the capillary rope 27 is in a straightened state, and the values ​​of multiple tension sensors 29 are also recorded. It is necessary to observe whether the tension applied to the tension sensor 29 changes later, which indicates whether the plate body is displaced during this process. When the plate making work is completed, the cone 31 can be heated by the heating element 34. At this time, the limit plate 32 will also be heated, and the film layer 33 will be heated and softened, so that the clamping block 25 can be separated from the fiber disk and the plate body.

[0052] Embodiment 2

[0053] The present application embodiment discloses a plate-making process of a photolithography plate-making system. Figure 1 A plate-making process of a photolithography plate-making system comprises the following steps:

[0054] S1, fix the plate body on the moving platform 1, and clamp and fix the plate body through two longitudinal brackets 3 and four clamping blocks 25; the tension rope 10 starts to rotate around the rotating mouth 20, and moves the brake pad in the direction away from the brake disc 9; under the action of the torsion spring 7 and the transmission rope 6, the two longitudinal brackets 3 both start to move on the transverse bracket 2 and move toward the plate body until the plate body is clamped and the bottom surface of the plate body is placed on the placement plate 4; under the elastic force of the third spring 23, when the clamping block 25 moves toward the plate body, the clamping mouth 26 is adapted to the angle of the plate body, and the fixing effect of the plate body is achieved through the longitudinal bracket 3 and the clamping block 25;

[0055] S2, only the interference lithography system is turned on, and the moving stage 1 carries the plate body to move to expose different areas of the plate body. When all the areas to be exposed have been exposed by the interference lithography system, the interference lithography system is turned off;

[0056] S3, only the projection lithography system is turned on, and the moving stage 1 carries the plate to move to expose different areas on the plate surface until the exposure dose of the plate after projection exposure modulation meets the requirements of optical waveguide patterning.

[0057] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A photolithography system, characterized in that: It comprises a movable motion stage (1), a projection lithography module and an interference lithography system; The moving platform (1) comprises two transverse supports (2), two longitudinal supports (3) moving on the transverse supports (2), a control device for realizing the automatic movement of the two longitudinal supports (3) toward the plate body, and a clamping device for clamping the plate body on the longitudinal supports (3); the inner side wall of the longitudinal support (3) is provided with a placement plate (4) for placing the plate body; The control device comprises a transmission mechanism for controlling the relative movement of the two longitudinal supports (3), an adjustment mechanism for braking the longitudinal supports (3), and a buffer mechanism for buffering the movement of the longitudinal supports (3); The transmission mechanism comprises two transmission rollers (5) rotatably arranged on the transverse bracket (2), two sections of transmission rope (6) and a reset component for realizing automatic reset of the two transmission rollers (5); One end of the two transmission ropes (6) is fixedly connected to the outer wall of the corresponding transmission roller (5), and the other end is fixedly connected to the end of the longitudinal bracket (3); the transmission rope (6) is in a stretched state, and the rotation axes of the two transmission rollers (5) are vertically arranged; The adjustment mechanism comprises a brake pad (8) that rotates elastically with the transverse bracket (2), a brake disc (9) that is coaxially fixed with the transmission roller (5), and a pressing assembly for controlling whether the brake pad (8) and the brake disc (9) are pressed tightly against each other, and when the brake pad (8) and the brake disc (9) are pressed tightly against each other, the movement of the longitudinal bracket (3) is locked; The clamping assembly comprises a clamping rope (10), a winding roller (11) for winding the clamping rope (10), a gear (12) coaxially fixed to the winding roller (11), a first bevel gear (13) coaxially fixed to the gear (12), a second bevel gear (15) meshingly connected to the first bevel gear (13), a rack (14) slidably connected to the longitudinal support (3), a clamping block (16) fixedly connected to the top of the rack (14), and a telescopic portion for controlling the length of the clamping rope (10), wherein the transverse support (2) is provided with a useful A tightening hole (17) for movement of the tightening block (16), the upper end of the tightening block (16) passes through the cross bracket (2), the bottom end of the tightening block (16) is fixedly connected to the rack (14), the first bevel gear (13) is arranged perpendicular to the movement direction of the rack (14) and the axial direction of the second bevel gear (15) is the same as the movement direction of the rack (14), the second bevel gear (15) is coaxially fixed to the winding roller (11), and the end of the tightening rope (10) away from the winding roller (11) is connected to the middle position of the brake plate (8); The buffer mechanism comprises a buffer block (36) and a plurality of foldable and telescopic shielding skins (24); the transverse support (2) is provided with a buffer groove for movement of the buffer block (36) along its length direction; one end of the shielding skin (24) is fixedly connected to the transverse support (2) and the other end is fixedly connected to the side wall corresponding to the longitudinal support (3); the shielding skin (24) is used to shield the buffer groove; the buffer groove is filled with a buffer medium; the buffer block (36) is provided with a buffer hole (37) for the buffer medium to pass through; The clamping device comprises two clamping blocks (25) elastically arranged on the longitudinal bracket (3) and a detection mechanism for detecting whether the plate body is displaced, the clamping block (25) being arranged in an L shape, the clamping block (25) being provided with a clamping opening (26), and the clamping opening (26) being adapted to the end of the plate body; The detection mechanism comprises a capillary string (27), a detection roller (28) for winding the capillary string (27), a tension sensor (29) for detecting the stress condition of the capillary string (27), and a connection assembly for connecting the end of the capillary string (27) to the end of the plate body; the clamping block (25) is provided with a detection hole (30) for the capillary string (27) to pass through; the clamping block (25) is fixedly connected to a cone (31) at the detection hole (30); the cone (31) has a smallest cross-sectional radius at one end facing the plate body; the end of the capillary string (27) is fixedly connected to a limit plate (32); the limit plate (32) is in contact with the plate body; the longitudinal bracket (3) is also provided with an electromagnet (35) for locking the detection roller (28); the detection roller (28) is locked after the electromagnet (35) adsorbs the detection roller (28).

2. A photolithography system according to claim 1, characterized in that: The reset assembly comprises two torsion springs (7), one end of the torsion spring (7) is fixedly connected to the transmission roller (5), and the other end is fixedly connected to the transverse bracket (2), and the torsion spring (7) is in a deformed state when the longitudinal bracket (3) is away from the plate body.

3. A photolithography system according to claim 2, characterized in that: The telescopic portion comprises a rotating rod (18) rotatably connected to the transverse bracket (2) and a limiting block (19) elastically arranged on the longitudinal bracket (3); the rotating rod (18) is provided with a rotating opening (20) for the tightening rope (10) to pass through; the portion of the rotating rod (18) located above the transverse bracket (2) is provided with a limiting groove (21) for the movement of the limiting block (19); the rotating rod (18) is provided with a rotating groove (22) for the sliding of the limiting block (19) at the bottom end of the limiting groove (21); the rotating groove (22) is arranged in an annular shape; when the limiting block (19) is in the rotating groove (22), the rotating rod (18) starts to wind the tightening rope (10).

4. A photolithography system according to claim 3, characterized in that: The connecting assembly comprises a film layer (33) arranged at the end of the limiting plate (32) and a heating element (34), wherein the heating element (34) is arranged in the cone (31), and the film layer (33) softens and has fluidity after being heated and is bonded to the plate body after being cured.

5. A platemaking process of a photolithography platemaking system, based on the photolithography platemaking system according to any one of claims 1 to 4, characterized in that: The steps include: S1, fix the plate body on the moving table (1), and clamp the plate body with two longitudinal brackets (3) and four clamping blocks (25); S2, only the interference lithography system is turned on, and the moving table (1) carries the plate body to move to expose different areas of the plate body. When all the areas to be exposed have been exposed by the interference lithography system, the interference lithography system is turned off; S3, only the projection lithography system is turned on, and the moving table (1) carries the plate to move to expose different areas on the surface of the plate, until the exposure dose of the plate after projection exposure modulation meets the requirements of optical waveguide patterning.

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