A focused beam automatic adjustment system, method and ion implanter

Abstract

The present application relates to the technical field of ion implantation, and specifically provides a focused beam automatic adjustment system, method and ion implanter. The system comprises: a quadrupole magnetic lens group, facing the output end of an ion source mechanism, comprising at least one X magnetic lens and at least one Y magnetic lens; a lens position adjustment component, used for adjusting the position of the X magnetic lens and / or the Y magnetic lens; a Faraday cup, arranged on a side of the quadrupole magnetic lens group away from the ion source mechanism, used for collecting actual beam size information; a controller, electrically connected to the lens position adjustment component and the Faraday cup, used for analyzing whether a current beam is a target beam according to the actual beam size information, and also used for controlling the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam is not the target beam, so as to maximize the actual beam size information or make the current beam reach the target beam; the system can effectively improve the focusing effect of a beam focusing system.

Description

Technical Field

[0001] The present application relates to the technical field of ion implantation, and in particular to a focused beam automatic adjustment system, method and ion implantation machine. Background Art

[0002] In the field of semiconductor device and integrated circuit production technology, the number, depth and distribution of doping elements are precisely controlled by using an ion implanter. The existing ion implanter includes an ion source system, a beam focusing system, a beam line system and a target chamber system arranged from left to right. The beam focusing system is used to focus the beam generated by the ion source system. The beam focusing system includes a dual quadrupole magnetic lens (an X magnetic lens and a Y magnetic lens). The installation process of the beam focusing system is: based on theoretical calculations, the installation position of the dual quadrupole magnetic lens is obtained; the dual quadrupole magnetic lens is fixedly installed according to the obtained installation position. The dual quadrupole magnetic lens will wear out after long-term use, and the focusing effect of the beam focusing system will decrease. Therefore, the prior art has the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens because the dual quadrupole magnetic lens is fixedly installed.

[0003] There is currently no effective technical solution to the above problems. Summary of the invention

[0004] The purpose of the present application is to provide a focused beam automatic adjustment system, method and ion implanter, which can effectively solve the problem that the installation position of the binary quadrupole magnetic lens obtained based on theoretical calculation is not the optimal installation position when the binary quadrupole magnetic lens is actually installed due to the limited actual installation accuracy of the binary quadrupole magnetic lens, and the deviation of parameters such as the vacuum degree of the environment where the binary quadrupole magnetic lens is located from the ideal state, and the optimal installation position of the binary quadrupole magnetic lens changes before and after wear, thereby effectively improving the focusing effect of the beam focusing system.

[0005] In a first aspect, the present application provides a focused beam automatic adjustment system, which is applied in an ion implanter, wherein the ion implanter includes an ion source mechanism, the ion source mechanism is used to generate a beam, and the focused beam automatic adjustment system includes:

[0006] A quadrupole magnetic lens group, facing the output end of the ion source mechanism, includes at least one X magnetic lens and at least one Y magnetic lens;

[0007] A lens position adjustment component, used for adjusting the position of the X magnetic lens and / or the Y magnetic lens;

[0008] A Faraday cup is arranged on the side of the quadrupole magnetic lens group away from the ion source mechanism and is used to collect information on the actual beam size;

[0009] The controller is electrically connected to the lens position adjustment component and the Faraday cup, and is used to analyze whether the current beam is the target beam according to the actual beam size information, and is also used to control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam is not the target beam, so as to maximize the actual beam size information or make the current beam reach the target beam.

[0010] The present application provides a focusing beam automatic adjustment system, including a quadrupole magnetic lens group, a lens position adjustment component, a Faraday cup and a controller. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0011] Optionally, the quadrupole magnetic lens group includes an X magnetic lens and a Y magnetic lens, and the controller controls the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. The process includes:

[0012] A1. Control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the preset position adjustment value, and record the position information of the X magnetic lens, the position information of the Y magnetic lens and the actual beam current size information after the position adjustment, until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach the first preset number threshold or the current beam current reaches the target beam current;

[0013] A2. When the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach a first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

[0014] Optionally, the distance between the X magnetic lens and the ion source mechanism is smaller than the distance between the Y magnetic lens and the ion source mechanism, and step A1 includes:

[0015] A11, controlling the lens position adjustment component to adjust the position of the X magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0016] A12, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A13, the preset target beam current size is the target beam current size;

[0017] A13, controlling the lens position adjustment component to adjust the position of the Y magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0018] A14, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A15;

[0019] A15, analyzing whether the cumulative adjustment times of the Y magnetic lens reaches a first preset number threshold, if yes, executing step A16, if no, returning to step A13;

[0020] A16. Analyze whether the cumulative adjustment times of the X magnetic lens reaches the first preset number threshold. If so, execute step A2. If not, control the lens position adjustment component to adjust the position of the Y magnetic lens to the initial position and clear the cumulative adjustment times of the Y magnetic lens, and return to step A11.

[0021] Because before executing step A13 and step A15, the technical solution first analyzes whether the actual beam current size information is greater than or equal to the preset target beam current size, and ends the adjustment when the actual beam current size information is greater than or equal to the preset target beam current size, that is, the technical solution is equivalent to stopping further adjusting the position of the X magnetic lens and / or the Y magnetic lens after adjusting the current beam current to the target beam current, so the technical solution can effectively avoid the situation where the position of the X magnetic lens and / or the Y magnetic lens is still being adjusted even if the current beam current has been adjusted to the target beam current under the current X magnetic lens position information.

[0022] Optionally, the quadrupole magnetic lens group includes a first quadrupole magnetic lens, a second quadrupole magnetic lens, and a third quadrupole magnetic lens arranged in sequence, when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both X magnetic lenses, the second quadrupole magnetic lens is a Y magnetic lens, or when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both Y magnetic lenses, the second quadrupole magnetic lens is an X magnetic lens, and the controller controls the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. The process includes:

[0023] A1', controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value, and recording the position information of the second quadrupole magnetic lens after the position adjustment and the actual beam current size information, until the cumulative adjustment times of the second quadrupole magnetic lens reaches the first preset number threshold or the current beam current reaches the target beam current;

[0024] A2', when the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

[0025] Optionally, the focusing beam automatic adjustment system further comprises a current adjustment component for adjusting the current of the second quadrupole magnetic lens, and step A1' comprises:

[0026] A11', controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value and controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information after each adjustment, until the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches a first preset number threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens reaches a second preset number threshold or the current beam current reaches the target beam current;

[0027] Step A2' comprises:

[0028] A21. When the cumulative number of adjustments of the position of the second quadrupole magnetic lens reaches a first preset number threshold, the cumulative number of adjustments of the current of the second quadrupole magnetic lens reaches a second preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the time when the actual beam current size information is maximum, and the current adjustment component is controlled to adjust the current of the second quadrupole magnetic lens according to the second quadrupole magnetic lens current information corresponding to the time when the actual beam current size information is maximum, so as to maximize the actual beam current size information.

[0029] Optionally, step A11' includes:

[0030] A111, controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time;

[0031] A112, analyze the actual beam size information is greater than or equal to the preset target beam size, if so, then end the adjustment, if not, proceed to step A113;

[0032] A113, controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens according to the preset current adjustment value, and recording the position information of the second quadrupole magnetic lens, the current information of the second quadrupole magnetic lens and the actual beam size information at this time;

[0033] A114, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A115;

[0034] A115, analyzing whether the cumulative number of adjustments of the current of the second quadrupole magnetic lens reaches a second preset number threshold, if so, executing step A116, if not, returning to step A112;

[0035] A116, analyzing whether the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches the first preset threshold value, if so, executing step A2', if not, controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens to the initial current and clear the cumulative adjustment times of the current of the second quadrupole magnetic lens, and returning to step A111.

[0036] Because before executing step A113 and step A115, the technical solution first analyzes whether the actual beam size information is greater than or equal to the preset target beam size, and ends the adjustment when the actual beam size information is greater than or equal to the preset target beam size, that is, the technical solution is equivalent to stopping further adjusting the position and current of the second quadrupole magnetic lens after adjusting the current beam current to the target beam current. Therefore, the technical solution can effectively avoid the situation where the current and position of the second quadrupole magnetic lens are still being adjusted even though the current beam current has been adjusted to the target beam current under the current second quadrupole magnetic lens position information.

[0037] Optionally, the X magnetic lens and the Y magnetic lens each include two south poles and two north poles, the two north poles of the X magnetic lens are respectively located in the first quadrant and the third quadrant of the X magnetic lens, the two south poles of the X magnetic lens are respectively located in the second quadrant and the fourth quadrant of the X magnetic lens, the two north poles of the Y magnetic lens are respectively located in the second quadrant and the fourth quadrant of the Y magnetic lens, and the two south poles of the Y magnetic lens are respectively located in the first quadrant and the third quadrant of the Y magnetic lens.

[0038] Optionally, the ion implanter further comprises an analysis magnet, which is arranged between the ion source mechanism and the automatic focusing beam adjustment system or between the automatic focusing beam adjustment system and the beam line mechanism.

[0039] In a second aspect, the present application further provides a focused beam automatic adjustment method, which is applied to a focused beam automatic adjustment system provided in the first aspect above, and the focused beam automatic adjustment method comprises the following steps:

[0040] S1. Analyze whether the current beam is the target beam according to the actual beam size information;

[0041] S2. When the current beam is not the target beam, the lens position adjustment component is controlled to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum.

[0042] The present application provides a method for automatically adjusting a focused beam, which is applied in an automatic focused beam adjustment system, the system comprising a quadrupole magnetic lens group, a lens position adjustment component, a Faraday cup and a controller. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0043] In a third aspect, the present application provides an ion implanter, which includes an automatic focusing beam adjustment system provided in the first aspect.

[0044] The present application provides an ion implanter, including a focused beam automatic adjustment system, which includes a quadrupole magnetic lens group, a lens position adjustment component, a Faraday cup and a controller. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0045] As can be seen from the above, the present application provides a focused beam automatic adjustment system, method and ion implanter, including a quadrupole magnetic lens group, a lens position adjustment component, a Faraday cup and a controller. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens to maximize the actual beam size information or make the current beam reach the target beam. Therefore, even if the quadrupole magnetic lens group is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens. BRIEF DESCRIPTION OF THE DRAWINGS

[0046] Figure 1A schematic structural diagram of a focused beam automatic adjustment system provided in the first embodiment of the present application.

[0047] Figure 2 A schematic structural diagram of a focused beam automatic adjustment system provided for the second embodiment of the present application.

[0048] Figure 3 Schematic diagram of the magnetic poles of the X magnetic lens and the Y magnetic lens provided in the embodiments of the present application.

[0049] Figure 4 A schematic diagram of the control relationship of a focused beam automatic adjustment system provided in an embodiment of the present application.

[0050] Figure 5 A flowchart of a method for automatically adjusting a focused beam provided in an embodiment of the present application.

[0051] Figure numerals: 1. ion source mechanism; 2. focused beam automatic adjustment system; 21. quadrupole magnetic lens group; 211. first quadrupole magnetic lens; 212. second quadrupole magnetic lens; 213. third quadrupole magnetic lens; 22. lens position adjustment assembly; 23. Faraday cup; 3. beam line mechanism; 4. target chamber mechanism; 5. analysis magnet; 6. controller. DETAILED DESCRIPTION

[0052] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application claimed for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work belong to the scope of protection of the present application.

[0053] It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further defined and explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and cannot be understood as indicating or implying relative importance.

[0054] First, as Figure 1-Figure 4 As shown, the present application provides a focused beam automatic adjustment system, which is applied in an ion implanter. The ion implanter includes an ion source mechanism 1, which is used to generate a beam. The focused beam automatic adjustment system includes:

[0055] A quadrupole magnetic lens group 21, facing the output end of the ion source mechanism 1, includes at least one X magnetic lens and at least one Y magnetic lens;

[0056] A lens position adjustment component 22, used for adjusting the position of the X magnetic lens and / or the Y magnetic lens;

[0057] A Faraday cup 23 is arranged on a side of the quadrupole magnetic lens group 21 away from the ion source mechanism 1 and is used to collect actual beam size information;

[0058] The controller 6 is electrically connected to the lens position adjustment component 22 and the Faraday cup 23, and is used to analyze whether the current beam is the target beam according to the actual beam size information, and is also used to control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam is not the target beam, so as to maximize the actual beam size information or make the current beam reach the target beam.

[0059] Among them, the focused beam automatic adjustment system provided by the present application is applied in an ion implanter. The ion implanter of this embodiment includes an ion source mechanism 1, a focused beam automatic adjustment system 2, a beam line mechanism 3 and a target chamber mechanism 4 arranged in sequence. The ion source mechanism 1 can be an existing ion source system. The ion source mechanism 1 is used to generate a beam. The beam line mechanism 3 can be an existing beam line system. The beam line mechanism 3 can analyze and accelerate the beam according to the Lorentz force of the beam to remove impurities in the beam and increase the kinetic energy of the beam. The target chamber mechanism 4 can be an existing target chamber system. A wafer to be implanted with ions is placed on the target chamber mechanism 4. The ion implanter of this embodiment can implant ions into the wafer. The focused beam automatic adjustment system 2 of this embodiment includes a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. The quadrupole magnetic lens group 21 of this embodiment is directly opposite to the output end of the ion source mechanism 1. The quadrupole magnetic lens group 21 includes at least one X-magnetic lens (refer to Figure 3 In the left picture, Figure 3 The N in the number represents the North Pole. Figure 3 The S in the number stands for South Pole. Figure 3 The Y in represents the Y-axis direction. Figure 3 X represents the X-axis direction) and at least one Y magnetic lens (refer to Figure 3), the X magnetic lens and the Y magnetic lens are both quadrupole magnetic lenses, the X magnetic lens can be an existing magnetic lens capable of focusing ions in the X-axis direction, and the Y magnetic lens can be an existing magnetic lens capable of focusing ions in the Y-axis direction. The lens position adjustment component 22 of this embodiment can be a component capable of driving the X magnetic lens and / or the Y magnetic lens to move, such as a linear slide module or an electric push rod. Since the position of the X magnetic lens and / or the position of the Y magnetic lens will change when the lens position adjustment component 22 drives the X magnetic lens and / or the Y magnetic lens to move, the lens position adjustment component 22 of this embodiment can adjust the position of the X magnetic lens and / or the Y magnetic lens. The Faraday cup 23 of this embodiment can be an existing device, and the Faraday cup 23 is arranged on the side of the quadrupole magnetic lens group 21 away from the ion source mechanism 1. The Faraday cup 23 can collect actual beam size information, that is, the embodiment can collect the size of the beam focused by the quadrupole magnetic lens group 21 through the Faraday cup 23. The controller 6 of this embodiment is electrically connected to the lens position adjustment component 22 and the Faraday cup 23. The controller 6 can analyze whether the current beam is the target beam according to the actual beam size information. The controller 6 can also control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam is not the target beam, so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Specifically, the controller 6 of this embodiment can analyze whether the current beam is the target beam by judging whether the actual beam size information is greater than or equal to the preset target beam size or judging whether the difference between the actual beam size information and the preset target beam size is within a preset range. The preset target beam size is the size of the target beam. It should be understood that before analyzing whether the current beam is the target beam according to the actual beam size information, the embodiment can first install the quadrupole magnetic lens group 21 according to the installation position of the quadrupole magnetic lens group 21 obtained based on theoretical calculations. It should also be understood that, since the purpose of setting up the dual quadrupole magnetic lens in the present application is to adjust the beam line generated by the ion source mechanism to the target beam, and when the actual beam size information reaches the maximum, the beam spot reaches the maximum and is most stable, therefore, the present application adjusts the position of the X magnetic lens and / or the Y magnetic lens to maximize the actual beam size information (equivalent to adjusting the actual beam size information to the maximum within the adjustable range of the X magnetic lens and the Y magnetic lens) or to make the current beam reach the target beam, which is equivalent to adjusting the installation position of the quadrupole magnetic lens group 21 to the optimal installation position.

[0060] The present application provides a focusing beam automatic adjustment system, comprising a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0061] In some embodiments, the quadrupole magnetic lens group 21 includes an X magnetic lens and a Y magnetic lens, and the controller 6 controls the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. The process includes:

[0062] A1. Control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the preset position adjustment value, and record the position information of the X magnetic lens, the position information of the Y magnetic lens and the actual beam current size information after the position adjustment, until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach the first preset number threshold or the current beam current reaches the target beam current;

[0063] A2. When the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach the first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component 22 is controlled to adjust the position of the X magnetic lens and / or the Y magnetic lens according to the X magnetic lens position information and the Y magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

[0064] The preset position adjustment value of step A1 is a preset value. Those skilled in the art can change the size of the preset position adjustment value according to actual needs. The preset position adjustment value is preferably 1% of the upper limit value of the lens position adjustment. The upper limit value of the lens position adjustment can reflect the adjustable range of the installation positions of the X magnetic lens and the Y magnetic lens. The upper limit value of the lens position adjustment is a value calculated based on data such as the vacuum degree of the environment where the quadrupole magnetic lens group 21 is located and the installation accuracy of the quadrupole magnetic lens group 21. Since the preset position adjustment value is preferably 1% of the upper limit value of the lens position adjustment, that is, when the cumulative adjustment times of the X magnetic lens or the Y magnetic lens reaches 100 times (the preferred value of the first preset number threshold) and the current beam current does not reach the target beam current, it means that the installation position of the X magnetic lens or the Y magnetic lens cannot be further adjusted. Therefore, step A1 sets the end condition as: the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach the first preset number threshold or the current beam current reaches the target beam current. It should be understood that, since each time the position of the X magnetic lens and / or the Y magnetic lens is adjusted, the embodiment will record the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information after the position adjustment, and step A1 will perform multiple position adjustments on the X magnetic lens and the Y magnetic lens. Therefore, when the cumulative adjustment times of the X magnetic lens and the Y magnetic lens reach the first preset number threshold and the current beam current does not reach the target beam current, the embodiment will record multiple actual beam size information and their corresponding X magnetic lens position information and Y magnetic lens position information. Step A2 can first determine the maximum value of the actual beam size information from the multiple actual beam size information, and then determine the maximum value of the actual beam size information based on the maximum value of the actual beam size information. The lens position adjustment component 22 is controlled by the X magnetic lens position information and the Y magnetic lens position information corresponding to the time when the actual beam size information is maximum to adjust the position of the X magnetic lens to the X magnetic lens position information corresponding to the time when the actual beam size information is maximum and to adjust the position of the Y magnetic lens to the Y magnetic lens position information corresponding to the time when the actual beam size information is maximum, so that the actual beam size information reaches the maximum, that is, this embodiment is equivalent to first trying to adjust the current beam current to the target beam current, and then when the current beam current cannot be adjusted to the target beam current, using the X magnetic lens position information and the Y magnetic lens position information corresponding to the time when the actual beam size information is maximum as the optimal installation position of the quadrupole magnetic lens group 21.

[0065] In some embodiments, the distance between the X magnetic lens and the ion source mechanism 1 is smaller than the distance between the Y magnetic lens and the ion source mechanism 1, and step A1 includes:

[0066] A11, controlling the lens position adjustment component 22 to adjust the position of the X magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0067] A12, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A13, the preset target beam current size is the target beam current size;

[0068] A13, controlling the lens position adjustment component 22 to adjust the position of the Y magnetic lens according to the preset position adjustment value, and recording the X magnetic lens position information, the Y magnetic lens position information and the actual beam size information at this time;

[0069] A14, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A15;

[0070] A15, analyzing whether the cumulative adjustment times of the Y magnetic lens reaches a first preset number threshold, if yes, executing step A16, if no, returning to step A13;

[0071] A16. Analyze whether the cumulative adjustment times of the X magnetic lens reaches the first preset number threshold. If so, execute step A2. If not, control the lens position adjustment component 22 to adjust the position of the Y magnetic lens to the initial position and clear the cumulative adjustment times of the Y magnetic lens, and return to step A11.

[0072] This embodiment is equivalent to first trying to adjust the current beam current to the target beam current by adjusting the Y magnetic lens position information under the same X magnetic lens position information, and when the cumulative adjustment times of the Y magnetic lens reaches the first preset number threshold (equivalent to the current beam current cannot be adjusted to the target beam current by adjusting the Y magnetic lens position information under the current X magnetic lens position information) and the cumulative adjustment times of the X magnetic lens does not reach the first preset number threshold, the position of the Y magnetic lens is restored and the position of the X magnetic lens is adjusted until the cumulative adjustment times of the X magnetic lens and the Y magnetic lens both reach the first preset number threshold or the current beam current reaches the target beam current. The working principle of this embodiment is as follows: under the same X magnetic lens position information, there is at most only one Y magnetic lens position information that can make the actual beam current size information greater than or equal to the preset target beam current size, that is, under the same X magnetic lens position information, there is at most only one chance to adjust the current beam current to the target beam current. Before executing step A13 and step A15, this embodiment first analyzes whether the actual beam current size information is greater than or equal to the preset target beam current size, and ends the adjustment when the actual beam current size information is greater than or equal to the preset target beam current size. That is, this embodiment is equivalent to stopping the adjustment of the position of the X magnetic lens and / or the Y magnetic lens after the current beam current is adjusted to the target beam current. Therefore, this embodiment can effectively avoid the situation where the position of the X magnetic lens and / or the Y magnetic lens is still adjusted even if the current beam current has been adjusted to the target beam current under the current X magnetic lens position information.

[0073] In some embodiments, the quadrupole magnetic lens group 21 includes a first quadrupole magnetic lens 211, a second quadrupole magnetic lens 212, and a third quadrupole magnetic lens 213 arranged in sequence. When the first quadrupole magnetic lens 211 and the third quadrupole magnetic lens 213 are both X magnetic lenses, the second quadrupole magnetic lens 212 is a Y magnetic lens, or when the first quadrupole magnetic lens 211 and the third quadrupole magnetic lens 213 are both Y magnetic lenses, the second quadrupole magnetic lens 212 is an X magnetic lens. The controller 6 controls the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. The process includes:

[0074] A1', controlling the lens position adjustment component 22 to adjust the position of the second quadrupole magnetic lens 212 according to the preset position adjustment value, and recording the position information of the second quadrupole magnetic lens after the position adjustment and the actual beam current size information, until the cumulative adjustment times of the second quadrupole magnetic lens 212 reaches the first preset number threshold or the current beam current reaches the target beam current;

[0075] A2', when the cumulative adjustment times of the second quadrupole magnetic lens 212 reaches a first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component 22 is controlled to adjust the position of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

[0076] This embodiment is equivalent to making the polarity of the first quadrupole magnetic lens 211 the same as the polarity of the third quadrupole magnetic lens 213 and making the polarity of the first quadrupole magnetic lens 211 opposite to the polarity of the second quadrupole magnetic lens 212. This embodiment is equivalent to determining the optimal installation position of the quadrupole magnetic lens group 21 by only adjusting the position of the second quadrupole magnetic lens 212.

[0077] In some embodiments, the focusing beam automatic adjustment system 2 further includes a current adjustment component for adjusting the current of the second quadrupole magnetic lens 212, and step A1' includes:

[0078] A11', controlling the lens position adjustment component 22 to adjust the position of the second quadrupole magnetic lens 212 according to the preset position adjustment value and controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens 212 according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information after each adjustment, until the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 reaches a first preset number threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches a second preset number threshold or the current beam current reaches the target beam current;

[0079] Step A2' comprises:

[0080] A21. When the cumulative number of adjustments of the position of the second quadrupole magnetic lens 212 reaches a first preset number threshold, the cumulative number of adjustments of the current of the second quadrupole magnetic lens 212 reaches a second preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component 22 is controlled to adjust the position of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens position information corresponding to the time when the actual beam current size information is maximum, and the current adjustment component is controlled to adjust the current of the second quadrupole magnetic lens 212 according to the second quadrupole magnetic lens current information corresponding to the time when the actual beam current size information is maximum, so that the actual beam current size information reaches the maximum.

[0081] The preset current adjustment value of this embodiment is a preset value. Those skilled in the art can change the value of the preset current adjustment value according to actual needs. The preset current adjustment value is preferably 1% of the upper limit value of the lens current adjustment. The upper limit value of the lens current adjustment can reflect the adjustable range of the current of the second quadrupole magnetic lens 212. The upper limit value of the lens current adjustment is preferably a value calculated based on the maximum injection energy of the ion implanter and the optical path parameters. Since the preset current adjustment value of this embodiment is preferably 1% of the upper limit value of the lens current adjustment, when the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches 100 times (the preferred value of the second preset number threshold) and the current beam current does not reach the target beam current, it means that the current of the second quadrupole magnetic lens 212 cannot be further adjusted. The current adjustment component of this embodiment can be a power supply with adjustable output current. The current adjustment component of this embodiment can also be a constant voltage power supply. The constant voltage power supply is connected to the second quadrupole magnetic lens 212 through a variable resistor. This embodiment can adjust the current of the second quadrupole magnetic lens 212 by adjusting the resistance value of the variable resistor. This embodiment is equivalent to determining the optimal installation position of the quadrupole magnetic lens group 21 by adjusting the position and current of the second quadrupole magnetic lens 212 .

[0082] In some embodiments, step A11' includes:

[0083] A111, controlling the lens position adjustment component 22 to adjust the position of the second quadrupole magnetic lens 212 according to the preset position adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information at this time;

[0084] A112, analyze the actual beam size information is greater than or equal to the preset target beam size, if so, then end the adjustment, if not, proceed to step A113;

[0085] A113, controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens 212 according to the preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time;

[0086] A114, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A115;

[0087] A115, analyzing whether the cumulative number of adjustments of the current of the second quadrupole magnetic lens 212 reaches the second preset number threshold, if yes, executing step A116, if no, returning to step A112;

[0088] A116, analyzing whether the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 reaches the first preset number threshold, if so, executing step A2', if not, controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens 212 to the initial current and clear the cumulative adjustment times of the current of the second quadrupole magnetic lens 212, and returning to step A111.

[0089] This embodiment is equivalent to obtaining actual beam size information corresponding to different second quadrupole magnetic lens current information based on the same second quadrupole magnetic lens position information, and when the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 does not reach the first preset number threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches the second preset number threshold, the current of the second quadrupole magnetic lens 212 is restored and adjusted until the cumulative adjustment times of the position of the second quadrupole magnetic lens 212 reaches the first preset number threshold and the cumulative adjustment times of the current of the second quadrupole magnetic lens 212 reaches the second preset number threshold. The working principles of step A112 and step A114 of this embodiment are similar to the working principles of step A12 and step A14 of the above embodiment, and will not be discussed in detail here. Because before executing step A113 and step A115, this embodiment first analyzes whether the actual beam current size information is greater than or equal to the preset target beam current size, and ends the adjustment when the actual beam current size information is greater than or equal to the preset target beam current size, that is, this embodiment is equivalent to stopping further adjusting the position and current of the second quadrupole magnetic lens 212 after adjusting the current beam current to the target beam current. Therefore, this embodiment can effectively avoid the situation where the current and position of the second quadrupole magnetic lens 212 are still being adjusted even if the current beam current has been adjusted to the target beam current under the current second quadrupole magnetic lens position information.

[0090] In some embodiments, the X magnetic lens and the Y magnetic lens each include two south poles and two north poles, the two north poles of the X magnetic lens are respectively located in the first quadrant and the third quadrant of the X magnetic lens, the two south poles of the X magnetic lens are respectively located in the second quadrant and the fourth quadrant of the X magnetic lens, the two north poles of the Y magnetic lens are respectively located in the second quadrant and the fourth quadrant of the Y magnetic lens, and the two south poles of the Y magnetic lens are respectively located in the first quadrant and the third quadrant of the Y magnetic lens.

[0091] In some embodiments, the ion implanter further includes an analysis magnet 5, which is disposed between the ion source mechanism 1 and the focused beam automatic adjustment system 2 or between the focused beam automatic adjustment system 2 and the beamline mechanism 3. The analysis magnet 5 can select suitable ions to pass through and intercept unsuitable ions, that is, this embodiment is equivalent to using the analysis magnet 5 to screen the ions in the beam generated by the ion source mechanism 1 or the ions in the beam focused by the focused beam automatic adjustment system 2.

[0092] As can be seen from the above, the present application provides a focusing beam automatic adjustment system, including a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0093] Second, as Figure 5 As shown, the present application also provides a focused beam automatic adjustment method, which is applied to a focused beam automatic adjustment system provided in the first aspect above, and the focused beam automatic adjustment method includes the following steps:

[0094] S1. Analyze whether the current beam is the target beam according to the actual beam size information;

[0095] S2. When the current beam is not the target beam, the lens position adjustment component 22 is controlled to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum.

[0096] An embodiment of the present application provides a method for automatically adjusting a focused beam, and the method is applied in the automatic focusing beam adjustment system 2 provided in the first aspect. The principle of the automatic focusing beam adjustment method of this embodiment is the same as the principle of the automatic focusing beam adjustment system 2 provided in the first aspect, and will not be discussed in detail here.

[0097] The present application provides a method for automatically adjusting a focused beam, which is applied in an automatic focused beam adjustment system, the system comprising a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0098] In a third aspect, the present application provides an ion implanter, which includes an automatic focusing beam adjustment system provided in the first aspect.

[0099] An embodiment of the present application provides an ion implanter, which includes the focused beam automatic adjustment system 2 provided in the first aspect above. The principle of the ion implanter of this embodiment is the same as the principle of the focused beam automatic adjustment system 2 provided in the first aspect above, and will not be discussed in detail here.

[0100] The present application provides an ion implanter, including a focused beam automatic adjustment system, which includes a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0101] As can be seen from the above, the present application provides a focused beam automatic adjustment system, method and ion implanter, including a quadrupole magnetic lens group 21, a lens position adjustment component 22, a Faraday cup 23 and a controller 6. When it is analyzed that the current beam is not the target beam, the present application can control the lens position adjustment component 22 to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam. Therefore, even if the quadrupole magnetic lens group 21 is worn after long-term use, the present application can adjust the focusing effect of the quadrupole magnetic lens group 21 by adjusting the position of the X magnetic lens and / or the Y magnetic lens, thereby effectively solving the problem that the focusing effect of the beam focusing system cannot be adjusted by adjusting the position of the dual quadrupole magnetic lens due to the fixed installation of the dual quadrupole magnetic lens.

[0102] In the embodiments provided in the present application, it should be understood that, herein, relational terms such as first and second, etc. are merely used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations.

[0103] The above description is only an embodiment of the present application and is not intended to limit the protection scope of the present application. For those skilled in the art, the present application may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A focused beam automatic adjustment system, applied in an ion implanter, wherein the ion implanter comprises an ion source mechanism, wherein the ion source mechanism is used to generate a beam, and wherein: The focusing beam automatic adjustment system comprises: A quadrupole magnetic lens group, facing the output end of the ion source mechanism, comprising at least one X magnetic lens and at least one Y magnetic lens; A lens position adjustment component, used for driving the X magnetic lens and / or the Y magnetic lens to move, so as to adjust the position of the X magnetic lens and / or the Y magnetic lens; A Faraday cup is arranged on a side of the quadrupole magnetic lens group away from the ion source mechanism and is used to collect actual beam size information; a controller, electrically connected to the lens position adjustment assembly and the Faraday cup, for analyzing whether a current beam is a target beam according to the actual beam size information, and for controlling the lens position adjustment assembly to adjust the position of the X magnetic lens and / or the Y magnetic lens when the current beam is not the target beam, so as to maximize the actual beam size information or to make the current beam reach the target beam; The quadrupole magnetic lens group includes a first quadrupole magnetic lens, a second quadrupole magnetic lens, and a third quadrupole magnetic lens arranged in sequence, when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both X magnetic lenses, the second quadrupole magnetic lens is a Y magnetic lens, or when the first quadrupole magnetic lens and the third quadrupole magnetic lens are both Y magnetic lenses, the second quadrupole magnetic lens is an X magnetic lens, and the controller controls the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches the maximum or the current beam reaches the target beam, the process includes: A1', controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value, and recording the position information of the second quadrupole magnetic lens after position adjustment and the actual beam current size information, until the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset number threshold or the current beam current reaches the target beam current; A2', when the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

2. The focusing beam automatic adjustment system according to claim 1, characterized in that: The focusing beam automatic adjustment system further comprises a current adjustment component for adjusting the current of the second quadrupole magnetic lens, and step A1' comprises: A11', controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value and controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens according to a preset current adjustment value, and recording the second quadrupole magnetic lens position information, second quadrupole magnetic lens current information and actual beam current size information after each adjustment, until the cumulative number of adjustments of the position of the second quadrupole magnetic lens reaches a first preset number threshold and the cumulative number of adjustments of the current of the second quadrupole magnetic lens reaches a second preset number threshold or the current beam current reaches the target beam current; Step A2' comprises: A21. When the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches the first preset number threshold, the cumulative adjustment times of the current of the second quadrupole magnetic lens reaches the second preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the time when the actual beam current size information is maximum, and the current adjustment component is controlled to adjust the current of the second quadrupole magnetic lens according to the second quadrupole magnetic lens current information corresponding to the time when the actual beam current size information is maximum, so that the actual beam current size information reaches the maximum.

3. The focusing beam automatic adjustment system according to claim 2, characterized in that: Step A11' includes: A111, controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam current size information at this time; A112, analyzing the actual beam size information is greater than or equal to the preset target beam size, if so, then end the adjustment, if not, proceed to step A113; A113, controlling the current adjustment component to adjust the current of the second quadrupole magnetic lens according to a preset current adjustment value, and recording the second quadrupole magnetic lens position information, the second quadrupole magnetic lens current information and the actual beam size information at this time; A114, analyzing whether the actual beam current size information is greater than or equal to the preset target beam current size, if so, ending the adjustment, if not, executing step A115; A115, analyzing whether the cumulative number of adjustments of the current of the second quadrupole magnetic lens reaches a second preset number threshold, if so, executing step A116, if not, returning to step A112; A116. Analyze whether the cumulative adjustment times of the position of the second quadrupole magnetic lens reaches a first preset threshold value. If so, execute step A2'; if not, control the current adjustment component to adjust the current of the second quadrupole magnetic lens to the initial current and clear the cumulative adjustment times of the current of the second quadrupole magnetic lens, and return to step A111.

4. The focusing beam automatic adjustment system according to claim 1, characterized in that: The X magnetic lens and the Y magnetic lens each include two south poles and two north poles, the two north poles of the X magnetic lens are respectively located in the first quadrant and the third quadrant of the X magnetic lens, the two south poles of the X magnetic lens are respectively located in the second quadrant and the fourth quadrant of the X magnetic lens, the two north poles of the Y magnetic lens are respectively located in the second quadrant and the fourth quadrant of the Y magnetic lens, and the two south poles of the Y magnetic lens are respectively located in the first quadrant and the third quadrant of the Y magnetic lens.

5. The focusing beam automatic adjustment system according to claim 1, characterized in that: The ion implanter further comprises an analysis magnet, which is arranged between the ion source mechanism and the focused beam automatic adjustment system or between the focused beam automatic adjustment system and the beam line mechanism.

6. A method for automatically adjusting a focused beam, characterized in that: Applied in the focused beam automatic adjustment system according to any one of claims 1 to 5, the focused beam automatic adjustment method comprises the following steps: S1, analyzing whether the current beam is the target beam according to the actual beam size information; S2, when the current beam is not the target beam, controlling the lens position adjustment component to adjust the position of the X magnetic lens and / or the Y magnetic lens so that the actual beam size information reaches a maximum; Step S2 includes: S21, controlling the lens position adjustment component to adjust the position of the second quadrupole magnetic lens according to a preset position adjustment value, and recording the position information of the second quadrupole magnetic lens after position adjustment and the actual beam current size information, until the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset number threshold or the current beam current reaches the target beam current; S22. When the cumulative adjustment times of the second quadrupole magnetic lens reaches a first preset number threshold and the current beam current does not reach the target beam current, the lens position adjustment component is controlled to adjust the position of the second quadrupole magnetic lens according to the second quadrupole magnetic lens position information corresponding to the maximum actual beam current size information, so that the actual beam current size information reaches the maximum.

7. An ion implanter, characterized in that: The ion implanter comprises the focused beam automatic adjustment system as described in any one of claims 1-5.

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