A lock head structure and a preparation method thereof, a lock box mechanism and a container transportation system

Abstract

The application discloses a lock head structure and a preparation method thereof, a lock box mechanism and a container transportation system, and relates to the technical field of transportation. The lock head structure comprises a lock head body and a protective layer arranged on the surface of the lock head body. The protective layer comprises a nitriding layer, a transition layer and a diamond-like layer arranged in sequence from inside to outside. The material of the transition layer comprises at least one of Cr and CrN. The diamond-like layer has the characteristics of high hardness and low friction coefficient. On the one hand, the contact surface strength of the lock head can be strengthened, and the wear caused by long-term friction can be reduced. On the other hand, the friction force can be effectively reduced, so that the external force required for unlocking the lock box is reduced, the excessive contact force on the contact surface caused by local deformation is reduced, and the situation that the unlocking friction torque is too large and the lock box is stuck is avoided. The nitriding layer provides good support for the diamond-like layer, reduces the hardness mutation between the diamond-like layer and the base body, and reduces the probability of collapse of the diamond-like layer under extrusion.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of automobiles, in particular to a lock head structure and a preparation method thereof, a lock box mechanism and a container transportation system. BACKGROUND

[0002] Containers play an extremely important role in modern logistics and trade. Container transportation has the advantages of high transportation efficiency, safe and reliable transportation process, and simple loading and unloading.

[0003] The container and the base are connected by a lock box mechanism. The rotary lock box is one of the commonly used mechanisms, which mainly consists of a lock head, a lock rod and a lock body. The lock head is generally circular or flat spherical. The lock head cooperates with the container fixing device and is tightened by rotating the lock head, thereby limiting the translational freedom of the container in the vertical direction.

[0004] However, under the influence of vibration during transportation, the container is prone to small radial movement, which may cause the lock head to be stuck with the container and difficult to be released. At this time, artificial assistance is needed to open, which wastes disassembly time and reduces the stability of the lock box mechanism. SUMMARY

[0005] The present application provides a lock head structure and a preparation method thereof, a lock box mechanism and a container transportation system to solve the problem that the existing lock head is stuck with the container and difficult to be released.

[0006] In a first aspect, the present application provides a lock head structure, comprising a lock head body and a protective layer arranged on the surface of the lock head body, wherein the protective layer comprises, from the inside to the outside, in order:

[0007] a nitriding layer;

[0008] a transition layer, the material of the transition layer comprising at least one of Cr and CrN; and

[0009] a diamond-like carbon layer.

[0010] The container and the base are connected by a lock box mechanism. The release of the container is completed by overcoming the friction torque formed between the lock head and the matching surface. When the friction torque exceeds the driving torque of the lock head, the lock head is stuck and difficult to be released. During transportation, the container is prone to small radial movement, which causes local deformation at the connection of the lock head, generates a large pressure at the contact surface of the lock head, and further generates an excessive friction force, resulting in the lock head being stuck and unable to be normally opened. At the same time, the surface of the lock head is prone to wear and tear after being used for many times, which further increases the friction coefficient between the lock head and the matching surface, resulting in the lock head being stuck.

[0011] The diamond-like carbon layer has high hardness and low friction coefficient, which can strengthen the contact surface strength of the lock head, reduce wear caused by long-term friction, effectively reduce friction, reduce the external force required for unlocking the lock box, reduce the excessive contact force on the contact surface caused by local deformation, and prevent the lock from being stuck due to excessive unlocking friction torque. After the metal material is treated by ion nitriding, the hardness and elastic modulus of the nitriding layer formed on the surface are improved, so that the deformation resistance of the surface is improved. Under the same force, the surface deformation after nitriding is smaller, so that the diamond-like carbon layer is well supported, the hardness difference between the diamond-like carbon layer and the substrate is reduced, and the probability of collapse of the diamond-like carbon layer under extrusion is reduced.

[0012] The diamond-like carbon material mainly refers to SP 2 Hybrid bond and SP 3 The metastable material is formed by hybrid bond combination.

[0013] In some embodiments, the thickness of the nitriding layer is 0.2-0.3mm. When the thickness of the nitriding layer is in this range, the diamond-like carbon layer is further supported, the hardness difference between the diamond-like carbon layer and the substrate is reduced, and the probability of collapse of the diamond-like carbon layer under extrusion is reduced; and / or,

[0014] The material of the lock head body includes at least one of 35CrMnSi and 42CrMo. The lock head body made of the above material has good comprehensive mechanical properties, high strength and sufficient toughness.

[0015] In some embodiments, the transition layer includes a Cr layer and a CrN layer arranged from inside to outside, wherein:

[0016] The thickness of the Cr layer is 0.1-0.2μm. Cr has good toughness and high adhesion with the substrate, which can improve the adhesion between the diamond-like carbon layer and the lock head body, and reduce the falling of the diamond-like carbon layer; and / or,

[0017] The thickness of the CrN layer is 0.5-1μm. CrN has higher hardness than elemental Cr. CrN can provide adhesion to reduce the falling of the diamond-like carbon layer, and also provide support to the diamond-like carbon layer, reduce the hardness difference between the diamond-like carbon layer and the lock head body, and reduce the probability of collapse of the diamond-like carbon layer under extrusion; and / or,

[0018] The thickness of the diamond-like carbon layer is 1-2μm. When the thickness of the diamond-like carbon layer is in this range, the internal stress of the diamond-like carbon coating is small, which can prevent natural cracking and falling caused by excessive internal stress.

[0019] In a second aspect, the application provides a method for preparing the lock head structure of the first aspect, comprising the following steps:

[0020] carrying out ion nitriding treatment on the surface of the lock head body to obtain a nitriding layer;

[0021] applying a transition layer material on the surface of the nitriding layer to obtain a transition layer;

[0022] applying a diamond-like carbon material on the surface of the transition layer to form a diamond-like carbon layer, thereby obtaining the lock head structure.

[0023] The diamond-like carbon layer has high hardness and low friction coefficient, which can strengthen the contact surface strength of the lock head, reduce the surface roughness deterioration caused by long-term friction and wear, effectively reduce the friction, and reduce the external force required for unlocking the lock box, thereby reducing the situation that the lock is stuck due to excessive contact force on the contact surface caused by local deformation and excessive unlocking friction torque.

[0024] It should be noted that before forming the nitriding layer, the lock head body can be subjected to sand blasting treatment to remove impurities such as oil stains and rust on the surface of the lock head, thereby exposing the fresh metal activation surface. At the same time, the impact of the micro-pellets in the sand blasting process can change the stress state of the lock head surface from tensile stress to compressive stress, thereby improving the surface compressive performance. Then, the lock head after sand blasting is subjected to ultrasonic cleaning with anhydrous ethanol or acetone to further remove surface impurities. Specifically, the sand blasting distance can be 20-30 cm, the sand blasting angle can be 60-90°, the sand blasting pressure can be 0.4-0.8 MPa, the sand particle diameter used can be 320-500 mesh, and the surface after sand blasting treatment can be free of rust and oil stains, and the fresh metal can be exposed. Subsequently, the surface is cleaned with anhydrous ethanol or acetone in an ultrasonic cleaning device for 20-30 minutes.

[0025] In some embodiments, the ion nitriding treatment on the surface of the lock head body to obtain a nitriding layer comprises:

[0026] The ion nitriding temperature is 400-500°C; and / or,

[0027] The ion nitriding voltage is -200 to -700 V; and / or,

[0028] The ion nitriding pressure is 250-300 Pa; and / or,

[0029] The ion nitriding time is 5-8 hours.

[0030] It should be noted that the lock head body can be pretreated before the ion nitriding treatment, which can be specifically as follows: the lock head is placed in the ion nitriding furnace, vacuum is extracted after the furnace door is closed, arc cleaning is started when the vacuum degree is extracted to 60-80 Pa, that is, the voltage difference between the workpiece and the furnace wall is increased, the substrate voltage is -200 to -700 V, the remaining air in the furnace is ionized to generate N + , H + , etc., and the ions collide with the surface impurities, thereby achieving the cleaning effect; after the cleaning is completed, H2 and N2 are introduced, the flow rate is gradually increased with the increase of the temperature, the flow rate ratio of H2 to N2 is maintained at 3:1, and the negative bias of the substrate is gradually increased; when the heating temperature reaches 400-500℃, the temperature, voltage, pressure and gas flow rate are set for the heat preservation nitriding, the nitriding time is 5-8 h, and the furnace is cooled after the nitriding is completed for standby.

[0031] In some embodiments, the material for plating the transition layer on the surface of the nitriding layer comprises:

[0032] The Cr layer is plated on the surface of the nitriding layer.

[0033] The CrN layer is deposited on the surface of the Cr layer to form the transition layer.

[0034] The Cr element has good toughness and high adhesion to the substrate, which can improve the adhesion between the diamond-like layer and the lock head body, reduce the peeling of the diamond-like layer, the CrN has higher hardness than the Cr element, which can provide adhesion for the diamond-like layer, reduce the peeling of the diamond-like layer, and also provide support for the diamond-like layer, reduce the hardness difference between the diamond-like layer and the lock head body, and reduce the probability of the diamond-like layer collapsing due to deformation under pressure.

[0035] In some embodiments, the target voltage for plating the Cr layer is 20-40 V; and / or,

[0036] The arc current of the target for plating the Cr layer is 80-120 A; and / or,

[0037] The time for plating the Cr layer is 5-15 min; and / or,

[0038] The furnace pressure for plating the Cr layer is 1-2 Pa; and / or,

[0039] The temperature for plating the Cr layer is 450-470℃; and / or,

[0040] The time for forming the CrN layer is 30-50 min.

[0041] It should be noted that the method of forming the Cr layer and the CrN layer can be specifically as follows: the lock head is placed on a rotating frame in an arc ion plating film machine, after the furnace door is closed, an automatic vacuum pumping mode is started, when the vacuum pumping is performed to 5*10 -3 Pa, the auxiliary heating electric heating wire in the furnace is started, gradient heating is performed, the heating temperature is first set to 270-300 DEG C, after the temperature is increased to the set value, the temperature is maintained for 20-30 min, then the heating temperature is set to 400-470 DEG C, after the temperature is increased to 450-470 DEG C, Cr plating is performed. First, the mixed gas of Ar+H2 with a flow rate of 180-220 sccm is introduced into the furnace, the pressure in the furnace is maintained at 0.5-1 Pa, the etching Ti target arc is started to etch and clean the surface of the lock head, the substrate bias is set to -30--150 V, after the etching and cleaning are completed, the etching target arc is turned off. Then, Ar is introduced alone, the pressure in the furnace is set to 1-2 Pa, the Cr target arc is started, the target voltage is 20-40 V, the current is 80-120 A, the elemental Cr is plated on the surface of the workpiece, the plating time is 5-15 min; then the Ar is turned off, N2 is introduced into the furnace, the pressure is maintained at 1-2 Pa, the CrN layer is prepared on the surface, the time is 30-50 min, after the completion, the Cr target arc is turned off, and the N2 introduction is turned off.

[0042] In some embodiments, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained;

[0043] The plating temperature is 100-200 DEG C; and / or,

[0044] The plating time is 30-50 min; and / or,

[0045] The substrate bias for plating is -200--300 V; and / or,

[0046] The bias pulse frequency for plating is 30-80 kHz; and / or,

[0047] The pressure in the furnace for plating is 0.1-0.5 Pa.

[0048] It should be noted that the diamond-like plating is performed by using a pure C target with a purity of 99.99% as a raw material in an inert gas.

[0049] In a third aspect, the application provides a lock box mechanism comprising the lock head structure prepared by the preparation method of the lock head structure of the first aspect or the second aspect.

[0050] It should be noted that the lock box mechanism further comprises a lock body, an electric or pneumatic push rod, and a connecting ring, the lock head is installed in the lock body, the connecting ring is connected with the lock head, the extended part of the connecting ring is connected with the driving rod, and the function of the connecting ring is to convert the linear motion of the push rod into the rotary motion of the lock head.

[0051] In a fourth aspect, the present application provides a container transport system comprising the locking mechanism of the third aspect. BRIEF DESCRIPTION OF DRAWINGS

[0052] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without any creative effort on the basis of these drawings.

[0053] Figure 1 It is a structural schematic diagram of the lock head structure of an embodiment of the present application.

[0054] Figure 2 It is an axial cross-sectional schematic diagram of the lock head structure of an embodiment of the present application.

[0055] Figure 3 It is an axial cross-sectional schematic diagram of the lock head structure of another embodiment of the present application.

[0056] Figure 4 It is a friction coefficient graph of the lock head structure of Embodiment 1 of the present application versus time.

[0057] Figure 5 It is a friction coefficient graph of the lock head structure of Comparative Example 1 of the present application versus time.

[0058] Figure 6 It is a friction coefficient graph of the lock head structure of Comparative Example 2 of the present application versus time.

[0059] Figure 7 It is a friction coefficient graph of the lock head structure of Comparative Example 3 of the present application versus time.

[0060] BRIEF DESCRIPTION OF DRAWINGS

[0061] 100 lock head structure; 1 lock head body; 2 protective layer; 21 nitriding layer; 22 transition layer; 221 Cr layer; 222 CrN layer; 23 diamond-like layer. DETAILED DESCRIPTION

[0062] In order to make the purpose, technical solutions and advantages of the present application more clear, the technical solutions of the present application will be described clearly and completely in combination with the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, but not all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without any creative effort belong to the scope of protection of the present application.

[0063] Container plays an extremely important role in modern logistics and trade, and container transportation has the advantages of high transportation efficiency, safe and reliable transportation process, simple loading and unloading, etc.

[0064] The container and the base are connected by a locking mechanism, and the rotary locking mechanism is one of the commonly used mechanisms, which mainly consists of a lock head, a lock rod and a lock body. The lock head is generally circular or flat spherical, and the lock head cooperates with the container fixing device to fasten by rotating the lock head, thereby limiting the translational freedom of the container in the upward and downward directions.

[0065] However, under the influence of vibration during transportation, the container is prone to slight radial movement, which may cause the lock head to be stuck with the container and difficult to be released. At this time, artificial assistance is needed to open, which wastes disassembly time and reduces the stability of the locking mechanism.

[0066] Therefore, the present application provides a lock head structure and a preparation method thereof, a locking mechanism and a container transportation system to solve the problem of the existing lock head being stuck with the container and difficult to be released.

[0067] As shown in Figure 1 and Figure 2 , in a first aspect, the present application provides a lock head structure 100, which comprises a lock head body 1 and a protective layer 2 arranged on the surface of the lock head body 1, wherein the protective layer 2 comprises, from inside to outside:

[0068] a nitriding layer 21;

[0069] a transition layer 22, the material of the transition layer 22 comprising at least one of Cr and CrN; and

[0070] a diamond-like carbon layer 23.

[0071] The container and the base are connected by a locking mechanism, and the container is released by overcoming the friction torque formed between the lock head and the matching surface. When the friction torque exceeds the driving torque of the lock head, the lock head is stuck and difficult to be released. During transportation, the container is prone to slight radial movement, which causes local slight deformation at the connection of the lock head, generates a large pressure at the contact surface of the lock head, and further generates an excessive friction force, resulting in the lock head being locked and unable to be normally opened. At the same time, the surface of the lock head is prone to wear and tear after being used for many times, which further increases the friction coefficient between the lock head and the matching surface, resulting in the lock head being locked.

[0072] The diamond-like carbon layer 23 has high hardness and low friction coefficient, which can strengthen the contact surface strength of the lock head, reduce wear caused by long-term friction, effectively reduce the friction, reduce the external force required for unlocking the lock box, reduce the excessive contact force on the contact surface caused by local deformation, and prevent the lock head from being stuck due to excessive unlocking friction torque.

[0073] The diamond-like carbon material mainly refers to SP 2 Hybrid bond and SP 3 The metastable material is formed by hybrid bond.

[0074] In combination with the first aspect, in some embodiments provided by the present application, the thickness of the nitriding layer 21 is 0.2-0.3 mm. The thickness of the nitriding layer 21 in this range can further provide good support for the diamond-like carbon layer 23, reduce the hardness mutation between the diamond-like carbon layer 23 and the substrate, and reduce the probability of collapse of the diamond-like carbon layer 23 under extrusion.

[0075] In combination with the first aspect, in some embodiments provided by the present application, the material of the lock head body 1 includes at least one of 35CrMnSi and 42CrMo. The lock head body 1 adopts the above material, has good comprehensive mechanical properties, high strength, and sufficient toughness.

[0076] As Figure 3 shown, in combination with the first aspect, in some embodiments provided by the present application, the transition layer 22 includes a Cr layer 221 and a CrN layer 222 arranged from inside to outside, wherein the thickness of the Cr layer 221 is 0.1-0.2 μm. The Cr element has good toughness and high adhesion with the substrate, which can improve the adhesion between the diamond-like carbon layer 23 and the lock head body, and reduce the falling of the diamond-like carbon layer 23.

[0077] In some embodiments of the first aspect, the transition layer 22 comprises a Cr layer 221 and a CrN layer 222 arranged in sequence from inside to outside, wherein the thickness of the CrN layer 222 is 0.5-1 μm. The CrN layer has higher hardness than the elemental Cr, and can provide the diamond-like carbon layer 23 with adhesion and reduce the shedding of the diamond-like carbon layer 23, while providing the diamond-like carbon layer 23 with certain support, reducing the hardness mutation between the diamond-like carbon layer 23 and the lock head body, and reducing the probability of collapse of the diamond-like carbon layer 23 under extrusion.

[0078] In some embodiments of the first aspect, the transition layer 22 comprises a Cr layer 221 and a CrN layer 222 arranged in sequence from inside to outside, wherein the thickness of the diamond-like carbon layer 23 is 1-2 μm. When the thickness of the diamond-like carbon layer 23 is in this range, the internal stress of the diamond-like carbon coating 23 is small, and natural cracking and shedding due to excessive internal stress can be prevented.

[0079] In the second aspect, the application provides a method for preparing a lock head structure, to prepare the lock head structure of the first aspect, comprising the following steps:

[0080] carrying out ion nitriding treatment on the surface of the lock head body to obtain a nitriding layer;

[0081] applying a transition layer material on the surface of the nitriding layer to obtain a transition layer;

[0082] applying a diamond-like carbon material on the surface of the transition layer to form a diamond-like carbon layer, to obtain the lock head structure.

[0083] The diamond-like carbon layer has high hardness and low friction coefficient, which can strengthen the contact surface strength of the lock head, reduce wear caused by long-term friction, and effectively reduce the friction force, thereby reducing the external force required for unlocking the lock box, reducing the situation that the lock box is stuck due to excessive contact force on the contact surface caused by local deformation, and excessive unlocking friction torque.

[0084] It should be noted that before forming the nitriding layer, the lock body can be sandblasted to remove impurities such as oil stains and rust on the surface of the lock head, and expose the fresh metal activation surface; at the same time, the impact of the sandblasting process can change the stress state of the lock head surface from tensile stress to compressive stress, thereby improving the surface compressive performance. Then the lock head after sandblasting is ultrasonically cleaned with ethylene glycol or acetone to further remove surface impurities. Specifically, the sandblasting distance can be 20-30 cm, the sandblasting angle can be 60-90°, the sandblasting pressure can be 0.4-0.8 MPa, the sand particle diameter used can be 320-500 mesh, and the surface after sandblasting can be free of rust and oil stains, while exposing fresh metal. Subsequently, the surface is cleaned with anhydrous ethanol in an ultrasonic cleaning device for 20-30 minutes.

[0085] In combination with the second aspect, in some embodiments provided in the present application, the ion nitriding treatment on the surface of the lock body to obtain the nitriding layer has a temperature of 400-500°C.

[0086] In combination with the second aspect, in some embodiments provided in the present application, the ion nitriding treatment on the surface of the lock body to obtain the nitriding layer has a voltage of -200 to -700V.

[0087] In combination with the second aspect, in some embodiments provided in the present application, the ion nitriding treatment on the surface of the lock body to obtain the nitriding layer has a pressure of 250-300 Pa.

[0088] In combination with the second aspect, in some embodiments provided in the present application, the ion nitriding treatment on the surface of the lock body to obtain the nitriding layer has a time of 5-8 hours.

[0089] Within the above temperature, voltage, pressure and time ranges, a nitriding layer substantially free of white layer can be prepared. The white layer, although having high hardness and excellent corrosion resistance, is itself brittle relative to the diffusion layer, which is not conducive to the adhesion of the coating and the improvement of the bonding force.

[0090] It should be noted that the lock body can also be pretreated before ion nitriding treatment. Specifically, the lock head can be placed in an ion nitriding furnace, the furnace door is closed, vacuum is drawn, and when the vacuum degree is drawn to 60-80 Pa, arc cleaning is started, that is, the voltage difference between the workpiece and the furnace wall is increased, the substrate voltage is -200 to -700V, the remaining air in the furnace is ionized to produce N + , H +After the cleaning is completed, H2 and N2 are introduced, the flow rate is gradually increased with the increase of temperature, the flow rate ratio of H2 to N2 is maintained at 3:1, the substrate negative bias is gradually increased, when the heating temperature reaches 400-500 ℃, the temperature, voltage, pressure and gas flow rate are set, and then the nitriding is performed, the nitriding time is 5-8 h, and after the nitriding is completed, the furnace is cooled and then used.

[0091] In some embodiments of the second aspect, the material for plating the transition layer on the surface of the nitriding layer comprises:

[0092] The Cr layer is plated on the surface of the nitriding layer.

[0093] The CrN layer is deposited on the surface of the Cr layer.

[0094] The Cr element has good toughness and high adhesion to the substrate, which can improve the adhesion between the coating and the lock body, the CrN layer has higher hardness than the Cr element layer, which can provide certain support for the diamond-like layer, reduce the hardness mutation between the diamond-like layer and the lock body, and reduce the probability of collapse of the diamond-like layer under extrusion.

[0095] In some embodiments of the second aspect, the substrate bias voltage for plating the Cr layer is -20 to -40 V.

[0096] In some embodiments of the second aspect, the target current for plating the Cr layer is 80-120 A.

[0097] In some embodiments of the second aspect, the plating time for plating the Cr layer is 5-15 min.

[0098] In some embodiments of the second aspect, the furnace pressure for plating the Cr layer is 1-2 Pa.

[0099] In some embodiments of the second aspect, the temperature for plating the Cr layer is 450-470 ℃.

[0100] In some embodiments of the second aspect, the time for forming the CrN layer is 30-50 min.

[0101] Under the above voltage, current, plating time, furnace pressure, temperature and N2 introduction time, the hardness of the transition layer is gradually increased, thereby reducing the hardness mutation between the final functional layer and the substrate.

[0102] It should be noted that the method of forming the Cr layer and the CrN layer can be specifically as follows: the lock head is placed on a rotating frame in an arc ion plating film machine, after the furnace door is closed, an automatic vacuum pumping mode is started, when the vacuum pumping is performed to 5*10 -3 Pa, the auxiliary heating electric heating wire in the furnace is started, gradient heating is performed, the heating temperature is first set to 270-300 DEG C, after the temperature is increased to the set value, the temperature is maintained for 20-30 min, then the heating temperature is set to 400-470 DEG C, after the temperature is increased to 450-470 DEG C, Cr plating is performed. First, the mixed gas of Ar+H2 with a flow rate of 180-220 sccm is introduced into the furnace, the pressure in the furnace is maintained at 0.5-1 Pa, the etching Ti target arc is started to etch and clean the surface of the lock head, the substrate bias is set to -30--150 V, after the etching and cleaning are completed, the etching target arc is turned off. Then, Ar is introduced alone, the pressure in the furnace is set to 1-2 Pa, the Cr target arc is started, the target voltage is 20-40 V, the current is 80-120 A, the elemental Cr is plated on the surface of the workpiece, the plating time is 5-15 min, then N2 is introduced into the furnace, the pressure is maintained at 1-2 Pa, the CrN layer is prepared on the surface, the time is 30-50 min, after the completion, the Cr target arc is turned off, and the N2 introduction is turned off.

[0103] In combination with the second aspect, in some embodiments provided in the application, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained; the plating temperature is 100-200 DEG C.

[0104] In combination with the second aspect, in some embodiments provided in the application, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained; the plating time is 30-50 min.

[0105] In combination with the second aspect, in some embodiments provided in the application, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained; the substrate bias during plating is -200--300 V.

[0106] In combination with the second aspect, in some embodiments provided in the application, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained; the bias pulse frequency during plating is 30-80 kHz.

[0107] In combination with the second aspect, in some embodiments provided in the application, the diamond-like material is plated on the surface of the transition layer to form a diamond-like layer, and the lock head structure is obtained; the pressure in the furnace during plating is 0.1-0.5 Pa.

[0108] It should be noted that the diamond-like carbon material is prepared by using C target as raw material and under inert gas. Under the above-mentioned temperature, time, bias, pulse frequency and intracranial pressure, the prepared DLC coating has high bonding force, and the hardness and friction coefficient are good.

[0109] In a third aspect, the application provides a lock mechanism comprising the lock head structure of the first aspect or the lock head structure prepared by the method of the second aspect.

[0110] It should be noted that the lock mechanism further comprises a driving device (electric push rod or pneumatic push rod), a connecting rod and a lock head matching flange. The lock head is connected with the driving device through the connecting rod, and the linear motion of the driving device is converted into the rotary motion of the lock head. The lock head cooperates with the lock head matching flange during the locking process, so as to achieve the locking action.

[0111] In a fourth aspect, the application provides a container transportation system comprising the lock mechanism of the third aspect.

[0112] The technical solutions provided by the application will be described in detail below with reference to the embodiments and drawings.

[0113] Embodiment 1

[0114] The embodiment 1 of the application provides a lock head structure and a preparation method.

[0115] The lock head structure comprises a lock head body made of 42CrMo material and a protective layer arranged on the surface of the lock head body, wherein the protective layer comprises, from inside to outside:

[0116] a nitriding layer with a thickness of 0.25mm;

[0117] a transition layer with a thickness of 0.8μm, and the material of the transition layer is Cr; and

[0118] a diamond-like carbon layer with a thickness of 1.5μm.

[0119] The preparation method of the lock head structure comprises the following steps:

[0120] The surface of the lock head after heat treatment is treated by sand blasting machine, the sand blasting distance is 25cm, the sand blasting angle is 75°, the sand blasting pressure is 0.5MPa, the diameter of the sand particles used is 400 meshes, and the surface after sand blasting treatment is free of rust and oil stains, and fresh metal is exposed. Subsequently, the surface is cleaned by anhydrous ethanol in an ultrasonic cleaning device for 25min;

[0121] Put the lock head into the ion nitriding furnace, close the furnace door, and then perform vacuum pumping. When the vacuum degree reaches 70 Pa, start arc cleaning, that is, increase the voltage difference between the workpiece and the furnace wall, the substrate voltage is -500 V, and the remaining air in the furnace is ionized to generate N + 、H + , and the ions collide with the surface impurities, thereby achieving the cleaning effect. After cleaning is completed, H2 and N2 are introduced. As the temperature increases, the flow rate gradually increases, the flow rate ratio of H2 to N2 is maintained at 3:1, and the substrate negative bias gradually increases. When the heating temperature reaches 450 DEG C, the holding temperature, voltage, pressure, and gas flow rate are set, and then the holding nitriding is started. The nitriding time is 6 h. After nitriding is completed, the furnace is cooled and then used;

[0122] Put the lock head on the rotating frame in the arc ion plating film machine, close the furnace door, and then start automatic vacuum pumping. When the vacuum degree reaches 5 x 10 -3 Pa, turn on the auxiliary heating wire in the furnace for gradient heating. First, set the heating temperature to 280 DEG C. When the temperature rises to the set value, hold for 25 min. Then, set the heating temperature to 450 DEG C. After the temperature rises to 450 DEG C, perform the film plating process. The film plating process is as follows: first, introduce a mixed gas of Ar and H2 with a flow rate of 200 sccm into the furnace, maintain the pressure in the furnace at 0.8 Pa, turn on the etching Ti target arc to etch and clean the surface of the lock head, and set the substrate bias voltage to -100 V. After etching and cleaning is completed, turn off the etching target arc. Then, introduce Ar alone, set the pressure in the furnace to 1.5 Pa, turn on the Cr target arc, set the target material voltage to 30 V and the current to 100 A, and plating elemental Cr on the surface of the workpiece. The film plating time is 10 min.

[0123] Reduce the temperature in the furnace to 150 DEG C, turn on the Ar introduction, control the pressure in the furnace to 0.4 Pa, turn on the C target arc, and set the substrate bias voltage to -250 V and the bias voltage pulse frequency to 50 kHz. The diamond-like carbon coating is prepared, and the film plating time is 40 min.

[0124] Embodiment 2

[0125] The embodiment 2 of the present application provides a lock head structure and a preparation method.

[0126] A lock head structure includes a lock head body made of 42CrMo material and a protective layer arranged on the surface of the lock head body. The protective layer includes, from the inside to the outside, a nitriding layer with a thickness of 0.25 mm, a Cr layer with a thickness of 0.15 μm, a CrN layer with a thickness of 0.65 μm, and a diamond-like carbon coating.

[0127] A nitriding layer with a thickness of 0.25 mm;

[0128] A Cr layer with a thickness of 0.15 μm;

[0129] A CrN layer with a thickness of 0.65 μm; and

[0130] A diamond-like carbon layer with a thickness of 1.5 μm.

[0131] A method for manufacturing a lock head structure, comprising the following steps:

[0132] The surface of the lock head after heat treatment is treated by sand blasting with a sand blasting machine, the sand blasting distance is 25 cm, the sand blasting angle is 75°, the sand blasting pressure is 0.5 MPa, the sand particle diameter used is 400 mesh, and the surface after sand blasting treatment is free of rust and oil stains, and fresh metal is exposed. Subsequently, the surface is cleaned by anhydrous ethanol in an ultrasonic cleaning device for 25 min;

[0133] The lock head is placed in an ion nitriding furnace, vacuum is drawn after the furnace door is closed, arc cleaning is started when the vacuum degree is drawn to 70 Pa, that is, the voltage difference between the workpiece and the furnace wall is increased, the substrate voltage is-500 V, the remaining air in the furnace is ionized to generate N + , H + ions, which impact the surface impurities to achieve the cleaning effect; after the cleaning is completed, H2 and N2 are started to be introduced, the flow rate is gradually increased with the increase of temperature, the flow rate ratio of N2:H2 is maintained to be 3:1, and the substrate negative bias is gradually increased; when the heating temperature reaches 450℃, the temperature, voltage, pressure and gas flow rate are set for the heat preservation and nitriding, and the nitriding time is 6 h. After the nitriding is completed, the furnace is cooled and waits for use;

[0134] The lock head is placed on the rotating frame in the arc ion plating film machine, the automatic vacuum drawing mode is started after the furnace door is closed, the auxiliary heating electric heating wire in the furnace is started when the vacuum is drawn to 5×10 -3 Pa, gradient heating is started, the heating temperature is set to be 280℃, the temperature is increased to the set value, and the temperature is maintained for 25 min, then the heating temperature is set to be 450℃, and the plating process is started after the temperature is increased to 450℃. The plating process is as follows: first, the mixed gas of Ar+H2 with a flow rate of 200 sccm is introduced into the furnace, the pressure in the furnace is maintained to be 0.8 Pa, the arc etching Ti target is started to etch and clean the surface of the lock head, the substrate bias is set to be-100 V, and the arc etching target is closed after the etching and cleaning are completed. Then, Ar is introduced alone, the pressure in the furnace is set to be 1.5 Pa, the Cr target arc is started, the target material voltage is 30 V, the current is 100 A, the single-element Cr is plated on the surface of the workpiece, the plating time is 10 min, then N2 is introduced into the furnace, the pressure is maintained to be 1.5 Pa, the CrN transition layer is continuously prepared on the surface, the plating time is 40 min, the Cr target arc is closed after the preparation is completed, and the N2 channel is closed;

[0135] The temperature in the furnace is reduced to 150℃, Ar is started to be introduced, the pressure in the furnace is controlled to be 0.4 Pa, the C target arc is started, the substrate bias is-250 V, the bias pulse frequency is 50 kHz, the diamond-like carbon coating is prepared, and the plating time is 40 min.

[0136] Embodiment 3

[0137] The embodiment 3 of the present application provides a lock head structure and a preparation method.

[0138] A lock head structure, comprising a lock head body of 35CrMnSi material and a protective layer arranged on the surface of the lock head body, wherein the protective layer comprises, from inside to outside, a nitriding layer, a Cr layer, a CrN layer and a diamond-like carbon layer.

[0139] The nitriding layer has a thickness of 0.2 mm.

[0140] The Cr layer has a thickness of 0.1 μm.

[0141] The CrN layer has a thickness of 1.0 μm.

[0142] The diamond-like carbon layer has a thickness of 1.0 μm.

[0143] A preparation method of a lock head structure, comprising the following steps:

[0144] The surface of the lock head after heat treatment is subjected to sand blasting treatment by using a sand blasting machine, the sand blasting distance is 20 cm, the sand blasting angle is 60°, the sand blasting pressure is 0.4 MPa, the sand particle diameter used is 320 mesh, and the surface after sand blasting treatment is free of rust and oil stains, and fresh metal is exposed. Subsequently, the surface is cleaned by using anhydrous ethanol in an ultrasonic cleaning device for 20 min.

[0145] The lock head is placed in an ion nitriding furnace, vacuum is drawn after the furnace door is closed, arc cleaning is started when the vacuum degree is drawn to 60 Pa, that is, the voltage difference between the workpiece and the furnace wall is increased, the substrate voltage is-200 V, N + , H + ions are generated by ionization of the remaining air in the furnace, so as to achieve the cleaning effect; after the cleaning is completed, H2 and N2 are introduced, the flow rate is gradually increased with the increase of temperature, the flow rate ratio of N2:H2 is maintained at 3:1, and the substrate negative bias is gradually increased; when the heating temperature reaches 400℃, the holding temperature, voltage, pressure and gas flow rate are set, and then the holding nitriding is started, the nitriding time is 5 h. After the nitriding is completed, the furnace is cooled and then used;

[0146] The lock head is placed on the rotating frame in the arc ion plating film machine, the automatic vacuum drawing mode is started after the furnace door is closed, the vacuum is drawn to 5x10 -3Pa, the auxiliary heating electric heating wire in the furnace is turned on, gradient heating is performed, the heating temperature is first set to 270 DEG C, the temperature is kept at the set value for 20 min, then the heating temperature is set to 400 DEG C, and after the temperature is raised to 460 DEG C, the film plating process is performed. The film plating process is as follows: first, the mixed gas of Ar and H2 with a flow rate of 180 sccm is introduced into the furnace, the pressure in the furnace is kept at 0.5 Pa, the etching Ti target arc is turned on to etch and clean the surface of the lock head, the substrate bias is set to -30 V, after the etching and cleaning are completed, the etching target arc is turned off. Then, Ar is introduced alone, the pressure in the furnace is set to 1.0 Pa, the Cr target arc is turned on, the target voltage is 20 V, the current is 80 A, the elemental Cr is plated on the surface of the workpiece, the plating time is 15 min, then N2 is introduced into the furnace, the pressure is kept at 1.0 Pa, the CrN transition layer is prepared on the surface, the plating time is 50 min, after the completion, the Cr target arc is turned off, and the N2 channel is closed;

[0147] The temperature in the furnace is reduced to 100 DEG C, Ar is introduced, the pressure in the furnace is controlled to 0.1 Pa, the C target arc is turned on, the substrate bias is -200 V, the bias pulse frequency is 30 kHz, the diamond-like coating is prepared, and the plating time is 30 min.

[0148] Embodiment 4

[0149] The embodiment 4 of the present application provides a lock head structure and a preparation method.

[0150] A lock head structure includes a lock head body of 35CrMnSi material and a protective layer arranged on the surface of the lock head body, wherein the protective layer includes, from inside to outside, a nitriding layer, a Cr layer, a CrN layer, and a diamond-like layer.

[0151] The nitriding layer has a thickness of 0.3 mm;

[0152] The Cr layer has a thickness of 0.2 μm;

[0153] The CrN layer has a thickness of 0.5 μm; and

[0154] The diamond-like layer has a thickness of 2 μm.

[0155] A preparation method of a lock head structure includes the following steps:

[0156] A sandblasting machine is used to perform sandblasting treatment on the surface of the lock head after heat treatment, the sandblasting distance is 30 cm, the sandblasting angle is 90 DEG, the sandblasting pressure is 0.8 MPa, the sand particle diameter used is 500 mesh, and after the sandblasting treatment, the surface is free of rust and oil stains, and fresh metal is exposed. Then, the surface is cleaned by anhydrous ethanol in an ultrasonic cleaning device for 30 min.

[0157] Put the lock head into the ion nitriding furnace, close the furnace door, and then perform vacuum pumping. When the vacuum degree reaches 80 Pa, start arc cleaning, that is, increase the voltage difference between the workpiece and the furnace wall, the substrate voltage is -700 V, and the residual air in the furnace is ionized to generate N + 、H + ions to impact the surface impurities, thereby achieving the cleaning effect. After cleaning is completed, start flowing H2 and N2. As the temperature increases, gradually increase the flow rate, maintain the flow rate ratio of H2:N2 as 3:1, and gradually increase the substrate negative bias voltage. When the heating temperature reaches 500℃, set the holding temperature, voltage, pressure, and gas flow rate, and then start the holding nitriding process. The nitriding time is 8h. After nitriding is completed, cool down in the furnace and wait for use;

[0158] Put the lock head on the trolley in the arc ion plating film machine, close the furnace door, and then start automatic vacuum pumping. When the vacuum degree reaches 5x10 -3 Pa, turn on the auxiliary heating wire in the furnace for gradient heating. First, set the heating temperature to 300℃. After the temperature rises to the set value, hold for 30 min. Then, set the heating temperature to 470℃. After the temperature rises to 470℃, perform the film plating process. The film plating process is as follows. First, flow Ar+H2 mixed gas into the furnace at a flow rate of 220sccm, maintain the furnace pressure at 1.0 Pa, turn on the etching Ti target arc to etch and clean the surface of the lock head, and set the substrate bias voltage to -150 V. After etching and cleaning is completed, turn off the etching target arc. Then, flow Ar alone into the furnace, set the furnace pressure to 2.0 Pa, turn on the Cr target arc, set the target material voltage to 40 V and the current to 120 A, and plating elemental Cr on the surface of the workpiece. The plating time is 5 min. Then, flow N2 into the furnace, maintain the pressure at 2 Pa, and continue to prepare a CrN transition layer on the surface. The plating time is 30 min. After completion, turn off the Cr target arc and the N2 channel.

[0159] Reduce the furnace temperature to 200℃, open the Ar inlet, control the furnace pressure to 0.5 Pa, turn on the C target arc, and set the substrate bias voltage to -300 V. The bias voltage pulse frequency is 80 kHz. Prepare a diamond-like carbon coating layer. The plating time is 50 min.

[0160] Comparative Example 1

[0161] The present application provides a lock head structure, which is similar to Example 1, except that it does not contain a nitriding layer and a transition layer.

[0162] Comparative Example 2

[0163] The present application provides a lock head structure, which is similar to Example 1, except that it does not contain a diamond-like carbon layer.

[0164] Comparative Example 3

[0165] The lock head structure of the present application comparative example 3 only contains a lock head body.

[0166] The hardness and friction coefficient of the lock head structures of examples 1 to 4 and comparative examples 1 to 4 were tested, and the results are shown in Table 1. The hardness was tested by the Vickers hardness test method, and the friction coefficient was tested by a friction and wear tester. The friction coefficient graph of example 1 is shown in Figure 4 The friction coefficient graph of comparative example 1 is shown in Figure 5 The friction coefficient graph of comparative example 2 is shown in Figure 6 The friction coefficient graph of comparative example 3 is shown in Figure 7

[0167] Table 1 Performance of the lock head structures of examples 1 to 4 and comparative examples 1 to 3

[0168] Hardness (HV) Average coefficient of friction Example 1 2235 0.20 Example 2 2194 0.22 Example 3 2157 0.20 Example 4 2203 0.21 Comparative Example 1 2204 0.25 Comparative Example 2 1800 0.49 Comparative Example 3 612 0.63

[0169] Comparative example 1 does not contain a nitriding layer and a transition layer, and the hardness is close to that of the examples, but the friction coefficient is larger than that of example 1. This is because there is no transition layer, the bonding force of the DLC functional layer is low, and wear occurs easily during wear, leading to coating failure. The change in the friction coefficient of comparative example 1 also reflects this. When the friction time is about 5 min, the friction coefficient rises sharply, which is due to the damage of the coating.

[0170] Comparative example 2 does not contain a diamond-like layer, and the friction coefficient of the lock head is smaller than that of the lock head without a protective layer, but larger than that of the lock head with all DLC coatings.

[0171] Comparative example 3 does not contain a protective layer, so its hardness is low and its friction coefficient is high, and the friction coefficient fluctuates greatly and tends to increase gradually, indicating that the surface condition gradually deteriorates as the friction experiment progresses. In actual working conditions, the friction coefficient increases with the number of uses, which is more detrimental to the unlocking of the lock box mechanism.

[0172] As can be seen from the above, the diamond-like layer has high hardness and low friction coefficient, which can on the one hand strengthen the strength of the lock head contact surface and reduce wear caused by long-term friction, and on the other hand effectively reduce the friction force, thereby reducing the external force required for unlocking the lock box, reducing the excessive contact force on the contact surface due to local deformation, and preventing the situation of excessive unlocking friction torque and jamming. The surface hardness and elastic modulus of the metal material are improved after ion nitriding treatment, so the surface deformation is smaller under the same force, which provides good support for the diamond-like layer, reduces the hardness discontinuity between the diamond-like layer and the substrate, reduces the probability of collapse of the diamond-like layer under extrusion, and reduces the probability of lock head jamming.

[0173] ​In the description of the specification, the description of the terms "one embodiment / way", "some embodiments / ways", "an example", "a specific example" or "some examples" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment / way or example are included in at least one embodiment / way or example of the present application. In the specification, the illustrative description of the above terms does not necessarily refer to the same embodiment / way or example. Also, the specific features, structures, materials or characteristics described can be combined in any appropriate manner in one or more embodiments / ways or examples. In addition, the person skilled in the art can combine and combine the different embodiments / ways or examples described in the specification and the features of the different embodiments / ways or examples, without contradiction.

[0174] It should be noted that in the present application, the relationship terms such as "first" and "second" are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between the entities or operations. Moreover, the terms "include", "contain" or any other variant thereof are intended to cover non-exclusive inclusion, so that the process, method, article or device including a series of elements not only includes those elements, but also includes other elements not explicitly listed or inherent to such process, method, article or device. Without more limitations, the element defined by the statement "including a" does not exclude the presence of another identical element in the process, method, article or device including the element. In the present application, the meaning of "a plurality of" is at least two, for example two, three, etc., unless otherwise explicitly specified.

[0175] The above is only a specific embodiment of the present application, which enables those skilled in the art to understand or implement the present application. Various modifications of these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the present application. Therefore, the present application will not be limited to these embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features applied herein.

Claims

1. A lock cylinder structure, characterized by, The lock head structure comprises a lock head body and a protective layer arranged on the surface of the lock head body, wherein the protective layer comprises, from inside to outside, a nitriding layer, a transition layer, and a diamond-like carbon layer. The nitriding layer; The transition layer, the material of the transition layer comprising Cr and CrN; and The diamond-like carbon layer; The transition layer comprises, from inside to outside, a Cr layer and a CrN layer, the thickness of the Cr layer being 0.1-0.2 μm; and / or the thickness of the CrN layer being 0.5-1 μm; The thickness of the diamond-like carbon layer is 1-2 μm.

2. The lock cylinder structure of claim 1 wherein, The thickness of the nitriding layer is 0.2-0.3 mm; and / or The material of the lock head body comprises at least one of 35CrMnSi and 42CrMo.

3. A method of producing a lock cylinder structure as claimed in claim 1 or 2, characterized in that The method comprises the following steps: carrying out ion nitriding treatment on the surface of the lock head body to obtain a nitriding layer; applying a material of the transition layer on the surface of the nitriding layer to obtain a transition layer; applying a diamond-like carbon material on the surface of the transition layer to form a diamond-like carbon layer, thereby obtaining a lock head structure.

4. The method of claim 3, wherein the lock cylinder structure is prepared by the steps of: In the step of carrying out ion nitriding treatment on the surface of the lock head body to obtain a nitriding layer: The temperature of ion nitriding is 400-500 ℃; and / or The voltage of ion nitriding is -200 to -700 V; and / or The pressure of ion nitriding is 250-300 Pa; and / or The time of ion nitriding is 5-8 h.

5. The method for preparing the lock head structure as described in claim 3, characterized in that, In the step of applying a material of the transition layer on the surface of the nitriding layer to obtain a transition layer: applying a Cr layer material on the surface of the nitriding layer to obtain a Cr layer; depositing CrN on the surface of the Cr layer to form a CrN layer, thereby obtaining a transition layer.

6. The method for preparing the lock head structure according to claim 3, wherein: The substrate bias voltage for applying the Cr layer is 20-40 V; and / or The target current for applying the Cr layer is 80-120 A; and / or The film deposition time for applying the Cr layer is 5-15 min; and / or The pressure in the furnace for applying the Cr layer is 1-2 Pa; and / or The temperature for applying the Cr layer is 450-470 ℃; and / or The time for forming the CrN layer is 30-50 min.

7. The method for preparing the lock head structure as described in claim 3, characterized in that, In the step of applying a diamond-like carbon material on the surface of the transition layer to form a diamond-like carbon layer, thereby obtaining a lock head structure: The temperature for applying is 100-200 ℃; and / or The time for applying is 30-50 min; and / or The substrate bias voltage for applying is -200 to -300 V; and / or The bias pulse frequency for applying is 30-80 kHz; and / or The pressure in the furnace for applying is 0.1-0.5 Pa.

8. A lock mechanism characterized by, The lock head structure comprises the lock head structure according to claim 1 or 2, or the lock head structure prepared by the method according to any one of claims 3 to 7.

9. A container transport system characterized by The lock box mechanism comprises the lock head structure according to claim 8.

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