Metal material polishing equipment

Abstract

The invention discloses a metal material polishing device, which relates to the technical field of metal material processing and comprises a protective cover, wherein a fixing ring is fixedly connected at the corners of the protective cover, and a cylinder is fixedly connected at the inner cavity of the fixing ring. The setting of the protective cover can block the debris and polishing wax residue generated during the polishing of the metal material to prevent them from splashing around and causing damage to the operator; the inner side surface of the cylinder is fixedly connected to a polishing wax clamping mechanism, and by setting the polishing wax clamping mechanism, the polishing wax required for polishing can be clamped, and the polishing wax can be in contact with the polishing mechanism during the polishing process, so that the metal material is always in contact with the polishing wax during the polishing process, and there is no need to apply the polishing wax after polishing for a period of time. The polishing wax clamping mechanism comprises a track frame, and the track frame is fixedly connected to the inner side surface of the cylinder to achieve the effect of always being in contact with the polishing wax during the polishing process.

Description

Technical Field

[0001] The invention relates to the technical field of metal material processing, in particular to a metal material polishing device. Background Art

[0002] Metal polishing is a gorgeous journey of transformation. In this wonderful process, craftsmen use their superb skills and patience to give metals new life. When metal products are placed on the polishing table, craftsmen hold polishing tools and gently brush across the metal surface, as if they are having a spiritual dialogue with the metal. Under their careful polishing, the flaws on the metal surface are gradually erased, and layer after layer of luster gradually emerges. From the initial dullness to the gradual shining of charming light, every subtle change is amazing. Metal polishing is not only a beautification of the appearance, but also an improvement of the quality. Polished metal is not only more beautiful, but also more durable and can withstand the test of time. In this process, the sweat and wisdom of the craftsmen are condensed on every inch of polished metal, making them true works of art;

[0003] When metal is polished, polishing wax is needed. The use of polishing wax can remove dirt and impurities on the metal surface when the grinder comes into contact with the metal material. However, the polishing machines on the market need to apply polishing wax regularly when working, and they do not have the effect of always being in contact with polishing wax during the working process. Summary of the invention

[0004] To achieve the above objectives, the present invention is implemented through the following technical solutions: a metal material polishing device, comprising a protective cover, a fixing ring is fixedly connected at the corner of the protective cover, a cylinder is fixedly connected at the inner cavity of the fixing ring, and the setting of the protective cover can block the debris and polishing wax residue generated during the polishing of the metal material to prevent them from splashing around and causing damage to the operator;

[0005] The inner side surface of the cylinder is fixedly connected with a polishing wax clamping mechanism. By setting the polishing wax clamping mechanism, the polishing wax required for polishing can be clamped, and the polishing wax can be in contact with the polishing mechanism during the polishing process, so that the metal material is always in contact with the polishing wax during the polishing process, and there is no need to apply polishing wax after polishing for a period of time. The polishing wax clamping mechanism includes a track frame, which is fixedly connected to the inner side surface of the cylinder, and a sliding plate is slidably connected to the inner cavity of the track frame. The outer surface of the sliding plate is fixedly connected with a first limiting rod, and the end of the first limiting rod away from the sliding plate is rotatably connected with the columnar polishing wax. The setting of the track frame can limit the sliding plate, so that the sliding plate can move stably in the inner cavity of the track frame. The setting of the first limiting rod can limit the columnar polishing wax, so that the columnar polishing wax can rotate, and then the columnar polishing wax can be used evenly when it contacts with the polishing mechanism.

[0006] The upper surface of the cylinder away from the end of the polishing wax clamping mechanism is fixedly connected to a first support rod, and the end of the first support rod away from the cylinder is fixedly connected to a position adjustment device. By setting the position adjustment device, when the polishing wax is reduced during use and the polishing mechanism and the polishing wax are out of contact, the polishing mechanism and the polishing wax can be brought into contact by pressing by an operator, and the position adjustment device includes a track box, which is fixedly connected to the end of the first support rod away from the cylinder, and a sliding rod is slidably connected to the inner cavity of the track box;

[0007] One end of the sliding rod located on the outer surface of the track box is fixedly connected with a polishing mechanism. By setting the polishing mechanism, it can contact with the polishing wax clamping mechanism, so as to perform polishing treatment on the metal material.

[0008] Preferably, a second support rod is fixedly connected to one side of the outer surface of the track box close to the protective cover, a handle is fixedly connected to the end of the second support rod, and a breathable screen plate is fixedly connected to the inner wall of the protective cover. The setting of the handle can facilitate the operator to hold the mechanism and move the device on the outer surface of the metal material, and the setting of the breathable screen plate can block and collect debris and polishing wax residue generated during polishing.

[0009] Preferably, there are two polishing wax clamping mechanisms, and the two polishing wax clamping mechanisms are respectively and parallelly arranged on both sides of the polishing mechanism. The arrangement of the two polishing wax clamping mechanisms allows both sides of the polishing mechanism to be in contact with the polishing wax.

[0010] Preferably, a threaded ring is fixedly connected to the outer surface of the track frame, a threaded rod is threadedly connected to the inner cavity of the threaded ring, an end of the threaded rod passes through the track frame and extends to the inner cavity of the track frame, the end of the threaded rod is squeezed and fitted with the outer surface of the sliding plate, and the setting of the threaded ring can limit the threaded rod, so that when the threaded rod is rotated, the end of the threaded rod can squeeze the sliding plate, so that it can still contact the polishing mechanism after the polishing wax is consumed.

[0011] Preferably, the outer surface of the sliding rod is fixedly connected to a second limit rod, and the end of the second limit rod is rotatably connected to an anti-slip wheel, and the anti-slip wheel is frictionally adapted to the inner wall of the track box. The setting of the anti-slip wheel can rotate on the outer surface of the second limit rod and make the sliding rod slide stably in the inner cavity of the track box.

[0012] Preferably, the upper surface and the lower surface of the sliding rod are fixedly connected with a spring, and the end of the spring away from the sliding rod is fixedly connected to the inner wall of the track box. The setting of the spring can generate elastic potential energy, so that the sliding rod will only be in the middle of the track box, and the sliding rod will only move when the operator presses it.

[0013] Preferably, the polishing mechanism includes a fixed frame and a support plate, the fixed frame is fixedly connected to the end of the sliding rod on one side, the support plate is fixedly connected to the end of the sliding rod on the other side, the lower surface of the fixed frame is fixedly connected to a fixed frame, the inner cavity of the fixed frame is fixedly connected to a servo motor, the output end of the servo motor is fixedly connected to a first rotating rod via a coupling, and the servo motor is arranged to cause the first rotating rod to rotate after being connected to a power source.

[0014] Preferably, the end of the first rotating rod is fixedly connected to a polishing barrel, the bottom end of the support plate is fixedly connected to a limiting frame, a rotating ball is rotatably connected to the inner cavity of the limiting frame, the setting of the limiting frame can limit the rotating ball so that the rotating ball can rotate stably in the inner cavity of the limiting frame, the outer surface of the rotating ball is fixedly connected to a second rotating rod, the end of the second rotating rod is fixedly connected to a side of the polishing barrel away from the first rotating rod, the setting of the polishing barrel can also generate rotation when the first rotating rod rotates.

[0015] The present invention provides a metal material polishing device having the following beneficial effects:

[0016] 1. The metal material polishing equipment can clamp the polishing wax required for polishing by providing a polishing wax clamping mechanism, and enable the polishing wax to contact with the polishing mechanism during the polishing process, so that the metal material is always in contact with the polishing wax during the polishing process, and there is no need to apply polishing wax after polishing for a period of time.

[0017] 2. The metal material polishing equipment can limit the sliding plate through the setting of the track frame, so that the sliding plate can move stably in the inner cavity of the track frame. The setting of the first limiting rod can limit the columnar polishing wax, so that the columnar polishing wax can rotate, and then the columnar polishing wax can be used evenly when it comes into contact with the polishing mechanism.

[0018] 3. The metal material polishing equipment is provided with a position adjustment device. When the polishing wax is reduced during use and the polishing mechanism is out of contact with the polishing wax, the operator can press to achieve the effect of making the polishing mechanism and the polishing wax contact. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 This is a schematic diagram of the external structure of a metal material polishing device of the present invention;

[0020] Figure 2 This is a schematic diagram of the bottom structure of a metal material polishing device according to the present invention;

[0021] Figure 3 It is a partial structural schematic diagram of a metal material polishing device of the present invention;

[0022] Figure 4 This is a schematic diagram of the polishing wax clamping mechanism of the present invention;

[0023] Figure 5 It is a structural schematic diagram of the position adjustment device of the present invention;

[0024] Figure 6 It is a schematic diagram of the polishing mechanism structure of the present invention.

[0025] In the figure: 1. protective cover; 2. fixed ring; 3. cylinder; 4. first support rod; 5. polishing wax clamping mechanism; 6. position adjustment device; 7. polishing mechanism; 8. second support rod; 9. handle; 10. breathable screen plate; 51. track frame; 52. sliding plate; 53. first limit rod; 54. cylindrical polishing wax; 55. threaded ring; 56. threaded rod; 61. track box; 62. sliding rod; 63. second limit rod; 64. anti-skid wheel; 65. spring; 71. fixed frame; 72. fixed frame; 73. servo motor; 74. first rotating rod; 75. polishing barrel; 76. support plate; 77. limit frame; 78. rotating ball; 79. second rotating rod. DETAILED DESCRIPTION

[0026] The present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. The embodiments of the present invention are provided for the purpose of illustration and description, and are not intended to be exhaustive or to limit the present invention to the disclosed forms. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiments are selected and described in order to better illustrate the principles and practical applications of the present invention, and to enable those of ordinary skill in the art to understand the present invention and thereby design various embodiments with various modifications suitable for specific uses.

[0027] The first embodiment, as Figure 1-Figure 4 As shown, the present invention provides a technical solution: a metal material polishing device, comprising a protective cover 1, a fixing ring 2 is fixedly connected to the corner of the protective cover 1, and a cylinder 3 is fixedly connected to the inner cavity of the fixing ring 2. The setting of the protective cover 1 can block the debris and polishing wax residue generated during the polishing of the metal material to prevent them from splashing around and causing damage to the operator;

[0028] The inner side surface of the cylinder 3 is fixedly connected with a polishing wax clamping mechanism 5. By setting the polishing wax clamping mechanism 5, the polishing wax required for polishing can be clamped, and the polishing wax can be in contact with the polishing mechanism 7 during the polishing process, so that the metal material is always in contact with the polishing wax during the polishing process, and it is no longer necessary to apply the polishing wax after polishing for a period of time. The polishing wax clamping mechanism 5 includes a track frame 51, which is fixedly connected to the inner side surface of the cylinder 3, and a sliding plate 52 is slidably connected to the inner cavity of the track frame 51. The outer surface of the sliding plate 52 is fixedly connected with a first limiting rod 53, and one end of the first limiting rod 53 away from the sliding plate 52 is rotatably connected with a columnar polishing wax 54. The setting of the track frame 51 can limit the sliding plate 52, so that the sliding plate 52 can move stably in the inner cavity of the track frame 51. The setting of the first limiting rod 53 can limit the columnar polishing wax 54, so that the columnar polishing wax 54 can rotate, and then when it contacts with the polishing mechanism 7, the columnar polishing wax 54 can be used evenly;

[0029] The upper surface of the cylinder 3 away from the polishing wax clamping mechanism 5 is fixedly connected with a first support rod 4, and the end of the first support rod 4 away from the cylinder 3 is fixedly connected with a position adjustment device 6. By setting the position adjustment device 6, when the polishing wax is reduced during use and the polishing mechanism 7 is out of contact with the polishing wax, the polishing mechanism 7 can be made to contact with the polishing wax by pressing by an operator. The position adjustment device 6 includes a track box 61, which is fixedly connected to the end of the first support rod 4 away from the cylinder 3, and a sliding rod 62 is slidably connected to the inner cavity of the track box 61;

[0030] One end of the sliding rod 62 located on the outer surface of the track box 61 is fixedly connected with a polishing mechanism 7. By setting the polishing mechanism 7, it can contact with the polishing wax clamping mechanism 5, so as to perform polishing treatment on the metal material.

[0031] A second support rod 8 is fixedly connected to one side of the outer surface of the track box 61 close to the protective cover 1, and a handle 9 is fixedly connected to the end of the second support rod 8. A breathable screen plate 10 is fixedly connected to the inner wall of the protective cover 1. The setting of the handle 9 can facilitate the operator to hold the mechanism and move the device on the outer surface of the metal material. The setting of the breathable screen plate 10 can block and collect the debris and polishing wax residue generated during polishing.

[0032] The number of the polishing wax clamping mechanisms 5 is two, and the two polishing wax clamping mechanisms 5 are respectively arranged in parallel on both sides of the polishing mechanism 7. The arrangement of the two polishing wax clamping mechanisms 5 allows both sides of the polishing mechanism 7 to contact with the polishing wax. The outer surface of the track frame 51 is fixedly connected with a threaded ring 55, and the inner cavity of the threaded ring 55 is threadedly connected with a threaded rod 56. The end of the threaded rod 56 penetrates the track frame 51 and extends to the inner cavity of the track frame 51. The end of the threaded rod 56 is pressed against the outer surface of the sliding plate 52 to fit the outer surface of the sliding plate 52. The setting of the threaded ring 55 can limit the threaded rod 56, so that when the threaded rod 56 is rotated, the end of the threaded rod 56 can squeeze the sliding plate 52, so that after the polishing wax is consumed, it can still contact the polishing mechanism 7. When in use, the operator rotates the threaded rod 56 to make the threaded rod 56 rotate in the inner cavity of the threaded ring 55, and makes the end of the threaded rod 56 squeeze the sliding plate 52, so that the sliding plate 52 drives the first limiting rod 53 and the columnar polishing wax 54 to move toward the direction of the polishing mechanism 7.

[0033] The second embodiment, as Figure 5As shown, the outer surface of the sliding rod 62 is fixedly connected with a second limiting rod 63, and the end of the second limiting rod 63 is rotatably connected with an anti-skid wheel 64, and the anti-skid wheel 64 is frictionally adapted to the inner wall of the track box 61. The setting of the anti-skid wheel 64 can rotate on the outer surface of the second limiting rod 63 and make the sliding rod 62 stably slide in the inner cavity of the track box 61. The upper and lower surfaces of the sliding rod 62 are fixedly connected with a spring 65, and the end of the spring 65 away from the sliding rod 62 is fixedly connected to the inner wall of the track box 61. The setting of the spring 65 can generate elastic potential energy, so that the sliding rod 62 will only be in the middle of the track box 61, and the sliding rod 62 will only move when the operator presses it. During use, after the columnar polishing wax 54 is consumed, the operator presses the handle 9. During the pressing process, the sliding rod 62 moves in the inner cavity of the track box 61, thereby shortening the distance between the columnar polishing wax 54 and the polishing mechanism 7, so that the columnar polishing wax 54 can be contacted.

[0034] The third embodiment, as Figure 6 As shown, the polishing mechanism 7 includes a fixed frame 71 and a support plate 76, the fixed frame 71 is fixedly connected to the end of the sliding rod 62 on one side, and the support plate 76 is fixedly connected to the end of the sliding rod 62 on the other side, the lower surface of the fixed frame 71 is fixedly connected to a fixed frame 72, the inner cavity of the fixed frame 72 is fixedly connected to a servo motor 73, the output end of the servo motor 73 is fixedly connected to a first rotating rod 74 through a coupling, the servo motor 73 is set, can make the first rotating rod 74 rotate after the power is connected, the end of the first rotating rod 74 is fixedly connected to a polishing barrel 75, the bottom end of the support plate 76 is fixedly connected to a limiting frame 77, the inner cavity of the limiting frame 77 is rotatably connected to a rotating The moving ball 78 and the setting of the limit frame 77 can limit the rotating ball 78 so that the rotating ball 78 can stably rotate in the inner cavity of the limit frame 77. The outer surface of the rotating ball 78 is fixedly connected to a second rotating rod 79. The end of the second rotating rod 79 is fixedly connected to the side of the polishing barrel 75 away from the first rotating rod 74. The setting of the polishing barrel 75 can also rotate when the first rotating rod 74 rotates. When in use, the operator connects the servo motor 73 to the power supply and turns on the switch of the servo motor 73, so that the first rotating rod 74 drives the polishing barrel 75 to rotate. During the rotation process, the rotating ball 78 at the end of the second rotating rod 79 rotates in the inner cavity of the limit frame 77, so that the polishing barrel 75 produces stable rotation.

[0035] When in use, the operator rotates the threaded rod 56 so that the threaded rod 56 rotates in the inner cavity of the threaded ring 55, and the end of the threaded rod 56 presses the sliding plate 52, so that the sliding plate 52 drives the first limiting rod 53 and the columnar polishing wax 54 to move toward the direction of the polishing mechanism 7;

[0036] After the columnar polishing wax 54 is consumed, the operator presses the handle 9, and during the pressing process, the sliding rod 62 moves in the inner cavity of the track box 61, thereby shortening the distance between the columnar polishing wax 54 and the polishing mechanism 7, so that the columnar polishing wax 54 can be contacted;

[0037] The operator connects the servo motor 73 to a power source and turns on the switch of the servo motor 73, so that the first rotating rod 74 drives the polishing barrel 75 to rotate. During the rotation, the rotating ball 78 at the end of the second rotating rod 79 rotates in the inner cavity of the limit frame 77, so that the polishing barrel 75 rotates stably.

[0038] Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field and related fields without creative work should fall within the scope of protection of the present invention. The structures, devices and operating methods not specifically described and explained in the present invention are implemented according to the conventional means in the field unless otherwise specified and limited.

Claims

1. A metal material polishing device, characterized in that: include: A protective cover (1), wherein a fixing ring (2) is fixedly connected to the corners of the protective cover (1), and a cylinder (3) is fixedly connected to the inner cavity of the fixing ring (2); The inner side surface of the cylinder (3) is fixedly connected to a polishing wax clamping mechanism (5), and the polishing wax clamping mechanism (5) comprises a track frame (51), the track frame (51) is fixedly connected to the inner side surface of the cylinder (3), a sliding plate (52) is slidably connected to the inner cavity of the track frame (51), a first limiting rod (53) is fixedly connected to the outer surface of the sliding plate (52), and a columnar polishing wax (54) is rotatably connected to one end of the first limiting rod (53) away from the sliding plate (52); A threaded ring (55) is fixedly connected to the outer surface of the track frame (51), a threaded rod (56) is threadedly connected to the inner cavity of the threaded ring (55), an end of the threaded rod (56) passes through the track frame (51) and extends to the inner cavity of the track frame (51), and the end of the threaded rod (56) is pressed and matched with the outer surface of the sliding plate (52); A first support rod (4) is fixedly connected to the upper surface of one end of the cylinder (3) away from the polishing wax clamping mechanism (5); a position adjustment device (6) is fixedly connected to the end of the first support rod (4) away from the cylinder (3); the position adjustment device (6) comprises a track box (61); the track box (61) is fixedly connected to the end of the first support rod (4) away from the cylinder (3); a sliding rod (62) is slidably connected to the inner cavity of the track box (61); One end of the sliding rod (62) located on the outer surface of the track box (61) is fixedly connected to a polishing mechanism (7); The outer surface of the sliding rod (62) is fixedly connected to a second limiting rod (63), the end of the second limiting rod (63) is rotatably connected to an anti-skid wheel (64), and the anti-skid wheel (64) is frictionally matched with the inner wall of the track box (61); The upper surface and the lower surface of the sliding rod (62) are both fixedly connected to a spring (65), and one end of the spring (65) away from the sliding rod (62) is fixedly connected to the inner wall of the track box (61); The polishing mechanism (7) comprises a fixing frame (71) and a supporting plate (76), wherein the fixing frame (71) is fixedly connected to the end of the sliding rod (62) on one side, and the supporting plate (76) is fixedly connected to the end of the sliding rod (62) on the other side, and the lower surface of the fixing frame (71) is fixedly connected to a fixing frame (72), and the inner cavity of the fixing frame (72) is fixedly connected to a servo motor (73), and the output end of the servo motor (73) is fixedly connected to a first rotating rod (74) via a coupling; The end of the first rotating rod (74) is fixedly connected to a polishing barrel (75), the bottom end of the support plate (76) is fixedly connected to a limit frame (77), a rotating ball (78) is rotatably connected to the inner cavity of the limit frame (77), the outer surface of the rotating ball (78) is fixedly connected to a second rotating rod (79), and the end of the second rotating rod (79) is fixedly connected to a side of the polishing barrel (75) away from the first rotating rod (74).

2. A metal material polishing device according to claim 1, characterized in that: A second support rod (8) is fixedly connected to a side of the outer surface of the track box (61) close to the protective cover (1), a handle (9) is fixedly connected to the end of the second support rod (8), and a breathable screen plate (10) is fixedly connected to the inner wall of the protective cover (1).

3. A metal material polishing device according to claim 1, characterized in that: The number of the polishing wax clamping mechanisms (5) is two, and the two polishing wax clamping mechanisms (5) are respectively arranged in parallel on both sides of the polishing mechanism (7).

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