Multipole magnetic coil charged particle beam scanning device and method

Abstract

The application provides a multi-pole magnetic coil charged particle beam scanning device and method, which comprises a charged particle inlet, a charged particle buncher arranged on the output side of the charged particle inlet, a charged particle beam guiding pole flange arranged on the output side of the charged particle buncher, and a plurality of charged particle beam guiding devices arranged around the outer wall of the charged particle beam guiding pole flange; the charged particle buncher intersects with the movement direction of the charged particle beam, the charged particle buncher is provided with an axial magnetic field along the movement direction of the charged particle beam, the charged particle beam guiding device is arranged on one side of the movement direction of the charged particle beam, the charged particle beam guiding device comprises at least three magnetic poles close to the charged particle beam, and the magnetic properties of at least two magnetic poles of the three magnetic poles close to the charged particle beam are opposite; the application can accurately control the deflection direction of the charged particle beam, can expand the longitudinal charged particle beam coverage range of the vacuum arc charged particle coating, and can improve the coating uniformity.

Description

Technical Field

[0001] This invention relates to the field of vacuum arc ion plating technology, and in particular to a multi-pole magnetic coil charged particle beam scanning device and method. Background Technology

[0002] Vacuum cathodic arc deposition is a commonly used surface modification method. It utilizes arc discharge technology to create a high-density plasma near the cathode target, which is then deposited onto the surface of the workpiece to enhance its surface properties. While this deposition method offers advantages such as high deposition rate, dense film, high hardness, and good adhesion, the arc discharge process also releases a large number of large particles and impurities. These particles, deposited on the workpiece surface, increase the surface roughness of the film, reduce film performance, and limit its application in high-performance fields.

[0003] To improve thin film performance, the effects of large particles and impurities during vacuum deposition must be eliminated. In existing technologies, a common method for eliminating large particles and impurities is to install a filter between the cathode target and the deposition vacuum chamber, namely magnetic filtration vacuum cathode arc deposition technology. This technology is currently the most effective and widely used method for suppressing the influence of large particles during the deposition process.

[0004] While filtration devices can improve film performance, charged particles are concentrated by the magnetic field. Furthermore, the cross-sectional area of ​​the charged particle beam entering the vacuum chamber is relatively small due to the limited outlet area of ​​the filter. The beam intensity also exhibits a normal spatial distribution, resulting in uneven film thickness on the workpiece surface. This is especially true when the vacuum chamber is large, where the film thickness varies even more significantly at different locations within the chamber, severely limiting the application of this technology. Summary of the Invention

[0005] To address the problems existing in the prior art, the present invention provides a multi-pole magnetic coil charged particle beam scanning device and method to solve the technical problem of uneven film thickness during vacuum cathode arc coating in the prior art.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] A multi-pole magnetic coil charged particle beam scanning device includes a charged particle inlet and a charged particle beam concentrator disposed on the output side of the charged particle inlet. The output side of the charged particle beam concentrator is provided with a charged particle beam guiding flange, and a plurality of charged particle beam guiding devices are arranged around the outer wall of the charged particle beam guiding flange.

[0008] The charged particle clusterer intersects the direction of motion of the charged particle beam. The charged particle clusterer is provided with an axial magnetic field along the direction of motion of the charged particle beam. The charged particle beam guiding device is provided on one side of the direction of motion of the charged particle beam. The charged particle beam guiding device includes two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam.

[0009] Furthermore, the charged particle beam gatherer is connected to a DC power supply, and the plurality of charged particle beam guiding devices are all connected to an AC power supply.

[0010] Furthermore, the charged particle beam guiding device includes a charged particle beam guiding electrode and a charged particle beam guiding coil wound on the charged particle beam guiding electrode.

[0011] Furthermore, the charged particle beam guide electrode is a columnar structure, and the axial extension of the columnar charged particle beam guide electrode intersects with the direction of movement of the charged particle beam.

[0012] Furthermore, a charged particle beam guide coil is wound around the central region of the columnar structure.

[0013] Furthermore, the charged particle clusterer includes a charged particle clustering flange and a charged particle clustering coil wound on the charged particle clustering flange.

[0014] Furthermore, a charged particle emitting device is provided on the input side of the charged particle inlet.

[0015] Furthermore, it also includes a vacuum chamber located in the direction of movement of the charged particle beam, wherein the charged particle inlet and the charged particle clusterer are sealed together and are sealed into the vacuum chamber via the charged particle beam guide flange;

[0016] Inside the vacuum chamber, a sample holder for coating is positioned in the direction of motion of the charged particle beam.

[0017] Furthermore, a turntable is provided at the bottom of the coating sample holder.

[0018] A method for scanning charged particle beams using a multi-pole magnetic coil includes the following steps:

[0019] Direct current is supplied to the charged particle beam clusterer, and alternating current is supplied to the charged particle beam guiding device. The charged particle beam clusterer forms an axial magnetic field along the direction of movement of the charged particle beam, and the multiple charged particle beam guiding devices periodically form opposite magnetic fields near the magnetic poles of the charged particle beam's direction of movement.

[0020] The charged particle beam is directed to the charged particle beam guiding device within the axial magnetic field.

[0021] Based on the guidance requirements of charged particle beams, at least one charged particle beam guiding device is connected to an AC power source, and at least one charged particle beam guiding device has a magnetic pole near the direction of the electron beam that is opposite to the magnetic pole on the output side of the charged particle beam gatherer, and at least one charged particle beam guiding device has a magnetic pole near the direction of the electron beam that is the same as the magnetic pole on the output side of the charged particle beam gatherer.

[0022] As the charged particle beam passes through the charged particle beam guiding device connected to an AC power source, it periodically deflects upward and / or downward.

[0023] Compared with the prior art, the present invention has the following beneficial technical effects:

[0024] This invention provides a multi-pole magnetic coil charged particle beam scanning device and method, including a charged particle inlet and a charged particle beam concentrator disposed on the output side of the charged particle inlet. The output side of the charged particle beam concentrator is provided with a charged particle beam guiding flange, and a plurality of charged particle beam guiding devices are arranged around the outer wall of the charged particle beam guiding flange. The charged particle beam concentrator intersects with the direction of motion of the charged particle beam, and the charged particle beam concentrator is provided with an axial magnetic field along the direction of motion of the charged particle beam. The charged particle beam guiding devices are disposed on one side of the direction of motion of the charged particle beam, and each charged particle beam guiding device includes at least three magnetic poles close to the charged particle beam, wherein at least two of the three magnetic poles close to the charged particle beam have opposite magnetic properties. This application connects direct current to the charged particle beam concentrator and to the charged particle beam guiding devices... Alternating current is applied, and the charged particle beam gatherer forms an axial magnetic field along the direction of movement of the charged particle beam. Multiple charged particle beam guiding devices, near the magnetic poles of the charged particle beam's direction of movement, periodically form opposing magnetic fields. The charged particle beam is accelerated within the axial magnetic field and reaches the charged particle beam guiding device. Based on the guiding requirements of the charged particle beam, an AC power source is connected to at least one charged particle beam guiding device. When the charged particle beam passes through the AC-connected guiding device, it periodically deflects upwards and / or downwards, thereby changing its trajectory. By connecting AC power to different charged particle beam guiding devices, the deflection direction of the charged particle beam can be more accurately controlled, enabling targeted coating and expanding the longitudinal charged particle beam coverage of vacuum arc charged particle coating, thus improving coating uniformity. Attached Figure Description

[0025] Figure 1 A schematic diagram of the structure of a multi-pole magnetic coil charged particle beam scanning device according to an embodiment of the present disclosure is shown;

[0026] Figure 2 A schematic diagram of the structure of a charged particle beam guiding device according to an embodiment of the present disclosure is shown;

[0027] Figure 3 A longitudinal distribution diagram of a charged particle beam according to an embodiment of the present disclosure is shown.

[0028] In the attached diagram: 1. Charged particle inlet; 2. Charged particle beam gatherer; 5. Charged particle beam guide device; 51. Charged particle beam guide electrode; 52. Charged particle beam guide coil; 20. Charged particle beam gatherer flange; 3. Charged particle beam gatherer coil; 7. Vacuum chamber; 8. Coated sample holder; 9. Turntable; 4. Charged particle beam; 6. Charged particle beam guide electrode flange. Detailed Implementation

[0029] In the following description, only certain exemplary embodiments are briefly described. As those skilled in the art will recognize, the described embodiments can be modified in various ways without departing from the spirit or scope of the invention. Therefore, the drawings and description are considered to be exemplary in nature and not restrictive.

[0030] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, "a plurality of" means two or more, unless otherwise explicitly specified.

[0032] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0033] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0034] It should be understood that, when used in this specification and the appended claims, the terms "comprising" and "including" indicate the presence of the described features, integrals, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components and / or collections thereof.

[0035] It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the invention. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise.

[0036] It should also be further understood that the term "and / or" as used in this specification and the appended claims refers to any combination of one or more of the associated listed items and all possible combinations, and includes such combinations.

[0037] The accompanying drawings illustrate various structural schematic diagrams according to embodiments disclosed in this invention. These drawings are not to scale, and some details have been enlarged for clarity, and some details may have been omitted. The shapes of the various regions and layers shown in the drawings, as well as their relative sizes and positional relationships, are merely exemplary and may deviate from reality due to manufacturing tolerances or technical limitations. Furthermore, those skilled in the art can design regions / layers with different shapes, sizes, and relative positions as needed.

[0038] The embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0039] Figure 1 An embodiment of the present disclosure illustrates a multi-pole magnetic coil charged particle beam scanning device, such as... Figure 1As shown, it includes a charged particle inlet 1 and a charged particle clusterer 2 disposed on the output side of the charged particle inlet 1. A charged particle beam guiding flange 6 is disposed on the output side of the charged particle clusterer 2, and a plurality of charged particle beam guiding devices 5 are disposed around the outer wall of the charged particle beam guiding flange 6.

[0040] The charged particle cluster 2 intersects the direction of motion of the charged particle beam 4. The charged particle cluster 2 is provided with an axial magnetic field along the direction of motion of the charged particle beam 4. The charged particle beam guiding device 5 is provided on one side of the direction of motion of the charged particle beam 4. The charged particle beam guiding device 5 includes at least three magnetic poles close to the charged particle beam, and at least two of the three magnetic poles close to the charged particle beam have opposite magnetic properties.

[0041] It should be noted that in this embodiment, there are four charged particle beam guiding devices 5. However, those skilled in the art can set different numbers of charged particle beam guiding devices 5 according to actual production needs, that is, the offset direction of the charged particle beam 4. Furthermore, it should be noted that the arrangement of the multiple charged particle beam guiding devices 5 can be uniform or non-uniform. For example, when multiple charged particle beam guiding devices 5 are arranged in a concentrated manner, the force received by the electron beam 4 in that region will be stronger, and vice versa.

[0042] It should be further noted that in some embodiments, multiple charged particle beam guiding devices 5 may be arranged on the same plane or on different planes. That is, when multiple charged particle beam guiding devices 5 are on different planes, the movement direction of the charged particle beam 4 can be adjusted in segments.

[0043] Preferably, in this embodiment of the present disclosure, the charged particle clusterer 2 is connected to a DC power supply, and the plurality of charged particle beam guiding devices 5 are all connected to an AC power supply. It should be noted that, for the charged particle clusterer 2, the DC power supply is connected to the charged particle clustering pole coil 3, and for the charged particle beam guiding device 5, the AC power supply is connected to the charged particle beam guiding coil 52. Specifically, when the charged particle clusterer 2 is connected to a DC power supply, it will generate an axial magnetic field with a stable magnetic field distribution. The axial magnetic field is preferably set so that the side away from the vacuum chamber 7 is the N pole. When the charged particle beam guiding coil 52 is connected to an AC power supply, its two magnetic poles periodically form changing opposite magnetism.

[0044] Preferably, in the embodiments of this disclosure, such as Figure 2As shown, the charged particle beam guiding device 5 includes a charged particle beam guiding electrode 51 and a charged particle beam guiding coil 52 wound around the charged particle beam guiding electrode 51. Further, the charged particle beam guiding electrode 51 has a columnar structure, and the axial extension direction of the columnar structure intersects the direction of movement of the charged particle beam. Specifically, the axial extension direction of the charged particle beam guiding electrode 51 can be at any angle to the charged particle beam 4. Further, the charged particle beam guiding coil 52 is wound around the central region of the columnar structure. It should be noted that the number of turns of the charged particle beam guiding coil 52 can be set by those skilled in the art according to actual production needs. Specifically, the more turns, the greater the force exerted by the charged particle beam guiding device 5 on the charged particles 4.

[0045] Furthermore, the charged particle beam guide electrode 51 is made of a magnetically conductive material. Specifically, the magnetically conductive material is a material with magnetic conductivity, which can effectively conduct and concentrate magnetic field lines in a magnetic field, thereby realizing energy conversion and transmission. Examples include pure iron, low-carbon steel, iron-silicon alloys, and ultracrystalline soft magnetic alloys.

[0046] It should be noted that the number of turns of the charged particle beam guiding coil 52 can be set by those skilled in the art according to actual production needs. Specifically, the more turns there are, the greater the force exerted by the charged particle beam guiding device 5 on the electron beam 4.

[0047] Preferably, in this embodiment of the present disclosure, the charged particle clusterer 2 includes a charged particle clustering flange 20 and a charged particle clustering coil 3 wound on the charged particle clustering flange 20. Specifically, the charged particle clustering flange 20 is a metal tubular structure, and the charged particle clustering coil 3 is wound on the charged particle clustering flange 20 along its axis. Those skilled in the art can set the number of turns of the charged particle clustering coil 3 and the length of the charged particle clustering flange 20 according to actual production needs. Generally speaking, for charged particles with higher density or larger particles, a longer acceleration time should be set, that is, a longer charged particle clustering flange 20 or a charged particle clustering coil 3 with more turns.

[0048] Preferably, in this embodiment of the present disclosure, a charged particle emitting device is provided on the input side of the charged particle inlet 1. Further, the charged particle emitting device can be a charged particle magnetic filter. The charged particle magnetic filter can remove large particles, neutral particles, and unwanted charged particle types from the charged particle beam 4, retaining the desired pure charged particle beam 4. Specifically, the charged particle magnetic filter can adopt a straight or curved structure. The straight charged particle magnetic filter usually uses the guiding effect of the magnetic field on the charged particle beam to reduce the size of the cathode spot and the proportion of macroscopic particle clusters. The curved charged particle magnetic filter separates large particles from charged particles by deflecting the charged particles under the combined action of the magnetic field and the electric field.

[0049] Preferably, in this embodiment of the present disclosure, a vacuum chamber 7 is further provided in the direction of movement of the charged particle beam 4, wherein the charged particle inlet 1 and the charged particle clusterer 2 are sealed together and are sealed into the vacuum chamber 7 via the charged particle beam guide flange 6.

[0050] Inside the vacuum chamber 7, a coating sample holder 8 is arranged in the direction of motion of the charged particle beam 4;

[0051] Furthermore, a turntable 9 is provided at the bottom of the coating sample holder 8, which is used to drive the coating sample holder 8 to rotate.

[0052] This embodiment also discloses a method for scanning a charged particle beam using a multi-pole magnetic coil, comprising the following steps:

[0053] Direct current is supplied to the charged particle beam clusterer 2, and alternating current is supplied to the charged particle beam guiding device 5. The charged particle beam clusterer 2 forms an axial magnetic field along the direction of movement of the charged particle beam, and the multiple charged particle beam guiding devices 5 form periodically changing opposite magnetic fields near the magnetic poles of the charged particle beam's direction of movement.

[0054] The charged particle beam is accelerated within the axial magnetic field and reaches the charged particle beam guiding device 5;

[0055] Based on the guidance requirements of the charged particle beam, an AC power supply is connected to at least one charged particle beam guiding device 5. When the charged particle beam passes through the charged particle beam guiding device 5 connected to the AC power supply, it periodically deflects upward and / or downward.

[0056] Specifically, according to the principle of magnetic circuit, an axial magnetic circuit is formed between the N pole generated by the charged particle focusing pole coil 3 and the S pole of the charged particle beam guiding pole 51, and the charged particle beam guiding device 5 generates a longitudinal magnetic field.

[0057] When the charged particle beam guiding device 5 is close to the S pole of the magnetic pole of the electron beam 4, the longitudinal magnetic circuit generated between the S pole and the N pole will guide the axial magnetic field to shift downward, thereby guiding the charged particle beam 4 to shift downward; when the charged particle beam guiding device 5 is close to the N pole of the magnetic pole of the electron beam 4, the longitudinal magnetic circuit generated between the N pole and the S pole will guide the axial magnetic field to shift upward, thereby guiding the charged particles to shift upward.

[0058] Since the charged particle beam guiding device 5 is connected to an AC power source, the magnetism of the magnetic poles near the direction of movement of the charged particle beam 4 will change periodically. In other words, the magnetic poles near the direction of movement of the charged particle beam 4 will periodically switch between the N pole and the S pole, thereby guiding the charged particle beam 4 to deflect up and down periodically and realizing the scanning of the charged particle beam 4.

[0059] Furthermore, the charged particle beam guiding device 5 includes at least three magnetic poles close to the charged particle beam, and at least two of the three magnetic poles close to the charged particle beam have opposite magnetic properties. That is, those skilled in the art can adjust the longitudinal offset angle of the charged particle beam 4 by adjusting the magnetic poles with opposite magnetic properties. For example, when more offset is needed, more magnetic poles with the same magnetic properties are set to act, while correspondingly reducing the magnetic poles with opposite magnetic properties. When more precise adjustment of the movement direction of the charged particle beam 4 is needed, the relative positions of multiple charged particle beam guiding devices 5 are adjusted. The relative positions include their relative positions in the horizontal projection and their relative positions in the longitudinal projection, thereby enabling arbitrary angle adjustment of the charged particle beam 4 in the three-dimensional direction.

[0060] Furthermore, in some embodiments, those skilled in the art can periodically rotate the sample on the coating sample holder 8 by rotating the turntable 9 periodically, and at the same time cooperate with the charged particle clusterer 2 and the charged particle beam guide device 5 to periodically guide the charged particle beam 4. By periodically guiding the direction of movement of the charged particle beam 4, the charged particle beam can be linearly scanned in one dimension or scanned 360° in two dimensions, thereby achieving a more uniform coating process.

[0061] This method also discloses a preferred embodiment as follows:

[0062] According to the principle of magnetic circuits, an axial magnetic circuit is formed between the N pole generated by the charged particle focusing pole coil 3 and the S pole of the charged particle beam guiding pole 51, and the charged particle beam guiding device 5 generates a longitudinal magnetic field; the introduced charged particle beam is focused, and the axial magnetic field constrains the direction of the charged particle beam.

[0063] By controlling the current direction of the charged particle beam guiding pole 51 corresponding to the charged particle beam guiding coil, the magnetic pole of at least one charged particle beam guiding device 5 close to the electron beam 4 is the S pole, and the magnetic poles of the other charged particle beam guiding devices 5 close to the electron beam 4 are the N poles.

[0064] The S pole of the charged particle beam guiding device 5, which is close to the electron beam 4, forms a magnetic field loop with the axial N pole. In this embodiment, the axial N pole refers to the magnetic field loop formed by the charged particle focusing pole coil 3.

[0065] Meanwhile, the N pole of the charged particle beam guiding device 5, which is close to the electron beam 4, repels the axial N pole, further causing the axial magnetic field to deflect towards the S pole of the charged particle beam guiding device 5, which is close to the electron beam 4, thereby guiding the charged particle beam to deflect in this direction.

[0066] By controlling the periodic change of the current direction of the charged particle beam guiding coil 52, it is ensured that at least one charged particle beam guiding device 5 close to the electron beam 4 has its magnetic pole at the S pole at the same time, while the magnetic poles of the other charged particle beam guiding devices 5 close to the electron beam 4 have their magnetic poles at the N pole, thereby forming a periodically changing magnetic field loop that guides the charged particle beam to deflect periodically, thus achieving multi-directional scanning of the charged particle beam.

[0067] like Figure 3 As shown, in Figure 3 The image on the left is a distribution diagram of the charged particle beam 4 output after only magnetic filtering in the prior art, while the image on the right is a distribution diagram of the charged particle beam 4 formed by the solution provided in this embodiment. It can be seen from the figure that the distribution of the charged particle beam 4 is wider and more uniform.

[0068] It should be noted that the traction process of the charged particle beam in this application is based on the periodic change of the axial magnetic field direction in the charged particle focusing device 2 by the magnetism of the charged particle guiding device 5. In contrast, the existing multi-field scanning method is based on the Lorentz force generated by the magnetic field perpendicular to the direction of movement of the charged particles to change the direction of movement of the charged particles. Therefore, the basic principle of this patent is different from that of the existing multi-field scanning method.

[0069] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the scope of the invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0070] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be appropriately combined to form other embodiments that can be understood by those skilled in the art. The above content is only for illustrating the technical concept of the present invention and should not be construed as limiting the scope of protection of the present invention. Any modifications made based on the technical concept proposed in this invention shall fall within the scope of protection of the claims of this invention.

Claims

1. A multi-pole magnetic coil charged particle beam scanning device, characterized in that, It includes a charged particle inlet (1) and a charged particle beam concentrator (2) disposed on the output side of the charged particle inlet (1). A charged particle beam guiding flange (6) is disposed on the output side of the charged particle beam concentrator (2). A plurality of charged particle beam guiding devices (5) are disposed around the outer wall of the charged particle beam guiding flange (6). The charged particle cluster (2) intersects the direction of motion of the charged particle beam. The charged particle cluster (2) is provided with an axial magnetic field along the direction of motion of the charged particle beam. The charged particle beam guiding device (5) is provided on one side of the direction of motion of the charged particle beam. The charged particle beam guiding device (5) includes two magnetic poles with opposite magnetic properties, and only one of the magnetic poles is close to the charged particle beam. The charged particle beam gatherer (2) is connected to a DC power supply, and the plurality of charged particle beam guiding devices (5) are all connected to an AC power supply. The charged particle beam guiding device (5) includes a charged particle beam guiding pole (51) and a charged particle beam guiding coil (52) wound on the charged particle beam guiding pole (51). The charged particle clusterer (2) includes a charged particle clustering flange (20) and a charged particle clustering coil (3) wound on the charged particle clustering flange (20).

2. The multi-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that, The charged particle beam guide electrode (51) is a columnar structure, and the axial extension of the columnar charged particle beam guide electrode (51) intersects with the direction of motion of the charged particle beam.

3. The multi-pole magnetic coil charged particle beam scanning device according to claim 2, characterized in that, A charged particle beam guide coil (52) is wound around the central region of the columnar structure.

4. The multi-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that, A charged particle emission device is provided on the input side of the charged particle inlet (1).

5. The multi-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that, It also includes a vacuum chamber (7) located in the direction of movement of the charged particle beam. The charged particle inlet (1) and the charged particle clusterer (2) are sealed together and sealed into the vacuum chamber (7) via the charged particle beam guide flange (6). Inside the vacuum chamber (7), a coating sample holder (8) is arranged in the direction of motion of the charged particle beam.

6. The multi-pole magnetic coil charged particle beam scanning device according to claim 5, characterized in that, The bottom of the coating sample holder (8) is provided with a turntable (9).

7. A method for scanning a charged particle beam using a multi-pole magnetic coil, characterized in that, Based on any one of claims 1-6, the multi-pole magnetic coil charged particle beam scanning device Includes the following steps: DC power is connected to the charged particle beam gatherer (2), and AC power is connected to the charged particle beam guide device (5). The charged particle beam gatherer (2) forms an axial magnetic field along the direction of movement of the charged particle beam, and the multiple charged particle beam guide devices (5) form opposing magnetic fields that periodically change near the magnetic poles of the charged particle beam direction of movement. The charged particle beam is directed to the charged particle beam guiding device (5) within the axial magnetic field. Based on the guidance requirements of the charged particle beam, an AC power supply is connected to at least one charged particle beam guiding device (5), and at least one charged particle beam guiding device (5) is close to the magnetic pole in the direction of the electron beam, opposite to the magnetic pole on the output side of the charged particle beam gatherer (2), and at least one charged particle beam guiding device (5) is close to the magnetic pole in the direction of the electron beam, the same as the magnetic pole on the output side of the charged particle beam gatherer (2). As the charged particle beam passes through the charged particle beam guiding device (5) connected to an AC power source, it periodically deflects upward and / or downward.

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