A two-pole magnetic coil charged particle beam scanning device and method

Abstract

The present invention provides a two-pole magnetic coil charged particle beam scanning device and method, comprising a charged particle inlet, and a charged particle buncher and a charged particle beam guiding device sequentially arranged on the output side of the charged particle inlet; the charged particle buncher and the charged particle beam guiding device are arranged at intervals in the movement direction of the charged particle beam, the output side of the charged particle buncher is provided with a charged particle beam guiding pole flange, and the charged particle beam guiding device is sleeved on the outer wall of the charged particle beam guiding pole flange; the charged particle beam guiding device intersects with the movement direction of the charged particle beam, and the charged particle beam guiding device comprises two magnetic poles arranged oppositely and having opposite magnetic properties; the charged particle buncher is provided with an axial magnetic field along the movement direction of the charged particle beam; the application can expand the longitudinal charged particle beam coverage range of vacuum arc charged particle coating and improve the coating uniformity.

Description

Technical Field

[0001] The present invention relates to the technical field of vacuum arc ion plating, and in particular to a two-pole magnetic coil charged particle beam scanning device and method. Background Art

[0002] Vacuum cathode arc coating is a commonly used surface modification method. Arc discharge technology generates a high-density plasma near the cathode target surface, which is then deposited onto the workpiece surface to enhance surface properties. While this coating method offers advantages such as high deposition rates, dense films, high hardness, and good adhesion, the arc discharge process also releases a large number of large particles and impurities. These particles, when deposited on the workpiece surface, increase surface roughness and reduce film performance, limiting its application in high-performance applications.

[0003] To improve thin film performance, the effects of large particles and impurities during vacuum coating must be eliminated. A common method for eliminating large particles and impurities in the prior art is to install a filter between the cathode target and the coating vacuum chamber. This technique, known as magnetic filtration vacuum cathode arc coating, is by far the most effective and widely used method for suppressing the effects of large particles during coating. The filter comprises a filter tube with at least one bend or bend and a coil module for generating a magnetic field within the filter tube. Charged particles in this magnetic field are subjected to the Lorentz force, causing them to spiral along the centerline of the tube. Large particles are generally uncharged or carry a slight negative charge, but because their mass is much higher than that of ions and electrons, they are largely unaffected by the electromagnetic field. Uncharged large particles maintain linear motion, collide with the inner wall of the filter tube, and are therefore difficult to exit. Even small amounts of negatively charged large particles can collide with the inner wall of the filter tube during spiral motion due to their large Larmor radius. Because not all large particles lose kinetic energy through continuous collisions with the wall, a certain number of large particles will pass through the tube outlet. Therefore, long and narrow filter tubes offer higher large particle filtration efficiency.

[0004] While adding a filter can improve film performance, the charged particles are focused by the magnetic field and are limited by the filter's exit area. This results in a small cross-sectional area for the charged particle beam upon entering the vacuum chamber, and the beam intensity is spatially distributed normally. This results in uneven film thickness on the workpiece surface. This is especially true when the vacuum chamber is large, as film thickness varies significantly across the workpiece surface at different locations within the chamber, severely limiting the technology's applicability. Summary of the Invention

[0005] In order to solve the problems existing in the prior art, the present invention provides a two-pole magnetic coil charged particle beam scanning device and method for solving the technical problem of uneven film thickness during vacuum cathode arc coating in the prior art.

[0006] To achieve the above object, the present invention provides the following technical solutions:

[0007] A two-pole magnetic coil charged particle beam scanning device comprises a charged particle inlet, and a charged particle buncher and a charged particle beam guide device sequentially arranged on the output side of the charged particle inlet;

[0008] The charged particle buncher and the charged particle beam guide device are arranged at intervals in the moving direction of the charged particle beam, the output side of the charged particle buncher is provided with a charged particle beam guide pole flange, and the charged particle beam guide device is sleeved on the outer wall of the charged particle beam guide pole flange;

[0009] The charged particle beam guide device intersects with the moving direction of the charged particle beam and comprises two oppositely arranged magnetic poles with opposite magnetic properties; the charged particle buncher is provided with an axial magnetic field along the moving direction of the charged particle beam.

[0010] Furthermore, the charged particle buncher is connected to a DC power supply, and the charged particle beam guiding device is connected to an AC power supply.

[0011] Furthermore, the charged particle beam guiding device includes a charged particle beam guiding electrode and a charged particle beam guiding coil wound around the charged particle beam guiding electrode.

[0012] Furthermore, the charged particle beam guide pole is made of magnetic conductive material.

[0013] Furthermore, the charged particle beam guide pole is a semi-enclosed continuous structure, and the charged particle beam guide pole of the semi-enclosed continuous structure intersects with the moving direction of the charged particle beam.

[0014] Furthermore, a charged particle beam guiding coil is wound around the middle area of ​​the arc-shaped structure.

[0015] Furthermore, the charged particle buncher includes a charged particle buncher flange and a charged particle buncher coil wound around the charged particle buncher flange.

[0016] Furthermore, a charged particle emitting device is provided on the input side of the charged particle inlet.

[0017] Furthermore, it also includes a vacuum chamber arranged in the moving direction of the charged particle beam, wherein the charged particle inlet is sealedly connected to the charged particle buncher and is sealedly connected to the vacuum chamber via a charged particle beam guide flange;

[0018] A film-coating sample rack is arranged inside the vacuum chamber in the moving direction of the charged particle beam; a turntable is arranged at the bottom of the film-coating sample rack, and the turntable is used to drive the film-coating sample rack to rotate.

[0019] A method for a two-pole magnetic coil charged particle beam scanning device comprises the following steps:

[0020] Connecting a direct current to a charged particle buncher and an alternating current to a charged particle beam guide, wherein the charged particle buncher forms an axial magnetic field along the direction of movement of the charged particle beam, and the two magnetic poles of the charged particle beam guide periodically form opposite magnetic properties;

[0021] The charged particle beam is directed within the axial magnetic field to reach a charged particle beam guide device;

[0022] The charged particle beam is periodically deflected upward or downward under the guidance of the charged particle beam guiding device.

[0023] Compared with the prior art, the present invention has the following beneficial technical effects:

[0024] The present invention provides a two-pole magnetic coil charged particle beam scanning device and method, comprising a charged particle inlet, and a charged particle buncher and a charged particle beam guide device sequentially arranged on the output side of the charged particle inlet; the charged particle buncher and the charged particle beam guide device are arranged at intervals in the movement direction of the charged particle beam, the output side of the charged particle buncher is provided with a charged particle beam guide pole flange, and the charged particle beam guide device is sleeved on the outer wall of the charged particle beam guide pole flange; the charged particle beam guide device intersects with the movement direction of the charged particle beam, and the charged particle beam guide device comprises two oppositely arranged and The invention discloses a method for producing a charged particle beam having opposite magnetic poles; the charged particle buncher is provided with an axial magnetic field along the moving direction of the charged particle beam; the charged particle buncher of the present application forms an axial magnetic field along the moving direction of the charged particle beam, and the two magnetic poles of the charged particle beam guiding device periodically form changing opposite magnetic properties; the charged particle beam is accelerated in the axial magnetic field to reach the charged particle beam guiding device; the charged particle beam is periodically deflected upward or downward under the guidance of the charged particle beam guiding device; thereby changing the moving trajectory of the charged particle beam, thereby expanding the longitudinal charged particle beam coverage range of the vacuum arc charged particle coating and improving the coating uniformity. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 A schematic structural diagram of a two-pole magnetic coil charged particle beam scanning device according to an embodiment of the present disclosure is shown;

[0026] Figure 2 A schematic structural diagram of a charged particle beam guiding device according to an embodiment of the present disclosure is shown;

[0027] Figure 3 The longitudinal distribution diagram of the charged particle beam according to the embodiment of the present disclosure is shown.

[0028] In the accompanying drawings: 1. Charged particle inlet; 2. Charged particle buncher; 5. Charged particle beam guide device; 51. Charged particle beam guide electrode; 52. Charged particle beam guide coil; 20. Charged particle buncher flange; 3. Charged particle buncher coil; 7. Vacuum chamber; 8. Coating sample rack; 9. Turntable; 4. Charged particle beam; 6. Charged particle beam guide electrode flange. DETAILED DESCRIPTION

[0029] Hereinafter, only certain exemplary embodiments are briefly described. As will be appreciated by those skilled in the art, the described embodiments may be modified in various ways without departing from the spirit or scope of the present invention. Therefore, the drawings and description are to be considered as illustrative in nature and not restrictive.

[0030] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0031] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of the technical features being referred to. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of such features. In the description of the present invention, "plurality" means two or more, unless otherwise specifically defined.

[0032] In the present invention, unless otherwise expressly specified or limited, terms such as "mounted," "connected," "connect," and "fixed" should be understood broadly. For example, they may refer to fixed connection, detachable connection, or integration; mechanical connection, electrical connection, or communication; direct connection or indirect connection through an intermediate medium; and internal communication between two components or interaction between two components. Those skilled in the art will understand the specific meanings of the above terms in the present invention based on specific circumstances.

[0033] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Furthermore, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0034] It will be understood that when used in this specification and the appended claims, the terms “comprises” and “comprising” indicate the presence of described features, integers, steps, operations, elements and / or components, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components and / or groups thereof.

[0035] It should also be understood that the terms used in the present specification are only for the purpose of describing particular embodiments and are not intended to limit the present invention. As used in the present specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms unless the context clearly indicates otherwise.

[0036] It should be further understood that the term "and / or" used in the present description and the appended claims refers to and includes any and all possible combinations of one or more of the associated listed items.

[0037] The accompanying drawings illustrate various schematic diagrams of structures according to embodiments disclosed herein. These figures are not drawn to scale; for clarity, some details are exaggerated and some details may be omitted. The shapes of the various regions and layers shown in the figures, as well as their relative sizes and positional relationships, are merely exemplary and may deviate in practice due to manufacturing tolerances or technical limitations. Those skilled in the art may design regions / layers with different shapes, sizes, and relative positions as needed.

[0038] The embodiments of the present invention are described in detail below with reference to the accompanying drawings.

[0039] Figure 1 A two-pole magnetic coil charged particle beam scanning device according to an embodiment of the present disclosure is shown. Figure 1 As shown, it includes a charged particle inlet 1, and a charged particle buncher 2 and a charged particle beam guide device 5 which are sequentially arranged on the output side of the charged particle inlet 1;

[0040] The charged particle buncher 2 and the charged particle beam guide device 5 are arranged at intervals in the moving direction of the charged particle beam 4. The output side of the charged particle buncher 2 is provided with a charged particle beam guide pole flange 6. The charged particle beam guide device 5 is sleeved on the outer wall of the charged particle beam guide pole flange 6.

[0041] The charged particle beam guide device 5 intersects with the moving direction of the charged particle beam 4 , and the charged particle beam guide device 5 includes two oppositely arranged magnetic poles with opposite magnetic properties; the charged particle buncher 2 is provided with an axial magnetic field along the moving direction of the charged particle beam 4 .

[0042] Preferably, in the embodiment of the present disclosure, the charged particle buncher 2 is connected to a DC power supply, and the charged particle beam guiding device 5 is connected to an AC power supply. It should be noted that, for the charged particle buncher 2, the DC power supply is connected to the charged particle bunching pole coil 3, and for the charged particle beam guiding device 5, the AC power supply is connected to the charged particle beam guiding coil 52; specifically, when the charged particle buncher 2 is connected to a DC power supply, an axial magnetic field is generated, and the axial magnetic field is preferably set to the side close to the vacuum chamber 7 as the N pole; when the charged particle beam guiding coil 52 is connected to an AC power supply, its two magnetic poles periodically form changing opposite magnetic properties.

[0043] Further, in the embodiment of the present disclosure, if Figure 2 As shown, the charged particle beam guiding device 5 includes a charged particle beam guiding pole 51 and a charged particle beam guiding coil 52 wound on the charged particle beam guiding pole 51; further, the charged particle beam guiding pole 51 is a semi-enclosed continuous structure, and the charged particle beam guiding pole 51 of the semi-enclosed continuous structure intersects with the movement direction of the charged particle beam 4. Specifically, the angle at which the charged particle beam guiding pole 51 of the arc-shaped structure intersects with the movement direction of the charged particle beam can be any angle; further, the charged particle beam guiding coil 52 is wound around the middle area of ​​the arc-shaped structure.

[0044] Furthermore, the charged particle beam guide pole 51 is made of magnetic conductive material. Specifically, the magnetic conductive material is a material with magnetic conductivity, which can effectively conduct and concentrate magnetic lines of force in a magnetic field, thereby realizing energy conversion and transmission, such as pure iron, low carbon steel, iron-silicon alloy and ultra-fine crystal soft magnetic alloy.

[0045] Specifically, the arc-shaped structure of the charged particle beam guide pole 51 can be a semi-enclosed continuous structure bent in the same plane, and its two ends are not connected. For example, when it is a semicircular ring structure, and its two magnetic poles are located on the upper and lower sides of the charged particle beam 4, the effect on the charged particle beam 4 is symmetrical. However, when it is a quarter arc-shaped structure, and the two magnetic poles are not located on the upper and lower sides of the charged particle beam 4, but on the same side, the effect on the charged particle beam 4 is a force that causes some charged particles to move closer or farther away. Those skilled in the art can set it according to the product to be processed; secondly, for the number of turns of the charged particle beam guide coil 52, those skilled in the art can also set it according to actual production needs. For example, when it is necessary to exert a greater longitudinal influence on the charged particle beam 4, the number of turns of the charged particle beam guide coil 52 can be increased for change.

[0046] Preferably, in the embodiment of the present disclosure, the charged particle buncher 2 includes a charged particle bunching electrode flange 20, and a charged particle bunching electrode coil 3 wound on the charged particle bunching electrode flange 20; specifically, the charged particle bunching electrode flange 20 is a metal tubular structure, and the charged particle bunching electrode coil 3 is wound on the charged particle bunching electrode flange 20 along its axis. Those skilled in the art can set the number of turns of the charged particle bunching electrode coil 3 and the length of the charged particle bunching electrode flange 20 according to actual production needs. Generally speaking, for charged particles with higher density or larger particles, a longer acceleration time should be set, that is, a longer charged particle bunching electrode flange 20 or a charged particle bunching electrode coil 3 with more turns.

[0047] Preferably, in the embodiment of the present disclosure, a charged particle emission device is provided on the input side of the charged particle inlet 1. Furthermore, the charged particle emission device can adopt a charged particle magnetic filter. The charged particle magnetic filter can remove large particles, neutral particles and unnecessary charged particle types in the charged particle beam 4, and retain the required pure charged particle beam 4. Specifically, the charged particle magnetic filter can adopt a linear or curved structure, wherein the linear charged particle magnetic filter usually utilizes the guiding effect of the magnetic field on the charged particle beam to reduce the size of the cathode spot and the proportion of macroscopic particle clusters; the curved charged particle magnetic filter separates large particle matter from the charged particles by causing the equal-charged particle body to be deflected under the joint action of the magnetic field and the electric field.

[0048] Preferably, in the embodiment of the present disclosure, a vacuum chamber 7 is further included, which is arranged in the moving direction of the charged particle beam 4. The charged particle inlet 1 and the charged particle buncher 2 are sealed and connected to the vacuum chamber 7 via a charged particle beam guide flange 6.

[0049] A film-coated sample rack 8 is provided inside the vacuum chamber 7 in the moving direction of the charged particle beam 4 . Furthermore, a turntable 9 is provided at the bottom of the film-coated sample rack 8 , and the turntable 9 is used to drive the film-coated sample rack 8 to rotate.

[0050] This embodiment also discloses a method for scanning a charged particle beam using a two-pole magnetic coil, comprising the following steps:

[0051] A direct current is connected to the charged particle buncher 2, and an alternating current is connected to the charged particle beam guide 5. The charged particle buncher 2 forms an axial magnetic field along the moving direction of the charged particle beam 4, and the two magnetic poles of the charged particle beam guide 5 periodically form opposite magnetic properties.

[0052] The charged particle beam 4 is directed in the axial magnetic field and reaches the charged particle beam guide device 5;

[0053] The charged particle beam 4 is periodically deflected upward or downward under the guidance of the charged particle beam guide device 5 .

[0054] Specifically, according to the magnetic circuit principle, an axial magnetic circuit is formed between the N pole generated by the charged particle bunching pole coil 3 and the S pole of the charged particle beam guide pole 51, and the N pole of the charged particle beam guide pole 51 repels the axial magnetic field generated by the charged particle bunching pole coil 3, thereby causing the axial magnetic field to shift toward the S pole end of the charged particle beam guide pole 51, guiding the charged particle beam 4 to deflect in this direction. The charged particle beam guide coil 52 is powered by AC, and its magnetic pole switches periodically between N and S, thereby guiding the charged particle beam 4 to deflect up and down periodically, thereby realizing scanning of the charged particle beam 4.

[0055] Furthermore, in some embodiments, those skilled in the art can drive the sample on the coating sample rack 8 to rotate by periodically rotating the turntable 9, and at the same time cooperate with the charged particle buncher 2 and the charged particle beam guide device 5 to periodically guide the charged particle beam 4. By periodically directional guiding the movement direction of the charged particle beam 4, a large-scale linear scanning of the charged particle beam can be achieved, thereby achieving a more uniform coating process.

[0056] like Figure 3 As shown, in Figure 3 The image on the left is a distribution diagram of the charged particle beam 4 output after only magnetic filtration in the prior art, and the image on the right is a distribution diagram of the charged particle beam 4 formed by the solution provided in this embodiment. It can be seen from the figure that the distribution of the charged particle beam 4 is wider and more uniform.

[0057] It should be noted that the present application realizes the pulling process of the charged particle beam based on the periodic change of the direction of the axial magnetic field in the charged particle bunching device 2 by the magnetism of the charged particle guiding device 5, while the multipole field scanning method existing in the prior art is based on the magnetic field perpendicular to the direction of movement of the charged particles to generate the Lorentz force to change the direction of movement of the charged particles. Therefore, the basic principle used in this patent is different from the existing multipole field scanning method.

[0058] The above shows and describes the basic principles and main features of the present invention and the advantages of the present invention. It is obvious to those skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention. Therefore, from all points of view, the embodiments should be regarded as illustrative and non-restrictive. The scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes that fall within the meaning and range of equivalents of the claims are included in the present invention. Any reference signs in the claims should not be construed as limiting the claim to which they relate.

[0059] In addition, it should be understood that although this specification describes the embodiments, not every embodiment contains only one independent technical solution. This description is for clarity only. Those skilled in the art should consider the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art. The above content is only for the purpose of illustrating the technical concept of the present invention and cannot be used to limit the scope of protection of the present invention. Any changes made based on the technical solution in accordance with the technical concept proposed by the present invention fall within the scope of protection of the claims of the present invention.

Claims

1. A two-pole magnetic coil charged particle beam scanning device, characterized in that: It comprises a charged particle inlet (1), and a charged particle buncher (2) and a charged particle beam guide device (5) which are sequentially arranged on the output side of the charged particle inlet (1); The charged particle buncher (2) and the charged particle beam guide device (5) are arranged at intervals in the movement direction of the charged particle beam, a charged particle beam guide pole flange (6) is provided on the output side of the charged particle buncher (2), and the charged particle beam guide device (5) is sleeved on the outer wall of the charged particle beam guide pole flange (6); The charged particle beam guide device (5) intersects with the movement direction of the charged particle beam, and the charged particle beam guide device (5) comprises two magnetic poles that are arranged oppositely and have opposite magnetic properties; the charged particle buncher (2) is provided with an axial magnetic field along the movement direction of the charged particle beam.

2. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that: The charged particle buncher (2) is connected to a DC power supply, and the charged particle beam guide device (5) is connected to an AC power supply.

3. The two-pole magnetic coil charged particle beam scanning device according to claim 2, characterized in that: The charged particle beam guiding device (5) comprises a charged particle beam guiding pole (51) and a charged particle beam guiding coil (52) wound around the charged particle beam guiding pole (51).

4. The two-pole magnetic coil charged particle beam scanning device according to claim 3, characterized in that: The charged particle beam guide pole (51) is made of magnetic conductive material.

5. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that: The charged particle beam guide electrode (51) is a semi-enclosed continuous structure, and the charged particle beam guide electrode (51) of the semi-enclosed continuous structure intersects with the movement direction of the charged particle beam.

6. The two-pole magnetic coil charged particle beam scanning device according to claim 5, characterized in that: A charged particle beam guide coil (52) is wound around a central region of the charged particle beam guide pole (51) of the semi-enclosed continuous structure.

7. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that: The charged particle buncher (2) comprises a charged particle bunching electrode flange (20) and a charged particle bunching electrode coil (3) wound around the charged particle bunching electrode flange (20).

8. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that: A charged particle emitting device is provided on the input side of the charged particle inlet (1).

9. The two-pole magnetic coil charged particle beam scanning device according to claim 1, characterized in that: It also includes a vacuum chamber (7) arranged in the moving direction of the charged particle beam, wherein the charged particle inlet (1) and the charged particle buncher (2) are sealed and connected to the vacuum chamber (7) through the charged particle beam guide flange (6); A film-coated sample rack (8) is provided inside the vacuum chamber (7) in the moving direction of the charged particle beam; a turntable (9) is provided at the bottom of the film-coated sample rack (8), and the turntable (9) is used to drive the film-coated sample rack (8) to rotate.

10. A method for a two-pole magnetic coil charged particle beam scanning device, characterized in that: Based on the two-pole magnetic coil charged particle beam scanning device according to any one of claims 1 to 9, The following steps are involved: A direct current is connected to the charged particle buncher (2), and an alternating current is connected to the charged particle beam guide device (5), wherein the charged particle buncher (2) forms an axial magnetic field along the moving direction of the charged particle beam, and the two magnetic poles of the charged particle beam guide device (5) periodically form opposite magnetic properties; The charged particle beam is directed in the axial magnetic field to reach the charged particle beam guide device (5); The charged particle beam is periodically deflected upward or downward under the guidance of the charged particle beam guide device (5).

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