Source gas inlet control component and adjustment method of epitaxial furnace

Abstract

The present invention discloses a source gas intake control component and an adjustment method for an epitaxial furnace, and relates to the technical field of source gas intake control for an epitaxial furnace. The source gas intake control component for an epitaxial furnace comprises an intake member, which is sealed and connected to a reaction shell, and one end of which is placed in the reaction shell; a flow equalizing component, which is placed at one end of the intake member outside the reaction shell, one end of which is connected to the intake member, and the other end of which is connected to a source gas intake system and a purge gas system; the present invention controls the extension of a telescopic driving component through the mutual cooperation among a porous flow equalizing plate, an air guide member, an arc-shaped air guide vane, an arc-shaped elastic air guide member and a sliding pressing member, so that the air guide tube is pulled out from the flow equalizing plate, and then controls the purge gas system to supply air to the flow equalizing component, and the incoming gas is guided by the arc-shaped elastic air guide member and the arc-shaped air guide vane so that the purge gas flows to the surroundings, and finally enters the intake member from the through groove to achieve the purge of the intake member.

Description

Technical Field

[0001] The invention relates to the technical field of source gas intake control of an epitaxial furnace, and in particular to a source gas intake control component and an adjustment method of an epitaxial furnace. Background Art

[0002] Epitaxial wafer is a material that plays an important role in semiconductor manufacturing. Epitaxial wafer is a semiconductor material film with specific crystal structure and electrical properties grown on the original semiconductor substrate material through a specific process.

[0003] For example, the patent with publication number CN114457321A discloses an air intake device and CVD equipment, which relates to the technical field of CVD equipment. The air intake device includes an air intake chamber body, a mounting seat, a porous air permeable member and a windshield; the mounting seat is arranged on the air intake chamber body, the porous air permeable member is arranged between the mounting seat and the air intake chamber body, and at least three airflow regulating chambers are formed between the porous air permeable member and the mounting seat, and an air intake interface is provided on the mounting seat corresponding to the airflow regulating chamber, and the air intake interface is used to introduce the reaction gas into the corresponding airflow regulating chamber, and an air guide chamber is provided on the side of the air intake chamber body away from the air intake interface corresponding to the airflow regulating chamber; each airflow regulating cavity is provided with a windshield corresponding to the air intake interface, and the windshield is located between the porous air permeable member and the mounting seat. The above-mentioned air intake device enables the reaction gas to quickly reach a uniform flow state when entering the air guide chamber, so that the wafer generates an epitaxial layer with uniform thickness and uniform doping concentration, without the need to design a longer air intake structure, thereby reducing costs.

[0004] Although the above patent can quickly achieve a uniform flow state, in order to ensure product quality, purging is required before air intake. However, due to the setting of the porous air-permeable part, purging cannot be performed quickly.

[0005] Therefore, it is necessary to propose a source gas intake control component and an adjustment method for an epitaxial furnace in the present invention to solve the above problems. Summary of the invention

[0006] The object of the present invention is to provide a source gas inlet control component and an adjustment method for an epitaxial furnace to solve the problems raised in the above-mentioned background technology.

[0007] To achieve the above object, the present invention provides the following technical solution: a source gas inlet control assembly of an epitaxial furnace, comprising an inlet member, which is sealed and connected to a reaction shell, and one end of which is placed in the reaction shell;

[0008] A flow balancing component, which is placed at one end of the gas inlet component outside the reaction shell, one end of which is connected to the gas inlet component, and the other end of which is connected to the source gas inlet system and the purge gas system;

[0009] The flow balancing component includes a docking seat, which is connected to the air inlet member;

[0010] A receiving groove, which is provided on a side of the docking seat close to the air inlet member;

[0011] A porous flow equalizing plate, which is placed inside the containing groove and has a sealing protrusion at one end thereof that cooperates with the air inlet member;

[0012] An air guide tube is placed between the porous flow balancing plate and the docking seat, and is slidably and sealingly plugged with the porous flow balancing plate and the docking seat;

[0013] An arc-shaped air guide piece is placed in the air guide tube and connected to the docking seat, with its middle portion arched toward the docking seat and a vent opening formed in its middle portion;

[0014] An arc-shaped elastic air guide member, which is placed in the air guide cylinder and between the arc-shaped air guide piece and the porous flow equalizing plate, and the arc-shaped arch direction of the arc-shaped elastic air guide member is adjustable;

[0015] An air inlet pipe connected to the air source air inlet system and the purge gas system, which passes through the docking seat and corresponds to the vent;

[0016] A sliding pressing member, which is disposed on a side of the air guide tube away from the porous flow equalizing plate, extends to the outside of the docking seat, and is sealingly and slidingly connected to the docking seat;

[0017] Two protrusions, which are respectively arranged at the front and rear sides of the arc-shaped elastic air guide, and are used to elastically deform the arc-shaped elastic air guide to change the arc-shaped arching direction of the arc-shaped elastic air guide;

[0018] A telescopic driving component is connected to the sliding pressing member and is used to drive the sliding pressing member to slide.

[0019] Preferably, the air inlet member comprises an air inlet body, the air inlet body is provided with at least three ventilation cavities and a plurality of protective gas ventilation cavities, and the protective gas ventilation cavities are connected to the protective gas inlet system;

[0020] A first docking flange portion, located at one end of the air inlet body, and used for docking with the docking seat;

[0021] The second docking flange is located on a peripheral side wall of the air inlet body close to the reaction shell and is used for docking with the reaction shell.

[0022] Preferably, the telescopic drive assembly is a pneumatic telescopic member, a fixed end of which is connected to the docking seat, and a telescopic end of which is connected to the sliding pressing member.

[0023] Preferably, a first sinking groove for accommodating the air guide tube is provided on one side of the porous flow equalizing plate close to the air guide tube and on the inner wall of the accommodating groove.

[0024] Preferably, the air guide tube comprises an air guide body;

[0025] A first elastic deformation portion, which is disposed at one end of the air guide body close to the porous flow equalizing plate;

[0026] The second elastic deformation portion is disposed at an end of the air guide body which is away from the porous flow equalizing plate.

[0027] Preferably, it further comprises a second sinking groove, which is opened on the inner wall of the first sinking groove;

[0028] An elastic sealing ring, which is placed in the second sink;

[0029] The sealing pressure plate is placed in the second sink groove and presses itself and the elastic sealing ring into the second sink groove through a fastener.

[0030] Preferably, it further comprises two sealing grooves, which are respectively opened on the opposite side of the docking seat and the air inlet member;

[0031] A sealing member is placed in the sealing groove and is used to seal the connection between the docking seat and the air inlet member.

[0032] Preferably, it also includes a through groove, which is placed in the first sedimentation tank and penetrates the porous flow equalizing plate.

[0033] Preferably, a threaded docking hole corresponding to the air inlet pipe is provided on the docking seat.

[0034] The present invention also provides a source gas inlet adjustment method for an epitaxial furnace, comprising the following steps:

[0035] Step 1: Control the telescopic driving assembly to drive the sliding pressing member to slide, so that the sliding pressing member pushes the air guide tube to slide, and the sliding of the air guide tube causes the arc-shaped elastic air guide member to change from a state in the opposite direction to the arc-shaped air guide plate to the same state, and the air guide tube is connected to the through groove;

[0036] Step 2: Then control the purge gas system to supply gas to the flow balancing component to purge the flow balancing component. After the purge is completed, control the purge gas system to stop supplying gas;

[0037] Step 3: Control the sliding pressing member to slide by the telescopic driving assembly, so that the arc-shaped elastic air guide member changes from a state in the same direction as the arc-shaped air guide plate to an opposite state;

[0038] Step 4: Control the source gas supply system to supply gas to the flow equalization component. Under the flow equalization of the flow equalization component, the gas entering the reaction chamber can reach a uniform flow state, thereby improving the flatness of the epitaxial wafer.

[0039] Technical effects and advantages of the present invention:

[0040] 1. The present invention controls the extension of the telescopic drive assembly through the mutual cooperation between the porous flow equalizing plate, the air guide member, the arc-shaped air guide vane, the arc-shaped elastic air guide member and the sliding pressing member, so that the air guide tube is pulled out from the flow equalizing plate, and then controls the purge gas system to supply air to the flow equalizing assembly. The incoming gas is guided by the arc-shaped elastic air guide member and the arc-shaped air guide vane to make the purge gas flow to the surroundings, and finally enters the air inlet member from the through groove to achieve the purge of the air inlet member.

[0041] 2. The present invention can perform strong blowing on one of the ventilation cavities separately after overall blowing through the mutual cooperation among the porous flow equalizing plate, the air guide member, the arc-shaped air guide vane, the arc-shaped elastic air guide member and the sliding pressing member, and the like. The telescopic driving assembly corresponding to the ventilation cavity that is not strongly purged is controlled to contract, so that the arc-shaped elastic air guide member is finally pressed against the flow equalizing plate. At the same time, the telescopic driving assembly corresponding to the ventilation cavity that needs strong blowing is controlled to extend, so that the air guide tube corresponding to the ventilation cavity that needs strong blowing slides out of the flow equalizing plate, so that all the air guide tubes are interconnected, thereby achieving increased air flow and pressure in the ventilation cavity that needs strong blowing, and achieving strong blowing.

[0042] 3. The present invention achieves mutual coordination among the porous flow equalizing plate, the air guide member, the arc-shaped air guide piece, the arc-shaped elastic air guide member and the sliding pressing member. After the blowing is completed, the telescopic driving assembly is controlled to drive the sliding pressing member, the air guide tube and the arc-shaped elastic air guide member to reset, and then the source air supply system is controlled to supply air to the flow equalizing assembly. Under the action of the arc-shaped elastic air guide member, the airflow is guided to diffuse around, so that the airflow entering the air inlet member is more uniform, thereby improving the uniformity of the epitaxial thickness. BRIEF DESCRIPTION OF THE DRAWINGS

[0043] Figure 1 It is a schematic diagram of the overall structure of the present invention.

[0044] Figure 2 It is a schematic diagram of the structure of the air intake component and the flow equalizing component in the present invention.

[0045] Figure 3 For the present invention Figure 2 Schematic diagram of the structure from another angle.

[0046] Figure 4 It is a schematic diagram of the local structure of the air intake member in the present invention.

[0047] Figure 5 It is an exploded schematic diagram of the connection structure of the porous flow equalizing plate, the elastic sealing ring and the sealing pressure plate in the present invention.

[0048] Figure 6 It is a schematic diagram of the three-dimensional structure of the porous flow equalizing plate in the present invention when viewed from the air inlet part to the flow equalizing component.

[0049] Figure 7It is a schematic diagram of the structural connection of the air guide member, the arc-shaped air guide plate and the arc-shaped elastic air guide member in the present invention.

[0050] Figure 8 It is a schematic diagram of the structural connection of some air guide members, arc-shaped air guide plates and arc-shaped elastic air guide members in the present invention.

[0051] Fig. 9 It is a schematic diagram of the docking seat structure in the present invention.

[0052] Fig.10 It is a schematic diagram of the structural connection between the sliding pressing member, the telescopic driving assembly and the air guide member in the present invention.

[0053] Fig.11 It is a partial structural cross-sectional view of the current balancing component in the present invention.

[0054] In the figure: 1. air inlet member; 11. air inlet body; 1101. ventilation cavity; 1102. protective gas ventilation cavity; 12. first docking flange; 13. second docking flange; 2. flow equalizing assembly; 21. docking seat; 22. receiving groove; 23. porous flow equalizing plate; 25. air guide tube; 251. air guide body; 252. first elastic deformation part; 253. second elastic deformation part; 26. arc-shaped air guide plate; 27. arc-shaped elastic air guide member; 28. sliding pressing member; 29. ​​raised part; 3. telescopic drive assembly; 4. first sinking groove; 5. second sinking groove; 6. elastic sealing ring; 7. sealing pressure plate; 8. through groove; 9. sealing groove; 10. sealing member. DETAILED DESCRIPTION

[0055] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0056] The present invention provides Figures 1 to 11 The source gas inlet control assembly of the epitaxial furnace shown includes an inlet member 1 which is sealed to the reaction shell and one end of which is placed inside the reaction shell. The inlet member 1 of the present invention realizes the introduction of source gas by sealingly connecting to the reaction shell.

[0057] The flow balancing component 2 is placed at one end of the air inlet component 1 outside the reaction shell, one end of which is connected to the air inlet component 1, and the other end is connected to the source gas inlet system and the purge gas system. The present invention connects the flow balancing component 2 to the source gas inlet system and the purge gas system. When the source gas inlet system supplies gas to the flow balancing component 2, under the regulation of the flow balancing component 2, a uniform reaction gas flow is supplied to the epitaxial furnace. When the purge gas system supplies gas to the flow balancing component 2, under the regulation of the flow balancing component 2, the gas entering from the flow balancing component 2 purges the air inlet component 1 and the epitaxial furnace.

[0058] The flow balancing component 2 includes a docking seat 21 , which is connected to the air inlet member 1 .

[0059] The receiving groove 22 is formed on a side of the docking seat 21 close to the air inlet member 1 .

[0060] like Figure 6 As shown, a porous flow equalizing plate 23 is placed inside the receiving groove 22, and one end of the porous flow equalizing plate 23 is provided with a sealing protrusion that cooperates with the air inlet member 1; the present invention arranges a porous flow equalizing plate 23 to equalize the airflow, thereby forming a uniform airflow, so that the thickness of the epitaxially formed film is more uniform.

[0061] The air guide 25 is placed between the porous flow equalizing plate 23 and the docking seat 21, and is slidably and sealedly plugged with the porous flow equalizing plate 23 and the docking seat 21; the present invention sets the air guide 25 to separate the airflow entering from multiple different air inlet pipes, thereby avoiding mixed flow before entering the corresponding ventilation cavity 1101, which leads to unstable airflow.

[0062] The arc-shaped air guide piece 26 is placed in the air guide tube 25 and connected to the docking seat 21 , with its middle portion arched toward the docking seat 21 and a ventilation hole opened in its middle portion.

[0063] The arc-shaped elastic air guide member 27 is placed in the air guide tube 25 and is located between the arc-shaped air guide plate 26 and the porous flow equalizing plate 23. The arc-shaped arch direction of the arc-shaped elastic air guide member 27 is adjustable. When the arc-shaped arch direction of the arc-shaped air guide plate 26 is opposite to the arc-shaped arch direction of the arc-shaped air guide plate 26, the arc-shaped elastic air guide member 27 is used to guide the wind passing through the ventilation opening of the arc-shaped air guide plate 26 to the surrounding of the arc-shaped elastic air guide member 27 when the arc-shaped arch direction of the arc-shaped air guide plate 26 is the same as the arc-shaped arch direction of the arc-shaped air guide plate 26.

[0064] like Fig.11The present invention achieves a more uniform airflow by cooperating with each other among the porous flow equalizing plate 23, the air guide tube 25, the arc-shaped air guide piece 26 and the arc-shaped elastic air guide piece 27. On the one hand, the airflow direction is controlled by adjusting the arc-shaped arch direction, thereby optimizing the gas distribution and achieving a more uniform airflow; on the other hand, the arc-shaped elastic air guide piece 27 is changed by controlling the telescopic drive component 3 to drive the sliding pressing piece 28 to move, so that the airflow direction can be controlled to meet the different needs of different epitaxial production stages.

[0065] The air inlet pipe connected to the air source intake system and the purge gas system passes through the docking seat 21 and corresponds to the vent. The present invention realizes air supply to the flow balancing component 2 by setting the air inlet pipe.

[0066] Specifically, a threaded docking hole corresponding to the air inlet pipe is provided on the docking seat 21 .

[0067] like Fig.10 and 11 As shown, the sliding pressing member 28 is disposed on a side of the air guide tube 25 away from the porous flow equalizing plate 23 , extends to the outside of the docking seat 21 , and is sealed and slidably connected to the docking seat 21 .

[0068] Two raised portions 29 are respectively arranged on the front and rear sides of the arc-shaped elastic air guide 27, and are used to elastically deform the arc-shaped elastic air guide 27 and change the arc-shaped arch direction of the arc-shaped elastic air guide 27; the present invention controls the sliding pressing member 28 to slide, thereby driving the raised portion 29 to move and contact with the porous flow equalizing plate 23 or the arc-shaped air guide sheet 26, and under the reverse force, the arc-shaped elastic air guide 27 is elastically deformed, thereby adjusting the airflow guide direction.

[0069] The telescopic driving component 3 is connected to the sliding pressing member 28 and is used to drive the sliding pressing member 28 to slide. The present invention controls the sliding pressing member 28 to slide back and forth by setting the telescopic driving component 3 and controlling the telescopic driving component 3.

[0070] The air intake component 1 includes an air intake body 11, on which at least three ventilation cavities 1101 and a plurality of protective gas ventilation cavities 1102 are provided, and the protective gas ventilation cavities 1102 are connected to the protective gas intake system; the present invention realizes supplying reaction gas into the reaction shell by setting the ventilation cavities 1101, and realizes supplying protective gas into the reaction shell by setting the protective gas ventilation cavities 1102.

[0071] The first docking flange portion 12 is located at one end of the air inlet body 11 and is used for docking with the docking seat 21 . The present invention achieves docking with the docking seat 21 by providing the first docking flange portion 12 .

[0072] The second docking flange 13 is located on the peripheral side wall of the air inlet body 11 close to the reaction shell and is used for docking with the reaction shell. The second docking flange 13 is provided to achieve docking between the air inlet member 1 and the reaction shell.

[0073] The telescopic driving assembly 3 is a pneumatic telescopic component, a fixed end of which is connected to the docking seat 21 , and a telescopic end of which is connected to the sliding pressing component 28 .

[0074] The first sinking groove 4 for accommodating the air guide tube 25 is provided on one side of the porous flow equalizing plate 23 close to the air guide tube 25 and on the inner wall of the accommodating groove 22. The present invention realizes the plugging of the air guide tube 25 with the porous flow equalizing plate 23 and the docking seat 21 by providing the first sinking groove 4, so as to separate the gases entering from each air inlet pipe and avoid mixed flow.

[0075] The air guide tube 25 includes an air guide body 251 ; the present invention is used to achieve air guiding by providing the air guide body 251 .

[0076] The first elastic deformation portion 252 is disposed at one end of the air guide body 251 close to the porous flow equalizing plate 23 .

[0077] The second elastic deformation portion 253 is disposed at one end of the air guide body 251 away from the porous flow equalizing plate 23 .

[0078] The present invention sets a first elastic deformation part 252 and a second elastic deformation part 253. On the first hand, under the elastic force of the first elastic deformation part 252 and the second elastic deformation part 253, the porous flow equalizing plate 23 is pressed onto the air inlet part 1 to achieve sealing between the porous flow equalizing plate 23 and the air inlet part 1; on the second hand, the air guide tube 25 can be moved, so that the air guide tube 25 drives the arc-shaped elastic air guide part 27 to move, so that the arc-shaped elastic air guide part 27 is deformed to adjust the air guiding direction.

[0079] Furthermore, to ensure the sealing between the air guide 25 and the porous flow equalizing plate 23 and the docking seat 21, it also includes a second sink 5, which is opened on the inner wall of the first sink 4; an elastic sealing ring 6, which is placed in the second sink 5; and a sealing pressure plate 7, which is placed in the second sink 5 and presses itself and the elastic sealing ring 6 into the second sink 5 through fasteners. The present invention provides a second sink 5 in the inner wall of the first sink 4 for accommodating the elastic sealing ring 6, thereby enhancing the sealing effect between the air guide 25 and the porous flow equalizing plate 23. The sealing pressure plate 7 presses itself and the elastic sealing ring 6 into the second sink 5 through fasteners, so that it maintains a sealed state under the action of airflow to prevent gas leakage.

[0080] It also includes two sealing grooves 9 which are respectively opened on the opposite side of the docking seat 21 and the air inlet member 1 .

[0081] The sealing member 10 is disposed in the sealing groove 9 and is used to seal the connection between the docking seat 21 and the air inlet member 1 .

[0082] The present invention provides a sealing groove 9 on the side of the docking seat 21 close to the air inlet 1, and places a sealing member 10 in the sealing groove 9, thereby ensuring reliable air tightness at the connection between the docking seat 21 and the air inlet 1. The sealing member 10 can effectively prevent gas from leaking from the gap between the docking seat 21 and the air inlet 1, thereby ensuring stable transmission of airflow in the epitaxial furnace. The design of the sealing groove 9 allows the sealing member 10 to be fixed in a suitable position, preventing displacement or loosening caused by changes in airflow pressure, thereby ensuring a long-term sealing effect.

[0083] It also includes a through groove 8, which is placed in the first sink 4 and penetrates the porous flow equalizing plate 23. The design of the through groove 8 can provide a channel for the air flow, so that the purge gas enters the air inlet 1 through the through groove 8 to purge it.

[0084] In summary, if Fig.11 As shown, first, by controlling the telescopic driving component 3 to contract, the contraction of the telescopic driving component 3 will drive the sliding pressing member 28 to slide toward the porous flow equalizing plate 23. Due to the arrangement of the first elastic deformation portion 252 and the second elastic deformation portion 253, the sliding pressing member 28 can drive the air guide tube 25 to slide toward the porous flow equalizing plate 23 during the sliding process. The sliding of the air guide tube 25 will drive the protrusion 29 to move, and finally collide with the porous flow equalizing plate 23. Under the reverse force of the porous flow equalizing plate 23, the arc-shaped elastic air guide member 27 is subjected to a reverse thrust, and changes from a state opposite to the arc-shaped arched direction of the arc-shaped air guide plate 26 to a state having the same arc-shaped arched direction.

[0085] Then the telescopic driving assembly 3 is controlled to extend so that the air guide tube 25 is pulled out from the porous flow equalizing plate 23. At this time, the protrusion 29 does not conflict with the arc-shaped air guide plate 26, so that the air guide tube 25 is connected with the through groove 8. Then the purge gas system is controlled to supply air to the flow equalizing assembly 2. The incoming gas is guided by the arc-shaped elastic air guide member 27 and the arc-shaped air guide plate 26. Since the arc-shaped elastic air guide member 27 and the arc-shaped air guide plate 26 have the same arc-shaped arch direction at this time, the purge gas flows around the air guide tube 25 and finally enters the air inlet member 1 from the through groove 8 to achieve the purge of the air inlet member 1.

[0086] The present invention can also perform strong blowing on one of the ventilation chambers 1101 separately after the overall blowing, and control the contraction of the telescopic drive assembly 3 corresponding to the ventilation chamber 1101 that is not blown strongly, so that the air guide tube 25 corresponding to the ventilation chamber 1101 that is not blown strongly moves toward the porous flow equalizing plate 23, and finally slides out of the docking seat 21, and then continues to push, so that the arc-shaped elastic air guide member 27 arches in the same direction as the arc-shaped air guide plate 26, and finally the arc-shaped elastic air guide member 27 is pressed against the porous flow equalizing plate 23. On the plate 23, the air holes on the porous flow equalizing plate 23 are covered, so that the airflow can better flow to the through groove 8 corresponding to the ventilation cavity 1101 that needs strong blowing; at the same time, the telescopic drive assembly 3 corresponding to the ventilation cavity 1101 that needs strong blowing is controlled to extend, so that the air guide tube 25 corresponding to the ventilation cavity 1101 that needs strong blowing can slide out from the porous flow equalizing plate 23, so that all the air guide tubes 25 are interconnected, thereby achieving increased air flow and pressure in the ventilation cavity 1101 that needs strong blowing, and achieving strong blowing.

[0087] After the purge is completed in the non-forced purge mode, the telescopic drive component 3 is controlled to continue to extend, so that the air guide tube 25, the protrusion 29 and the arc-shaped elastic air guide member 27 slide synchronously, and finally the protrusion 29 of the arc-shaped elastic air guide member 27 close to the docking seat 21 is in conflict with the arc-shaped air guide plate 26. Under the reaction force, the arc-shaped elastic air guide member 27 is pushed from the same state as the arc-shaped arch direction of the arc-shaped air guide plate 26 to the opposite state, and then the telescopic drive component 3 is controlled to drive the sliding pressing member 28, the air guide tube 25 and the arc-shaped elastic air guide member 27 to reset, and then the source air supply system is controlled to supply air to the flow equalizing component 2. Under the action of the arc-shaped elastic air guide member 27, the airflow is guided to diffuse around, so that the airflow entering the air inlet member 1 is more uniform, thereby improving the uniformity of the epitaxial thickness.

[0088] The present invention also provides a source gas inlet adjustment method for an epitaxial furnace, comprising the following steps:

[0089] Step 1: Control the telescopic driving assembly 3 to drive the sliding pressing member 28 to slide, so that the sliding pressing member 28 pushes the air guide tube 25 to slide, and the air guide tube 25 slides to make the arc-shaped elastic air guide member 27 change from the state in the opposite direction to the arc-shaped air guide piece 26 to the same state, and make the air guide tube 25 communicate with the through groove 8;

[0090] Step 2: Then control the purge gas system to supply gas to the flow equalizing component 2 to purge the flow equalizing component 2. After the purge is completed, control the purge gas system to stop supplying gas;

[0091] Step 3: Control the sliding pressing member 28 to slide by the telescopic driving assembly 3, so that the arc-shaped elastic air guide member 27 changes from a state in the same arc-shaped arching direction as the arc-shaped air guide piece 26 to an opposite state;

[0092] Step 4: Control the source gas supply system to supply gas to the flow equalization component 2. Under the flow equalization of the flow equalization component 2, the gas entering the reaction chamber can reach a uniform flow state, thereby improving the flatness of the epitaxial wafer.

[0093] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, it is still possible for those skilled in the art to modify the technical solutions described in the aforementioned embodiments or to make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A source gas inlet control assembly for an epitaxial furnace, comprising an inlet member, characterized in that: It is sealed and connected to the reaction shell, and one end is placed in the reaction shell; A flow balancing component, which is placed at one end of the gas inlet component outside the reaction shell, one end of which is connected to the gas inlet component, and the other end of which is connected to the source gas inlet system and the purge gas system; The flow balancing component includes a docking seat, which is connected to the air inlet member; A receiving groove, which is provided on a side of the docking seat close to the air inlet member; A porous flow equalizing plate, which is placed inside the containing groove and has a sealing protrusion at one end thereof that cooperates with the air inlet member; An air guide tube is placed between the porous flow balancing plate and the docking seat, and is slidably and sealingly plugged with the porous flow balancing plate and the docking seat; An arc-shaped air guide piece is placed in the air guide tube and connected to the docking seat, with its middle portion arched toward the docking seat and a vent opening formed in its middle portion; An arc-shaped elastic air guide member is placed in the air guide cylinder and between the arc-shaped air guide piece and the multi-hole flow equalizing plate, and the arc-shaped arch direction is adjustable; An air inlet pipe connected to the air source air inlet system and the purge gas system, which passes through the docking seat and corresponds to the vent; A sliding pressing member, which is disposed on a side of the air guide tube away from the porous flow equalizing plate, extends outside the docking seat, and is sealingly and slidingly connected to the docking seat; Two protrusions, which are respectively arranged at the front and rear sides of the arc-shaped elastic air guide, and are used to elastically deform the arc-shaped elastic air guide to change the arc-shaped arching direction of the arc-shaped elastic air guide; A telescopic driving assembly, which is connected to the sliding pressing member and is used to drive the sliding pressing member to slide; The first sinking groove for accommodating the air guide tube is provided on one side of the porous flow balancing plate close to the air guide tube and on the inner wall of the accommodating groove; The air guide cylinder comprises an air guide body; A first elastic deformation portion, which is disposed at one end of the air guide body close to the porous flow equalizing plate; A second elastic deformation portion, which is disposed at an end of the air guide body away from the porous flow equalizing plate; It also includes a second sink, which is opened on the inner wall of the first sink; An elastic sealing ring, which is placed in the second sink; The sealing pressure plate is placed in the second sink groove and presses itself and the elastic sealing ring into the second sink groove through a fastener.

2. The source gas inlet control assembly of the epitaxial furnace according to claim 1, characterized in that: The air intake member comprises an air intake body, on which at least three ventilation cavities and a plurality of protective gas ventilation cavities are provided, and the protective gas ventilation cavities are connected to the protective gas intake system; A first docking flange portion, located at one end of the air inlet body, and used for docking with the docking seat; The second docking flange is located on a peripheral side wall of one end of the air inlet body close to the reaction shell and is used for docking with the reaction shell.

3. The source gas inlet control assembly of the epitaxial furnace according to claim 1, characterized in that: The telescopic driving component is a pneumatic telescopic component, a fixed end of which is connected to the docking seat, and a telescopic end of which is connected to the sliding pressing component.

4. The source gas inlet control assembly of the epitaxial furnace according to claim 1, characterized in that: It also includes two sealing grooves, which are respectively opened on the opposite side of the docking seat and the air inlet member; A sealing member is placed in the sealing groove and is used to seal the connection between the docking seat and the air inlet member.

5. The source gas inlet control assembly of the epitaxial furnace according to claim 1, characterized in that: It also includes a through groove, which is placed in the first sink and penetrates the porous flow equalizing plate.

6. The source gas inlet control assembly of the epitaxial furnace according to claim 1, characterized in that: The docking seat is provided with a threaded docking hole corresponding to the air inlet pipe.

7. A method for regulating the source gas inlet of an epitaxial furnace, the method utilizing the source gas inlet control assembly of the epitaxial furnace as claimed in any one of claims 1 to 6 to regulate the inlet gas, characterized in that: The following steps are involved: Step 1: Control the telescopic driving assembly to drive the sliding pressing member to slide, so that the sliding pressing member pushes the air guide tube to slide, and the sliding of the air guide tube causes the arc-shaped elastic air guide member to change from a state in the opposite direction to the arc-shaped air guide plate to the same state, and the air guide tube is connected to the through groove; Step 2: Then control the purge gas system to supply gas to the flow balancing component to purge the flow balancing component. After the purge is completed, control the purge gas system to stop supplying gas; Step 3: Control the sliding pressing member to slide by the telescopic driving assembly, so that the arc-shaped elastic air guide member changes from a state in the same direction as the arc-shaped air guide plate to an opposite state; Step 4: Control the source gas supply system to supply gas to the flow equalization component. Under the flow equalization of the flow equalization component, the gas entering the reaction chamber can reach a uniform flow state, thereby improving the flatness of the epitaxial wafer.

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