Ring light source detection and adjustment method and system for nail fold microcirculation imaging

Abstract

The present invention relates to the technical field of medical imaging, and provides a ring light source detection and adjustment method and system for nail fold microcirculation imaging, which analyzes a first image of a nail fold area when the ring light source is in a reference luminous state, obtains reflection property information of the nail fold area to light, and identifies abnormal irradiation sub-areas; adjusts the spatial state and / or luminous state of the ring light source, and identifies changes in light intensity distribution of the nail fold area to determine whether the ring light source presents a trend of uniform illumination of the surface of the nail fold area; visually identifies changes in light intensity distribution on the surface of the nail fold area to determine the optimal state of the ring light source during the state adjustment process, so that the ring light source illuminates the nail fold area in the best uniform manner; performs scattered light analysis on the image of the space corresponding to the nail fold area when the ring light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to improve the fidelity and accuracy of nail fold microcirculation imaging.

Description

Technical Field

[0001] The present invention relates to the technical field of medical imaging, and in particular to a method and system for detecting and adjusting an annular light source for nail fold microcirculation imaging. Background Art

[0002] The fingernail fold refers to the skin wrinkle covering the root of the nail. There are a large number of capillaries distributed inside the nail fold area. By imaging, detecting and analyzing the capillaries, the state of the human nail fold microcirculation can be accurately determined, providing a reliable and comprehensive basis for diagnosing related human diseases. In order to improve the clarity of the microcirculation imaging of the nail fold area, the prior art uses a ring light source as the imaging light source of the nail fold area. The ring light source irradiates light from all directions of the nail fold area to avoid direct irradiation of the nail fold area and glare in a certain range of the surface of the nail fold area. The use of a ring light source can improve the uniformity of irradiation of the nail fold area. However, due to the randomly undulating morphology of the surface of the nail fold area, the light emitted by the ring light source will still have local over-reflection or concentrated scattering of visible light of certain wavelengths on the surface of the nail fold area, resulting in problems such as overexposure or chromatic distortion of the captured nail fold area image, and it is impossible to provide a true and reliable nail fold area image, which reduces the accuracy and reliability of subsequent recognition of the state of the nail fold microcirculation. Summary of the invention

[0003] In view of the defects existing in the prior art, the present invention provides a method and system for detecting and adjusting an annular light source for nail fold microcirculation imaging, which analyzes a first image of a nail fold area when the annular light source is in a reference luminous state, obtains reflection property information of the nail fold area to light, thereby identifying abnormal irradiation sub-areas, and accurately positioning and identifying the glare caused by the morphology of the nail fold area itself; adjusts the spatial state and / or luminous state of the annular light source, and simultaneously identifies the change in light intensity distribution of the nail fold area to determine whether the annular light source presents a trend of uniform illumination of the surface of the nail fold area; visually identifies the change in light intensity distribution of the surface of the nail fold area to determine the optimal state of the annular light source during the state adjustment process, so that the annular light source can optimally and uniformly illuminate the nail fold area; and also performs scattered light analysis on the image of the space corresponding to the nail fold area when the annular light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to avoid chromaticity distortion of nail fold area imaging due to light scattering, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0004] The present invention provides a method for detecting and adjusting an annular light source for nail fold microcirculation imaging, comprising the following steps:

[0005] Step S1, obtaining a first image of a nail fold area when the ring light source is in a reference lighting state, analyzing the first image to obtain reflection property information of the nail fold area to the light from the ring light source; based on the reflection property information, identifying all abnormal illumination sub-areas of the nail fold area;

[0006] Step S2, based on the attribute information of all abnormal illumination sub-regions, adjusting the spatial state and / or the luminous state of the annular light source; based on the light intensity distribution change characteristic information of the nail fold region during the spatial state adjustment and / or the luminous state adjustment process, judging whether the annular light source presents a uniform illumination trend on the surface of the nail fold region;

[0007] Step S3, when the annular light source presents a trend of uniform illumination of the surface of the nail fold area, a second image of the surface of the nail fold area under the illumination of the annular light source in the process of state adjustment is obtained; the second image is dynamically analyzed to obtain information on changes in light intensity distribution on the surface of the nail fold area; based on the information on changes in light intensity distribution, the optimal state of the annular light source in the process of state adjustment is determined;

[0008] Step S4, when the annular light source does not show a trend of uniformly illuminating the surface of the nail fold area, obtain a third image of the space corresponding to the nail fold area under the illumination of the annular light source in a reference luminous state; perform scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; and perform corresponding fill light adjustment based on the abnormal light distribution area.

[0009] In one embodiment disclosed in the present application, in the step S1, a first image of a nail fold region under illumination by an annular light source in a reference light emitting state is acquired, the first image is analyzed to obtain reflection property information of the nail fold region to light from the annular light source; based on the reflection property information, all illumination abnormal sub-regions of the nail fold region are identified, including:

[0010] Scanning and photographing the nail fold area when the ring light source is in a reference light emitting state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain distribution attribute information of reflected light from the ring light source in the nail fold area;

[0011] The reflected light distribution attribute information is analyzed to obtain reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image; based on the reflected light intensity difference information, a reflected light intensity mutation screen sub-area of ​​the full-area image is determined, and a sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as an illumination abnormality sub-area.

[0012] In one embodiment disclosed in the present application, in the step S2, based on the attribute information of all abnormal illumination sub-regions, the space state and / or the luminous state of the ring light source are adjusted; based on the light intensity distribution change characteristic information of the nail fold region during the space state adjustment and / or the luminous state adjustment process, it is judged whether the ring light source presents a uniform illumination trend on the surface of the nail fold region, including:

[0013] Perform edge contour identification and average light intensity identification on each abnormal illumination sub-region to obtain regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, perform spatial posture adjustment on the ring light source to change the posture angle of the ring light source relative to the nail fold region; and / or, based on the average light intensity attribute information, perform local adjustment on the luminous intensity of the ring light source to change the local light illumination intensity of the ring light source to the nail fold region;

[0014] The nail fold area is dynamically photographed during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; the full-area dynamic image is sequentially subjected to frame processing and light intensity distribution recognition processing to obtain information on changes in the area of ​​the illuminated and shadowed areas on the surface of the nail fold area; based on the information on changes in the area of ​​the illuminated and shadowed areas, it is determined whether the area of ​​the illuminated and shadowed areas on the surface of the nail fold area shows a trend of shrinking during the adjustment process; if so, it is determined that the annular light source shows a trend of uniform illumination of the surface of the nail fold area; if not, it is determined that the annular light source does not show a trend of uniform illumination of the surface of the nail fold area.

[0015] In one embodiment disclosed in the present application, in the step S3, when the annular light source presents a uniform illumination trend on the surface of the nail fold area, a second image of the surface of the nail fold area under the illumination of the annular light source in state adjustment is obtained; the second image is dynamically analyzed to obtain light intensity distribution change information on the surface of the nail fold area; based on the light intensity distribution change information, the optimal state of the annular light source in the state adjustment process is determined, including:

[0016] When the annular light source presents a uniform illumination trend on the surface of the nail fold area, a time interval at which the uniform illumination trend presents a peak is determined based on a variation rule of the uniform illumination trend; based on the time interval, a corresponding full-area dynamic sub-image is intercepted from a full-area dynamic image taken of the surface of the nail fold area under illumination by the annular light source in a state adjustment;

[0017] The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in sequence to determine the occurrence time when the illuminated shadow area on the surface of the nail fold region is at a minimum value; the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state corresponding to the annular light source at the occurrence time is taken as the optimal state of the annular light source.

[0018] In one embodiment disclosed in the present application, in the step S4, when the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, a third image of the space corresponding to the nail fold area under the illumination of the annular light source in a reference luminous state is obtained; scattered light analysis is performed on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; and corresponding fill light adjustment is performed based on the abnormal light distribution area, including:

[0019] When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space;

[0020] Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths;

[0021] Based on the light intensity distribution information, the abnormal light distribution area in the three-dimensional space where the nail fold area is located is determined; based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

[0022] The present invention also provides a ring light source detection and adjustment system for nail fold microcirculation imaging, comprising:

[0023] A first visual analysis module is used to obtain a first image of the nail fold area when the ring light source is in a reference lighting state, and analyze the first image to obtain reflection property information of the nail fold area to the light from the ring light source;

[0024] an irradiation abnormality identification module, used for identifying all irradiation abnormality sub-regions of the nail fold region based on the reflection attribute information;

[0025] A light source state adjustment module, configured to adjust the space state and / or the light emission state of the annular light source based on the attribute information of all abnormal illumination sub-regions;

[0026] A light source lighting trend judgment module, used to judge whether the annular light source presents a uniform lighting trend on the surface of the nail fold area based on the light intensity distribution change characteristic information of the nail fold area during the spatial state adjustment and / or the lighting state adjustment process;

[0027] A second visual analysis module is used for obtaining a second image of the surface of the nail fold area when the ring light source is irradiated by the ring light source in a state adjustment when the ring light source presents a trend of uniform illumination of the surface of the nail fold area; and dynamically analyzing the second image to obtain information on changes in light intensity distribution on the surface of the nail fold area;

[0028] A light source optimal state determination module, used to determine the optimal state of the annular light source during the state adjustment process based on the light intensity distribution change information;

[0029] A third visual analysis module is used for obtaining a third image of the space corresponding to the nail fold area under the illumination of the ring light source in a reference light emitting state when the ring light source does not present a trend of uniform illumination of the surface of the nail fold area; performing scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area;

[0030] The fill light adjustment module is used to perform corresponding fill light adjustment based on the abnormal light distribution area.

[0031] In one embodiment disclosed in the present application, the first visual analysis module is used to obtain a first image of the nail fold area when the ring light source is in a reference light emitting state, and analyze the first image to obtain reflection property information of the nail fold area to the light from the ring light source, including:

[0032] Scanning and photographing the nail fold area when the ring light source is in a reference light emitting state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain distribution attribute information of reflected light from the ring light source in the nail fold area;

[0033] The illumination abnormality identification module is used to identify all illumination abnormality sub-regions of the nail fold region based on the reflection attribute information, including:

[0034] The reflected light distribution attribute information is analyzed to obtain reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image; based on the reflected light intensity difference information, a reflected light intensity mutation screen sub-area of ​​the full-area image is determined, and a sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as an illumination abnormality sub-area.

[0035] In one embodiment disclosed in the present application, the light source state adjustment module is used to adjust the spatial state and / or the luminous state of the ring light source based on the attribute information of all abnormal illumination sub-areas, including:

[0036] Perform edge contour identification and average light intensity identification on each abnormal illumination sub-region to obtain regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, perform spatial posture adjustment on the ring light source to change the posture angle of the ring light source relative to the nail fold region; and / or, based on the average light intensity attribute information, perform local adjustment on the luminous intensity of the ring light source to change the local light illumination intensity of the ring light source to the nail fold region;

[0037] The light source lighting trend judgment module is used to judge whether the annular light source presents a uniform lighting trend on the surface of the nail fold area based on the light intensity distribution change characteristic information of the nail fold area during the spatial state adjustment and / or the lighting state adjustment process, including:

[0038] The nail fold area is dynamically photographed during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; the full-area dynamic image is sequentially subjected to frame processing and light intensity distribution recognition processing to obtain information on changes in the area of ​​the illuminated and shadowed areas on the surface of the nail fold area; based on the information on changes in the area of ​​the illuminated and shadowed areas, it is determined whether the area of ​​the illuminated and shadowed areas on the surface of the nail fold area shows a trend of shrinking during the adjustment process; if so, it is determined that the annular light source shows a trend of uniform illumination of the surface of the nail fold area; if not, it is determined that the annular light source does not show a trend of uniform illumination of the surface of the nail fold area.

[0039] In one embodiment disclosed in the present application, the second visual analysis module is used to obtain a second image of the surface of the nail fold area when the ring light source is irradiated by the ring light source in a state adjustment when the ring light source presents a uniform illumination trend on the surface of the nail fold area; and dynamically analyze the second image to obtain information on changes in light intensity distribution on the surface of the nail fold area, including:

[0040] When the annular light source presents a uniform illumination trend on the surface of the nail fold area, a time interval at which the uniform illumination trend presents a peak is determined based on a variation rule of the uniform illumination trend; based on the time interval, a corresponding full-area dynamic sub-image is intercepted from a full-area dynamic image taken of the surface of the nail fold area under illumination by the annular light source in a state adjustment;

[0041] The light source optimal state determination module is used to determine the optimal state of the annular light source during the state adjustment process based on the light intensity distribution change information, including:

[0042] The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in sequence to determine the occurrence time when the illuminated shadow area on the surface of the nail fold region is at a minimum value; the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state corresponding to the annular light source at the occurrence time is taken as the optimal state of the annular light source.

[0043] In one embodiment disclosed in the present application, the third visual analysis module is used to obtain a third image of the space corresponding to the nail fold area under the illumination of the ring light source in a reference light emitting state when the ring light source does not present a trend of uniform illumination of the surface of the nail fold area; perform scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area, including:

[0044] When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space;

[0045] Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths;

[0046] Based on the light intensity distribution information, determining an abnormal light distribution area in the three-dimensional space where the nail fold area is located;

[0047] The fill light adjustment module is used to perform corresponding fill light adjustment based on the abnormal light distribution area, including:

[0048] Based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

[0049] Compared with the prior art, the ring light source detection and adjustment method and system for nail fold microcirculation imaging analyzes the first image of the nail fold area when the ring light source is in a reference luminous state, obtains the reflection property information of the nail fold area to the light, thereby identifying the abnormal irradiation sub-area, and accurately locates and identifies the glare caused by the morphology of the nail fold area itself; adjusts the spatial state and / or luminous state of the ring light source, and at the same time identifies the change of light intensity distribution in the nail fold area to determine whether the ring light source shows a trend of uniform illumination of the surface of the nail fold area; visually identifies the change of light intensity distribution on the surface of the nail fold area to determine the optimal state of the ring light source during the state adjustment process, so that the ring light source can optimally and uniformly illuminate the nail fold area; and also performs scattered light analysis on the image of the space corresponding to the nail fold area when the ring light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to avoid chromaticity distortion of nail fold area imaging due to light scattering, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0050] Other features and advantages of the present invention will be described in the following description, and partly become apparent from the description, or understood by practicing the present invention. The purpose and other advantages of the present invention can be realized and obtained by the structures particularly pointed out in the written description, claims, and drawings.

[0051] The technical solution of the present invention is further described in detail below through the accompanying drawings and embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0052] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0053] Figure 1 A schematic flow chart of a method for detecting and adjusting a ring light source for nail fold microcirculation imaging provided by the present invention;

[0054] Figure 2 A schematic diagram of the framework of the annular light source detection and adjustment system for nailfold microcirculation imaging provided by the present invention. DETAILED DESCRIPTION

[0055] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0056] See also Figure 1 , is a flow chart of a method for detecting and adjusting an annular light source for nail fold microcirculation imaging provided by an embodiment of the present invention. The method for detecting and adjusting an annular light source for nail fold microcirculation imaging comprises:

[0057] Step S1, obtaining a first image of a nail fold region when the ring light source is in a reference light emitting state, analyzing the first image to obtain reflection property information of the nail fold region to the light from the ring light source; based on the reflection property information, identifying all abnormal illumination sub-regions of the nail fold region;

[0058] Step S2, based on the attribute information of all abnormal illumination sub-regions, adjusting the spatial state and / or the luminous state of the annular light source; based on the characteristic information of the light intensity distribution change of the nail fold region during the spatial state adjustment and / or the luminous state adjustment, judging whether the annular light source presents a uniform illumination trend on the surface of the nail fold region;

[0059] Step S3, when the annular light source presents a trend of uniform illumination of the surface of the nail fold region, a second image of the surface of the nail fold region under the illumination of the annular light source in the process of state adjustment is obtained; the second image is dynamically analyzed to obtain information on changes in light intensity distribution on the surface of the nail fold region; based on the information on changes in light intensity distribution, the optimal state of the annular light source in the process of state adjustment is determined;

[0060] Step S4, when the annular light source does not show a trend of uniformly illuminating the surface of the nail fold area, obtain a third image of the space corresponding to the nail fold area under the illumination of the annular light source in a reference luminous state; perform scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; and perform corresponding fill light adjustment based on the abnormal light distribution area.

[0061] The ring light source detection and adjustment method for nail fold microcirculation imaging analyzes a first image of a nail fold area when the ring light source is in a reference luminous state, obtains reflection property information of the nail fold area to light, thereby identifying abnormal luminous sub-areas, and accurately positioning and identifying the glare caused by the morphology of the nail fold area itself; adjusts the spatial state and / or luminous state of the ring light source, and simultaneously identifies the light intensity distribution change of the nail fold area to determine whether the ring light source presents a uniform illumination trend on the surface of the nail fold area; visually identifies the light intensity distribution change on the surface of the nail fold area to determine the optimal state of the ring light source during the state adjustment process, so that the ring light source can optimally and uniformly illuminate the nail fold area; and also performs scattered light analysis on the image of the space corresponding to the nail fold area when the ring light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to avoid chromaticity distortion of nail fold area imaging due to light scattering, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0062] Preferably, in step S1, a first image of the nail fold area when the ring light source is in a reference light emitting state is obtained, and the first image is analyzed to obtain reflection property information of the nail fold area to the light from the ring light source; based on the reflection property information, all illumination abnormal sub-areas of the nail fold area are identified, including:

[0063] Scanning and photographing the nail fold area under the illumination of the annular light source in the reference luminous state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain distribution attribute information of reflected light from the annular light source in the nail fold area;

[0064] The reflected light distribution attribute information is analyzed to obtain the reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image; based on the reflected light intensity difference information, the reflected light intensity mutation screen sub-area of ​​the full-area image is determined, and the sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as the illumination abnormality sub-area.

[0065] In the above technical solution, the annular light source used for nailfold microcirculation imaging may include a number of LED light sources evenly arranged along an annular path, and each LED light source is individually configured with a light modulator, so that the annular light source can emit a light beam with an annular cross-sectional shape; the light modulator may be, but is not limited to, a collimating beam expander lens group and / or a beam cross-sectional shape modulating lens group, and each LED light source can individually adjust the luminous intensity. In addition, the annular light source is encapsulated as a whole in a shell, and the shell can be adjusted in three-dimensional space to change the overall spatial posture of the annular light source. During the initial imaging of the nail fold microcirculation, the nail fold area is first placed in an area near the illumination focus of the annular light source, and the annular light source is enabled to irradiate light to the nail fold area in a reference lighting state; wherein the reference lighting state may be, but is not limited to, that all LED light sources inside the annular light source irradiate light at a preset reference lighting intensity, at which time the nail fold area illuminated by the annular light source in the reference lighting state is scanned and photographed to obtain a full-area image of the nail fold area, and the full-area image is sequentially subjected to pixel grayscale conversion processing and pixel brightness value extraction processing, and the full-area image is subjected to pixel-dimensional brightness recognition, thereby refining and identifying the distribution of reflected light intensity formed by the nail fold area under the illumination of the annular light source. There is a wrinkled structure on the surface of the nail fold area. When the light emitted by the ring light source reaches the surface of the nail fold area, different wrinkle structures have different reflection effects on the light, which makes the reflected light intensity formed at different positions on the surface of the nail fold area different. The reflected light intensity formed at some positions on the surface of the nail fold area is smaller, while the reflected light intensity formed at other positions is larger. The position range with larger reflected light intensity is likely to cause overexposure in the shooting of the nail fold area. For this purpose, the reflected light distribution attribute information of the nail fold area is analyzed to obtain the reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image, so as to comprehensively quantify the reflected light intensity difference between adjacent pixels on the full-area image screen, so as to further determine the reflected light intensity mutation screen sub-area of ​​the full-area image. For example, the area surrounded by all pixels whose reflected light intensity difference between adjacent pixels on the full-area image screen exceeds a preset difference threshold is determined as the reflected light intensity mutation screen sub-area, and the sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as the illumination abnormality sub-area, so as to identify and locate the sub-area on the nail fold area where the light from the ring light source is excessively concentratedly reflected, so as to provide a basis for subsequent adjustment of the state of the ring light source.

[0066] Preferably, in step S2, based on the attribute information of all abnormal illumination sub-regions, the space state and / or the luminous state of the annular light source are adjusted; based on the light intensity distribution change characteristic information of the nail fold region during the space state adjustment and / or the luminous state adjustment process, it is judged whether the annular light source presents a uniform illumination trend on the surface of the nail fold region, including:

[0067] Perform edge contour recognition and average light intensity recognition on each abnormal illumination sub-region to obtain regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, perform spatial posture adjustment on the ring light source to change the posture angle of the ring light source relative to the nail fold region; and / or, based on the average light intensity attribute information, perform local adjustment on the luminous intensity of the ring light source to change the local light illumination intensity of the ring light source to the nail fold region;

[0068] The nail fold area is dynamically photographed during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; the full-area dynamic image is sequentially subjected to frame processing and light intensity distribution recognition processing to obtain information on changes in the area of ​​the illuminated and shadowed areas on the surface of the nail fold area; based on the information on changes in the area of ​​the illuminated and shadowed areas, it is determined whether the area of ​​the illuminated and shadowed areas on the surface of the nail fold area shows a trend of shrinking during the adjustment process; if so, it is determined that the annular light source presents a trend of uniform illumination of the surface of the nail fold area; if not, it is determined that the annular light source does not present a trend of uniform illumination of the surface of the nail fold area.

[0069] In the above technical solution, the incident angle and intensity of the light emitted by the annular light source irradiating the nail fold area will affect the reflection of the light emitted by the annular light source by the nail fold area. In this way, by adjusting the posture angle of the annular light source and / or the luminous intensity at different positions, the reflection of the light emitted by the annular light source by the nail fold area can be improved, and the situation of concentrated reflection of the light by the nail fold area can be avoided. To this end, edge contour recognition and average light intensity recognition are performed on each abnormal illumination sub-area to obtain the regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-area; and based on the regional position attribute information, the spatial posture of the annular light source is adjusted to change the posture angle of the annular light source relative to the nail fold area; and / or based on the average light intensity attribute information, the luminous intensity of the annular light source is locally adjusted to change the local light irradiation intensity of the annular light source to the nail fold area, so that the annular light source can be adjusted in terms of both spatial posture angle and local luminous intensity, and the reflection concentration of the light emitted by the annular light source in the nail fold area can be improved to the maximum extent. In addition, during the process of adjusting the spatial posture of the annular light source and / or adjusting the local luminous intensity, the nail fold area is dynamically photographed synchronously to obtain a full-area dynamic image of the nail fold area under different light irradiation states of the annular light source, thereby identifying the area change information of the illuminated shadow area on the surface of the nail fold area, so as to quantitatively identify whether the surface of the nail fold area is uniformly illuminated by the light from the annular light source. The larger the area of ​​the illuminated shadow area on the surface of the nail fold area, the less uniformly illuminated the surface of the nail fold area is by the light from the annular light source. By analyzing the time change of the area change information of the illuminated shadow area, it is determined whether the area of ​​the illuminated shadow area on the surface of the nail fold area shows a trend of shrinking during the adjustment process, so as to further determine whether the annular light source shows a trend of uniform illumination of the surface of the nail fold area, providing a reliable basis for subsequent differentiated adjustment of the annular light source.

[0070] Preferably, in step S3, when the annular light source presents a uniform illumination trend on the surface of the nail fold area, a second image of the surface of the nail fold area under the illumination of the annular light source in the state adjustment is obtained; the second image is dynamically analyzed to obtain light intensity distribution change information on the surface of the nail fold area; based on the light intensity distribution change information, the optimal state of the annular light source in the state adjustment process is determined, including:

[0071] When the annular light source presents a uniform illumination trend on the surface of the nail fold area, a time interval in which the uniform illumination trend presents a peak value is determined based on a variation rule of the uniform illumination trend; based on the time interval, a corresponding full-area dynamic sub-image is intercepted from a full-area dynamic image captured of the surface of the nail fold area under illumination of the annular light source in a state adjustment;

[0072] The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in turn to determine the occurrence time when the illuminated shadow area on the surface of the nail fold region is at the minimum value; the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time is taken as the optimal state of the annular light source.

[0073] In the above technical solution, when the annular light source presents a uniform illumination trend on the surface of the nail fold area, it indicates that uniform illumination on the surface of the nail fold area can be achieved only by adjusting the spatial posture of the annular light source and / or adjusting the luminous intensity locally. At this time, based on the variation law of the uniform illumination trend, the time interval where the peak value of the uniform illumination trend is present is determined. When the peak value is present, the illumination uniformity of the surface of the nail fold area by the light emitted by the annular light source reaches an optimal state. Then, based on the time interval, a corresponding full-area dynamic sub-image is captured from the full-area dynamic image of the surface of the nail fold area taken under the illumination of the annular light source in the state adjustment. Then, the full-area dynamic sub-image is captured from the full-area dynamic image of the surface of the nail fold area taken under the illumination of the annular light source in the state adjustment. The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in turn to determine the occurrence time corresponding to the minimum area of ​​the illuminated shadow area on the surface of the nail fold region, and the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time is taken as the optimal state of the annular light source. In this way, it is possible to accurately determine in which spatial posture state and / or luminous intensity distribution state the annular light source is in order to achieve optimal illumination of the surface of the nail fold region, so as to facilitate the subsequent direct setting of the annular light source to the corresponding spatial posture state and / or luminous intensity distribution state to achieve optimal illumination for nail fold microcirculation imaging.

[0074] Preferably, in step S4, when the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, a third image of the space corresponding to the nail fold area under the illumination of the annular light source in the reference luminous state is obtained; scattered light analysis is performed on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; and corresponding fill light adjustment is performed based on the abnormal light distribution area, including:

[0075] When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space;

[0076] Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths;

[0077] Based on the light intensity distribution information, the abnormal light distribution area in the three-dimensional space where the nail fold area is located is determined; based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

[0078] In the above technical solution, when the annular light source does not show a trend of uniform illumination of the surface of the nail fold area, it indicates that no matter what form of spatial posture adjustment and / or local adjustment of the luminous intensity of the annular light source is performed, uniform illumination of the surface of the nail fold area cannot be achieved. At this time, supplementary light is required to illuminate the surface of the nail fold area in order to achieve uniform illumination of the surface of the nail fold area. To this end, the three-dimensional space where the nail fold area is located is photographed from multiple angles and image stitched under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space, and the scattered light analysis is performed on the panoramic image to obtain the light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in the three-dimensional space. There are a large number of wrinkle structures in the nail fold area, and the wrinkle structures form scattering microstructures, which can strongly scatter light of a certain range of wavelengths and weakly scatter light of another range of wavelengths. This will cause chromatic distortion of the image when the nail fold area is photographed. In order to maintain the color fidelity of the image of the nail fold area, the abnormal light distribution area in the three-dimensional space where the nail fold area is located is determined based on the light intensity distribution information; based on the position information of the abnormal light distribution area, the fill light illumination adjustment of the corresponding wavelength of visible light is performed, which can compensate for the chromatic distortion caused by the scattering of specific wavelengths in the light from the annular light source in the nail fold area, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0079] See also Figure 2 , is a schematic diagram of the framework of a ring light source detection and adjustment system for nail fold microcirculation imaging provided by an embodiment of the present invention. The ring light source detection and adjustment system for nail fold microcirculation imaging includes:

[0080] A first visual analysis module is used to obtain a first image of the nail fold area when the ring light source is in a reference lighting state, and analyze the first image to obtain reflection property information of the nail fold area to the light from the ring light source;

[0081] An irradiation anomaly identification module is used to identify all irradiation anomaly sub-regions of the nail fold region based on the reflection attribute information;

[0082] A light source state adjustment module, used to adjust the space state and / or the light emission state of the annular light source based on the attribute information of all abnormal illumination sub-regions;

[0083] A light source lighting trend judgment module, used to judge whether the annular light source presents a uniform lighting trend on the surface of the nail fold area based on the light intensity distribution change characteristic information of the nail fold area during the spatial state adjustment and / or the lighting state adjustment process;

[0084] The second visual analysis module is used to obtain a second image of the surface of the nail fold area when the ring light source is irradiated by the ring light source in a state adjustment when the ring light source presents a trend of uniform illumination of the surface of the nail fold area; and dynamically analyze the second image to obtain information on changes in light intensity distribution on the surface of the nail fold area;

[0085] A light source optimal state determination module, used to determine the optimal state of the annular light source during the state adjustment process based on the light intensity distribution change information;

[0086] A third visual analysis module is used for obtaining a third image of the space corresponding to the nail fold area under the illumination of the ring light source in a reference light emitting state when the ring light source does not show a trend of uniform illumination of the surface of the nail fold area; performing scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area;

[0087] The fill light adjustment module is used to perform corresponding fill light adjustment based on the abnormal light distribution area.

[0088] The ring light source detection and adjustment system for nail fold microcirculation imaging analyzes the first image of the nail fold area when the ring light source is in a reference luminous state, obtains the reflection property information of the nail fold area to the light, thereby identifying the abnormal luminous sub-area, and accurately positioning and identifying the glare caused by the morphology of the nail fold area itself; adjusts the spatial state and / or luminous state of the ring light source, and at the same time identifies the change of light intensity distribution in the nail fold area, and judges whether the ring light source presents a trend of uniform illumination of the surface of the nail fold area; visually identifies the change of light intensity distribution on the surface of the nail fold area, thereby determining the optimal state of the ring light source in the state adjustment process, so that the ring light source can optimally and uniformly illuminate the nail fold area; and also performs scattered light analysis on the image of the space corresponding to the nail fold area when the ring light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to avoid chromaticity distortion of nail fold area imaging due to light scattering, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0089] Preferably, the first visual analysis module is used to obtain a first image of the nail fold area when the ring light source is in a reference light emitting state, and analyze the first image to obtain reflection property information of the nail fold area to the light from the ring light source, including:

[0090] Scanning and photographing the nail fold area under the illumination of the annular light source in the reference luminous state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain distribution attribute information of reflected light from the annular light source in the nail fold area;

[0091] The radiation anomaly identification module is used to identify all radiation anomaly sub-regions of the nail fold region based on the reflection attribute information, including:

[0092] The reflected light distribution attribute information is analyzed to obtain the reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image; based on the reflected light intensity difference information, the reflected light intensity mutation screen sub-area of ​​the full-area image is determined, and the sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as the illumination abnormality sub-area.

[0093] In the above technical solution, the annular light source used for nailfold microcirculation imaging may include a number of LED light sources evenly arranged along an annular path, and each LED light source is individually configured with a light modulator, so that the annular light source can emit a light beam with an annular cross-sectional shape; the light modulator may be, but is not limited to, a collimating beam expander lens group and / or a beam cross-sectional shape modulating lens group, and each LED light source can individually adjust the luminous intensity. In addition, the annular light source is encapsulated as a whole in a shell, and the shell can be adjusted in three-dimensional space to change the overall spatial posture of the annular light source. During the initial imaging of the nail fold microcirculation, the nail fold area is first placed in an area near the illumination focus of the annular light source, and the annular light source is enabled to irradiate light to the nail fold area in a reference lighting state; wherein the reference lighting state may be, but is not limited to, that all LED light sources inside the annular light source irradiate light at a preset reference lighting intensity, at which time the nail fold area illuminated by the annular light source in the reference lighting state is scanned and photographed to obtain a full-area image of the nail fold area, and the full-area image is sequentially subjected to pixel grayscale conversion processing and pixel brightness value extraction processing, and the full-area image is subjected to pixel-dimensional brightness recognition, thereby refining and identifying the distribution of reflected light intensity formed by the nail fold area under the illumination of the annular light source. There is a wrinkled structure on the surface of the nail fold area. When the light emitted by the ring light source reaches the surface of the nail fold area, different wrinkle structures have different reflection effects on the light, which makes the reflected light intensity formed at different positions on the surface of the nail fold area different. The reflected light intensity formed at some positions on the surface of the nail fold area is smaller, while the reflected light intensity formed at other positions is larger. The position range with larger reflected light intensity is likely to cause overexposure in the shooting of the nail fold area. For this purpose, the reflected light distribution attribute information of the nail fold area is analyzed to obtain the reflected light intensity difference information between adjacent pixels on the entire screen of the full-area image, so as to comprehensively quantify the reflected light intensity difference between adjacent pixels on the full-area image screen, so as to further determine the reflected light intensity mutation screen sub-area of ​​the full-area image. For example, the area surrounded by all pixels whose reflected light intensity difference between adjacent pixels on the full-area image screen exceeds a preset difference threshold is determined as the reflected light intensity mutation screen sub-area, and the sub-area corresponding to the reflected light intensity mutation screen sub-area on the nail fold area is determined as the illumination abnormality sub-area, so as to identify and locate the sub-area on the nail fold area where the light from the ring light source is excessively concentratedly reflected, so as to provide a basis for subsequent adjustment of the state of the ring light source.

[0094] Preferably, the light source state adjustment module is used to adjust the space state and / or the light emission state of the ring light source based on the attribute information of all abnormal illumination sub-regions, including:

[0095] Perform edge contour recognition and average light intensity recognition on each abnormal illumination sub-region to obtain regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, perform spatial posture adjustment on the ring light source to change the posture angle of the ring light source relative to the nail fold region; and / or, based on the average light intensity attribute information, perform local adjustment on the luminous intensity of the ring light source to change the local light illumination intensity of the ring light source to the nail fold region;

[0096] The light source lighting trend judgment module is used to judge whether the annular light source presents a uniform lighting trend on the surface of the nail fold area based on the light intensity distribution change characteristic information of the nail fold area during the spatial state adjustment and / or the lighting state adjustment process, including:

[0097] The nail fold area is dynamically photographed during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; the full-area dynamic image is sequentially subjected to frame processing and light intensity distribution recognition processing to obtain information on changes in the area of ​​the illuminated and shadowed areas on the surface of the nail fold area; based on the information on changes in the area of ​​the illuminated and shadowed areas, it is determined whether the area of ​​the illuminated and shadowed areas on the surface of the nail fold area shows a trend of shrinking during the adjustment process; if so, it is determined that the annular light source presents a trend of uniform illumination of the surface of the nail fold area; if not, it is determined that the annular light source does not present a trend of uniform illumination of the surface of the nail fold area.

[0098] In the above technical solution, the incident angle and intensity of the light emitted by the annular light source irradiating the nail fold area will affect the reflection of the light emitted by the annular light source by the nail fold area. In this way, by adjusting the posture angle of the annular light source and / or the luminous intensity at different positions, the reflection of the light emitted by the annular light source by the nail fold area can be improved, and the situation of concentrated reflection of the light by the nail fold area can be avoided. To this end, edge contour recognition and average light intensity recognition are performed on each abnormal illumination sub-area to obtain the regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-area; and based on the regional position attribute information, the spatial posture of the annular light source is adjusted to change the posture angle of the annular light source relative to the nail fold area; and / or, based on the average light intensity attribute information, the luminous intensity of the annular light source is locally adjusted to change the local light irradiation intensity of the annular light source to the nail fold area, so that the annular light source can be adjusted in terms of both spatial posture angle and local luminous intensity, and the reflection concentration of the light emitted by the annular light source in the nail fold area can be improved to the maximum extent. In addition, during the process of adjusting the spatial posture of the annular light source and / or adjusting the local luminous intensity, the nail fold area is dynamically photographed synchronously to obtain a full-area dynamic image of the nail fold area under different light irradiation states of the annular light source, thereby identifying the area change information of the illuminated shadow area on the surface of the nail fold area, so as to quantitatively identify whether the surface of the nail fold area is uniformly illuminated by the light from the annular light source. The larger the area of ​​the illuminated shadow area on the surface of the nail fold area, the less uniformly illuminated the surface of the nail fold area is by the light from the annular light source. By analyzing the time change of the area change information of the illuminated shadow area, it is determined whether the area of ​​the illuminated shadow area on the surface of the nail fold area shows a trend of shrinking during the adjustment process, so as to further determine whether the annular light source shows a trend of uniform illumination of the surface of the nail fold area, providing a reliable basis for subsequent differentiated adjustment of the annular light source.

[0099] Preferably, the second visual analysis module is used to obtain a second image of the surface of the nail fold area when the annular light source is irradiated by the annular light source in a state adjustment when the annular light source presents a uniform illumination trend on the surface of the nail fold area; and dynamically analyze the second image to obtain information on changes in light intensity distribution on the surface of the nail fold area, including:

[0100] When the annular light source presents a uniform illumination trend on the surface of the nail fold area, a time interval in which the uniform illumination trend presents a peak value is determined based on a variation rule of the uniform illumination trend; based on the time interval, a corresponding full-area dynamic sub-image is intercepted from a full-area dynamic image captured of the surface of the nail fold area under illumination of the annular light source in a state adjustment;

[0101] The light source optimal state determination module is used to determine the optimal state of the annular light source during the state adjustment process based on the light intensity distribution change information, including:

[0102] The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in turn to determine the occurrence time when the illuminated shadow area on the surface of the nail fold region is at the minimum value; the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time is taken as the optimal state of the annular light source.

[0103] In the above technical solution, when the annular light source presents a uniform illumination trend on the surface of the nail fold area, it indicates that uniform illumination on the surface of the nail fold area can be achieved only by adjusting the spatial posture of the annular light source and / or adjusting the luminous intensity locally. At this time, based on the variation law of the uniform illumination trend, the time interval where the peak value of the uniform illumination trend is present is determined. When the peak value is present, the illumination uniformity of the surface of the nail fold area by the light emitted by the annular light source reaches an optimal state. Then, based on the time interval, a corresponding full-area dynamic sub-image is captured from the full-area dynamic image of the surface of the nail fold area taken under the illumination of the annular light source in the state adjustment. Then, the full-area dynamic sub-image is captured from the full-area dynamic image of the surface of the nail fold area taken under the illumination of the annular light source in the state adjustment. The full-area dynamic sub-image is subjected to frame processing and light intensity distribution recognition processing in turn to determine the occurrence time corresponding to the minimum area of ​​the illuminated shadow area on the surface of the nail fold region, and the occurrence time is matched with the state adjustment record of the annular light source, and the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time is taken as the optimal state of the annular light source. In this way, it is possible to accurately determine in which spatial posture state and / or luminous intensity distribution state the annular light source is in order to achieve optimal illumination of the surface of the nail fold region, so as to facilitate the subsequent direct setting of the annular light source to the corresponding spatial posture state and / or luminous intensity distribution state to achieve optimal illumination for nail fold microcirculation imaging.

[0104] Preferably, the third visual analysis module is used to obtain a third image of the space corresponding to the nail fold area under the illumination of the ring light source in the reference light emitting state when the ring light source does not present a trend of uniform illumination of the surface of the nail fold area; perform scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area, including:

[0105] When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space;

[0106] Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths;

[0107] Based on the light intensity distribution information, determining an abnormal light distribution area in the three-dimensional space where the nail fold area is located;

[0108] The fill light adjustment module is used to perform corresponding fill light adjustment based on the abnormal light distribution area, including:

[0109] Based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

[0110] In the above technical solution, when the annular light source does not show a trend of uniform illumination of the surface of the nail fold area, it indicates that no matter what form of spatial posture adjustment and / or local adjustment of the luminous intensity of the annular light source is performed, uniform illumination of the surface of the nail fold area cannot be achieved. At this time, supplementary light is required to illuminate the surface of the nail fold area in order to achieve uniform illumination of the surface of the nail fold area. To this end, the three-dimensional space where the nail fold area is located is photographed from multiple angles and image stitched under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space, and the scattered light analysis is performed on the panoramic image to obtain the light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in the three-dimensional space. There are a large number of wrinkle structures in the nail fold area, and the wrinkle structures form scattering microstructures, which can strongly scatter light of a certain range of wavelengths and weakly scatter light of another range of wavelengths. This will cause chromatic distortion of the image when the nail fold area is photographed. In order to maintain the color fidelity of the image of the nail fold area, the abnormal light distribution area in the three-dimensional space where the nail fold area is located is determined based on the light intensity distribution information; based on the position information of the abnormal light distribution area, the fill light illumination adjustment of the corresponding wavelength of visible light is performed, which can compensate for the chromatic distortion caused by the scattering of specific wavelengths in the light from the annular light source in the nail fold area, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0111] It can be seen from the contents of the above embodiments that the ring light source detection and adjustment method and system for nail fold microcirculation imaging analyzes the first image of the nail fold area when the ring light source is in a reference luminous state, obtains the reflection property information of the nail fold area to the light, thereby identifying the abnormal irradiation sub-area, and accurately positioning and identifying the glare caused by the morphology of the nail fold area itself; adjusts the spatial state and / or luminous state of the ring light source, and at the same time identifies the change of light intensity distribution in the nail fold area to determine whether the ring light source presents a trend of uniform illumination of the surface of the nail fold area; visually identifies the change of light intensity distribution on the surface of the nail fold area to determine the optimal state of the ring light source during the state adjustment process, so that the ring light source illuminates the nail fold area in the best uniform manner; and also performs scattered light analysis on the image of the space corresponding to the nail fold area when the ring light source is in a reference luminous state, determines the abnormal light distribution area, and performs fill light adjustment to avoid chromaticity distortion of nail fold area imaging due to light scattering, thereby improving the fidelity and accuracy of nail fold microcirculation imaging.

[0112] Obviously, those skilled in the art can make various changes and modifications to the present invention without departing from the spirit and scope of the present invention. Thus, if these modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include these modifications and variations.

Claims

1. A method for detecting and adjusting a ring light source for nail fold microcirculation imaging, characterized in that: It includes the following steps: Step S1, obtaining a first image of the nail fold area when the ring light source is in a reference luminous state, analyzing the first image to obtain reflection property information of the nail fold area to the light from the ring light source; based on the reflection property information, identifying all abnormal illumination sub-areas of the nail fold area, including scanning and photographing the nail fold area when the ring light source is in a reference luminous state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain reflection light distribution property information of the nail fold area to the light from the ring light source; analyzing the reflection light distribution property information to obtain reflection light intensity difference information between adjacent pixels on the entire screen of the full-area image; based on the reflection light intensity difference information, determining a sub-area of ​​the full-area image with a sudden change in reflection light intensity, and determining the sub-area corresponding to the sub-area of ​​the sub-area of ​​the reflection light intensity sudden change on the nail fold area as the abnormal illumination sub-area; Step S2, based on the attribute information of all abnormal illumination sub-regions, adjusting the spatial state and / or luminous state of the ring light source; based on the light intensity distribution change characteristic information of the nail fold region during the spatial state adjustment and / or luminous state adjustment process, judging whether the ring light source presents a uniform illumination trend on the surface of the nail fold region, including edge contour recognition and average light intensity recognition for each abnormal illumination sub-region, obtaining regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, adjusting the spatial posture of the ring light source, changing the position of the ring light source relative to the nail fold region posture angle; and / or based on the average light intensity attribute information, locally adjust the luminous intensity of the annular light source to change the local light irradiation intensity of the annular light source to the nail fold area; dynamically shoot the nail fold area during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; perform frame processing and light intensity distribution recognition processing on the full-area dynamic image in sequence to obtain information on changes in the area of ​​the illuminated and shadowed areas on the surface of the nail fold area; based on the information on the changes in the area of ​​the illuminated and shadowed areas, determine whether the area of ​​the illuminated and shadowed areas on the surface of the nail fold area shows a trend of shrinking during the adjustment process; If yes, it is determined that the annular light source presents a uniform lighting trend on the surface of the nail fold area; if no, it is determined that the annular light source does not present a uniform lighting trend on the surface of the nail fold area; Step S3, when the annular light source presents a uniform illumination trend on the surface of the nail fold area, a second image of the surface of the nail fold area under the illumination of the annular light source in the state adjustment is obtained; the second image is dynamically analyzed to obtain the light intensity distribution change information of the surface of the nail fold area; based on the light intensity distribution change information, the optimal state of the annular light source in the state adjustment process is determined, including when the annular light source presents a uniform illumination trend on the surface of the nail fold area, then based on the uniform illumination trend change law, the time interval where the uniform illumination trend presents a peak value is determined; based on the time interval, a corresponding full-area dynamic sub-image is intercepted from the full-area dynamic image taken of the surface of the nail fold area under the illumination of the annular light source in the state adjustment; the full-area dynamic sub-image is sequentially subjected to frame processing and light intensity distribution recognition processing to determine the occurrence time corresponding to the minimum value of the illuminated shadow area area of ​​the surface of the nail fold area; Matching the occurrence time with the state adjustment record of the annular light source, and taking the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time as the optimal state of the annular light source; Step S4, when the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, obtaining a third image of the space corresponding to the nail fold area under the illumination of the annular light source in a reference luminous state; performing scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; Based on the abnormal light distribution area, corresponding fill light adjustment is performed.

2. The method for detecting and adjusting annular light source for nail fold microcirculation imaging according to claim 1, characterized in that: The step S4 comprises: When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space; Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths; Based on the light intensity distribution information, the abnormal light distribution area in the three-dimensional space where the nail fold area is located is determined; based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

3. A ring light source detection and adjustment system for nail fold microcirculation imaging, characterized in that: include: A first visual analysis module is used to obtain a first image of the nail fold area when the ring light source is in a reference lighting state, analyze the first image, and obtain reflection property information of the nail fold area to the light from the ring light source, including scanning and photographing the nail fold area when the ring light source is in a reference lighting state to obtain a full-area image of the nail fold area; performing pixel grayscale conversion processing and pixel brightness value extraction processing on the full-area image to obtain reflection light distribution property information of the nail fold area to the light from the ring light source; an illumination abnormality identification module, for identifying all illumination abnormality sub-regions of the nail fold region based on the reflection attribute information, including analyzing the reflected light distribution attribute information to obtain reflected light intensity difference information between adjacent pixels on the entire screen of the full-region image; determining a sub-region of the full-region image with a sudden change in reflected light intensity based on the reflected light intensity difference information, and determining a sub-region corresponding to the sub-region of the reflected light intensity sudden change in the nail fold region as an illumination abnormality sub-region; A light source state adjustment module, for adjusting the spatial state and / or luminous state of the ring light source based on the attribute information of all abnormal illumination sub-regions, including edge contour recognition and average light intensity recognition for each abnormal illumination sub-region, obtaining the regional position attribute information and average light intensity attribute information corresponding to each abnormal illumination sub-region; based on the regional position attribute information, adjusting the spatial posture of the ring light source, changing the posture angle of the ring light source relative to the nail fold region; and / or, based on the average light intensity attribute information, locally adjusting the luminous intensity of the ring light source, changing the local light illumination intensity of the ring light source to the nail fold region; A light source lighting trend judgment module, for judging whether the annular light source presents a uniform lighting trend on the surface of the nail fold area based on the light intensity distribution change characteristic information of the nail fold area during the spatial state adjustment and / or the luminous state adjustment process, including dynamically photographing the nail fold area during the spatial posture adjustment and / or the local adjustment of the luminous intensity to obtain a full-area dynamic image of the nail fold area; performing frame processing and light intensity distribution recognition processing on the full-area dynamic image in sequence to obtain information on changes in the area of ​​the illuminated shadow area on the surface of the nail fold area; based on the information on the changes in the area of ​​the illuminated shadow area, determining whether the area of ​​the illuminated shadow area on the surface of the nail fold area presents a trend of shrinking during the adjustment process; If yes, it is determined that the annular light source presents a uniform lighting trend on the surface of the nail fold area; if no, it is determined that the annular light source does not present a uniform lighting trend on the surface of the nail fold area; A second visual analysis module is used for obtaining a second image of the surface of the nail fold area under the illumination of the ring light source in a state adjustment when the ring light source presents a uniform illumination trend on the surface of the nail fold area; performing dynamic analysis on the second image to obtain information on changes in light intensity distribution on the surface of the nail fold area, including determining a time interval at which a peak value of the uniform illumination trend is present based on a change rule of the uniform illumination trend when the ring light source presents a uniform illumination trend on the surface of the nail fold area; and based on the time interval, capturing a corresponding full-area dynamic sub-image from a full-area dynamic image of the surface of the nail fold area taken under the illumination of the ring light source in a state adjustment; A light source optimal state determination module is used to determine the optimal state of the annular light source during the state adjustment process based on the light intensity distribution change information, including sequentially performing frame processing and light intensity distribution recognition processing on the full-area dynamic sub-images to determine the occurrence time corresponding to the minimum value of the illuminated shadow area on the surface of the nail fold area; Matching the occurrence time with the state adjustment record of the annular light source, and taking the spatial posture state and / or luminous intensity distribution state of the annular light source corresponding to the occurrence time as the optimal state of the annular light source; A third visual analysis module is used for obtaining a third image of the space corresponding to the nail fold area under the illumination of the ring light source in a reference light emitting state when the ring light source does not present a trend of uniform illumination of the surface of the nail fold area; performing scattered light analysis on the third image to obtain an abnormal light distribution area of ​​the space corresponding to the nail fold area; The fill light adjustment module is used to perform corresponding fill light adjustment based on the abnormal light distribution area.

4. The ring light source detection and adjustment system for nail fold microcirculation imaging according to claim 3, characterized in that: The third visual analysis module includes: When the annular light source does not show a trend of uniformly irradiating the surface of the nail fold area, the three-dimensional space where the nail fold area is located is photographed from multiple directions and image stitching is performed under the illumination of the annular light source in the reference luminous state to obtain a panoramic image of the three-dimensional space; Performing scattered light analysis on the panoramic image to obtain light intensity distribution information of the scattered light generated by the nail fold area under the illumination of the annular light source in three-dimensional space; wherein the light intensity distribution information includes light intensity distribution information of visible light of different wavelengths; Based on the light intensity distribution information, determining an abnormal light distribution area in the three-dimensional space where the nail fold area is located; The fill light adjustment module comprises: Based on the position information of the abnormal light distribution area, the supplementary light irradiation of the corresponding wavelength of visible light is adjusted.

Images