Array substrate manufacturing method, display panel and display device

Abstract

The application belongs to the technical field of display, and particularly relates to a preparation method of an array substrate, a display panel and a display device. A groove corresponding to a supporting column is arranged on the side of the array substrate, and the groove is filled with a photoactive agent. The photoactive agent can react with a reaction piece in a liquid crystal layer under the action of light to generate a complementary alignment film with an alignment force. When the alignment film on the side of the array substrate is scratched due to the friction of the supporting column, the photoactive agent in the groove is exposed and reacts with the reaction piece in the liquid crystal layer under the action of light to generate a complementary alignment film capable of aligning liquid crystal molecules. The liquid crystal molecules are aligned by using the complementary alignment film, so that the liquid crystal molecules at the scratched part of the alignment film are not disordered, the liquid crystal molecules at the scratched part of the alignment film are arranged in order, problems such as red and blue spot defects are improved, and the display effect of the display panel and the display device is improved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of display, and particularly relates to a preparation method of an array substrate, a display panel and a display device. BACKGROUND

[0002] With the development of display technology, liquid crystal display panels (LCD) are favored by consumers due to their low cost and mature technology, especially thin and light display panels. After cell formation, the thin and light display panel needs to be thinned to reduce the overall thickness of the display panel.

[0003] The existing LCD display panel usually has a support column (PhotoSpacer, PS) designed between the array substrate and the opposing substrate, thereby supporting the display panel. However, the support column is easily scratched on the alignment film on the array substrate side under the influence of external force (such as thinning or transportation bumps), which makes the alignment film scratched and loses the alignment ability, resulting in disordered liquid crystal arrangement, increased transmittance at the scratch, and further problems such as red and blue spots. SUMMARY

[0004] The purpose of the present application is to provide a preparation method of an array substrate, a display panel and a display device, which can improve the red and blue spot display failure problem caused by the support column scratching the alignment film.

[0005] The first aspect of the present application provides a preparation method of an array substrate, comprising the following steps:

[0006] forming a first metal layer on a substrate and patterning the first metal layer to form a gate electrode;

[0007] forming a gate insulating layer and a semiconductor layer on the substrate in sequence, the gate insulating layer covering the gate electrode;

[0008] depositing a second metal layer on the gate insulating layer and the semiconductor layer, and patterning the second metal layer to form a first electrode and a second electrode arranged at intervals, the first electrode and the second electrode being respectively overlapped on opposite sides of the semiconductor layer;

[0009] forming a passivation layer on the gate insulating layer and the semiconductor layer, the passivation layer covering the first electrode and the second electrode;

[0010] depositing a planarization layer on the passivation layer and patterning the planarization layer to form a groove and a through hole, the through hole exposing part of the first electrode;

[0011] forming a pixel electrode on the planarization layer, the pixel electrode being connected to the first electrode through the through hole;

[0012] coating a photo initiator on the flat layer;

[0013] coating an alignment film on the flat layer, the alignment film covering the photo initiator on the flat layer.

[0014] In an exemplary embodiment of the present application, the preparation method of the recesses includes, after the flat layer is patterned on the flat layer:

[0015] exposing the flat layer to form the recesses and the through holes.

[0016] In an exemplary embodiment of the present application, after the photo initiator is coated on the flat layer, the preparation method further includes:

[0017] processing the photo initiator outside the recesses with light to deactivate the photo initiator outside the recesses.

[0018] A display panel is provided in the second aspect of the present application. The display panel includes a counter substrate, a liquid crystal layer, support columns, and an array substrate prepared by the preparation method described in any one of the above aspects. The array substrate is arranged in a cell with the counter substrate. The liquid crystal layer and the support columns are arranged between the array substrate and the counter substrate. The support columns are arranged on the side of the counter substrate and extend to the side of the array substrate. The array substrate includes a substrate and a gate electrode, a gate insulating layer, a semiconductor layer, a first electrode, a second electrode, a passivation layer, and a pixel electrode arranged on the substrate. The gate electrode is arranged on the substrate. The gate insulating layer is arranged between the gate electrode and the semiconductor layer. The first electrode and the second electrode are arranged on both ends of the semiconductor layer. The passivation layer is arranged on the side of the gate insulating layer away from the substrate, and the passivation layer covers the first electrode, the second electrode, and the semiconductor layer. The liquid crystal layer includes liquid crystal molecules and a reaction member. The array substrate further includes:

[0019] a flat layer arranged on the side of the passivation layer away from the substrate. The flat layer is provided with recesses and through holes. The through holes expose part of the first electrode. The pixel electrode is connected to the first electrode through the through holes. The recesses correspond to the support columns one by one. The recesses are filled with a photo initiator. The photo initiator can react with the reaction member under the action of light to form a complementary alignment film having an alignment force for the liquid crystal molecules.

[0020] an alignment film arranged on the side of the flat layer away from the substrate, and the alignment film covers the recesses.

[0021] In another exemplary embodiment of the present application, a projection of the support column on the substrate substrate is located within a projection of the groove on the substrate substrate.

[0022] In another exemplary embodiment of the present application, a cross-sectional area of the groove gradually increases in a direction from the substrate substrate to the planar layer.

[0023] In another exemplary embodiment of the present application, the groove comprises an inclined portion and a flat portion, the flat portion is located opposite to the support column, a projection of the support column on the substrate substrate is located within a projection of the flat portion on the substrate substrate; the inclined portion is located around an edge of the flat portion, and a side of the inclined portion away from the flat portion abuts against the alignment film.

[0024] In another exemplary embodiment of the present application, a depth H of the groove is less than a thickness D of the planar layer; and the depth H of the groove and the thickness D of the planar layer satisfy the following relationship:

[0025] 1 / 5D≤H≤D.

[0026] In another exemplary embodiment of the present application, the opposite substrate comprises a base and a color resistance layer provided on the base, the color resistance layer comprises color resistances and a black matrix, colors of adjacent color resistances are different, and the black matrix is provided between adjacent color resistances.

[0027] The support column is provided on a side of the color resistance layer away from the base, and the support column is provided on the black matrix, a projection of the support column on the base is located within a projection of the black matrix on the base.

[0028] A projection of the black matrix on the substrate substrate is located within a projection of the groove on the substrate substrate.

[0029] The third aspect of the present application provides a display device, the display device comprising a backlight module and the display panel of any one of the above aspects, the display panel being provided on a light-emitting side of the backlight module.

[0030] The array substrate preparation method, the display panel and the display device provided in the present application have at least the following beneficial effects:

[0031] By setting the grooves corresponding to the support columns on the array substrate side, and filling the grooves with the photoactive agent, the photoactive agent can react with the reaction member in the liquid crystal layer under the action of light to produce a complementary alignment film with an alignment force, and when the alignment film on the array substrate side is not scratched by the support column, the alignment of the liquid crystal molecules relies on the alignment film; when the alignment film on the array substrate side is scratched by the friction of the support column, the photoactive agent in the groove is exposed, and the photoactive agent reacts with the reaction member in the liquid crystal layer under the action of light to produce a complementary alignment film capable of aligning the liquid crystal molecules. The liquid crystal molecules are aligned by the complementary alignment film, so that the liquid crystal molecules at the scratch of the alignment film are not disordered, the liquid crystal molecules at the scratch of the alignment film are orderly arranged, the problems such as red and blue spot defects are improved, and the display effect of the display panel and the display device is improved.

[0032] Other features and advantages of the present application will become apparent from the following detailed description, or will be learned by practice of the present application.

[0033] It should be understood that the foregoing general description and the following detailed description are only exemplary and explanatory, and cannot limit the present application. BRIEF DESCRIPTION OF DRAWINGS

[0034] The drawings incorporated into the specification and constituting a part of the specification show embodiments consistent with the present application and, together with the specification, serve to explain the principles of the present application. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor.

[0035] Figure 1 A cross-sectional structure schematic diagram of the array substrate provided by the embodiment one, the embodiment two or the embodiment three of the present application is shown;

[0036] Figure 2 A cross-sectional structure schematic diagram of the reaction of the photoactive agent with the reaction member provided by the embodiment one, the embodiment two or the embodiment three of the present application is shown;

[0037] Figure 3 A preparation method flowchart of the array substrate provided by the embodiment one, the embodiment two or the embodiment three of the present application is shown;

[0038] Figures 4a-4j A step schematic diagram of the array substrate preparation method provided by the embodiment one, the embodiment two or the embodiment three of the present application is shown;

[0039] Figure 5 A structure schematic diagram of the inactivation of the photoactive agent outside the groove by light provided by the embodiment one, the embodiment two or the embodiment three of the present application is shown;

[0040] Figure 6 Fig. 1 shows a structural schematic diagram of a display panel and a backlight module connected according to an embodiment of the present application.

[0041] Legend of signs:

[0042] 1. display device;

[0043] 10. display panel;

[0044] 100. array substrate; 110. substrate; 120. gate; 130. gate insulating layer; 140. semiconductor layer; 150. first electrode; 160. second electrode; 170. passivation layer; 180. planarization layer; 181. groove; 1810. inclined part; 1811. flat part; 182. via hole; 190. pixel electrode; 1100. photoinitiator; 1110. alignment film; 200. counter substrate; 210. base; 220. color resist layer; 221. color resist; 222. black matrix; 300. support column; 400. liquid crystal layer; 410. liquid crystal molecule; 420. reaction piece; 500. first mask plate; 600. second mask plate;

[0045] 20. backlight module. DETAILED DESCRIPTION

[0046] Example implementations will now be described more fully with reference to the accompanying drawings. Example implementations may, however, be implemented in many different forms and should not be construed as limited to the implementations set forth in this disclosure; rather, these implementations are provided so that this disclosure will be thorough and complete, and will fully convey the inventive aspects to those skilled in the art. Like reference numerals may refer to like elements throughout.

[0047] In the present application, the terms "first", "second", etc. are used only for the purpose of description, and should not be understood as indicating or implying relative importance or implying the number of the technical features indicated. Therefore, the features defined as "first", "second" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "a plurality of" is two or more, unless otherwise explicitly specified and limited.

[0048] In the present application, unless otherwise explicitly specified and limited, the terms "assembly", "connection" and the like should be understood broadly, for example, can be fixed connection, can be detachable connection, or integral; can be mechanical connection, can be electrical connection; can be direct connection, can be indirect connection through an intermediate medium, can be internal communication of two elements or interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0049] Moreover, the described features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. In the following description, numerous specific details are provided to give a thorough understanding of embodiments of the application. One skilled in the relevant art will recognize, however, that the application can be practiced without one or more of the specific details, or with other methods, components, materials, and so forth. In other instances, well-known structures, devices, implementations, or operations are not shown or described in detail to avoid obscuring aspects of the application.

[0050] Embodiment One

[0051] Referring to Figure 1 , Figure 2 and Figure 3 , Embodiment One of the present application provides a manufacturing method of an array substrate 100, comprising the following steps:

[0052] Step S100, forming a first metal layer on a substrate 110, and patterning the first metal layer to form a gate 120 and a scan line, the scan line being connected to the gate 120, as shown in Figure 4a .

[0053] In this step S100, it comprises:

[0054] Depositing the first metal layer on the substrate 110 by a physical vapor deposition method (PVD).

[0055] Patterning the first metal layer by a first mask process to obtain the gate 120 and the scan line.

[0056] The substrate 110 can be made of glass, quartz or other suitable materials; the material of the first metal layer includes molybdenum (Mo), copper (Cu) and the like.

[0057] Further, the first mask process comprises photoresist coating, exposure, development, wet etching and photoresist stripping processes. The first mask process is used to form a plurality of gates 120 on the substrate 110, and the adjacent gates 120 are arranged at intervals.

[0058] Step S200, sequentially forming a gate insulating layer 130 and a semiconductor layer 140 on the substrate 110, the gate insulating layer 130 covering the gate 120 and the scan line, as shown in Figure 4b .

[0059] The material of the gate insulating layer 130 includes one or more of silicon oxide (SiOx) and silicon nitride (SiNx); the material of the semiconductor layer 140 includes one or more of amorphous silicon, polycrystalline silicon and metal oxide.

[0060] In addition, both the gate insulating layer 130 and the semiconductor layer 140 are deposited using chemical vapor deposition (CVD).

[0061] In step S300, a second metal layer is deposited on the gate insulating layer 130 and the semiconductor layer 140, and the second metal layer is patterned to form a first electrode 150, a second electrode 160, and data lines spaced apart from each other, such as... Figure 4c As shown.

[0062] It should be noted that the method used to deposit the second metal layer is physical vapor deposition (PVD).

[0063] In addition, the patterning process for the second metal layer includes photoresist coating, exposure, development, wet etching, and photoresist stripping.

[0064] Materials for the second metal layer include molybdenum (Mo) and copper (Cu).

[0065] It is worth mentioning that the first electrode 150 can be either the source or the drain, and the second electrode 160 can be either the source or the drain.

[0066] For example, the first electrode 150 is the drain electrode and the second electrode 160 is the source electrode. The two are spaced apart on the gate insulating layer 130. One end of the first electrode 150 and one end of the second electrode 160 are respectively connected to the opposite sides of the semiconductor layer 140 formed in step S800.

[0067] In step S400, a passivation layer 170 is formed on the gate insulating layer 130 and the semiconductor layer 140. The passivation layer 170 covers the first electrode 150, the second electrode 160, and the data lines, such as... Figure 4d As shown.

[0068] In step S500, a planarization layer 180 is deposited on the passivation layer 170, and the planarization layer 180 is patterned to form a groove 181 and a via 182, wherein the via 182 exposes a portion of the first electrode 150, as shown below. Figure 4e and Figure 4f As shown.

[0069] Understandably, since the first electrode 150 is covered by two layers, a passivation layer 170 and a planarization layer 180, in order to expose part of the first electrode 150, through holes 182 need to be formed on both the planarization layer 180 and the passivation layer 170 by patterning the planarization layer 180. Specifically, the planarization layer 180 has through holes, and the passivation layer 170 has partial through holes.

[0070] In step S600, a pixel electrode 190 is formed on the planarization layer 180. The pixel electrode 190 is connected to the first electrode 150 through a via 182, as shown below. Figure 4g As shown.

[0071] The material of the pixel electrode 190 can be indium tin oxide (ITO), indium tin zinc oxide (ITZO). The pixel electrode 190 can be in a block or strip structure.

[0072] In step S700, a layer of photoinitiator 1100 is coated on the flat layer 180, as shown in FIG. 7A. Figure 4h

[0073] The photoinitiator 1100 can be a photosensitive initiator, which can form a complementary alignment film 1110 with the reaction element 420 in the liquid crystal layer 400 under light irradiation, and the complementary alignment film 1110 has an alignment force on the liquid crystal molecules 410.

[0074] In step S800, a layer of alignment film 1110 is coated on the flat layer 180, and the alignment film 1110 covers the photoinitiator 1100 on the flat layer 180, as shown in FIG. 8A. Figure 4j

[0075] It is worth mentioning that the alignment film 1110 can be used to align the liquid crystal molecules 410 in the liquid crystal layer 400 between the array substrate 100 and the opposing substrate 200.

[0076] The existing support column 300 is provided on the opposing substrate 200, and when affected by external force, the support column 300 is easy to rub the alignment film 1110 on the array substrate 100 side, so that the alignment film 1110 is scratched and loses the alignment ability, and then causes the liquid crystal arrangement to be disordered, causing the transmittance of the scratch to increase, and causing the red and blue spot problem.

[0077] The present application adopts a layer of photoinitiator 1100 below the alignment film 1110, please refer to FIG. 9A. Figure 1 When the support column 300 scratches the alignment film 1110 on the surface of the array substrate 100, the photoinitiator 1100 below the alignment film 1110 is exposed, and under the action of light, it reacts with the reaction element 420 in the liquid crystal layer 400 to form a complementary alignment film 1110 with an alignment force on the liquid crystal molecules 410, as shown in FIG. 9B. Figure 2 The alignment order of the liquid crystal molecules 410 at the scratch is ensured, and then the transmittance at the scratch is ensured, and the display effect of the display panel 10 and the display device 1 is ensured.

[0078] The photoinitiator 1100 can be a photosensitive initiator, which can form a complementary alignment film 1110 with the reaction element 420 in the liquid crystal layer 400 under light irradiation, and the complementary alignment film 1110 has an alignment force on the liquid crystal molecules 410.

[0079] The light can be ultraviolet light for irradiating the photoinitiator 1100, or other light for irradiating the photosensitive initiator, as long as it can promote the reaction between the photoinitiator 1100 and the reaction element 420 in the liquid crystal layer 400.​​

[0080] In addition, as shown in Figure 2 the light irradiation direction can be from the direction of the backlight module 20, i.e. the direction of the array substrate 100 away from the opposite substrate 200. By irradiating the ultraviolet light from the direction of the array substrate 100 away from the opposite substrate 200, the photoinitiator 1100 in the groove 181 can be protected by the above-mentioned gate electrode 120, the first electrode 150 and the second electrode 160, so as to avoid the photoinitiator 1100 in the groove 181 losing activity, and the photoinitiator 1100 in the groove 181 and the reaction member 420 in the liquid crystal layer 400 generate the complementary alignment film 1110 with alignment ability, so as to ensure the ordered arrangement of the liquid crystal molecules 410 in the liquid crystal layer 400.

[0081] It should be noted that, as shown in Figure 1 or Figure 2 the liquid crystal layer 400 includes a plurality of liquid crystal molecules 410 and a plurality of reaction members 420. The reaction member 420 can be hexyl methacrylate (HMA monomers). The ultraviolet light irradiates the display panel 10 to make the reaction member 420 react to form a pre-tilt angle of the liquid crystal molecules 410.

[0082] In some embodiments of the present application, as shown in Figure 4e and Figure 4f the preparation method of the groove 181 includes:

[0083] exposing the planar layer 180 to form the groove 181 and the via hole 182.

[0084] It can be understood that the exposure of the planar layer 180 includes patterning the planar layer 180 by using the first mask plate 500 to form the groove 181 and the via hole.

[0085] As shown in Figure 4f the first mask plate 500 can be a half-tone mask plate or a gray-tone mask plate. The first mask plate 500 has at least three regions with different light transmittances. The transmittance of the first mask plate 500 corresponding to the region other than the groove 181 and the via hole is 0, i.e. the light cannot pass through the first mask plate 500, i.e. the planar layer 180 is not processed; the transmittance of the first mask plate 500 corresponding to the groove 181 is greater than 0 but less than the transmittance of the first mask plate 500 corresponding to the via hole; the transmittance of the mask plate corresponding to the via hole is greater than the transmittance of the mask plate corresponding to the groove 181, which needs to completely penetrate the planar layer 180 and partially penetrate the passivation layer 170 to expose part of the first electrode 150.

[0086] In the embodiments of the present application, asFigure 1 and Figure 2 As shown in FIG. 18, the groove 181 corresponds to the support column 300 on the opposite substrate 200 one by one. When the support column 300 is moved or affected by other external forces, the support column 300 will scratch the alignment film 1110 below the support column 300 in advance, that is, the alignment film 1110 corresponding to the position below the support column 300 is easily damaged by the support column 300. Therefore, by corresponding the groove 181 to the support column 300 one by one, when the alignment film 1110 below the support column 300 is scratched, the photoactive agent in the groove 181 can form a complementary alignment film 1110 with the reaction member 420 in the liquid crystal layer 400 under the action of ultraviolet light, so as to make the liquid crystal molecules 410 at the scratch position align in order, ensure the transmittance, and eliminate the red and blue spot phenomenon.

[0087] It should be understood that, as shown in FIG. 19, in order to avoid the red and blue spot phenomenon, the orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the groove 181 on the substrate 110, that is, the size of the groove 181 is greater than the maximum size of the support column 300, so as to ensure the maintenance effect on the liquid crystal molecules 410 in the area that can be scratched by the support column 300, avoid the red and blue spot phenomenon, ensure the alignment order of the liquid crystal molecules 410, and further ensure the display effect of the display panel 10 and the display device 1. Figure 1 Figure 2 As shown in FIG. 19, in order to avoid the red and blue spot phenomenon, the orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the groove 181 on the substrate 110, that is, the size of the groove 181 is greater than the maximum size of the support column 300, so as to ensure the maintenance effect on the liquid crystal molecules 410 in the area that can be scratched by the support column 300, avoid the red and blue spot phenomenon, ensure the alignment order of the liquid crystal molecules 410, and further ensure the display effect of the display panel 10 and the display device 1.

[0088] As shown in FIG. 19, in order to avoid the red and blue spot phenomenon, the orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the groove 181 on the substrate 110, that is, the size of the groove 181 is greater than the maximum size of the support column 300, so as to ensure the maintenance effect on the liquid crystal molecules 410 in the area that can be scratched by the support column 300, avoid the red and blue spot phenomenon, ensure the alignment order of the liquid crystal molecules 410, and further ensure the display effect of the display panel 10 and the display device 1.

[0089] In the embodiment of the present application, as shown in FIG. 20, in the direction from the substrate 110 to the planar layer 180, the cross-sectional area of the groove 181 gradually increases. The groove 181 with gradually increasing cross-sectional area can ensure that the photoactive agent 1100 can flow into the groove 181 when the photoactive agent 1100 is coated, so as to ensure that the groove 181 has the photoactive agent 1100, and further ensure that the photoactive agent 1100 in the groove 181 generates a complementary alignment film 1110 with the reaction member 420 in the liquid crystal layer 400, so that the liquid crystal molecules 410 are arranged in order. Figure 2 For example, as shown in FIG. 21, in the direction from the substrate 110 to the planar layer 180, the cross-sectional area of the groove 181 gradually increases. The groove 181 with gradually increasing cross-sectional area can ensure that the photoactive agent 1100 can flow into the groove 181 when the photoactive agent 1100 is coated, so as to ensure that the groove 181 has the photoactive agent 1100, and further ensure that the photoactive agent 1100 in the groove 181 generates a complementary alignment film 1110 with the reaction member 420 in the liquid crystal layer 400, so that the liquid crystal molecules 410 are arranged in order.

[0090] Figure 4g ​​As shown, the groove 181 includes an inclined portion 1810 and a flat portion 1811, the flat portion 1811 is arranged at the bottom of the groove 181 and is parallel to the opposite substrate 200, that is, the flat portion 1811 is a plane; the inclined portion 1810 is arranged around the flat portion 1811. In the direction from the substrate 110 to the flat layer 180, the cross-sectional area of the inclined portion 1810 gradually increases, that is, the groove 181 has an inverted trapezoidal structure. The orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the flat portion 1811 on the substrate 110, so as to ensure that the range of the generated supplemental alignment film 1110 meets the maximum scratch range of the support column 300, and the liquid crystal molecules 410 in the maximum scratch range can be orderly arranged, thereby ensuring the alignment order of the liquid crystal molecules 410 and the display effect of the display panel 10 and the display device 1.

[0091] The inclined portion 1810 can limit and protect the support column 300, and also ensure the generation range of the supplemental alignment film 1110, and reduce the manufacturing cost; and the light initiator 1100 can flow into the groove 181, so that the groove 181 is filled with the light initiator 1100.

[0092] It can be understood that, as shown in Figure 4f As shown, when the groove 181 has an inverted trapezoidal opening structure, the light transmission region corresponding to the first mask plate 500 includes a plurality of light transmission sub-regions. The light transmission rate of the light transmission sub-region corresponding to the flat portion 1811 is greater than that of the light transmission sub-region corresponding to the inclined portion 1810, and the light transmission rates of the light transmission sub-regions corresponding to the inclined portions 1810 are different, and the light transmission rate of the light transmission sub-region gradually decreases in the horizontal direction from the bottom of the inclined portion 1810 to the top of the inclined portion 1810, so as to form the inclined portion 1810 with gradually increasing cross-sectional area.

[0093] In addition, the top surface of the inclined portion 1810 abuts against the side of the alignment film 1110 away from the liquid crystal layer 400.

[0094] It is worth mentioning that the groove 181 can penetrate part of the flat layer 180 or can penetrate the entire flat layer 180.

[0095] In the embodiments of the present application, as shown in Figure 4e As shown, the depth H of the groove 181 is less than the thickness D of the flat layer 180, and the depth H of the groove 181 and the thickness D of the flat layer 180 satisfy the following relationship: 1 / 5D≤H≤D. For example, the depth H of the groove 181 is 2 / 5 of the thickness D of the flat layer 180. Through this design, there is sufficient photoactive agent in the groove 181, which can react with the reaction piece 420 to generate the supplemental alignment film 1110, thereby ensuring the alignment of the liquid crystal molecules 410 at the scratch, and ensuring the display effect of the display panel 10.

[0096] In addition, please see Figure 4i As shown, after coating the photoinitiator 1100 on the planarization layer 180, the preparation method further includes:

[0097] The photoinitiator 1100 located outside the groove 181 is phototreated to deactivate the photoinitiator 1100 located outside the groove 181.

[0098] That is, the photoinitiator 1100 outside the groove 181 is exposed to make the photoinitiator 1100 lose its activity and cannot react with the reaction element 420 inside the liquid crystal layer 400.

[0099] In other words, only the photoinitiator 1100 located in the groove 181 is not exposed. It can react with the reactant 420 in the liquid crystal layer 400 under light to generate a supplementary alignment film 1110, thereby ensuring the alignment of the liquid crystal molecules 410.

[0100] Please see below. Figure 4i As shown, the photoinitiator 1100 outside the groove 181 can be exposed using light and a second mask 600. This second mask 600 has two light transmittance regions: a first completely transmittance region corresponding to the area outside the groove 181, and a second completely opaque region corresponding to the groove 181 region. Please refer to... Figure 5 As shown, the photoinitiator 1100 outside the groove 181 can also be exposed using only light, that is, ultraviolet light is emitted from the side of the array substrate 100 away from the opposing substrate 200, and the metal at the array substrate 100 is used to shield and protect the photoactive agent in the groove 181, so as to prevent the photoactive agent in the groove 181 from losing its activity; by using only light, the use of photomasks can be reduced, and the manufacturing cost can be reduced.

[0101] It is worth mentioning that, please see Figure 5 As shown, when it is necessary to deactivate the photoinitiator 1100 outside the groove 181 and to irradiate the array substrate 100 from the side away from the opposing substrate 200, the orthogonal projections of the gate 120, the first electrode 150 and the second electrode 160 on the substrate 110 should completely cover the orthogonal projection of the groove 181 on the substrate 110 or completely overlap with the orthogonal projection of the groove 181 on the substrate 110, so as to avoid the photoinitiator 1100 in the groove 181 from losing its activity and to ensure that the photoinitiator 1100 in the groove 181 forms a supplementary alignment film 1110 with the reactant 420.

[0102] In addition, please see Figure 6 As shown, the opposing substrate 200 includes a substrate 210 and a color resist layer 220 disposed on the substrate 210.

[0103] The base 210 can be made of the same material as the substrate 110, such as glass, quartz or other suitable material; the color resist layer 220 includes a plurality of black matrices 222 and a plurality of color resists 221 of different colors, the colors of adjacent color resists 221 are the same, and the black matrix 222 is arranged between adjacent color resists 221.

[0104] For example, the color resist layer 220 includes red color resists, green color resists and blue color resists, which are arranged in the row direction in turn and are spaced apart, and a pixel unit is formed between the red color resists, the green color resists and the blue color resists. The black matrix 222 is arranged between the red color resists and the green color resists, between the green color resists and the blue color resists, and between the blue color resists and the red color resists, so as to prevent color mixing between adjacent color resists 221.

[0105] The support column 300 is arranged on the black matrix 222 to ensure light transmittance, and the orthographic projection of the support column 300 on the base 210 is located in the orthographic projection of the black matrix 222 on the base 210, so as to avoid affecting the light transmittance of the support column 300.

[0106] It should be noted that the orthographic projection of the black matrix 222 on the substrate 110 is located in the orthographic projection of the groove 181 on the substrate 110, so as to ensure the alignment of the liquid crystal molecules 410 and the deflection of the liquid crystal molecules 410 to light, thereby ensuring the display effect.

[0107] Embodiment Two

[0108] As shown in FIG. 10, the display panel 10 provided by the embodiment two of the present application includes an array substrate 100, a counter substrate 200, a liquid crystal layer 400 and a support column 300. The array substrate 100 and the counter substrate 200 are arranged in a cell, and the liquid crystal layer 400 and the support column 300 are arranged between the array substrate 100 and the counter substrate 200. The support column 300 is arranged on the side of the counter substrate 200 and extends to the side of the array substrate 100. Figure 1 or Figure 2 As shown in FIG. 10, the display panel 10 provided by the embodiment two of the present application includes an array substrate 100, a counter substrate 200, a liquid crystal layer 400 and a support column 300. The array substrate 100 and the counter substrate 200 are arranged in a cell, and the liquid crystal layer 400 and the support column 300 are arranged between the array substrate 100 and the counter substrate 200. The support column 300 is arranged on the side of the counter substrate 200 and extends to the side of the array substrate 100.

[0109] It needs to be explained, please see Figure 2 As shown in the figure, the liquid crystal layer 400 includes liquid crystal molecules 410 and reaction pieces 420; the liquid crystal layer 400 contains a plurality of liquid crystal molecules 410 and a plurality of reaction pieces 420 distributed at intervals, and the reaction piece 420 can adopt hexyl methacrylate (HMA monomers). The reaction piece 420 is reacted under the irradiation of ultraviolet light on the display panel 10 to make the liquid crystal molecules 410 form a pre-tilt angle.

[0110] In addition, please see Figure 4j As shown in the figure, the array substrate 100 further includes a planar layer 180 and an alignment film 1110; the planar layer 180 is arranged on the side of the passivation layer 170 away from the substrate substrate 110, and the planar layer 180 is provided with a groove 181 and a via hole. The preparation method of the groove 181 and the via hole is as described in Embodiment One, which will not be described in detail here. The alignment film 1110 is arranged on the side of the planar layer 180 away from the substrate substrate 110, and the alignment film 1110 covers the groove 181.

[0111] Among them, please see Figure 2 and Figure 4f The via hole leaks part of the first electrode 150, and the pixel electrode 190 is connected with the first electrode 150 through the via hole to transmit signals. The groove 181 corresponds to the support column 300 one by one, and the groove 181 is filled with a photoinitiator 1100, which can react with the reaction piece 420 in the liquid crystal layer 400 under the action of light to form a complementary alignment film 1110 with alignment force to the liquid crystal molecules 410. The photoinitiator 1100 can adopt a photosensitive initiator, which can form a complementary alignment film 1110 with alignment force to the liquid crystal molecules 410 by reacting with the reaction piece 420 in the liquid crystal layer 400 under the action of light.

[0112] The present application adopts a layer of photoinitiator 1100 arranged below the alignment film 1110. When the alignment film 1110 on the surface of the array substrate 100 is scratched by the support column 300, the photoinitiator 1100 below the alignment film 1110 is exposed, which reacts with the reaction piece 420 in the liquid crystal layer 400 under the action of light to form a complementary alignment film 1110 with alignment force to the liquid crystal molecules 410, ensuring the alignment order of the liquid crystal molecules 410 at the scratch, and further ensuring the transmittance at the scratch, ensuring the display effect of the display panel 10 and the display device 1.

[0113] The light can be ultraviolet light for irradiating the photoinitiator 1100, or other light for irradiating the photosensitive initiator, as long as it can promote the reaction between the photoinitiator 1100 and the reaction piece 420 in the liquid crystal layer 400.

[0114] In addition, please see Figure 2As shown, the incident direction of the light can be from the direction of the backlight module 20, that is, the direction of the array substrate 100 away from the opposite substrate 200. The ultraviolet light incident from the direction of the array substrate 100 away from the opposite substrate 200 can shield and protect the photoinitiator 1100 in the groove 181 through the above-described gate electrode 120, the first electrode 150, and the second electrode 160, so as to avoid the photoinitiator 1100 in the groove 181 from losing activity, and make the photoinitiator 1100 in the groove 181 and the reaction member 420 in the liquid crystal layer 400 generate the complementary alignment film 1110 having alignment ability, so as to ensure the ordered arrangement of the liquid crystal molecules 410 in the liquid crystal layer 400.

[0115] In the embodiment of the present application, the groove 181 corresponds to the support column 300 on the opposite substrate 200. When the support column 300 is moved or affected by other external forces, the support column 300 will scratch the alignment film 1110 below the support column 300, that is, the alignment film 1110 corresponding to the position below the support column 300 is easily damaged by the support column 300. Therefore, the groove 181 corresponds to the support column 300, so that when the alignment film 1110 below the support column 300 is scratched, the photoactive agent in the groove 181 can form the complementary alignment film 1110 with the reaction member 420 in the liquid crystal layer 400 under the action of ultraviolet light, so as to make the liquid crystal molecules 410 at the scratch position align in order, ensure the transmittance, and eliminate the red and blue spot phenomenon.

[0116] It should be understood that, please refer to Figure 2 As shown, in order to avoid the red and blue spot phenomenon, the orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the groove 181 on the substrate 110, that is, the size of the groove 181 is greater than the maximum size of the support column 300, so as to ensure the maintenance of the liquid crystal molecules 410 in the area that can be scratched by the support column 300, avoid the red and blue spot phenomenon, ensure the ordered arrangement of the liquid crystal molecules 410, and further ensure the display effect of the display panel 10 and the display device 1.

[0117] The groove 181 can be a groove 181 structure with a constant cross-sectional area, or a groove 181 structure with a gradually increasing cross-sectional area, as long as the orthogonal projection area of the groove 181 on the substrate 110 is greater than the orthogonal projection area of the support column 300 on the substrate 110.

[0118] In the embodiment of the present application, please refer to Figure 2As shown, the cross-sectional area of the groove 181 gradually increases in the direction from the substrate 110 to the planar layer 180. The gradually increasing cross-sectional area of the groove 181 can ensure that the photoinitiator 1100 can flow into the groove 181 when the photoinitiator 1100 is coated, so that the photoinitiator 1100 is ensured to be in the groove 181, and the photoinitiator 1100 in the groove 181 and the reaction agent 420 in the liquid crystal layer 400 can generate the complementary alignment film 1110, so that the liquid crystal molecules 410 are orderly arranged.

[0119] For example, referring to Figure 4g As shown, the groove 181 includes an inclined portion 1810 and a flat portion 1811. The flat portion 1811 is arranged on the bottom of the groove 181 and is parallel to the opposite substrate 200, i.e., the flat portion 1811 is a plane. The inclined portion 1810 is arranged around the flat portion 1811. In the direction from the substrate 110 to the planar layer 180, the cross-sectional area of the inclined portion 1810 gradually increases, i.e., the groove 181 has an inverted trapezoidal structure. The orthogonal projection of the support column 300 on the substrate 110 is located in the orthogonal projection of the flat portion 1811 on the substrate 110, so that the range of the complementary alignment film 1110 is ensured to be consistent with the maximum scratch range of the support column 300, and the liquid crystal molecules 410 in the maximum scratch range can be orderly arranged, so that the liquid crystal molecules 410 are orderly arranged, and the display effect of the display panel 10 and the display device 1 is ensured.

[0120] The inclined portion 1810 can limit and protect the support column 300, and can also ensure the generation range of the complementary alignment film 1110, and can also reduce the manufacturing cost. The inclined portion 1810 can also facilitate the flow of the photoinitiator 1100 into the groove 181, so that the groove 181 is filled with the photoinitiator 1100.

[0121] It can be understood that when the groove 181 has an inverted trapezoidal opening structure, the light transmission region corresponding to the first mask plate 500 includes a plurality of light transmission sub-regions. The light transmission rate of the light transmission sub-region corresponding to the flat portion 1811 is greater than that of the light transmission sub-region corresponding to the inclined portion 1810, and the light transmission rates of the light transmission sub-regions corresponding to the inclined portion 1810 are different. In the horizontal direction from the bottom of the inclined portion 1810 to the top of the inclined portion 1810, the light transmission rate of the light transmission sub-region gradually decreases, so as to form the inclined portion 1810 with the gradually increasing cross-sectional area.

[0122] In addition, the top surface of the inclined portion 1810 abuts against the side of the alignment film 1110 away from the liquid crystal layer 400.

[0123] It is worth mentioning that the groove 181 can penetrate part of the planar layer 180, or can penetrate the entire planar layer 180.

[0124] In the embodiments of the present application, please refer to Figure 2 As shown in the figure, the depth H of the groove 181 is less than the thickness D of the flat layer 180, and the depth H of the groove 181 and the thickness D of the flat layer 180 satisfy the following relationship: 1 / 5D≤H≤D. For example, the depth H of the groove 181 is 2 / 5 of the thickness D of the flat layer 180. Through this design, it can be ensured that there is sufficient light active agent in the groove 181 to ensure that the reaction with the reaction piece 420 can generate a complementary alignment film 1110, thereby ensuring the alignment of the liquid crystal molecules 410 at the scratch, so as to ensure the display effect of the display panel 10.

[0125] In addition, please refer to Figure 1 or Figure 2 As shown in the figure, the opposite substrate 200 includes a substrate 210 and a color resistance layer 220 arranged on the substrate 210.

[0126] The substrate 210 can be made of the same material as the substrate 110, such as glass, quartz or other suitable materials; and the color resistance layer 220 includes a plurality of black matrices 222 and a plurality of color color resistances 221 of different colors. The colors of adjacent color color resistances 221 are the same, and the black matrix 222 is arranged between adjacent color color resistances 221.

[0127] For example, the color resistance layer 220 includes red color resistance, green color resistance and blue color resistance, which are arranged in the row direction in turn and are spaced apart. The red color resistance, the green color resistance and the blue color resistance constitute a pixel unit. The black matrix 222 is arranged between the red color resistance and the green color resistance, between the green color resistance and the blue color resistance, and between the blue color resistance and the red color resistance, so as to prevent color bleeding between adjacent color color resistances 221.

[0128] The support column 300 is arranged on the black matrix 222 to ensure light transmittance, and the orthographic projection of the support column 300 on the substrate 210 is located in the orthographic projection of the black matrix 222 on the substrate 210, so as to avoid the influence of the support column 300 on the light transmittance.

[0129] It should be noted that the orthographic projection of the black matrix 222 on the substrate 110 is located in the orthographic projection of the groove 181 on the substrate 110, so as to ensure the alignment of the liquid crystal molecules 410, the deflection of the liquid crystal molecules 410 to light, and the display effect.

[0130] Embodiment three

[0131] The embodiment three of the present application includes a display device 1, please refer to Figure 6 As shown in the figure, it includes the display panel 10 described in embodiment two, and can be further provided with a backlight module 20, wherein the display panel 10 is located on the light emitting side of the backlight module 20.

[0132] According to the embodiments of this application, the specific type of the display device 1 is not particularly limited. Any type of display device 1 commonly used in the art can be used, such as liquid crystal displays, mobile devices such as mobile phones and laptops, wearable devices such as watches, VR devices, etc. Those skilled in the art can make the appropriate selection according to the specific purpose of the display device, which will not be elaborated here.

[0133] In the description of this specification, references to terms such as "some embodiments," "exemplarily," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of this application. The illustrative expressions of the above terms in this specification do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in a suitable manner in any one or more embodiments or examples. Moreover, without contradiction, those skilled in the art can combine and integrate the different embodiments or examples described in this specification, as well as the features of different embodiments or examples.

[0134] Although embodiments of this application have been shown and described above, it is understood that the above embodiments are exemplary and should not be construed as limiting this application. Those skilled in the art can make changes, modifications, substitutions and variations to the above embodiments within the scope of this application. Therefore, any changes or modifications made in accordance with the claims and description of this application should fall within the scope of this patent application.

Claims

1. A method for manufacturing an array substrate, characterized by, The method comprises the following steps: forming a first metal layer on a substrate and patterning the first metal layer to form a gate electrode; forming a gate insulating layer and a semiconductor layer on the substrate in sequence, the gate insulating layer covering the gate electrode; depositing a second metal layer on the gate insulating layer and the semiconductor layer and patterning the second metal layer to form a first electrode and a second electrode spaced apart from each other, the first electrode and the second electrode being respectively overlapped on opposite sides of the semiconductor layer; forming a passivation layer on the gate insulating layer and the semiconductor layer, the passivation layer covering the first electrode and the second electrode; depositing a planar layer on the passivation layer and patterning the planar layer to form a groove and a via, the via exposing a portion of the first electrode; forming a pixel electrode on the planar layer, the pixel electrode being connected to the first electrode through the via; coating a photoinitiator on the planar layer; performing light treatment on the photoinitiator outside the groove to deactivate the photoinitiator outside the groove; coating an alignment film on the planar layer, the alignment film covering the photoinitiator on the planar layer; wherein the photoinitiator is configured to react with a reactant in a liquid crystal layer under light irradiation to form a complementary alignment film having an alignment force on liquid crystal molecules when the alignment film is scratched to be exposed.

2. The production method according to claim 1, characterized by, The method for forming the groove on the planar layer comprises: exposing the planar layer to form the groove and the via.

3. A display panel comprising an array substrate prepared by the method of any one of claims 1 to 2, a liquid crystal layer, a support column and a counter substrate, the array substrate and the counter substrate being provided in a cell, the liquid crystal layer and the support column being provided between the array substrate and the counter substrate, the support column being provided on the side of the counter substrate and extending to the side of the array substrate; the array substrate comprising a substrate and a gate, a gate insulating layer, a semiconductor layer, a first electrode, a second electrode, a passivation layer and a pixel electrode provided on the substrate, the gate being provided on the substrate, the gate insulating layer being provided between the gate and the semiconductor layer, the first electrode and the second electrode being provided on both ends of the semiconductor layer, the passivation layer being provided on the side of the gate insulating layer away from the substrate, and the passivation layer covering the first electrode, the second electrode and the semiconductor layer; characterized in that, The liquid crystal layer comprises liquid crystal molecules and a reactant; the array substrate further comprises: a planar layer, the planar layer being arranged on a side of the passivation layer away from the substrate, the planar layer being provided with a groove and a via, the via exposing a portion of the first electrode, the pixel electrode being connected to the first electrode through the via, the groove corresponding to the support column one by one, the groove being filled with a photoinitiator, the photoinitiator being capable of reacting with the reactant under the action of light irradiation to form a complementary alignment film having an alignment force on the liquid crystal molecules; an alignment film, the alignment film being arranged on a side of the planar layer away from the substrate, and the alignment film covering the groove.

4. The display panel of claim 3, wherein, A normal projection of the support column on the substrate is located within a normal projection of the groove on the substrate.

5. The display panel of claim 4, wherein, In a direction from the substrate to the planar layer, a cross-sectional area of the groove gradually increases.

6. The display panel of claim 5, wherein, The groove comprises an inclined portion and a flat portion, the flat portion being arranged opposite to the support column, a normal projection of the support column on the substrate being located within a normal projection of the flat portion on the substrate; the inclined portion is arranged around an edge of the flat portion, and a side of the inclined portion away from the flat portion abuts against the alignment film.

7. The display panel of claim 3, wherein, A depth H of the groove is less than a thickness D of the planar layer; and the depth H of the groove and the thickness D of the planar layer satisfy the following relationship: 1 / 5D≤H≤D.

8. The display panel of claim 3, wherein, The opposite substrate comprises a substrate and a color resist layer arranged on the substrate, the color resist layer comprises color resists and a black matrix, colors of adjacent color resists are different, and the black matrix is arranged between adjacent color resists; The support column is arranged on a side of the color resist layer away from the substrate, and the support column is arranged on the black matrix, and a normal projection of the support column on the substrate is located in a normal projection of the black matrix on the substrate; A normal projection of the black matrix on the substrate is located in a normal projection of the groove on the substrate.

9. A display device, characterized by comprising: The display device comprises a backlight module and the display panel of any one of claims 3 to 8, and the display panel is arranged on a light-emitting side of the backlight module.

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