AR film with excellent durability and process for producing the same

Abstract

The application discloses an AR film with excellent durability, which comprises a substrate layer, wherein an upper coating layer, a primer layer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a silicon-aluminum mixed layer and an anti-scratch layer are sequentially arranged on the substrate layer; wherein a hafnium dioxide layer is arranged between the first niobium oxide layer and the silicon dioxide layer or between the second niobium oxide layer and the silicon-aluminum mixed layer; and the thickness of the hafnium dioxide layer is 1-20 nm. The AR film with excellent durability has excellent optical performance, high hardness, wear resistance and high-temperature resistance, and excellent durability.

Description

Technical Field

[0001] This invention belongs to the field of optical film technology, specifically relating to durable AR films and their preparation process. Background Technology

[0002] AR film, also known as anti-reflective coating, is a high-transmittance optical film that reduces reflection and allows light to pass through more completely. AR film reduces or eliminates reflected light from optical surfaces such as prisms and mirrors, thereby increasing the amount of light transmitted to these components and maximizing the amount of light presented to the user's eyes. Due to its inherent properties, AR film is commonly used in protective screens for display devices such as automotive displays, televisions, computers, mobile phones, and tablets—electronic products that improve transmittance and reduce reflectance. AR film effectively increases the transmittance and reduces the reflectance of the glass in these electronic products.

[0003] Currently, the main focus of AR film performance testing is on light transmittance and reflectance. However, other physical properties such as abrasion resistance and high-temperature resistance also affect its durability, but there is relatively little research on these aspects. Therefore, improving the durability of AR film while ensuring optical performance is a problem that needs further investigation.

[0004] The information disclosed in this background section is intended only to enhance the understanding of the overall background of the invention and should not be construed as an admission or in any way implying that the information constitutes prior art known to those skilled in the art. Summary of the Invention

[0005] The purpose of this invention is to provide an AR film with excellent durability and its preparation process. The AR film has excellent wear resistance and high temperature resistance, and has high durability.

[0006] To achieve the above objectives, a specific embodiment of the present invention provides the following technical solution:

[0007] A durable AR film includes a substrate layer, on which a top coating layer, an undercoat layer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a silicon-aluminum hybrid layer, and a scratch-resistant layer are sequentially disposed.

[0008] Wherein, a hafnium dioxide layer is provided between the first niobium oxide layer and the silicon dioxide layer, or a hafnium dioxide layer is provided between the second niobium oxide layer and the silicon-aluminum mixed layer;

[0009] The thickness of the hafnium dioxide layer is 1–20 nm.

[0010] In one or more embodiments of the present invention, the underlay material is selected from one or more of SiO2, Ti, Si, Al, MgF2, SiO, Sn, and Y; and / or,

[0011] The thickness of the substrate layer is 0.1–10 nm.

[0012] In one or more embodiments of the present invention, the thickness of the first niobium oxide layer is 5 to 200 nm.

[0013] In one or more embodiments of the present invention, the thickness of the silicon dioxide layer is 10–260 nm.

[0014] In one or more embodiments of the present invention, the thickness of the second niobium oxide layer is 5 to 280 nm.

[0015] In one or more embodiments of the present invention, the silicon-aluminum molar ratio in the silicon-aluminum hybrid layer is (85-98):(15-2) based on silicon-aluminum atoms; and / or,

[0016] The thickness of the silicon-aluminum hybrid layer is 50–310 nm.

[0017] In one or more embodiments of the present invention, the substrate layer is selected from one of a PET layer, a PI layer, an SRF layer, a TAC layer, a COP layer, and a PC layer; and / or,

[0018] The thickness of the substrate layer is 5.7–250 μm.

[0019] In one or more embodiments of the present invention, a lower coating layer is further provided on the surface of the substrate layer opposite to the upper coating layer, wherein the thickness of the upper coating layer is 50-500 nm and the thickness of the lower coating layer is 0.2-4.1 μm.

[0020] In one or more embodiments of the present invention, the thickness of the scratch-resistant layer is 2 to 190 nm.

[0021] Another specific embodiment of the present invention provides the following technical solution:

[0022] A fabrication process for a durable AR (Augmented Reality) includes the following steps:

[0023] A lower coating layer and an upper coating layer are coated on both sides of the substrate layer, and a high-temperature protective film is applied on the lower coating layer.

[0024] An underlayer, a first niobium oxide layer, a hafnium dioxide layer, a silicon dioxide layer, a second niobium oxide layer, and a silicon-aluminum mixed layer are sequentially deposited on the upper coating layer; or, an underlayer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a hafnium dioxide layer, and a silicon-aluminum mixed layer are sequentially deposited on the upper coating layer.

[0025] A scratch-resistant layer is applied to the silicon-aluminum hybrid layer;

[0026] A positive protective film is applied to the scratch-resistant layer.

[0027] Compared with the prior art, the AR film of the present invention exhibits superior hardness, wear resistance and high temperature resistance, while also demonstrating excellent optical performance and high overall durability. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 This is a schematic diagram of the durable AR film in Embodiment 1 of the present invention;

[0030] Figure 2 This is a schematic diagram of the durable AR film in Embodiment 5 of the present invention;

[0031] Figure 3 This is a comparison chart of the reflection curves of Embodiment 1, Embodiment 5 and Comparative Example 1380-780nm.

[0032] Figure 4 The image shows a comparison of the reflection curves of Embodiment 1, Embodiment 5, and Comparative Example 1400–700 nm.

[0033] Explanation of key figure labels:

[0034] 1-High temperature protective film, 2-Lower coating layer, 3-Substrate layer, 4-Upper coating layer, 5-Undercoat layer, 6-First niobium oxide layer, 7-Hafnium dioxide layer, 8-Silicon dioxide layer, 9-Second niobium oxide layer, 10-Silicon-aluminum mixed layer, 11-Scratch-resistant layer, 12-Positive protective film. Detailed Implementation

[0035] To enable those skilled in the art to better understand the technical solutions of this invention, the technical solutions of the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this invention, and not all embodiments. Based on the embodiments of this invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of this invention.

[0036] A specific embodiment of the present invention provides an AR film with excellent durability, comprising a substrate layer, wherein the substrate layer is sequentially provided with an upper coating layer, an undercoat layer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a silicon-aluminum hybrid layer, and a scratch-resistant layer; wherein a hafnium dioxide layer is provided between the first niobium oxide layer and the silicon dioxide layer, or a hafnium dioxide layer is provided between the second niobium oxide layer and the silicon-aluminum hybrid layer; the thickness of the hafnium dioxide layer is 1-20 nm.

[0037] Specifically, the underlayer can improve the adhesion of the AR film, the first niobium oxide layer can increase the transmittance of the AR film, the silicon dioxide layer can reduce reflection, the second niobium oxide layer can further increase the transmittance, and the silicon-aluminum hybrid layer can further reduce reflection. At the same time, it can also improve the weather resistance of the AR film. The combination of the underlayer, the first niobium oxide layer, the silicon dioxide layer, the second niobium oxide layer and the silicon-aluminum hybrid layer can ensure that the AR film has superior optical performance.

[0038] Hafnium dioxide possesses excellent scratch resistance and high-temperature resistance, while also exhibiting superior optical properties in terms of transparency, refractive index, and luminescence. By setting a hafnium dioxide layer between the first niobium oxide layer and the silicon dioxide layer, or between the second niobium oxide layer and the silicon-aluminum hybrid layer, the surface hardness, wear resistance, and high-temperature resistance of the AR film can be effectively improved, while the overall optical properties of the AR film remain unaffected, resulting in superior overall durability.

[0039] In one specific embodiment, the substrate material is selected from one or more of SiO2, Ti, Si, Al, MgF2, SiO, Sn and Y; the substrate thickness is 0.1 to 10 nm.

[0040] Specifically, using SiO2 (silicon dioxide), Ti (titanium), Si (silicon), Al (aluminum), MgF2 (magnesium fluoride), SiO (silicon monoxide), Sn (tin), and Y (yttrium) as the underlayer can effectively improve the adhesion of the AR film.

[0041] In one specific embodiment, the thickness of the first niobium oxide layer is 5–200 nm, the thickness of the silicon dioxide layer is 10–260 nm, and the thickness of the second niobium oxide layer is 5–280 nm.

[0042] Specifically, the layer thickness affects the optical performance of the AR film. When the layer thickness is too small, the expected optical performance cannot be obtained. Although increasing the layer thickness helps to improve the optical performance of the AR film, when the layer thickness is too large, the optical performance will gradually deteriorate. Therefore, by controlling the layer thickness, the optical performance of the AR film can be optimized.

[0043] In one specific embodiment, the silicon-aluminum molar ratio in the silicon-aluminum hybrid layer is (85-98):(15-2) in terms of silicon-aluminum atoms; the thickness of the silicon-aluminum hybrid layer is 50-310 nm.

[0044] Specifically, the silicon-aluminum hybrid layer is located on the surface of the AR film and has a significant impact on the coating uniformity. Selecting a silicon-aluminum hybrid target for coating can improve the stability of the coating and make the coating more uniform, thereby ensuring the overall optical stability of the AR film.

[0045] In one specific embodiment, the substrate layer is selected from one of the following: PET layer, PI layer, SRF layer, TAC layer, COP layer, and PC layer; the thickness of the substrate layer is 5.7–250 μm.

[0046] Specifically, the PET layer is the polyethylene terephthalate layer, the PI layer is the polyimide layer, the SRF layer is the super-complex polyester film, the TAC layer is the cellulose triacetate layer, the COP layer is the cyclic olefin polymer layer, and the PC layer is the polycarbonate layer. Selecting the above types of substrate layers can give the AR film a stable structure and optical properties.

[0047] In one specific embodiment, a lower coating layer is further provided on the surface of the substrate layer opposite to the upper coating layer, wherein the thickness of the upper coating layer is 50-500 nm and the thickness of the lower coating layer is 0.2-4.1 μm.

[0048] Specifically, both the lower and upper coating layers are formed by coating with acrylic resin coating liquid, which is an existing product. By coating with acrylic resin coating liquid, the hardness, wear resistance and high temperature resistance of AR film can be improved.

[0049] In one specific embodiment, the thickness of the scratch-resistant layer is 2–190 nm.

[0050] Specifically, the scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid, which is an existing product. Its main component is perfluoropolyether polymer. The scratch-resistant layer is located on the surface of the AR film and can effectively improve the AR film's resistance to oil stains, fingerprints, and scratches.

[0051] Another specific embodiment of the present invention provides a process for preparing an AR film with excellent durability, comprising the following steps:

[0052] A lower coating layer and an upper coating layer are coated on both sides of the substrate layer, and a high-temperature protective film is applied on the lower coating layer.

[0053] An underlayer, a first niobium oxide layer, a hafnium dioxide layer, a silicon dioxide layer, a second niobium oxide layer, and a silicon-aluminum mixed layer are sequentially deposited on the upper coating layer; or, an underlayer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a hafnium dioxide layer, and a silicon-aluminum mixed layer are sequentially deposited on the upper coating layer.

[0054] A scratch-resistant layer is coated on the silicon-aluminum hybrid layer, and a positive protective film is set on the scratch-resistant layer.

[0055] Specifically, both the high-temperature protective film and the positive protective film are PET films, with the high-temperature protective film thickness ranging from 30 to 188 μm and the positive protective film thickness ranging from 30 to 188 μm. Each coating is deposited using conventional magnetron sputtering technology.

[0056] The present invention will be further described in detail below with reference to specific embodiments.

[0057] Example 1

[0058] like Figure 1 As shown, the durable AR film comprises, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 1nm thick hafnium dioxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0059] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0060] Example 2

[0061] The durable AR film comprises, from bottom to top, a 100μm thick high-temperature protective film, a 0.2μm thick lower coating layer, a 38μm thick substrate layer, a 50nm thick upper coating layer, a 0.1nm thick undercoat layer, a 90nm thick first niobium oxide layer, a 10nm thick hafnium dioxide layer, a 260nm thick silicon dioxide layer, a 280nm thick second niobium oxide layer, a 170nm thick silicon-aluminum hybrid layer, a 190nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0062] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PET layer. The base layer is made of Y. The silicon-aluminum mixed layer has a silicon-aluminum molar ratio of 85:15 (based on silicon-aluminum atoms). The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0063] Example 3

[0064] The durable AR film consists of, from bottom to top, a high-temperature protective film with a thickness of 188 μm, a lower coating layer with a thickness of 4.1 μm, a substrate layer with a thickness of 250 μm, an upper coating layer with a thickness of 500 nm, a base layer with a thickness of 6 nm, a first niobium oxide layer with a thickness of 200 nm, a hafnium dioxide layer with a thickness of 20 nm, a silicon dioxide layer with a thickness of 130 nm, a second niobium oxide layer with a thickness of 120 nm, a silicon-aluminum hybrid layer with a thickness of 310 nm, a scratch-resistant layer with a thickness of 100 nm, and a positive protective film with a thickness of 40 μm.

[0065] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a TAC layer. The base layer is made of Ti. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0066] Example 4

[0067] The durable AR film consists of, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 20nm thick hafnium dioxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0068] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0069] Example 5

[0070] like Figure 2 As shown, the durable AR film comprises, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 1nm thick hafnium dioxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0071] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0072] Example 6

[0073] The durable AR film consists of, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 20nm thick hafnium dioxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0074] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0075] Comparative Example 1

[0076] The durable AR film consists of, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0077] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0078] Comparative Example 2

[0079] The durable AR film consists of, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 0.3nm thick hafnium dioxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0080] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0081] Comparative Example 3

[0082] The durable AR film comprises, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 40nm thick hafnium dioxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0083] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0084] Comparative Example 4

[0085] The durable AR film consists of, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 0.3nm thick hafnium dioxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0086] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0087] Comparative Example 5

[0088] The durable AR film comprises, from bottom to top, a 30μm thick high-temperature protective film, a 2μm thick lower coating layer, a 125μm thick substrate layer, a 200nm thick upper coating layer, a 10nm thick undercoat layer, a 5nm thick first niobium oxide layer, a 10nm thick silicon dioxide layer, a 5nm thick second niobium oxide layer, a 40nm thick hafnium dioxide layer, a 50nm thick silicon-aluminum hybrid layer, a 2nm thick scratch-resistant layer, and a 40μm thick positive protective film.

[0089] The high-temperature protective film and the positive protective film are both made of PET. The lower coating layer and the upper coating layer are both formed by coating with acrylic resin coating liquid. The substrate layer is a PI layer. The base layer is made of SiO. The silicon-aluminum molar ratio in the silicon-aluminum mixed layer is 98:2 based on silicon-aluminum atoms. The scratch-resistant layer is formed by coating with AF anti-fingerprint coating liquid.

[0090] The AR films used in the above-described preparation methods were prepared and their performance was tested.

[0091] (1) The total light transmittance and the light transmittance of the AR film in Example 1, Example 5 and Comparative Example 1 were tested. The results are shown in Table 1.

[0092] Table 1 Optical Transmission Test Results

[0093]

[0094] (2) The reflectance curves of the AR films in Examples 1, 5, and Comparative Example 1 at 380–780 nm and 400–700 nm were tested, and the results are as follows: Figure 3 and Figure 4 As shown, Figure 3 and Figure 4 In the text, the old scheme refers to Comparative Example 1, Existing Scheme 1 refers to Example 1, and Existing Scheme 2 refers to Example 5.

[0095] (3) Place the AR film on a glass panel and divide the film surface into three sections (left, middle, and right) according to the average width of the film. Use a pencil hardness tester with a load of 500g and 750g respectively, and use a 3H hardness pencil and a 4H hardness pencil to test the hardness of the coated surface. During the test, draw 5 lines at each position and record the number of lines without scratches. Result judgment: If 3 or more lines (including 3) are without scratches, it is considered OK; if less than 3 lines are without scratches, it is considered NG. The results are shown in Table 2.

[0096] Table 2. Pencil Hardness Test Results

[0097]

[0098]

[0099] (4) Steel wool abrasion test: Place the AR film on the glass panel, load the abrasion tester with a load of 1000g, and record the number of scratches that appear after 2000, 3000 and 5000 abrasions. ≥4 scratches are considered NG, and ≤3 scratches are considered OK. The results are shown in Table 3.

[0100] Table 3 Abrasion Resistance Test Results of Steel Wool

[0101]

[0102]

[0103]

[0104] (4) Apply OCA optical adhesive to the back of the AR film and attach it to the transparent glass. After bonding, degas the film using a degassing machine. Wipe the surface clean after degassing. Then, boil the AR film in water at 100℃ for 3 hours and 5 hours, place it at double 85 (i.e., high temperature 85℃, high humidity 85%) for 32 days and 36 days, place it at high temperature 95℃ for 32 days and 36 days, place it at low temperature -40℃ for 32 days and 36 days, and expose it to sunlight (light intensity 0.55w / (m²)). 2 The wavelength was 340nm, using an Extended UV-Q / B filter. One cycle consisted of 3.8 hours of light exposure followed by 1 hour of darkness. During the light exposure phase, the blackboard temperature was set to 89℃, the cabinet temperature to 63℃, and the humidity to 50%. During the darkness phase, the cabinet and blackboard temperatures were set to 38℃, and the humidity to 95%. After 32 and 36 days, a 100-grid cross-section was drawn using a cross-section cutter. Then, 3M 681 tape was applied, pressed firmly, and left to stand for at least 30 seconds before being removed. No peeling was rated 5B, slight peeling was rated 3-4B (barely acceptable), and anything below 2B was considered NG. The results are shown in Table 4.

[0105] Table 4 Comparison of various environmental monitoring parameters (100 grid lines)

[0106]

[0107]

[0108] As shown in Table 1, the AR films in Examples 1, 5, and Comparative Example 1 achieve a total light transmittance of over 95%, and a light transmittance of over 93% in the 400-700nm spectrophotometer, meeting the qualification requirements. According to optical testing requirements, the average reflectance in the 380-780nm range is below 1.0%, and the average reflectance in the 400-700nm range is below 0.5%. Figure 2 It can be seen that within the range of 380–780 nm, the average reflectance of Example 1 is 0.70%, the average reflectance of Example 5 is 0.70%, and the average reflectance of Comparative Example 1 is 0.76%. Figure 3 As can be seen, within the range of 400–700 nm, the average reflectance of Example 1 is 0.24%, the average reflectance of Example 5 is 0.25%, and the average reflectance of Comparative Example 1 is 0.25%. This demonstrates that the AR films in Examples 1, 5, and Comparative Example 1 all exhibit good optical performance, indicating that the optical performance of the AR film in this invention meets the requirements.

[0109] As can be seen from Tables 2 and 3, the AR film in the embodiments of the present invention has better hardness and wear resistance, indicating that by adding a hafnium dioxide layer to the AR film, the present invention can effectively improve the surface hardness and wear resistance of the AR film while ensuring that the overall optical performance of the AR film is not affected. Furthermore, as can be seen from Table 4, the AR film in the present invention also exhibits better high temperature resistance, and the overall durability is greatly improved.

[0110] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from its spirit or essential characteristics. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be included within the present invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0111] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A durable AR film, characterized in that, The substrate layer is provided with an upper coating layer, a primer layer, a first niobium oxide layer, a silicon dioxide layer, a second niobium oxide layer, a silicon-aluminum mixed layer and an anti-scratch layer in sequence on the substrate layer; The hafnium dioxide layer is arranged between the first niobium oxide layer and the silicon dioxide layer, or between the second niobium oxide layer and the silicon-aluminum mixed layer; The thickness of the hafnium dioxide layer is 1-20 nm; The thickness of the first niobium oxide layer is 90-200 nm; The thickness of the silicon dioxide layer is 10-130 nm; The thickness of the second niobium oxide layer is 120-280 nm; The thickness of the silicon-aluminum mixed layer is 170-310 nm.

2. The AR film of claim 1, wherein The primer layer is made of one or more of SiO2, Ti, Si, Al, MgF2, SiO, Sn and Y; and / or The thickness of the primer layer is 0.1-10 nm.

3. The AR film of claim 1, wherein The molar ratio of silicon to aluminum in the silicon-aluminum mixed layer is (85-98):(15-2) in terms of silicon and aluminum atoms.

4. The AR film of claim 1, wherein The substrate layer is selected from one of PET layer, PI layer, SRF layer, TAC layer, COP layer and PC layer; and / or The thickness of the substrate layer is 5.7-250 μm.

5. The AR film of claim 1, wherein The surface of the substrate layer away from the upper coating layer is further provided with a lower coating layer, the thickness of the upper coating layer is 50-500 nm, and the thickness of the lower coating layer is 0.2-4.1 μm.

6. The AR film of claim 1, wherein The thickness of the anti-scratch layer is 2-190 nm.

7. The process for producing an AR film having superior durability according to any one of claims 1 to 6, characterized in that, The method comprises the following steps: The lower coating layer and the upper coating layer are respectively coated on both sides of the substrate layer, and a high-temperature protective film is arranged on the lower coating layer; The primer layer, the first niobium oxide layer, the hafnium dioxide layer, the silicon dioxide layer, the second niobium oxide layer and the silicon-aluminum mixed layer are sequentially plated on the upper coating layer; or the primer layer, the first niobium oxide layer, the silicon dioxide layer, the second niobium oxide layer, the hafnium dioxide layer and the silicon-aluminum mixed layer are sequentially plated on the upper coating layer; The anti-scratch layer is coated on the silicon-aluminum mixed layer; A positive protective film is arranged on the anti-scratch layer.

Images