A filter for material light aging test, its plating method and application

Abstract

This application relates to a filter for material light aging tests, belonging to the technical field of optical filters. It includes a substrate material with a thickness of 2 mm. A film layer is provided on the substrate material. The film layer is formed by alternately stacking high-refractive-index and low-refractive-index materials. The film system structure of the film layer is (HL)<supgt;7< / supgt;, where H is the high-refractive-index material, L is the low-refractive-index material, and 7 is the number of times of alternately stacking the high-refractive-index and low-refractive-index materials together. The filter of this application can effectively filter out the spectrum with a wavelength less than 290 nm and simultaneously correct the light transmittance in the range of 600 - 1200 nm.

Description

Technical Field

[0001] This application relates to the technical field of optical filters, and in particular, to a filter for material light aging test, its coating method and application. Background Art

[0002] An optical filter is an optical element widely used in the scientific research field. It can selectively filter out certain wavelengths in the spectrum to achieve the control and regulation of light, thus playing a key role in various optical applications.

[0003] Xenon arc lamp is a commonly used light source for ultraviolet accelerated aging test of materials. The power and the proportions of UVB, UVA1, UVA2, VIS, and NIR must meet the requirements of international standards. Usually, the light source for ultraviolet accelerated aging test of materials is a xenon arc lamp light source, which is widely used because its ultraviolet distribution characteristics are very close to the solar spectrum. Summary of the Invention

[0004] In order to cut off the spectrum of <290nm while ensuring the proportion of each section of the spectrum within 290 - 800nm, this application provides a filter for material light aging test, its coating method and application.

[0005] In the first aspect, this application provides a filter for material light aging test, adopting the following technical solution:

[0006] A filter for material light aging test includes a substrate material with a thickness of 2mm. A film layer is provided on the substrate material. The film layer is formed by alternately stacking high refractive index and low refractive index materials, and the film system structure of the film layer is (HL) 7 , where H is a high refractive index material, L is a low refractive index material, and 7 is the number of times of alternately stacking high refractive index and low refractive index materials together;

[0007] The film layer has a total of 14 layers, and the thicknesses of the first to fourteenth layers of the film layer are as follows:

[0008] The thickness of the first layer is 18.08 ± 5nm;

[0009] The thickness of the second layer is 24.32 ± 5nm;

[0010] The thickness of the third layer is 90.40 ± 5nm;

[0011] The thickness of the fourth layer is 121.58 ± 5nm;

[0012] The thickness of the fifth layer is 90.4 ± 5nm;

[0013] The thickness of the sixth layer is 121.58 ± 5nm;

[0014] The thickness of the seventh layer is 90.4 ± 5 nm;

[0015] The thickness of the eighth layer is 121.58 ± 5 nm;

[0016] The thickness of the ninth layer is 90.4 ± 5 nm;

[0017] The thickness of the tenth layer is 121.58 ± 5 nm;

[0018] The thickness of the eleventh layer is 90.4 ± 5 nm;

[0019] The thickness of the twelfth layer is 121.58 ± 5 nm;

[0020] The thickness of the thirteenth layer is 90.4 ± 5 nm;

[0021] The thickness of the fourteenth layer is 60.79 ± 5 nm.

[0022] By adopting the above technical solution, the film layer formed by alternately stacking high-refractive-index materials and low-refractive-index materials, and the thickness of the film layer is within the thickness range of this application. Without increasing the thickness of the film layer, it can effectively filter out the spectrum <290 nm, and at the same time ensure the proportion of each section of the spectrum within 290 - 800 nm. Moreover, the thickness of the initially stacked film layer and the finally stacked film layer are both lower than the thickness of the film layer in the middle stack, and the formed film layer is more stable and not easily peeled off due to the influence of the external environment, thereby ensuring its light filtering effect.

[0023] Optionally, the substrate uses a quartz substrate.

[0024] Optionally, the high-refractive-index material is HFO 2 , and the low-refractive-index material is SiO 2 , and the film layer materials of the first to fourteenth layers of the film layer are HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2 .

[0025] By adopting the above technical solution, using HFO 2 and SiO 2The film layers formed by alternating stacking have good bonding strength with the substrate, ensuring the light filtering effect of the filter and making the filtered light close to the standard solar ultraviolet spectrum.

[0026] In a second aspect, the present application provides a method for plating a filter for a material photoaging test, adopting the following technical solution:

[0027] A method for plating a filter for a material photoaging test evaporates the coating material by means of electron gun heating; the vacuum degree reaches 3×10 -3 Pa.

[0028] By adopting the above technical solution, a stable film layer with good bonding effect is obtained, enabling the filter to meet the light filtering requirements of international standards.

[0029] In a third aspect, the present application provides an application of a filter for a material photoaging test, adopting the following technical solution:

[0030] An application of a filter for a material photoaging test uses a xenon arc lamp as the light source for a solar ultraviolet accelerated aging test. The spectral transmittance of the filter in the 250 - 1100 nm band can meet the following requirements:

[0031] The average transmittance T < 2% in the 250 - 270 nm band; the average transmittance T = 92% with an allowable deviation of ±3% in the 290 - 600 nm band; the average transmittance T = 11% with an allowable deviation of ±2% in the 730 nm band; the average transmittance T = 92% with an allowable deviation of ±2% in the 880 nm band, the average transmittance T = 72% with an allowable deviation of ±2% in the 960 nm band. The average transmittance T = 92% with an allowable deviation of ±2% in the 1100 nm band.

[0032] By adopting the above technical solution, for the relative spectral intensity distribution of the xenon arc lamp light source, the light filtered by the filter can be made close to the standard solar ultraviolet spectrum. Using the filter with the filter characteristics of the present application, defining 290 - 800 nm as 100%, the proportion of 290 < λ ≤ 320 can reach 0.6 ± 0.2%, and the proportion of 320 < λ ≤ 360 can reach 4.2 ± 0.5%; the proportion of 360 < λ ≤ 400 can reach 6.2 ± 1.0%, indicating that it can ensure a better retention of the proportion in the 290 - 400 nm band and better meet the basic conditions of the test.

[0033] In summary, the present application includes at least one of the following beneficial technical effects:

[0034] 1. The film layer formed by the present application by alternately stacking high refractive index materials and low refractive index materials, and the film layer thickness is within the thickness range of the present application, can effectively filter out the <290 nm spectrum and ensure the proportion of each spectrum segment within 290 - 800 nm;

[0035] Using the filter with the light filtering characteristics of the present application, the range of 290 - 800 nm is defined as 100%. The proportion of 290 < λ ≤ 320 can reach 0.6 ± 0.2%, the proportion of 320 < λ ≤ 360 can reach 4.2 ± 0.5%, and the proportion of 360 < λ ≤ 400 can reach 6.2 ± 1.0%. This shows that it can ensure a better retention of the proportion in the 290 - 400 nm wavelength band and better meet the basic conditions of the experiment. Description of the Drawings

[0036] Figure 1 It is the spectral design diagram of the filter when the xenon arc lamp source is used as the test light source in the present application. Detailed Description of the Preferred Embodiments

[0037] The present application will be further described in detail below in conjunction with the embodiments.

[0038] Embodiment 1

[0039] A filter for material light aging test, including a substrate material. The thickness of the substrate material is 2 mm, and the substrate is made of quartz substrate;

[0040] A film layer is provided on the substrate material. The film layer is formed by alternately stacking high refractive index and low refractive index materials. The film system structure of the film layer is (HL) 7 , where H is the high refractive index material, L is the low refractive index material, 7 is the number of times of alternately stacking the high refractive index and low refractive index materials. Among them, the high refractive index material is HFO 2 , and the low refractive index material is SiO 2 ;

[0041] The film layer has a total of 14 layers. The coating materials and thicknesses of the first to fourteenth layers of the film layer are shown as follows.

[0042]

[0043]

[0044] The thickness errors of the above coating materials are all within the range of 5 nm.

[0045] A method for plating a filter for material light aging test, including the following steps:

[0046] Evaporating the coating material by means of electron gun heating; the vacuum degree is 3×10 -3 Pa.

[0047] Application Example 1

[0048] Application of a filter for material light aging test. A xenon arc lamp is used as the light source for solar ultraviolet accelerated aging test, and the spectral transmittance of the filter made in Test Example 1 is measured in the wavelength range of 250 - 1100 nm.

[0049] Performance detection test

[0050] 1. According to the xenon arc lamp light source specified in international standards ISO4892 - 2 and ASTM G155, the spectral transmittance of the filter in Application Example 1 is measured, and the test results are as Figure 1 shown.

[0051] Combined with Figure 1 it can be concluded that the filter can meet the following requirements: the average transmittance T < 2% in the wavelength range of 250 - 270 nm; the average transmittance T = 92% with an allowable deviation of ±3% in the wavelength range of 290 - 600 nm; the average transmittance T = 11% with an allowable deviation of ±2% at 730 nm; the average transmittance T = 92% with an allowable deviation of ±2% at 880 nm; the average transmittance T = 72% with an allowable deviation of ±2% at 960 nm; the average transmittance T = 92% with an allowable deviation of ±2% at 1100 nm.

[0052] 2. The spectral relative irradiance of the filter made in Test Example 1 is measured using ISO4892 - 2 artificial weathering (Method A). The relative irradiance refers to the proportion of spectral energy in different wavelength ranges after passing through the filter. The light energy after passing through = the light energy before passing through * transmittance.

[0053] The test results are shown in Table 1.

[0054] Table 1 Spectral relative irradiance of ISO 4892 - 2 artificial weathering (Method A)

[0055]

[0056]

[0057] Combined with Table 1, it can be seen that for the relative irradiance of the filter in Test Example 1, defining 290 - 800 nm as 100%, the proportion of 290 < λ ≤ 320 can reach 0.6 ± 0.2%, the proportion of 320 < λ ≤ 360 can reach 4.2 ± 0.5%; the proportion of 360 < λ ≤ 400 can reach 6.2 ± 1.0%, indicating that it can ensure a better retention of the proportion in the wavelength range of 290 - 400 nm and better meet the basic conditions of the test.

[0058] 3. Using standard sunlight as a reference, according to the test conditions specified in ASTM G155, the spectral proportion of the filter made in Test Example 1 is measured.

[0059] The test results are shown in Table 2.

[0060] Spectral ratio of the filter obtained in Example 1 in Table 2

[0061]

[0062] It can be seen from Table 2 that the filter of Example 1 of the present application filters light in different wavelength bands, and the proportion approaching sunlight. According to the relative spectral intensity distribution of the xenon arc lamp light source, a matching filter is designed so that the ultraviolet light after passing through the filter is close to the standard solar spectrum.

[0063] Combined with Figure 1 Tables 1-2, it can be obtained that the filter made in Example 1 of the present application forms a film layer by alternately stacking high-refractive-index materials and low-refractive-index materials, and the film layer thickness is within the thickness range of the present application. Without increasing the film layer thickness, it can effectively filter out the spectrum with a wavelength less than 290 nm, and at the same time ensure the spectral ratio within the range of 290-800 nm. Moreover, the thickness of the initially stacked film layer and the thickness of the finally stacked film layer are both lower than the thickness of the film layer in the middle stack, and the formed film layer is more stable and not easily peeled off due to the influence of the external environment, thereby ensuring its light filtering effect.

[0064] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereby. Therefore, all equivalent changes made according to the structure, shape, and principle of the present application shall be covered within the protection scope of the present application.

Claims

1. A filter for material light aging test, characterized in that: The substrate material comprises a substrate material having a thickness of 2 mm, a film layer is arranged on the substrate material, the film layer is formed by alternately stacking high refractive index materials and low refractive index materials, and the film system structure of the film layer is (HL) 7 , where H is a high refractive index material, L is a low refractive index material, and 7 is the number of times the high refractive index and low refractive index materials are alternately stacked together; The film has 14 layers in total, and the thicknesses of the first to fourteenth layers of the film are as follows: The thickness of the first layer is 18.08±5nm; The thickness of the second layer is 24.32±5nm; The thickness of the third layer is 90.40±5nm; The thickness of the fourth layer is 121.58±5nm; The thickness of the fifth layer is 90.4±5nm; The thickness of the sixth layer is 121.58±5nm; The thickness of the seventh layer is 90.4±5nm; The eighth layer has a thickness of 121.58±5 nm; The thickness of the ninth layer is 90.4±5nm; The thickness of the tenth layer is 121.58±5nm; The thickness of the eleventh layer is 90.4±5nm; The thickness of the twelfth layer is 121.58±5nm; The thickness of the thirteenth layer is 90.4±5nm; The thickness of the fourteenth layer is 60.79±5nm; A xenon arc lamp is used as the light source for the solar ultraviolet accelerated aging test. The spectral transmittance of the filter in the 250-1100nm band can meet the following requirements: In the 250-270nm band, the average transmittance T<2%; in the 290-600nm band, the average transmittance T=92%, and the allowable deviation is ±3%; in the 730nm band, the average transmittance T=11%, and the allowable deviation is ±2%; in the 880nm band, the average transmittance T=92%, and the allowable deviation is ±2%; in the 960nm band, the average transmittance T=72%, and the allowable deviation is ±2%; in the 1100nm band, the average transmittance T=92%, and the allowable deviation is ±2%.

2. The optical filter for material light aging test according to claim 1, characterized in that: The substrate is a quartz substrate.

3. The optical filter for material light aging test according to claim 2, characterized in that: The high refractive index material is HFO2, the low refractive index material is SiO2, and the film materials of the first to fourteenth layers of the film are HFO2, respectively. 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO 2、 HFO 2、 SiO2.

4. A method for plating a filter for a material light aging test according to any one of claims 1 to 3, characterized in that: The coating material is evaporated by electron gun heating; the vacuum degree reaches 3×10 -3 Pa.

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