Cleaning device

Abstract

The present invention provides a cleaning device, including a driving mechanism, a cleaning arm, a pipe and a plurality of nozzles arranged on the cleaning arm; the cleaning arm is horizontally placed inside a process chamber, a plurality of nozzles are arranged on the surface of the cleaning arm facing the top plate of the process chamber, the pipe is horizontally buried inside the cleaning arm and is connected to all the nozzles, and one end of the pipe is an open end to allow external media to enter the cleaning arm from the open end, and the other end of the pipe is a closed end; the driving mechanism is located outside the process chamber and is transmission-connected to the cleaning arm, and the driving mechanism is used to drive the cleaning arm so that the cleaning arm rotates with the transmission shaft that is transmission-connected to the cleaning arm as the rotation axis. The cleaning arm is driven to rotate by the driving mechanism, and the nozzle sprays the medium to clean the top plate of the process chamber, thereby reducing or even avoiding the attachment of chemical waste liquid to the top plate of the process chamber, so as to prevent the chemical waste liquid from falling on the surface of the wafer during the process to form defects and affect the process yield.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor equipment, and in particular to a cleaning device. Background Art

[0002] With the rapid development of semiconductor integrated circuit manufacturing technology, the graphic feature size of integrated circuit chips has entered the deep submicron stage, and the feature size of key contaminants (such as particles) that cause failure or damage of ultra-fine circuits on chips has also decreased. In the manufacturing process of integrated circuits, semiconductor wafers usually go through multiple process steps such as thin film deposition, etching, and polishing. These process steps become an important place for contaminants to be generated. In order to keep the surface of the wafer clean and eliminate contaminants deposited on the surface of the wafer in each process step, the surface of the wafer needs to be cleaned after each process step. Therefore, the cleaning process has become the most common process step in the production of integrated circuits.

[0003] Among them, most of the process steps of wafer preparation need to be carried out in the corresponding process chamber, such as wet etching. Some processes will use more chemicals, among which some highly volatile chemicals (such as hydrochloric acid, potassium iodide, etc.) will volatilize during the process and form chemical waste liquid crystals inside the process chamber. The chemical waste liquid crystals will cause pollution to the process chamber environment. Currently, the commonly used cleaning devices can only clean the side walls of the process chamber, and cannot ensure the cleanliness of the top plate of the process chamber. The chemical waste liquid crystals on the top plate of the process chamber are easy to fall on the wafer surface during the process to form wafer defects, which seriously affects the yield. Summary of the invention

[0004] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a cleaning device for solving the problem that the cleaning device in the prior art can only clean the side walls of the process chamber but cannot ensure the cleanliness of the top plate of the process chamber, and chemical waste liquid can easily fall on the wafer surface during the process to form wafer defects, thereby seriously affecting the yield.

[0005] To achieve the above-mentioned object and other related objects, the present invention provides a cleaning device, which comprises: a driving mechanism, a cleaning arm, a pipe and a plurality of nozzles arranged on the cleaning arm;

[0006] The cleaning arm is placed transversely inside the process chamber, a plurality of the nozzles are arranged on the surface of the cleaning arm facing the top plate of the process chamber, the pipeline is buried in the cleaning arm along the transverse direction and communicated with all the nozzles, and one end of the pipeline is an open end so that the external medium enters the cleaning arm from the open end, and the other end of the pipeline is a closed end;

[0007] The pipeline includes an air intake pipeline and a liquid intake pipeline which are parallel to each other and not connected to each other, and all the pipelines are respectively connected to the corresponding nozzles, and the nozzles are divided into a first nozzle and a second nozzle, the first nozzle is arranged on the surface of the cleaning arm above the air intake pipeline, and the second nozzle is arranged on the surface of the cleaning arm above the liquid intake pipeline;

[0008] Wherein, the liquid inlet pipeline is configured as a double-layer coaxially nested inner layer pipeline and outer layer pipeline; the second nozzle is connected to the outer layer pipeline and the second nozzle is arranged on the surface of the cleaning arm above the outer layer pipeline; one end of the inner layer pipeline is an open end to allow the external liquid medium to enter the cleaning arm, and the inner layer pipeline is provided with a plurality of inner layer pipeline liquid outlet holes along its extension direction to drain the liquid medium in the inner layer pipeline into the outer layer pipeline; the end between the outer layer pipeline and the inner layer pipeline at the liquid inlet end of the liquid inlet pipeline is closed, and the outer layer pipeline and the inner layer pipeline at the other end of the liquid inlet pipeline are both closed ends;

[0009] The driving mechanism is located outside the process chamber and is transmission-connected to the cleaning arm. The driving mechanism is used to drive the cleaning arm so that the cleaning arm rotates with the transmission shaft transmission-connected between the driving mechanism and the cleaning arm as the rotation axis.

[0010] Optionally, the medium entering through the air inlet pipe includes nitrogen, and the medium entering through the liquid inlet pipe includes deionized water.

[0011] Optionally, the first nozzles are evenly distributed along the extension direction of the air inlet pipe; and the second nozzles are evenly distributed along the extension direction of the liquid inlet pipe.

[0012] Optionally, the inner layer pipe liquid outlet hole is arranged on the surface below the inner layer pipe.

[0013] Optionally, the cleaning device further comprises a cleaning arm adjustment block fixed to the inner side of the process chamber top plate, the side of the cleaning arm adjustment block clamps the cleaning arm, and the cleaning arm adjustment block is used to adjust the positional relationship between the cleaning arm and the process chamber top plate.

[0014] Further, the washing arm adjustment block includes a main body and an adjustment part, the main body is fixedly connected to one end of the transmission shaft close to the cavity top plate, the adjustment part is arranged on the side of the main body, and a protruding cylindrical adjustment shaft is arranged on the side of the main body, and the adjustment shaft is embedded in a hole correspondingly arranged on the adjustment part, so that the adjustment part is connected to the main body through the adjustment shaft, and the adjustment part clamps the washing arm;

[0015] A height adjustment screw and at least one height fastening screw are provided at the bottom of the body part, the height adjustment screw passes through the body part from the bottom of the body part and supports the transmission shaft, the height fastening screw passes through the body part from the bottom of the body part and is connected to the transmission shaft, the height adjustment screw is used to adjust the longitudinal distance between the cleaning arm and the top plate of the process chamber, and the height fastening screw is used to fix the longitudinal distance between the cleaning arm and the top plate of the process chamber;

[0016] A lower swing adjusting screw and an upper swing adjusting screw are longitudinally arranged on one side of the adjusting portion close to the extending direction of the cleaning arm, and a swing fastening screw is also arranged on the other side of the adjusting portion, the lower swing adjusting screw and the upper swing adjusting screw pass through the adjusting portion and support the main body, the swing fastening screw passes through the adjusting portion and is connected to the main body, the lower swing adjusting screw and the upper swing adjusting screw are used to adjust the angle between the cleaning arm and the top plate of the process chamber, and the swing fastening screw is used to fix the angle between the cleaning arm and the top plate of the process chamber.

[0017] Optionally, the driving mechanism is a cylinder driving mechanism, which includes a rotating cylinder and a cylinder transmission assembly, the rotating cylinder is drivingly connected to the cylinder transmission assembly, the cylinder transmission assembly is drivingly connected to the transmission shaft, the transmission shaft is drivingly connected to the cleaning arm, and the rotating cylinder is used to drive the cylinder transmission assembly to drive the transmission shaft to rotate, thereby driving the cleaning arm to rotate with the transmission shaft as the rotation axis.

[0018] Furthermore, the cylinder drive mechanism also includes a base plate, a rotating cylinder bracket, a bearing end cover, a sealing end cover and a tensioning block; the cylinder transmission assembly includes a driving wheel, a driven wheel and a bearing seat; the base plate is bolted to the top plate of the process chamber, the rotating cylinder bracket is bolted to the base plate, the rotating cylinder is bolted to the cylinder bracket, the driving wheel is bolted to the rotating cylinder, two supporting bearings are arranged inside the bearing seat, the transmission shaft is fixed inside the supporting bearing through an axial hole, and the driven wheel is bolted and fixed to the transmission shaft The top of the driven wheel and the driving wheel are connected to transmit power through a synchronous belt, the bearing end cover is bolted to the top of the bearing seat and presses the supporting bearing, the sealing end cover is bolted to the lower part of the process chamber top plate, the tensioning block is bolted to the base plate, and a tensioning screw is provided on the tensioning block, and the tensioning screw is used to adjust the tightness of the synchronous belt, the rotating cylinder is used to drive the driving wheel to rotate, and then drive the driven wheel to rotate through the synchronous belt, and at the same time drive the transmission shaft in the bearing seat to rotate, thereby driving the cleaning arm to rotate.

[0019] Furthermore, an air inlet hole is provided on the rotating cylinder, and ventilation to the air inlet hole can make the rotating cylinder rotate.

[0020] Optionally, the nozzle is a wide-angle nozzle, and the medium sprayed by the nozzle is distributed in a wide-angle shape.

[0021] As described above, the present invention provides a cleaning device, which has the following beneficial effects: the cleaning device of the present invention comprises a driving mechanism, a cleaning arm, a pipe and a plurality of nozzles arranged on the cleaning arm; the cleaning arm is placed horizontally inside a process chamber, and a plurality of nozzles are arranged on the surface of the cleaning arm facing the top plate of the process chamber, the pipe is buried inside the cleaning arm along the horizontal direction and is connected with all the nozzles, and one end of the pipe is an open end so that an external medium enters the cleaning arm from the open end, and the other end of the pipe is a closed end; the pipe comprises an air inlet pipe and a liquid inlet pipe which are parallel to each other and not connected with each other, and all the pipes are respectively connected with the corresponding nozzles, and the nozzles are divided into a first nozzle and a second nozzle, the first nozzle is arranged on the surface of the cleaning arm above the air inlet pipe, and the second nozzle is arranged on the surface of the cleaning arm above the liquid inlet pipe; Wherein, the liquid inlet pipeline is configured as a double-layer coaxially nested inner pipeline and outer pipeline; the second nozzle is connected to the outer pipeline and the second nozzle is arranged on the surface of the cleaning arm above the outer pipeline; one end of the inner pipeline is an open end to allow the external liquid medium to enter the cleaning arm, and the inner pipeline is provided with a plurality of inner pipeline outlet holes along its extension direction to drain the liquid medium in the inner pipeline into the outer pipeline; the end between the outer pipeline and the inner pipeline at the liquid inlet end of the liquid inlet pipeline is closed, and the outer pipeline and the inner pipeline at the other end of the liquid inlet pipeline are both closed ends; the driving mechanism is located outside the process chamber and is transmission-connected to the cleaning arm, and the driving mechanism is used to drive the cleaning arm so that the cleaning arm rotates with the transmission shaft transmission-connected to the cleaning arm as the rotation axis. When cleaning the top plate of the process chamber, the cleaning arm is driven to rotate by the driving mechanism, and the medium is sprayed from the nozzle to achieve spray cleaning of the top plate of the process chamber, thereby reducing or even avoiding the attachment of chemical waste liquid to the top plate of the process chamber, thereby reducing or even avoiding the chemical waste liquid falling on the surface of the wafer to form defects during the process, thereby affecting the process yield. In addition, the present invention can ensure that the liquid medium is sprayed out from the second nozzle at the same time and with uniform pressure through the setting of the double-layer coaxial nested inner pipe and outer pipe, thereby achieving uniform spray cleaning of the top plate of the process chamber, thereby avoiding the problem of uneven cleaning of the top plate of the process chamber caused by the pipe of the cleaning arm being too long, resulting in water coming out first and with high pressure at the end close to the liquid inlet pipe, and water coming out later and with low pressure at the end far away from the liquid inlet pipe. BRIEF DESCRIPTION OF THE DRAWINGS

[0022] Figure 1Shown is a schematic diagram of the overall structure of the cleaning device of the present invention.

[0023] Figure 2 It is a schematic diagram of the cross-sectional structure of the cleaning arm of the cleaning device of the present invention along the AA' direction in FIG. 1 .

[0024] Figure 3 It is a partially enlarged schematic diagram of the cross-sectional structure of the cleaning arm of the cleaning device of the present invention along the BB' direction in FIG3 .

[0025] Figure 4 Shown is a partial half-section structural schematic diagram of the cleaning device of the present invention.

[0026] Figure 5 Shown is a schematic diagram of the bottom structure of the cleaning device of the present invention.

[0027] Component number description

[0028] 1 driving mechanism, 10 base plate, 11 rotating cylinder bracket, 12 rotating cylinder, 13 driving wheel, 14 bearing seat, 141 supporting bearing, 142 transmission shaft, 143 bearing end cover, 15 driven wheel, 16 synchronous belt, 17 sealing end cover, 18 tensioning block, 181 tensioning screw, 2 cleaning arm, 21 nozzle, 211 first nozzle, 212 second nozzle, 22 pipeline, 221 air inlet pipeline, 222 liquid inlet pipeline, 223 outer pipeline, 224 inner pipeline, 225 inner pipeline liquid outlet hole, 3 process chamber top plate, 4 cleaning arm adjustment block, 41 height fastening screw, 42 height adjustment screw, 43 lower swing adjustment screw, 44 upper swing adjustment screw, 45 swing fastening screw, 46 adjustment part, 47 body part, 48 adjustment shaft. DETAILED DESCRIPTION

[0029] The following describes the embodiments of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific embodiments, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.

[0030] See also Figures 1 to 5 It should be noted that the illustrations provided in this embodiment are only used to illustrate the basic concept of the present invention in a schematic manner, and the illustrations only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.

[0031] The present invention provides a cleaning device, such as Figures 1 to 4 As shown, the cleaning device comprises: a driving mechanism 1, a cleaning arm 2, a pipe 22 and a plurality of nozzles 21 arranged on the cleaning arm 2;

[0032] The cleaning arm 2 is placed transversely inside the process chamber, and a plurality of the nozzles 21 are arranged on the surface of the cleaning arm 2 facing the top plate 3 of the process chamber. The pipe 22 is buried in the cleaning arm 2 transversely and communicates with all the nozzles 21. One end of the pipe 22 is an open end so that the external medium enters the cleaning arm 2 from the open end, and the other end of the pipe 22 is a closed end.

[0033] like Figures 1 to 3 As shown, the pipeline 22 includes an air intake pipeline 221 and a liquid intake pipeline 222 which are parallel to each other and not connected to each other, and all the pipelines 22 are respectively connected to the corresponding nozzles 21, and the nozzles 21 are divided into a first nozzle 211 and a second nozzle 212. The first nozzle 211 is arranged on the surface of the cleaning arm 2 above the air intake pipeline 221, and the second nozzle 212 is arranged on the surface of the cleaning arm 2 above the liquid intake pipeline 222;

[0034] like Figure 2 and Figure 3 As shown, the liquid inlet pipe 222 is configured as a double-layer coaxially nested inner pipe 224 and outer pipe 223; the second nozzle 212 is connected to the outer pipe 223 and the second nozzle 212 is arranged on the surface of the cleaning arm 2 above the outer pipe 223; one end of the inner pipe 224 is an open end to allow the external liquid medium to enter the cleaning arm 2, and the inner pipe 224 is provided with a plurality of inner pipe outlet holes 225 along its extension direction to drain the liquid medium in the inner pipe 224 into the outer pipe 223; the end between the outer pipe 223 and the inner pipe 224 at the liquid inlet end of the liquid inlet pipe 222 is closed, and the outer pipe 223 and the inner pipe 224 at the other end of the liquid inlet pipe 222 are both closed ends;

[0035] like Figure 4 As shown, the driving mechanism 1 is located outside the process chamber and is transmission-connected to the cleaning arm 2. The driving mechanism 1 is used to drive the cleaning arm 2 so that the cleaning arm 2 rotates with the transmission shaft 142 transmission-connected between the driving mechanism 1 and the cleaning arm 2 as the rotation axis.

[0036] When the cleaning device of this embodiment cleans the process chamber top plate, the driving mechanism drives the cleaning arm to rotate, and the nozzle sprays the medium to achieve spray cleaning of the process chamber top plate, thereby reducing or even avoiding the attachment of chemical waste liquid to the process chamber top plate, thereby reducing or even avoiding the chemical waste liquid falling on the wafer surface during the process to form defects and affect the process yield. In addition, the present invention can ensure that the liquid medium is sprayed out from the second nozzle at the same time and with uniform pressure through the setting of double-layer coaxial nested inner and outer pipes, thereby achieving uniform spray cleaning of the process chamber top plate, avoiding the problem of uneven cleaning of the process chamber top plate caused by the cleaning arm pipe being too long, resulting in water coming out first and with high pressure near the liquid inlet pipe end, and water coming out later and with low pressure away from the liquid inlet pipe end.

[0037] The driving mechanism 1 is disposed outside the process chamber to avoid the driving mechanism 1 occupying the space inside the process chamber, and to prevent the chemical solution inside the process chamber from corroding the driving mechanism 1 .

[0038] The cleaning arm 2 is placed horizontally inside the process chamber, that is, the extension direction of the cleaning arm 2 is horizontal to the process chamber top plate 3. The length of the cleaning arm 2 can be set according to the size of the process chamber top plate, so that the cleaning arm 2 can achieve all-round coverage spraying on the process chamber top plate 3 during the rotation of the driving mechanism 1 and the transmission shaft 142 connected to the cleaning arm 2, thereby improving the cleaning efficiency.

[0039] The medium enters the cleaning arm 2 from the open end of the pipe 22. The medium can be set according to different processes. As an example, the medium entering the air inlet pipe 221 includes nitrogen, and the medium entering the liquid inlet pipe 222 includes deionized water. During the actual cleaning process, the second nozzle 212 can first spray the medium to perform liquid cleaning on the process chamber top plate 3, and then the first nozzle 211 can spray the medium to perform gas drying on the process chamber top plate 3. Alternatively, only the liquid cleaning work or only the gas drying work can be performed, or both the liquid cleaning work and the gas drying work can be performed simultaneously. Those skilled in the art can make settings according to the actual needs of the liquid cleaning work, and no limitation is made here.

[0040] In this embodiment, the first nozzles 211 are evenly distributed along the extension direction of the air inlet pipe 221; the second nozzles 212 are evenly distributed along the extension direction of the liquid inlet pipe 222. By setting a plurality of the nozzles 21, the cleaning arm 2 can achieve all-round and even coverage spraying on the process chamber top plate 3 during the reciprocating swing parallel to the process chamber top plate 3, thereby improving the cleaning efficiency.

[0041] As an example, the nozzle 21 can be set as a wide-angle nozzle, and the medium sprayed by the nozzle is distributed in a wide-angle shape, further achieving all-round coverage spraying of the process chamber top plate 3, and having a better cleaning effect.

[0042] It should be noted that the liquid medium is the medium that enters the cleaning arm 2 from the open end of the inner layer pipe 224 , and the liquid medium is used to perform the liquid cleaning work on the top plate of the process chamber.

[0043] When the cleaning device performs the liquid cleaning work, the liquid medium first enters the inner layer pipe 224 from the open end of the inner layer pipe 224, then enters the outer layer pipe 223 through the inner layer pipe outlet hole 225, and then is sprayed out by the second nozzle 212 connected to the outer layer pipe 223 to achieve the liquid cleaning work of the process chamber top plate 3. The inner layer pipe outlet hole 225 is exemplarily arranged on the surface below the inner layer pipe. In this embodiment, by setting the double-layer coaxial nested inner layer pipe 224 and outer layer pipe 223, it can be ensured that the liquid medium is sprayed out from the second nozzle 212 at the same time and with uniform pressure, so as to achieve uniform spray cleaning of the process chamber top plate 3, so as to avoid the problem of uneven cleaning of the process chamber top plate 3 caused by the excessive length of the pipe of the cleaning arm 2, which causes the water to be discharged first with high pressure near the liquid inlet end of the liquid inlet pipe 222, and the water to be discharged later with low pressure away from the liquid inlet end of the liquid inlet pipe 222.

[0044] As an example, Figure 5 As shown, the cleaning device also includes a cleaning arm adjustment block 4 fixed to the inner side of the process chamber top plate 3, the side of the cleaning arm adjustment block 4 clamps the cleaning arm 2, and the cleaning arm adjustment block 4 is used to adjust the positional relationship between the cleaning arm 2 and the process chamber top plate 3, as shown in FIG. Figure 4 As shown, the cleaning arm adjustment block 4 is installed at the bottom of the transmission shaft 142 , and the cleaning arm 2 is in transmission connection with the transmission shaft 142 .

[0045] As a specific example, Figure 5As shown, the cleaning arm adjustment block 4 includes a main body 47 and an adjustment part 46, the main body 47 is fixedly connected to one end of the transmission shaft 142 close to the cavity top plate 3, the adjustment part 46 is arranged on the side of the main body 47, and the side of the main body 47 is provided with an adjustment shaft 48 of a protruding cylindrical structure, and the adjustment shaft 48 is embedded in a hole correspondingly arranged in the adjustment part 46, so that the adjustment part 46 and the main body 47 are connected through the adjustment shaft 48, and the adjustment part 46 clamps the cleaning arm 2. The hole arranged in the adjustment part 46 can be a through hole that penetrates the side of the adjustment part 46, or it can be a blind hole that does not penetrate the side of the adjustment part 46, as long as the adjustment part 46 and the main body 47 can be connected, and the cleaning arm 2 and the adjustment part 46 can be rotated with the adjustment shaft 48 as the rotation axis, and no limitation is made here.

[0046] The bottom of the main body 47 is provided with a height adjustment screw 42 and at least one height fastening screw 41. The height adjustment screw 42 passes through the main body 47 from the bottom of the main body 47 and supports the transmission shaft 142. The height fastening screw 41 passes through the main body 47 from the bottom of the main body 47 and is connected to the transmission shaft 142. The height adjustment screw 42 is used to adjust the longitudinal distance between the cleaning arm 2 and the process chamber top plate 3. The height fastening screw 41 is used to fix the longitudinal distance between the cleaning arm 2 and the process chamber top plate 3. It should be noted here that the bottom of the main body 47 is the side away from the process chamber top plate 3.

[0047] A lower swing adjusting screw 43 and an upper swing adjusting screw 44 are longitudinally arranged on one side of the adjusting portion 46 close to the extending direction of the cleaning arm 2, and a swing fastening screw 45 is also arranged on the other side of the adjusting portion 46. The lower swing adjusting screw 43 and the upper swing adjusting screw 44 pass through the adjusting portion 46 and support the main body 47. The swing fastening screw 45 passes through the adjusting portion 46 and is connected to the main body 47. The lower swing adjusting screw 43 and the upper swing adjusting screw 44 are used to adjust the angle between the cleaning arm 2 and the process chamber top plate 3, and the swing fastening screw 45 is used to fix the angle between the cleaning arm 2 and the process chamber top plate 3. It should be noted here that the longitudinal direction is a direction perpendicular to the process chamber top plate 3.

[0048] Before performing the cleaning work, it is necessary to adjust the positional relationship between the cleaning arm 2 and the process chamber top plate 3, including adjusting the angle between the cleaning arm 2 and the process chamber top plate 3 so that the cleaning arm 2 is parallel to the process chamber top plate 3, and adjusting the longitudinal distance between the cleaning arm 2 and the process chamber top plate 3 so that the cleaning arm 2 is at a preset distance from the process chamber top plate 3, thereby further achieving all-round and uniform coverage spraying of the process chamber top plate 3 and improving the cleaning efficiency.

[0049] As an example, the process of adjusting the cleaning arm adjustment block 4 before performing the cleaning work is as follows: first, loosen the swing fastening screw 45, and adjust the lower swing adjustment screw 43 or the upper swing adjustment screw 44 according to the horizontal position of the cleaning arm 2. For example, when it is necessary to adjust the cleaning arm 2 to one side of the process chamber top plate 3 so that it is parallel to the process chamber top plate 3, the upper swing adjustment screw 44 can be adjusted to support the main body 47 of the cleaning arm adjustment block 4 to increase the gap between the end of the adjustment part 46 away from the process chamber top plate 3 and the main body 47, and at the same time reduce the gap between the end of the adjustment part 46 close to the process chamber top plate 3 and the main body 47, so that the cleaning arm 2 and the adjustment part 46 rotate with the adjustment shaft 48 as the rotation axis until the cleaning arm 2 Parallel to the process chamber top plate 3, then tighten the swing fastening screw 45 to fix the angle between the cleaning arm 2 and the process chamber top plate 3. Similarly, when it is necessary to adjust the cleaning arm 2 to the side away from the process chamber top plate 3 so that it is parallel to the process chamber top plate 3, the swing adjustment screw 43 can be adjusted accordingly. Then turn the height adjustment screw 42. Since the height adjustment screw 42 supports the transmission shaft 142, the gap between the main body 47 of the cleaning arm adjustment block 4 and the transmission shaft 142 can be adjusted by turning the height adjustment screw 42, and then the longitudinal spacing between the cleaning arm 2 and the process chamber top plate 3 can be driven to adjust. After adjusting to the preset distance from the process chamber top plate 3, tighten the height fastening screw 41 to fix the longitudinal spacing between the cleaning arm adjustment block 4 and the transmission shaft 142, and the adjustment is completed.

[0050] The driving mechanism 1 is located outside the process chamber and is transmission-connected to the cleaning arm 2. The driving mechanism 1 is used to drive the cleaning arm 2 so that the cleaning arm 2 rotates with the transmission shaft 142 that the driving mechanism 1 is transmission-connected to the cleaning arm 2 as the rotation axis, thereby achieving the cleaning work on the process top plate 3. The driving mechanism 1 can be a motor driving mechanism or a cylinder driving mechanism. Those skilled in the art can select a suitable driving mechanism 1 by themselves, and no specific limitation is made here. Preferably, in this embodiment, a cylinder driving mechanism is selected to drive the cleaning arm 2. Figure 1 and Figure 4 As shown, the cylinder drive mechanism includes a rotating cylinder 12 and a cylinder transmission assembly, the rotating cylinder 12 is transmission-connected to the cylinder transmission assembly, the cylinder transmission assembly is transmission-connected to the transmission shaft 142, the transmission shaft 142 is transmission-connected to the cleaning arm 2, and the rotating cylinder is used to drive the cylinder transmission assembly and drive the transmission shaft 142 to rotate, thereby driving the cleaning arm 2 to rotate with the transmission shaft 142 as the rotation axis.

[0051] As a specific example, Figure 1 and Figure 4As shown, the cylinder drive mechanism includes a rotating cylinder 12 and a cylinder transmission assembly, and the cylinder transmission assembly includes a driving wheel 13, a driven wheel 15 and a bearing seat 14. The cylinder drive mechanism also includes a base plate 10, a rotating cylinder bracket 11, a bearing end cover 143, a sealing end cover 17 and a tensioning block 18. The connection method between the various components of the cylinder drive mechanism can be selected according to actual needs, and is not limited here. This embodiment preferably adopts a bolt connection method so that the various components of the cylinder drive mechanism can be freely disassembled, and the cylinder drive mechanism can be regularly inspected and maintained as needed. Specifically, the base plate 10 is fixed to the process chamber top plate 3 by bolt connection, the rotating cylinder bracket 11 is fixed to the base plate 10 by bolt connection, the rotating cylinder 12 is installed on the cylinder bracket 11 by bolt connection, and the driving wheel 13 is installed on the rotating cylinder 12 by bolt connection. Two supporting bearings 141 are provided inside the bearing seat 14, the transmission shaft 142 is exemplarily fixed inside the supporting bearing 141 through shaft hole matching, the driven wheel 15 is fixed to the top of the transmission shaft 142 by bolt connection, the driven wheel 15 and the driving wheel 13 are connected to transmit power through a synchronous belt 16, the bearing end cover 143 is installed on the top of the bearing seat 14 by bolt connection and presses the supporting bearing 141, the sealing end cover 17 is installed on the lower part of the process chamber top plate 3 by bolt connection to ensure the sealing inside and outside the process chamber, the tensioning block 18 is fixed to the base plate 10 by bolt connection, and a tensioning screw 181 is provided on the tensioning block 18, and the tightness of the synchronous belt 16 can be controlled by adjusting the tensioning screw 181, such as Figure 4 and Figure 5 As shown, the cleaning arm adjustment block 4 is installed at the bottom of the transmission shaft 142 by bolt connection.

[0052] As an example, the rotary cylinder 12 is also provided with an air inlet. When performing liquid cleaning, the rotary cylinder 12 is ventilated through the air inlet to realize the rotation of the rotary cylinder 12, thereby driving the driving wheel 13 bolted to the rotary cylinder 12 to rotate, and at the same time driving the driven wheel 15 to rotate through the synchronous belt 16, and then driving the cleaning arm adjustment block 4 to swing through the transmission shaft 142, and finally realizing the rotation and swing of the cleaning arm 2 parallel to the process chamber top plate 3. The cleaning device using the cylinder drive mechanism has a simple structure, convenient adjustment, and low maintenance cost. For the semiconductor cleaning industry, it reduces the semiconductor process production cost and assembly and maintenance cost, and greatly improves production efficiency.

[0053] In summary, the cleaning device of the present invention comprises a driving mechanism, a cleaning arm, a pipe arranged on the cleaning arm, and a plurality of nozzles; the cleaning arm is placed horizontally inside the process chamber, and a plurality of nozzles are arranged on the surface of the cleaning arm facing the top plate of the process chamber, the pipe is buried in the cleaning arm along the horizontal direction and is connected with all the nozzles, and one end of the pipe is an open end to allow external medium to enter the cleaning arm from the open end, and the other end of the pipe is a closed end; the pipe comprises an air inlet pipe and a liquid inlet pipe which are parallel to each other and not connected with each other, and all the pipes are respectively connected with the corresponding nozzles, and the nozzles are divided into a first nozzle and a second nozzle, the first nozzle is arranged on the surface of the cleaning arm above the air inlet pipe, and the second nozzle is arranged on the surface of the cleaning arm above the liquid inlet pipe; wherein, the liquid inlet pipe is The invention relates to a double-layer coaxially nested inner pipe and outer pipe; the second nozzle is connected to the outer pipe and is arranged on the surface of the cleaning arm above the outer pipe; one end of the inner pipe is an open end to allow external liquid medium to enter the cleaning arm, and the inner pipe is provided with a plurality of inner pipe outlet holes along its extension direction to drain the liquid medium in the inner pipe into the outer pipe; the end between the outer pipe and the inner pipe at the liquid inlet end of the liquid inlet pipe is closed, and the outer pipe and the inner pipe at the other end of the liquid inlet pipe are both closed ends; the driving mechanism is located outside the process chamber and is transmission-connected to the cleaning arm, and the driving mechanism is used to drive the cleaning arm so that the cleaning arm rotates with the transmission shaft transmission-connected to the cleaning arm as the rotation axis. When the cleaning device of the present invention cleans the process chamber top plate, the driving mechanism drives the cleaning arm to rotate, and the nozzle sprays the medium to achieve spray cleaning of the process chamber top plate, thereby reducing or even avoiding the attachment of chemical waste liquid to the process chamber top plate, thereby reducing or even avoiding the chemical waste liquid falling on the wafer surface during the process to form defects and affect the process yield. In addition, the present invention can ensure that the liquid medium is sprayed out from the second nozzle at the same time and with uniform pressure through the setting of double-layer coaxial nested inner and outer pipes, thereby achieving uniform spray cleaning of the process chamber top plate, avoiding the problem of uneven cleaning of the process chamber top plate caused by the excessive length of the cleaning arm pipe, which causes the water to flow out first and with high pressure near the liquid inlet pipe end, and the water to flow out later and with low pressure far away from the liquid inlet pipe end. Therefore, the present invention effectively overcomes various shortcomings in the prior art and has high industrial utilization value.

[0054] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the art may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed by the present invention shall still be covered by the claims of the present invention.

Claims

1. A cleaning device, characterized in that: The cleaning device comprises: a driving mechanism, a cleaning arm, a pipe arranged on the cleaning arm and a plurality of nozzles; The cleaning arm is placed transversely inside the process chamber, a plurality of the nozzles are arranged on the surface of the cleaning arm facing the top plate of the process chamber, the pipeline is buried in the cleaning arm along the transverse direction and communicated with all the nozzles, and one end of the pipeline is an open end so that the external medium enters the cleaning arm from the open end, and the other end of the pipeline is a closed end; The pipeline includes an air intake pipeline and a liquid intake pipeline which are parallel to each other and not connected to each other, and all the pipelines are respectively connected to the corresponding nozzles, and the nozzles are divided into a first nozzle and a second nozzle, the first nozzle is arranged on the surface of the cleaning arm above the air intake pipeline, and the second nozzle is arranged on the surface of the cleaning arm above the liquid intake pipeline, and the first nozzles are evenly distributed along the extension direction of the air intake pipeline; the second nozzles are evenly distributed along the extension direction of the liquid intake pipeline; Wherein, the liquid inlet pipeline is configured as a double-layer coaxially nested inner layer pipeline and outer layer pipeline; the second nozzle is connected to the outer layer pipeline and the second nozzle is arranged on the surface of the cleaning arm above the outer layer pipeline; one end of the inner layer pipeline is an open end to allow the external liquid medium to enter the cleaning arm, and the inner layer pipeline is provided with a plurality of inner layer pipeline liquid outlet holes along its extension direction to drain the liquid medium in the inner layer pipeline into the outer layer pipeline; the end between the outer layer pipeline and the inner layer pipeline at the liquid inlet end of the liquid inlet pipeline is closed, and the outer layer pipeline and the inner layer pipeline at the other end of the liquid inlet pipeline are both closed ends; The driving mechanism is located outside the process chamber and is transmission-connected to the cleaning arm. The driving mechanism is used to drive the cleaning arm so that the cleaning arm rotates with the transmission shaft transmission-connected between the driving mechanism and the cleaning arm as the rotation axis.

2. The cleaning device according to claim 1, characterized in that: The medium entering the air inlet pipe includes nitrogen, and the medium entering the liquid inlet pipe includes deionized water.

3. The cleaning device according to claim 1, characterized in that: The inner layer pipeline liquid outlet hole is arranged on the surface below the inner layer pipeline.

4. The cleaning device according to claim 1, characterized in that: The cleaning device also includes a cleaning arm adjustment block fixed to the inner side of the process chamber top plate, the side of the cleaning arm adjustment block clamps the cleaning arm, and the cleaning arm adjustment block is used to adjust the positional relationship between the cleaning arm and the process chamber top plate.

5. The cleaning device according to claim 4, characterized in that: The cleaning arm adjustment block comprises a main body and an adjustment part, wherein the main body is fixedly connected to one end of the transmission shaft close to the top plate of the process chamber, the adjustment part is arranged on the side of the main body, and a protruding cylindrical adjustment shaft is arranged on the side of the main body, and the adjustment shaft is embedded in a hole correspondingly arranged on the adjustment part, so that the adjustment part is connected to the main body through the adjustment shaft, and the adjustment part clamps the cleaning arm; A height adjustment screw and at least one height fastening screw are provided at the bottom of the body part, the height adjustment screw passes through the body part from the bottom of the body part and supports the transmission shaft, the height fastening screw passes through the body part from the bottom of the body part and is connected to the transmission shaft, the height adjustment screw is used to adjust the longitudinal distance between the cleaning arm and the top plate of the process chamber, and the height fastening screw is used to fix the longitudinal distance between the cleaning arm and the top plate of the process chamber; A lower swing adjusting screw and an upper swing adjusting screw are longitudinally arranged on one side of the adjusting portion close to the extending direction of the cleaning arm, and a swing fastening screw is also arranged on the other side of the adjusting portion, the lower swing adjusting screw and the upper swing adjusting screw pass through the adjusting portion and support the main body, the swing fastening screw passes through the adjusting portion and is connected to the main body, the lower swing adjusting screw and the upper swing adjusting screw are used to adjust the angle between the cleaning arm and the top plate of the process chamber, and the swing fastening screw is used to fix the angle between the cleaning arm and the top plate of the process chamber.

6. The cleaning device according to claim 1, characterized in that: The driving mechanism is a cylinder driving mechanism, which includes a rotating cylinder and a cylinder transmission assembly. The rotating cylinder is transmission-connected to the cylinder transmission assembly, the cylinder transmission assembly is transmission-connected to the transmission shaft, and the transmission shaft is transmission-connected to the cleaning arm. The rotating cylinder is used to drive the cylinder transmission assembly to drive the transmission shaft to rotate, thereby driving the cleaning arm to rotate with the transmission shaft as the rotation axis.

7. The cleaning device according to claim 6, characterized in that: The cylinder drive mechanism also includes a base plate, a rotating cylinder bracket, a bearing end cover, a sealing end cover and a tensioning block; the cylinder transmission assembly includes a driving wheel, a driven wheel and a bearing seat; the base plate is bolted to the top plate of the process chamber, the rotating cylinder bracket is bolted to the base plate, the rotating cylinder is bolted to the cylinder bracket, the driving wheel is bolted to the rotating cylinder, two supporting bearings are arranged inside the bearing seat, the transmission shaft is fixed inside the supporting bearing through an axial hole, and the driven wheel is bolted and fixed to the top of the transmission shaft The driven wheel and the driving wheel are connected to transmit power through a synchronous belt, the bearing end cover is bolted to the top of the bearing seat and presses the supporting bearing, the sealing end cover is bolted to the lower part of the process chamber top plate, the tension block is bolted to the base plate, and a tension screw is provided on the tension block. The tension screw is used to adjust the tightness of the synchronous belt, and the rotating cylinder is used to drive the driving wheel to rotate, and then drive the driven wheel to rotate through the synchronous belt, and at the same time drive the transmission shaft in the bearing seat to rotate, thereby driving the cleaning arm to rotate.

8. The cleaning device according to claim 6, characterized in that: The rotary cylinder is provided with an air inlet hole, and ventilation through the air inlet hole can make the rotary cylinder rotate.

9. The cleaning device according to claim 1, characterized in that: The nozzle is a wide-angle nozzle, and the medium sprayed by the nozzle is distributed in a wide-angle shape.

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