A surface drying and cooling treatment process in the production of a processing-free CTP offset printing plate

Abstract

The present application relates to a kind of surface drying cooling treatment process in the production of treatment-free CTP offset printing plate material, and the process steps include preheating treatment, heat preservation conveying, high-temperature drying, rapid cooling, drying treatment, secondary cooling;By setting preheating chamber, subsection temperature preheating helps the uniform heating of CTP plate material to avoid the quality problem caused by uneven temperature, while using roller to carry out secondary flattening treatment to coated surface, prevent coating liquid from leaving from the edge of plate material due to gravity, cause uneven coating of coating liquid;By setting a cooling chamber, effectively neutralize the high temperature at the inlet, avoid the skin effect caused by too large temperature change;By setting drying chamber, CTP plate material after rapid cooling due to large environmental temperature difference can form CTP plate material surface water vapor condensation, hydrophilic coating is prone to moisture absorption and appears the phenomenon of re-humidification, therefore, set drying chamber to CTP plate material is slightly heated, secondary heating and drying, ensure the dryness of CTP plate material.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of processing technology of non-processed CTP plate material, and particularly relates to a surface drying and cooling treatment process in production of non-processed CTP offset plate material. BACKGROUND

[0002] The non-processed CTP plate material refers to plate material that is exposed to imaging on a direct plate making equipment, and does not need any subsequent processing procedure, and can be directly printed without chemical developing and washing treatment, and is a truly non-processed plate material. The production process of the non-processed CTP plate material includes unwinding, alkali washing and neutralization, electrolytic oxidation, coating and drying, cutting and packaging. In the existing production process, the plate material after coating and drying is cooled by natural air drying, which is slow and affects the production process of the next cutting process. Therefore, the surface drying and cooling treatment process in production of non-processed CTP offset plate material is developed.

[0003] A patent No. CN200610017719.1 discloses a preparation method of a photosensitive lithographic plate material. The plate material is prepared by using a photosensitive lithographic plate coating liquid suitable for the drying method. However, the plate material does not have a design for preventing moisture return, and the moisture of the plate material is attached to the inner wall of the warehouse during the drying process. In addition, the plate material does not have a design for rapid heating and rapid cooling during the drying process. SUMMARY

[0004] The present application aims to solve the technical problems of the existing non-processed CTP offset plate material, such as large temperature change, easy moisture return on the surface of the plate material, uneven coating liquid on the side during preheating, and long cooling time after drying.

[0005] To achieve the above-mentioned purpose, the present application provides the following technical solutions.

[0006] A surface drying and cooling treatment process in production of non-processed CTP offset plate material, which comprises the following steps:

[0007] Step one: after the surface of the CTP plate material sprayed with photosensitive coating is flattened, it enters the preheating chamber for preheating treatment, the temperature is controlled at 50-180 degrees Celsius, and the time is 20-60 seconds;

[0008] Step two: the CTP plate material after preheating treatment enters the first heat preservation chamber, the roller shaft in the first heat preservation chamber flattens it again and then transports it to the drying chamber, the temperature in the first heat preservation chamber is controlled at 120-180 degrees Celsius, and the CTP plate material flows for 5-8 seconds;

[0009] Step three: the CTP plate material after step two enters the first drying chamber, the first drying chamber adopts quartz tube heating mode, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds;

[0010] Step four: the CTP plate material after drying enters the first cooling chamber, the first cooling chamber uses a rapid cooling device to rapidly cool the CTP plate material after drying, the cooling speed is 5-25 degrees Celsius per minute, the time is 5-29 minutes, and the temperature of the CTP plate material is reduced to 55 degrees Celsius;

[0011] Step five: the CTP plate material after rapid cooling treatment in step four enters the drying chamber for re-humidification drying treatment, the temperature is controlled at 65-75 degrees Celsius, and the time is 6-10 seconds;

[0012] Step six: the CTP plate material after step five enters the second cooling chamber, so that the surface temperature of the CTP plate material is reduced to 35-45 degrees Celsius, and the time is 1-8 minutes.

[0013] As a preferred, the preheating chamber includes a first preheating chamber and a second preheating chamber, the CTP plate material in the first preheating chamber is a flat flow section of coating liquid, the temperature is set between 50-70 degrees Celsius, the heating time is 2-15 seconds, and the CTP plate material is preliminarily heated and solidified.

[0014] As a preferred, the CTP plate material in the second preheating chamber is pre-dried, the temperature is set between 120-180 degrees Celsius, and the pre-drying time is 10-40 seconds.

[0015] As a preferred, a heat preservation transportation bin is arranged between the first preheating chamber and the second preheating chamber, the CTP plate material is flattened and heat preserved in the heat preservation transportation bin, and the temperature in the heat preservation transportation bin is the same as that in the first preheating chamber.

[0016] As a preferred, the temperature in the first heat preservation chamber is the same as that in the second preheating chamber, and the cabin body of the first heat preservation chamber is composed of polyurethane spraying and polyurethane heat preservation bin plate.

[0017] As a kind of preferred, the preheating chamber, the back of the first drying chamber is connected with waste gas recovery device, the upper and lower sides of the preheating chamber are vertically provided with drying port.

[0018] As a kind of preferred, the drying chamber adopts negative pressure control, and the negative pressure control is 0-100 mmHg.

[0019] As a kind of preferred, the second cooling chamber adopts air cooling mode for cooling, the unit area mass of the photosensitive layer of the treatment-free CTP offset printing plate is 0.10 g / m2, and the thickness of the plate is 0.15-0.40 mm.

[0020] The present application has the following advantages:

[0021] (1) In the present application, by setting the preheating chamber, the CTP plate after coating is heated by using the segmented heating preheating mode, so that the CTP plate can reach the required temperature faster in the subsequent processing process, which is helpful for the uniform heating of the CTP plate, avoids the quality problems caused by uneven temperature, and the heat preservation transport warehouse is arranged between the first preheating chamber and the second preheating chamber, because the CTP plate in the first preheating chamber is the advection section of the coating liquid, the coating liquid is left from the edge of the plate due to the influence of gravity, which will cause uneven coating of the coating liquid, therefore, the roller flattening process is arranged in the heat preservation transport warehouse to roll and flatten the unhardened coating liquid, to ensure the uniformity of the coating liquid, and to reduce the air bubbles and improve the yield.

[0022] (2) In the present application, by setting the first cooling chamber, the high-temperature CTP plate is rapidly cooled, which effectively neutralizes the high temperature at the inlet, avoids the large temperature change, and ensures the uniform drying of the coating, avoids the skinning effect caused by uneven heating and rapid temperature rise.

[0023] (3) In the present application, the drying chamber is arranged behind the first cooling chamber, the high-temperature CTP plate will form water vapor condensation on the surface of the CTP plate due to the large environmental temperature difference after rapid cooling, and the hydrophilic coating is easy to absorb water and appear re-humidification phenomenon, therefore, the drying chamber is arranged to slightly heat the CTP plate, and the CTP plate is dried by secondary heating, to ensure the dryness of the CTP plate.

[0024] In summary, the present application has the advantages of high yield, fast cooling speed and high dryness, and is especially suitable for the treatment process technology field of treatment-free CTP plate. BRIEF DESCRIPTION OF DRAWINGS

[0025] In order to more clearly illustrate the technical scheme of the embodiments of the present application, the drawings needed in the embodiment description will be briefly introduced below, and obviously, the drawings described below are only some embodiments of the present application, and those skilled in the art can also obtain other drawings according to these drawings without creating any creative labor.

[0026] Fig. 1 Schematic diagram of the overall process of surface drying and cooling treatment in the production of treatment-free CTP offset printing plates.

[0027] Fig. 2 This is a flow chart of the preheating chamber part.

[0028] Fig. 3 This is a schematic diagram of the waste gas treatment and drying process in the preheating chamber and the No. 1 drying chamber. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the present invention are clearly and completely described below with reference to the accompanying drawings.

[0030] Example 1

[0031] like Figs. 1 to 3 As shown, the present invention provides a surface drying and cooling treatment process for the production of treatment-free CTP offset printing plates, which process comprises the following steps:

[0032] Step 1: After the surface of the CTP plate is sprayed with a photosensitive coating and is scraped flat, it enters the preheating chamber for plate preheating. The temperature is controlled at 50-180 degrees Celsius for 20-60 seconds. The coated CTP plate is heated so that it can reach the required temperature more quickly during subsequent processing, which helps the CTP plate to be heated evenly and avoids quality problems caused by uneven temperature.

[0033] Step 2: After preheating, the CTP plate enters the No. 1 insulation chamber. The rollers in the No. 1 insulation chamber smooth it again and then transport it to the drying room with insulation. The temperature in the No. 1 insulation chamber is controlled at 120-180 degrees Celsius. The flow time of the CTP plate is 5-8 seconds. There is a gap between the preheating chamber and the No. 1 drying chamber. In order to reduce heat loss and energy consumption, the No. 1 insulation chamber is set as a receiving warehouse. In the No. 1 insulation chamber, rollers are designed to smooth it again to reduce bubbles formed by evaporation of water in the coating liquid and ensure the flatness of the CTP plate coating surface.

[0034] Step 3: After step 2, the CTP plate enters the No. 1 drying room. The No. 1 drying room adopts quartz tube heating method, and the temperature is controlled at 190-200 degrees Celsius for 2-20 seconds. The traditional drying room adopts air heating method, which is noisy and easy to form water accumulation in the room, increasing the probability of CTP plate getting damp. The quartz tube heating method we adopt is efficient and energy-saving, with high working temperature, fast heating, low thermal inertia, high temperature resistance, corrosion resistance, good thermochemical performance stability, long service life, high insulation strength and no pollution.

[0035] Step four: the CTP plate material after drying enters the first cooling chamber, and the rapid cooling device is used in the first cooling chamber to rapidly cool the CTP plate material after drying, the cooling speed is 5-25 degrees Celsius per minute, the time is 5-29 minutes, and the temperature of the CTP plate material is reduced to 55 degrees Celsius. The CTP plate material is rapidly cooled to effectively neutralize the high temperature at the inlet, avoid large temperature changes, ensure uniform drying of the coating, and avoid skinning effect caused by uneven heating and rapid temperature rise.

[0036] Step five: the CTP plate material after rapid cooling in step four enters the drying chamber for re-humidification drying treatment, the temperature is controlled at 65-75 degrees Celsius, and the time is 6-10 seconds. The CTP plate material after rapid cooling will form water vapor condensation on the surface due to large environmental temperature difference, and the hydrophilic coating is easy to absorb water and re-humidify. Therefore, the drying chamber is set to re-heat and dry the CTP plate material to ensure the dryness of the CTP plate material.

[0037] Step six: the CTP plate material after step five enters the second cooling chamber to reduce the surface temperature of the CTP plate material to 35-45 degrees Celsius, and the time is 1-8 minutes. The air-cooled treatment is performed on the CTP plate material after secondary drying to improve the cooling efficiency and increase the dryness, and further cut the plate material.

[0038] Further, as shown in Fig. 2 , the preheating chamber includes a first preheating chamber and a second preheating chamber. The CTP plate material in the first preheating chamber is a flat flow section of coating liquid, the temperature is set between 50-70 degrees Celsius, and the heating time is 2-15 seconds. The CTP plate material is preliminarily heated and solidified.

[0039] Further, the second preheating chamber is used for pre-drying the CTP plate material, the temperature is set between 120-180 degrees Celsius, and the pre-drying time is 10-40 seconds. The second preheating chamber and the first drying chamber are used for segmented heating of the CTP plate material, effectively controlling the temperature rising speed and temperature gradient, and avoiding the CTP plate material from being overheated and peeling.

[0040] Further, as shown in Fig. 2 , the first preheating chamber and the second preheating chamber are provided with a heat preservation transportation bin. The CTP plate material is flattened and heat preserved in the heat preservation transportation bin. The temperature in the heat preservation transportation bin is the same as that in the first preheating chamber. Because the CTP plate material in the first preheating chamber is a flat flow section of coating liquid, the coating liquid is affected by gravity and left from the edge of the plate material, which causes uneven coating of the coating liquid. Therefore, a roller flattening process is set in the heat preservation transportation bin to roll and flatten the un-solidified coating liquid, ensure the uniformity of the coating liquid, and reduce air bubbles to improve the yield.

[0041] Further, the temperature in the first heat preservation chamber is the same as the temperature in the second preheating chamber, and the cabin body of the first heat preservation chamber is combined by polyurethane spraying and polyurethane heat preservation warehouse board, and has excellent heat preservation performance, good waterproof performance, fire safety and environmental protection properties.

[0042] Further, as shown in Fig. 3 The back of the preheating chamber and the first drying chamber are connected with waste gas recovery devices, because the coating liquid of the CTP plate material will generate waste gas in the heating process, and the direct emission of waste gas will have a great impact on the environment, therefore, the waste gas recovery device is arranged to agree to recycle the waste gas to the park waste water treatment station for centralized treatment. The upper and lower sides of the preheating chamber are vertically provided with drying ports, and the inside is provided with chemical drying agent and filtering structure. A large amount of moisture condensed on the inner wall of the preheating chamber is adsorbed, and the moisture is filtered out through the filtering structure and discharged to the outside, so as to reduce the possibility of the coating liquid of the CTP plate material being reabsorbed and humidified.

[0043] Further, the drying chamber adopts negative pressure control, and the negative pressure control is 0-100 mmHg.

[0044] Further, the second cooling chamber adopts air cooling mode for cooling. The unit area mass of the photosensitive layer of the treatment-free CTP offset plate material is 0.10 g / m2, and the plate material thickness is 0.15-0.40 mm.

[0045] Working process: first, the coated CTP plate material is treated by scraping and then enters the preheating chamber for preheating treatment, the temperature is controlled at 50-180 degrees Celsius, the time is 20-60 seconds, the coated CTP plate material is heated, so that the CTP plate material can reach the required temperature faster in the subsequent processing process, which is helpful to the uniform heating of the CTP plate material and avoids quality problems caused by uneven temperature; further, the CTP plate material after preheating treatment enters the first heat preservation chamber, the roller shaft in the first heat preservation chamber flattens it again and then transports it to the drying chamber, the temperature in the first heat preservation chamber is controlled at 120-180 degrees Celsius, the CTP plate material flows for 5-8 seconds, there is a gap between the preheating chamber and the first drying chamber, in order to reduce the heat loss and energy consumption, the first heat preservation chamber is set as a receiving bin, and the roller shaft is designed in the first heat preservation chamber to flatten again, reduce the bubbles formed by the evaporation of water in the coating liquid, and ensure the flatness of the coated surface of the CTP plate material; further, the CTP plate material after step two enters the first drying chamber, the drying chamber adopts a quartz tube heating method, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds; further, the CTP plate material after drying enters the first cooling chamber, the first cooling chamber uses a rapid cooling device to rapidly cool the dried CTP plate material, the cooling speed is 5-25 degrees Celsius per minute, and the time is 5-29 minutes, the temperature of the CTP plate material is reduced to 55 degrees Celsius, the high-temperature CTP plate material is rapidly cooled, effectively neutralizing the high temperature at the inlet, avoiding large temperature changes, ensuring uniform drying of the coating, and avoiding the skinning effect caused by uneven heating and rapid temperature rise; further, the CTP plate material after rapid cooling enters the drying chamber for re-humidification drying treatment, the temperature is controlled at 65-75 degrees Celsius, and the time is 6-10 seconds, the high-temperature CTP plate material after rapid cooling will form water vapor condensation on the surface due to the large environmental temperature difference, and the hydrophilic coating is easy to absorb water and appear re-humidification phenomenon, therefore, the drying chamber is set to re-heat the CTP plate material, and the CTP plate material is dried again to ensure the dryness of the CTP plate material; further, the CTP plate material enters the second cooling chamber, so that the surface temperature of the CTP plate material is reduced to 35-45 degrees Celsius, and the time is 1-8 minutes, the CTP plate material after secondary drying is air-cooled to improve the cooling efficiency and increase the dryness, and the plate material is further cut.

[0046] In the description of the present application, it should be understood that the terms "front and back", "left and right" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or components referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore cannot be understood as a limitation on the application.

[0047] Of course in the technical solution, those skilled in the art should understand that the term "one" should be understood as "at least one" or "one or more", that is, in one embodiment, the number of one element can be one, and in another embodiment, the number of the element can be multiple, and the term "one" cannot be understood as a limitation on the number.

[0048] The above description is only the preferred embodiment of the present application, but the protection scope of the present application is not limited to this. Any changes or replacements that can be easily thought of by those skilled in the art under the technical hints of the present application should be covered in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A process for surface drying and cooling treatment in the production of a processless CTP offset printing plate material, characterized by: The process comprises the following steps: Step one: after the surface of the CTP plate material is sprayed with a photosensitive coating and is subjected to scraping treatment, the plate material is preheated in a preheating chamber, the temperature is controlled at 50-180 degrees Celsius, and the time is 20-60 seconds; Step two: after the preheating treatment, the CTP plate material enters a first heat preservation chamber, the roller shaft in the first heat preservation chamber flattens the CTP plate material again and then heat preservation transports the CTP plate material to a drying chamber, the temperature in the first heat preservation chamber is controlled at 120-180 degrees Celsius, and the CTP plate material is transported for 5-8 seconds; Step three: the CTP plate material after step two enters a first drying chamber, the first drying chamber adopts a quartz tube heating mode, the temperature is controlled at 190-200 degrees Celsius, and the time is 2-20 seconds; Step four: the CTP plate material after drying enters a first cooling chamber, the first cooling chamber uses a rapid cooling device to rapidly cool the CTP plate material after drying, the cooling speed is 5-25 degrees Celsius per minute, the time is 5-29 minutes, and the temperature of the CTP plate material is reduced to 55 degrees Celsius; Step five: the CTP plate material after the rapid cooling treatment in step four enters a drying chamber for re-humidification and drying treatment, the temperature is controlled at 65-75 degrees Celsius, and the time is 6-10 seconds; Step six: the CTP plate material after step five enters a second cooling chamber, so that the surface temperature of the CTP plate material is reduced to 35-45 degrees Celsius, and the time is 1-8 minutes.

2. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 1, characterized in that, The preheating chamber comprises a first preheating chamber and a second preheating chamber, the CTP plate material in the first preheating chamber is in a flat flow section of the coating liquid, the temperature is set at 50-70 degrees Celsius, the heating time is 2-15 seconds, and the CTP plate material is preliminarily heated and solidified.

3. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 2, characterized in that, The CTP plate material in the second preheating chamber is subjected to pre-drying treatment, the temperature is set at 120-180 degrees Celsius, and the pre-drying time is 10-40 seconds.

4. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 2, characterized in that, A heat preservation transportation bin is arranged between the first preheating chamber and the second preheating chamber, the CTP plate material is flattened and heat preserved by the roller shaft in the heat preservation transportation bin, and the temperature in the heat preservation transportation bin is the same as that in the first preheating chamber.

5. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 2, characterized in that, The temperature in the first heat preservation chamber is the same as that in the second preheating chamber, and the cabin body of the first heat preservation chamber is composed of polyurethane spraying and polyurethane heat preservation bin plates.

6. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 2, characterized in that, The back of the preheating chamber and the first drying chamber is connected with a waste gas recovery device, and the upper and lower sides of the preheating chamber are vertically provided with drying ports.

7. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 1, characterized in that, The drying chamber adopts negative pressure control, and the negative pressure control is 0-100 mmHg.

8. A process for surface drying and cooling treatment in production of a processless CTP offset printing plate material according to claim 1, characterized in that, The second cooling chamber adopts air cooling for cooling, the unit area mass of the photosensitive layer of the free treatment CTP offset plate material is 0.10 g / m2, and the thickness of the plate material is 0.15-0.40 mm.

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