Composition for barrier protection layer of photosensitive drum of organic photoconductor

Abstract

The invention relates to the technical field of organic photoconductor photosensitive drums, in particular to a composition for a blocking protection layer of an organic photoconductor photosensitive drum. The invention relates to a composition for a blocking protective layer of a photosensitive drum of an organic photoconductor. The composition is characterized by comprising the following raw materials: zinc oxide, titanium dioxide, silicon dioxide, polyvinyl butyral, curable resin, a curing agent, n-butyl alcohol, methanol, dichloromethane and dichloroethane. The composition for the organic photoconductor photosensitive drum blocking protection layer has the beneficial effects that the composition can be better dip-coated on a base material, the appearance is smooth, a coating can be quickly dried and volatilized due to a proper high-boiling-point solvent ratio and a proper low-boiling-point solvent ratio during film forming, and the problem of coating blistering caused by solvent volatilization in a drying process can be better solved; and the adhesive force with a photosensitive drum base material is good, so that a shielding and protecting effect can be effectively achieved.

Description

Technical Field

[0001] The invention relates to the technical field of organic photoconductor photosensitive drums, in particular to a composition for a barrier protective layer of an organic photoconductor photosensitive drum. Background Art

[0002] Photosensitive drum, also known as organic photoconductor photosensitive drum, English name Organic Photoconductor, often abbreviated as OPC, is an indispensable photosensitive element in printers. Organic photoconductor photosensitive drum is a photoelectric conversion device formed by coating the surface of conductive aluminum cylinder with organic photoconductor material. Its characteristics are that it is an insulator in the dark and can maintain a certain static charge. When a certain wavelength of light is irradiated, the light signal is converted into an electrical signal and becomes a conductor, releasing the charge through the aluminum base. When the photosensitive drum is charged and exposed to carbon powder, the carbon powder will be absorbed and attached to the surface of the photosensitive drum due to the effect of the electric field. The structure of the photosensitive drum is divided into coating and substrate. The substrate is composed of aluminum tube, and the coating can be roughly divided into: blocking protective layer, charge transfer layer, and charge generation layer. The blocking protective layer is one of the important coatings on OPC. It can be divided into a curing type blocking protective layer and a non-curing type blocking protective layer. It is a dielectric material that can enhance the ability of OPC to store charge. The curing type blocking protective layer is generally used in copiers and printers. During the production process of the curing barrier layer photosensitive drum, the barrier layer coating often has surface micro-bubbles and other defects, which affects the stability of product printing. Therefore, developing barrier layer materials with low bubble defect rate, smooth appearance and good substrate adhesion is an important way to improve the comprehensive performance of OPC. Summary of the invention

[0003] In order to achieve the above object, an object of the present invention is to provide a composition for a barrier protective layer of a photosensitive drum of an organic photoconductor.

[0004] A composition for a barrier protective layer of an organic photoconductor photosensitive drum, characterized in that the raw materials consist of the following components: 20-30 parts of zinc oxide, 0-20 parts of titanium dioxide, 0-10 parts of silicon dioxide, 1-3 parts of polyvinyl butyral, 3-6 parts of curable resin, 0.01-2 parts of curing agent, 50-65 parts of n-butanol, 3-10 parts of methanol, 1-3 parts of dichloromethane, and 1-3 parts of dichloroethane.

[0005] The zinc oxide has a particle size of 30-50 nm and a specific surface area of ​​15-100 m 2 / g, can thicken and prevent sedimentation, improve the stability of the composition system, is beneficial to the dip coating of the photosensitive drum substrate, can improve the hiding power and tinting power of the barrier protective layer, and improve the shielding performance.

[0006] The titanium dioxide and silicon dioxide are fillers, which are beneficial to the covering and coloring of the coating and can also improve the thixotropic rheology of the dip coating.

[0007] The polyvinyl butyral provides excellent powder dispersibility and film-forming properties, can effectively prevent the base layer of the substrate from cracking, and has high bonding strength.

[0008] The curable resin is an epoxy resin, which can make the barrier protective layer have better substrate bonding strength.

[0009] The curing agent is an organic amine curing agent.

[0010] The n-butanol is beneficial to film formation and ensures the dissolution requirement of polyvinyl butyral.

[0011] The methanol is a low boiling point solvent and can accelerate the drying speed of the coating.

[0012] The dichloromethane and dichloroethane are more likely to dissolve the curable resin.

[0013] The sum of the methanol, dichloromethane and dichloroethane does not exceed 15% of the total proportion of the solvent.

[0014] A method for preparing a composition for a barrier protective layer of an organic photoconductor photosensitive drum, characterized in that the composition is prepared according to the following steps:

[0015] (1) Clean and dry the stirring kettle, add 50-65 parts of n-butanol, 1-3 parts of polyvinyl butyral, and 3-10 parts of methanol into the stirring kettle, stir and dissolve for 24 hours;

[0016] (2) Add 1-3 parts of dichloromethane, 1-3 parts of dichloroethane, and 3-6 parts of curable resin into a stirring kettle and stir evenly;

[0017] (3) adding 20-30 parts of zinc oxide, 0-20 parts of titanium dioxide, and 0-10 parts of silicon dioxide into a stirred tank, stirring and dispersing the mixture evenly, and then transferring the mixture in the stirred tank into a grinder for grinding;

[0018] (4) Add the ground composition into a stirring kettle, add 0.01-2 parts of a curing agent, stir evenly, filter, and the resulting material is the composition for the barrier protective layer of the organic photoconductor photosensitive drum of the present application.

[0019] Compared with the prior art, the beneficial effects of the invention are: the composition for the organic photoconductor photosensitive drum blocking protective layer can be well dip-coated on the substrate, has a smooth appearance, and when forming a film, due to the appropriate high and low boiling point solvent ratio, the coating can not only quickly dry and evaporate the solvent, but also better balance the problem of coating bubbling caused by solvent volatilization during the drying process, and has good adhesion to the photosensitive drum substrate, which can effectively play a shielding and protective role. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical solutions and beneficial effects of the present invention more clearly understood, the present application is further described in detail below in conjunction with embodiments.

[0021] Example 1

[0022] The preparation method of the composition for the barrier protective layer of the organic photoconductor photosensitive drum of this example is carried out according to the following steps:

[0023] (1) Clean and dry the stirred tank, add 50 parts of n-butanol, 1 part of polyvinyl butyral, and 3 parts of methanol into the stirred tank, stir and dissolve for 24 hours;

[0024] (2) Add 1 part of dichloromethane, 1 part of dichloroethane and 3 parts of epoxy resin into a stirring kettle and stir evenly;

[0025] (3) adding 20 parts of zinc oxide, 2 parts of titanium dioxide, and 1 part of silicon dioxide into a stirred tank, stirring and dispersing the mixture uniformly, and then transferring the mixture in the stirred tank into a grinder for grinding;

[0026] (4) Add the ground composition into a stirring kettle, add 0.02 parts of an organic amine curing agent, stir evenly, filter, and the resulting material is the composition for the barrier protective layer of the organic photoconductor photosensitive drum of the present application.

[0027] (3) After the mixture is stirred and dispersed uniformly, the mixture in the stirring tank is added into a grinder for grinding;

[0028] After testing: the photosensitive drum substrate dipped in the composition for the organic photoconductor photosensitive drum barrier protective layer in this example has a smooth appearance without bubbles after drying, the film thickness test is 12.8um, the 100-grid test is level 1, and there is no visible damage to the coating after wiping with solvent.

[0029] Example 2

[0030] The preparation method of the composition for the barrier protective layer of the organic photoconductor photosensitive drum of this example is carried out according to the following steps:

[0031] (1) Clean and dry the stirred tank, add 61 parts of n-butanol, 2 parts of polyvinyl butyral, and 6 parts of methanol into the stirred tank, stir and dissolve for 24 hours;

[0032] (2) Add 1 part of dichloromethane, 2 parts of dichloroethane and 5 parts of epoxy resin into a stirring kettle and stir evenly;

[0033] (3) adding 25 parts of zinc oxide, 10 parts of titanium dioxide, and 6 parts of silicon dioxide into a stirred tank, stirring and dispersing the mixture uniformly, and then transferring the mixture in the stirred tank into a grinder for grinding;

[0034] (4) Add the ground composition into a stirring kettle, add 0.9 parts of an organic amine curing agent, stir evenly, filter, and the resulting material is the composition for the barrier protective layer of the organic photoconductor photosensitive drum of the present application.

[0035] After testing: the photosensitive drum substrate dipped in the composition for the organic photoconductor photosensitive drum barrier protective layer in this example has a smooth appearance without bubbles after drying, the film thickness test is 11.3um, the 100-grid test is level 0, and there is no obvious damage to the coating surface visible to the naked eye after wiping with solvent.

[0036] Example 3

[0037] The preparation method of the composition for the barrier protective layer of the organic photoconductor photosensitive drum of this example is carried out according to the following steps:

[0038] (1) Clean and dry the stirred tank, add 65 parts of n-butanol, 3 parts of polyvinyl butyral, and 7 parts of methanol into the stirred tank, stir and dissolve for 24 hours;

[0039] (2) Add 3 parts of dichloromethane, 1 part of dichloroethane and 6 parts of epoxy resin into a stirring kettle and stir evenly;

[0040] (3) adding 30 parts of zinc oxide, 20 parts of titanium dioxide, and 10 parts of silicon dioxide into a stirred tank, stirring and dispersing the mixture uniformly, and then transferring the mixture in the stirred tank into a grinder for grinding;

[0041] (4) Add the ground composition into a stirring kettle, add 1.8 parts of an organic amine curing agent, stir evenly, filter, and the resulting material is the composition for the barrier protective layer of the organic photoconductor photosensitive drum of the present application.

[0042] After testing: the photosensitive drum substrate dipped in the composition for the organic photoconductor photosensitive drum blocking protective layer in this example has a smooth appearance after drying with a few pinhole bubbles, the film thickness test is 11.5um, the 100-grid test is level 0, and there is no obvious damage to the coating visible to the naked eye after wiping with solvent.

[0043] The specific implementation modes of the present invention described above should be understood as explaining the technical solutions of the present invention, and do not constitute limitations on the protection scope of the present invention.

Claims

1. A composition for a barrier protective layer of an organic photoconductor photosensitive drum, characterized in that The raw materials are composed of the following components: 20-30 parts of zinc oxide, 0-20 parts of titanium dioxide, 0-10 parts of silicon dioxide, 1-3 parts of polyvinyl butyral, 3-6 parts of curable resin, 0.01-2 parts of curing agent, 50-65 parts of n-butanol, 3-10 parts of methanol, 1-3 parts of dichloromethane and 1-3 parts of ethylene dichloride.

2. The composition for a barrier protective layer of an organic photoconductor photosensitive drum according to claim 1, characterized in that The zinc oxide has a particle size of 30-50 nm and a specific surface area of ​​15-100 m 2 / g.

3. The composition for a barrier protective layer of an organic photoconductor photosensitive drum according to claim 1, characterized in that The curable resin is epoxy resin.

4. The composition for a barrier protective layer of an organic photoconductor photosensitive drum according to claim 1, characterized in that The curing agent is an organic amine curing agent.

5. The composition for a barrier protective layer of an organic photoconductor photosensitive drum according to claim 1, characterized in that The sum of the methanol, dichloromethane and dichloroethane does not exceed 15% of the total proportion of the solvent.

6. The composition for a barrier protective layer of an organic photoconductor photosensitive drum according to claim 1, characterized in that The method for preparing the composition for the barrier protective layer of the organic photoconductor photosensitive drum is prepared according to the following steps: (1) Clean and dry the stirring kettle, add 50-65 parts of n-butanol, 1-3 parts of polyvinyl butyral, and 3-10 parts of methanol into the stirring kettle, stir and dissolve for 24 hours; (2) Add 1-3 parts of dichloromethane, 1-3 parts of dichloroethane, and 3-6 parts of curable resin into a stirring kettle and stir evenly; (3) adding 20-30 parts of zinc oxide, 0-20 parts of titanium dioxide, and 0-10 parts of silicon dioxide into a stirred tank, stirring and dispersing the mixture evenly, and then transferring the mixture in the stirred tank into a grinder for grinding; (4) Add the ground composition into a stirring kettle, add 0.01-2 parts of a curing agent, stir evenly, filter, and the resulting material is the composition for the barrier protective layer of the organic photoconductor photosensitive drum of the present application.