Screen glass photoetching machine and screen glass exposure method

Abstract

The invention discloses a screen glass photoetching machine and a screen glass exposure method, and relates to the field of screen production equipment. The screen glass photoetching machine table comprises a rack as well as a first long-edge light source, a second long-edge light source, a first short-edge light source and a second short-edge light source which are mounted on the rack, and a first exposure station and a second exposure station which are arranged in the left-right direction are arranged below the rack; the first long-side light source and the second long-side light source are used for providing inclined light sources which are crossed downwards front and back for the first exposure station; the first short-edge light source provides a vertical light source for the first exposure station in a vertical state, and the second short-edge light source provides a vertical light source for the second exposure station in a vertical state; and the first short-edge light source and the second short-edge light source provide a left-right crossed downward inclined light source for the second exposure station in an inclined state. The screen glass photoetching machine provided by the invention can meet the exposure requirements of screen glass with different structures, and the forming quality of an ink frame is improved, so that the quality of a mobile phone screen is improved.

Description

Technical Field

[0001] The present invention relates to the field of screen production equipment, and in particular to a screen glass photolithography machine and a screen glass exposure method. Background Art

[0002] The surface of the mobile phone screen is a glass layer, and the inner surface of the glass layer needs to be processed to form an ink frame to block the light leakage at the edge of the screen. Currently, the market mainly uses the photolithography development method to prepare the ink frame on the inner surface of the glass layer. First, an ink layer is coated on the inner surface of the glass layer, and then a negative photoresist is coated on the surface of the ink layer. After that, a specific photomask is used for vertical exposure. After the exposure is completed, the excess negative photoresist and the excess ink layer in the middle area are etched away, and finally the remaining negative photoresist on the edge is peeled off to obtain an ink frame covering the edge area of ​​the inner surface of the glass layer.

[0003] There are three main types of glass on the market: flat glass, long curved edge glass and fully curved edge glass. The two long sides and two short sides of flat glass are basically straight or slightly curved; the two long sides of long curved edge glass are curved with large arcs, and the two short sides are basically straight; the two long sides and two short sides of fully curved edge glass are both curved with large arcs.

[0004] When performing vertical exposure to cure negative photoresist, the exposure effect of flat glass is relatively good. However, due to the large arc of the long curved edge glass and the full curved edge glass, the vertical light cannot be directly shot into the inner side of the curved edge, and the exposure effect is poor. The photoresist covering the inner side of the curved edge is difficult to be completely cured, resulting in poor quality of ink frame molding, which seriously affects the quality of the mobile phone screen. Summary of the invention

[0005] The purpose of the present invention is to provide a screen glass lithography machine that can meet the exposure requirements of screen glasses with different structures, improve the molding quality of ink frames, and thus improve the quality of mobile phone screens.

[0006] Another object of the present invention is to provide a screen glass exposure method, which can improve the quality of ink frame molding, thereby improving the quality of mobile phone screens.

[0007] The embodiment of the present invention provides a technical solution:

[0008] A screen glass lithography machine, comprising:

[0009] A frame, wherein a first exposure station and a second exposure station are arranged below the frame, and the first exposure station and the second exposure station are arranged at intervals along the left-right direction;

[0010] A first long side light source and a second long side light source, wherein the first long side light source and the second long side light source are fixed on the frame and are located above the first exposure station, and the first long side light source and the second long side light source are tilted frontward and backward toward the first exposure station, and are used to provide the first exposure station with tilted light sources that cross frontward and back downward;

[0011] A first short side light source and a second short side light source, wherein the first short side light source and the second short side light source are both movably arranged on the frame, and the first short side light source and the second short side light source are used to rotate to a vertical state or a tilted state;

[0012] In the vertical state, the first short side light source is vertically downward facing the first exposure station to provide a vertical light source to the first exposure station; the second short side light source is vertically downward facing the second exposure station to provide a vertical light source to the second exposure station;

[0013] In the inclined state, the first short side light source and the second short side light source are inclined left and right toward the second exposure station, so as to provide the second exposure station with inclined light sources that cross left and right and go downward.

[0014] In an optional embodiment, the first short side light source is rotatably disposed on the frame and is located vertically above the short side light source, and the first short side light source is used to rotate in a vertical plane relative to the frame.

[0015] In an optional embodiment, a first driving mechanism is disposed on the frame, and the first driving mechanism is connected to the first short side light source and is used to drive the first short side light source to rotate in a vertical plane.

[0016] In an optional embodiment, a rodless cylinder is disposed on the frame, and the second short side light source is rotatably disposed on the rodless cylinder to move left and right relative to the frame under the drive of the rodless cylinder.

[0017] In an optional embodiment, a second driving mechanism is slidably provided on the frame, and the second driving mechanism is connected to the second short side light source and is used for driving the second short side light source to rotate in a vertical plane.

[0018] In an optional embodiment, the screen glass lithography machine further includes a first stage, which is disposed at the first exposure station and is used to place the screen glass;

[0019] A first photolithography plate is arranged above the first carrier, the first long side light source is used for obliquely irradiating the rear area of ​​the first photolithography plate, the second long side light source is used for obliquely irradiating the front area of ​​the first photolithography plate, and the first short side light source is used for vertically irradiating the surface of the first photolithography plate in the vertical state.

[0020] In an optional embodiment, the screen glass lithography machine further includes a second stage, which is disposed at the second exposure station and is used to place the screen glass;

[0021] A second photolithography plate is arranged above the second carrier, and the first short-side light source is used for obliquely irradiating the right area of ​​the second photolithography plate in the inclined state, and the second short-side light source is used for obliquely irradiating the left area of ​​the second photolithography plate in the inclined state, and is also used for vertically irradiating the surface of the second photolithography plate in the vertical state.

[0022] An embodiment of the present invention further provides a screen glass exposure method, which is applied to the aforementioned screen glass lithography machine, and the screen glass exposure method comprises:

[0023] Arranging an integral photomask at one of the first exposure station and the second exposure station, wherein the integral photomask has two long-side light-transmitting areas distributed front and back, and two short-side light-transmitting areas distributed left and right;

[0024] Placing a flat glass under the integral photolithography plate and aligning it with the integral photolithography plate, wherein the flat glass has two long straight edges distributed front to back and two short straight edges distributed left to right;

[0025] The first short side light source and the second short side light source are controlled to maintain the vertical state, and one of the two corresponding to the overall photolithography plate is controlled to start, so as to expose the two long straight sides and the two short straight sides of the flat glass through the two long side light-transmitting areas and the two short side light-transmitting areas.

[0026] An embodiment of the present invention further provides a screen glass exposure method, which is applied to the aforementioned screen glass lithography machine, and the screen glass exposure method comprises:

[0027] A long-side photoresist plate is arranged at the first exposure station, and a short-side photoresist plate is arranged at the second exposure station, wherein the long-side photoresist plate has two long-side light-transmitting areas distributed front to back, and the short-side photoresist plate has two short-side light-transmitting areas distributed left to right;

[0028] Placing a long curved edge glass under the long edge photolithography plate and aligning it with the long edge photolithography plate, wherein the long curved edge glass has two long curved edges distributed front and back and two short straight edges distributed left and right;

[0029] Controlling the first long side light source to obliquely illuminate the rear area of ​​the long side photolithography plate, and controlling the second long side light source to obliquely illuminate the front area of ​​the long side photolithography plate, so as to obliquely expose the two long curved sides of the long curved side glass;

[0030] Placing the long curved-edge glass that has completed the tilted exposure under the long-edge photolithography plate under the short-edge photolithography plate;

[0031] The second short-side light source is controlled to maintain the vertical state and be started, so as to vertically expose the two short straight sides of the long curved-side glass through the two short-side light-transmitting areas of the short-side photolithography plate.

[0032] An embodiment of the present invention further provides a screen glass exposure method, which is applied to the aforementioned screen glass lithography machine, and the screen glass exposure method comprises:

[0033] A long-side photoresist plate is arranged at the first exposure station, and a short-side photoresist plate is arranged at the second exposure station, wherein the long-side photoresist plate has two long-side light-transmitting areas distributed front to back, and the short-side photoresist plate has two short-side light-transmitting areas distributed left to right;

[0034] Placing a full-curved-edge glass under the long-edge photolithography plate and aligning it with the long-edge photolithography plate, wherein the full-curved-edge glass has two long curved edges distributed front and back, and two short curved edges distributed left and right;

[0035] Controlling the first long side light source to obliquely illuminate the rear area of ​​the long side photolithography plate, and controlling the second long side light source to obliquely illuminate the front area of ​​the long side photolithography plate, so as to obliquely expose the two long curved sides of the long curved side glass;

[0036] Placing the full-curved-edge glass that has completed the tilted exposure under the long-edge photolithography plate under the short-edge photolithography plate;

[0037] Controlling the first short side light source and the second short side light source to maintain the inclined state;

[0038] The first short side light source is controlled to obliquely illuminate the right area of ​​the short side photolithography plate, and the second short side light source is controlled to obliquely illuminate the left area of ​​the short side photolithography plate, so as to obliquely expose the two short curved sides of the full-curved glass.

[0039] Compared with the prior art, the screen glass lithography machine provided by the present invention, when exposing the flat glass, places the flat glass in the first exposure station or the second exposure station, and uses the corresponding first short side light source or the second short side light source to vertically illuminate; when exposing the long curved side glass, the first long side light source and the second long side light source are used at the first exposure station to obliquely illuminate the two long curved sides of the long curved side glass, and the inner side of the two long curved sides can be illuminated at a better angle to obtain better exposure, and after completion, the second light end light source is used at the second exposure station to vertically illuminate the two short straight sides of the long curved side glass; when exposing the full curved side glass, the first long side light source and the second long side light source are used at the first exposure station to obliquely illuminate the two long curved sides of the long curved side glass, and after completion, the first short side light source and the second short side light source are used at the second exposure station to obliquely illuminate the two short curved sides of the long curved side glass, so that both the two long curved sides and the two short curved sides can obtain better exposure. Therefore, the beneficial effects of the screen glass lithography machine provided by the present invention include: being able to meet the exposure requirements of screen glasses of different structures, improving the molding quality of the ink frame, and thus improving the quality of the mobile phone screen. BRIEF DESCRIPTION OF THE DRAWINGS

[0040] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings required for use in the embodiments are briefly introduced below. It should be understood that the following drawings only illustrate certain embodiments of the present invention and should not be regarded as limiting the scope. For those of ordinary skill in the art, other related drawings can also be obtained based on these drawings without creative work.

[0041] Figure 1 A schematic diagram of the structure of a screen glass photolithography machine in one state provided by the first embodiment of the present invention;

[0042] Figure 2 A schematic diagram of the structure of the screen glass photolithography machine provided by the first embodiment of the present invention in another state;

[0043] Figure 3 for Figure 2 A schematic diagram of the structure enlargement of the A region in the middle;

[0044] Figure 4 for Figure 2 A schematic diagram of the structure of the middle B region;

[0045] Figure 5 is a schematic diagram of the structure when the flat glass is exposed by the first short side light source;

[0046] Figure 6 It is a structural schematic diagram of a long curved edge glass when two long curved edges are exposed by a first long edge light source and a second long edge light source;

[0047] Figure 7 It is a structural schematic diagram of a full-curved-edge glass when two short curved edges are exposed by a first short-edge light source and a second short-edge light source;

[0048] Figure 8 A flowchart of a screen glass exposure method provided by a second embodiment of the present invention;

[0049] Fig. 9 A flowchart of a screen glass exposure method provided by a third embodiment of the present invention;

[0050] Fig.10 A flowchart of a screen glass exposure method provided for the fourth embodiment of the present invention.

[0051] Icons: 100-screen glass photolithography machine; 110-frame; 111-first exposure station; 112-second exposure station; 120-first long-side light source; 130-second long-side light source; 140-first short-side light source; 150-second short-side light source; 160-first driving mechanism; 170-rodless cylinder; 180-second driving mechanism; 191-first carrier; 192-first photolithography plate; 193-second carrier; 194-second photolithography plate; 200-flat glass; 300-long curved-edge glass; 400-full curved-edge glass. DETAILED DESCRIPTION

[0052] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are part of the embodiments of the present invention, not all of the embodiments. Generally, the components of the embodiments of the present invention described and shown in the drawings here can be arranged and designed in various different configurations.

[0053] Therefore, the following detailed description of the embodiments of the present invention provided in the accompanying drawings is not intended to limit the scope of the invention claimed for protection, but merely represents selected embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0054] It should be noted that similar reference numerals and letters denote similar items in the following drawings, and therefore, once an item is defined in one drawing, further definition and explanation thereof is not required in subsequent drawings.

[0055] In the description of the present invention, it should be understood that the terms "upper", "lower", "inside", "outside", "left", "right", etc. indicate directions or positional relationships based on the directions or positional relationships shown in the accompanying drawings, or are directions or positional relationships in which the product of the invention is usually placed when in use, or are directions or positional relationships commonly understood by those skilled in the art. These directions or positional relationships are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.

[0056] Furthermore, the terms “first”, “second”, etc. are merely used for distinguishing descriptions and should not be understood as indicating or implying relative importance.

[0057] In the description of the present invention, it is also necessary to explain that, unless otherwise clearly specified and limited, the terms such as "setting" and "connection" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal communication of two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0058] The specific implementation modes of the present invention are described in detail below in conjunction with the accompanying drawings.

[0059] First embodiment

[0060] Please refer to Figure 1 and Figure 2 , Figure 1 FIG. 1 is a schematic structural diagram of the screen glass lithography machine 100 provided in this embodiment in one state. Figure 2 FIG. 1 is a schematic structural diagram of the screen glass lithography machine 100 in another state.

[0061] The screen glass lithography machine 100 provided in this embodiment is used to perform exposure processing on different screen glasses to solidify the edge of the photoresist layer on the screen glass, so as to facilitate the subsequent forming of the ink frame after development, etching and glass processing.

[0062] The screen glass lithography machine 100 includes a frame 110, a first long side light source 120, a second long side light source 130, a first short side light source 140 and a second short side light source 150. A first exposure station 111 and a second exposure station 112 are arranged below the frame 110. The first exposure station 111 and the second exposure station 112 are arranged at intervals along the left-right direction.

[0063] The first long side light source 120 and the second long side light source 130 are fixed on the frame 110 and are located above the first exposure station 111. The first long side light source 120 and the second long side light source 130 are tilted forward and backward toward the first exposure station 111 to provide the first exposure station 111 with tilted light sources that cross forward and backward and are downward.

[0064] The first short side light source 140 and the second short side light source 150 are both movably disposed on the frame 110 , and are used to rotate to a vertical state or a tilted state.

[0065] In the vertical state, the first short side light source 140 faces the first exposure station 111 vertically downward to provide a vertical light source to the first exposure station 111 ; the second short side light source 150 faces the second exposure station 112 vertically downward to provide a vertical light source to the second exposure station 112 .

[0066] In the inclined state, the first short side light source 140 and the second short side light source 150 are inclined leftward and rightward toward the second exposure station 112 , so as to provide the second exposure station 112 with inclined light sources that cross leftward and rightward and go downward.

[0067] Figure 1 The direction indicated by the X arrow is from left to right, the direction indicated by the Y arrow is from front to back, and the direction indicated by the Z arrow is vertically downward.

[0068] It can be understood that the first long side light source 120 and the second long side light source 130 are fixedly mounted on the frame 110 in an inclined state, the first long side light source 120 illuminates the first exposure station 111 from the upper front to the lower rear, and the second long side light source 130 illuminates the first exposure station 111 from the upper rear to the lower front, and the light rays of the two extend and intersect in a vertical plane perpendicular to the direction indicated by the X arrow.

[0069] The first short side light source 140 is rotatably disposed on the frame 110 and is located vertically above the short side light source. The first short side light source 140 is used to rotate relative to the frame 110 in a vertical plane perpendicular to the direction indicated by the Y arrow.

[0070] Figure 1 In the state shown, the first short side light source 140 and the second short side light source 150 are in a vertical state. At this time, the first short side light source 140 is vertically downward and faces the first exposure station 111; the second short side light source 150 is vertically downward and faces the second exposure station 112.

[0071] Figure 2In the state shown, the first short side light source 140 and the second short side light source 150 are in a tilted state. At this time, the first short side light source 140 and the second short side light source 150 are respectively located on the left and right sides of the second exposure station 112. The first short side light source 140 tilts from the upper left to the lower right to illuminate the second exposure station 112, and the second short side light source 150 tilts from the upper right to the lower left to illuminate the second exposure station 112. The light rays of the two extend and cross in a vertical plane perpendicular to the direction indicated by the Y arrow.

[0072] Please refer to Figure 3 and Figure 4 , Figure 3 Shown Figure 2 A schematic diagram of the structure of the A area in the middle. Figure 4 Shown Figure 2 Schematic diagram of the enlarged structure of area B in the middle.

[0073] In this embodiment, a first driving mechanism 160 is disposed on the frame 110 . The first driving mechanism 160 is connected to the first short side light source 140 and is used to drive the first short side light source 140 to rotate in a vertical plane.

[0074] Specifically, the first short side light source 140 is installed on the frame 110 through a rotating shaft extending in the front-to-back direction. The first driving mechanism 160 is an electric push rod, and its output end is connected to the first short side light source 140 through a rotating floating joint, driving the first short side light source 140 to rotate clockwise or counterclockwise in a plane perpendicular to the direction indicated by the Y arrow.

[0075] The frame 110 is provided with a rodless cylinder 170, and the second short side light source 150 is rotatably provided on the rodless cylinder 170, and is used to move left and right relative to the frame 110 under the drive of the rodless cylinder 170. The frame 110 is slidably provided with a second driving mechanism 180, and the second driving mechanism 180 is connected to the second short side light source 150, and is used to drive the second short side light source 150 to rotate in a vertical plane.

[0076] The rodless cylinder 170 drives the second short side light source 150 to slide in the left-right direction to adjust the horizontal distance between the second short side light source 150 and the first short side light source 140. The second short side light source 150 also rotates with the rodless cylinder 170 through a rotating shaft extending in the front-back direction. The second driving mechanism 180 is also an electric push rod, which is slidably arranged on the frame 110, and the output end is connected to the first short side light source 140 through a rotating floating joint. The second driving mechanism 180 can move in the left-right direction driven by the second short side light source 150, and can also drive the second short side light source 150 to rotate clockwise or counterclockwise in a plane perpendicular to the direction indicated by the Y arrow.

[0077] In this embodiment, the screen glass lithography machine 100 further includes a first stage 191, which is disposed at the first exposure station 111 and is used to place the screen glass. A first photolithography plate 192 is disposed above the first stage 191, a first long side light source 120 is used to obliquely illuminate the rear area of ​​the first photolithography plate 192, a second long side light source 130 is used to obliquely illuminate the front area of ​​the first photolithography plate 192, and a first short side light source 140 is used to vertically illuminate the surface of the first photolithography plate 192 in a vertical state.

[0078] The screen glass lithography machine 100 further includes a second stage 193, which is disposed at the second exposure station 112 and is used to place the screen glass. A second photoresist plate 194 is disposed above the second stage 193, and the first short side light source 140 is used to obliquely illuminate the right area of ​​the second photoresist plate 194 in an inclined state, and the second short side light source 150 is used to obliquely illuminate the left area of ​​the second photoresist plate 194 in an inclined state, and is also used to vertically illuminate the surface of the second photoresist plate 194 in a vertical state.

[0079] When the screen glass is placed horizontally, its projection on the horizontal plane is roughly rectangular, with two opposite long sides and two opposite short sides. The long side and the short side of the flat glass 200 are both straight without any bends, so its long side is defined as a long straight side, and the short side is a short straight side; the long side of the long curved edge glass 300 has a certain curvature, and the short side is straight, so its long side is defined as a long curved side, and the short side is a short straight side; the long side and the short side of the full curved edge glass 400 have a certain curvature, so its long side is defined as a long curved side, and the short side is a short curved side.

[0080] It is understandable that the structures of the first photolithography plate 192 and the second photolithography plate 194 can be adjusted and replaced according to actual conditions. Figure 5 , Figure 5 The diagram shows the structure of the flat glass 200 when it is exposed by the first short side light source 140. If the flat glass 200 is exposed on the first stage 191, the first photomask 192 may have two long side light transmission areas distributed front and back, and two short side light transmission areas distributed left and right. The two long side light transmission areas correspond to the two long straight sides of the flat glass 200, and the two short side light transmission areas correspond to the two short straight sides of the flat glass 200. The first short side light source 140 irradiates the first photomask 192 vertically to achieve one-time exposure of the flat glass 200.

[0081] When the long curved glass 300 needs to be exposed, the first photoresist plate 192 has two long side light-transmitting areas distributed front and back, and the second photoresist plate 194 has two short side light-transmitting areas distributed left and right. Figure 6 , Figure 6The structure diagram of the long curved edge glass 300 when exposing the long curved edge is shown. First, the long curved edge glass 300 is placed in the first exposure station 111, and its state is adjusted to be aligned with the first photolithography plate 192, so that its long curved edge extends in the left-right direction, and its short straight edge extends in the front-back direction, and its inner side faces upward, that is, the side coated with the photoresist layer faces upward.

[0082] Then, the first long side light source 120 and the second long side light source 130 are used to complete the oblique illumination of the concave arc-shaped inner area of ​​the two long curved sides of the long curved side glass 300 distributed in the front-to-back direction, and the exposure of the two long curved sides is completed. Specifically, the first long side light source 120 illuminates the rear long curved side of the long curved side glass 300 through the long side light-transmitting area on the rear side of the first photolithography plate 192, and the second long side light source 130 illuminates the front long curved side of the long curved side glass 300 through the long side light-transmitting area on the front side of the first photolithography plate 192.

[0083] After the exposure of the two long curved edges is completed, the long curved edge glass 300 is transferred to the second exposure station 112 and adjusted to align with the second photolithography plate 194. The second short edge light source 150 is kept in a vertical state and vertically illuminates the second photolithography plate 194 to achieve exposure of the two short straight edges at the left and right ends of the long curved edge glass 300.

[0084] When the full curved edge glass 400 needs to be exposed, the first photolithography plate 192 has two long side light-transmitting areas distributed front and back, and the second photolithography plate 194 has two short side light-transmitting areas distributed left and right. First, the full curved edge glass 400 is placed in the first exposure station 111, and its state is adjusted to be aligned with the first photolithography plate 192. Then, the first long side light source 120 and the second long side light source 130 are used to complete the oblique irradiation of the concave arc-shaped inner area of ​​the two long curved edges of the full curved edge glass 400 distributed in the front and back direction, and the exposure of the two long curved edges is completed.

[0085] After the exposure of the two long curved edges is completed, the full curved edge glass 400 is transferred to the second exposure station 112 and adjusted to align with the second photoresist plate 194. Figure 7 , Figure 7 The figure shows a schematic diagram of the structure when the short curved edge of the full curved edge glass 400 is exposed. The first short edge light source 140 and the second short edge light source 150 are both kept in an inclined state. The first short edge light source 140 and the second short edge light source 150 are used to complete the inclined illumination of the concave arc-shaped inner area of ​​the two short curved edges of the full curved edge glass 400 distributed in the left and right directions, and the exposure of the two short curved edges is completed. Specifically, the first short edge light source 140 illuminates the right short curved edge on the full curved edge glass 400 through the short edge light transmission area on the right side of the second photolithography plate 194, and the second short edge light source 150 illuminates the left short curved edge on the full curved edge glass 400 through the short edge light transmission area on the left side of the second photolithography plate 194.

[0086] In summary, the screen glass lithography machine 100 provided in this embodiment can expose flat glass 200, long curved edge glass 300 and full curved edge glass 400, which can meet the exposure requirements of screen glasses with different structures, improve the molding quality of the ink frame, and thus improve the quality of the mobile phone screen.

[0087] Second embodiment

[0088] See also Figure 8 , Figure 8 The figure shows a flowchart of the screen glass exposure method provided in this embodiment, and the screen glass exposure method is applied to the screen glass lithography machine 100 provided in the first embodiment. Specifically, the screen glass exposure method includes:

[0089] In step S101 , a whole photomask is arranged in one of the first exposure station 111 and the second exposure station 112 .

[0090] The overall photolithography plate has two long-side light-transmitting areas distributed front and back, and two short-side light-transmitting areas distributed left and right.

[0091] Step S102 , placing the flat glass 200 under the overall photomask and aligning it with the overall photomask.

[0092] The flat glass 200 has two long straight sides distributed front to back and two short straight sides distributed left to right.

[0093] Step S103, control the first short side light source 140 and the second short side light source 150 to maintain a vertical state, and control the one of the two corresponding to the overall photolithography plate to start, so as to expose the two long straight sides and the two short straight sides of the flat glass 200 through the two long side light-transmitting areas and the two short side light-transmitting areas.

[0094] When the flat glass 200 is exposed on the first stage 191, the first photomask 192 is an integral photomask, which has two long-side light-transmitting areas distributed front and back, and two short-side light-transmitting areas distributed left and right, the two long-side light-transmitting areas respectively corresponding to the two long straight sides of the flat glass 200, and the two short-side light-transmitting areas respectively corresponding to the two short straight sides of the flat glass 200. The first short-side light source 140 vertically illuminates the first photomask 192 to achieve one-time exposure of the flat glass 200.

[0095] Third embodiment

[0096] See also Fig. 9 , Fig. 9 The figure shows a flowchart of the screen glass exposure method provided in this embodiment, and the screen glass exposure method is applied to the screen glass lithography machine 100 provided in the first embodiment. Specifically, the screen glass exposure method includes:

[0097] Step S201 , arranging a long-side photoresist board at the first exposure station 111 , and arranging a short-side photoresist board at the second exposure station 112 .

[0098] The long-side photolithography plate has two long-side light-transmitting areas distributed front to back, and the short-side photolithography plate has two short-side light-transmitting areas distributed left to right.

[0099] Step S202 , placing the long curved edge glass 300 under the long edge photoresist plate and aligning it with the long edge photoresist plate.

[0100] The long curved edge glass 300 has two long curved edges distributed front and back, and two short straight edges distributed left and right.

[0101] Step S203 , controlling the first long side light source 120 to obliquely illuminate the rear area of ​​the long side photomask, and the second long side light source 130 to obliquely illuminate the front area of ​​the long side photomask, so as to obliquely expose the two long curved sides of the long curved side glass 300 .

[0102] Step S204, placing the long curved-edge glass 300 that has completed the tilted exposure under the long-edge photoresist plate under the short-edge photoresist plate.

[0103] Step S205 , controlling the second short side light source 150 to maintain a vertical state and start up, so as to vertically expose the two short straight sides of the long curved side glass 300 through the two short side light-transmitting areas of the short side photolithography plate.

[0104] The first photolithography plate 192 is a long-side photolithography plate, having two long-side light-transmitting areas distributed front and back; the second photolithography plate 194 is a short-side photolithography plate, having two short-side light-transmitting areas distributed left and right. First, the long curved-edge glass 300 is placed in the first exposure station 111, and the first long-edge light source 120 is used to illuminate the rear long curved edge of the long curved-edge glass 300 through the long-edge light-transmitting area on the rear side of the long-edge photolithography plate, and the second long-edge light source 130 is used to illuminate the front long curved edge of the long curved-edge glass 300 through the long-edge light-transmitting area on the front side of the long-edge photolithography plate, thereby completing the exposure of the two long curved edges of the long-edge photolithography plate.

[0105] Afterwards, the long curved-edge glass 300 is transferred to under the short-edge photolithography plate of the second exposure station 112, and its state is adjusted to be aligned with the short-edge photolithography plate. The second short-edge light source 150 is kept in a vertical state and vertically illuminates the short-edge photolithography plate to achieve exposure of the two short straight edges at the left and right ends of the long curved-edge glass 300.

[0106] Fourth embodiment

[0107] See also Fig.10 , Fig.10The figure shows a flowchart of the screen glass exposure method provided in this embodiment, and the screen glass exposure method is applied to the screen glass lithography machine 100 provided in the first embodiment. Specifically, the screen glass exposure method includes:

[0108] Step S301 , arranging a long-side photoresist board at the first exposure station 111 , and arranging a short-side photoresist board at the second exposure station 112 .

[0109] The long-side photolithography plate has two long-side light-transmitting areas distributed front to back, and the short-side photolithography plate has two short-side light-transmitting areas distributed left to right.

[0110] Step S302 , placing the full-curved-edge glass 400 under the long-edge photoresist plate and aligning it with the long-edge photoresist plate.

[0111] The full-curved glass 400 has two long curved edges distributed front and back, and two short curved edges distributed left and right.

[0112] Step S303 , controlling the first long side light source 120 to obliquely illuminate the rear area of ​​the long side photomask, and the second long side light source 130 to obliquely illuminate the front area of ​​the long side photomask, so as to obliquely expose the two long curved sides of the long curved side glass 300 .

[0113] Step S304, placing the full-curved-edge glass 400 that has completed the tilted exposure under the long-edge photoresist plate under the short-edge photoresist plate.

[0114] Step S305 , controlling the first short side light source 140 and the second short side light source 150 to maintain an inclined state.

[0115] Step S306 , controlling the first short side light source 140 to obliquely illuminate the right area of ​​the short side photomask, and controlling the second short side light source 150 to obliquely illuminate the left area of ​​the short side photomask, so as to obliquely expose the two short curved sides of the full curved edge glass 400 .

[0116] When the full curved edge glass 400 needs to be exposed, the first photolithography plate 192 is a long edge photolithography plate, which has two long edge light-transmitting areas distributed front and back, and the second photolithography plate 194 is a short edge photolithography plate, which has two short edge light-transmitting areas distributed left and right. First, the full curved edge glass 400 is placed in the first exposure station 111, and its state is adjusted to be aligned with the long edge photolithography plate. Then, the first long edge light source 120 and the second long edge light source 130 are used to complete the oblique irradiation of the concave arc inner area of ​​the two long curved edges of the full curved edge glass 400 distributed in the front and back directions, and the exposure of the two long curved edges is completed.

[0117] After the exposure of the two long curved edges is completed, the full curved edge glass 400 is transferred to the second exposure station 112 and adjusted to align with the short edge photomask. The first short edge light source 140 and the second short edge light source 150 are both kept in an inclined state, the first short edge light source 140 illuminates the right short curved edge on the full curved edge glass 400 through the short edge light transmission area on the right side of the short edge photomask, and the second short edge light source 150 illuminates the left short curved edge on the full curved edge glass 400 through the short edge light transmission area on the left side of the short edge photomask, completing the exposure of the two short curved edges.

[0118] Benefiting from the beneficial effects of the screen glass lithography machine 100 provided in this embodiment, the screen glass exposure method provided in this application can improve the quality of ink frame molding, thereby improving the quality of mobile phone screens.

[0119] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A screen glass lithography machine, characterized in that: include: A frame (110), wherein a first exposure station (111) and a second exposure station (112) are arranged below the frame (110), and the first exposure station (111) and the second exposure station (112) are arranged at intervals in the left-right direction; a first long side light source (120) and a second long side light source (130), wherein the first long side light source (120) and the second long side light source (130) are fixed on the frame (110) and are located above the first exposure station (111), and the first long side light source (120) and the second long side light source (130) are tilted forward and backward toward the first exposure station (111), and are used to provide the first exposure station (111) with tilted light sources that cross forward and backward and face downward; a first short side light source (140) and a second short side light source (150), wherein the first short side light source (140) and the second short side light source (150) are both movably arranged on the frame (110), and the first short side light source (140) and the second short side light source (150) are used to rotate to a vertical state or an inclined state; In the vertical state, the first short side light source (140) is vertically downward facing the first exposure station (111) to provide a vertical light source to the first exposure station (111); the second short side light source (150) is vertically downward facing the second exposure station (112) to provide a vertical light source to the second exposure station (112); In the inclined state, the first short side light source (140) and the second short side light source (150) are inclined leftward and rightward toward the second exposure station (112), and are used to provide the second exposure station (112) with inclined light sources that cross leftward and rightward and point downward.

2. The screen glass lithography machine according to claim 1, characterized in that: The first short side light source (140) is rotatably arranged on the frame (110) and is located vertically above the short side light source; the first short side light source (140) is used to rotate in a vertical plane relative to the frame (110).

3. The screen glass lithography machine according to claim 2, characterized in that: The frame (110) is provided with a first driving mechanism (160), which is connected to the first short side light source (140) and is used to drive the first short side light source (140) to rotate in a vertical plane.

4. The screen glass lithography machine according to claim 1, characterized in that: A rodless cylinder (170) is arranged on the frame (110), and the second short side light source (150) is rotatably arranged on the rodless cylinder (170) and is used to move left and right relative to the frame (110) under the drive of the rodless cylinder (170).

5. The screen glass lithography machine according to claim 4, characterized in that: A second driving mechanism (180) is slidably arranged on the frame (110); the second driving mechanism (180) is connected to the second short side light source (150) and is used to drive the second short side light source (150) to rotate in a vertical plane.

6. The screen glass lithography machine according to claim 1, characterized in that: The screen glass photolithography machine (100) further comprises a first carrier (191), wherein the first carrier (191) is arranged at the first exposure station (111) and is used for placing the screen glass; A first photolithography plate (192) is arranged above the first carrier (191), the first long side light source (120) is used for obliquely irradiating the rear area of ​​the first photolithography plate (192), the second long side light source (130) is used for obliquely irradiating the front area of ​​the first photolithography plate (192), and the first short side light source (140) is used for vertically irradiating the surface of the first photolithography plate (192) in the vertical state.

7. The screen glass lithography machine according to claim 1, characterized in that: The screen glass photolithography machine (100) further comprises a second carrier (193), wherein the second carrier (193) is arranged at the second exposure station (112) and is used for placing the screen glass; A second photolithography plate (194) is arranged above the second carrier (193), and the first short-side light source (140) is used to obliquely illuminate the right area of ​​the second photolithography plate (194) in the inclined state, and the second short-side light source (150) is used to obliquely illuminate the left area of ​​the second photolithography plate (194) in the inclined state, and is also used to vertically illuminate the surface of the second photolithography plate (194) in the vertical state.

8. A screen glass exposure method, applied to the screen glass lithography machine (100) according to any one of claims 1 to 7, characterized in that: The screen glass exposure method comprises: Arranging an integral photomask at one of the first exposure station (111) and the second exposure station (112), wherein the integral photomask has two long-side light-transmitting areas distributed front to back and two short-side light-transmitting areas distributed left to right; Placing a flat glass (200) below the integral photolithography plate and aligning it with the integral photolithography plate, wherein the flat glass (200) has two long straight edges distributed front to back and two short straight edges distributed left to right; The first short side light source (140) and the second short side light source (150) are controlled to maintain the vertical state, and one of the two corresponding to the overall photolithography plate is controlled to start, so as to expose the two long straight sides and the two short straight sides of the flat glass (200) through the two long side light-transmitting areas and the two short side light-transmitting areas.

9. A screen glass exposure method, applied to the screen glass lithography machine (100) according to any one of claims 1 to 7, characterized in that: The screen glass exposure method comprises: A long-side photoresist plate is arranged at the first exposure station (111), and a short-side photoresist plate is arranged at the second exposure station (112), wherein the long-side photoresist plate has two long-side light-transmitting areas distributed front to back, and the short-side photoresist plate has two short-side light-transmitting areas distributed left to right; Placing a long curved edge glass (300) below the long edge photolithography plate and aligning it with the long edge photolithography plate, wherein the long curved edge glass (300) has two long curved edges distributed front and back, and two short straight edges distributed left and right; Controlling the first long side light source (120) to obliquely illuminate the rear side area of ​​the long side photolithography plate, and controlling the second long side light source (130) to obliquely illuminate the front side area of ​​the long side photolithography plate, so as to obliquely expose the two long curved sides of the long curved side glass (300); Placing the long curved-edge glass (300) that has completed the tilted exposure under the long-edge photolithography plate below the short-edge photolithography plate; The second short-side light source (150) is controlled to maintain the vertical state and be started, so as to vertically expose the two short straight sides of the long curved-edge glass (300) through the two short-side light-transmitting areas of the short-side photolithography plate.

10. A screen glass exposure method, applied to the screen glass photolithography machine (100) according to any one of claims 1 to 7, characterized in that: The screen glass exposure method comprises: A long-side photoresist plate is arranged at the first exposure station (111), and a short-side photoresist plate is arranged at the second exposure station (112), wherein the long-side photoresist plate has two long-side light-transmitting areas distributed front to back, and the short-side photoresist plate has two short-side light-transmitting areas distributed left to right; Placing a full-curved-edge glass (400) below the long-edge photolithography plate and aligning it with the long-edge photolithography plate, wherein the full-curved-edge glass (400) has two long curved edges distributed front and back, and two short curved edges distributed left and right; Controlling the first long edge light source (120) to obliquely illuminate the rear area of ​​the long edge photolithography plate, and controlling the second long edge light source (130) to obliquely illuminate the front area of ​​the long edge photolithography plate, so as to obliquely expose the two long curved edges of the full curved edge glass (400); Placing the full-curved-edge glass (400) that has completed tilted exposure under the long-edge photolithography plate below the short-edge photolithography plate; Controlling the first short side light source (140) and the second short side light source (150) to maintain the inclined state; The first short side light source (140) is controlled to obliquely illuminate the right side area of ​​the short side photolithography plate, and the second short side light source (150) is controlled to obliquely illuminate the left side area of ​​the short side photolithography plate, so as to obliquely expose the two short curved sides of the full curved edge glass (400).

Images