Power supply arrangement, plasma generating device and method for controlling multiple plasma processes

Abstract

The invention relates to a power supply arrangement (10) for a plurality of plasma generators (17a, 17b, 17n), each specially designed for exciting a gas into a gas plasma remote from the plasma treatment, comprising: f) a power supply input connection (2) for connecting a power supply (7), g) a data connection (13) for connecting to a control system (4), h), the invention relates to a power supply arrangement for converting power from a power supply input terminal (2) having an alternator stage (6) into alternating voltage power, i) ensuring that the alternating voltage power can be supplied as a first alternating voltage power to a first load (9a) via a data port (13) in the event of setting the power supply arrangement, the first AC voltage power is supplied from a first local remote load (9b) to a second load as a second AC voltage power, in particular cannot be supplied to both loads at the same time, and is controllable such that the first and second AC voltage powers set different characteristics for at least one or more of the following control values: output current; an output voltage; an output frequency; outputting power; the output curve of the current and / or the voltage, and wherein the power supply device (10) is arranged to output a drive signal for an impedance matching device (15A, 15B, 15N) assigned to any alternating voltage power.

Description

Technical Field

[0001] The invention relates to a power supply device for a plurality of plasma generators, a plasma generating device having such a power supply device, and a method for controlling a plurality of plasma processes using such a power supply device. Background Art

[0002] In particular, the plasma generating device can be designed to excite the gas into a gas plasma at a location remote from the plasma treatment. Such a plasma generator is also referred to as a "remote plasma source". Such a plasma generator is described, for example, in WO 2014 / 016335 A1 or US 2007 / 0103092 A1.

[0003] The power supply arrangement is usually provided as a unit with a plasma generator, i.e. a plasma chamber in which the gas plasma is generated. When processing and / or manufacturing materials in a process chamber, several such remote gas plasma generators are usually required. For example, these can be used to excite the gas, so that the excited gas is used during the processing. For example, they can also be used to excite the gas, so that the gas escapes from the process chamber.

[0004] The cost of multiple units consisting of power arrays and plasma generators is high, and as the number of such units increases, the risk of one of them failing also increases. Summary of the invention

[0005] The object of the present invention is to provide a power supply device, a plasma generating device and / or a method for controlling plasma processes in which these disadvantages are overcome.

[0006] This problem can be solved by the power supply device according to claim 1 , the plasma generating device according to claim 11 and / or the method according to claim 15 .

[0007] Therefore, in one aspect of solving the problem, several plasma generator power supply devices are disclosed, each generator is specially designed to excite gas into gas plasma at a location remote from the plasma process, having:

[0008] a) mains input connection for connection to the electricity supply service,

[0009] b) data connection for connection to the control system,

[0010] c) wherein the power supply means is designed to convert electrical power from a power input terminal having an alternator stage into an alternating current power,

[0011] d) In case of power supply arrangement, through the data port:

[0012] ensure that the AC voltage power can be supplied to the first load as the first AC voltage power and can also be supplied to the second load as the second AC voltage power from the first load at a local distance, in particular not to supply power to both loads at the same time, and

[0013] controllable so that the first and second AC voltage powers may have different characteristics for at least one or more of the following control values:

[0014] Output current

[0015] Output voltage

[0016] Output frequency

[0017] Output power

[0018] Output curves of current and / or voltage, and

[0019] e) When the power supply device is set to output the drive signal to the impedance matching device assigned to one of the AC voltages.

[0020] "Tax Value Characteristics" means specific predefined values ​​of one or more Values.

[0021] For example, for the first AC voltage power, the output power may be 3kW, the output frequency may be 30kHz, and the output curve of the current may be a rectangular pulse with a pulse-pause ratio of 70% and a repetition frequency of 100Hz. For example, for the second AC voltage, the output power may be 4kW, the output frequency may be 35kHz, and the current output curve may be a rectangular pulse with a pulse-pause ratio of 70% and a repetition frequency of 100Hz, just like the first AC voltage.

[0022] As a control value property, a limit value can also be specified for one or more control values, ie a value which should not be exceeded, for example a maximum current of 10 A or a minimum power of 100 W.

[0023] In at least one of the control value characteristics, the first and second AC voltage powers differ.

[0024] In one aspect, at least two of the tax value characteristics differ, particularly preferably at least three.

[0025] The impedance matching device here refers to a device that can convert the output impedance connected to its output (for example, in the load direction) so that a predetermined impedance can be set at its input. There are many types of impedance matching devices. For example, such descriptions can be found in WO2016 / 177766A1, WO2017 / 072087A1, WO2019 / 185423A1, WO2021 / 255250A1. They usually have both variable and non-variable reactances, i.e. inductance and capacitance. Impedance changing elements such as transmission lines, resistors, transformers, baluns, couplers are also known. Variable elements can be electronically controlled and variable. For example, a vacuum capacitor can be changed by a motor, or the reactance can be turned on and off.

[0026] An alternator stage refers to an electronic circuit for converting an initial electrical power (e.g. direct current) into alternating current. Alternating current is characterized by the fact that voltage and current periodically change their signs. Current and voltage can have different courses. For example, the voltage and / or current can be approximately sinusoidal or approximately rectangular. In the latter case, it is often also called a bipolar voltage generator stage. Such an alternator stage usually has a bridge circuit of switching elements, in particular transistors, preferably MOSFETs or IGBTs.

[0027] On the one hand, the power supply arrangement also has:

[0028] a) a first power output connection for delivering a first AC voltage power to a first load;

[0029] b) A second power output terminal for providing a second AC voltage power to a second load away from the first load.

[0030] On the one hand, the power supply component also has a switching unit, which in particular is part of a power supply arrangement, wherein the power supply arrangement is arranged to be controllable via a data connection so that the switching unit can switch the AC voltage electrical energy generated by the AC generator stage to one of the power supply output connections and / or the load, taking into account the different characteristics of the respective AC voltage power.

[0031] A switching unit is here understood to mean an electronic component which is designed to transfer an electrical signal from its first contact to its second contact in a first setting and to block this transfer, in particular prevent it, in a second setting. Advantageously, the switching unit in the second setting can transfer the electrical signal in the second position from the first contact to the third contact and in the first setting block this transfer, in particular prevent it. The switching unit can be a transistor, in particular a power transistor, preferably an IGBT or a MOSFET. Other embodiments, such as a PIN diode or an electromechanical switch are also conceivable.

[0032] In one aspect, a power supply apparatus is disclosed for a plurality of plasma generators, each generator being specifically designed to excite a gas into a gas plasma remote from a plasma process, comprising:

[0033] a) mains input connection for connection to the electricity supply service,

[0034] b) a data connection for connection to a control system, which may in particular be located inside or outside the power supply unit;

[0035] c) a power supply device designed to convert power from a power input terminal with an alternator stage into first and second alternating voltage outputs;

[0036] d) a first power output connection for delivering a first AC voltage power to a first load;

[0037] e) a second power output connection for providing a second AC voltage power to a second load remote from the first load;

[0038] f) wherein the power supply device is designed to be controllable via the data connection such that the first and second AC voltage powers can have different characteristics for at least one or more of the following control values:

[0039] Output current

[0040] Output voltage

[0041] Output frequency,

[0042] Output power

[0043] Output curves of current and / or voltage, and

[0044] g) wherein the power supply device is arranged to output a control signal, in particular a plurality of control signals, in particular for an impedance matching device, which signal is assigned to one of the AC voltage powers.

[0045] This means that multiple plasma processes or multiple plasma generators can be operated using one power supply unit. This increases reliability and significantly reduces costs. Since one or more control signals are provided for the impedance matching devices assigned to the plasma generators, these signals can also be provided individually according to the respective AC voltage power of the respective plasma generators.

[0046] In one aspect, the power supply assembly can have one, in particular several, switch units, the power supply arrangement being arranged to ensure that, via the data connection, the switch unit connects the alternating current generated by the alternating current generator stage to one of the power supply output terminals, and the design of the power supply arrangement can also take into account the different characteristics of the individual power supply terminals. AC voltage power. For example, one power supply arrangement can provide an AC voltage generator stage for a single plasma generator. This saves a lot of costs.

[0047] In one aspect, one, in particular several, switching units can be arranged outside the power supply arrangement, wherein the power supply arrangement is arranged so that they can be controlled via the data connection, such that the switching unit switches the AC voltage generated by the AC generator stage to one of the power supply output connections, thereby taking into account different characteristics of the respective AC voltage power. For example, one power supply arrangement can provide an AC voltage generator stage for a single plasma generator. This saves a lot of costs and can also be very flexibly adapted to the respective application.

[0048] Between the impedance matching device and the power supply assembly there can be a connecting cable for transmitting the AC current of 1 m or more, in particular 3 m or more. This makes the use of the power supply arrangement particularly flexible and therefore cost-effective.

[0049] On the one hand, the power supply arrangement is designed in such a way that the power ratings of all the AC voltage outputs delivered to the loads (especially those that can be removed) are increased to be greater than the power rating of the AC generator stage. For example, an AC generator stage with a relatively low nominal power can be used to power a plurality of plasma generators, each of which individually requires no more nominal power than the AC generator stage can provide, but which at the same time require a significantly higher nominal power. This is because the plasma generators can be supplied sequentially in time, i.e. never simultaneously.

[0050] In one aspect, the power supply arrangement may be configured to output different drive signals to a plurality of impedance matching devices, each device being associated with an AC power supply output.

[0051] In one aspect, the power supply arrangement may be arranged to receive one or more plasma signals, in particular one or more and / or a plurality of plasma voltages, from one of the plasma generators.

[0052] A plasma signal is a signal detected in or near the generated plasma, e.g. a measured signal. This can be, for example, a signal measured on the winding side of an excitation transformer for exciting the plasma. It can also be a measured light signal, electromagnetic waves in the invisible range, e.g. UV, X-ray range, electric or magnetic fields, noise, vibrations, ultrasonic signals. The plasma voltage is particularly desirable and can be measured, in particular, on the winding side or on the winding side of the excitation transformer.

[0053] In one aspect, the power supply device can be configured to assign one or more emitted plasma signals to a characteristic of the AC voltage power, in particular to adjust the characteristic of the AC voltage power as a function of the respective plasma signal. This means that all plasma generators can be individually controlled very accurately and reliably by the power supply device.

[0054] In one aspect, the power supply arrangement can be configured to receive one or more voltages and / or currents from a current and / or voltage sensor, which is arranged and configured to measure the current and / or voltage of the AC voltage power. In particular, the power supply arrangement can also be designed to assign one or more emission voltages and / or currents to a characteristic of the AC voltage power, in particular to adjust the characteristic of the AC voltage power as a function of the corresponding voltage and / or current. This means that all plasma generators can be individually controlled very accurately and reliably by the power supply device.

[0055] In one aspect, the power supply arrangement can be arranged to receive one or more voltages and / or currents from a current and / or voltage sensor, which is arranged and configured to measure the current and / or voltage in or on the impedance matching device. In particular, the power supply arrangement can also be designed to assign one or more transmission voltages and / or currents to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power as a function of the corresponding voltage and / or current. This means that all plasma generators can be individually controlled very accurately and reliably by the power supply device.

[0056] On the one hand, the controller can be integrated into the power supply arrangement. This allows for further cost savings, so that all plasma generators can be individually controlled very precisely and reliably via the power supply unit.

[0057] On the one hand, the plasma generating device may have the following features:

[0058] a) a power supply arrangement as described above, and

[0059] b) Several plasma generators connected to the power supply device, in particular to its power output connection, and each plasma generator can be operated according to the control value characteristic.

[0060] In one aspect, the plasma generating device can have an initial transformer arrangement, in particular a transformer arrangement for each plasma generator, for coupling the AC voltage power to the load, the transformer assembly preferably being located in the vicinity of the load. This can further save costs, so that all plasma generators can be individually controlled very accurately and reliably by the power supply device. The transformer assembly refers to an inductive element having a first turn and a second turn, which can transfer the AC power applied to the first turn (primary winding) to the second turn (secondary turn). There are many different design options for such a transformer arrangement, the windings can be wound on a magnetic core, they can be arranged flat on a circuit board or represent a combination of both construction methods, although other variants are possible. For example, a possible second "turn" can also be the generated plasma itself. An example of such a transformer arrangement is disclosed in US9,368,328B2 as "transformer 35".

[0061] In one aspect, the plasma generating device can have an impedance matching device, in particular several impedance matching devices, preferably one impedance matching device at a time between the power supply assembly and the plasma generator. This can further save costs, since all plasma generators can be individually controlled very accurately and reliably via the power supply device.

[0062] On the one hand, the plasma generating device between the impedance matching device and the power supply assembly can have a connecting cable of 1 m or more, in particular a connecting cable of 3 m or more. This makes the plasma generating device particularly flexible.

[0063] On the one hand, the plasma generating device, i.e. the plasma generator, can be used for post-treatment of gases escaping from the plasma treatment device. On the one hand, the plasma generating device, i.e. the plasma generator, can be used for pre-treatment of gases introduced into the plasma treatment device. In particular, the plasma generating device of both plasma generators may have.

[0064] In one aspect, the impedance matching device may have one or more of the following components:

[0065] a) Inductor,

[0066] b) capacity,

[0067] The inductance and / or capacitance are adjustable and controlled by a signal connected to the data port. This allows further cost savings, so that all plasma generators can be individually controlled very precisely and reliably via the power supply unit.

[0068] In one aspect, in particular several plasma generators can be designed to excite a gas to a gas plasma at a location remote from the plasma process. In other words, they can advantageously be used as so-called remote plasma sources.

[0069] In one aspect, a method of controlling multiple plasma processes, each process specifically designed to excite a gas into a gas plasma remote from the plasma treatment, may provide the following steps:

[0070] a) supply electricity to the power supply device;

[0071] b) converting the power supply into a first AC voltage power, and delivering the first AC voltage power to a first load of the first plasma generator;

[0072] c) converting the power into a second AC voltage power and providing the second AC voltage power to a second load of a second plasma generator,

[0073] In particular, steps b) and c) do not occur simultaneously.

[0074] d) Controlling the AC voltage output according to different characteristics of one or more of the following control values:

[0075] Output current

[0076] Output voltage

[0077] Output frequency

[0078] Output power

[0079] Output curves of current and / or voltage, and

[0080] e) generating and outputting a drive signal for an impedance matching device distributed to one of the AC voltage powers.

[0081] This means that multiple plasma processes or multiple plasma generators can be operated using one power supply unit. This increases reliability and significantly reduces costs. Since one or more control signals are provided for the impedance matching devices assigned to the plasma generators, these signals can also be provided individually according to the corresponding AC voltage power of the corresponding plasma generators. All functions of the above-mentioned devices can also be further developed in a suitable program.

[0082] On the one hand, the method can provide multiple AC voltage outputs for each load of the relevant plasma generator, so that the delivery of AC voltage power to the loads does not occur simultaneously, and each load operates with its corresponding control characteristics, in particular, multiple control signals are generated and output for the impedance matching device assigned to one of the AC voltage powers.

[0083] In one aspect, the first and / or second AC power source can be transmitted via a connection cable of 1 m or longer, in particular 3 m or longer. This makes the process very flexible and therefore cost-effective.

[0084] In one aspect, the computer program product may be intended to control the power supply arrangement described above, in particular for features g) and f) and / or for process steps d) and e).

[0085] In one aspect, a non-volatile storage medium may be provided having instructions stored thereon for execution with a processor or for configuring a programmable logic module to perform control of the power supply arrangement described above, in particular for features g) and f) and / or method steps d) and e).

[0086] Further features and advantages of the invention are described in the following detailed description of embodiments of the invention, based on the essential details of the invention shown in the figures and the claims. The features shown here are not necessarily to scale and are presented in such a way that the special features of the invention can be clearly seen. The various functions can be implemented individually or in various combinations in variants of the invention.

[0087] Exemplary embodiments of the invention are shown in the schematic drawings and explained in the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0088] It shows:

[0089] Figure 1 the first plasma generating facility with initial power supply arrangements;

[0090] Figure 2 a second plasma generation facility having a second power supply arrangement;

[0091] Figure 3 Timing diagram of the output power when the power supply is first connected to the output;

[0092] Figure 4 A time graph of the power output connection output power per second;

[0093] Figure 5 Rectifier bridge circuit;

[0094] Figure 6 Bipolar power converter bridge;

[0095] Figure 7 A first embodiment of a switch unit;

[0096] Figure 8 A second embodiment of the switch unit;

[0097] Fig. 9 Flowchart of the procedure. DETAILED DESCRIPTION

[0098] Figure 1A first power supply device 10 and three plasma generators 17a, 17b, ... 17n are shown. The plasma generating units 17a, 17b, 17n each include a load 9a, 9b, ... 9n, each having an impedance matching device 15A, 15B, ... 15n with a power output port 3A, 3B, ... 3n.

[0099] For the overview, only three plasma generating units 17a, 17b, 17n are provided, each with an impedance matching device 15a, 15b, ... 15n. Of course, there can be more than three such devices. This is represented by three points, for example between the power output connections 3b and 3n. At the power output connections 3a, 3b, ... 3n are CT1a, CT1b, ... CT1n, for example for current and / or voltage measurement. Via the data bus 16, the signal determined there is fed to the data port 13 connected to the controller 4. Sensors for frequency, phase, power, in particular forward and / or reflected power, can also be used here.

[0100] The loads 9a, 9b, ... 9n are in particular so-called "remote plasma sources", RPS. These are special plasma generators 17a, 17b, ... 17n which are arranged to excite gases from a plasma process locally into a gas plasma. This type of plasma excitation is facilitated by transformer assemblies T1a, T1b, ... T1n. On the secondary side of these transformer assemblies facing the plasma, a plurality of plasma signals CT4a, CT4b, CT4n, in particular one or more plasma voltages, can be detected. These can also be transmitted to the data port 13 via the data bus 16.

[0101] At least one plasma generator 17a is connected to the power output terminal 3a of the power supply device 10 through an impedance matching device 15a. In this embodiment, all plasma generators 17a, 17b, ... 17n are connected through an impedance matching device, and each 15A, 15B, ... 15n has a power output port 3A, 3B, ... 3n of the power supply arrangement 10.

[0102] The impedance matching device 15a, 15b, ... 15n has several switchable inductors L1a, L2a, L3a, L1b, L2b, L3b, L1n, L2n, L3n as examples. These are in particular connected in parallel to the plasma generators 17a, 17b, ... 17n and the power supply output connections 3a, 3b, .. 3n of the power supply device 10. This means that the impedance adjustment can be carried out in stages very quickly. The currents through these inductors L1a, L2a, L3a, L1b, L2b, L3b, L1n, L2n, L3n can be compared with CT2a, CT2b, ... CT2n. These detected signals can also be fed to the data bus 16.

[0103] The impedance matching device 15a, 15b, ... 15n has a capacitor C1a, C1b, ... C1n. In particular, this can be an adjustable capacitor, for example by means of an adjustable vacuum condenser. As shown in the figure, the capacitor can be connected between the plasma generator 17a, 17b, ... 17n and the power supply output 3a, 3b, .. 3n of the power supply device 10. This means that impedance matching can be performed very reliably.

[0104] A further inductor L4a, L4b, L4n may also be connected between the plasma generator 17a, 17b, ... 17n and the power supply output connection 3a, 3b, .. 3n of the power supply device 10. This may be achieved at least in part by the stray inductance of the transformer array T1a, T1b, T1n.

[0105] At the output or inside the impedance matching device 15a, 15b, ... 15n, additional CT4a, CT4b, CT4n sensors may be provided, suitable for measuring current, voltage, phase, impedance and / or power. These recorded signals may also be fed to the data bus 16.

[0106] The power supply device 10 comprises a power input port 2 for connecting to a power source 7 .

[0107] The power supply device 10 further comprises a first power converter stage 5, which is configured to convert the input power at the power input terminal 2 into an intermediate power, preferably a DC link power 12. Several first power converter stages 5 for converting the input power at the power input port 2 into an intermediate power, preferably in a DC link power supply 12, may also be part of the power supply device 10 and are preferably connected in parallel.

[0108] In particular, the power supply device 10 further comprises an alternator stage 6 which is located downstream of the first power converter stage 5 and is configured to convert the intermediate power from the first power converter stage into a bipolar output power.

[0109] Between the power converter stage 5 and the further alternator stage 6, energy storage elements such as inductors or capacitors may be implemented to smooth the current or voltage.

[0110] The power supply device 10 further comprises a plurality of switch units 8a, 8b, ... For example, at the alternator stage 6 and the power supply output connection 3a, 3b, ..3n.

[0111] One or more switching units may also be located outside the power supply device 10, in particular close to, immediately before or after, or at an impedance matching device 15a, 15b, ... 15n (not shown). Since the data bus 16 is connected outside the power supply device 10 anyway, switching units outside the power supply device 10 may also be controlled.

[0112] The power supply device 10 further comprises a controller 4, which is designed to set the power supply device 10 to deliver bipolar output power to the power supply output terminals 3a, 3b, 3n using at least one of the following control parameters: power, voltage, current, exciter frequency or threshold for protection measures, so that at least one control parameter on the first power supply output terminal 3a is consistent with the control parameter on the corresponding other power supply output terminal 3b, ... to 3n.

[0113] In this example, the controller has 4 connections to the power converter stage 5 and switch units 8a, 8b and ... 8n. Some of these connectors may be optional, such as connecting to the power converter stage 5. The controller 4 can be configured to have switch units 8a, 8b, ... 8n that switch from the closed state to the open state only when the absolute value of the current through the switch is less than 1 ampere (preferably zero). The advantage of this is that the switching units 8a, 8b, ... 8n do not have to be designed for switching higher currents. This makes the device cheaper.

[0114] The plasma generating device 1 may include a controller in addition to the power supply device 10. The external controller may also control the loads 9a, 9b, .. 9n.

[0115] The controller 4 can also be configured with switch units 8a, 8b, ... 8n which switch from the open state to the closed state only when the absolute value of the voltage across the open switch is less than 20 volts (preferably zero). The advantage of this is that switch units can be used without having to be designed to switch higher voltages. This makes the device more affordable.

[0116] The power supply device 10 is capable of converting electrical input power into bipolar output power and transmitting the output power to at least two independent loads 9a, 9b, ... 9n, wherein the power supply arrangement comprises:

[0117] - Power input connection 2, for connecting power supply 7,

[0118] - at least two, preferably more than two, power supply output connections 3a, 3b, ... 3n, each for connection to a load 9a, 9b, ... 9n,

[0119] - A controller 4 configured to control the power supply assembly to deliver bipolar output power to the power supply output terminal using at least one of the following control parameters:

[0120] By obtaining a set of set points for the power output terminal parameters, providing power, voltage, current, excitation frequency or thresholds for protection measures,

[0121] In particular, the controller 4 is further designed to calculate whether the power supply arrangement is capable of delivering each set point to each power output terminal and, if applicable, to calculate a pulse sequence to deliver power to the power output terminals in order to power the plasma process.

[0122] In a further aspect, the controller 4 can be configured to control the power supply arrangement 10 so that at least one control parameter connected to a first power supply output terminal 3a, 3b, ... 3n is not equal to a corresponding control parameter of another power supply output terminal. This allows a single power supply arrangement with a given maximum power to be used, rather than multiple.

[0123] In this disclosure, bipolar output power refers to output power having an alternating current in which the current changes direction at a frequency (excitation frequency) that can excite a plasma process.

[0124] The control parameter may be a measured value or a target value of the parameter.

[0125] The measured value and the target value may be an absolute value, an instantaneous value, an RMS value (eg, an RMS (root mean square) value), or an extreme value (eg, a maximum value or a minimum value).

[0126] The input power can be the power provided by the AC power grid. It can also be a DC power line (AC: alternating current; DC: direct current).

[0127] The controller 4 may be comprised of a microcontroller that runs a software program when the power supply assembly is in operation.

[0128] The controller 4 may have multiple interfaces, such as data connections with external components, displays, and keyboards, which may be wired or wireless connections.

[0129] A controller can have a computing part and a memory part. The memory part can be divided into different uses, such as display memory, RAM, data storage, and program storage.

[0130] The threshold value can be a value used to detect plasma ignition or collapse. It can be set differently for each output port and can change over time.

[0131] The bipolar output power may be a power value of 1 kW or more, preferably 10 kW or more.

[0132] The frequency of the bipolar output power may be greater than 1 kHz, preferably greater than 10 kHz, and more preferably greater than 50 kHz.

[0133] In another aspect, the power supply device 10 may include a power converter stage 5 designed to convert input power into an intermediate power, preferably a DC link power.

[0134] On the other hand, the power supply arrangement may comprise at least one alternator stage 6 designed to convert the intermediate power coming from the first power converter stage 5 into a bipolar output power.

[0135] In a further aspect, the power supply device 10 can accommodate at least two additional alternator stages 6a, 6b, . . . 6n for converting the intermediate power from the first power converter stage 5 into a plurality of bipolar output power signals and routing these powers to the power output terminals.

[0136] In another aspect, the controller 4 can be designed to control the power converter stage 5 and / or the AC generator stage 6, 6a, 6b, ... 6n in such a way that, during use, the power supply device 10 provides a first power output signal at a first time frame, in particular at a first power output terminal in the first time frame, and provides a second power output signal at a second time frame, in particular at the second power output terminal, wherein the first time frame is different from the second time point and / or the first time frame is different from the second time frame.

[0137] On the other hand, the power supply device 10 may include one or more switching units 8a, 8b, . . . 8n between the power converter stage 6 and the power output terminals 3a, 3b . . . 3n.

[0138] On the other hand, the switching units 8a, 8b, ... 8n are controlled by the controller 4.

[0139] In another aspect, the controller 4 can be designed to control the power converter stage 5 and / or the alternator stage 6, 6a, 6b, ... 6n and / or the switch unit 8a, 8b, ... 8n. As shown in the figure, the power supply device in operation provides a first output power signal at a first time frame and provides a second power signal at a second power output port at a second time frame, the first time is different from the second time point and / or the first time frame is different from the second time frame.

[0140] On the other hand, the switch units 8a, 8b, ... 8n are arranged in such a way that they can conduct electricity in two opposite directions.

[0141] On the other hand, the controller 4 can be configured with switch units 8a, 8b, ... 8n. The switch is switched from the closed state to the open state only when the amount of current passing through the switch is less than 1 ampere (preferably zero).

[0142] On the other hand, the controller 4 may be configured to activate the switch unit from the open state to the closed state only when the voltage level across the open switch is less than 20 volts (preferably zero).

[0143] On the other hand, at least one of the power transformer stages 5 and / or the AC voltage generator stages 6, 6a, 6b, . . . 6n is a bridge circuit, preferably a full bridge circuit.

[0144] The bridge circuit may be a bridge circuit capable of rectifying an AC power source.

[0145] The bridge circuit can be a switching jumper circuit that produces bipolar output power.

[0146] In another aspect, power supply device 10 may include a housing that encloses all other parts of the unit.

[0147] On the other hand, the input connections can be connected directly to the control cabinet.

[0148] On the other hand, the power output connections 3a, 3b, ... 3n are directly connected to the housing.

[0149] In another aspect, the plasma generating device 1 may include:

[0150] - Two, preferably more than two, load 9a, 9b, ... 9n,

[0151] - A power supply device 10 as described above.

[0152] Each load 9a, 9b, ... 9n may be connected to one of the power output connectors 3a, 3b, ... 3n of the arrangement.

[0153] The problem of the invention is also solved by a controller 4 for controlling a plurality of plasma processes in a plurality of loads by converting an electrical input power into a bipolar output power and delivering this output power to the loads, the controller being designed to control an array of power supplies to deliver the bipolar output power to a power output, using at least one of the following control parameters:

[0154] By obtaining a complete set of set points for the power output terminal parameters, power, voltage, current, excitation frequency or threshold values ​​for protective measures, the controller is further designed to calculate whether the power supply device is able to deliver each set point to each power output terminal and, if applicable, to calculate a pulse sequence for delivering power to the power output terminals to power the plasma process.

[0155] In another embodiment of the controller 4, the complete set of setpoints may be provided via an interface connection, preferably by a controller external to the power supply unit, which also controls the plasma process in the plasma chamber.

[0156] In a further embodiment of the controller 4, the calculation may comprise determining a maximum target power at all points in time and comparing with a maximum power of the power supply arrangement.

[0157] In another embodiment of the controller 4, an error message may be given if the calculation result indicates that it is not possible to provide a set value for each power output connection.

[0158] In another embodiment of the controller 4, if the calculation results in that it is not possible to deliver the set point power to each power output connection, one or more possibilities of modifying the process using a new set of set points may be given.

[0159] In a further embodiment of the controller 4, the controller may control the power supply arrangement in such a way that at least one control parameter of a first plasma chamber is not equal to a corresponding control parameter of another plasma chamber.

[0160] The various loads 9a, 9b, ... 9n can be different or the same. They can be the same but in different states, i.e. the plasma process in a first load is in, for example, a first gas excitation state, while the plasma process in another load is in a gas conversion state at the beginning.

[0161] For the switch units 8a, 8b, ... 8n, bipolar transistors 81, 82, 91, 92 may be used, such as Figure 7 and Figure 8 As shown. These bipolar transistors are much cheaper than MOSFETs. The bipolar transistors 81, 82, 91, 92 may be IGBTs, which are low-cost transistors that can carry large currents and have low energy losses. This makes the power supply device 1 more cost-effective because it does not require expensive cooling equipment.

[0162] exist Figure 7 and Figure 8 In the embodiment, additional diodes 83, 84, 93, 94 are connected to supply current in the required direction and cut off current in the unwanted direction.

[0163] The power converter stage 5 may include a rectifier circuit, preferably a rectifier-bridge circuit 50, such as Figure 5 As shown. Four rectifier diodes 52, 53, 54, 55 are connected in a bridge circuit to rectify the alternating current from the first terminal 51 to the second terminal 56. At least one of the following elements can also be connected to the first terminal 51: a filter, a surge protection circuit, an overcurrent protection circuit. The filter can be composed of one or more energy storage elements, such as capacitors or inductors.

[0164] The AC voltage generator stage 6 may comprise a switching bridge, preferably a full bridge circuit 60, such as Figure 6 As shown. The full bridge circuit 60 includes four switch units 62, 63, 64, 65. These switch units can be transistors, bipolar transistors, IGBTs, and in particular MOSFETs. At the input end of the second AC generator stage 6, there can be a filter circuit with one or more energy storage elements, such as a capacitor 61 and / or inductors 66, 67. The full bridge circuit 60 can further include multiple diodes as shown in the figure.

[0165] The power supply assembly 10 may include a housing that encloses all other parts of the power supply assembly 10. It may be made of metal, so that it is well protected against electromagnetic interference waves. The power input port 2 may be directly connected to the cabinet. The power output connections 3a, 3b, ... 3n may also be directly connected to the housing 10.

[0166] In the power supply device 10 , the current carrying capacity . . . 8N of all the switch units 8 a , 8 b together is higher than the power transmission capacity of the maximum power converter 5 level.

[0167] Figure 2 A second plasma generating device 1' and a second power supply arrangement 10' are shown. The second power supply arrangement 10' is an alternative to the first power supply arrangement 10, such as Figure 1 All with Figure 1 The elements in a match all have the same reference position. Figure 2 The power supply arrangement 10 ′ shown comprises, instead of a conversion unit 8 a, 8 b, ... 8 n, a plurality of power converter stages 6A, 6B, ... 6 n, which are designed to convert a DC intermediate power 12 from a first power converter stage 5 into a plurality of bipolar output power signals and transmit these powers to power output terminals 3 a, 3 b, ... 3 n. All power converter stages 6 a, 6 b, ... 6 n can be controlled by a controller 4. All power converter stages 6 a, 6 b, ... 6 n can be composed of a full bridge 60 and filter elements 61, 66, 67, such as Figure 6 shown.

[0168] Sensors CT1a, CT1b, CT1n can be connected to the power output connections 3a, 3b, ... 3n to detect voltage, current, frequency or power. The power supply device 10 can also include several power converter stages 5, which are designed to convert the input power of the power input port 2 into an intermediate power, preferably a DC link power 12, and are preferably connected in parallel.

[0169] The cables used in the power supply device 10 and one or more impedance matching devices 15a, 15b, ... 15N can be 1 m long or longer, especially 3 m long or longer. In particular, these cables can have a predetermined impedance, preferably a real impedance without an imaginary part, and particularly preferably in the range of 45 to 80Ω. For such cases, one or more impedance matching devices 15a, 15b, ... 15n and control signals are particularly useful for them.

[0170] Figure 3 A time diagram of the output power of the first power output terminal 3a is shown. Axis t is the time axis, and axis S30 can be a voltage, current or power axis, etc. Axis S30 represents the actual values ​​of these parameters, while axis S31 represents the RMS values ​​of these parameters. Figure 3 In the first figure, with axis S30, bipolar signals are shown in two signal sequences 31 and 32. Signal sequence 31 has an excitation frequency of 2 / 11 of the time window, starting at time T31 and ending at time T32. Signal sequence 32 has an excitation frequency with a period of 2 / 11 of the time window, starting at time T33 and ending at time T34. In this example, these frequencies are the same, but these frequencies may be different. Figure 3 In the second diagram of FIG. 1 , with axis S31, the RMS values ​​of the two signal sequences 31, 32 are shown in the two signal sequences 33, 34. In this diagram, two threshold lines 35, 36 are also drawn. When the RMS value of one of the power, voltage or current parameters exceeds such thresholds, they can be used to detect plasma collapse, such as arcing or ignition of the plasma.

[0171] In the power supply arrangement 1 ′, the sum of the current carrying capacities 6 a , 6 b , . . . 6 n of all power converter stages is higher than the sum of the maximum power transfer capacities of all power converter stages 5 .

[0172] Figure 4 A time diagram of the output power of another power output terminal 3b, ... 3n is shown. Axis t is the time axis, and axis S40 can be a voltage axis, a current axis, or a power axis, etc. Axis S40 represents the actual values ​​of these parameters, and axis S41 represents the effective values ​​of these parameters. Figure 4In the first diagram with axis S40, the bipolar signal is represented by two signal sequences 41, 42. The excitation frequency period of signal sequence 41 is 1 / 7 of the time window, starting at time T41 and ending at time T42. The second pulse 44 starts at time T43, and its end time cannot be seen in this diagram. The second signal sequence 42 starts at time T43. This example shows that the frequencies of signal sequences 31, 32 and signal sequences 41, 42 are different, and the frequency of signal sequences 41, 42 is higher than the frequency of signal sequences 31, 32.

[0173] In addition or as an alternative to the different frequency excitation, a power, voltage, current or threshold value protection measure is performed between two different power supply output terminals 3a, 3b, 3n or two different loads 9a, 9b, ..9n.

[0174] In this figure, two threshold lines 45, 46 are also shown. When the RMS value of any power, voltage or current parameter exceeds such thresholds, they can be used to detect plasma collapse, such as arcing or ignition of the plasma.

[0175] The working principle of the present invention is that it involves several loads 9a, 9b, ... 9n and the controller 4 in a conversion manner, converting the electrical input power into bipolar output power, as shown in the signal sequence 31, 32, 41, 42, and delivering this output power to the loads 9a, 9b, ... 9n. The controller 4 controls the power supply device 1 to deliver the bipolar output power to the power output terminals 3a, 3b, ... 3n using at least one of the following control parameters: power, voltage, current, excitation frequency or threshold value for protection measures, by obtaining a complete set of power output terminals 3a, 3b, ... 3N as shown in the figure, wherein the controller 4 is further designed to calculate whether the power supply device 1, 1' is able to convert each set value to each power output terminal 3a, 3b, ... 3n, and if this is correct, then to provide power to the power output terminals 3a, 3b, ... 3N for the plasma process.

[0176] To this end, the controller 4 may control the power converter stages 6, 6a, 6b, .. 6n or the switch units 8a, 8b, .. 8n so that the unit 1 in operation receives the first output power signal at the first power output port 3a for the first frame T31-T32 and receives the second power signal at the second power output port 3b at the second frame T41. 3n represents the second time frame T41-T42, wherein the first time point T31, T41 is different from the second time T32, T42 and / or the first time frame T31-T32 is different from the second time frame T41-T42.

[0177] like Figure 1 The plasma generating device 1 shown and Figure 2The plasma generating device 1' shown is subject to the limitation of multiple power output connections 3a, 3b, ... 3n. Figure 2 For example, in the case of the plasma generating device 1' shown, these limitations occur when the total power or processing capacity of the output stage combined with the input stage exceeds the power or instantaneous capacity of the input stage, so that the maximum output power is not applied to all power output terminals 3a, 3b, ... 3n at the same time. Figure 1 For the plasma generating device shown, the maximum output power can only be achieved at the power output terminals 3a, 3b, ... 3N, or multiple power output ports 3A, 3B, ... 3n. In the case where different plasma processes need to be run independently, this can be achieved as long as the total duty cycle of all processes plus the time spent switching between outputs is less than the total cycle time.

[0178] These constraints define the areas where the operation can be performed and the areas where the operation cannot be performed within the parameters mentioned above. For any requirement, at an output or a group of power supply output terminals 3a, 3b, ... 3n, the position inside or outside the area where the operation can be performed must be determined. This leads to the need for sequence control.

[0179] The sequence controller 14 may be part of the controller 4. Their algorithms determine the output power provided to each power output connection, the demand 1 for each power output connection or the need to change one or more parameters to determine whether the demand is within the possible operating range. Figure 3 and Figure 4 The process shown, in which power is delivered to the power output connections 3a, 3b, ... 3N, whereby the various power output connections 3A, 3B, ... 3n operate at different powers, different pulse duty cycles or different pulse frequencies, the sequence control ensures that:

[0180] - the pulse frequencies are integer multiples of each other to avoid pulse overlap (for plasma devices 1 ', such as Figure 2 (shown)

[0181] - For overlapping pulses, the total required power and current does not exceed the possible maximum value (for plasma devices 1 ', such as Figure 2 (shown)

[0182] - If the possible maximum value is exceeded for a limited time in the cycle, no mode is found that exceeds this (for plasma devices 1 ', such as Figure 2 (shown)

[0183] - the sum of the pulse and the switching time between outputs is less than the minimum pulse cycle frequency (for plasma device 1, such as Figure 1 (shown)

[0184] - Activate a newly required output pulse pattern in a given output at the right time to adapt to the existing pulse patterns of other outputs (for plasma devices 1, e.g. Figure 1 (shown)

[0185] - Overall average power limit and flow not exceeding

[0186] - If the requested sequence is out of range, a warning will be given to the user

[0187] - Recommend possible modification sequences to the user.

[0188] Fig. 9 A flow chart showing the procedure is shown. The method is characterized in that it is particularly suitable for controlling multiple plasma processes, each of which is specially designed for exciting a gas into a gas plasma remote from the plasma treatment, i.e. for controlling several so-called "remote plasma sources" RPS, with the following steps:

[0189] Step 71: Providing power to the power supply device 10,

[0190] Step 72: converting the power supply into a first AC voltage power, and providing the first AC voltage power to the first load 9a of the first plasma generator 17a,

[0191] Step 73: converting the power into a second AC power, and delivering the second AC power to a second load 17b of a second plasma generator 9b, wherein steps 73 and 72 do not occur simultaneously,

[0192] Step 74: Control the AC power according to different characteristics of one or more of the following control values:

[0193] Output current

[0194] Output voltage

[0195] Output frequency /

[0196] Output power

[0197] Output curves of current and / or voltage, and

[0198] Step 75: Generate and output a driving signal for the impedance matching device 15a, 15b, 15n distributed to one of the AC voltage power.

Claims

1. A power supply device (10) for a plurality of plasma generators (17a, 17b, 17n), in particular each plasma generator being specially designed for exciting a gas into a gas plasma at a location remote from the plasma process, include: a) Power input connection (2), for connecting to a power source (7), b) a data connection (13) for connecting to a control system (4), c) Among them, The power supply device (10) is designed to convert the power from the power input terminal (2) into AC voltage power by means of an AC generator stage (6), d) With the power supply device (10) provided, via the data port (13): ensuring that AC voltage power can be supplied as first AC voltage power to a first load (9a) and as second AC voltage power to a second load (9b) remote from the first local load, in particular not to power both loads simultaneously, and controllable so that the first and second AC voltage powers have different characteristics at least for one or more of the following control values: Output current Output voltage Output frequency Output power Output curves of current and / or voltage, and e) wherein the power supply device (10) is configured to output a driving signal for an impedance matching device (15A, 15B, 15N) allocated to any AC voltage power.

2. The power supply device (10) according to claim 1, It is characterized in that The invention is characterized by comprising: a) a first power output terminal (3a) for delivering a first AC voltage power to a first load (9a), b) A second power output terminal (3b) for providing a second AC voltage power to a second load (9b) remote from the first load.

3. The power supply device (10) according to any one of the preceding claims, in, A switching unit (8a, 8b) is also provided, which is in particular part of the power supply device (10), wherein the power supply device (10) is arranged to ensure that: via the data connection (13), the switching unit (8a, 8b) can provide the AC voltage power generated by the AC voltage generator stage (6) to one of the power supply output terminals (3a, 3b) and / or the load (9a / 9b) respectively and is arranged to be able to adjust different characteristics of the corresponding AC voltage power.

4. A power supply arrangement (10) according to any one of the preceding claims, wherein the arrangement is designed so that the sum of the rated powers of all AC voltage powers that can be provided to the loads (9a, 9b, ... 9n) is greater than the rated power of the AC voltage generator stage (6).

5. A power supply device (10) according to one of the preceding claims, in, It is designed to output different control signals for a plurality of impedance matching devices (15a, 15b), each impedance matching device being assigned to one of the AC voltage powers.

6. A power supply device (10) according to any of the preceding claims, in, It is configured to receive one and / or more plasma signals (CT4a, CT4b, CT4n), in particular one and / or more plasma voltages, from one of the plasma generators (17a, 17b, 17n).

7. A power supply device (10) according to one of the preceding claims, in, Its design purpose is to assign the emitted one or more plasma signals (CT4a, CT4b, CT4n) to the characteristics of the AC voltage power, and in particular to adjust the characteristics of the AC voltage power as a function of the respective plasma signal (CT4a, CT4b, CT4n).

8. A power supply device (10) according to any of the preceding claims, in, It is established to receive one or more voltages and / or currents from current and / or voltage sensors (CT1a, CT1b, CT1n), which are arranged and equipped to measure the current and / or voltage of the AC voltage power, and wherein the power supply device (10) is particularly designed so that one or more emitted voltage and / or current intensities should be assigned to the characteristics of the AC voltage power, in particular to adjust the characteristics of the AC voltage power according to the corresponding voltage and / or current.

9. A power supply device (10) according to any one of the preceding claims, It is characterized in that Its characteristics yes Receiving one or more voltages and / or currents from a current and / or voltage transducer (CT2a, CT2b, CT2n, CT3a, CT3b, CT3n), wherein the current and / or voltage transducer (CT2a, CT2b, CT2n, CT3a, CT3b, CT3n) is set and configured to measure the current and / or voltage in or on the impedance matching device (15a, 15b, 15n), wherein the power supply device (10) is particularly further established to: assign one or more transmission voltages and / or currents to the characteristics of the AC voltage power, and particularly to adjust the characteristics of the AC voltage power according to the corresponding voltage and / or current.

10. A power supply device (10) according to any one of the preceding claims, It is characterized in that The controller (4) is integrated into the power supply device (10).

11. Plasma generating device (1), include: a) A power supply arrangement (10) according to any preceding claim, and b) Several plasma generators (17a, 17b, 17n), which are connected to the power supply device (10), in particular to its power output terminals (3a, 3b, 3n), and each plasma generator can be operated according to a control value characteristic.

12. The plasma generating device (1) according to claim 11, further comprising a first transformer assembly (T1a), in particular one transformer assembly (T1a, T1b, T1n) for each plasma generator (17a, 17b, 17n), for coupling the AC voltage power to the load (9a, 9b, 9n), in, The transformer assembly (T1a, T1b, T1n) is preferably located in the immediate vicinity of the load (9a, 9b, 9n).

13. A plasma generating device (1) according to any one of the preceding claims 11 or 12, further comprising an impedance matching device (15a), in particular several impedance matching devices (15a, 15b, 15n), in, An impedance matching device (15a, 15b, 15n) is preferably located between the power supply device (10) and the plasma generator (17a, 17b, 17n).

14. A plasma generating device (1) according to any one of the preceding claims 11 to 13, in, In particular, several plasma generators ( 17 a , 17 b , 17 n ) (so-called remote plasma sources) are designed to excite the gas into a gas plasma at a local distance from the plasma process.

15. A method of controlling a plurality of plasma processes, in particular each process being specifically designed to excite a gas into a gas plasma at a distance from the plasma process, the steps comprising: a) a power supply device (10) supplies power, b) converting the power supply into a first AC voltage power and delivering the first AC voltage power to a first load (9a) of a first plasma generator (17a), c) converting the power into a second AC power and providing the second AC power to a second load (9b) of a second plasma generator (17b), in particular steps b) and c) do not occur at the same time, d) Controlling AC power according to different characteristics of one or more of the following control values: Output current Output voltage Output frequency Output power Output curves of current and / or voltage, and e) generating and outputting a driving signal for an impedance matching device (15a, 15b, 15n) distributed to one of the AC voltage power.

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