A gas filtration and separation system for chip manufacturing

Abstract

The present application relates to the technical field of gas filtration and separation, and provides a gas filtration and separation system for chip manufacturing, including a raw material storage tank, a filtration mechanism, and a filter material regeneration mechanism. The filtration mechanism includes a particle filter, an adsorption filter, and a dryer group connected in sequence. The raw material storage tank is connected to the particle filter. The dryer group includes an air intake pipe, an air outlet pipe, a flow control component, and a plurality of dry filters. One end of the air intake pipe is connected to the adsorption filter. The plurality of dry filters are arranged in parallel. The flow control component is used to control different dry filters to be connected to the particle filter and the air outlet pipe. The filter material regeneration mechanism includes a heating tank, a second driving source, and a hot air purge component that are connected to each other. The hot air purge component is provided with multiple groups corresponding to the dry filters, and the hot air purge component is located in the dry filter. The present application can shorten the downtime while reducing the secondary pollution of the special gas by external impurities, and reducing the filtering burden of the filtration system.

Description

Technical Field

[0001] The present application relates to the technical field of gas filtration and separation, and in particular to a gas filtration and separation system for chip manufacturing. Background Art

[0002] In the semiconductor manufacturing process, various special gases such as silane, ammonia, fluoride gas, etc. are used in key links such as thin film deposition, etching and doping. These gases must be filtered to achieve extremely high purity (usually above 99.999%) to ensure that the formed film is uniform, structurally stable and has excellent performance. In the chemical vapor deposition (CVD) process, the filtration system that filters the raw gas mainly filters impurities including particulate matter, moisture, organic matter, etc. Moisture comes from moisture in the production and transportation of the gas, or moisture in the environment. Moisture will react with certain reactive gases to generate by-products, affecting the quality and purity of the film.

[0003] During the process of drying special gases in the filter in the system, a large amount of moisture carried in the special gases adheres to the filter material. In order to maintain the drying function of the filter area, the filter material in the filter needs to be replaced. When replacing the filter material, in order to reduce the downtime of the filtration system and improve the problem of reduced production efficiency caused by downtime, multiple filters will be connected in the filtration system; multiple filters can be used alternately to achieve the purpose of shortening downtime.

[0004] However, in the process of replacing the filter material in the filter, it is easy to introduce other impurities in the environment into the filtration system, pollute the special gases in the filtration system, and increase the filtration burden of the filtration system. Summary of the invention

[0005] In order to shorten the downtime in special gas filtration, reduce the secondary contamination of special gases by external impurities, and alleviate the filtration burden of the filtration system, the present application provides a filtration and separation system for chip manufacturing gases.

[0006] The present application provides a gas filtration and separation system for chip manufacturing, which adopts the following technical solution:

[0007] A gas filtering and separation system for chip manufacturing, comprising:

[0008] A raw material storage tank, a filtering mechanism, including a particle filter, an adsorption filter and a dryer group connected in sequence, wherein the raw material storage tank is connected to the particle filter, and the dryer group includes an air intake pipe, an air outlet pipe, a flow control component and a plurality of dry filters, one end of the air intake pipe is connected to the adsorption filter, and a plurality of dry filters are arranged in parallel, and the flow control component is used to control different dry filters to be connected between the particle filter and the air outlet pipe;

[0009] A first driving source is connected between the raw material storage tank and the particulate filter and is used to drive the gas in the raw material storage tank to flow into the particulate filter;

[0010] The filter material regeneration mechanism includes a heating tank, a second driving source and a hot air purge component which are interconnected. The hot air purge components are provided in multiple groups corresponding to the drying filters, and the hot air purge components are located in the drying filters. The heating tank is connected to an air supply pipe, and the second driving source is used to drive the gas in the heating tank to flow to the hot air purge component.

[0011] By adopting the above technical solution, the flow control component is used to make multiple dry filters in the dryer group alternately participate in the filtering process, so as to achieve the continuity and stability of the drying function and avoid the production interruption caused by the failure of a single filter. The filter material regeneration mechanism uses the heating tank and the hot air purge component to enable the filter material in the dry filter to be regenerated in situ and restore its drying function, thereby reducing the time and labor cost required to replace the filter material. The first driving source ensures that the gas in the raw material storage tank can flow smoothly into the particle filter, ensuring the smooth progress of the entire filtering process. The particle filter and the adsorption filter in the filtering mechanism perform preliminary filtration and further purification of the gas in turn, effectively removing particulate matter and organic matter in the gas, and improving the purity of the final output gas.

[0012] Optionally, the flow control component includes an air inlet branch pipe, an air outlet branch pipe, a first on-off valve arranged on the air inlet branch pipe, and a second on-off valve arranged on the air outlet branch pipe. Each of the drying filters is connected to the air inlet branch pipe and the air outlet branch pipe, and one end of each of the air inlet branch pipes away from the drying filter is connected to the air inlet main pipe, and one end of each of the air outlet branch pipes away from the drying filter is connected to the air outlet main pipe.

[0013] By adopting the above technical solution, the flow control component connects each drying filter through the air inlet branch pipe and the air outlet branch pipe, and controls the connection status of different drying filters through the first on-off valve and the second on-off valve, thereby realizing the alternating use of multiple drying filters, effectively reducing the downtime of the filtration system and improving production efficiency.

[0014] Optionally, it also includes a gas collecting tank, which is connected to the gas outlet main pipe; the end of the gas supply pipe away from the heating tank is connected to the gas collecting tank, and a third driving source is provided on the gas supply pipe, and the third driving source is used to drive the gas in the gas collecting tank to flow into the heating tank.

[0015] By adopting the above technical solution, the gas collection tank is used to effectively collect the finished special gas that has been filtered and dried, and the gas in the gas collection tank can be directly put into chip production; at the same time, through the connection between the gas collection tank and the gas supply pipe, the collected gas can be sent back to the heating tank, and the filtered special gas is heated and then put into the dry filter through the hot gas purge component to dry the filter material in the dry filter to reduce the pollution caused to the system during the process of hot gas purge to regenerate the filter material. The setting of the third driving source makes the gas delivery more stable and reliable, and improves the operating efficiency and stability of the entire system.

[0016] Optionally, the drying filter includes a drying tank, a liquid cooling pipe, and a filter material holding rack disposed in the drying tank;

[0017] The drying tank is connected with an exhaust pipe and a drain pipe, the drain pipe is provided with an exhaust valve, and the drain pipe is provided with a drain valve;

[0018] The liquid cooling pipe is coiled around the periphery of the filter material containing frame, and both ends of the liquid cooling pipe pass through the drying tank.

[0019] By adopting the above technical solution, a filter material holding rack and a liquid cooling pipe are arranged inside the drying tank of the drying filter. The filter material holding rack is used to load the desiccant, and the liquid cooling pipe is coiled around the periphery of the filter material holding rack, which can effectively reduce the temperature inside the drying tank, promote the condensation of water vapor in the drying tank, and improve the drying efficiency. The exhaust pipe and the drain pipe connected to the drying tank are respectively provided with an exhaust valve and a drain valve, which are convenient for discharging the waste gas and waste liquid generated during the filter material regeneration process, ensuring the smooth progress of the drying process, while avoiding the accumulation of waste liquid to cause damage to the equipment.

[0020] Optionally, the heating tank comprises a heating tank body and an electromagnetic heater disposed in the heating tank body;

[0021] The hot air blowing assembly includes an air distribution mesh pipe and a plurality of nozzles connected to the air distribution mesh pipe, the air distribution mesh pipe is connected to the heating pipe, and the air distribution mesh pipe is located below the filter material holding rack, and the nozzles are arranged toward the filter material holding rack.

[0022] By adopting the above technical solution, the electromagnetic heater in the heating tank is used to efficiently heat the gas in the tank, ensuring that the gas temperature reaches the high temperature condition required for filter media regeneration. The design of the air distribution network pipe and the nozzle in the hot gas purge assembly enables the hot gas to be evenly distributed and directly act on the filter media on the filter media holder, effectively improving the regeneration efficiency of the filter media and restoring its drying function. At the same time, this design avoids external impurities that may be introduced during the traditional filter media replacement process, further ensuring the purity of the special gas and the stability of the system operation.

[0023] Optionally, the plurality of nozzles are distributed in an array.

[0024] By adopting the above technical solution, multiple nozzles are distributed in an array, which can more evenly cover the filter material rack, improve the uniformity and effectiveness of hot air blowing, and thus better promote the regeneration of the filter material and restore its drying function. At the same time, the uniform hot air distribution also helps to avoid local overheating, protect the filter material from damage, and extend the service life of the filter material, further reducing maintenance costs.

[0025] Optionally, it also includes a temperature regulating tank, on which a heat exchange pipe is passed; the temperature regulating tank is connected to a temperature regulating inlet pipe and a temperature regulating outlet pipe, the temperature regulating inlet pipe is connected to the gas collecting storage tank, and a thermometer is also arranged on the temperature regulating inlet pipe.

[0026] By adopting the above technical solution, since the finished gas in the gas collection tank is cooled during drying, the gas temperature is relatively low, which will affect the reaction temperature on the deposition rate and film quality in the chemical vapor deposition process. When the finished gas obtained after filtration needs to be put into use, the finished gas in the gas collection tank is first passed into the temperature regulating tank along the temperature regulating inlet pipe; when in use, the high-temperature medium is introduced into the heat exchange tube, and the inside of the temperature regulating tank is heated through the heat exchange tube, and the pure special gas is heated to a temperature suitable for the working state, which can accelerate the reaction rate and improve the deposition uniformity.

[0027] Optionally, a plurality of heat exchange tubes are arranged at intervals.

[0028] By adopting the above technical solution, the arrangement of multiple heat exchange tubes reduces the gas flow area in the cross-section of the temperature regulating tank, so that the gas flow rate is accelerated when flowing through the multiple heat exchange tubes, thereby improving the heat exchange rate.

[0029] Optionally, the drying tank is also connected to a vacuum pump.

[0030] By adopting the above technical solution, before the hot air purge component works, the vacuum pump can extract the air in the drying tank to form a negative pressure environment, thereby accelerating the evaporation of moisture inside the filter material; reducing the working intensity of the subsequent hot air purge component, improving the regeneration speed and effect of the filter material, and ensuring that the dry filter quickly restores the drying function.

[0031] In summary, the present application includes at least one of the following beneficial effects:

[0032] 1. In this application, the alternating use of different drying filters is controlled by the flow control component, thereby realizing the continuous operation of the filtration system, reducing the downtime caused by changing the filter material, and improving the production efficiency;

[0033] 2. In this application, the filter material regeneration mechanism is used to regenerate the filter material in the dry filter in situ, thereby avoiding the introduction of external impurities during the filter material replacement process, ensuring the purity of the special gas and reducing the burden on the filtration system;

[0034] 3. In the present application, the particle filter, adsorption filter and dryer group are interconnected, which can effectively remove particulate matter, organic matter and moisture in the gas, ensure the high purity of the gas, and improve the quality and reliability of thin film deposition. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 It is a schematic diagram of the overall structure of the filtration and separation system for chip manufacturing gas according to an embodiment of the present application;

[0036] Figure 2 It is a partial cross-sectional structural schematic diagram of a gas filtering and separation system for chip manufacturing showing the internal structure of a drying tank and a heating tank in an embodiment of the present application;

[0037] Figure 3 It is a structural schematic diagram of a temperature regulating tank according to an embodiment of the present application;

[0038] Description of the reference numerals: 1. Raw material storage tank; 2. Particle filter; 3. Adsorption filter; 4. Dryer group; 41. Inlet main pipe; 42. Outlet main pipe; 43. Flow control component; 431. Inlet branch pipe; 432. Outlet branch pipe; 433. First on-off valve; 434. Second on-off valve; 44. Drying filter; 441. Drying tank; 442. Liquid cooling pipe; 443. Filter material holding rack; 444. Exhaust pipe; 4441. Exhaust valve; 445. Drain pipe; 4451. Drain valve; 5. The first driving source; 6. filter material regeneration mechanism; 61. heating tank; 611. heating tank body; 612. electromagnetic heater; 613. exhaust gas pipe; 6131. ​​exhaust branch pipe; 614. air supply pipe; 62. the second driving source; 63. hot air purge assembly; 631. air distribution network pipe; 632. nozzle; 64. the third driving source; 65. manual air valve; 7. air collecting tank; 8. temperature control tank; 81. temperature control inlet pipe; 82. temperature control exhaust pipe; 83. heat exchange pipe; 9. thermometer; 10. vacuum pump. DETAILED DESCRIPTION

[0039] The following is combined with Figure 1-3 This application is described in further detail.

[0040] Embodiment 1:

[0041] Embodiment 1 of the present application provides a gas filtration and separation system for chip manufacturing.

[0042] Reference Figure 1, the filtering and separation device for chip manufacturing gas provided in the embodiment of the present application includes a raw material storage tank 1, a filtering mechanism, a filter material regeneration mechanism 6 and a gas collection storage tank 7. Among them, the filtering mechanism includes a particle filter 2, an adsorption filter 3 and a dryer group 4, and the raw material storage tank 1, the particle filter 2 and the adsorption filter 3 are sequentially connected through a gas pipeline. The raw material storage tank 1 is used to store the special gas to be filtered. The raw material storage tank 1 can be made of stainless steel with good corrosion resistance and sealing to ensure that the special gas will not leak. A first driving source 5 is installed on the gas pipeline between the raw material storage tank 1 and the particle filter 2. The first driving source 5 is specifically configured as a diaphragm pump to drive the special gas in the raw material storage tank 1 to move toward the particle filter 2. The particle filter 2 adopts a multi-layer filter mesh structure, such as a stainless steel wire mesh or a ceramic filter mesh; when the special gas flows through the particle filter 2, the solid particles in the particle special gas. The adsorption filter 3 is filled with activated carbon to remove organic matter and part of the water in the special gas.

[0043] Reference Figure 1 and Figure 2 The dryer group 4 includes an air inlet pipe 41, an air outlet pipe 42, a flow control component 43 and a plurality of dry filters 44. One end of the air inlet pipe 41 is connected to the adsorption filter 3, and one end of the air outlet pipe 42 is connected to the gas collection tank 7. The dry filter 44 includes a drying tank 441, a liquid cooling pipe 442, and a filter material holding rack 443 arranged in the drying tank 441. The top of the drying tank 441 is connected to an exhaust pipe 444, and the bottom is connected to a drain pipe 445; an exhaust valve 4441 is arranged on the exhaust pipe 444, and a drain valve 4451 is arranged on the drain pipe 445. By adjusting the exhaust valve 4441 and the drain valve 4451, the waste gas and waste liquid generated during the drying process can be conveniently discharged. The filter material holding rack 443 is fixed in the drying tank 441 and is used to hold desiccant. The liquid cooling pipe 442 is coiled around the outer periphery of the filter material holding frame 443 , both ends of the liquid cooling pipe 442 pass through the drying tank 441 , and the pipe section of the liquid cooling pipe 442 in contact with the drying tank 441 is fixedly connected to the drying tank 441 .

[0044] When in use, coolant is introduced into the liquid cooling tube 442 through the end of the liquid cooling tube 442 to cool the interior of the drying tank 441. When the special gas flows into the drying tank 441, the desiccant absorbs the moisture in the special gas; and the cooling effect of the liquid cooling tube 442 promotes the condensation of water vapor in the special gas, thereby improving the drying efficiency and drying effect.

[0045] Reference Figure 2The flow control component 43 includes an air inlet branch pipe 431, an air outlet branch pipe 432, a first on-off valve 433 disposed on the air inlet branch pipe 431, and a second on-off valve 434 disposed on the air outlet branch pipe 432. The drying pipes in each filter dryer 44 are connected with the air inlet branch pipe 431 and the air outlet branch pipe 432, and the end of each air inlet branch pipe 431 away from the filter dryer 44 is connected to the air inlet main pipe 41, and the end of each air outlet branch pipe 432 away from the filter dryer 44 is connected to the air outlet main pipe 42, so that multiple drying tanks 441 are connected in parallel between the air inlet main pipe 41 and the air outlet main pipe 42. By adjusting the states of each first on-off valve 433 and the second on-off valve 434, different filter dryers 44 can be flexibly switched to achieve the alternating use of multiple groups of filter dryers 44 in the system, thereby shortening the downtime and improving production efficiency.

[0046] In this embodiment, two drying filters 44 are specifically provided in the dryer group 4. In other embodiments, the two first on-off valves 433 can be directly replaced with a three-way valve to control the air intake main pipe 41 to flow into different air intake branch pipes 431; similarly, the two second on-off valves 434 can be replaced with a three-way valve to control the communication between different air outlet branch pipes 432 and the air outlet main pipe 42.

[0047] Reference Figure 2 The filter material regeneration mechanism 6 includes a heating tank 61, a second driving source 62 and a hot gas purge assembly 63 which are interconnected. The heating tank 61 includes a heating tank body 611 and an electromagnetic heater 612 arranged in the heating tank body 611. The heating tank body 611 is connected with a gas supply pipe 614, and the end of the gas supply pipe 614 away from the heating pipe is connected with the gas collection tank 7; the gas supply pipe 614 is installed with a third driving source 64, and the third driving source 64 is also set as a diaphragm pump. The diaphragm pump is used to drive the pure special gas in the gas collection tank 7 to move into the heating tank 61. Multiple electromagnetic heaters 612 are arranged at intervals in the heating tank 61. The electromagnetic heaters 612 can quickly increase the temperature of the gas in the tank to ensure that the pure special gas entering the heating tank body 611 can reach the required temperature.

[0048] Reference Figure 2 , multiple groups of hot gas purge components 63 are provided corresponding to the drying tank 441, and the hot gas purge components 63 are provided in the drying tank 441. The heating tank body 611 is connected with a heat exhaust pipe 613, and one end of the heat exhaust pipe 613 away from the heating tank body 611 is connected with multiple heat exhaust branch pipes 6131; the heat exhaust branch pipes 6131 are provided one by one with the hot gas purge components 63, and are connected with the corresponding hot gas purge components 63, and each heat exhaust branch pipe 6131 is installed with a manual gas valve 65. The second driving source 62 is installed on the heat exhaust pipe 613 to drive the special gas heated in the heating tank body 611 to flow to the hot gas purge component 63. In this embodiment, the second driving source 62 is specifically configured as an air pump.

[0049] Reference Figure 2 The hot air purge assembly 63 includes an air distribution network pipe 631 and a plurality of air jet heads 632 connected to the air distribution network pipe 631. The air distribution network pipe 631 is connected to the corresponding heat exhaust branch pipe 6131, and the air distribution network pipe 631 is located below the filter material holding rack 443, and the air jet heads 632 are arranged toward the filter material holding rack 443. The plurality of air jet heads 632 are distributed in an array, which can ensure the uniformity and comprehensiveness of the purge and avoid the problem of incomplete local drying.

[0050] When the filter material in a drying tank 441 needs to be regenerated, the corresponding first on-off valve 433 and the second on-off valve 434 on the drying tank 441 are closed, and the drain valve 4451 is opened first to discharge the waste liquid in the drying tank 441, and then the corresponding exhaust valve 4441 and the manual air valve 65 are opened to introduce high-temperature pure special gas into the drying tank 441 to perform heat purge on the inside of the drying tank 441, which can effectively remove moisture and other impurities on the surface of the filter material and restore the drying function of the filter material.

[0051] Reference Figure 2 The drying tank 441 is also connected to a vacuum pump 10. Before using the hot air purge assembly 63 to purge the inside of the drying tank 441, the moisture and other impurities on the surface of the filter material can be further removed by vacuuming to reduce the subsequent water removal burden and improve the regeneration efficiency. The vacuum pump 10 can be a screw vacuum pump or a rotary vane vacuum pump. These vacuum pumps 10 have a high pumping speed and stability, and can quickly reduce the pressure in the drying tank 441, thereby accelerating the evaporation and removal of moisture. Furthermore, before the hot air purge assembly 63 works, the liquid cooling pipe 442 and the vacuum pump 10 can be used to act. The vacuum pump 10 is first used to extract the air in the drying tank 441 to form a negative pressure environment, so that the water molecules in the filter material overflow into a gaseous state, reducing the moisture content in the filter material; then the temperature in the drying tank 441 is reduced by the liquid cooling pipe 442 to accelerate the liquefaction of water vapor inside the drying tank 441, and achieve preliminary dehumidification treatment. The provision of the vacuum pump 10 and the liquid cooling pipe 442 reduces the work intensity of the subsequent hot gas purge assembly 63 and reduces the amount of finished gas used during the filter material regeneration process, thereby increasing the regeneration speed and effect of the filter material and ensuring that the drying filter 44 quickly restores the drying function.

[0052] Reference Figure 1 and Figure 3The gas collection tank 7 is connected to the temperature regulating tank 8, and the temperature regulating tank 8 is also penetrated with a plurality of heat exchange pipes 83, and both ends of the heat exchange pipes 83 are located outward from the temperature regulating, which is convenient for connecting an external heat source to ensure that the temperature of the gas in the temperature regulating tank 8 is quickly adjusted. The temperature regulating tank 8 includes a temperature regulating inlet pipe 81 and a temperature regulating exhaust pipe 82 at both ends, and the temperature regulating inlet pipe 81 is connected to the gas collection tank 7. Through the circulation of the heat-conducting medium in the heat exchange pipe 83, the temperature of the special gas in the temperature regulating tank 8 can be effectively adjusted, and the heated special gas is discharged along the temperature regulating exhaust pipe 82 into the chip manufacturing process, which is conducive to the efficient implementation of the chip manufacturing process. A thermometer 9 is also provided on the temperature regulating inlet pipe 81. Through the monitoring of the thermometer 9, it is convenient to adjust the temperature of the gas to ensure that the gas temperature is compatible with the current working state.

[0053] The implementation principle of this embodiment is: through multi-stage filtration, solid particles in the gas are first removed through the particle filter 2, and then organic matter and part of the water are removed through the adsorption filter 3. Through the adjustment of the flow control component 43, multiple groups of dry filters 44 can be used alternately, shortening the downtime and improving production efficiency. During the regeneration process of the dry filter 44, the synergistic effect of the heating tank 61 and the hot air purge component 63 can effectively remove the moisture and other impurities on the surface of the filter material, restore the drying function of the filter material, thereby realizing the continuous drying of special gases, reducing environmental pollution and equipment failures, and improving the reliability and stability of the overall production process.

[0054] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A gas filtration and separation system for chip manufacturing, characterized in that: include: Raw material storage tank (1), A filtering mechanism, comprising a particle filter (2), an adsorption filter (3) and a dryer group (4) which are connected in sequence, wherein the raw material storage tank (1) is connected to the particle filter (2), the dryer group (4) comprises an air intake pipe (41), an air outlet pipe (42), a flow control component (43) and a plurality of dry filters (44), one end of the air intake pipe (41) is connected to the adsorption filter (3), a plurality of the dry filters (44) are arranged in parallel, and the flow control component (43) is used to control different dry filters (44) to be connected between the particle filter (2) and the air outlet pipe (42); A first driving source (5) is connected between the raw material storage tank (1) and the particle filter (2) and is used to drive the gas in the raw material storage tank (1) to flow into the particle filter (2); A filter material regeneration mechanism (6), comprising a heating tank (61), a second driving source (62) and a hot air purge assembly (63) which are interconnected, wherein a plurality of hot air purge assemblies (63) are provided corresponding to the filter drier (44), and the hot air purge assemblies (63) are located inside the filter drier (44); the heating tank (61) is connected to an air supply pipe (614), and the second driving source (62) is used to drive the gas in the heating tank (61) to flow toward the hot air purge assembly (63); A gas collecting tank (7), the gas collecting tank (7) being connected to the gas outlet main pipe (42); an end of the gas supply pipe (614) away from the heating tank (61) being connected to the gas collecting tank (7), a third driving source (64) being provided on the gas supply pipe (614), the third driving source (64) being used to drive the gas in the gas collecting tank (7) to flow toward the heating tank (61); The drying filter (44) comprises a drying tank (441), a liquid cooling pipe (442), and a filter material holding rack (443) arranged in the drying tank (441); the drying tank (441) is connected to an exhaust pipe (444) and a drain pipe (445); the drain pipe (445) is provided with an exhaust valve (4441); the drain pipe (445) is provided with a drain valve (4451); the liquid cooling pipe (442) is coiled around the periphery of the filter material holding rack (443), and both ends of the liquid cooling pipe (442) pass through the drying tank (441); the drying tank (441) is also connected to a vacuum pump (10); A temperature regulating tank (8), wherein the temperature regulating tank (8) is provided with a heat exchange pipe (83); the temperature regulating tank (8) is connected to a temperature regulating inlet pipe (81) and a temperature regulating exhaust pipe (82), the temperature regulating inlet pipe (81) is connected to the gas collecting tank (7), and a thermometer (9) is also provided on the temperature regulating inlet pipe (81); The flow control component (43) comprises an air inlet branch pipe (431), an air outlet branch pipe (432), a first on-off valve (433) arranged on the air inlet branch pipe (431), and a second on-off valve (434) arranged on the air outlet branch pipe (432); each of the drying filters (44) is connected to the air inlet branch pipe (431) and the air outlet branch pipe (432); and one end of each of the air inlet branch pipes (431) away from the drying filter (44) is connected to the air inlet main pipe (41), and one end of each of the air outlet branch pipes (432) away from the drying filter (44) is connected to the air outlet main pipe (42); The heating tank (61) comprises a heating tank body (611) and an electromagnetic heater (612) arranged in the heating tank body (611); The hot air purge assembly (63) comprises an air distribution mesh tube (631) and a plurality of air jet heads (632) connected to the air distribution mesh tube (631); the air distribution mesh tube (631) is connected to the heating tank (61), and the air distribution mesh tube (631) is located below the filter material holding rack (443); and the air jet heads (632) are arranged toward the filter material holding rack (443).

2. A chip manufacturing gas filtration and separation system according to claim 1, characterized in that: The plurality of nozzles (632) are distributed in an array.

3. A chip manufacturing gas filtration and separation system according to claim 1, characterized in that: A plurality of heat exchange tubes (83) are arranged at intervals.

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